阅读说明：本技术 一种显影装置 (Developing device ) 是由 闫鹏 江奇纮 叶光尧 于 2020-12-17 设计创作，主要内容包括：本发明公开了一种显影装置,涉及光刻胶显影技术领域。显影装置包括喷嘴、载物台、与载物台驱动连接的旋转驱动机构和与喷嘴驱动连接的直线驱动机构,载物台用于承载芯片,喷嘴设置在载物台上方,喷嘴上设有至少两个出液孔,出液孔用于朝向载物台表面喷吐显影液,旋转驱动机构的旋转输出端与载物台的中心转动连接,用于驱动载物台水平转动,直线驱动机构用于驱动喷嘴沿经过载物台中心的直线方向往复运动。上述显影装置通过多孔式喷嘴的设计并配合喷嘴和载物台的运动,不仅使待显影芯片表面达到线宽的高度一致性,提高了芯片的良品率,还能够适应多种尺寸的芯片,具有较高的普适性。(The invention discloses a developing device, and relates to the technical field of photoresist development. Developing device includes the nozzle, the objective table, the rotary driving mechanism who is connected with the objective table drive and the linear driving mechanism who is connected with the nozzle drive, the objective table is used for bearing the chip, the nozzle sets up in the objective table top, be equipped with two at least liquid holes on the nozzle, it is used for towards objective table surface eruption developer to go out the liquid hole, rotary driving mechanism's rotatory output end rotates with the center of objective table to be connected, be used for driving the horizontal rotation of objective table, linear driving mechanism is used for driving the nozzle along the straight line direction reciprocating motion through the objective table center. Above-mentioned developing device not only makes the chip surface of treating to develop reach the high uniformity of line width through the design of porous formula nozzle and the motion of cooperation nozzle and objective table, has improved the yields of chip, can also adapt to the chip of multiple size, has higher universality.)

1. The utility model provides a developing device, its characterized in that, including nozzle, objective table, with the rotary driving mechanism that the objective table drive is connected and with the sharp actuating mechanism that the nozzle drive is connected, the objective table is used for bearing the chip, the nozzle sets up the objective table top, be equipped with two at least liquid holes on the nozzle, it is used for the orientation to go out the liquid hole the developer is spouted to the objective table surface, rotary driving mechanism's rotatory output with the center of objective table rotates and is connected, is used for the drive the objective table horizontal rotation, sharp actuating mechanism is used for the drive the nozzle is along the process the straight line direction reciprocating motion at objective table center.

2. Developing device as in claim 1, characterized in that at least two of the exit openings are arranged in a line on the ejection face of the nozzle.

3. Developing device as claimed in claim 2, characterized in that the apertures of at least two of the exit openings are identical.

4. The developing device according to claim 2, wherein the diameters of at least two of said liquid outlets decrease in order along said alignment direction.

5. The developing device according to claim 1, wherein the liquid outlet hole has a liquid outlet direction perpendicular to the surface of the stage.

6. The developing device according to claim 1, further comprising a liquid inlet pipe communicating with the nozzle, the developing solution being supplied to the nozzle through the liquid inlet pipe.

7. The developing device according to claim 6, further comprising a liquid storage tank for containing the developing solution, wherein the liquid inlet pipe is used for communicating the liquid storage tank with the nozzle.

8. The developing device according to claim 2, wherein at least two of said liquid outlet holes are arranged in the same direction as a forward direction of the reciprocating movement of said nozzle.

9. Developing device as in claim 1, characterized in that the initial position of the nozzle is located above the projection of the stage center.

10. The developing device according to claim 9, wherein one end of the reciprocating movement of the nozzle is above the projection of the center of the stage and the other end does not exceed the edge of the stage.

Technical Field

The invention relates to the technical field of photoresist development, in particular to a developing device.

Background

With the evolution of semiconductor manufacturing process, the requirements of the industry on the production efficiency, power consumption, energy saving and line width precision of chips are higher and higher, and a large amount of heavy processing and even scrapping can be generated by carelessness. Therefore, it is a great test for those skilled in the art how to accurately control the line width of each region on the chip during the developing process to achieve high yield.

At present, the standard developing and imaging method commonly used in the industry is to spray developer in a developing tank by using a vertical single nozzle, so as to realize developing and imaging on the surface of a chip. Meanwhile, the line width of each area on the chip is controlled by the rotation of the chip and the movement of the developing nozzle. However, the entire ejection range of the conventional nozzle moving area cannot completely cover the development area of the chip, and the line width of each area on the chip is easily uneven, thereby reducing the yield.

Disclosure of Invention

The invention aims to provide a developing device to solve the technical problem that the line widths of all areas after a chip is developed are not consistent in the prior art.

The embodiment of the invention is realized by the following steps:

the embodiment of the invention provides a developing device which comprises a nozzle, an objective table, a rotary driving mechanism in driving connection with the objective table and a linear driving mechanism in driving connection with the nozzle, wherein the objective table is used for bearing a chip, the nozzle is arranged above the objective table, at least two liquid outlet holes are formed in the nozzle and used for spraying developing liquid towards the surface of the objective table, the rotary output end of the rotary driving mechanism is in rotating connection with the center of the objective table and used for driving the objective table to horizontally rotate, and the linear driving mechanism is used for driving the nozzle to reciprocate along the linear direction passing through the center of the objective table.

Optionally, the at least two liquid outlet holes are arranged in a straight line on the spraying surface of the nozzle.

Optionally, the diameters of the at least two liquid outlet holes are the same.

Optionally, the diameters of the at least two liquid outlet holes decrease in sequence along the linear arrangement direction.

Optionally, the liquid outlet direction of the liquid outlet hole is perpendicular to the surface of the object stage.

Optionally, the developing device further includes a liquid inlet pipe communicated with the nozzle, and the developing solution is input to the nozzle through the liquid inlet pipe.

Optionally, the developing device further comprises a liquid storage tank, the liquid storage tank is used for containing developing liquid, and the liquid inlet pipe is used for communicating the liquid storage tank and the nozzle.

Optionally, the arrangement direction of the at least two liquid outlet holes is the same as the forward stroke direction of the reciprocating motion of the nozzle.

Optionally, the initial position of the nozzle is located above the projection of the center of the stage.

Optionally, one end of the reciprocating motion of the nozzle is above the projection of the center of the object stage, and the other end does not exceed the edge of the object stage.

The embodiment of the invention has the beneficial effects that:

the developing device provided by the embodiment of the invention comprises a nozzle, an objective table, a rotary driving mechanism in driving connection with the objective table and a linear driving mechanism in driving connection with the nozzle, wherein the objective table is used for bearing a chip, the nozzle is arranged above the objective table, at least two liquid outlet holes are formed in the nozzle and are used for spraying developing liquid towards the surface of the objective table, the rotary output end of the rotary driving mechanism is in rotary connection with the center of the objective table and is used for driving the objective table to horizontally rotate, and the linear driving mechanism is used for driving the nozzle to reciprocate along the linear direction passing through the center of the objective table. Under the mutual cooperation of the rotary motion of the objective table and the linear motion of the nozzle, the developing solution covers the whole surface to be developed of the chip. In addition, through the linear motion of the nozzle, the developing solution can be sprayed on the surface of a large chip under the condition that the size of the nozzle is small, meanwhile, the size and the structure of the nozzle are not limited by the size of the chip to be developed, and the universality of the developing device is improved. The design of the porous nozzle can enable the developing solution to cover the developing area of a larger area in unit time, and meanwhile, the flow of the developing agent can be adjusted to enable the surface of the chip to be developed to achieve high consistency of line width, so that the yield of the chip is improved.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.

FIG. 1 is a schematic structural diagram of a developing device according to an embodiment of the present invention;

FIG. 2 is a schematic structural diagram of an ejection surface of a nozzle in a developing device according to an embodiment of the present invention;

fig. 3 is a second schematic structural diagram of the ejection surface of the nozzle in the developing device according to the embodiment of the present invention.

Icon: 100-a developing device; 110-a nozzle; 111-liquid outlet holes; 120-stage; 130-a rotary drive mechanism; 140-a liquid inlet pipe; 200-chip; 300-developing solution; 310-development area.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.

In the description of the present invention, it should be noted that the terms "center", "inside", "outside", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the referred device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention. The terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.

Fig. 1 is a schematic structural diagram of a developing device 100 according to an embodiment of the present invention, and referring to fig. 1, the embodiment provides a developing device 100, including a nozzle 110, an object stage 120, a rotary driving mechanism 130 in driving connection with the object stage 120, and a linear driving mechanism in driving connection with the nozzle 110, where the object stage 120 is used for carrying a chip 200, the nozzle 110 is disposed above the object stage 120, the nozzle 110 is provided with at least two liquid outlets 111, the liquid outlets 111 are used for ejecting a developing solution 300 toward a surface of the object stage 120, a rotary output end of the rotary driving mechanism 130 is rotatably connected with a center of the object stage 120 and is used for driving the object stage 120 to rotate horizontally, and the linear driving mechanism is used for driving the nozzle 110 to reciprocate along a linear direction passing through the center of the object stage 120.

The chip 200 is fixed on the stage 120 with the surface to be developed of the chip 200 facing upward, and the ejection surface of the nozzle 110 faces the surface of the stage 120 (i.e., the surface to be developed of the chip 200) to eject the developing solution 300 toward the surface to be developed of the chip 200. During the development process, the stage 120 is driven by the rotary driving mechanism 130 to rotate around the center thereof, so that the chip 200 on the stage 120 also rotates along with the stage 120, the nozzle 110 is driven by the linear driving mechanism to reciprocate along the linear direction passing through the center of the stage 120, and the developing solution 300 covers the whole surface to be developed of the chip 200 under the mutual cooperation of the rotary motion of the stage 120 and the linear motion of the nozzle 110. Further, the linear movement of the nozzle 110 can discharge the developer 300 onto the surface of the large chip 200 even when the nozzle 110 is small in size, and the size and structure of the nozzle 110 are not restricted by the size of the chip 200 to be developed, thereby improving the versatility of the developing apparatus 100.

There are two reciprocating directions of the nozzle 110, namely, a forward direction (direction a in fig. 1) in which the nozzle 110 reciprocates and a backward direction (direction B in fig. 1) in which the nozzle 110 reciprocates, the forward direction being from the center to the edge of the stage 120, and the backward direction being from the edge to the center of the stage 120, and the nozzle 110 discharges the developer 300 when moving in the forward direction, and does not discharge the developer 300 when moving in the backward direction, but only resets the nozzle 110, and prepares for developing the next chip 200.

The nozzle 110 is provided with at least two liquid outlet holes 111, the design of the multi-hole nozzle 110 can enable the developing solution 300 to cover the developing area 310 of a larger area in unit time, and meanwhile, the surface of the chip 200 to be developed can achieve high consistency of line width by adjusting the flow of the developing agent, so that the yield of the chip 200 is improved.

In summary, the developing device 100 includes a nozzle 110, a stage 120, a rotary driving mechanism 130 drivingly connected to the stage 120, and a linear driving mechanism drivingly connected to the nozzle 110, wherein the stage 120 is configured to carry the chip 200, the nozzle 110 is disposed above the stage 120, the nozzle 110 is provided with at least two liquid outlet holes 111, the liquid outlet holes 111 are configured to spray the developing solution 300 toward the surface of the stage 120, a rotary output end of the rotary driving mechanism 130 is rotationally connected to the center of the stage 120 and configured to drive the stage 120 to rotate horizontally, and the linear driving mechanism is configured to drive the nozzle 110 to reciprocate along a linear direction passing through the center of the stage 120. The developing device 100 not only enables the surface of the chip 200 to be developed to achieve the high consistency of the line width through the design of the multi-hole nozzle 110 and the movement of the nozzle 110 and the objective table 120, improves the yield of the chip 200, but also can adapt to the chips 200 with various sizes, and has higher universality.

It should be noted that, in the present embodiment, the number of the liquid outlet holes 111 is not limited, and may be two, three or more, and the specific number may be determined according to the diameter of the chip 200 to be developed, the developing efficiency, and the like. The liquid outlet holes 111 may be distributed at equal intervals or at variable intervals, and may be determined according to the size of the chip 200 and the flow rate of the developing solution 300. Illustratively, the number of the exit holes 111 is three, and the three exit holes 111 are uniformly distributed in a straight line along the radius direction of the object stage 120.

The shape and size of the stage 120 are not limited, the stage 120 may be circular, square, rectangular, etc., and the surface area of the stage 120 may be larger than the surface area of the chip 200 or smaller than the surface area of the chip 200. Further, a suction mechanism may be provided on the upper surface of the stage 120, and the chip 200 may be fixed to the stage 120 by the suction mechanism so as to rotate together with the stage 120. Alternatively, a clamping mechanism may be provided on the upper surface of the stage 120, and the clamping mechanism clamps and fixes the chip 200 to the surface of the stage 120 so that the chip 200 rotates together with the stage 120.

The specific structure of the rotary driving mechanism 130 and the linear driving mechanism is not limited, as long as the rotary driving mechanism 130 can drive the stage 120 to rotate horizontally, and the linear driving mechanism can drive the nozzle 110 to reciprocate along a linear direction passing through the center of the stage 120. Illustratively, the rotary driving mechanism 130 is a rotary electric machine, and the linear driving mechanism is one of a linear electric machine, a hydraulic cylinder, an air cylinder, and a motor; the driving end of the rotation driving mechanism 130 is fixedly connected with the center of the object stage 120, and the object stage 120 is driven to rotate around the center by the rotation of the driving end of the rotation driving mechanism 130; the driving end of the linear driving mechanism is fixedly connected with the nozzle 110, and the linear reciprocating motion of the nozzle 110 is realized through the linear reciprocating motion of the driving end of the linear driving mechanism.

In order to make the developer 300 sprayed on the surface of the chip 200 more regular and uniform, optionally, at least two liquid outlet holes 111 are arranged in a straight line on the spraying surface of the nozzle 110.

At least two liquid outlet holes 111 are arranged on the nozzle 110 along the same straight line, and are matched with the straight reciprocating motion of the nozzle 110 and the rotating motion of the objective table 120, so that the developing solution 300 can be more uniformly covered on the surface of the chip 200, and the consistency of the surface line width of the chip 200 can be improved.

It should be understood that, in the present embodiment, the shape of the ejection surface of the nozzle 110 is not limited as long as at least two liquid outlet holes 111 can be arranged in a straight line on the ejection surface of the nozzle 110. Illustratively, the spray surface of the nozzle 110 is rectangular, and at least two liquid outlet holes 111 are linearly arranged along the length direction of the rectangular spray surface. The rectangular spraying surface can provide distribution space for two, three or more liquid outlet holes 111, and simultaneously can save the space in the non-distribution direction of the liquid outlet holes 111, so that the spraying surface of the nozzle 110 is utilized reasonably to the maximum extent, and more liquid outlet holes 111 are distributed and arranged on a smaller spraying area.

Fig. 2 is a schematic structural diagram of a spraying surface of a nozzle 110 in a developing device 100 according to an embodiment of the present invention, and referring to fig. 2, optionally, at least two liquid outlets 111 have the same aperture.

The liquid outlet holes 111 arranged on the spraying surface of the nozzle 110 have the same aperture, so that the flow of the developing solution 300 is conveniently controlled, and the liquid outlet amount of each liquid outlet hole 111 is ensured to be consistent on the premise that the flow rate of the developing solution 300 is the same.

Fig. 3 is a second schematic structural view of the ejection surface of the nozzle 110 in the developing device 100 according to the embodiment of the present invention, and referring to fig. 3, the aperture of at least two liquid outlets 111 is optionally reduced in sequence along the linear arrangement direction.

The alignment direction is from the center of the stage 120 to the edge of the stage 120, and the diameters of the liquid outlet holes 111 decrease in sequence along the direction, so that the liquid outlet holes 111 with small diameters can firstly discharge the developing solution 300 along the direction from the center of the chip 200 to the edge, and then the liquid outlet holes 111 with large diameters can discharge the developing solution 300. The two edges of the distribution direction of the liquid outlet holes 111 on the nozzle 110 are respectively defined as a first edge and a second edge, and the aperture of the liquid outlet holes 111 decreases from the first edge to the second edge in sequence. According to the difference of centripetal force of the wafer close to the circle center and the wafer far away from the circle center, the at least two liquid outlet holes 111 with the gradually decreasing aperture from the first edge to the second edge ensure the uniformity of development, reduce the throwing-off of the developing solution 300 at the edge of the chip 200, save the consumption of the developing solution 300 and reduce the development cost.

Optionally, the liquid outlet direction of the liquid outlet hole 111 is perpendicular to the surface of the object stage 120.

The play liquid direction of liquid hole 111 is perpendicular with objective table 120's surface for its speed direction is perpendicular with objective table 120's surface after developer 300 flows from liquid hole 111, and direct action is in the region of treating development of chip 200, makes the developer 300 of spouting to chip 200 surface more add evenly, has reduced the loss of chip 200 edge developer 300, has improved the homogeneity of chip 200 surface line width, has saved the quantity of developer 300.

In order to more conveniently deliver the developing solution 300 to the nozzle 110, the developing device 100 may further include a liquid inlet pipe 140 communicating with the nozzle 110, and the developing solution 300 may be introduced into the nozzle 110 through the liquid inlet pipe 140.

The liquid outlet holes 111 provided in the nozzle 110 may be communicated with each other or may be independent of each other in the nozzle 110. If the liquid outlet holes 111 are communicated with each other in the nozzle 110, only one liquid inlet pipe 140 needs to be arranged to supply liquid to a communication area in the nozzle 110, the developing solution 300 flows out through the liquid outlet holes 111 after entering the communication area, at this time, the flow rate of the developing solution 300 at the liquid outlet holes 111 is the same, and if the flow rate of the developing solution 300 at the liquid outlet holes 111 is to be regulated, the flow rate is required to be regulated through the aperture of the liquid outlet holes 111; that is, if the diameters of the liquid outlet holes 111 are the same, the flow rates of the developer 300 at the liquid outlet holes 111 are equal, and if the diameters of the liquid outlet holes 111 are different, the flow rate of the developer 300 at the liquid outlet hole 111 having a larger diameter is larger, and the flow rate of the developer 300 at the liquid outlet hole 111 having a smaller diameter is smaller. If the liquid outlet holes 111 are independent of each other and not communicated with each other in the nozzle 110, the liquid inlet pipes 140 with the same number as the liquid outlet holes 111 need to be arranged to independently supply liquid to each liquid outlet hole 111, and the developing solution 300 flows out from the liquid outlet holes 111 through the channels connected with the liquid outlet holes 111 in the nozzle 110, at this time, the flow rates of the developing solution 300 at the liquid outlet holes 111 can be the same or different, and the flow regulation and control of the developing solution 300 at the liquid outlet holes 111 are more flexible. For example, if the apertures of the liquid outlet holes 111 are the same, the flow rate of the developer 300 at the liquid outlet holes 111 can be adjusted by adjusting the flow rates of the developer 300 in the liquid inlet pipes 140; of course, the aperture of the liquid outlet holes 111 and the flow rate of the developer 300 in the liquid inlet pipe 140 connected to the liquid outlet holes can be simultaneously controlled, so that the flow rate of the developer 300 at each liquid outlet hole 111 can reach the optimal flow rate. Optionally, a flow regulating valve is disposed on the liquid inlet pipe 140, and the flow rate of the developing solution 300 in the liquid inlet pipe 140 is controlled by the flow regulating valve.

Optionally, the developing device 100 further comprises a liquid storage tank for containing the developing solution 300, and the liquid inlet pipe 140 is used for communicating the liquid storage tank with the nozzle 110.

The liquid storage tank is used for containing the developing solution 300 and supplying the developing solution to the nozzle 110 through the liquid inlet pipe 140, and the developing solution 300 can be supplemented in time by observing the residual amount of the developing solution 300 in the liquid storage tank in the liquid supply process.

Optionally, the arrangement direction of the at least two liquid outlet holes 111 is the same as the forward stroke direction of the reciprocating motion of the nozzle 110.

The arrangement direction of the liquid outlet holes 111 is the same as the reciprocating movement of the nozzle 110, and all of the liquid outlet holes are from the center of the objective table 120 to the edge of the objective table 120, and the linear movement of the nozzle 110 and the rotary movement of the objective table 120 are combined, so that the developing solution 300 can be more uniformly sprayed onto the chip 200, and the uniformity of the surface line width of the chip 200 can be improved.

Alternatively, the nozzle 110 may reciprocate with one end above the projection of the center of the stage 120 and the other end not beyond the edge of the stage 120.

The two reciprocating ends of the nozzle 110 are limited between the projection above the center of the objective table 120 and the edge of the objective table 120, and when the diameter of the chip 200 is smaller than or equal to that of the objective table 120, the nozzle 110 can be prevented from spraying the developing solution 300 to the outside of the chip 200, so that the waste of the developing solution 300 is avoided. When the diameter of the chip 200 is larger than that of the stage 120, one end of the reciprocating motion of the nozzle 110 is above the projection of the center of the stage 120, and the other end does not exceed the edge of the chip 200.

The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.