阅读说明：本技术 包括二进气口的电浆装置 (Plasma apparatus comprising two gas inlets ) 是由 王震南 于 2020-06-24 设计创作，主要内容包括：本发明提供一种用于医疗和消毒目的的电浆产生装置,其包括一控制元件(10)和连接至该控制元件(10)的一电浆产生器(30)。该电浆产生器(30)包括具有一第一端(311)和一第二端(312)的一电浆管(31)；一第一介电质层(32)设置在该电浆管(32)的内表面上,一第一电极(33)设置在该第一介电层(32)上,而一第二介电层(34)设置在该第一电极(33)上；一第二电极(35)设置在该第二介电层(34)上；以及一电浆喷嘴(3122)设置在该电浆管(31)的第二端(312)的底盖(3121)上。(The invention provides a plasma generating device for medical and disinfection purposes, comprising a control element (10) and a plasma generator (30) connected to the control element (10). The plasma generator (30) includes a plasma tube (31) having a first end (311) and a second end (312); a first dielectric layer (32) disposed on the inner surface of the plasma tube (32), a first electrode (33) disposed on the first dielectric layer (32), and a second dielectric layer (34) disposed on the first electrode (33); a second electrode (35) disposed on the second dielectric layer (34); and a plasma nozzle (3122) disposed on the bottom cover (3121) of the second end (312) of the plasma tube (31).)

1. An apparatus having two inlets, comprising:

a control element, comprising:

a first gas module comprising:

a first inlet port; and

a first gas controller;

a second gas module comprising:

a second air inlet; and

a second gas controller;

a total gas flow sensor, and

a high voltage generator; and

a plasma generator connected to the control device, comprising:

a plasma tube having a first end and a second end;

a first dielectric layer disposed on an inner surface of the plasma tube;

a first electrode disposed on the first dielectric layer;

a second dielectric layer disposed on the first electrode;

a second electrode disposed on the second dielectric layer; and

a plasma nozzle is disposed at the second end of the plasma tube.

2. The apparatus of claim 1, wherein the plasma generator comprises a second electrode having a substantially rotationally symmetric shape.

3. The apparatus of claim 2, wherein the second electrode is circular with a plurality of hollow cylinders therein.

4. The apparatus of claim 2, wherein the second electrode is circular with a plurality of hollow blade shapes inside.

5. The apparatus of claim 1, wherein the plasma generator further comprises a top cover and a bottom cover disposed over the first end and the second end, respectively; the top cover is connected to the control element through a connector and the plasma nozzle is disposed on the bottom cover.

6. The apparatus of claim 5, wherein the control element further comprises: a Programmable Logic Controller (PLC); a buzzer; an AC/DC converter; and a Human Machine Interface (HMI).

7. The apparatus of claim 1, wherein the control element is connected to a power source.

Technical Field

The present invention relates to a plasma apparatus for inactivating microorganisms or viruses and assisting blood microcirculation. More particularly, the present invention is a plasma apparatus having two inlets for the input of different gases.

Background

Atmospheric thermal plasma exists in nature. Because of its high energy, thermal plasma is used in a variety of applications, including surface coatings and display devices. Cold plasma processing procedures are also well known in the art. Cold plasma is generated by discharging a gas from a variety of gases, which may be atmospheric or noble gases, through a positive electrode to negative electrode arrangement. Since the temperature of cold plasma is relatively low and can be used for human therapy, many methods of plasma therapy have been reported in the prior art. The plasma treatment method must be effective in killing all organisms including spores without damaging the treated human body.

The plasma configuration must satisfy the parameters of the plasma treatment process, such as the input of different gases or combinations of gases, the flow rate of the gas input, and the power applied to the gas. In addition, the plasma characteristics vary depending on the different gases or combinations of gases that are introduced. Prior art-US 20110112522A 1 and US 10121638B 1 disclose a plasma apparatus having an inlet. However, the device disclosed in the prior art-european patent EP2160081 a1 requires a gas as a carrier and at least one additive to disinfect or improve wound healing, and further requires a mixer to mix the carrier gas and the additive.

Therefore, there is a need in the art to develop a plasma apparatus that can generate plasma having specific characteristics according to the kind of gas inputted by inputting a single gas through a single gas inlet for a specific process or simultaneously inputting two different gases through two gas inlets for a desired gas combination at a specific time. Arrangements are utilized to control and measure gas input and generate a plasma accordingly, which may be used for wound healing improvement, sterilization and other intended purposes.

Disclosure of Invention

The present invention comprises a system that provides:

(1) air; (2) a non-corrosive gas; (3) a gas combination of air and a non-corrosive gas.

The invention relates to a device which can make microorganism or virus inactive and can help blood microcirculation by using cold air plasma. The device is used for non-invasive treatment and to promote wound healing, pain relief and inflammation reduction. The device can be used for trauma or internal injury.

The device can be used for surface cleaning. The device also has bactericidal and disinfectant effects, and can be used for surface cleaning, disinfection, or personal or environmental hygiene, and infection prevention, especially in hospital or healthcare related infections.

The invention aims to provide a device with two air inlets, which comprises: a control element; a plasma generator connected to the control device. The control element includes: a first gas module, a second gas module, a total gas flow sensor, and a high voltage generator. The first gas module includes: a first inlet and a first gas controller. The second gas module includes: a second gas inlet and a second gas controller. The plasma generator includes: a plasma tube having a first end and a second end; a first dielectric layer disposed on an inner surface of the plasma tube; a first electrode disposed on the first dielectric layer; a second dielectric layer disposed on the first electrode; a second electrode disposed on the second dielectric layer; and a plasma nozzle disposed at the second end of the plasma tube.

In a particular embodiment, wherein the plasma generator comprises a second electrode having a substantially rotationally symmetric shape.

In a specific embodiment, the second electrode is circular with a plurality of hollow cylinders inside.

In a specific embodiment, the second electrode is circular with a plurality of hollow blade shapes inside.

In a specific embodiment, the plasma generator further comprises a top cover and a bottom cover disposed on the first end and the second end, respectively; the top cover is connected to the control element through a connector and the plasma nozzle is located on the bottom cover.

In a particular embodiment, wherein the control element further comprises: a Programmable Logic Controller (PLC); a buzzer; an AC/DC converter; and a Human Machine Interface (HMI).

In a particular embodiment, wherein the control element is connected to a power source.

Drawings

The foregoing summary, as well as the following detailed description of the invention, will be better understood when read in conjunction with the appended drawings. In the drawings:

FIG. 1 shows a schematic view of the apparatus of the present invention.

FIG. 2 is a schematic diagram of a first and second gas module according to the present invention.

FIG. 3 is a cross-sectional view of a plasma generator according to the present invention.

FIG. 4 is a partial cross-sectional view of a plasma generator according to the present invention.

Fig. 5(a) and 5(B) are top views of the second electrode in alternative embodiments (other components are omitted).

FIG. 6 shows the results of plasma treatment after inoculating E.coli (E.coli) with the medium and the growth inhibition thereof.

Detailed Description

The foregoing and other technical matters, features and effects of the present application will be apparent from the following embodiments when read in conjunction with the accompanying drawings. Technical means and effects of the present invention adopted to achieve the above objects will be further understood by the description of the specific embodiments. Further, since the disclosure of the present invention can be readily understood and carried out by those skilled in the art, all equivalent changes or modifications without departing from the inventive concept are intended to be covered by the present invention.

Moreover, ordinal numbers such as "first," "second," etc., in the specification are used for describing the claimed elements only and do not imply or indicate a sequential order of the elements, and do not imply or indicate an order of steps between one element and another or between two elements in a manufacturing process. The use of a particular ordinal number merely distinguishes one element having a particular name from another element having a particular name.

In addition, the terms "above," "over," and "… above" as used herein mean not only direct contact with other elements, but also indirect contact with other elements.

The present invention relates to a device for medical, hygienic and disinfection purposes.

The device of the present invention is capable of inactivating microorganisms or viruses using direct cold air plasma while improving blood microcirculation. The purpose of the present invention is to promote wound healing, reduce pain and reduce inflammation.

The device also has the effects of sterilization, virus killing and disinfection, and can be used for surface cleaning and disinfection or environmental sanitation.

In one embodiment, the plasma generated by the disclosed apparatus is from air, a non-corrosive gas, or a combination thereof, to meet the above mentioned therapeutic and other needs. In a preferred embodiment, the plasma generated by the apparatus of the present invention is derived from air, an inert gas or a combination of both.

In one embodiment, the device of the present application may be used on an animal or human.

In one embodiment, the device of the present application can be directed to internal or external injuries.

Please refer to fig. 1. The apparatus of the present application includes a control device 10 and a plasma generator 30. The control device 10 is connected to the plasma generator via a connector 20. The control element 10 is used to control the input of gas and to control the gas flow and the power.

The control element 10 comprises: a first gas module 11, a second gas module 12, a total gas flow sensor 13, and a high voltage generator 14.

In a specific embodiment, the control device 10 further comprises: a Human Machine Interface (HMI)15, a buzzer 16, an AC/DC converter 17, and a Programmable Logic Controller (PLC) 18.

Referring to fig. 2, the first gas module 11 includes: a first gas inlet 111 and a first gas controller 112; the second gas module 12 includes: a second air inlet 121 and a second air controller 122. The gas modules 11,12 feed gas into the apparatus of the present application and transport the gas to the plasma generator 30.

The intake ports 111,121 are connected to different external cylinders (not shown). In one implementation, the air inlets 111,121 are operated individually by the controllers 112, 122. In another specific embodiment, one of the two gas inlets 111,121 can be selectively opened for a set time to input gas, or the two gas inlets 111,121 can be simultaneously opened to input two different gases, thereby inputting mixed gas.

The gas provided by the first gas inlet 111 is different from the gas provided by the second gas inlet 121. For example, the first air inlet 111 inputs air, and the first air inlet 111 inputs another corrosive gas. The gas provided by the gas inlets 111,121 may be a single substance or a mixture of gases.

The controllers 112,122 are configured to control the flow rate of the incoming gas and gases. The total gas flow sensor 13 is provided for detecting the flow rate of the gas input.

The control unit 10 is connected to a power source to provide power to the device of the present application.

A Programmable Logic Controller (PLC)18 is provided on the control device 10 for controlling the performance and performance of the components of the apparatus of the present application. The components controlled by the PLC 18 include, but are not limited to, at least one of the following: a timer (not shown), gas controllers 112,122, a total gas flow sensor 13, a high voltage generator 14, a buzzer 16, and a main power switch. In a particular embodiment, the PLC 18 is controlled by the switch and also controls the plasma generator 30 to start or stop plasma treatment.

The gas inlets 111,121 may be connected to different sources of gas to provide different properties of the plasma generated by the apparatus of the present application. In a preferred embodiment, the gas provided by the first gas inlet 111 is different from the gas provided by the second gas inlet 121. The gas supplied to the gas inlets 111,121 is controlled and sensed by the gas controllers 112, 122.

In a particular embodiment, the gases provided through the gas inlets 111,121 are combined in a single channel that provides gas to the plasma generator 30, and the total gas flow sensor 13 can detect the combined gas flow.

In one particular embodiment of generating a plasma using different gases, as shown in FIG. 1, the apparatus of the present application comprises: a first gas module 11 and a second gas module 12. However, in an alternative embodiment (not shown) where a single gas is used to generate the plasma, the apparatus of the present application includes only one gas module.

Please refer to fig. 3. The plasma generator 30 preferably has the appearance of a circular tube through which the input gas and the generated plasma flow. The plasma generator 30 includes a plasma tube 31, the plasma tube 31 having a first end 311 and a second end 312. The first end 311 of the plasma tube 31 is connected to the control unit 10. A top cover 3111 is disposed on the first end 311, and is a head through which the high voltage current supply cable and the external air provided by the control device 10 flow. The top cover 3111 may be screwed to the plasma tube 31. A bottom cover 3121 is disposed on the second end 312. Locking means are provided on the surface of the bottom cover 3121 for locking disposable spacers and/or other fittings of different sizes and configured to be secured to the bottom cover 3121 and for protection, adjustment of the treatment area, and sterilization purposes. The bottom cover 3121 may be screwed to the plasma tube 31.

The bottom cover 3121 is provided with a nozzle 3122. The nozzle 3122 a protruding portion of the bottom cover 3121, and the nozzle 3122 has a diameter of 1 centimeter (mm) to 15 mm. In a preferred embodiment, the nozzle 3122 has a diameter of 1 centimeter (mm) to 10 mm. The surface of the nozzle 3122 is provided with locking means for locking disposable spacers and/or other fittings of different sizes and is configured to be secured to the bottom cover 3121 and for protection, adjustment of the treatment area, and sterilization purposes.

Please refer to fig. 4. FIG. 4 shows a partial cross-sectional view of the plasma generator 30 of the present application along the line of FIG. 3A-A'.

The plasma tube 31 has an inner surface. A first dielectric layer 32 is disposed on the inner surface of the plasma tube 31. A first electrode 33 is disposed on the first dielectric layer 32. A second dielectric layer 34 is disposed on the first electrode 33. A second electrode 35 is disposed on the second dielectric layer 34. As shown in fig. 4, the dielectric layers 32,34 directly contact the electrodes 33,35, but the application is not limited thereto, and the application may be an alternative embodiment in which the dielectric layers 32,34 do not directly contact the electrodes 33,35, as shown in fig. 3.

It should be noted that although fig. 4 discloses the second dielectric layer 34 disposed on the first electrode 33, in another alternative embodiment, as shown in fig. 3, the second dielectric layer 34 partially overlaps the first electrode 33 and partially faces the first dielectric layer 32. Thus, in another embodiment of the present application, the dielectric layers 32,34 and the electrodes 33,35 partially overlap. In a specific embodiment, the first electrode 33 is a cathode and the second electrode 35 is an anode.

Fig. 5 discloses a top view of the second electrode 35 (other elements are omitted). The second electrode 35 is disposed in the plasma generator 30 and has a rotationally symmetric appearance.

In one embodiment, the second electrode 35 has a ring-shaped appearance, including a plurality of hollow cylinders therein, as shown in fig. 5 (a). In an alternative embodiment, the second electrode 35 has a ring-shaped appearance, including a plurality of blade-shaped hollow cylinders therein, as shown in fig. 5 (B).

However, the number of the hollow cylinders or the vane-shaped cylinders of the second electrode 35 is not limited to that disclosed in the drawings, and may be 1 or any suitable number.

The device of the present application is tested by a moist solid medium on agar medium and the medium is inoculated with microorganisms.

The experiment was performed using the device of the present application on an inoculation incubation plate with time-dependent and localized spot-shaped plasma treatment, performed at a point facing the target microorganism without moving the nozzle of the device.

The test method comprises the following steps:

1. selecting single microorganism growth colonies from a TSB culture plate, subculturing the colonies in a 5ml test tube containing a TSB culture medium, inoculating the microorganisms on a shaking culture table, and culturing at 30 ℃ for 14-24 hours;

2. 100 μ l of the culture medium was diluted 10 times and OD was detected using a spectrometer₆₀₀Absorbance (1OD ═ 1x 10)⁹ cfu/ml)；

3. Serial dilution with water to 10 microbial dilutions⁵Multiple (about 8.67x 10)⁵cfu/ml)；

4. Taking 500 mu l of diluted microbial culture solution, and culturing the microbial culture solution in a TSB culture medium;

5. treating the microorganisms on the culture medium with a plasma generated by the apparatus of the present application, the nozzle opening being 5mm from the culture medium; and

6. the microorganisms were cultured at 30 ℃ for 1 to 2 days, and the growth inhibition zone was observed.

The growth inhibition zone of the microorganism was defined as a circular area with no visible growth of E.coli.

The experiments were performed according to the following different designs, in which air and argon were used to generate the plasma:

the plasma treatment varies depending on the experimental method of treatment, such as the kind of gas, the treatment time, and the distance between the nozzle opening and the culture plate.

The microorganisms on the growth plates were treated with air and argon at different ratios and the results are shown in FIG. 6.

As shown in FIG. 6, treatments using groups of 100% argon, 100% air, and 75% argon and 25% air each resulted in a growth inhibition zone of 11mm in diameter.

In the disclosure of the embodiments of the present application, it is obvious to those skilled in the art that the foregoing embodiments are only exemplary and may be combined; those skilled in the art to which the present application pertains may effect numerous variations, substitutions, and alterations without departing from the spirit and scope of the present application. Many variations of the present application are possible in light of the above teachings. The present specification defines the scope of the present application to cover the methods and structures described above and equivalents thereof.