阅读说明：本技术 一种可钢化的近红外线反射型低辐射玻璃 (Temperable near-infrared reflection type low-emissivity glass ) 是由 武爱平 于 2020-12-23 设计创作，主要内容包括：本发明提供一种可钢化的近红外线反射型低辐射玻璃,具体涉及汽车与建筑镀膜玻璃生产领域,包括本体着色的浮法玻璃基板、在浮法玻璃基板上设有致密二氧化硅阻隔层、功能层、致密二氧化硅保护层,所述功能层为可实现近红外线反射的低辐射涂层。本发明克服在线低辐射的缺陷,将在线低辐射玻璃的近红外线的反射率提高一倍以上,有助于低辐射玻璃进入汽车节能玻璃市场。(The invention provides a temperable near infrared reflection type low-emissivity glass, and particularly relates to the field of production of coated glass for automobiles and buildings. The invention overcomes the defect of on-line low radiation, improves the reflectivity of near infrared rays of on-line low radiation glass by more than one time, and is beneficial to the low radiation glass to enter the automobile energy-saving glass market.)

1. A near infrared reflection type low emissivity glass capable of being tempered is characterized in that: the coating comprises a float glass substrate with a colored body, a dense silicon dioxide barrier layer, a functional layer and a dense silicon dioxide protective layer, wherein the dense silicon dioxide barrier layer, the functional layer and the dense silicon dioxide protective layer are arranged on the float glass substrate, and the functional layer is a low-radiation coating capable of realizing near infrared reflection.

2. The near infrared ray reflection type low emissivity glass as claimed in claim 1, wherein: the bulk-colored float glass substrate is prepared by adding a colorant with heat absorption performance into raw materials, and the visible light transmittance of the float glass substrate is 40-80%.

3. The near infrared ray reflection type low emissivity glass as claimed in claim 2, wherein: the dense silicon dioxide barrier layer and the dense silicon dioxide protective layer are both obtained by adopting the same chemical vapor deposition process CVD, and the thickness of the dense silicon dioxide barrier layer is 600 nm-800 nm; the thickness of the dense silicon dioxide protective layer is 300 nm-500 nm.

4. The near infrared ray reflection type low emissivity glass as claimed in claim 3, wherein: the functional layer is made of a precursor liquid with infrared reflection and low radiation functions, can reflect infrared with the wavelength of more than 800nm, and has the near infrared reflectivity of more than 30%.

5. The near infrared ray reflection type low emissivity glass as claimed in claim 4, wherein: the functional layer is obtained by spraying the precursor liquid on the barrier layer through an ultrasonic spraying machine, and the frequency range of the ultrasonic spraying machine is 60 KHz-130 KHz.

6. The near infrared ray reflection type low emissivity glass as claimed in claim 5, wherein: the functional layer is subjected to high-temperature reduction to enable precursors forming the functional layer to react, crack and change phase, and the method comprises the following steps: mixing 10% of hydrogen and 90% of argon, injecting the mixture into a high-temperature furnace, pushing the toughened near-infrared reflection type low-emissivity glass into the high-temperature furnace, gradually heating to 500-550 ℃, keeping the temperature for 10-20 minutes, then slowly cooling, and cooling to 60 ℃ after 10-30 minutes.

7. The near infrared ray reflection type low emissivity glass as claimed in claim 6, wherein: when the glass is subjected to hot bending or toughening, 10% of hydrogen and 90% of argon are mixed and then injected into a hot bending furnace or a toughening furnace, and the hot bending or toughening of the glass is completed under the protection of mixed atmosphere.

Technical Field

The invention belongs to the field of production of coated glass for automobiles and buildings, and particularly relates to near infrared reflection type low-emissivity glass capable of being tempered.

Background

In recent years, automobiles have increasingly demanded functional glass, including energy-saving glass, heat-insulating glass, color-changing glass, radiation-proof glass and the like. Two major types of functional glass are bulk-colored float glass and coated glass, and coated glass realizes the specific functions of the float glass by coating on the surface of the float glass, such as low-emissivity and solar control glass, and the coated glass plays an increasingly important role due to superior energy-saving performance. Especially, low-emissivity glass is the first choice for building energy-saving glass, and on-line low-emissivity glass also begins to permeate into automobile glass. However, the online low-emissivity glass has low reflectivity and absorptivity to ultraviolet rays and near infrared rays in sunlight, and has small contribution to heat insulation and energy conservation of automobile glass, so that the online low-emissivity glass is limited in practical use. Chinese patent CN 103864313a discloses a heat-insulating glass with an infrared reflective multilayer structure and a manufacturing method thereof, which comprises a multilayer structure, a silica barrier layer, a protective layer and a composite tungsten oxide heat-insulating layer, so that the glass has a good heat-insulating function. However, the wet coating barrier layer adopted in the patent cannot solve the problem of failure of the heat insulation function when toughening treatment is carried out at a high temperature of more than 700 ℃ due to poor compactness;

the invention aims to overcome the defect of on-line low radiation, improves the reflectivity of near infrared rays of on-line low radiation glass by more than one time, and is beneficial to the low radiation glass to enter the automobile energy-saving glass market.

Disclosure of Invention

The invention aims to provide toughened near-infrared reflection type low-emissivity glass, which applies a heat-insulation precursor with near-infrared reflection and low-emissivity functions to a toughened glass coating.

The invention provides the following technical scheme:

the temperable near infrared ray reflection type low-radiation glass comprises a float glass substrate colored in a body, wherein a dense silicon dioxide barrier layer, a functional layer and a dense silicon dioxide protective layer are arranged on the float glass substrate, and the functional layer is a low-radiation coating capable of realizing near infrared ray reflection.

Further, the bulk-colored float glass substrate is a commercially available colored glass produced by adding a colorant having heat absorbing property to a raw material, and the float glass substrate has a visible light transmittance of 40% to 80%.

Furthermore, the dense silicon dioxide barrier layer and the dense silicon dioxide protective layer are both obtained by adopting the same chemical vapor deposition process CVD, and the thickness of the dense silicon dioxide barrier layer is 600 nm-800 nm; the thickness of the dense silicon dioxide protective layer is 300 nm-500 nm.

Furthermore, the functional layer is made of a commercially available precursor liquid with infrared reflection and low radiation functions, can reflect infrared rays with the wavelength of more than 800nm, and has the near infrared reflectivity of more than 30%.

Further, the functional layer is obtained by spraying the precursor liquid on the barrier layer through an ultrasonic sprayer, and the frequency range of the ultrasonic sprayer is 60 KHz-130 KHz.

Further, the functional layer needs to be reduced at high temperature to enable precursors forming the functional layer to react, crack and change phase, which specifically comprises the following steps: mixing 10% of hydrogen and 90% of argon, injecting the mixture into a high-temperature furnace, pushing the toughened near-infrared reflection type low-emissivity glass into the high-temperature furnace, gradually heating to 500-550 ℃, keeping the temperature for 10-20 minutes, then slowly cooling, and cooling to 60 ℃ after 10-30 minutes.

Preferably, when the glass is subjected to hot bending or tempering, 10% of hydrogen and 90% of argon are mixed and then injected into a hot bending furnace or a tempering furnace, and the hot bending or tempering of the glass is completed under the protection of mixed atmosphere.

The invention has the beneficial effects that:

the method aims at avoiding structural function failure by high-temperature processing, and a dense barrier layer is chemically deposited (CVD) on a glass substrate so as to improve the stability of a glass interface and avoid the high-temperature sodium permeation effect from damaging the lattice structure arrangement in a functional layer to cause the functional layer to fail. The functional layer is a low-radiation coating with a high near infrared ray reflection function. And depositing a compact protective layer by adopting a CVD method after the functional layer to prevent the functional layer from being oxidized during high-temperature processing. The multilayer structure performance can be optimized by adjusting the density and thickness of the barrier layer, the functional layer and the protective layer.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and together with the description serve to explain the principles of the invention and not to limit the invention. In the drawings:

FIG. 1 is a block diagram of the present invention.

Detailed Description

As shown in fig. 1, a Chemical Vapor Deposition (CVD) process is used to replace wet coating, and a thick and dense silicon dioxide barrier layer with a thickness of more than 600nm and a protective layer with a thickness of more than 300nm are deposited on a glass substrate, so that sodium permeation and oxidation during high-temperature glass tempering treatment at a temperature of more than 700 ℃ can be well blocked, and functional layer failure or performance degradation caused by the sodium permeation and oxidation can be avoided. The temperable near infrared ray reflection type low-emissivity glass needs to be added with a reducing protective atmosphere of 10% hydrogen and 90% argon during high-temperature sintering. The temperable near-infrared reflection type low-emissivity glass needs to be subjected to high-temperature reduction treatment, wherein the reduction temperature is 500-550 ℃, and the retention time is 10-20 minutes. The production process of the tempered heat-reflecting glass is characterized in that the temperature of the glass needs to be slowly reduced to 60 ℃ after the glass is sintered at a high temperature, and the temperature needs to be reduced to 60 ℃ after 10-30 minutes, so that the tempering effect caused by the stress increase on the surface of the glass due to the too fast temperature reduction of the glass is avoided, and the subsequent cutting and other processing are influenced. The glass substrate is made of body-colored float glass, can absorb a large amount of solar infrared heat radiation, weaken the irradiation intensity of sunlight, and can further increase the blocking of the glass to sunlight near infrared rays by matching with the infrared reflection and low radiation functions of the functional layer.

Practical implementation and production cases:

depositing a compact silicon dioxide barrier layer with the thickness of 700nm on the glass substrate with the number of #1 by adopting a Chemical Vapor Deposition (CVD) process; and spraying transparent heat-insulating precursor liquid with infrared reflection and low radiation functions on the barrier layer by adopting an ultrasonic spraying machine with the frequency of 100KHz, adjusting the spraying thickness according to the requirement of 30 percent of the total reflectivity of near infrared rays before tempering, leveling after 6 minutes after spraying, and drying in a 200 ℃ oven to form the functional layer. After the functional layer is processed, a compact silicon dioxide protective layer with the thickness of 500nm is deposited on the functional layer by adopting a chemical vapor deposition process.

After the three-layer structure is processed, the glass is sent into a 500 ℃ oven for sintering, the oven needs to be firstly filled with a protective atmosphere of 10% hydrogen and 90% argon, and the sintering time is kept for 15 minutes. After the glass is sintered, the temperature is slowly reduced, and the temperature is reduced to the room temperature after 30 minutes.

Example 2, all conditions, materials and processes were the same as in example 1, only the thickness of the silica barrier layer was reduced from 700nm to 500nm to compare haze and near infrared reflectance.

After the three-layer structure is processed, the glass is sent into a toughening furnace for toughening, and the toughening furnace needs to be filled with a protective atmosphere of 10% hydrogen and 90% argon.

Comparison of results	#1	#2
			Haze degree	06％	1.5％
Reflectivity of near infrared ray	35％	16％

According to the results of the above examples, #1 performed well, while #2 after tempering had an increased haze and a decreased near infrared reflectance by more than half, which means that when the thickness of the blocking layer was less than 500nm, the sodium penetration could not be effectively blocked to destroy the lattice structure in the functional layer, resulting in a decreased performance of the functional layer.

Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that various changes, modifications and substitutions can be made without departing from the spirit and scope of the invention as defined by the appended claims. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.