阅读说明：本技术 晶圆浸泡槽 (Wafer soaking tank ) 是由 王静强 徐福兴 黄锡钦 于 2019-04-26 设计创作，主要内容包括：为了解决现有技术中晶圆浸泡时间长的技术问题,本发明提供了晶圆浸泡槽,槽体内设置有用于吊装晶舟或者提篮的拉杆组件；拉杆组件包括夹持件、连接件、外管件和内拉杆件,外管件套装在内拉杆件的外部,夹持件与外管件固连,连接件与内拉杆件铰接,夹持件和连接件均与晶舟或者提篮铰接；槽体外部设置有第一伺服滚珠丝杆副组件和第二伺服滚珠丝杆副组件,第一伺服滚珠丝杆副组件带动晶圆离开或者没入化学品中,第一伺服滚珠丝杆副组件通过提高或者降低内拉杆件的高度从而调整晶圆的倾斜的角度,第一伺服滚珠丝杆副组件不停反复运动实现了晶圆在浸泡槽内的反复晃动,被搅动的化学品不停冲击晶圆表面,加速了晶圆表面杂质的剥离速度。(In order to solve the technical problem of long wafer soaking time in the prior art, the invention provides a wafer soaking groove, wherein a pull rod assembly for hoisting a wafer boat or a lifting basket is arranged in a groove body; the pull rod assembly comprises a clamping piece, a connecting piece, an outer pipe piece and an inner pull rod piece, the outer pipe piece is sleeved outside the inner pull rod piece, the clamping piece is fixedly connected with the outer pipe piece, the connecting piece is hinged with the inner pull rod piece, and the clamping piece and the connecting piece are both hinged with the crystal boat or the lifting basket; the cell body outside is provided with first servo ball screw sub-assembly and the servo ball screw sub-assembly of second, first servo ball screw sub-assembly drives the wafer and leaves or submerge in the chemical, thereby the angle of the slope of the height adjustment wafer of first servo ball screw sub-assembly through improving or reducing the interior pull rod spare, the incessantly repetitive motion of first servo ball screw sub-assembly has realized that the wafer rocks repeatedly in soaking the inslot, the chemical that is stirred incessantly strikes the wafer surface, the speed of peeling off of wafer surface impurity has been accelerated.)

1. The wafer soaking tank is characterized in that a pull rod assembly for hoisting a wafer boat or a lifting basket is arranged in the tank body, and a driving mechanism for driving the pull rod assembly to ascend and descend is arranged outside the tank body;

the pull rod assembly comprises a clamping piece, a connecting piece, an outer pipe piece and an inner pull rod piece, the outer pipe piece is sleeved outside the inner pull rod piece, the clamping piece is fixedly connected with the outer pipe piece, the connecting piece is hinged with the inner pull rod piece, and the clamping piece and the connecting piece are both hinged with the crystal boat or the lifting basket;

the driving mechanism comprises a first servo ball screw pair assembly and a second servo ball screw pair assembly, screws in the two servo ball screw pair assemblies are vertically placed, the first servo ball screw pair assembly drives the outer pipe piece to lift, and the second servo ball screw pair assembly drives the inner pull rod piece to lift; and a base is arranged on the shaft sleeve of the first servo ball screw pair assembly, and the second servo ball screw pair assembly is fixed on the base.

2. The wafer immersion tank of claim 1, wherein the holder has two symmetrical connections hinged to the boat or basket.

3. The wafer soaking tank according to claim 1, wherein two bearing seats are fixed on the base, the two bearing seats are arranged up and down, a screw sleeve with an opening on the side surface is arranged between the two bearing seats, the screw rod in the second servo ball screw pair assembly is arranged in the screw sleeve, the ball sleeve is arranged outside the screw sleeve, and a bump which is meshed with the screw rod is arranged on the inner wall of the ball sleeve.

4. The wafer immersion tank of claim 1, wherein the drive mechanism includes a position sensor that monitors a height of a position of the second servo ball screw assembly and a position sensor that monitors a height of the inner tie member.

5. The wafer soaking tank according to claim 1, wherein a sealing cover is arranged at the top of the tank body; the top of the sealing cover is provided with a round hole, a sealing end cover inserted in the round hole is fixedly arranged on the sealing cover, and the outer pipe passes through the sealing end cover.

6. The wafer immersion tank as claimed in claim 5, wherein the side of the sealing cover is provided with a pneumatic sealing door which is opened up and down.

7. The wafer soaking tank according to claim 1, wherein an overflow tank is arranged beside the tank body, and a slot hole communicated with the overflow tank is arranged on the side wall of the tank body; and a liquid level sensor and a liquid discharge valve are arranged in the overflow groove.

Technical Field

The invention relates to the technical field of wafer cleaning equipment, in particular to a wafer soaking tank.

Background

The processing of semiconductor products mainly includes wafer fabrication (front end) and packaging (back end) tests, and with the penetration of advanced packaging technologies, a processing link between wafer fabrication and packaging, called middle end, appears. The most complicated of these three process steps is wafer fabrication and packaging.

The wafer production line can be divided into 7 independent production areas: diffusion, photoetching, etching, ion implantation, film growth, polishing and metallization. A plurality of wafer cleaning devices are arranged in the production areas to meet the cleaning requirements in different processes. In some process procedures, due to special process requirements, the wafer needs to be soaked in chemicals for a period of time and then taken out for the next process. At present, the soaking time of the wafer in the soaking tank is about 30 minutes, and if the soaking time of the wafer can be shortened, the cleaning efficiency of the wafer can be greatly improved.

Disclosure of Invention

The technical problem to be solved by the invention is as follows: how to shorten the soaking time of the wafer.

In order to solve the technical problems, the technical scheme of the invention is as follows:

the wafer soaking tank comprises a tank body for containing chemicals, and a heating device is arranged at the bottom of the tank body; a pull rod assembly for hoisting the crystal boat or the lifting basket is arranged in the groove body, and a driving mechanism for driving the pull rod assembly to ascend and descend is arranged outside the groove body;

the pull rod assembly comprises a clamping piece, a connecting piece, an outer pipe piece and an inner pull rod piece, the outer pipe piece is sleeved outside the inner pull rod piece, the clamping piece is fixedly connected with the outer pipe piece, the connecting piece is hinged with the inner pull rod piece, and the clamping piece and the connecting piece are both hinged with the crystal boat or the lifting basket;

The driving mechanism comprises a first servo ball screw pair assembly and a second servo ball screw pair assembly, screws in the two servo ball screw pair assemblies are vertically placed, the first servo ball screw pair assembly drives the outer pipe piece to lift, and the second servo ball screw pair assembly drives the inner pull rod piece to lift; and a base is arranged on the shaft sleeve of the first servo ball screw pair assembly, and the second servo ball screw pair assembly is fixed on the base.

In one embodiment, the clamping piece is provided with two symmetrical connecting parts hinged with the crystal boat or the lifting basket.

In one embodiment, two bearing seats are fixedly arranged on the base, a screw sleeve with an opening on the side face is installed between the two bearing seats, a screw rod in the second servo ball screw pair assembly is installed in the screw sleeve, a ball shaft sleeve is installed outside the screw sleeve, and a convex block meshed with the screw rod is arranged on the inner wall of the ball shaft sleeve.

In one embodiment, the drive mechanism includes a position sensor that monitors a height of the second servo ball screw assembly position, and a position sensor that monitors a height of the inner linkage.

In one embodiment, a sealing cover is arranged at the top of the groove body; the top of the sealing cover is provided with a round hole, a sealing end cover inserted in the round hole is fixedly arranged on the sealing cover, and the outer pipe passes through the sealing end cover.

Further, a pneumatic sealing door which can be opened up and down is arranged on the side surface of the sealing cover.

In one embodiment, an overflow groove is arranged beside the groove body, and a groove hole communicated with the overflow groove is arranged on the side wall of the groove body; and a liquid level sensor and a liquid discharge valve are arranged in the overflow groove.

Compared with the prior art, the invention has the beneficial effects that:

1. the first servo ball screw pair assembly drives the wafer to leave or sink into the chemicals, the first servo ball screw pair assembly adjusts the inclined angle of the wafer by increasing or reducing the height of the inner pull rod piece, the first servo ball screw pair assembly continuously and repeatedly moves to realize the repeated shaking of the wafer in the soaking tank, the stirred chemicals continuously impact the surface of the wafer, the stripping speed of impurities on the surface of the wafer is accelerated, and the soaking time of the wafer is shortened;

2. according to the invention, the screw sleeve is additionally arranged in the second servo ball screw pair assembly, so that when the screw rotates in the screw, the ball shaft sleeve moves up and down without generating clearance displacement, high-precision movement of the inner pull rod piece is realized, the wafers can be ensured not to shake in the process of repeatedly changing the inclination angle, and the wafers cannot slide out of the wafer boat or the basket to cause damage;

3. The overflow groove is added to receive chemicals overflowing due to shaking, and the chemicals in the overflow groove can be detected to judge whether the purity of the chemicals in the soaking groove meets the continuous use standard.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments will be briefly introduced below.

FIG. 1 is a block diagram of a wafer immersion tank disclosed in the embodiments;

FIG. 2 is a block diagram of the wafer immersion tank (with the seal cover removed) disclosed in the examples;

FIG. 3 is a block diagram of the wafer immersion tank (with the seal cover removed) disclosed in the examples.

Detailed Description

The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.