阅读说明：本技术 开盖机构及半导体加工设备 (Uncapping mechanism and semiconductor processing equipment ) 是由 冯思达 于 2019-04-26 设计创作，主要内容包括：本发明提供一种开盖机构及半导体加工设备,该开盖机构包括：导向件,竖直设置在上电极机构的一侧,且与腔室固定连接；第一定位结构,用于限制所述导向件与所述腔室的相对位置和旋转自由度；滑动件,与所述导向件滑动配合,且与所述上电极机构固定连接；第二定位结构,用于限制所述滑动件与所述上电极机构的相对位置和旋转自由度；驱动装置,用于驱动所述上电极机构和/或所述滑动件相对于所述腔室作升降运动。(The invention provides a cover opening mechanism and semiconductor processing equipment, wherein the cover opening mechanism comprises: the guide piece is vertically arranged on one side of the upper electrode mechanism and is fixedly connected with the cavity; a first positioning structure for limiting the relative position and rotational freedom of the guide and the chamber; the sliding part is in sliding fit with the guide part and is fixedly connected with the upper electrode mechanism; a second positioning structure for limiting the relative position and rotational degree of freedom of the slide member and the upper electrode mechanism; and the driving device is used for driving the upper electrode mechanism and/or the sliding piece to do lifting motion relative to the chamber.)

1. A lid opening mechanism, comprising:

The guide piece is vertically arranged on one side of the upper electrode mechanism and is fixedly connected with the cavity;

a first positioning structure for limiting the relative position and rotational freedom of the guide and the chamber;

the sliding part is in sliding fit with the guide part and is fixedly connected with the upper electrode mechanism;

a second positioning structure for limiting the relative position and rotational degree of freedom of the slide member and the upper electrode mechanism;

and the driving device is used for driving the upper electrode mechanism and/or the sliding piece to do lifting motion relative to the chamber.

2. The door release mechanism according to claim 1, wherein the guide member includes an optical axis; the sliding part is provided with a through hole, the sliding part is sleeved on the optical axis through the through hole, and the through hole is in sliding fit with the optical axis.

3. The door release mechanism according to claim 1 or 2, wherein the first positioning structure comprises: a first positioning hole and a first positioning pin;

a first matching part is arranged on the guide piece, the first matching part is positioned in the first positioning hole, and the peripheral wall of the first matching part is matched with the hole wall of the first positioning hole;

And a second positioning hole and a third positioning hole are correspondingly and respectively arranged on the hole wall of the first positioning hole and the peripheral wall of the first matching part, and the first positioning pin is arranged in the second positioning hole and the third positioning hole in a penetrating manner and used for limiting the rotation freedom degree of the guide piece in the horizontal plane.

4. The cap opening mechanism according to claim 3, wherein the first positioning hole comprises a first sub-hole and a second sub-hole which are coaxially arranged from top to bottom, and the diameter of the first sub-hole is larger than that of the second sub-hole;

the first matching part comprises a first sub-part and a second sub-part which are arranged from top to bottom in sequence and are coaxial, and the outer diameter of the first sub-part is larger than that of the second sub-part; wherein the first sub-part is positioned in the first sub-hole, the lower end surface of the first sub-part is matched with the upper end surface of the second sub-hole, and the outer diameter of the first sub-part is smaller than the diameter of the first sub-hole; the second sub-portion is located in the second sub-hole, and the peripheral wall of the second sub-portion is matched with the hole wall of the second sub-hole.

5. The door opening mechanism according to claim 1 or 2, wherein the second positioning structure comprises a positioning through hole provided on a bottom plate of the upper electrode mechanism and penetrating the bottom plate in a vertical direction; the outer peripheral wall of the sliding piece is matched with the hole wall of the positioning through hole;

The orthographic projection shape of the peripheral wall of the sliding piece and the hole wall of the positioning through hole on the horizontal plane is non-circular so as to limit the rotation freedom degree of the sliding piece in the horizontal plane.

6. The door release mechanism according to claim 1 or 2, wherein the second positioning structure comprises:

the positioning through hole is arranged on the bottom plate of the upper electrode mechanism and penetrates through the bottom plate along the vertical direction, and the peripheral wall of the sliding piece is matched with the hole wall of the positioning through hole;

and the rotary positioning structure is used for limiting the rotary freedom degree of the sliding piece in the horizontal plane.

7. The door opening mechanism according to claim 6, wherein the rotary positioning structure comprises a concave portion and a convex portion respectively provided on the outer peripheral wall of the slider and the hole wall of the positioning through hole, the concave portion and the convex portion being engaged; alternatively, the first and second electrodes may be,

the rotary positioning structure comprises a fourth positioning hole and a fifth positioning hole which are correspondingly and respectively arranged on the peripheral wall of the sliding part and the hole wall of the positioning through hole, and a second positioning pin which is arranged in the fourth positioning hole and the fifth positioning hole in a penetrating mode.

8. The door release mechanism according to claim 1, further comprising an upper electrode positioning structure for limiting a relative position and a rotational degree of freedom of the upper electrode mechanism and the chamber.

9. The door opening mechanism according to claim 8, wherein the upper electrode positioning structure comprises a positioning convex part and a positioning concave part which are respectively arranged at the bottom of the upper electrode mechanism and the top of the chamber and are positioned at the edge of the chamber, and the positioning convex part and the positioning concave part are mutually matched when the upper electrode mechanism is positioned at the cover closing position.

10. The lid opening mechanism according to claim 8, wherein the upper electrode positioning structure comprises a positioning chute and a positioning pulley which are respectively arranged at the bottom of the upper electrode mechanism and the top of the chamber and are located at the edge of the chamber, and the positioning chute and the positioning pulley are mutually matched when the upper electrode mechanism is located at the lid closing position.

11. The door release mechanism according to claim 1, wherein the driving means comprises a linear electric cylinder, a linear air cylinder, or a linear hydraulic cylinder.

12. A semiconductor processing apparatus comprising a reaction chamber, an upper electrode mechanism and a lid opening mechanism, wherein the lid opening mechanism is configured to drive the upper electrode mechanism to perform an elevating movement with respect to the reaction chamber, and is characterized in that the lid opening mechanism is the lid opening mechanism according to any one of claims 1 to 11.

Technical Field

The invention relates to the field of semiconductor manufacturing, in particular to a cover opening mechanism and semiconductor processing equipment.

Background

An Inductively Coupled Plasma (ICP) etching apparatus generally includes functional modules such as a reaction chamber 1, an upper electrode mechanism 2, and a lid opening mechanism 3, as shown in fig. 1. Wherein, the reaction chamber 1 is used for providing a vacuum environment and radio frequency power; the upper electrode mechanism 2 is used for providing process gas and upper radio frequency power; the cover opening mechanism 3 is used for driving the upper electrode mechanism 2 to move up and down relative to the reaction chamber 1 so as to provide a convenient window for maintenance inside the reaction chamber 1.

The existing uncovering mechanism mainly comprises main functional modules such as a linear module, a linear module bracket and a driving source. However, the existing cap opening mechanism has the following problems in practical application:

firstly, the linear module is in threaded connection with the linear module support through the oblong holes and the screws arranged on the linear module, and the positioning accuracy of the connection mode is poor, so that the positioning accuracy of the upper electrode mechanism is influenced.

Secondly, the linear module bracket and the reaction chamber as well as the adapter of the linear module and the upper electrode mechanism are fixedly connected in a threaded connection mode, so that the positioning accuracy is poor, the limitation of the degree of freedom is incomplete, and the positioning accuracy of the upper electrode mechanism can be affected.

Disclosure of Invention

The invention aims to at least solve one technical problem in the prior art, and provides a cover opening mechanism and semiconductor processing equipment, which can improve the positioning precision of an upper electrode mechanism.

To achieve the object of the present invention, there is provided a door opening mechanism including:

the guide piece is vertically arranged on one side of the upper electrode mechanism and is fixedly connected with the cavity;

a first positioning structure for limiting the relative position and rotational freedom of the guide and the chamber;

The sliding part is in sliding fit with the guide part and is fixedly connected with the upper electrode mechanism;

a second positioning structure for limiting the relative position and rotational degree of freedom of the slide member and the upper electrode mechanism;

and the driving device is used for driving the upper electrode mechanism and/or the sliding piece to do lifting motion relative to the chamber.

Optionally, the guide comprises an optical axis; the sliding part is provided with a through hole, the sliding part is sleeved on the optical axis through the through hole, and the through hole is in sliding fit with the optical axis.

Optionally, the first positioning structure includes: a first positioning hole and a first positioning pin;

a first matching part is arranged on the guide piece, the first matching part is positioned in the first positioning hole, and the peripheral wall of the first matching part is matched with the hole wall of the first positioning hole;

and a second positioning hole and a third positioning hole are correspondingly and respectively arranged on the hole wall of the first positioning hole and the peripheral wall of the first matching part, and the first positioning pin is arranged in the second positioning hole and the third positioning hole in a penetrating manner and used for limiting the rotation freedom degree of the guide piece in the horizontal plane.

Optionally, the first positioning hole includes a first sub-hole and a second sub-hole which are arranged from top to bottom and are coaxial, and a diameter of the first sub-hole is larger than a diameter of the second sub-hole;

the first matching part comprises a first sub-part and a second sub-part which are arranged from top to bottom in sequence and are coaxial, and the outer diameter of the first sub-part is larger than that of the second sub-part; wherein the first sub-part is positioned in the first sub-hole, the lower end surface of the first sub-part is matched with the upper end surface of the second sub-hole, and the outer diameter of the first sub-part is smaller than the diameter of the first sub-hole; the second sub-portion is located in the second sub-hole, and the peripheral wall of the second sub-portion is matched with the hole wall of the second sub-hole.

Optionally, the second positioning structure includes a positioning through hole disposed on the bottom plate of the upper electrode mechanism and penetrating through the bottom plate in a vertical direction; the outer peripheral wall of the sliding piece is matched with the hole wall of the positioning through hole;

the orthographic projection shape of the peripheral wall of the sliding piece and the hole wall of the positioning through hole on the horizontal plane is non-circular so as to limit the rotation freedom degree of the sliding piece in the horizontal plane.

Optionally, the second positioning structure includes:

the positioning through hole is arranged on the bottom plate of the upper electrode mechanism and penetrates through the bottom plate along the vertical direction, and the peripheral wall of the sliding piece is matched with the hole wall of the positioning through hole;

and the rotary positioning structure is used for limiting the rotary freedom degree of the sliding piece in the horizontal plane.

Optionally, the rotary positioning structure includes a concave portion and a convex portion correspondingly and respectively disposed on the peripheral wall of the sliding member and the wall of the positioning through hole, and the concave portion and the convex portion are matched with each other; alternatively, the first and second electrodes may be,

the rotary positioning structure comprises a fourth positioning hole and a fifth positioning hole which are correspondingly and respectively arranged on the peripheral wall of the sliding part and the hole wall of the positioning through hole, and a second positioning pin which is arranged in the fourth positioning hole and the fifth positioning hole in a penetrating mode.

Optionally, the lid opening mechanism further includes an upper electrode positioning structure for limiting relative positions and rotational degrees of freedom of the upper electrode mechanism and the chamber.

Optionally, the upper electrode positioning structure includes a positioning convex portion and a positioning concave portion, which are correspondingly disposed at the bottom of the upper electrode mechanism and the top of the chamber, respectively, and located at the edge of the chamber, and the positioning convex portion and the positioning concave portion are mutually matched when the upper electrode mechanism is located at the cover closing position.

Optionally, the upper electrode positioning structure includes a positioning chute and a positioning pulley, which are correspondingly and respectively disposed at the bottom of the upper electrode mechanism and the top of the cavity, and are located at the edge of the cavity, and the positioning chute and the positioning pulley are mutually matched when the upper electrode mechanism is located at the cover closing position.

Optionally, the driving device comprises a linear electric cylinder, a linear air cylinder or a linear hydraulic cylinder.

As another technical scheme, the invention further provides semiconductor processing equipment which comprises a reaction chamber, an upper electrode mechanism and a cover opening mechanism, wherein the cover opening mechanism is used for driving the upper electrode mechanism to move up and down relative to the reaction chamber, and the cover opening mechanism adopts the cover opening mechanism provided by the invention.

The invention has the following beneficial effects:

according to the cover opening mechanism provided by the invention, the relative position and the rotational freedom degree of the guide piece and the cavity are limited by utilizing the first positioning structure, so that the position precision of the guide piece can be ensured, and the rotational freedom degree of the guide piece is limited, so that the guide piece can be prevented from rotating; meanwhile, the relative position and the rotational freedom degree of the sliding piece and the upper electrode mechanism are limited through the second positioning structure, the position precision of the sliding piece can be ensured, and the rotational freedom degree of the sliding piece is limited at the same time, so that the sliding piece can be prevented from rotating. Therefore, the cover opening mechanism provided by the invention can improve the positioning precision of the upper electrode mechanism.

According to the semiconductor processing equipment provided by the invention, the cover opening mechanism provided by the invention is adopted, so that the positioning precision of the upper electrode mechanism can be improved.

Drawings

FIG. 1 is a schematic diagram of a prior ICP etching apparatus;

fig. 2 is a structural view of a door opening mechanism provided in the embodiment of the present invention;

FIG. 3 is a cross-sectional view of a first positioning structure employed in an embodiment of the present invention;

FIG. 4 is a cross-sectional view of a second indexing arrangement used in accordance with an embodiment of the present invention;

FIG. 5 is another cross-sectional view of a second indexing feature used in accordance with an embodiment of the present invention;

FIG. 6 is a block diagram of an electrode positioning structure used in embodiments of the present invention;

fig. 7 is another structural view of an electrode positioning structure employed in the embodiment of the present invention.

Detailed Description

In order to make those skilled in the art better understand the technical solution of the present invention, the cover opening mechanism and the semiconductor processing apparatus provided by the present invention are described in detail below with reference to the accompanying drawings.

Referring to fig. 2 to 4, the cover opening mechanism according to the embodiment of the present invention is used for driving the upper electrode mechanism 5 to move up and down relative to the chamber 4, so as to provide a convenient window for maintenance inside the chamber 4. Specifically, the lid opening mechanism includes a guide 6, a first positioning structure 8, a slider 7, a second positioning structure (not shown in the figure), and a driving device 9.

Wherein, the guide piece 6 is vertically arranged at one side of the upper electrode mechanism 5 and is fixedly connected with the chamber 4. The first locating formation 8 serves to limit the relative position and rotational freedom of the guide 6 and the chamber 4. In the present embodiment, the guide member 6 is fixed to the bottom plate 41 of the chamber 4 by the first positioning structure 8, and the first positioning structure 8 defines the position of the guide member 6 on the bottom plate 41, and defines the rotational freedom of the guide member 6, so that the guide member 6 is kept upright without inclination, and the guide member 6 does not rotate, thereby ensuring the positional accuracy and the mounting accuracy of the guide member 6.

In the present embodiment, as shown in fig. 3, the first positioning structure 8 includes a first positioning hole 82 and a first positioning pin 83. Wherein, the first positioning hole 82 is arranged on the positioning body 81 fixedly connected with the chamber 4, and the guide 6 is provided with the first matching part 61, and the first matching part 61 is positioned in the first positioning hole 82.

Optionally, the first positioning hole 82 includes a first sub-hole 821 and a second sub-hole 822, which are arranged in sequence from top to bottom and are coaxial, and a diameter of the first sub-hole 821 is larger than a diameter of the second sub-hole 822, that is, the first sub-hole 821 and the second sub-hole 822 constitute a counter bore structure. The first matching part 61 comprises a first sub-part 611 and a second sub-part 612 which are coaxially arranged from top to bottom, and the outer diameter of the first sub-part 611 is larger than that of the second sub-part 612; wherein the first sub-part 611 is located in the first sub-hole 821, and a lower end surface of the first sub-part 611 cooperates with an upper end surface of the second sub-hole 822 to function as a support for the guide 6 while defining a height of the guide 6. And, the outer diameter of the first sub-part 611 is smaller than the diameter of the first sub-hole 821; the second sub-portion 612 is located in the second sub-hole 822, and the peripheral wall of the second sub-portion 612 is matched with the hole wall of the second sub-hole 822, so that the position of the guide 6 on the bottom plate 41 is defined, and the rotational freedom of the guide 6 is defined, so that the guide 6 is kept vertical without inclination, and the position precision and the installation precision of the guide 6 are improved.

Further, a second positioning hole and a third positioning hole are provided correspondingly on the hole wall of the first positioning hole 82 and the outer peripheral wall of the first fitting portion 61, respectively, and specifically, in the present embodiment, a second positioning hole penetrating the positioning body 81 from the inner wall of the first sub-hole 821 in the radial direction thereof is provided in the positioning body 81; correspondingly, a third positioning hole is provided in the outer peripheral wall of the first sub-portion 611, and the first positioning pin 83 is inserted into the second positioning hole and the third positioning hole so that the guide 6 does not rotate, thereby defining the rotational freedom of the guide 6 in the horizontal plane. Optionally, the third positioning hole and/or the second positioning hole are threaded holes, and the first positioning pin 83 is a screw and is in threaded fit with the threaded holes.

It should be noted that, in the present embodiment, the first positioning hole 82 is a counter bore, but the present invention is not limited to this, and in practical application, the first positioning hole 82 may also be a through hole, and the outer peripheral wall of the first fitting portion 61 fits with the hole wall of the through hole. This also defines the position of the guide 6 on the base plate 41 and at the same time defines the freedom of rotation of the guide 6, keeping it vertical and free from tilting. Of course, in practical applications, the first positioning hole 82 and the first fitting portion 61 may have any other structures as long as they can function to define the position and rotational freedom of the guide on the bottom plate 41.

Optionally, the positioning body 81 is connected with the bottom plate 41 of the chamber 4, that is, the positioning body 81 is connected with the bottom plate 41 in a non-detachable manner, such as welding, or is processed in an integrally formed manner, or the positioning body 81 is a part of the bottom plate 41, so that as long as the processing accuracy of the bottom plate 41 can be ensured, the processing accuracy of the positioning body 81 and the first positioning hole 82 therein can be ensured. Of course, in practical applications, the positioning body 81 and the bottom plate 41 of the chamber 4 may be detachably connected, for example, by screwing.

The sliding member 7 is slidably fitted to the guide member 6 and is fixedly connected to the upper electrode mechanism 5. Thus, the slider 7 and the upper electrode mechanism 5 can slide synchronously along the guide 6. The guide 6 guides the movement of both in the vertical direction.

Optionally, the guide 6 comprises an optical axis. And, be provided with the through-hole on slider 7, slider 7 overlaps on the optical axis through this through-hole, and through-hole and optical axis sliding fit, can realize slider 7 along the optical axis slip from this. Since the optical axis has high processing accuracy, the moving accuracy of the slider 7 can be ensured. Meanwhile, the sliding part 7 is sleeved on the optical axis, and the hole wall of the through hole is in sliding fit with the outer peripheral wall of the optical axis, so that compared with a mode of connecting the sliding part 7 with the optical axis by using screws and long holes in the prior art, the connecting stability and firmness of the sliding part 7 and the optical axis can be improved, and the connecting structure and the mounting process can be simplified.

The second positioning structure is for restricting the relative position and rotational freedom of the slider 7 and the upper electrode mechanism 5. In the present embodiment, as shown in fig. 4, the second positioning structure includes a positioning through hole 54 provided on the bottom plate 51 of the upper electrode mechanism 5 and penetrating the bottom plate 51 in the vertical direction, and a rotational positioning structure for defining the rotational degree of freedom of the slider 7 in the horizontal plane. By means of the positioning through hole 54 and the rotational positioning structure, it is possible to define the position of the slider 7 on the bottom plate 51 while defining the rotational degree of freedom of the slider 7 to keep it upright without tilting, thereby improving the positional accuracy and mounting accuracy of the slider 7.

Alternatively, the above-mentioned rotation positioning structure includes a convex portion 71 and a concave portion 541 respectively provided on the outer peripheral wall of the slider 7 and the hole wall of the positioning through hole 54, and the convex portion 71 and the concave portion 541 cooperate with each other so that the slider 7 does not rotate. In the present embodiment, the projection 71 is provided on the outer peripheral wall of the slider 7 and the recess 541 is provided on the positioning through-hole 54, but it is also possible to provide the projection on the positioning through-hole 54 and the recess on the outer peripheral wall of the slider 7.

The rotational positioning structure is not limited to the above structure of the present embodiment, and any other structure capable of restricting the degree of freedom of rotation of the slider 7 in the horizontal plane may be used in practical applications. For example, the rotational positioning structure is a positioning pin. Specifically, a fourth positioning hole and a fifth positioning hole, and a second positioning pin inserted through the fourth positioning hole and the fifth positioning hole are provided on the outer peripheral wall of the slider 7 and the hole wall of the positioning through hole, respectively. The second alignment pins may be disposed in a manner similar to that of the first alignment pins 83, and will not be described herein.

In practical applications, the rotational positioning structure may be omitted, and the orthogonal projection shape of the outer peripheral wall of the slider 7 and the hole wall of the positioning through hole on the horizontal plane may be non-circular, so as to achieve the purpose of limiting the rotational degree of freedom of the slider 7 in the horizontal plane. The non-circular shape means that the orthogonal projection shape on the horizontal plane of the outer peripheral wall of the slider 7 and the hole wall of the positioning through hole satisfies: the length of a connecting line between the center of the orthographic projection shape and different positions on the outline of the orthographic projection shape is different.

For example, as shown in fig. 5, the second positioning structure includes a positioning through hole 54 'provided on the bottom plate 51 of the upper electrode mechanism 5 and penetrating through the bottom plate 51 in the vertical direction, and an orthogonal projection shape of a hole wall of the positioning through hole 54' on a horizontal plane is rectangular; the orthogonal projection of the outer peripheral wall of the slider 7 'in the horizontal plane is also rectangular in shape and fits the hole wall of the positioning through hole 54'. By designing the orthogonal projection shape of the outer peripheral wall of the slider 7 and the hole wall of the positioning through hole on the horizontal plane to be rectangular, the slider 7 can be prevented from rotating, and the rotational degree of freedom of the slider 7 is limited. Of course, in practical applications, other non-circular shapes may also be used, such as oval, square, irregular, and so forth. Further, the outer peripheral wall of the slider 7 ' and the hole wall of the positioning through hole 54 ' may be formed in a non-circular shape in an orthogonal projection on the horizontal plane, and the rotational positioning structure may be further provided to further limit the degree of freedom of rotation of the slider 7 ' in the horizontal plane.

The cover opening mechanism provided by the invention can respectively ensure the position precision and the rotation freedom degree of the guide piece 6 and the sliding piece 7 by virtue of the first positioning structure and the second positioning structure, so that the positioning precision of the upper electrode mechanism 5 can be ensured as long as the processing precision of the bottom plate 41 of the cavity 4 and the bottom plate 51 of the upper electrode mechanism 5 is ensured, and other adjustment links are not needed, so that the positioning precision of the upper electrode mechanism can be improved, and the installation structure and the positioning adjustment process can be simplified.

Preferably, the lid opening mechanism further comprises an upper electrode positioning structure for limiting the relative position and rotational freedom of the upper electrode mechanism 5 and the chamber 4. By means of the upper electrode positioning structure, the upper electrode mechanism 5 can reach the cover engaging position abutting against the chamber 4 every time the lowering movement is performed, without deflection or offset, so that the repetition accuracy of the movement of the upper electrode mechanism 5 can be improved.

In this embodiment, as shown in fig. 6, the upper electrode positioning structure includes a positioning chute 42 and a positioning pulley 52, which are correspondingly and respectively disposed at the bottom of the upper electrode mechanism 5 and the top of the chamber 4 and located at the edge of the chamber 4, and the positioning chute 42 and the positioning pulley 52 are mutually matched when the upper electrode mechanism 5 is located at the cover closing position, so that the upper electrode mechanism 5 does not deflect or shift, and further the motion repetition precision of the upper electrode mechanism 5 can be improved. Meanwhile, since the positioning pulley 52 is in sliding contact with the positioning chute 42, the friction force therebetween can be reduced, and thus the resistance to the movement of the upper electrode mechanism 5 can be reduced. It should be noted that the positioning pulley 52 may be disposed at the bottom of the upper electrode mechanism 5 or at the top of the chamber 4, and correspondingly, the positioning chute 42 may be disposed at the top of the chamber 4 or at the bottom of the upper electrode mechanism 5.

Of course, in practical applications, the upper electrode positioning structure may also adopt any other structure as long as the upper electrode mechanism 5 can not deflect or shift. For example, as shown in fig. 7, the upper electrode positioning structure includes a positioning protrusion 53 and a positioning recess 43 respectively disposed at the bottom of the upper electrode mechanism 5 and the top of the chamber 4 and located at the edge of the chamber 4, and the positioning protrusion 53 and the positioning recess 43 are engaged with each other when the upper electrode mechanism 5 is located at the cover closing position. It should be noted that the positioning convex portion 53 may be disposed at the bottom of the upper electrode mechanism 5 or the top of the chamber 4, and correspondingly, the positioning concave portion 43 may be disposed at the top of the chamber 4 or the bottom of the upper electrode mechanism 5.

The driving device 9 is used for driving the upper electrode mechanism 5 and/or the sliding piece 7 to do lifting movement relative to the chamber 4. In the present embodiment, the driving device 9 is mounted on the whole machine bracket 10 and is located at the bottom of the chamber 4. And the top end of the driving shaft of the driving device 9 can be connected with the upper electrode mechanism 5 to directly drive the upper electrode mechanism 5 to do lifting motion, and at the moment, the sliding part 7 moves synchronously along the guide part 6 along with the upper electrode mechanism 5 to play a role of guiding the upper electrode mechanism 5. Of course, in practical applications, the driving shaft of the driving device 9 may be connected to the slider 7, or both the upper electrode mechanism 5 and the slider 7.

In practical applications, the driving device may employ a linear driving source, such as a linear electric cylinder, a linear air cylinder, or a linear hydraulic cylinder.

As another technical solution, an embodiment of the present invention further provides a semiconductor processing apparatus, which includes a reaction chamber, an upper electrode mechanism, and a lid opening mechanism, where the lid opening mechanism is used to drive the upper electrode mechanism to perform a lifting motion with respect to the reaction chamber, and the lid opening mechanism adopts the lid opening mechanism provided in the embodiment of the present invention.

The semiconductor processing equipment can be ICP etching equipment and the like.

According to the semiconductor processing equipment provided by the embodiment of the invention, the cover opening mechanism provided by the embodiment of the invention is adopted, so that the positioning precision of the upper electrode mechanism can be improved.

It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.