Apparatus for treating surface oxide of base material
阅读说明:本技术 基材表面氧化物处理装置 (Apparatus for treating surface oxide of base material ) 是由 王少峰 曹云飞 倪涛 李泳杰 何龙 于 2020-07-16 设计创作,主要内容包括:本发明提供了一种基材表面氧化物处理装置,包括壳体和第一氧化物处理组,其中,壳体具有作业腔;第一氧化物处理组与壳体连接,并与作业腔连通,其中,壳体的设置有第一氧化物处理组的位置处所在的平面与水平面具有夹角地设置,且第一氧化物处理组的轴线与水平面具有夹角地设置,以使第一氧化物处理组的第一喷射端形成第一击打角度,其中,第一喷射端用于向基材的第一表面喷射砂浆混合液,以去除第一表面的氧化皮。本发明解决了现有技术中的基材表面氧化物处理装置的结构不合理,无法确保基材表面氧化物处理装置的氧化物处理组能够有效地松动基材表面的氧化皮,从而降低了基材表面氧化物处理装置的表面氧化皮处理可靠性的问题。(The invention provides a substrate surface oxide treatment device, which comprises a shell and a first oxide treatment group, wherein the shell is provided with a working cavity; the first oxide treatment group is connected with the shell and communicated with the operation cavity, wherein a plane of the shell where the first oxide treatment group is arranged with an included angle with a horizontal plane, and an axis of the first oxide treatment group is arranged with an included angle with the horizontal plane, so that a first spraying end of the first oxide treatment group forms a first beating angle, wherein the first spraying end is used for spraying mortar mixed liquid to the first surface of the base material to remove scale on the first surface. The invention solves the problems that the structure of the substrate surface oxide treatment device in the prior art is unreasonable, and the oxide treatment group of the substrate surface oxide treatment device can not be ensured to effectively loosen the oxide skin on the substrate surface, so that the surface oxide skin treatment reliability of the substrate surface oxide treatment device is reduced.)
1. An apparatus for treating an oxide on a surface of a substrate, comprising:
a housing (10), the housing (10) having a working chamber;
a first oxide treatment group (30), wherein the first oxide treatment group (30) is connected with the shell (10) and communicated with the working cavity, a plane of the shell (10) where the first oxide treatment group (30) is arranged at an included angle with a horizontal plane, and an axis of the first oxide treatment group (30) is arranged at an included angle with the horizontal plane, so that a first spraying end of the first oxide treatment group (30) forms a first spraying angle, wherein the first spraying end is used for spraying a mortar mixed liquid to a first surface of a base material to remove scale on the first surface.
2. The substrate surface oxide treatment apparatus of claim 1, wherein the axis of the first oxide treatment group (30) is at an angle a to the horizontal plane, wherein a satisfies: a is more than or equal to 10 degrees and less than or equal to 30 degrees.
3. The substrate surface oxide treatment apparatus of claim 1, further comprising:
and a second oxide treatment group (20), wherein the second oxide treatment group (20) is connected with the shell (10) and is communicated with the working cavity, the plane of the shell (10) where the second oxide treatment group (20) is arranged is a horizontal plane, the second oxide treatment group (20) is arranged opposite to the first oxide treatment group (30), the axis of the second oxide treatment group (20) is arranged at an included angle with the horizontal plane, so that a second spraying end (23) of the second oxide treatment group (20) forms a second striking angle, and the second spraying end (23) is used for spraying mortar mixed liquid to a second surface of the base material opposite to the first surface to remove oxide scale on the second surface.
4. The substrate surface oxide treatment apparatus of claim 1, further comprising:
a second oxide treatment group (20), wherein the second oxide treatment group (20) is arranged on the shell (10) and is communicated with the working cavity, a plane of the shell (10) where the second oxide treatment group (20) is arranged at an included angle with a horizontal plane, the second oxide treatment group (20) is arranged opposite to the first oxide treatment group (30), an axis of the second oxide treatment group (20) is arranged at an included angle with the horizontal plane, so that a second spraying end (23) of the second oxide treatment group (20) forms a second striking angle, and the second spraying end (23) is used for spraying mortar mixed liquid to a second surface of the base material opposite to the first surface to remove oxide skin on the second surface.
5. The device for the surface oxide treatment of a substrate according to claim 3 or 4, wherein the axis of the second oxide treatment group (20) forms an angle b with the horizontal plane, wherein b satisfies: b is more than or equal to 10 degrees and less than or equal to 30 degrees.
6. The substrate surface oxide treatment apparatus according to claim 5, wherein a spray range of the first spray tip and/or the second spray tip (23) is adjustably set in a width direction of the substrate.
7. The substrate surface oxide treatment apparatus of claim 6, wherein the first oxide treatment group (30) comprises:
the device comprises a first processing unit (31) and a second processing unit (32), wherein the first processing unit (31) and the second processing unit (32) are arranged at intervals along the width direction of the shell (10), and a plane where the first processing unit (31) is arranged of the shell (10) is arranged and a plane where the second processing unit (32) is arranged of the shell (10) form an included angle;
wherein the first treatment unit (31) comprises a first turbine rotating in a first direction and the second treatment unit (32) comprises a second turbine rotating in a second direction opposite to the first direction.
8. The apparatus according to claim 7, wherein the first treatment unit (31) and the second treatment unit (32) are arranged alternately in the direction of movement of the substrate.
9. The substrate surface oxide treatment apparatus of claim 3, wherein the second oxide treatment group (20) comprises:
a third processing unit (21) and a fourth processing unit (22), wherein the third processing unit (21) and the fourth processing unit (22) are arranged at intervals along the width direction of the shell (10);
wherein the third treatment unit (21) comprises a third turbine, which rotates in a third direction, and the fourth treatment unit (22) comprises a fourth turbine, which rotates in a fourth direction, which is opposite to the third direction.
10. The substrate surface oxide treatment apparatus of claim 4, wherein the second oxide treatment group (20) comprises:
the device comprises a third processing unit (21) and a fourth processing unit (22), wherein the third processing unit (21) and the fourth processing unit (22) are arranged at intervals along the width direction of the shell (10), and a plane where the third processing unit (21) is arranged of the shell (10) and a plane where the fourth processing unit (22) is arranged of the shell (10) have included angles;
wherein the third treatment unit (21) comprises a third turbine, which rotates in a third direction, and the fourth treatment unit (22) comprises a fourth turbine, which rotates in a fourth direction, which is opposite to the third direction.
11. The apparatus according to any one of claims 9 or 10, wherein the first oxide treatment groups (30) are provided in plural groups, plural groups of the first oxide treatment groups (30) are provided at intervals in a moving direction of the substrate, plural groups of the second oxide treatment groups (20) are provided, and plural groups of the second oxide treatment groups (20) are provided in one-to-one correspondence with the plural groups of the first oxide treatment groups (30).
12. The substrate surface oxide treatment apparatus of claim 4, wherein the first oxide treatment group (30) is disposed at the bottom of the housing (10), and the first oxide treatment group (30) is disposed upside down.
Technical Field
The invention relates to the technical field of substrate surface treatment equipment, in particular to a substrate surface oxide treatment device.
Background
Disclosure of Invention
The invention mainly aims to provide a substrate surface oxide treatment device, which solves the problems that the structure of the substrate surface oxide treatment device in the prior art is unreasonable, an oxide treatment group of the substrate surface oxide treatment device can not effectively loosen oxide scales on the surface of a substrate, and the surface oxide scale treatment reliability of the substrate surface oxide treatment device is reduced.
In order to achieve the above object, the present invention provides a substrate surface oxide treatment apparatus comprising a housing and a first oxide treatment group, wherein the housing has a working chamber; the first oxide treatment group is connected with the shell and communicated with the operation cavity, wherein a plane of the shell where the first oxide treatment group is arranged with an included angle with a horizontal plane, and an axis of the first oxide treatment group is arranged with an included angle with the horizontal plane, so that a first spraying end of the first oxide treatment group forms a first beating angle, wherein the first spraying end is used for spraying mortar mixed liquid to the first surface of the base material to remove scale on the first surface.
Further, the included angle between the axis of the first oxide treatment group and the horizontal plane is a, wherein a satisfies: a is more than or equal to 10 degrees and less than or equal to 30 degrees.
The base material surface oxide treatment device further comprises a second oxide treatment group, the second oxide treatment group is connected with the shell and communicated with the operation cavity, a plane where the second oxide treatment group is arranged of the shell is a horizontal plane, the second oxide treatment group is arranged opposite to the first oxide treatment group, and an axis of the second oxide treatment group and the horizontal plane are arranged in an included angle mode so that a second spraying end of the second oxide treatment group forms a second striking angle, wherein the second spraying end is used for spraying mortar mixed liquid to a second surface, opposite to the first surface, of the base material to remove oxide scales on the second surface.
The base material surface oxide treatment device further comprises a second oxide treatment group, the second oxide treatment group is arranged on the shell and communicated with the working cavity, a plane of the shell where the second oxide treatment group is arranged to form an included angle with a horizontal plane, the second oxide treatment group is arranged opposite to the first oxide treatment group, an axis of the second oxide treatment group is arranged to form an included angle with the horizontal plane, so that a second spraying end of the second oxide treatment group forms a second striking angle, and the second spraying end is used for spraying mortar mixed liquid to a second surface, opposite to the first surface, of the base material to remove oxide scales on the second surface.
Further, the included angle between the axis of the second oxide treatment group and the horizontal plane is b, wherein b satisfies: b is more than or equal to 10 degrees and less than or equal to 30 degrees.
Further, the jetting range of the first jetting end and/or the second jetting end is adjustably set in the width direction of the substrate.
Further, the first oxide treatment group comprises a first treatment unit and a second treatment unit, the first treatment unit and the second treatment unit are arranged at intervals along the width direction of the shell, and a plane of the shell where the first treatment unit is arranged and forms an included angle with a plane of the shell where the second treatment unit is arranged; wherein the first treatment unit comprises a first turbine rotating in a first direction and the second treatment unit comprises a second turbine rotating in a second direction opposite to the first direction.
Further, the first processing unit and the second processing unit are arranged alternately in the moving direction of the substrate.
Further, the second oxide treatment group comprises a third treatment unit and a fourth treatment unit which are arranged at intervals along the width direction of the shell; wherein the third treatment unit comprises a third turbine, the third turbine rotating in a third direction, and the fourth treatment unit comprises a fourth turbine, the fourth turbine rotating in a fourth direction opposite to the third direction.
Furthermore, the second oxide treatment group comprises a third treatment unit and a fourth treatment unit, the third treatment unit and the fourth treatment unit are arranged at intervals along the width direction of the shell, and a plane of the shell where the third treatment unit is arranged and forms an included angle with a plane of the shell where the fourth treatment unit is arranged; wherein the third treatment unit comprises a third turbine, the third turbine rotating in a third direction, and the fourth treatment unit comprises a fourth turbine, the fourth turbine rotating in a fourth direction opposite to the third direction.
Furthermore, the first oxide treatment groups are multiple groups, the multiple groups of first oxide treatment groups are arranged at intervals along the moving direction of the base material, the multiple groups of second oxide treatment groups are multiple groups, and the multiple groups of second oxide treatment groups and the multiple groups of first oxide treatment groups are arranged in a one-to-one correspondence manner.
Further, the first oxide treatment group is arranged at the bottom of the shell, and the first oxide treatment group is arranged in an inverted mode.
By applying the technical scheme of the invention, the arrangement mode of the first oxide treatment group of the substrate surface oxide treatment device is optimized, so that the axis of the first oxide treatment group is arranged at an angle with the horizontal plane, and thus, the first spraying end of the first oxide treatment group can obtain the first beating angle, namely, the first spraying end can obtain the optimal beating angle, so that the mortar mixed liquid sprayed by the first spraying end can accurately beat the oxide skin on the first surface of the substrate, the oxide skin on the first surface of the substrate is loosened, the falling reliability of the oxide skin on the first surface of the substrate is ensured, the beating reliability of the first spraying end is greatly improved, and the improvement of the oxide skin treatment reliability of the substrate surface oxide treatment device is facilitated.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic diagram illustrating a front view of an apparatus for treating a surface oxide of a substrate according to an alternative embodiment of the present invention;
FIG. 2 is a schematic diagram showing a top view of the substrate surface oxide treatment apparatus of FIG. 1;
FIG. 3 shows a schematic view of the third treatment unit of the second oxide treatment group of the substrate surface oxide treatment apparatus of FIG. 1;
FIG. 4 is a schematic diagram of another perspective of the third processing unit of FIG. 3;
FIG. 5 shows a schematic diagram of the structure of the fourth processing unit of the second oxide processing group of FIG. 1;
FIG. 6 shows a schematic diagram of the structure of a first processing unit of the first oxide processing group of FIG. 1;
FIG. 7 shows a schematic diagram of another perspective of the first processing unit of FIG. 6;
FIG. 8 shows a schematic diagram of the structure of a second processing unit of the first oxide processing group of FIG. 1;
fig. 9 shows a schematic view of another perspective of the second processing unit in fig. 8;
FIG. 10 shows a schematic cross-sectional view of a third turbine of the third treatment unit of FIG. 3;
FIG. 11 is a schematic view of the housing of a substrate surface oxide treatment apparatus according to an alternative embodiment of the invention from a bottom perspective;
fig. 12 is a schematic diagram showing a top view of the housing of the substrate surface oxide treatment apparatus of fig. 11.
Wherein the figures include the following reference numerals:
10. a housing; 30. a first oxide treatment group; 31. a first processing unit; 211. a third turbine structure; 2111. a third accommodating chamber; 212. a third driving section; 213. a third hitting blade; 32. a second processing unit; 23. a second injection end; 20. a second oxide treatment group; 21. a third processing unit; 22. a fourth processing unit; 40. a water vapor discharge device; 11. a first mounting hole; 12. a second mounting hole; 13. a third mounting hole; 14. and a fourth mounting hole.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the invention, its application, or uses. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
The invention provides a substrate surface oxide treatment device, aiming at solving the problems that the structure of the substrate surface oxide treatment device in the prior art is unreasonable, and the oxide treatment group of the substrate surface oxide treatment device can not be ensured to effectively loosen oxide skin on the surface of a substrate, so that the surface oxide skin treatment reliability of the substrate surface oxide treatment device is reduced.
As shown in fig. 1, the substrate surface oxide treatment apparatus includes a housing 10 and a first
The first
As shown in fig. 1 and 2, the direction E in the drawings refers to the direction of movement of the substrate.
It should be noted that in the present application, the axis of the first
As shown in fig. 1, the axis of the first
As shown in fig. 1, the substrate surface oxidation treatment apparatus further includes a second
Optionally, in an embodiment of the present application, which is not shown in the drawings, the substrate surface oxidation treatment apparatus further includes a second
It should be noted that in the present application, the axis of the second
As shown in fig. 1, the axis of the second
Note that, in the present application, the ejection range of the first ejection end and/or the
In the present application, as shown in fig. 2 to 9, the first direction is the a direction, the second direction is the B direction, the third direction is the C direction, and the fourth direction is the D direction.
As shown in fig. 1 and 2, the first
As shown in fig. 1 and 2, the first and
Note that, in the present application, the second
In an embodiment of the present application, which is not shown in the drawings, the second
As shown in fig. 10, the third turbine includes a
As shown in fig. 1, the second
It should be noted that, in the present application, the internal structures of the second turbine, the first turbine and the fourth turbine are the same as the internal structure of the third turbine, and are not described herein again, except that the rotation directions of the turbines are different.
Alternatively, the first
It should be noted that, in the present application, in order to ensure that the included angle between the axis of the first
It should be noted that the first
As shown in fig. 11, the structure of the bottom view of the housing 10 of the present application is schematically illustrated, in which the first mounting hole 11 is used for mounting the first processing unit 31, the second mounting hole 12 is used for mounting the
As shown in fig. 12, the top view of the housing 10 of the present application is a schematic structural diagram, in which the third mounting hole 13 is used for mounting the third processing unit 21, the fourth mounting hole 14 is used for mounting the
In the present application, considering that the substrate surface oxidation treatment apparatus generates steam during the scale treatment operation, the substrate surface oxidation treatment apparatus further includes a drain steam unit 40 for timely draining the steam generated in the substrate surface oxidation treatment apparatus, and the drain steam unit 40 is configured to timely drain the steam generated in the substrate surface oxidation treatment apparatus.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.
The relative arrangement of the components and steps, the numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present invention unless specifically stated otherwise. Meanwhile, it should be understood that the sizes of the respective portions shown in the drawings are not drawn in an actual proportional relationship for the convenience of description. Techniques, methods, and apparatus known to those of ordinary skill in the relevant art may not be discussed in detail but are intended to be part of the specification where appropriate. In all examples shown and discussed herein, any particular value should be construed as merely illustrative, and not limiting. Thus, other examples of the exemplary embodiments may have different values. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, further discussion thereof is not required in subsequent figures.
Spatially relative terms, such as "above … …," "above … …," "above … …," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial relationship to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if a device in the figures is turned over, devices described as "above" or "on" other devices or configurations would then be oriented "below" or "under" the other devices or configurations. Thus, the exemplary term "above … …" can include both an orientation of "above … …" and "below … …". The device may be otherwise variously oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular is intended to include the plural unless the context clearly dictates otherwise, and it should be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of features, steps, operations, devices, components, and/or combinations thereof.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application described herein are capable of operation in sequences other than those illustrated or described herein.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
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