High-temperature oxide cleaning agent based on organic phosphonic acid, preparation and use method

文档序号:1265501 发布日期:2020-08-25 浏览:22次 中文

阅读说明:本技术 基于有机膦酸的高温氧化物清洗剂、制备及使用方法 (High-temperature oxide cleaning agent based on organic phosphonic acid, preparation and use method ) 是由 王德智 杜定强 于 2020-04-07 设计创作,主要内容包括:本发明涉及一种基于有机膦酸的高温氧化物清洗剂、制备及使用方法,包含如下重量比成分:有机膦酸8-12份、苯并三氮唑1-1.5份、渗透剂1-2份、有机胺缓释剂5-8份,余量为去离子水,清洗剂使用过程中,在超声波的作用下,将表面经氩弧焊产生的高温氧化物清洗处理干净,清洗剂中含有有机膦酸的成分,利用有机膦酸与铜离子的螯合反应,产生螯合沉淀物,以达到去除液体中铜离子的功能,使得本发明既能实现对表面高温氧化物的有效去除,同时避免清洗残液里有大量的铜离子残留,进而避免了因重金属超标而导致的环境问题,具有较好的应用推广价值。(The invention relates to a high-temperature oxide cleaning agent based on organic phosphonic acid, and a preparation method and a use method thereof, wherein the cleaning agent comprises the following components in parts by weight: 8-12 parts of organic phosphonic acid, 1-1.5 parts of benzotriazole, 1-2 parts of penetrating agent, 5-8 parts of organic amine slow release agent and the balance of deionized water, wherein in the using process of the cleaning agent, under the action of ultrasonic waves, the surface of the cleaning agent is cleaned by high-temperature oxide generated by argon arc welding, the cleaning agent contains organic phosphonic acid components, and a chelating precipitate is generated by a chelating reaction of organic phosphonic acid and copper ions so as to achieve the function of removing the copper ions in the liquid.)

1. The high-temperature oxide cleaning agent based on organic phosphonic acid is characterized by comprising the following components in parts by weight: 8-12 parts of organic phosphonic acid, 1-1.5 parts of benzotriazole, 1-2 parts of penetrating agent, 5-8 parts of organic amine slow release agent and the balance of deionized water.

2. The organic phosphonic acid based high temperature oxide cleaner as claimed in claim 1, wherein the penetrant is JFC-2 penetrant.

3. A preparation method of a high-temperature oxide cleaning agent based on organic phosphonic acid, which is used for preparing the high-temperature oxide cleaning agent based on organic phosphonic acid in claim 2, and is characterized by comprising the following steps: a1. weighing the organic phosphonic acid, the benzotriazole, the JFC-2 penetrating agent, the organic amine slow-release agent and the deionized water according to the weight ratio for later use; b1. adding the organic phosphonic acid and deionized water into a batching kettle, and stirring and mixing fully at normal temperature; c1. sequentially adding the benzotriazole, the JFC-2 penetrating agent and the organic amine slow-release agent, and stirring at normal temperature until the materials are completely mixed.

4. The method for preparing an organic phosphonic acid-based high-temperature oxide cleaning agent according to claim 3, wherein the mixing temperature in step b1 is not higher than 30 ℃.

5. The method for preparing organic phosphonic acid-based high-temperature oxide cleaning agent according to claim 4, wherein the stirring temperature in step c1 is not higher than 30 ℃ and the stirring time is 0.5-1 h.

6. The use method of the organic phosphonic acid-based high-temperature oxide cleaning agent, which is used by the organic phosphonic acid-based high-temperature oxide cleaning agent in claim 2, is characterized by comprising the following steps: a2. putting a high-temperature oxide cleaning agent into an ultrasonic cleaning machine; b2. immersing a product to be cleaned in a high-temperature oxide cleaning agent in the ultrasonic cleaning machine; c2. ultrasonic cleaning for 7-10 min.

7. The method for using organic phosphonic acid based high temperature oxide cleaning agent as claimed in claim 6, further comprising after step c 2: d2. and carrying out copper ion detection on the cleaning residual liquid after ultrasonic cleaning.

8. The method as claimed in claim 7, wherein the step d2 includes: collecting a sample of the cleaning residual liquid by using potassium iodide starch test paper; the colorimetric card was quantitatively measured using copper ion detection.

Technical Field

The invention relates to the technical field of heating ventilation, in particular to a high-temperature oxide cleaning agent based on organic phosphonic acid, and preparation and use methods thereof.

Background

In the heating and ventilation industry, two-device accessories are a general name of an evaporator and a condenser, and a two-device joint needs to be welded with red copper and brass in the production process, argon arc welding is adopted, so that the surfaces of the brass and the red copper are oxidized at high temperature, and the high-temperature oxides need to be cleaned in the next production process. In the current industry, strong acid with the pH value lower than 3 is adopted for pickling, but a large amount of copper ions are left in pickling residual liquid, so that heavy metals exceed the standard, and even if a sewage treatment plant is difficult to treat, the environmental pollution is caused, and the coordinated development of resources and the environment is not facilitated.

Disclosure of Invention

The invention aims to overcome the defects in the prior art and provide a high-temperature oxide cleaning agent based on organic phosphonic acid, a preparation method and a use method.

The invention is realized by the following technical scheme:

the high-temperature oxide cleaning agent based on organic phosphonic acid is characterized by comprising the following components in parts by weight: 8-12 parts of organic phosphonic acid, 1-1.5 parts of benzotriazole, 1-2 parts of penetrating agent, 5-8 parts of organic amine slow release agent and the balance of deionized water.

According to the technical scheme, preferably, the penetrating agent is a JFC-2 penetrating agent.

The patent also discloses a preparation method of the high-temperature oxide cleaning agent based on organic phosphonic acid, which is characterized by comprising the following steps: a1. weighing the organic phosphonic acid, the benzotriazole, the JFC-2 penetrating agent, the organic amine slow-release agent and the deionized water according to the weight ratio for later use; b1. adding the organic phosphonic acid and deionized water into a batching kettle, and stirring and mixing fully at normal temperature; c1. sequentially adding the benzotriazole, the JFC-2 penetrating agent and the organic amine slow-release agent, and stirring at normal temperature until the materials are completely mixed.

According to the technical scheme, the stirring and mixing temperature in the step b1 is preferably not higher than 30 ℃.

According to the technical scheme, the stirring temperature in the step c1 is preferably not higher than 30 ℃, and the stirring time is 0.5-1 h.

The patent also discloses a using method of the high-temperature oxide cleaning agent based on organic phosphonic acid, which is characterized by comprising the following steps: a2. putting a high-temperature oxide cleaning agent into an ultrasonic cleaning machine; b2. immersing a product to be cleaned in a high-temperature oxide cleaning agent in the ultrasonic cleaning machine; c2. ultrasonic cleaning for 7-10 min.

According to the above technical solution, after step c2, the method preferably further includes: d2. and carrying out copper ion detection on the cleaning residual liquid after ultrasonic cleaning.

According to the above technical solution, preferably, step d2 includes: collecting a sample of the cleaning residual liquid by using potassium iodide starch test paper; the colorimetric card was quantitatively measured using copper ion detection.

The invention has the beneficial effects that:

in the using process of the cleaning agent, under the action of ultrasonic waves, the surface of the cleaning agent is cleaned by high-temperature oxides generated by argon arc welding, the cleaning agent contains organic phosphonic acid components, and chelation reaction of the organic phosphonic acid and copper ions is utilized to generate chelated precipitates so as to achieve the function of removing the copper ions in the liquid, so that the cleaning agent can effectively remove the high-temperature oxides on the surface, simultaneously avoid a large amount of copper ion residues in the cleaning residual liquid, further avoid the environmental problem caused by excessive heavy metals, and has good application and popularization values.

Drawings

FIG. 1 is a schematic flow diagram of the preparation process of the present invention.

FIG. 2 is a schematic flow diagram of a method of use of the present invention.

Detailed Description

In order to make the technical solutions of the present invention better understood by those skilled in the art, the present invention will be further described in detail with reference to the accompanying drawings and preferred embodiments.

As shown in the figure, the invention comprises the following components in percentage by weight: example 1: 9 parts of organic phosphonic acid, 1 part of benzotriazole, 2 parts of penetrant, 6 parts of organic amine slow-release agent and 82 parts of deionized water; example 2: 12 parts of organic phosphonic acid, 1.5 parts of benzotriazole, 1 part of penetrating agent, 7 parts of organic amine slow release agent and 78.5 parts of deionized water. Compared with the traditional strong acid cleaning agent with the PH of 1-2, the PH of the high-temperature oxide cleaning agent based on organic phosphonic acid used in the invention is about 4-5, thereby avoiding generating larger corrosion to the surfaces of the joints of the two devices. In the using process of the cleaning agent, under the action of ultrasonic waves, the surface of the cleaning agent is cleaned by high-temperature oxides generated by argon arc welding, the cleaning agent contains organic phosphonic acid components, and chelation reaction of the organic phosphonic acid and copper ions is utilized to generate chelated precipitates so as to achieve the function of removing the copper ions in the liquid, so that the cleaning agent can effectively remove the high-temperature oxides on the surface, simultaneously avoid a large amount of copper ion residues in the cleaning residual liquid, further avoid the environmental problem caused by excessive heavy metals, and has good application and popularization values.

According to the above embodiment, preferably, the penetrating agent is JFC-2 penetrating agent, and the JFC-2 penetrating agent has a chemical name of sec-octanol polyoxyethylene ether, and is non-toxic, acid-base resistant, hard water, heavy metal and the like.

The patent also discloses a preparation method of the high-temperature oxide cleaning agent based on organic phosphonic acid, which is characterized by comprising the following steps: a1. weighing the organic phosphonic acid, the benzotriazole, the JFC-2 penetrating agent, the organic amine slow-release agent and the deionized water according to the weight ratio for later use; b1. adding the organic phosphonic acid and deionized water into a batching kettle, and stirring and mixing fully at normal temperature; c1. sequentially adding the benzotriazole, the JFC-2 penetrating agent and the organic amine slow-release agent, and stirring at normal temperature until the materials are completely mixed.

According to the above embodiment, it is preferable that the stirring and mixing temperature in step b1 is not higher than 30 ℃.

According to the above examples, it is preferred that the stirring temperature in step c1 is not higher than 30 ℃ and the stirring time is 0.5 to 1 hour.

The patent also discloses a using method of the high-temperature oxide cleaning agent based on organic phosphonic acid, which is characterized by comprising the following steps: a2. putting a high-temperature oxide cleaning agent into an ultrasonic cleaning machine; b2. immersing a product to be cleaned in a high-temperature oxide cleaning agent in the ultrasonic cleaning machine; c2. ultrasonic cleaning for 7-10min, wherein the ultrasonic cleaning is to disperse, emulsify and peel off the dirt layer to achieve the cleaning purpose by utilizing the direct and indirect action of the cavitation action, acceleration action and direct current action of ultrasonic waves in liquid on the liquid and the dirt.

According to the above embodiment, after step c2, it is preferable that the method further includes: d2. and (3) carrying out copper ion detection on the cleaning residual liquid after ultrasonic cleaning, and adjusting the cleaning time in the cleaning process and the raw material ratio of the cleaning agent according to the detection result to ensure that no large amount of copper ion residues exist in the cleaning residual liquid.

According to the above embodiment, preferably, step d2 includes: collecting a sample of the cleaning residual liquid by using potassium iodide starch test paper; the colorimetric card was quantitatively measured using copper ion detection.

In the using process of the cleaning agent, under the action of ultrasonic waves, the surface of the cleaning agent is cleaned by high-temperature oxides generated by argon arc welding, the cleaning agent contains organic phosphonic acid components, and chelation reaction of the organic phosphonic acid and copper ions is utilized to generate chelated precipitates so as to achieve the function of removing the copper ions in the liquid, so that the cleaning agent can effectively remove the high-temperature oxides on the surface, simultaneously avoid a large amount of copper ion residues in the cleaning residual liquid, further avoid the environmental problem caused by excessive heavy metals, and has good application and popularization values.

The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.

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