阅读说明：本技术 一种多膜层结构、显示面板、显示装置及窗口 (Multi-film-layer structure, display panel, display device and window ) 是由 周俊 顾跃凤 于 2020-06-18 设计创作，主要内容包括：本发明实施例提供一种多膜层结构、显示面板、显示装置及窗口,多膜层结构包括多个膜层,所述多个膜层包括多个高折射率材料层和多个低折射率材料层,所述多个高折射率材料层与所述多个低折射率材料层一一间隔设置,所述高折射率材料层的折射率大于所述低折射率材料层的折射率；所述膜层的数量大于或者等于8个,所述高折射率材料层包括透明金属氧化物,所述低折射率材料层包括氟化镁。本发明实施例提供一种多膜层结构、显示面板、显示装置及窗口,以实现兼具紫外光波段高反射率、红外光波段高反射率和可见光波段低反射率。(The embodiment of the invention provides a multi-film structure, a display panel, a display device and a window, wherein the multi-film structure comprises a plurality of films, the films comprise a plurality of high-refractive-index material layers and a plurality of low-refractive-index material layers, the high-refractive-index material layers and the low-refractive-index material layers are arranged at intervals one by one, and the refractive index of the high-refractive-index material layers is greater than that of the low-refractive-index material layers; the number of the film layers is greater than or equal to 8, the high-refractive-index material layer comprises transparent metal oxide, and the low-refractive-index material layer comprises magnesium fluoride. The embodiment of the invention provides a multi-film layer structure, a display panel, a display device and a window, which are used for realizing high reflectivity of an ultraviolet band, high reflectivity of an infrared band and low reflectivity of a visible band.)

1. A multi-film structure is characterized by comprising a plurality of film layers, wherein the film layers comprise a plurality of high-refractive-index material layers and a plurality of low-refractive-index material layers, the high-refractive-index material layers and the low-refractive-index material layers are arranged at intervals one by one, and the refractive index of the high-refractive-index material layers is greater than that of the low-refractive-index material layers;

the number of the film layers is greater than or equal to 8, the high-refractive-index material layer comprises transparent metal oxide, and the low-refractive-index material layer comprises magnesium fluoride.

2. The multi-film structure of claim 1, wherein the number of film layers is less than or equal to 12; the thickness of any film layer is greater than or equal to 10nm and less than or equal to 200 nm.

3. The multi-film structure according to claim 2, wherein the plurality of high refractive index material layers include a first high refractive index material layer, a second high refractive index material layer, a third high refractive index material layer, and a fourth high refractive index material layer, which are sequentially stacked; the plurality of low-refractive-index material layers comprise a first low-refractive-index material layer, a second low-refractive-index material layer, a third low-refractive-index material layer, a fourth low-refractive-index material layer and a fifth low-refractive-index material layer which are sequentially stacked; the first high refractive index material layer is located between the first low refractive index material layer and the second low refractive index material layer;

the thickness L1 of the first low refractive index material layer satisfies: l1 is more than or equal to 119.42nm and less than or equal to 124.30 nm;

the thickness H1 of the first high refractive index material layer satisfies: h1 is more than or equal to 18.71nm and less than or equal to 20.27 nm;

the thickness L2 of the second low refractive index material layer satisfies: l2 is more than or equal to 191.11nm and less than or equal to 198.91 nm;

the thickness H2 of the second high refractive index material layer satisfies: h2 is not less than 116.56nm and not more than 121.32 nm;

the thickness L3 of the third low refractive index material layer satisfies: l3 is more than or equal to 185.17nm and less than or equal to 192.73 nm;

the thickness H3 of the third high refractive index material layer satisfies: h3 is more than or equal to 102.09nm and less than or equal to 106.25 nm;

the thickness L4 of the fourth low refractive index material layer satisfies: l4 is more than or equal to 189.20nm and less than or equal to 196.92 nm;

the thickness H4 of the fourth high refractive index material layer satisfies: h4 is more than or equal to 99.95nm and less than or equal to 104.03 nm;

the thickness L5 of the fifth low refractive index material layer satisfies: l5 is not less than 181.43nm and not more than 188.83 nm.

4. The multi-film structure according to claim 2, wherein the plurality of high refractive index material layers include a first high refractive index material layer, a second high refractive index material layer, a third high refractive index material layer, a fourth high refractive index material layer, and a fifth high refractive index material layer, which are sequentially stacked; the plurality of low-refractive-index material layers comprise a first low-refractive-index material layer, a second low-refractive-index material layer, a third low-refractive-index material layer, a fourth low-refractive-index material layer and a fifth low-refractive-index material layer which are sequentially stacked; the first high refractive index material layer is located between the first low refractive index material layer and the second low refractive index material layer;

the thickness L1 of the first low refractive index material layer satisfies: l1 is more than or equal to 82.56nm and less than or equal to 89.44 nm;

the thickness H1 of the first high refractive index material layer satisfies: h1 is more than or equal to 40.94nm and less than or equal to 44.35 nm;

the thickness L2 of the second low refractive index material layer satisfies: l2 is more than or equal to 22.71nm and less than or equal to 24.60 nm;

the thickness H2 of the second high refractive index material layer satisfies: h2 is more than or equal to 29.50nm and less than or equal to 31.95 nm;

the thickness L3 of the third low refractive index material layer satisfies: l3 is more than or equal to 190.54nm and less than or equal to 198.31 nm;

the thickness H3 of the third high refractive index material layer satisfies: h3 is more than or equal to 103.56nm and less than or equal to 107.79 nm;

the thickness L4 of the fourth low refractive index material layer satisfies: l4 is more than or equal to 180.06nm and less than or equal to 187.41 nm;

the thickness H4 of the fourth high refractive index material layer satisfies: h4 is more than or equal to 100.88nm and less than or equal to 105.00 nm;

the thickness L5 of the fifth low refractive index material layer satisfies: l5 is more than or equal to 15.01nm and less than or equal to 16.26 nm;

the thickness H5 of the fifth high refractive index material layer satisfies: h5 is more than or equal to 11.64nm and less than or equal to 12.61 nm.

5. The multi-film structure according to claim 2, wherein the plurality of high refractive index material layers include a first high refractive index material layer, a second high refractive index material layer, a third high refractive index material layer, a fourth high refractive index material layer, a fifth high refractive index material layer, and a sixth high refractive index material layer, which are sequentially stacked; the plurality of low-refractive-index material layers comprise a first low-refractive-index material layer, a second low-refractive-index material layer, a third low-refractive-index material layer, a fourth low-refractive-index material layer, a fifth low-refractive-index material layer and a sixth low-refractive-index material layer which are sequentially stacked; the first high refractive index material layer is located between the first low refractive index material layer and the second low refractive index material layer;

the thickness L1 of the first low refractive index material layer satisfies: l1 is more than or equal to 102.19nm and less than or equal to 106.37 nm;

the thickness H1 of the first high refractive index material layer satisfies: h1 is not less than 31.60nm and not more than 34.24 nm;

the thickness L2 of the second low refractive index material layer satisfies: l2 is more than or equal to 30.81nm and less than or equal to 33.37 nm;

the thickness H2 of the second high refractive index material layer satisfies: h2 is more than or equal to 22.20nm and less than or equal to 24.04 nm;

the thickness L3 of the third low refractive index material layer satisfies: l3 is more than or equal to 183.40nm and less than or equal to 190.88 nm;

the thickness H3 of the third high refractive index material layer satisfies: h3 is not less than 104.05nm and not more than 108.29 nm;

the thickness L4 of the fourth low refractive index material layer satisfies: l4 is more than or equal to 181.00nm and less than or equal to 188.38 nm;

the thickness H4 of the fourth high refractive index material layer satisfies: h4 is not less than 104.84nm and not more than 109.12 nm;

the thickness L5 of the fifth low refractive index material layer satisfies: l5 is more than or equal to 178.20nm and less than or equal to 185.48 nm;

the thickness H5 of the fifth high refractive index material layer satisfies: h5 is not less than 108.20nm and not more than 112.62 nm;

the thickness L6 of the sixth low refractive index material layer satisfies: l6 is more than or equal to 184.51nm and less than or equal to 192.05 nm;

the thickness H6 of the sixth high refractive index material layer satisfies: h6 is not less than 109.04nm and not more than 113.50 nm.

6. The multi-film structure of claim 1, wherein the number of film layers is greater than or equal to 13 and less than or equal to 37; the thickness of any film layer is greater than or equal to 1nm and less than or equal to 206 nm.

7. The multi-film structure of claim 6, wherein the plurality of film layers comprises eighteen layers of high refractive index material and nineteen layers of low refractive index material.

8. The multi-film structure of claim 1, wherein the transparent metal oxide comprises niobium pentoxide or titanium dioxide.

9. A display panel comprising the multi-film layer structure according to any one of claims 1 to 8.

10. The display panel of claim 9, further comprising a substrate base plate, a display medium, and a cover plate, the display medium being located between the substrate base plate and the cover plate; the multi-film layer structure is positioned on one side of the cover plate, which is far away from the substrate base plate.

11. The display panel of claim 10, wherein the film layer furthest from the cover sheet is a low refractive index material layer.

12. The display panel according to claim 10, further comprising a backlight module, a first polarizer, a second polarizer, a color resistor, and a black matrix;

the first polarizer is located on one side, far away from the display medium, of the substrate base plate, the backlight module is located on one side, far away from the substrate base plate, of the first polarizer, the color resistor and the black matrix are located between the display medium and the second polarizer, and the second polarizer is located between the color resistor and the black matrix and the cover plate.

13. The display panel according to claim 9, further comprising a touch functional layer; and in the light emitting direction of the display panel, the multi-film layer structure is positioned above the touch control functional layer.

14. A display device characterized by comprising the display panel according to any one of claims 9 to 13.

15. A window comprising the multi-film structure of any one of claims 1 to 8, and a substrate, wherein the multi-film structure is fixed to the substrate, and the substrate has a transmittance in the visible light band greater than a predetermined value.

Technical Field

The present invention relates to display technologies, and in particular, to a multi-film structure, a display panel, a display device, and a window.

Background

With the development of scientific technology and the progress of society, people increasingly depend on the aspects of information communication and transmission, and display devices as main carriers and material bases for information exchange and transmission become hot spots of research of many scientists.

In order to increase the transmittance of visible light, a reflection reducing film is generally provided in a display device, but the reflection reducing film has no effects of preventing ultraviolet rays and insulating heat (reflecting infrared rays). A sunshade film that can prevent ultraviolet rays and insulate heat cannot have good transmittance in a visible light band.

Disclosure of Invention

The embodiment of the invention provides a multi-film layer structure, a display panel, a display device and a window, which are used for realizing high reflectivity of an ultraviolet band, high reflectivity of an infrared band and low reflectivity of a visible band.

In a first aspect, an embodiment of the present invention provides a multi-film structure, including a plurality of film layers, where the film layers include a plurality of high refractive index material layers and a plurality of low refractive index material layers, the high refractive index material layers and the low refractive index material layers are arranged at intervals one by one, and a refractive index of the high refractive index material layer is greater than a refractive index of the low refractive index material layer;

the number of the film layers is greater than or equal to 8, the high-refractive-index material layer comprises transparent metal oxide, and the low-refractive-index material layer comprises magnesium fluoride.

In a second aspect, an embodiment of the present invention provides a display panel, including the multi-film layer structure described in the first aspect.

In a third aspect, an embodiment of the present invention provides a display device, including the display panel of the second aspect.

In a fourth aspect, an embodiment of the present invention provides a window, including the multi-film structure of the first aspect, and a substrate, where the multi-film structure is fixed on the substrate, and a transmittance of the substrate in a visible light band is greater than a preset value.

In an embodiment of the present invention, the multi-film structure includes at least 8 film layers. The high-refractive-index material layers and the low-refractive-index material layers are arranged at intervals one by one, the high-refractive-index material layers comprise transparent metal oxide, and the low-refractive-index material layers comprise magnesium fluoride. The refractive index difference between the high refractive index material layer and the low refractive index material layer is large, so that the ultraviolet light waveband high reflectivity, the infrared light waveband high reflectivity and the visible light waveband low reflectivity are achieved.

Drawings

FIG. 1 is a reflectance spectrum of a antireflection film in a prior art design;

FIG. 2 is a reflectance spectrum of a solar control film of the prior art design;

FIG. 3 is a schematic diagram of a multi-film structure according to an embodiment of the present invention;

FIG. 4 is a reflectance spectrum of the multi-layer structure shown in FIG. 3;

FIG. 5 is a schematic view of a multi-film structure according to an embodiment of the present invention;

FIG. 6 is a reflectance spectrum of the multi-film structure shown in FIG. 5;

FIG. 7 is a schematic view of a multi-film structure according to an embodiment of the present invention;

FIG. 8 is a reflectance spectrum of the multi-film layer structure shown in FIG. 7;

FIG. 9 is a schematic view of a multi-film structure provided in accordance with an embodiment of the present invention;

FIG. 10 is a reflectance spectrum of the multi-film layer structure shown in FIG. 9;

FIG. 11 is a spectrum of a reflectivity envelope for the multi-film structure shown in FIG. 7;

FIG. 12 is a graph of a transmission envelope spectrum of magnesium fluoride;

FIG. 13 is a reflectance spectrum of another multi-layer structure provided in accordance with an embodiment of the present invention;

FIG. 14 is a reflectance spectrum of another multi-layer structure provided in accordance with an embodiment of the present invention;

FIG. 15 is a reflectance spectrum of another multi-layer structure provided in accordance with an embodiment of the present invention;

FIG. 16 is a transmission spectrum of another multiple film layer structure provided by embodiments of the present invention;

FIG. 17 is a reflectance spectrum of another multi-layer structure provided in accordance with an embodiment of the present invention;

FIG. 18 is a reflectance spectrum of the multi-film layer structure shown in FIG. 17;

fig. 19 is a schematic structural diagram of a display panel according to an embodiment of the present invention;

fig. 20 is a schematic structural diagram of a display device according to an embodiment of the invention;

fig. 21 is a schematic structural diagram of a window according to an embodiment of the present invention.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.

Fig. 1 is a reflectivity spectrum of a reflection reducing film in the prior art, and referring to fig. 1, an ultraviolet region refers to an ultraviolet light band, a visible light region refers to a visible light band, an infrared region refers to an infrared light band, and specifically, a near-infrared light band. Illustratively, the wavelength range of the ultraviolet region is 300nm to 400nm, the wavelength range of the visible region is 400nm to 800nm, and the wavelength range of the infrared region is 800nm to 1100 nm. It should be noted that the wavelength division of the infrared region, the visible light region and the ultraviolet region is not unique and definite, and the wavelength division of the infrared region, the visible light region and the ultraviolet region is commonly used in the art, and on the basis of the above-mentioned band division, it is acceptable to move the endpoint value of the wavelength range up and down by a certain small range, and the overall trend of the reflectivity and/or the transmissivity in the infrared region, the visible light region and the ultraviolet region is not affected. Another wavelength division in the infrared, visible and ultraviolet regions may be, for example: the wavelength range of the ultraviolet region is 300 nm-380 nm, the wavelength range of the visible light region is 380 nm-780 nm, and the wavelength range of the infrared region is 780 nm-1100 nm. As can be seen from fig. 1, the antireflection film in the prior art has low reflectance in the ultraviolet region and the infrared region, but has no efficacy in preventing ultraviolet rays and insulating heat (reflecting infrared rays).

Fig. 2 is a reflectivity spectrum diagram of a sunshade in the prior art, and referring to fig. 2, the average reflectivity of the sunshade in the prior art is greater than 8% in the visible light region, and the reflectivity of the sunshade in almost all wavelength positions of the entire visible light region is greater than 8%, and the reflectivity of the sunshade in the prior art is higher in the visible light region, and the sunshade cannot have good transmissivity in the visible light band. Referring to fig. 1 and 2 in combination, a multi-film structure having high reflectivity in an ultraviolet light band, high reflectivity in an infrared light band, and low reflectivity in a visible light band has not been realized in the prior art. It should be further noted that if a antireflection film and a sunshade film are used in a laminated manner, not only two film layers are required, and thus a separate manufacturing process of the two film layers and a laminating process of the two film layers are required, but also, more importantly, the advantages of the antireflection film and the sunshade film are not simply combined with the advantages of the sunshade film laminated manner after the antireflection film and the sunshade film are used, or the defects of the antireflection film and the defects of the sunshade film laminated manner are simply combined, so that the spectrum of a plurality of film layers after the laminated manner is used is not predictable due to optical effects such as multiple reflection, refraction or scattering between the film layers. This is further described in more detail below with reference to specific examples.

Fig. 3 is a schematic view of a multi-film structure according to an embodiment of the present invention, and referring to fig. 3, the multi-film structure includes a plurality of film layers, the plurality of film layers includes a plurality of high refractive index material layers 20 and a plurality of low refractive index material layers 10, the plurality of high refractive index material layers 20 and the plurality of low refractive index material layers 10 are arranged at intervals one by one, and a refractive index of the high refractive index material layer 20 is greater than a refractive index of the low refractive index material layer 10. The number of the film layers is greater than or equal to 8, the high refractive index material layer 20 comprises a transparent metal oxide, and the low refractive index material layer 10 comprises magnesium fluoride.

Fig. 4 is a reflectance spectrum diagram of the multi-film structure shown in fig. 3, and alternatively, referring to fig. 3 and 4, the plurality of high refractive index material layers 20 includes a first high refractive index material layer 21, a second high refractive index material layer 22, a third high refractive index material layer 23, and a fourth high refractive index material layer 24, which are sequentially stacked. The plurality of low refractive index material layers 10 include a first low refractive index material layer 11, a second low refractive index material layer 12, a third low refractive index material layer 13, and a fourth low refractive index material layer 14, which are sequentially stacked. The first high refractive index material layer 21 is located between the first low refractive index material layer 11 and the second low refractive index material layer 12. The design parameters of the reflectivity spectrum shown in fig. 4 are: the thickness L1 of the first low refractive index material layer 11 was 93.64nm, the thickness H1 of the first high refractive index material layer 21 was 94.96nm, the thickness L2 of the second low refractive index material layer 12 was 180.72nm, the thickness H2 of the second high refractive index material layer 22 was 119.4nm, the thickness L3 of the third low refractive index material layer 13 was 179.14nm, the thickness H3 of the third high refractive index material layer 23 was 109.24nm, the thickness L4 of the fourth low refractive index material layer 14 was 187.88nm, and the thickness H4 of the fourth high refractive index material layer 24 was 98.18 nm. Under this parametric design, referring to fig. 4, the multi-film layer structure has an average reflectance of more than 70% in the ultraviolet region, less than 3.72% in the visible region, and more than 75% in the infrared region. Compared with the traditional design of the antireflection film, the multi-film structure in the embodiment of the invention has higher reflectivity in the ultraviolet region and the infrared region. Compared with the sun-shading film in the existing design, the multi-film structure in the embodiment of the invention has lower reflectivity in a visible light region, thereby having high reflectivity of an ultraviolet light band, high reflectivity of an infrared light band and low reflectivity of a visible light band.

In an embodiment of the present invention, the multi-film structure includes at least 8 film layers. The plurality of high refractive index material layers 20 and the plurality of low refractive index material layers 10 are arranged at intervals one by one, the high refractive index material layers 20 comprise transparent metal oxide, and the low refractive index material layers 10 comprise magnesium fluoride. The refractive index difference between the high refractive index material layer 20 and the low refractive index material layer 10 is large, so that high reflectivity of an ultraviolet light waveband, high reflectivity of an infrared light waveband and low reflectivity of a visible light waveband are achieved.

It should be further noted that the reflectivity of the multi-film layer structure in various wavelength bands (e.g., ultraviolet, visible, and infrared) and various wavelengths (e.g., 350nm, 700nm, etc.) is related to a combination of factors, and that changing any one of the factors results in a change in the reflectivity spectrum of the multi-film layer structure, and the factors are combined and act together. Illustratively, factors affecting the reflectivity of the multi-film layer structure at various wavelength bands and wavelengths include: the number of layers, the material of each layer, and the thickness of each layer.

Optionally, in the multi-film structure, the number of the film layers is greater than or equal to 8 and less than or equal to 12. The thickness of any film layer is greater than or equal to 10nm and less than or equal to 200 nm. The effect of combining high reflectivity of an ultraviolet light wave band, high reflectivity of an infrared light wave band and low reflectivity of a visible light wave band cannot be realized due to the fact that the number of the film layers is too small, and the design difficulty can be remarkably increased along with the increase of the number of the film layers. On one hand, when more films exist, the films with the thickness less than 10nm are easy to appear, and the existing film processes (such as vapor deposition and the like) are difficult to realize the films with the thickness less than 10nm and are incompatible with the existing film processes; on the other hand, when there are many film layers, the film layer cannot be manufactured according to the pre-designed value, but the film layer needs to be manufactured while measuring the previous film layer, and then a new film layer is formed, so that the manufacturing process is complex, and the manufacturing difficulty is very high. In the embodiment of the invention, the number of the arranged film layers is more than or equal to 8 and less than or equal to 12, and the thickness of any film layer is more than or equal to 10nm and less than or equal to 200nm, so that the manufacturing difficulty of the multi-film-layer structure is reduced.

Generally, the greater the number of film layers, the easier it is to achieve high reflectance in the ultraviolet band, high reflectance in the infrared band, and low reflectance in the visible band. Furthermore, the number of the film layers can be set to be greater than or equal to 9 and less than or equal to 12, and the thickness of any film layer is greater than or equal to 10nm and less than or equal to 200nm, so as to further improve the reflectivity of the ultraviolet light band and the infrared light band and further reduce the reflectivity of the visible light band.

Fig. 5 is a schematic view of a multi-film structure according to an embodiment of the present invention, and referring to fig. 5, the plurality of high refractive index material layers 20 include a first high refractive index material layer 21, a second high refractive index material layer 22, a third high refractive index material layer 23, and a fourth high refractive index material layer 24, which are sequentially stacked. The plurality of low refractive index material layers 10 include a first low refractive index material layer 11, a second low refractive index material layer 12, a third low refractive index material layer 13, a fourth low refractive index material layer 14, and a fifth low refractive index material layer 15, which are sequentially stacked. The first high refractive index material layer 21 is located between the first low refractive index material layer 11 and the second low refractive index material layer 12. The thickness L1 of the first low refractive index material layer 11 satisfies: l1 is not less than 119.42nm and not more than 124.30 nm. The thickness H1 of the first high refractive-index material layer 21 satisfies: h1 is more than or equal to 18.71nm and less than or equal to 20.27 nm. The thickness L2 of the second low refractive index material layer 22 satisfies: l2 is not less than 191.11nm and not more than 198.91 nm. The thickness H2 of the second high refractive-index material layer 22 satisfies: h2 is not less than 116.56nm and not more than 121.32 nm. The thickness L3 of the third low refractive index material layer 13 satisfies: l3 is not less than 185.17nm and not more than 192.73 nm. The thickness H3 of the third high refractive-index material layer 23 satisfies: h3 is more than or equal to 102.09nm and less than or equal to 106.25 nm. The thickness L4 of the fourth low refractive-index material layer 14 satisfies: l4 is not less than 189.20nm and not more than 196.92 nm. The thickness H4 of the fourth high refractive-index material layer 24 satisfies: h4 is not less than 99.95nm and not more than 104.03 nm. The thickness L5 of the fifth low refractive index material layer 15 satisfies: l5 is not less than 181.43nm and not more than 188.83 nm.

Fig. 6 is a reflectance spectrum of the multi-film structure shown in fig. 5, and optionally, with reference to fig. 5 and 6, the design parameters of the reflectance spectrum shown in fig. 6 are: l1-121.86 nm, H1-19.46 nm, L2-195.01 nm, H2-118.94 nm, L3-188.95 nm, H3-104.17 nm, L4-193.06 nm, H4-101.99 nm, and L5-185.13 nm. Under the parameter design, the average reflectivity of the multi-film layer structure in an ultraviolet region is more than 70%, the average reflectivity in a visible region is less than 4.8%, and the average reflectivity in an infrared region is more than 75%. Compared with the traditional design of the antireflection film, the multi-film structure in the embodiment of the invention has higher reflectivity in the ultraviolet region and the infrared region. Compared with the sun-shading film in the existing design, the multi-film structure in the embodiment of the invention has lower reflectivity in a visible light region, thereby having high reflectivity of an ultraviolet light band, high reflectivity of an infrared light band and low reflectivity of a visible light band.

It should be noted that although the average reflectance of the multi-film structure with 8 film layers in the visible light region is smaller than that of the multi-film structure with 9 film layers, the reflectance of the multi-film structure with 9 film layers in the entire visible light band is relatively balanced, and there is no peak with a relatively large reflectance. Illustratively, the multi-film structure of 9 films has a smaller reflectivity than the multi-film structure of 8 films between 550nm and 650nm, and the multi-film structure of 9 films has a smaller reflectivity than the multi-film structure of 8 films between 675nm and 775 nm. And the reflectivity of the multi-film structure with 9 film layers in an ultraviolet light wave band is higher than that of the multi-film structure with 8 film layers. Illustratively, the 9-film multi-film structure has a higher reflectivity at 310nm to 314nm than the 8-film multi-film structure. Therefore, the multi-film structure of 9 films is a more optimized design than the multi-film structure of 8 films.

In addition, although the reflectance spectrum shown in fig. 6 is a reflectance spectrum at a specific value point of a certain film layer, if the thickness of the film layer fluctuates within a certain small range, the influence on the reflectance spectrum is small. Exemplarily, the reflectance spectrum in fig. 6 is obtained at L1 ═ 121.86nm, but L1 satisfies: when the wavelength is L1 is not less than 119.42nm and not more than 124.30nm, the fluctuation of the reflectivity spectrum is small, the average reflectivity of the multi-film layer structure in an ultraviolet region is more than 70%, the average reflectivity in a visible region is less than 4.8%, and the average reflectivity in an infrared region is more than 75%. The effect of fluctuations in film thickness over a small range of fluctuations on the reflectivity spectrum is further described in more detail below with reference to specific examples. Illustratively, for a film layer after less than 10nm, the small fluctuation range may be ± 4% of its thickness. For a film layer greater than or equal to 10nm, the small fluctuation range may be ± 2% of its thickness.

Fig. 7 is a schematic view of a multi-film structure according to an embodiment of the present invention, and referring to fig. 7, the plurality of high refractive index material layers 20 include a first high refractive index material layer 21, a second high refractive index material layer 22, a third high refractive index material layer 23, a fourth high refractive index material layer 24, and a fifth high refractive index material layer 25, which are sequentially stacked. The plurality of low refractive index material layers 10 include a first low refractive index material layer 11, a second low refractive index material layer 12, a third low refractive index material layer 13, a fourth low refractive index material layer 14, and a fifth low refractive index material layer 15, which are sequentially stacked. The first high refractive index material layer 21 is located between the first low refractive index material layer 11 and the second low refractive index material layer 12. The thickness L1 of the first low refractive index material layer 11 satisfies: l1 is more than or equal to 82.56nm and less than or equal to 89.44 nm. The thickness H1 of the first high refractive-index material layer 21 satisfies: h1 is more than or equal to 40.94nm and less than or equal to 44.35 nm. The thickness L2 of the second low refractive index material layer 12 satisfies: l2 is not less than 22.71nm and not more than 24.60 nm. The thickness H2 of the second high refractive-index material layer 22 satisfies: h2 is more than or equal to 29.50nm and less than or equal to 31.95 nm. The thickness L3 of the third low refractive index material layer 13 satisfies: l3 is not less than 190.54nm and not more than 198.31 nm. The thickness H3 of the third high refractive-index material layer 23 satisfies: h3 is more than or equal to 103.56nm and less than or equal to 107.79 nm. The thickness L4 of the fourth low refractive-index material layer 14 satisfies: l4 is not less than 180.06nm and not more than 187.41 nm. The thickness H4 of the fourth high refractive-index material layer 24 satisfies: h4 is more than or equal to 100.88nm and less than or equal to 105.00 nm. The thickness L5 of the fifth low refractive index material layer 15 satisfies: l5 is more than or equal to 15.01nm and less than or equal to 16.26 nm. The thickness H5 of the fifth high refractive-index material layer 25 satisfies: h5 is more than or equal to 11.64nm and less than or equal to 12.61 nm.

Fig. 8 is a reflectance spectrum of the multi-film structure shown in fig. 7, and optionally, referring to fig. 7 and 8, the design parameters of the reflectance spectrum shown in fig. 8 are: l1-86.00 nm, H1-42.64 nm, L2-23.65 nm, H2-30.73 nm, L3-194.42 nm, H3-105.68 nm, L4-183.74 nm, H4-102.94 nm, L5-15.63 nm, and H5-12.12 nm. Under the parameter design, the average reflectivity of the multi-film layer structure in an ultraviolet region is more than 75%, the average reflectivity in a visible region is less than 1.8%, and the average reflectivity in an infrared region is more than 75%. Compared with the traditional design of the antireflection film, the multi-film structure in the embodiment of the invention has higher reflectivity in the ultraviolet region and the infrared region. Compared with the sun-shading film in the existing design, the multi-film structure in the embodiment of the invention has lower reflectivity in a visible light region, thereby having high reflectivity of an ultraviolet light band, high reflectivity of an infrared light band and low reflectivity of a visible light band.

It should be noted that the average reflectivity of the multi-film structure with 10 film layers in the visible light region is smaller than that of the multi-film structure with 9 film layers, and the reflectivity of the multi-film structure with 10 film layers in the whole visible light band is relatively balanced, and there is no peak with a relatively large reflectivity. The average reflectivity of the multi-film structure of 10 films in the infrared region and the ultraviolet region is larger than that of the multi-film structure of 9 films, the reflectivity of the multi-film structure of 10 films in the whole ultraviolet light wave band and the whole near infrared light wave band is relatively balanced, no wave peak with smaller reflectivity exists, and the reflectivity balance of the multi-film structure of 10 films in the ultraviolet light wave band is greatly improved. Therefore, the multi-film structure of 10 films is a more optimized design than the multi-film structure of 9 films.

Fig. 9 is a schematic view of a multi-film structure according to an embodiment of the present invention, and referring to fig. 9, the plurality of high refractive index material layers 20 include a first high refractive index material layer 21, a second high refractive index material layer 22, a third high refractive index material layer 23, a fourth high refractive index material layer 24, a fifth high refractive index material layer 25, and a sixth high refractive index material layer 26, which are sequentially stacked. The plurality of low refractive index material layers 10 include a first low refractive index material layer 11, a second low refractive index material layer 12, a third low refractive index material layer 13, a fourth low refractive index material layer 14, a fifth low refractive index material layer 15, and a sixth low refractive index material layer 16, which are sequentially stacked. The first high refractive index material layer 21 is located between the first low refractive index material layer 11 and the second low refractive index material layer 12. The thickness L1 of the first low refractive index material layer 11 satisfies: l1 is not less than 102.19nm and not more than 106.37 nm. The thickness H1 of the first high refractive-index material layer 21 satisfies: h1 is not less than 31.60nm and not more than 34.24 nm. The thickness L2 of the second low refractive index material layer 12 satisfies: l2 is more than or equal to 30.81nm and less than or equal to 33.37 nm. The thickness H2 of the second high refractive-index material layer 22 satisfies: h2 is more than or equal to 22.20nm and less than or equal to 24.04 nm. The thickness L3 of the third low refractive index material layer 13 satisfies: l3 is not less than 183.40nm and not more than 190.88 nm. The thickness H3 of the third high refractive-index material layer 23 satisfies: h3 is not less than 104.05nm and not more than 108.29 nm. The thickness L4 of the fourth low refractive-index material layer 14 satisfies: l4 is not less than 181.00nm and not more than 188.38 nm. The thickness H4 of the fourth high refractive-index material layer 24 satisfies: h4 is not less than 104.84nm and not more than 109.12 nm. The thickness L5 of the fifth low refractive index material layer 15 satisfies: l5 is not less than 178.20nm and not more than 185.48 nm. The thickness H5 of the fifth high refractive-index material layer 25 satisfies: h5 is not less than 108.20nm and not more than 112.62 nm. The thickness L6 of the sixth low refractive index material layer 16 satisfies: l6 is not less than 184.51nm and not more than 192.05 nm. The thickness H6 of the sixth high refractive-index material layer 26 satisfies: h6 is not less than 109.04nm and not more than 113.50 nm.

Fig. 10 is a reflectance spectrum of the multi-film layer structure shown in fig. 9, and alternatively, referring to fig. 9 and 10, the reflectance spectrum shown in fig. 10 has design parameters of: l1-104.28 nm, H1-32.92 nm, L2-32.09 nm, H2-23.12 nm, L3-187.14 nm, H3-106.17 nm, L4-184.69 nm, H4-106.98 nm, L5-181.84 nm, and H5-110.41 nm. L6-188.28 nm and H6-111.27 nm. Under the parameter design, the average reflectivity of the multi-film layer structure in an ultraviolet region is more than 75%, the average reflectivity in a visible region is less than 1.6%, and the average reflectivity in an infrared region is more than 75%. Compared with the traditional design of the antireflection film, the multi-film structure in the embodiment of the invention has higher reflectivity in the ultraviolet region and the infrared region. Compared with the sun-shading film in the existing design, the multi-film structure in the embodiment of the invention has lower reflectivity in a visible light region, thereby having high reflectivity of an ultraviolet light band, high reflectivity of an infrared light band and low reflectivity of a visible light band.

It should be noted that the average reflectivity of the multi-film structure with 12 film layers in the visible light region is smaller than that of the multi-film structure with 9 film layers, and the reflectivity of the multi-film structure with 12 film layers in the whole visible light band is relatively balanced, and no peak with a relatively large reflectivity exists. The average reflectivity of the multi-film structure of 12 films in the infrared region and the ultraviolet region is larger than that of the multi-film structure of 9 films, the reflectivity of the multi-film structure of 12 films in the whole ultraviolet light wave band and the whole near infrared light wave band is balanced, no wave peak with smaller reflectivity exists, and the balance of the reflectivity of the multi-film structure of 12 films in the ultraviolet light wave band is greatly improved. Therefore, the multi-film structure of 12 films is a more optimized design than the multi-film structure of 9 films. As a preferred embodiment, the number of the film layers may be set to 10, 11 or 12, at this time, the number of the film layers is moderate, and the thickness of any film layer may be controlled to be 10nm to 200nm, that is, the thickness of any film layer is greater than or equal to 10nm and less than or equal to 200nm, so that the existing equipment may be used to manufacture a multi-film structure without increasing the process difficulty. And the balance of the reflectivity in a near infrared band, a visible light band and an ultraviolet light band can be realized. In other embodiments, more than 12 film layers may also be used to form a multi-film layer structure.

Fig. 11 is a reflectance envelope spectrum of the multi-film structure shown in fig. 7, referring to fig. 7, 8 and 11, wherein "design value" refers to a design value of the reflectance spectrum shown in fig. 8, and the "design value" includes at least a thickness design value of any one of the film layers, that is: l1-86.00 nm, H1-42.64 nm, L2-23.65 nm, H2-30.73 nm, L3-194.42 nm, H3-105.68 nm, L4-183.74 nm, H4-102.94 nm, L5-15.63 nm, and H5-12.12 nm. The first envelope line and the second envelope line are obtained by splicing reflectivity results of single small wave bands in an ultraviolet region, a visible light region and an infrared region after fluctuating along with the thickness of the film layer, so that the maximum fluctuation range of a reflectivity spectrum can be caused after the fluctuation of the thickness of the film layer in a small range can be seen from the first envelope line and the second envelope line, and as can be seen from fig. 11, when the fluctuation of the thickness of the film layer in a certain small range, the influence on the reflectivity spectrum is small, and the ultraviolet light wave band high reflectivity, the infrared light wave band high reflectivity and the visible light wave band low reflectivity can be realized. In the embodiment of the present invention, the multi-film structure includes only 10 films, which is not limited to this.

Fig. 12 is a spectrum diagram of a transmittance envelope of magnesium fluoride, and referring to fig. 12, the transmittance of magnesium fluoride at each thickness is between a "third envelope" and a "fourth envelope", and a film layer formed of a simple magnesium fluoride material has a high transmittance in an ultraviolet band, that is, a low reflectance in the ultraviolet band. Therefore, a single material change cannot bring about a design required by an ultraviolet light band, a visible light band and an infrared light band, and as can be understood by those skilled in the art, the combination of materials with high and low refractive indexes, the combined use of the materials of the film layers, the thickness of the film layers (the reflectivity spectrum is sensitive to the thickness of the film layers), the number of the film layers and the like can realize the combination of high reflectivity of the ultraviolet light band, high reflectivity of the infrared light band and low reflectivity of the visible light band.

Fig. 13 is a reflectance spectrum of another multi-film structure provided in the embodiment of the present invention, fig. 14 is a reflectance spectrum of another multi-film structure provided in the embodiment of the present invention, fig. 15 is a reflectance spectrum of another multi-film structure provided in the embodiment of the present invention, fig. 16 is a transmittance spectrum of another multi-film structure provided in the embodiment of the present invention, and for convenience of description, referring to fig. 13 to fig. 16, a multi-film structure corresponding to the reflectance spectrum shown in fig. 13 is referred to as a first multi-film structure, a multi-film structure corresponding to the reflectance spectrum shown in fig. 14 is referred to as a second multi-film structure, a multi-film structure corresponding to the reflectance spectrum shown in fig. 15 is referred to as a third multi-film structure, and a multi-film structure corresponding to the transmittance spectrum shown in fig. 16 is referred to as a fourth multi-film structure. The fourth multi-film structure is a stacked structure of the first multi-film structure, the second multi-film structure and the third multi-film structure, and the second multi-film structure is located between the first multi-film structure and the third multi-film structure. Among them, the first multi-film layer structure can achieve a low reflectance in a visible region, but cannot achieve a high reflectance in an ultraviolet region and an infrared region. The second multi-film structure can achieve high reflectance in the infrared region, but cannot achieve low reflectance in the visible region, and cannot achieve high reflectance in the ultraviolet region. The third multi-film layer structure can realize high reflectivity in an ultraviolet region and low reflectivity in a visible region, but cannot realize high reflectivity in an infrared region. Although the fourth multi-film layer structure is a stacked structure of the first, second and third multi-film layer structures, the fourth multi-film layer structure has an average transmittance of more than 30% and an average reflectance of less than 70% in the ultraviolet region and the infrared region. The fourth multi-film layer structure has an average transmittance in the visible region of less than 80% and an average reflectance of greater than 20%. Due to optical effects such as multiple reflection, refraction or scattering between the film layers, spectra of the film layers after being overlapped and used are unpredictable, and the fourth multi-film structure cannot realize high reflectivity of an ultraviolet light waveband, high reflectivity of an infrared light waveband and low reflectivity of a visible light waveband.

Optionally, in the multi-film structure, the number of the film layers is greater than or equal to 13 and less than or equal to 37. The thickness of any film layer is greater than or equal to 1nm and less than or equal to 206 nm. In the embodiment of the invention, the number of the film layers is increased, so that the multi-film layer structure can realize high reflectivity in an ultraviolet region and an infrared region and realize low reflectivity in a visible region.

Fig. 17 is a schematic view of a multi-film structure according to an embodiment of the present invention, and referring to fig. 17, the multi-film structure includes eighteen high refractive index material layers 20 and nineteen low refractive index material layers 10. The plurality of high refractive index material layers 20 include a first high refractive index material layer 21, a second high refractive index material layer 22, a third high refractive index material layer 23, a fourth high refractive index material layer 24, a fifth high refractive index material layer 25, a sixth high refractive index material layer 26, a seventh high refractive index material layer 27, an eighth high refractive index material layer 28, a ninth high refractive index material layer 29, a tenth high refractive index material layer 210, an eleventh high refractive index material layer 211, a twelfth high refractive index material layer 212, a thirteenth high refractive index material layer 213, a fourteenth high refractive index material layer 214, a fifteenth high refractive index material layer 215, a sixteenth high refractive index material layer 216, a seventeenth high refractive index material layer 217, and an eighteenth high refractive index material layer 218, which are sequentially stacked. The plurality of low refractive index material layers 10 include a first low refractive index material layer 11, a second low refractive index material layer 12, a third low refractive index material layer 13, a fourth low refractive index material layer 14, a fifth low refractive index material layer 15, a sixth low refractive index material layer 16, a seventh low refractive index material layer 17, an eighth low refractive index material layer 18, a ninth low refractive index material layer 19, a tenth low refractive index material layer 110, an eleventh low refractive index material layer 111, a twelfth low refractive index material layer 112, a thirteenth low refractive index material layer 113, a fourteenth low refractive index material layer 114, a fifteenth low refractive index material layer 115, a sixteenth low refractive index material layer 116, a seventeenth low refractive index material layer 117, an eighteenth low refractive index material.

Fig. 18 is a reflectance envelope spectrum diagram of the multi-film structure shown in fig. 17, and referring to fig. 17 and 18, nineteen low refractive index material layers 10 of the first to nineteenth low refractive index material layers 11 to 119 have thicknesses of L1, L2, L3, L4, L5, L6, L7, L8, L9, L10, L11, L12, L13, L14, L15, L16, L17, L18, and L19, respectively. The eighteenth high refractive-index material layers 20 of the first to eighteenth high refractive-index material layers 21 to 218 have thickness distributions of H1, H2, H3, H4, H5, H6, H7, H8, H9, H10, H11, H12, H13, H14, H15, H16, H17, and H18. The design parameters are as follows: l1, H1, L1, H1, L1, H1, L1, H1, L1, H1, L1, H1, L3639, L1, L3660, L1, H1, L3639, L1, H38, L1, H38, L1, H38, L1, H38, L1, H38, L3660, L1, H38, L1, H38. Under the parameter design, the average reflectivity of the multi-film layer structure in the ultraviolet region is more than 99 percent (close to 100 percent), the average reflectivity in the visible region is less than 0.5 percent, and the average reflectivity in the infrared region is more than 99 percent (close to 100 percent). Compared with the traditional design of the antireflection film, the multi-film structure in the embodiment of the invention has higher reflectivity in the ultraviolet region and the infrared region. Compared with the sun-shading film in the existing design, the multi-film structure in the embodiment of the invention has lower reflectivity in a visible light region, thereby having high reflectivity of an ultraviolet light band, high reflectivity of an infrared light band and low reflectivity of a visible light band.

Optionally, the transparent metal oxide comprises niobium pentoxide or titanium dioxide. The refractive indexes of the niobium pentoxide and the titanium dioxide are higher, so that the refractive index difference between the niobium pentoxide and the titanium dioxide and the magnesium fluoride is larger, and the better design effect can be realized under fewer film layers. In other embodiments, the transparent metal oxide may further include other materials besides niobium pentoxide and titanium dioxide, which is not limited by the embodiment of the present invention.

Fig. 19 is a schematic structural diagram of a display panel according to an embodiment of the present invention, and referring to fig. 19, the display panel includes a multi-film layer structure 46 in the above-described embodiment, therefore, the multi-film structure 46 of the display panel in the embodiment of the invention can realize high reflectivity of ultraviolet light band, high reflectivity of infrared light band and low reflectivity of visible light band, the multi-film structure 46 may thus have a relatively high transmission of visible light exiting the display panel, has high reflectivity to ultraviolet light (ultraviolet light) and infrared light (infrared light) in the external environment light, thereby prevent that the ultraviolet ray in the external environment light from causing the damage to display panel internal device, also can prevent that the infrared light in the external environment light from shining to display panel is inside to cause and generates heat, have thermal-insulated effect to display panel's display quality has been improved and display panel's life has been prolonged.

Optionally, referring to fig. 19, the display panel further includes a substrate base plate 30, a display medium 50, and a cover plate 45, the display medium 50 being located between the substrate base plate 30 and the cover plate 45. The multi-film structure 46 is located on the side of the cover plate 45 away from the substrate base plate 30. Since almost all the devices in the display panel are located on the side of the cover plate 45 close to the substrate 30, in the embodiment of the present invention, the multi-film structure 46 is located on the side of the cover plate 45 away from the substrate 30, so that the multi-film structure 46 can protect almost all the devices in the display panel from the ultraviolet light and the infrared light in the external environment light.

Exemplarily, referring to fig. 19, the display medium 50 includes a plurality of liquid crystal molecules, and the display panel is a liquid crystal display panel. In other embodiments, the display panel may also be an organic light emitting display panel, for example. When the display panel is an organic light emitting display panel, the display medium 50 may include an organic light emitting material layer.

Alternatively, referring to fig. 3-19 in combination, in the multi-film structure 46 of the display panel, the film layer farthest from the cover plate 45 is the low refractive index material layer 10. Illustratively, in the multi-film layer structure 46, the film layer farthest from the cover plate 45 is the first low refractive index material layer 11. In the embodiment of the present invention, the film layer farthest from the cover plate 45 is the low refractive index material layer 10, and the low refractive index material layer 10 includes magnesium fluoride, so that fingerprints can be prevented from being left after a touch subject such as a finger touches the display panel.

Optionally, referring to fig. 19, the display panel further includes a backlight module 60, a first polarizer 35, a second polarizer 41, a color resistor 49, and a black matrix 47. The first polarizer 35 is located on the side of the substrate 30 away from the display medium 50, the backlight module 60 is located on the side of the first polarizer 35 away from the substrate 30, the color resistor 49 and the black matrix 47 are located between the display medium 50 and the second polarizer 41, and the second polarizer 41 is located between the color resistor 49 and the black matrix 47 and the cover plate 45. In the embodiment of the invention, the backlight module 60, the first polarizer 35, the second polarizer 41, the color resistor 49 and the black matrix 47 all comprise organic materials, and the organic materials are more easily damaged when being irradiated by ultraviolet rays. In the embodiment of the present invention, the backlight module 60, the first polarizer 35, the second polarizer 41, the color resistor 49, and the black matrix 47 are all located on one side of the cover plate 45 away from the multi-film structure 46, so that the multi-film structure 46 can prevent ultraviolet rays in the external ambient light from irradiating the backlight module 60, the first polarizer 35, the second polarizer 41, the color resistor 49, and the black matrix 47, and provide ultraviolet protection for the backlight module 60, the first polarizer 35, the second polarizer 41, the color resistor 49, and the black matrix 47.

Optionally, referring to fig. 19, the display panel further includes a touch functional layer 43. The touch function layer 43 may include a self-capacitance touch electrode or a mutual capacitance touch electrode. The multi-film structure 46 is located above the touch functional layer 43 along the light emitting direction of the display panel. In the embodiment of the present invention, the display panel further includes a touch functional layer 43, so that the display panel can implement a touch function. In the light emitting direction of the display panel, the multi-film structure 46 is located above the touch functional layer 43, so that the multi-film structure 46 can prevent ultraviolet rays and infrared rays in the external environment light from irradiating the touch functional layer 43.

Exemplarily, referring to fig. 19, the touch function layer 43 is located between the second polarizer 41 and the cover plate 45. The display panel may further include a gate insulating layer 31, an interlayer insulating layer 32, a planarization layer 33, and an electrode insulating layer 34 sequentially disposed along the base substrate 30 toward the display medium 50. The display panel may further include a thin film transistor 36, a common electrode 37, and a pixel electrode 38. The thin film transistor includes a gate electrode, a source electrode, a drain electrode, and a semiconductor layer. The gate insulating layer 31 is located between the gate electrode and the semiconductor layer, the interlayer insulating layer 32 is located between the gate electrode and the source electrode, the source electrode and the drain electrode are disposed on the same layer, and the planarization layer is located between the source electrode and the common electrode 37. The electrode insulating layer 34 is located between the common electrode 37 and the pixel electrode 38. The display panel may further include an opposite substrate 40, a first optical glue layer 42, a second optical glue layer 44, and support posts 48. The opposite substrate 40 is positioned between the second polarizer 41 and the black matrix 47. The first optical adhesive layer 42 is located between the second polarizer 41 and the touch functional layer 43. The second optical adhesive layer 44 is located between the cover plate 45 and the touch functional layer 43. The support posts 48 are located between the black matrix 47 and the color resistors 49 and the display medium 50.

Fig. 20 is a schematic structural diagram of a display device according to an embodiment of the present invention, and referring to fig. 20, the display device includes the display panel in the above embodiment. The display device can be a mobile phone, a tablet computer, an intelligent wearable device and the like.

Fig. 21 is a schematic structural diagram of a window according to an embodiment of the present invention, and referring to fig. 21, the window according to the embodiment of the present invention includes the multi-film structure and the substrate according to the above embodiment, the multi-film structure is fixed on the substrate, and the transmittance of the substrate in the visible light band is greater than a predetermined value. The preset value can be, for example, 90%, 95% or 99%. That is, the substrate has high light transmittance in the visible light band, and the substrate is a transparent substrate, and the substrate can be made of a transparent material such as glass. In the embodiment of the invention, the window comprises the multi-film layer structure in the embodiment, so that the window has high reflectivity of an ultraviolet light waveband, high reflectivity of an infrared light waveband and low reflectivity of a visible light waveband.

Illustratively, referring to fig. 21, the window is a vehicle window 100, and the vehicle window 100 includes a substrate and a multi-film structure, the multi-film structure may be attached to the outer side of the substrate, which is the vehicle window glass in the embodiment of the present invention. Because window 100 includes the multilayer film structure, consequently, window 100 can reflect the infrared light wave band in the ambient light on the one hand, in order to prevent that the light of infrared light wave band from shining to the car, thermal-insulated effect has been reached, on the other hand, window 100 can reflect the purple light wave band in the ambient light, prevent that the light of purple light wave band from shining to the car in, the effect of protecting interior equipment of car and improving interior equipment ageing resistance performance has been reached, on the other hand, window 100 is low at visible light wave band reflectivity, the light transmittance of visible light wave band has been improved, the sight definition has been improved. In other embodiments, the window may also be an exterior architectural window, in which case the substrate is exterior architectural wall glass and the exterior architectural window includes a multi-layer structure.

It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious modifications, rearrangements, combinations and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.