阅读说明：本技术 图案的形成方法以及压印装置 (Pattern forming method and imprint apparatus ) 是由 黑宫未散 于 2020-01-22 设计创作，主要内容包括：本发明提供能够获得良好的转印精度的图案的形成方法以及压印装置。该图案的形成方法包括：填充工序,其将被转印体从上方按压于涂覆有转印材料的模具,在所述被转印体与所述模具之间填充转印材料；固化工序,其利用UV照射使被填充的所述转印材料在被转印体上固化；以及脱模工序,其使固化了所述转印材料的所述被转印体从所述模具脱模,在所述固化工序中,对所述模具的从图案尺寸较小的区域切换到平坦部的部位或者从所述图案尺寸较小的区域切换到图案尺寸较大的区域的部位中的所述图案尺寸较小的部位的终端部即切换部进行冷却,在所述脱模工序中,加热所述切换部。(The invention provides a pattern forming method and an imprint apparatus capable of obtaining good transfer precision. The method for forming the pattern comprises the following steps: a filling step of pressing a transfer object against a mold coated with a transfer material from above, and filling the transfer material between the transfer object and the mold; a curing step of curing the filled transfer material on the transfer object by UV irradiation; and a mold releasing step of releasing the transferred object in which the transfer material is solidified from the mold, wherein in the solidifying step, a switching portion that is an end portion of a portion of the mold that is smaller in pattern size, among a portion that is switched from a region with a smaller pattern size to a flat portion or a portion that is switched from the region with the smaller pattern size to a region with a larger pattern size, is cooled, and in the mold releasing step, the switching portion is heated.)

1. A method for forming a pattern, wherein,

the method for forming the pattern comprises the following steps:

a filling step of pressing a transfer object against a mold coated with a transfer material from above, and filling the transfer material between the transfer object and the mold;

a curing step of curing the filled transfer material on the transfer object by UV irradiation; and

a mold releasing step of releasing the transferred object in which the transfer material is solidified from the mold,

in the curing step, a switching portion, which is an end portion of the small pattern size portion, of a portion of the mold that switches from the small pattern size region to the flat portion or a portion that switches from the small pattern size region to the large pattern size region, is cooled,

in the mold releasing step, the switching unit is heated.

2. The method of forming a pattern according to claim 1,

in the solidification step, the cooling is performed based on the rotation speed of the rotating mold.

3. The method of forming a pattern according to claim 1 or 2,

in the curing step, cooling is performed from the mold side toward the switching portion.

4. The method of forming a pattern according to claim 3,

in the curing step, cooling is performed from a direction facing the UV irradiation toward the switching portion.

5. The method of forming a pattern according to any one of claims 1 to 4,

in the curing step, a region of at least 50 μm including the switching portion is cooled.

6. The method of forming a pattern according to claim 5,

in the curing step, a region including both the switching portion and a region 50 μm before the switching portion is cooled.

7. The method of forming a pattern according to claim 5 or 6,

in the curing step, the region is cooled to 20 degrees or more and 25 degrees or less.

8. The method of forming a pattern according to any one of claims 1 to 6,

in the mold releasing step, the heating is performed based on the rotation speed of the rotating mold.

9. The method of forming a pattern according to any one of claims 1 to 7,

in the mold releasing step, the mold is heated from the mold side toward the switching portion.

10. The method of forming a pattern according to claim 9,

in the mold releasing step, heating is performed from a direction facing the UV irradiation toward the switching portion.

11. The method of forming a pattern according to any one of claims 1 to 10,

in the mold-releasing step, a region of at least 50 μm including the switching portion is heated.

12. The method of forming a pattern according to claim 11,

in the mold-releasing step, a region including both the switching portion and a region 50 μm before the switching portion is heated.

13. The method of forming a pattern according to claim 11 or 12,

in the curing step, the region is heated to 35 degrees or more and 40 degrees or less.

14. An imprint apparatus, wherein a substrate is placed on a substrate,

the imprint apparatus includes:

a roller;

a mold disposed on the surface of the roller and having a pattern filled with a transfer material;

a curing device that cures the transfer material filled in the mold on a transfer object by UV irradiation; and

and a temperature control device that is disposed below a switching portion that is a terminal end portion of a portion of the mold that is smaller in pattern size, the portion being switched from a region with a smaller pattern size to a flat portion, or the portion being switched from the region with the smaller pattern size to a region with a larger pattern size.

15. The imprint apparatus according to claim 14, wherein,

the temperature control device is disposed inside the roller.

16. The imprint apparatus according to claim 14 or 15, wherein,

the temperature control device controls the temperature based on the rotation speed of the roller.

17. The imprint apparatus according to claim 16, wherein,

the temperature control device cools the transfer material at a timing when the switching portion enters a UV irradiation range of the curing device.

18. The imprint apparatus according to claim 17, wherein,

the temperature control device cools the switching unit to 20 degrees or more and 25 degrees or less at a timing when the switching unit enters the UV irradiation range of the curing device.

19. The imprint apparatus according to any one of claims 16 to 18,

the temperature control device heats the transfer material when the switching unit passes through the UV irradiation range.

20. The imprint apparatus according to claim 19, wherein,

the temperature control device heats the switching unit to 35 degrees or more and 40 degrees or less at a timing when the switching unit passes the UV irradiation range.

Technical Field

The present disclosure relates to a pattern forming method using an imprint technique and an imprint apparatus.

Background

(background of imprint technique, applicable field)

In recent years, in optical parts for goods for display, illumination, and the like, it is desired to realize the following devices: by forming a nano (nm) to micro (μm) fine pattern exhibiting special optical characteristics, a new function of controlling reflection and diffraction of light, which has not been achieved before, is exhibited. Further, in semiconductors such as system LSIs, miniaturization of wiring accompanied by high integration is also desired. As a method for forming such a fine structure, in addition to a photolithography technique and an electron beam exposure technique, an imprint technique has recently been attracting attention.

The imprint technique is a method of forming a microstructure by pressing a mold, which has a surface processed with a fine shape in advance, against a resin applied to a surface of a base material.

As the imprint method, a thermal imprint method of transferring a shape by pressing a thermoplastic resin applied to a surface of a substrate against a mold heated to a glass transition temperature or higher and a UV imprint method of transferring a shape by irradiating UV light in a state of being pressed against the mold with a UV curable resin are generally employed. The hot stamping method has a characteristic that the selectivity of the material is wide, but has a problem that productivity is low because the temperature of the mold is required to be raised and lowered when the shape is transferred. On the other hand, the UV imprint method is limited to materials cured by ultraviolet rays, and therefore has a narrower selectivity than the thermal imprint method, but since curing can be completed within several seconds to several tens of seconds, productivity is very high. The thermal imprint method and the UV imprint method are different depending on the device to be used, but the UV imprint method is considered to be suitable as a mass production method without causing problems due to materials.

(imprint method by UV imprint method)

Next, as an imprint method for forming a pattern by the UV imprint method, a flat plate imprint method is generally used.

In addition, when the target substrate is a film such as PET, there are also a roll-to-roll imprinting method: it is expected that productivity will be further improved by transferring a microstructure onto a film while conveying the film using a roller with a mold having a fine shape formed on the surface.

(plate type imprinting method)

A general process flow when forming a pattern by the flat imprint method will be described below with reference to fig. 2.

FIG. 2 is a schematic view of a general plate imprint process.

First, as shown in step (a) of fig. 2, a substrate 204 to be processed is prepared on a table 201, and a transfer material 203 is applied using a dispenser, ink jet, or the like.

Next, as shown in step (b) of fig. 2, the uneven pattern of the mold 202 having the pattern to be transferred is brought into contact with the transfer material 203 on the work substrate 204 and pressed by the roller 205. Further, as shown in step (c) of fig. 2, UV is irradiated from a UV irradiator 206 while pressing the mold 202, and the photocurable resin is cured to form a cured transfer material 203.

Next, as shown in step (d) of fig. 2, the mold 202 is moved obliquely upward or vertically with respect to the work base 204, and is released from the cured transfer material 203. After the mold release, a transfer pattern formed of the transfer material 203 is formed on the work substrate 204.

(roll-to-roll imprinting method)

Next, a general method for forming a pattern by a roll-to-roll imprinting method will be described below with reference to fig. 3.

Fig. 3 is a schematic view of a general roll-to-roll imprinting method.

First, a transfer material 303 is extruded and coated from a die (die)307 onto a continuously advancing film 304. Next, the film 304 passes between a roller 305 provided with a mold 302 having a fine shape on the surface thereof and a pressure roller 309 pressed against the roller 305 with a predetermined pressure, and the transfer material 303 is filled in the fine shape of the mold 302. Next, by irradiating UV light from the UV irradiator 306 to the mold 302, the transfer material 303 is cured in a state of being filled in the fine shape of the mold 302. Finally, the film 304 passes between the mold release roller 308 and the roller 305, and travels along the mold release roller 308, whereby the film is released from the mold 302, and a fine shape is formed on the film 304.

The above-described embodiment is an embodiment in which a fine shape is formed on one side surface of a film substrate. When a fine shape is required on the other surface as well, for example, a method of preparing two steps having the same configuration as described above and reversing the thin film between the steps is conceivable. In this case, the relative positional accuracy of the fine shapes formed on both surfaces of the film base is required.

In each of the above-described imprint methods, when the mold is released from the cured transfer material as shown in fig. 2 (d) and 3, pattern defects such as surface corner portions of the transfer pattern are broken and the transfer accuracy deteriorates at the end of the region having a small pattern size where the region having a small pattern size is switched from the region having a small pattern size to the flat portion or the region having a large pattern size as shown in fig. 4 (a) and (b). Such pattern defects frequently occur in a mold, particularly when a metal mold typified by Ni or the like is used.

As one of the main causes, the following is known: when the mold is released from a region of the mold having a small pattern size to a flat portion or a region having a large pattern size, the mold release speed is rapidly increased in the vicinity of the boundary thereof, and a large mold release resistance is rapidly applied to the terminal end portion of the region having a small pattern size, thereby generating a pattern defect.

In order to solve the above problem, for example, a method of adjusting the exposure amount of UV light for each pattern is known as described in patent document 1. In patent document 1, in the region having a small pattern size and a high mold release resistance, the UV exposure amount is made smaller than the UV exposure amount in the flat portion or the region having a large pattern size and a low mold release resistance to reduce the degree of curing of the transfer material, thereby facilitating mold release of the region having a small pattern size, and suppressing rapid increase in mold release speed near the boundary thereof and rapid application of a large mold release resistance to the terminal end portion of the region having a small pattern size. As a result, it is possible to suppress the occurrence of pattern defects at the terminal end of the region having a small pattern size, and to obtain good transfer accuracy.

Prior art documents

Patent document

Patent document 1: japanese patent laid-open publication No. 2011-181548

Disclosure of Invention

Problems to be solved by the invention

As described above, as a conventional imprint method, there has been proposed a method of suppressing occurrence of a pattern defect at the terminal end of a region having a small pattern size at a portion where a region having a small pattern size is switched to a flat portion or a region having a large pattern size by adjusting the exposure amount of UV light for each pattern. This method can be applied to a case where the mold is fixed during UV irradiation as in the flat imprint method, since the exposure amount of UV light can be adjusted for each pattern region.

However, in the method shown in the conventional example, in the case of the roll-to-roll imprinting method, the UV light source is in the form of a stripe, and the roll with the mold transfers while rotating at a high speed, so that it is difficult to change the exposure amount of the UV light for each pattern region.

The present disclosure has been made in view of the above-described conventional problems, and an object thereof is to provide a pattern forming method and an imprint apparatus capable of obtaining good transfer accuracy.

Means for solving the problems

In order to achieve the above object, a method of forming a pattern of the present disclosure includes: a filling step of pressing a transfer object against a mold coated with a transfer material from above, and filling the transfer material between the transfer object and the mold; a curing step of curing the filled transfer material on the transfer object by UV irradiation; and a mold releasing step of releasing the transferred object in which the transfer material is solidified from the mold, wherein in the solidifying step, a switching portion that is an end portion of a portion of the mold that is smaller in pattern size, among a portion that is switched from a region with a smaller pattern size to a flat portion or a portion that is switched from the region with the smaller pattern size to a region with a larger pattern size, is cooled, and in the mold releasing step, the switching portion is heated.

Effects of the invention

As described above, according to the pattern forming method and the imprint apparatus of the present disclosure, good transfer accuracy can be obtained.

Drawings

Fig. 1 (a) to (c) are schematic diagrams of the imprint process in the present embodiment.

Fig. 2 (a) to (d) are schematic diagrams of a general flat plate imprint process.

Fig. 3 is a schematic view of a general roll-to-roll imprinting process.

Fig. 4 (a) is a photomicrograph showing an SEM image of the top surface of the transfer defect, and (b) is a photomicrograph showing a cross-sectional SEM image of the transfer defect.

Description of reference numerals:

101 first coating roller

102 first mould

103. 203, 303 transfer material

104. 304 film

105 first roller

106 first UV irradiator

107 first die head

108 first stripper roll

109 first pressure roller

110 first roll control part

111 first temperature control part

112 second application roller

113 second mold

114 second roll

115 second stripper roll

116 second pressure roller

117 second die

118 second UV irradiator

119 second roller control part

120 second temperature control part

201 working table

202. 302 mould

204 substrate to be processed

205. 305 roller

206. 306 UV irradiator

307 die head

308 stripping roller

309 a pressure roller.

Detailed Description

(embodiment mode)

The present embodiment will be described below with reference to the drawings.

Fig. 1 is a schematic diagram illustrating a method of forming a pattern in the present embodiment.

First, the structure of the roll-to-roll double-sided imprinting apparatus according to the present embodiment will be described with reference to fig. 1 (a).

First, in order to form a pattern on one surface, a first application roller 101 is provided at a position where a transfer material 103 is supplied onto a film 104. In addition, provided are: a first roller 105 to which a first mold 102 patterned on a surface is attached; and a first pressure roller 109 and a first mold release roller 108, which are in contact with the first roller 105.

Next, in order to form a pattern on the back surface after forming a pattern on one surface, a second application roller 112 is provided at a position where the transfer material 103 is supplied onto the film 104, similarly to the one surface. In addition, provided are: a second roller 114 to which a second mold 113 having a pattern formed on a surface thereof is attached; and a second pressure roller 116 and a second mold release roller 115, which are in contact with the second roller 114.

In this roll structure, the film 104 is wound from above the first application roll 101 in the drawing so as to contact the first pressure roll 109 from above the first pressure roll 109 in the drawing, contacts the first die 102, and contacts the first stripper roll 108 from below in the drawing. Thereafter, the film 104 is wound up through the second coating roller 112 at the lower side in the figure so as to be in contact with the second pressure roller 116 and the second die 113, and finally wound up so as to be in contact with the second stripper roller 115, and is conveyed from the left to the right in the figure by the rotation of each roller.

A first die 107 is disposed on the first application roller 101, and the transfer material 103 is applied to the film 104. A second die 117 is disposed on the second application roller 112, and the transfer material 103 is applied to the film 104. After the film 104 passes between the first pressure roller 109 and the first mold 102, the first UV irradiator 106 disposed below the first roller 105 irradiates UV light to cure the transfer material 103. Thereafter, the transfer material 103 is applied to the film 104 from the second die 117 disposed below the second application roller 112, the film 104 passes between the second pressure roller 116 and the second mold 113, and then UV light is irradiated from the second UV irradiator 118 disposed above the second roller 114, and after the transfer material 103 is cured, the film 104 is released from the second release roller 115.

The first mold 102 and the second mold 113 have a pattern region and a flat portion, respectively. The pattern region is a region having an uneven shape on the mold surface, and the pattern size increases as the distance between the uneven portions increases, and decreases as the distance between the uneven portions decreases. The flat portion is a region having no irregularities on the mold surface.

The first roller 105 includes a first temperature control unit 111 therein. The second roller 114 includes a second temperature control unit 120 therein. The first temperature control unit 111 and the second temperature control unit 120 are, for example, a heater for heating, an electric power operator for controlling the heater, a cooling path for flowing cooling water and cooling gas for cooling, a flow rate operator for controlling the cooling path, and the like.

Preferably, the first temperature control unit 111 is disposed below the switching unit on the first mold 102. Further, the second temperature control unit 120 is preferably disposed below the switching unit on the second mold 113. Here, the switching portion indicates an end portion of a pattern region in a switching portion between the pattern region and the flat portion, or an end portion of a region having a smaller pattern size in a switching portion between a region having a smaller pattern size and a larger region, in the pattern of the mold.

The first roller 105 and the second roller 114 are provided with a first roller control unit 110 and a second roller control unit 119 inside, and the first roller control unit 110 and the second roller control unit 119 detect the rotation speed of the rollers, and calculate the timing of UV irradiation and mold release from the information, thereby outputting an instruction for temperature control of the rollers to the first temperature control unit 111 and the second temperature control unit 120.

The first roller control unit 110 and the second roller control unit 119 have a calculation function such as a CPU, for example, and detect the rotational speed of the roller from a predetermined rotational speed of the roller. For example, the first roller control unit 110 and the second roller control unit 119 may include a sensor that detects rotation of the roller, and output the rotation speed of the roller based on the rotation of the roller detected by the sensor. For example, the first roller control unit 110 and the second roller control unit 119 may be provided with a sensor for detecting a mark provided in advance on the roller, and output the rotation speed of the roller based on the detection time of the mark.

The first roller control unit 110 and the second roller control unit 119 output the timing of roller temperature control to the first temperature control unit 111 and the second temperature control unit 120 as instructions. The first roller control unit 110 and the second roller control unit 119 may output the temperature of the roller temperature control as an instruction.

The first roller control unit 110 and the second roller control unit 119 output instructions for temperature control to the first temperature control unit 111 and the second temperature control unit 120 disposed below the switching units on the first mold 102 and the second mold 113 when the switching units on the first mold 102 and the second mold 113 reach the UV irradiation range. The temperature of the transfer material is controlled by the first temperature control unit 111 and the second temperature control unit 120. Therefore, the temperature of the transfer material at the time of UV irradiation can be controlled based on the roller rotation speed. In this way, the transfer material described later is cooled.

Further, the first roller control unit 110 and the second roller control unit 119 output instructions for temperature control to the first temperature control unit 111 and the second temperature control unit 120 disposed below the switching units on the first mold 102 and the second mold 113 at a timing when the first mold 102 and the second mold 113 rotate and the switching units on the first mold 102 and the second mold 113 pass the UV irradiation range. The temperature of the transfer material is controlled by the first temperature control unit 111 and the second temperature control unit 120. Therefore, the temperature of the transfer material at the time of mold release can be controlled based on the roller rotation speed. In this way, the transfer material described later is heated.

Here, the range in which the temperature is controlled during UV irradiation at the switching portion of the first mold 102 and the second mold 113 is desirably a region from 50 μm to 1000 μm in the front from the terminal end of the region with a small pattern size.

When the range of temperature control is 50 μm or less, even if the curing rate of the transfer material is lowered and the elastic modulus is lowered, since the contact area with the region of the mold having a small pattern size is small, the stress application to the flat portion is started and the mold release is started in a state where the mold release resistance cannot be sufficiently lowered. As a result, the mold release speed is rapidly increased near the boundary of the pattern, and a pattern defect occurs.

In addition, when the range of temperature control is 1000 μm or more, it is difficult to lower the mold heated at the time of mold release to the ambient temperature in advance before the next UV irradiation. As a result, the transfer accuracy deteriorates due to variation in the coating film thickness of the transfer material and thermal shrinkage of the pattern on the mold.

Next, a method for forming a pattern in the present embodiment will be described with reference to fig. 1.

First, as shown in step (a) of fig. 1, when the region on the first mold 102 facing the UV irradiation section of the first UV irradiation device 106 is not the switching section, or when the region on the second mold 113 facing the UV irradiation section of the second UV irradiation device 118 is not the switching section, the surface temperature of the first roller 105 and the second roller 114 is not controlled, and imprinting is performed.

The transfer material 103 includes various UV curable resins such as urethane acrylate resin, epoxy acrylate resin, polyester acrylate resin, and acrylic acrylate resin (アクリルアクリレ - ト resin), and may be appropriately selected according to the shape of the object to be transferred, the amount of UV light required for curing, and the like.

The material of the first mold 102 and the second mold 113 is not particularly limited as long as it has rigidity, hardness, and the like necessary for the mold, but the effect of the present disclosure can be made remarkable particularly in the case of a metal material. The metal material is desirably a material having high releasability from the transfer material, such as Ni.

In order to improve releasability from the transfer material, a release layer may be formed on the surface of the fine pattern of the first mold 102 and the second mold 113 so as to cover the fine pattern. The release layer is formed by bonding a coupling agent to the upper surface of the fine pattern. By forming the release layer using a coupling agent, an extremely thin film such as a monomolecular film can be formed, and the influence on the transfer shape is extremely small.

As the coupling agent, for example, various metal alkoxides having Ti, Li, Si, Na, K, Mg, Ca, St, Ba, Al, In, Ge, Bi, Fe, Cu, Y, Zr, Ta, and the like can be used, but among them, a silane coupling agent, which is a metal alkoxide having Si, is particularly desirably used.

Finally, as a method for applying the transfer material 103 to the entire surfaces of the first mold 102 and the second mold 113, various methods such as distribution coating, roll coating, gravure coating, screen coating, and the like can be cited, but it is preferable to select the method appropriately depending on the properties of the transfer material and the shape of the object to be transferred.

Next, as shown in step (b), at the timing when the switching portion on the first mold 102 rotates to the region facing the UV irradiation portion of the first UV irradiator 106, that is, the timing of UV irradiation calculated from the rotational speed information of the first roller 105, the surface of the first roller 105 is cooled to 20 degrees or more and 25 degrees or less, thereby cooling the terminal end portion of the region of the first mold 102 having a small pattern size at the portion switched from the region having a small pattern size to the flat portion or the region having a large pattern size to 20 degrees or more and 25 degrees or less.

Similarly, the surface of the second roller 114 is cooled to 20 degrees or more and 25 degrees or less at the timing when the switching portion on the second mold 113 rotates to the region facing the UV irradiation portion of the second UV irradiator 118, that is, the timing of UV irradiation calculated from the rotational speed information of the second roller 114, thereby cooling the switching portion on the second mold 113 to 20 degrees or more and 25 degrees or less.

As described above, by cooling the switching portion during UV curing, it is possible to suppress a decrease in viscosity due to heating by UV irradiation. That is, since the polymerization process of the transfer material 103 is difficult to proceed, the double bond reaction rate, that is, the curing rate gradually decreases.

As a result, since the curing rate of the switching portion decreases and the elastic modulus decreases, the mold release resistance decreases, and the mold release speed can be suppressed from rapidly increasing near the boundary at the portion where the switching portion switches from the region with the small pattern size to the flat portion or the region with the large pattern size, and the generation of the pattern defect can be suppressed while rapidly applying the large mold release resistance to the terminal end portion of the region with the small pattern size.

Here, when the cooling temperature of the switching portion on the first mold 102 and the second mold 113 becomes lower than 20 degrees at the timing of UV irradiation, the curing rate becomes too small, and the desired hardness cannot be obtained in the subsequent process and the product. When the temperature is higher than 25 degrees, the curing rate cannot be sufficiently reduced, and pattern defects occur.

Next, as shown in step (c), the switching portion of the first mold 102 is heated to 35 degrees or more and 45 degrees or less at the timing when the switching portion of the first mold 102 rotates to the mold releasing portion of the first mold releasing roll 108, that is, at the timing of mold releasing calculated from the rotational speed information of the first roll 105.

Similarly, the switching portion of the first mold 102 is heated to 35 degrees or more and 45 degrees or less at the timing when the switching portion of the second mold 113 rotates to the mold releasing portion of the second mold releasing roller 115, that is, at the timing of mold releasing calculated from the rotational speed information of the second roller 114.

Here, when the heating temperature of the switching portion on the first mold 102 and the second mold 113 is lower than 35 degrees at the timing of UV irradiation, the elastic modulus of the transfer material cannot be sufficiently reduced, and pattern defects occur. When the temperature is higher than 45 degrees, the pattern is easily deformed by thermal expansion of the transfer material.

As described above, by heating the switching portion at the time of mold release, the modulus of elasticity of the transfer material 103 after curing is reduced, and the increase in mold release resistance at the portion where the region having the small pattern size is switched to the flat portion or the region having the large pattern size is reduced, whereby occurrence of pattern defects can be suppressed.

It is desirable that the first mold 102 on the first roll 105 and the second mold 113 on the second roll 114, which are heated to 35 degrees or more and 45 degrees or less in the step (c), be lowered to 20 degrees or more and 25 degrees or less in advance before the roll passes through the step (a) and reaches the step (b) by rotating the roll. This can suppress the thickness of the coating film of the transfer material and the expansion of the pattern on the roller, and thus can ensure the transfer accuracy.

By repeating the above steps, it is possible to perform imprint with high transfer accuracy without burr defects or defects.

Industrial applicability of the invention

The present disclosure is useful for an imprint method and an imprint apparatus, etc., capable of forming a pattern with high accuracy and transferring the pattern onto a transfer target.