阅读说明：本技术 阀装置、使用该阀装置的流体控制装置以及半导体制造装置 (Valve device, fluid control device using the same, and semiconductor manufacturing apparatus ) 是由 渡边一诚 执行耕平 相川献治 中田知宏 松田隆博 篠原努 于 2018-11-12 设计创作，主要内容包括：本发明提供一种组装有节流孔并且能够以低成本进行制造的阀装置。阀体(20)划定在阀体(20)的表面开口并且内置有阀元件的收纳凹部(22)、以及与收纳凹部(22)连接的初级侧流路(21)和次级侧流路(24),阀元件(2)具有将初级侧流路(21)和次级侧流路(24)之间的通过收纳凹部(22)的直接的连通切断的密封部(50b2、50b3)、以及通过阀元件(2)而使初级侧流路(21)和次级侧流路(24)连通的贯通流路(50、16p),在贯通流路(50、16p)形成有节流孔(16p)。(The invention provides a valve device which is assembled with an orifice and can be manufactured at low cost. The valve element (2) is provided with a housing recess (22) which is open on the surface of the valve element (20) and in which a valve element is disposed, and a primary-side flow path (21) and a secondary-side flow path (24) which are connected to the housing recess (22), and the valve element (2) is provided with sealing sections (50b2, 50b3) which block direct communication between the primary-side flow path (21) and the secondary-side flow path (24) via the housing recess (22), and through-flow paths (50, 16p) which communicate the primary-side flow path (21) and the secondary-side flow path (24) via the valve element (2), and orifices (16p) are formed in the through-flow paths (50, 16 p).)

1. A valve device having a block-shaped valve body, wherein,

a housing recess portion that defines a surface opening of the valve body and houses a valve element, a primary-side flow path that is connected to a bottom surface of the housing recess portion, and a secondary-side flow path that is connected to an inner peripheral surface of the housing recess portion,

the valve element has a seal portion that blocks direct communication between the primary-side flow passage and the secondary-side flow passage via the housing recess, and a through-flow passage that communicates the primary-side flow passage and the secondary-side flow passage via the valve element,

an orifice is formed in the through flow passage.

2. The valve apparatus of claim 1,

the valve element has:

a valve seat having an annular seat surface formed on one end surface of the valve seat, an annular seal surface formed on the other end surface of the valve seat, and a flow passage formed inside the seat surface and the seal surface and penetrating the one end surface and the other end surface;

a valve seat support member having a support surface that is in contact with the sealing surface of the valve seat and supports a pressing force from the sealing surface; and

a diaphragm provided so as to be capable of abutting against and separating from the seat surface supported by the valve seat support,

the diaphragm communicates the flow channel with the secondary-side flow channel through a gap between the diaphragm and the seat surface,

the valve seat support has: a sealing surface that cooperates with a portion of an inner wall surface of the housing recess to block communication between the primary-side flow passage and the secondary-side flow passage; and the bypass channel connecting the primary-side channel and the flow channel,

the orifice is formed in a flow passage of the valve seat or a bypass passage of the valve seat support.

3. A valve device having a block-shaped valve body, wherein,

the valve body defines a1 st housing recess and a2 nd housing recess each having a1 st valve element and a2 nd valve element built therein, a primary-side flow passage for allowing the 1 st housing recess and the 2 nd housing recess to communicate with the outside of the valve body, respectively, a secondary-side flow passage for allowing the 1 st housing recess and the 2 nd housing recess to communicate with the outside of the valve body, respectively, and a communication flow passage for connecting the 1 st housing recess and the 2 nd housing recess and for allowing the secondary-side flow passages to communicate with each other,

each of the 1 st and 2 nd valve elements has a seal portion that blocks direct communication between the primary-side flow path and the secondary-side flow path via the housing recess portion, and a through-flow path that communicates the primary-side flow path and the secondary-side flow path via the valve element,

an orifice is formed in the through flow passage of one of the 1 st valve element and the 2 nd valve element.

4. A fluid control apparatus in which a plurality of fluid devices are arranged,

the plurality of fluidic devices comprising the valve apparatus of any one of claims 1-3.

5. A flow control method, wherein,

the flow rate control method uses a fluid control device including the valve device according to any one of claims 1 to 3 for controlling the flow rate of a process gas.

6. A method for manufacturing a product, wherein,

in a process for manufacturing a product such as a semiconductor device, a flat panel display, or a solar panel, which requires a process step in a closed process chamber by using a process gas, a fluid control device including the valve device according to any one of claims 1 to 3 is used for controlling the process gas.

7. A semiconductor manufacturing apparatus, wherein,

the semiconductor manufacturing apparatus has a fluid control device for supplying a process gas to a process chamber,

the fluid control device comprises a valve device as claimed in any one of claims 1 to 3.

Technical Field

The present invention relates to a valve device.

Background

In various manufacturing processes such as a semiconductor manufacturing process, a fluid control apparatus in which various fluid devices such as an on-off valve, a regulator, and a mass flow controller are integrated is used to supply a process gas accurately metered to a process chamber.

In the fluid control device as described above, instead of the pipe joints, an installation block (hereinafter, referred to as a base block) in which flow paths are formed is disposed along the longitudinal direction of the substrate, and various fluid devices including a joint block to which a plurality of fluid devices and pipe joints are connected, and the like are installed on the base block, thereby achieving integration (for example, see patent document 1).

Disclosure of Invention

Problems to be solved by the invention

A valve device applied to the fluid control device as described above is required to have various functions. For example, an orifice is provided in the flow path of the valve device.

However, when an orifice plate or the like is inserted into a flow path of the valve device, it is difficult to seal the flow path, which leads to a problem of high manufacturing cost.

An object of the present invention is to provide a valve device incorporating an orifice and capable of being manufactured at low cost.

Means for solving the problems

The valve device according to claim 1 of the present invention is a valve device having a block-shaped valve body,

a housing recess portion that defines a surface opening of the valve body and houses a valve element, a primary-side flow path that is connected to a bottom surface of the housing recess portion, and a secondary-side flow path that is connected to an inner peripheral surface of the housing recess portion,

the valve element has a seal portion that blocks direct communication between the primary-side flow passage and the secondary-side flow passage via the housing recess, and a through-flow passage that communicates the primary-side flow passage and the secondary-side flow passage via the valve element,

an orifice is formed in the through flow passage.

Preferably, such a structure can be adopted:

the valve element has:

a valve seat having an annular seat surface formed on one end surface of the valve seat, an annular seal surface formed on the other end surface of the valve seat, and a flow passage formed inside the seat surface and the seal surface and penetrating the one end surface and the other end surface;

a valve seat support member having a support surface that is in contact with the sealing surface of the valve seat and supports a pressing force from the sealing surface; and

a diaphragm provided so as to be capable of abutting against and separating from the seat surface supported by the valve seat support,

the diaphragm communicates the flow channel with the secondary-side flow channel through a gap between the diaphragm and the seat surface,

the valve seat support has: a sealing surface that cooperates with a portion of an inner wall surface of the housing recess to block communication between the primary-side flow passage and the secondary-side flow passage; and the bypass channel connecting the primary-side channel and the flow channel,

the orifice is formed in a flow passage of the valve seat or a bypass passage of the valve seat support.

The valve device according to claim 2 of the present invention is a valve device having a block-shaped valve body,

the valve body defines a1 st housing recess and a2 nd housing recess each having a1 st valve element and a2 nd valve element built therein, a primary-side flow passage for allowing the 1 st housing recess and the 2 nd housing recess to communicate with the outside of the valve body, respectively, a secondary-side flow passage for allowing the 1 st housing recess and the 2 nd housing recess to communicate with the outside of the valve body, respectively, and a communication flow passage for connecting the 1 st housing recess and the 2 nd housing recess and for allowing the secondary-side flow passages to communicate with each other,

each of the 1 st and 2 nd valve elements has a seal portion that blocks direct communication between the primary-side flow path and the secondary-side flow path via the housing recess portion, and a through-flow path that communicates the primary-side flow path and the secondary-side flow path via the valve element,

an orifice is formed in the through flow passage of one of the 1 st valve element and the 2 nd valve element.

The flow rate control method of the present invention uses a fluid control device including the valve device having the above-described configuration for controlling the flow rate of the process gas.

In the product manufacturing method of the present invention, in a manufacturing process of a product such as a semiconductor device, a flat panel display, or a solar panel, which requires a process step to be performed in a closed process chamber by using a process gas, a fluid control apparatus including the valve apparatus having the above-described configuration is used for controlling the process gas.

The semiconductor manufacturing apparatus of the present invention has a fluid control device for supplying a process gas to a process chamber,

the fluid control device includes the valve device of the above-described structure.

ADVANTAGEOUS EFFECTS OF INVENTION

According to the present invention, a valve device is obtained that incorporates an orifice and can be manufactured at low cost.

Drawings

Fig. 1A is a front view partially including a longitudinal section of a valve device according to an embodiment of the present invention.

FIG. 1B is a top view of the valve apparatus of FIG. 1A.

Fig. 1C is a bottom view of the valve device of fig. 1A.

FIG. 1D is a side view of the valve apparatus of FIG. 1A.

Fig. 2 is an enlarged sectional view of a main portion of the valve device of fig. 1A, showing a valve closed state.

Fig. 3 is an enlarged sectional view of a main portion of the valve device of fig. 1A, and is a view showing a valve open state.

Fig. 4 is a sectional view of the inner disc.

FIG. 5 is a cross-sectional view of a valve seat.

FIG. 6 is a cross-sectional view of the valve seat support.

Fig. 7 is an enlarged sectional view of a main portion of a valve device according to embodiment 2 of the present invention.

Fig. 8 is an enlarged sectional view of a main portion of a valve device according to embodiment 3 of the present invention.

Fig. 9 is a schematic configuration diagram of a semiconductor manufacturing apparatus according to an embodiment of the present invention.

Fig. 10 is a perspective view showing an example of a fluid control device to which the valve device of the present invention can be applied.

Detailed Description

Embodiment 1

Hereinafter, embodiments of the present invention will be described with reference to the drawings. In the present specification and the drawings, the same reference numerals are used for components having substantially the same functions, and overlapping descriptions are omitted.

Fig. 1A to 1D show the configuration of a valve device according to an embodiment of the present invention, fig. 2 and 3 show the operation of the valve device of fig. 1A, fig. 4 shows the sectional configuration of an inner disk, fig. 5 shows the sectional configuration of a valve seat, and fig. 6 shows the sectional configuration of a valve seat support.

In fig. 1A to 3, arrows a1 and a2 in the drawings indicate the vertical direction, and a1 indicates the vertical direction and a2 indicates the vertical direction. Arrows B1, B2 indicate the longitudinal direction of the valve element 20 of the valve device 1, and B1 indicates one end side, and B2 indicates the other end side. C1 and C2 show the width direction perpendicular to the longitudinal directions B1 and B2 of the valve body 20, and C1 shows the front surface side and C2 shows the back surface side.

The valve body 20 is a block-shaped member having a rectangular shape in plan view, and defines an upper surface 20f1 and a bottom surface 20f2, and 4 side surfaces 20f3 to 20f6 extending between the upper surface 20f1 and the bottom surface 20f 2. Further, the housing recess 22 opened at the upper surface 20f1 is defined. As can be seen from fig. 2 and the like, the housing recess 22 is formed by inner circumferential surfaces 22a, 22b, 22c and a bottom surface 22d having different diameters. The inner peripheral surfaces 22a, 22b, 22c are successively smaller in diameter. The valve element 2 is placed in the housing recess 22.

The valve body 20 defines a primary-side flow passage 21 and a secondary-side flow passage 24 connected to the housing recess 22. The primary-side flow path 21 is a flow path to which a fluid such as a gas is supplied from the outside, and the secondary-side flow path 24 is a flow path through which the fluid such as the gas flows to the outside. The primary-side flow passage 21 is formed obliquely to the bottom surface 20f2 of the valve body 20 and opens at the bottom surface 20f 2. A seal holding portion 21a is formed around the opening of the primary-side flow passage 21. A gasket, not shown, is disposed as a sealing member in the seal holding portion 21 a. The valve body 20 is coupled to another flow path block not shown by screwing the fastening bolt into the screw hole 20h 1. At this time, the gasket held by the seal holding portion 21a is compressed by the fastening force of the fastening bolt between the gasket and another flow path block not shown, and thus the periphery of the opening of the primary side flow path 21 is sealed.

Examples of the gasket include a metal gasket and a resin gasket. Examples of the gasket include a soft gasket, a semi-metal gasket, and a metal gasket. Specifically, the following gasket is preferably used.

(1) Soft pad

Rubber O-ring seal

Rubber sheet (for whole seat)

Bonding sheet

Expanded graphite sheet

PTFE sheet

PTFE jacket shape

(2) Semi-metal gasket

Spiral-wound gaskets (Spiral-wind gaskets)

Metallic jacketed liners

(3) Metal gasket

Metallic flat gasket

Hollow O-ring seal of metal

Ring joint

The seal holding portions 25a1 and 26b1 provided around the openings of the branch flow paths 25 and 26 described later are also the same, and detailed description thereof is omitted.

The secondary-side flow passage 24 includes two secondary-side flow passages 24A, 24B formed on opposite sides of the housing recess 22 in the longitudinal directions B1, B2 of the valve body 20. The secondary side flow passages 24A, 24B are formed on a common axis J1 extending in the longitudinal directions B1, B2 of the valve body 20. One end of the secondary-side flow passage 24A opens to the inner circumferential surface 22b of the housing recess 22, and the other end 24A1 is closed inside the valve body 20. One end of the secondary-side flow passage 24B opens to the inner peripheral surface 22B of the housing recess 22, and the other end 24B1 opens to the side surface 20f 6. The closing member 30 is provided by welding or the like at the opening of the secondary-side flow passage 24B located on the side surface 20f6, and the opening of the secondary-side flow passage 24B is closed. The secondary side flow passages 24A and 24B can be easily machined using a tool such as a drill.

The secondary-side flow passage 24A branches into two branch flow passages 25 at the other end 24A1, and opens at the upper surface 20f 1. The secondary-side flow passage 24B branches into two branch flow passages 26 at mid-way, and opens at the upper surface 20f 1.

That is, in the valve device 1 of the present embodiment, the fluid such as gas flowing into the primary-side flow passage 21 can be branched into 4 by the branch flow passages 25 and 26 of the secondary-side flow passage 24.

The valve element 2 has a diaphragm 14, an inner disk 15, a valve seat 16, and a valve seat support 50. The valve element 2 blocks direct communication between the primary-side flow passage 21 and the secondary-side flow passage 24 via the housing recess 22, and the primary-side flow passage 21 and the secondary-side flow passage 24 communicate with each other via the valve element 2. The valve element 2 will be specifically described below.

A valve seat support 50 having an outer diameter fitted to the inner peripheral surface 22c is inserted into the accommodation recess 22. As shown in fig. 6, the seat support 50 is a cylindrical metal member, and has a bypass passage 50a formed by a through hole at the center and an annular support surface 50f1 formed on the upper end surface and centered on the bypass passage 50 a. The support surface 50f1 of the valve seat support 50 is formed of a flat surface and has a step formed on the outer peripheral portion thereof. The outer peripheral surface 50b1 of the seat support 50 has a diameter that fits into the inner peripheral surface 22c of the housing recess 22, and has a step with the outer peripheral surface 50b2 that is reduced in diameter on the lower end side. The annular end surface 50b3 is formed by this step. As shown in fig. 2 and the like, a sealing member 51 made of resin such as PTFE is fitted to the outer peripheral surface 50b 2. The cross-sectional shape of the seal member 51 is formed in a rectangular shape, and has a size crushed between the bottom surface 22d of the housing recess 22 and the end surface 50b3 of the valve seat support 50. When the sealing member 51 is crushed between the bottom surface 22d of the housing recess 22 and the end surface 50b3 of the valve seat support 50, resin enters between the outer peripheral surface 50b1 of the valve seat support 50 and the inner peripheral surface 22c and the bottom surface 22d of the housing recess 22, and the valve seat support 50 and the housing recess 22 are reliably sealed. That is, the outer peripheral surface 50b2 and the end surface 50b3 as the seal portion cooperate with the inner peripheral surface 22c and the bottom surface 22d of the housing recess 22 to shut off the communication between the primary-side flow passage 21 and the secondary-side flow passage 24.

The bypass channel 50a of the valve seat support 50 is connected to the primary side channel 21 that opens at the bottom surface 22d of the housing recess 22.

The valve seat 16 is provided on the support surface 50f1 of the valve seat support 50.

The valve seat 16 is formed to be elastically deformable by a resin such as PFA or PTFE, and as shown in fig. 5, the valve seat 16 is formed in an annular shape, and an annular seat surface 16s is formed on one end surface and an annular seal surface 16f is formed on the other end surface. A flow channel 16p formed of a through hole is formed inside the seat surface 16s and the seal surface 16 f.

The flow passage 16p is the flow passage 16p of the present invention connected to the bypass passage 50a of the valve seat support 50, but may be an orifice (hereinafter, also referred to as an orifice 16p) having an inner diameter sufficiently smaller than the inner diameter of the bypass passage 50 a. The flow passage 16p and the bypass passage 50a of the valve seat support 50 constitute a through passage of the present invention.

The valve seat 16 has a small diameter portion 16b1 and a large diameter portion 16b2 on the outer peripheral side thereof, and a stepped portion is formed between the small diameter portion 16b1 and the large diameter portion 16b 2.

The valve seat 16 is positioned with respect to the support surface 50f1 of the valve seat support 50 by the inner disk 15 as a positioning pressing member, and is pressed toward the support surface 50f1 of the valve seat support 50. Specifically, the large-diameter portion 15a1 and the small-diameter portion 15a2 are formed in the center of the inner disk 15, and a stepped surface 15a3 is formed between the large-diameter portion 15a1 and the small-diameter portion 15a 2. An annular flat surface 15f1 is formed on one end surface side of the inner disk 15. On the other end surface side of the inner disk 15, an annular flat surface 15f2 is formed on the outer side, and an annular flat surface 15f3 is formed on the inner side. The flat surface 15f2 and the flat surface 15f3 have different heights, and the flat surface 15f3 is located near the flat surface 15f 1. An outer peripheral surface 15b that fits into the inner peripheral surface 22a of the housing recess 22 is formed on the outer peripheral side of the inner panel 15. A plurality of flow paths 15h penetrating one end surface and the other end surface are formed at equal intervals in the circumferential direction. By fitting the large diameter portion 16b2 and the small diameter portion 16b1 of the valve seat 16 into the large diameter portion 15a1 and the small diameter portion 15a2 of the inner disk 15, the valve seat 16 is positioned with respect to the bearing surface 50f1 of the valve seat bearing 50.

The flat surface 15f2 of the inner panel 15 is provided on a flat stepped surface formed between the inner peripheral surface 22a and the inner peripheral surface 22b of the accommodation recess 22. The diaphragm 14 is provided on the flat surface 15f1 of the inner disk 15, and the pressing ring 13 is provided on the diaphragm 14.

The actuator 10 is driven by a drive source such as an air pressure, and moves the diaphragm pressing member 12 held so as to be movable in the vertical directions a1 and a 2. As shown in fig. 1A, the top end portion of the housing 11 of the actuator 10 is screwed and fixed to the valve body 20. The tip end portion presses the pressing ring 13 downward a2, and the diaphragm 14 is fixed in the housing recess 22. The diaphragm 14 seals the housing recess 22 on the opening side. Further, the inner panel 15 is also pressed downward a 2. The height of the step surface 15a3 is set in such a manner that: in a state where the flat surface 15f2 of the inner panel 15 is pressed against the step surface of the housing recess 22, the step surface 15a3 presses the valve seat 16 against the support surface 50f1 of the valve seat support 50. The flat surface 15f3 of the inner disk 15 does not abut on the upper end surface of the seat support 50.

The diaphragm 14 has a diameter larger than that of the valve seat 16, and is formed in a spherical shell shape by a metal such as stainless steel or NiCo alloy, or a fluorine resin so as to be elastically deformable. The diaphragm 14 is supported by the valve body 20 so as to be able to be abutted against and separated from the seat surface 16s of the valve seat 16.

In fig. 2, the diaphragm 14 is pressed by the diaphragm presser 12 and elastically deformed, and is pressed against the seat surface 16s of the valve seat 16. When the pressing by the septum presser 12 is released, the septum 14 returns to a spherical shell shape as shown in fig. 3. In a state where the diaphragm 14 is pressed against the seat surface 16s of the valve seat 16, the flow passage between the primary-side flow passage 21 and the secondary-side flow passage 24 is closed. When the diaphragm pressing member 12 moves in the upward direction a1, the diaphragm 14 separates from the seat surface 16s of the valve seat 16 as shown in fig. 3. The fluid supplied from the primary-side flow passage 21 passes through the orifice 16p of the valve seat 16, passes through the gap between the diaphragm 14 and the seat surface 16s of the valve seat 16, and flows into the secondary-side flow passages 24A and 24B. Finally, the fluid supplied from the primary-side flow passage 21 flows out of the valve element 20 through the branch flow passages 25 and 26.

As described above, according to the present embodiment, the orifice function can be easily added to the valve device 1 by machining the orifice 16p in the valve seat 16, which is a component of the valve element 2, without directly machining the orifice in the valve body 20. Further, since it is not necessary to enlarge the valve body 20 for the orifice 16p, the valve body 20 can be kept compact.

In the above embodiment, the case where the secondary side flow passage 24 is branched into a plurality of branches in the valve element 20 and the branch flow passages 25 and 26 are opened in the upper surface 20f1 of the valve element 20 has been exemplified, but the present invention is not limited to this and a structure in which the branch flow passages are opened in any one of the bottom surface 20f2 and the side surfaces 20f3 to 20f6 may be adopted.

In the above embodiment, the inner disk 15 and the valve seat 16 are provided as separate members, but the inner disk 15 and the valve seat 16 may be integrated.

Embodiment 2

Fig. 7 shows a valve device according to embodiment 2 of the present invention. In fig. 7, the same reference numerals are given to the same components as those of the above embodiment.

The valve seat support 50B of the valve device shown in fig. 7 has a columnar protruding portion 50t at the center of the upper end, and an orifice 50p having an inner diameter sufficiently smaller than the inner diameter of the bypass passage 50a is formed at the center of the protruding portion 50 t. The valve seat 16B has a through hole 16a formed in the center thereof, and the protruding portion 50t of the valve seat support 50B is fitted into the through hole 16 a.

According to the present embodiment, the orifice 50p is formed in the valve seat support 50B, which is a component of the valve element 2, without directly processing an orifice in the valve body 20, whereby the orifice function can be easily added to the valve device.

Embodiment 3

Fig. 8 shows a valve device according to embodiment 3 of the present invention. In fig. 8, the same reference numerals are used for the same components as those of the above embodiment.

The valve device of the present embodiment includes two valve elements 2A and 2B in a common valve body 20.

The valve body 20 defines two housing recesses 22A, 22B opened at the upper surface 20f 1. The housing recesses 22A and 22B have the same structure as the housing recess 22, and are arranged to be separated in the longitudinal directions B1 and B2. The valve elements 2A and 2B are respectively disposed in the housing recesses 22A and 22B. The first-side flow passages 21A, 21B connected to the 1 st housing recess 22A and the 2 nd housing recess 22B, the second-side flow passages 24A, 24B connected to the housing recesses 22A, 22B, and the communication flow passage 24C connecting the housing recess 22A and the housing recess 22B are defined. The communication channel 24C functions as a part of the secondary-side channel 24.

The primary-side flow passage 21A is formed obliquely to the bottom surface 20f2 of the valve body 20, one end of the primary-side flow passage 21A is connected to the bottom surface 22d of the housing recess 22A, and the other end of the primary-side flow passage 21A opens at the bottom surface 20f 2.

The primary-side flow passage 21B is formed obliquely to the bottom surface 20f2 of the valve body 20 in a direction opposite to the primary-side flow passage 21A, and has one end connected to the bottom surface 22d of the housing recess 22B and the other end opened at the bottom surface 20f 2.

Seal holding portions 21A and 21B similar to the seal holding portion 21A are formed around the openings of the primary side flow paths 21A and 21B, respectively.

The secondary-side flow passage 24 includes two secondary-side flow passages 24A, 24B formed on opposite sides of the housing concave portions 22A, 22B in the longitudinal directions B1, B2 of the valve body 20 and a communication flow passage 24C connecting the housing concave portions 22A, 22B.

The secondary side flow passages 24A, 24B and the communication flow passage 24C are formed on a common axis J1 extending in the longitudinal directions B1, B2 of the valve body 20.

One end of the secondary-side flow passage 24A opens to the inner peripheral surface 22b of the housing recess 22A, and the other end 24A1 is closed inside the valve body 20.

One end of the secondary-side flow passage 24B opens to the inner peripheral surface 22B of the housing recess 22B, and the other end 24B1 opens to the side surface 20f 6.

The closing member 30 is provided by welding or the like at the opening of the secondary-side flow passage 24B located on the side surface 20f6, and the opening of the secondary-side flow passage 24B is closed.

One end of the communication flow path 24C opens to the inner circumferential surface 22B of the housing recess 22A, and the other end opens to the inner circumferential surface 22B of the housing recess 22B. The secondary-side flow passage 24A and the secondary-side flow passage 24B are communicated with each other via the communication flow passage 24C.

The secondary-side flow passages 24A and 24B and the communication flow passage 24C constituting the secondary-side flow passage 24 can be easily machined using a tool such as a drill. The secondary-side flow passage 24 may be cut from the other end of the valve body 20 with a drill or the like, or may be cut from both ends, i.e., one end and the other end, with a drill or the like to communicate with the inside of the valve body 20.

The secondary-side flow passage 24A branches into two branch flow passages 25 at the other end 24A1, and opens at the upper surface 20f 1.

The secondary-side flow passage 24B branches into two branch flow passages 26 at mid-way, and opens at the upper surface 20f 1.

The valve element 2A has the same configuration as the valve element 2 of embodiment 1. The valve element 2A has an orifice 16 p. The valve element 2B has no orifice.

In this way, two valve elements 2A and 2B can be provided in the common valve body 20, and an orifice can be provided to only one valve element 2A. The fluid supplied from the primary-side flow passage 21A or 21B flows out to the secondary-side flow passages 24A, 24B, and 24C in common. For the valve element 2A and the valve element 2B, one is selectively opened, and the other is closed.

In the present embodiment, the case where the orifice 16p is formed in the valve seat 16 of the valve element 2A is exemplified, but the present invention is not limited thereto, and an orifice may be formed in the valve seat support as in embodiment 2.

Next, an application example of the valve device 1 will be described with reference to fig. 9.

The semiconductor manufacturing apparatus 1000 shown in fig. 9 is a system for performing a semiconductor manufacturing process based on an Atomic layer Deposition method (a L D: Atomic L a layer Deposition method), and reference numeral 600 shows a process gas supply source, reference numeral 700 shows a gas tank, reference numeral 710 shows a tank, reference numeral 720 shows a valve, reference numeral 800 shows a process chamber, and reference numeral 900 shows an exhaust pump.

In a process for depositing a film on a substrate, in order to stably supply a process gas, the process gas supplied from the gas box 700 is temporarily stored in a tank 710 serving as a buffer, a valve 720 provided in the vicinity of the process chamber 800 is opened and closed at a high frequency, and the process gas from the tank is supplied to the process chamber 800 having a vacuum atmosphere.

The a L D method is 1 type of chemical vapor deposition method, and is a method of depositing a film by reacting with atoms on a substrate surface by alternately flowing two or more types of process gases one after another on the substrate surface under film formation conditions such as temperature and time, and can control the thickness of each monoatomic layer, thereby forming a uniform film thickness and growing a very dense film as a film quality.

In the semiconductor manufacturing process by the a L D method, it is necessary to precisely adjust the flow rate of the process gas, and it is also necessary to ensure the flow rate of the process gas to some extent due to the increase in the diameter of the substrate.

The gas box 700 accommodates a fluid control device, which is an integrated fluid device of various types, in order to supply a precisely measured processing gas to the processing chamber 800. The fluid control device includes the valve device according to each of the above embodiments.

The tank 710 functions as a buffer for temporarily storing the process gas supplied from the gas box 700.

The process chamber 800 provides a sealed process space for forming a film on a substrate using the a L D method.

The exhaust pump 900 evacuates the processing chamber 800.

An example of a fluid control device to which the valve device of the present invention can be applied will be described with reference to fig. 10.

The fluid control device shown in fig. 10 is provided with metal substrates BS arranged in the width directions W1 and W2 and extending in the longitudinal directions G1 and G2. Further, reference numeral W1 shows the direction of the front side, reference numeral W2 shows the direction of the back side, reference numeral G1 shows the direction of the upstream side, and reference numeral G2 shows the direction of the downstream side. Various fluid devices 991A to 991E are provided on the substrate BS via a plurality of passage blocks 992, and passages, not shown, through which fluid flows from the upstream side G1 to the downstream side G2 are formed by the plurality of passage blocks 992.

Here, the "fluid device" is a device used for a fluid control apparatus that controls a flow of fluid, and is a device having a main body that defines a fluid flow path and at least two flow paths that open on a surface of the main body. Specifically, the valve includes an on-off valve (two-way valve) 991A, a regulator 991B, a pressure gauge 991C, an on-off valve (three-way valve) 991D, a mass flow controller 991E, and the like, but the present invention is not limited thereto. The introduction pipe 993 is connected to a flow path port on the upstream side of the flow path not shown.

The present invention can be applied to various valve devices such as the opening/closing valves 991A, 991D and the regulator 991B.

Description of the reference numerals

1. A valve device; 2. 2A, 2B, a valve element; 10. an actuator; 11. a housing; 12. a diaphragm pressing member; 13. pressing a ring; 14. a diaphragm; 15. an inner disc; 15h, a flow path; 16. 16B, a valve seat; 16a, a through hole; 16f, a sealing surface; 16p, orifice (flow channel); 16s, seat surface; 20. a valve body; 20f1, upper surface; 20f2, bottom surface; 20f 3-20 f6 and side faces; 20h1, threaded hole; 21. a primary-side flow path; 21a, a seal holding portion; 22. a receiving recess; 22b, an inner peripheral surface; 24A, 24B, 24, a secondary-side flow path; 25. 26, a branch flow path; 30. a closure member; 50. 50B, a valve seat support; 50a, a bypass flow path; 50p, orifice; 50t, a protrusion; 50f1, bearing surface; 50b2, outer peripheral surface (sealing surface, sealing portion); 50b3, end faces (sealing faces, sealing portions); 51. a sealing member; 600. a process gas supply source; 700. a gas box; 710. a tank; 720. a valve; 800. a processing chamber; 900. an exhaust pump; 1000. a semiconductor manufacturing apparatus; a1, upper direction; a2, down; 991A, an opening and closing valve; 991B, a regulator; 991C, a pressure gauge; 991D, an opening and closing valve; 991E, a mass flow controller; 992. a flow path block; 993. an introducing pipe; BS and a substrate; g1, longitudinal direction (upstream side); g2, longitudinal direction (downstream side); w1, width direction; w2, width direction.