阅读说明：本技术 具有集成传感器的化学机械抛光保持环 (Chemical mechanical polishing retaining ring with integrated sensor ) 是由 西蒙·亚沃伯格 于 2015-05-28 设计创作，主要内容包括：本文中提供一种用于化学机械抛光承载头的保持环,具有用于基板的固定表面。在一些实施方式中,该保持环可以包括具有中央开口的环形主体、被形成在该主体中的通道,其中该通道的第一端邻近该中央开口；以及被设置在该通道内并邻近该第一端的传感器,其中该传感器配置为检测来自在该基板上进行的工艺的声波及/或振动发射。(A retaining ring for a chemical mechanical polishing carrier head having a retaining surface for a substrate is provided herein. In some embodiments, the retaining ring may include an annular body having a central opening, a channel formed in the body, wherein a first end of the channel is adjacent the central opening; and a sensor disposed within the channel and adjacent the first end, wherein the sensor is configured to detect acoustic and/or vibrational emissions from a process performed on the substrate.)