阅读说明：本技术 光掩膜版保护膜的去除系统及方法 (System and method for removing protective film of photomask ) 是由 高丁山 于 2018-08-23 设计创作，主要内容包括：本发明提供一种光掩膜版保护膜的去除系统及方法,光掩膜版保护膜的去除系统包括：气罩,底部设有凹槽,顶部设有与所述凹槽相连通的通孔；抽真空装置；吸气管路,一端经由所述通孔与所述凹槽相连通,另一端与所述抽真空装置相连接。本发明的光掩膜版保护膜的去除系统可以在去除光掩膜版上的保护膜时先采用真空抽气的方式去除保护膜层,然后再去除环形边框,这样在保护膜去除的过程中就不会有保护膜层掉落在光掩膜版上,不会对光掩膜版造成污染,从而提升良率,节约成本。(The invention provides a system and a method for removing a protective film of a photomask, wherein the system for removing the protective film of the photomask comprises the following steps: the bottom of the gas hood is provided with a groove, and the top of the gas hood is provided with a through hole communicated with the groove; a vacuum pumping device; and one end of the air suction pipeline is communicated with the groove through the through hole, and the other end of the air suction pipeline is connected with the vacuumizing device. The system for removing the protective film of the photomask plate can remove the protective film layer by adopting a vacuum air exhaust mode when the protective film on the photomask plate is removed, and then remove the annular frame, so that the protective film layer does not fall on the photomask plate in the process of removing the protective film, the photomask plate is not polluted, the yield is improved, and the cost is saved.)

1. The utility model provides a system of getting rid of photomask version protection film which characterized in that, the system of getting rid of photomask version protection film is used for getting rid of the protection film of photomask version, the system of getting rid of photomask version protection film includes:

the bottom of the gas hood is provided with a groove, and the top of the gas hood is provided with a through hole communicated with the groove;

a vacuum pumping device;

and one end of the air suction pipeline is communicated with the groove through the through hole, and the other end of the air suction pipeline is connected with the vacuumizing device.

2. The system of claim 1, wherein the vacuum pumping device comprises a vacuum pump.

3. The system of claim 1, further comprising a switching valve, wherein the switching valve is located on the air suction pipe.

4. The system of claim 3, wherein the switch valve is located at a connection of the suction line and the mask.

5. The system of claim 1, wherein the grooves have the same shape as the protective film, and the size of the grooves is larger than the size of the protective film.

6. The system of claim 5, wherein the gas mask has the same shape and size as the photomask; the size of the groove is smaller than that of the photomask.

7. A method for removing a protective film of a photomask is characterized by comprising the following steps:

1) providing a photomask plate, wherein a protective film is arranged on the surface of the photomask plate, and the protective film comprises an annular frame positioned at the periphery of a graphic area of the photomask plate and a protective film layer covering the annular frame;

2) removing the protective film layer by adopting a vacuum air pumping mode;

3) and removing the annular frame from the photomask plate.

8. The method for removing the protective film of the photomask according to claim 7, wherein the step 2) of removing the protective film layer by vacuum adsorption comprises the following steps:

2-1) providing a system for removing a photomask protective film according to any one of claims 1 to 6;

2-2) buckling the gas hood on the photomask plate;

2-3) using the vacuum extractor to extract air so as to form suction on the surface of the protective film layer, thereby removing the protective film layer.

9. The method for removing the protective film of the photomask according to claim 8, further comprising the following steps between the step 2) and the step 3):

removing the gas hood from above the photomask;

and the vacuumizing device stops vacuumizing.

Technical Field

The invention relates to the technical field of semiconductors, in particular to a system and a method for removing a protective film of a photomask.

Background

Disclosure of Invention

In view of the above disadvantages of the prior art, an object of the present invention is to provide a system and a method for removing a protective film of a photomask, which are used to solve the problem that the photomask is scrapped because the protective film layer easily falls onto the pattern region of the photomask when the protective film is removed in the prior art to contaminate the photomask.

In order to achieve the above and other related objects, the present invention provides a system for removing a protective film of a photomask, the system for removing a protective film of a photomask being used for removing a protective film of a photomask, the system for removing a protective film of a photomask comprising:

the bottom of the gas hood is provided with a groove, and the top of the gas hood is provided with a through hole communicated with the groove;

a vacuum pumping device;

and one end of the air suction pipeline is communicated with the groove through the through hole, and the other end of the air suction pipeline is connected with the vacuumizing device.

Preferably, the evacuation device comprises a vacuum pump.

Preferably, the system for removing the photomask protective film further comprises a switch valve, and the switch valve is located on the air suction pipeline.

Preferably, the on-off valve is located at the connection of the suction line and the gas hood.

Preferably, the shape of the groove is the same as the shape of the protective film, and the size of the groove is larger than the size of the protective film.

Preferably, the shape of the gas hood is the same as that of the photomask plate, and the size of the gas hood is the same as that of the photomask plate; the size of the groove is smaller than that of the photomask.

The invention also provides a method for removing the protective film of the photomask, which comprises the following steps:

1) providing a photomask plate, wherein a protective film is arranged on the surface of the photomask plate, and the protective film comprises an annular frame positioned at the periphery of a graphic area of the photomask plate and a protective film layer covering the annular frame;

2) removing the protective film layer by adopting a vacuum air pumping mode;

3) and removing the annular frame from the photomask plate.

Preferably, in the step 2), the removing the protective film layer by vacuum adsorption comprises the following steps:

2-1) providing a system for removing the photomask protective film in any scheme;

2-2) buckling the gas hood on the photomask plate;

2-3) using the vacuum pumping device to pump air so as to form suction on the surface of the protective film layer, thereby removing the protective film layer.

Preferably, the following steps are further included between step 2) and step 3):

removing the gas hood from above the photomask;

and the vacuumizing device stops vacuumizing.

As described above, the system and method for removing a protective film of a photomask plate according to the present invention have the following advantages:

the system for removing the protective film of the photomask plate can remove the protective film layer by adopting a vacuum air exhaust mode when the protective film on the photomask plate is removed, and then remove the annular frame, so that the protective film layer does not fall on the photomask plate in the process of removing the protective film, the photomask plate is not polluted, the yield is improved, and the cost is saved;

according to the method for removing the protective film of the photomask, when the protective film on the photomask is removed, the protective film layer is removed in a vacuum air exhaust mode, and then the annular frame is removed, so that the protective film layer does not fall on the photomask in the process of removing the protective film, the photomask is not polluted, the yield is improved, and the cost is saved.

Drawings

Fig. 1 is a schematic structural diagram of a system for removing a photomask protection film according to a first embodiment of the present invention.

Fig. 2 is a schematic diagram illustrating a working principle of a system for removing a photomask protection film according to a first embodiment of the present invention.

Fig. 3 is a flowchart illustrating a method for removing a protection film of a photomask according to a second embodiment of the present invention.

Fig. 4 to 8 are schematic structural views of structures corresponding to respective steps in the method for removing the photomask protective film according to the second embodiment of the present invention.

Description of the element reference numerals

11 gas hood

111 groove

112 through hole

12 vacuum extractor

13 air suction pipeline

14 switching valve

21 photo mask plate

211 pattern area

22 protective film

221 annular frame

222 protective film layer

Detailed Description

The embodiments of the present invention are described below with reference to specific embodiments, and other advantages and effects of the present invention will be easily understood by those skilled in the art from the disclosure of the present specification. The invention is capable of other and different embodiments and of being practiced or of being carried out in various ways, and its several details are capable of modification in various respects, all without departing from the spirit and scope of the present invention.

Please refer to fig. 1 to 8. It should be noted that the drawings provided in the present embodiment are only schematic and illustrate the basic idea of the present invention, and although the drawings only show the components related to the present invention and are not drawn according to the number, shape and size of the components in actual implementation, the form, quantity and proportion of the components in actual implementation may be changed arbitrarily, and the layout of the components may be more complicated.