阅读说明：本技术 薄膜太阳能电池及其制备方法 (Thin film solar cell and preparation method thereof ) 是由 姚俊奇 于 2018-07-24 设计创作，主要内容包括：本发明是关于一种薄膜太阳能电池及其制备方法,属于太阳能电池技术领域,该薄膜太阳能电池包括：金属衬底和背电极,金属衬底和背电极之间设置有阻挡层,所述阻挡层包括交替层叠设置的金属薄膜和金属化合物薄膜,所述金属化合物薄膜由金属氮化物和金属氧化物中的至少一种制成。本发明解决了金属衬底中的有害元素在吸收层的高温制备环境下通过背电极向吸收层扩散,降低薄膜太阳能电池的光电转换性能的问题。(The invention relates to a thin-film solar cell and a preparation method thereof, belonging to the technical field of solar cells, wherein the thin-film solar cell comprises: the metal substrate and the back electrode are provided with a barrier layer, the barrier layer comprises metal films and metal compound films which are alternately stacked, and the metal compound films are made of at least one of metal nitride and metal oxide. The invention solves the problem that harmful elements in the metal substrate are diffused to the absorption layer through the back electrode under the high-temperature preparation environment of the absorption layer, so that the photoelectric conversion performance of the thin-film solar cell is reduced.)

1. A thin film solar cell comprising:

the metal substrate and the back electrode are provided with a barrier layer, wherein the barrier layer comprises a metal film and a metal compound film which are alternately stacked, and the metal compound film is made of at least one of metal nitride and metal oxide.

2. The thin-film solar cell according to claim 1,

the metal compound film is made of at least one of molybdenum nitride, aluminum nitride, nickel nitride, molybdenum oxide, and nickel oxide.

3. The thin-film solar cell according to claim 1,

the metal thin film is made of at least one of molybdenum, chromium, titanium, aluminum, and nickel.

4. The thin-film solar cell according to claim 1,

the thickness of each film in the barrier layer is 0.01-1 micron.

5. The thin-film solar cell according to claim 1,

the barrier layer includes a first metal compound film, a first metal film, a second metal compound film, and a second metal film.

6. The thin-film solar cell according to claim 5,

the first metal compound film is made of molybdenum nitride, the first metal film is made of chromium, the second metal compound film is made of aluminum nitride, and the second metal film is made of titanium.

7. A method for manufacturing a thin film solar cell comprises the following steps:

forming a barrier layer on a metal substrate, the barrier layer including a metal thin film and a metal compound thin film alternately stacked, the metal compound thin film being made of at least one of a metal nitride and a metal oxide;

and forming a back electrode on the barrier layer.

8. The method of claim 7, wherein the barrier layer is formed on the metal substrate by vapor deposition.

9. The method of claim 8, wherein the vapor deposition is magnetron sputter coating.

10. The method of claim 7,

the metal compound film is made of at least one of molybdenum nitride, aluminum nitride, nickel nitride, molybdenum oxide, and nickel oxide.

11. The method of claim 7,

the metal thin film is made of at least one of molybdenum, chromium, titanium, aluminum, and nickel.

12. The method of claim 7,

the thickness of each film in the barrier layer is 0.01-1 micron.

13. The method of claim 9, wherein the forming the barrier layer on the metal substrate by vapor deposition comprises:

forming a first metal compound film on the metal substrate by adopting a magnetron sputtering coating mode;

forming a first metal film on the first metal compound film by adopting a magnetron sputtering coating mode;

forming a second metal compound film on the first metal film by adopting a magnetron sputtering coating mode;

and forming a second metal film on the second metal compound film by adopting a magnetron sputtering coating mode.

Technical Field

The invention relates to the technical field of solar cells, in particular to a thin-film solar cell and a preparation method thereof.

Background

The thin-film solar cell has the characteristics of small mass, thin thickness, flexibility, simple manufacturing process and the like. The current thin-film solar cell mainly comprises a substrate, a back electrode, an absorption layer, a buffer layer, a window layer, a top electrode and an antireflection layer. The substrate may be a metal substrate or a non-metal substrate.

However, when the substrate is a metal substrate, harmful elements in the metal substrate can diffuse toward the absorption layer through the back electrode in the high-temperature preparation environment of the absorption layer, and the photoelectric conversion performance of the thin-film solar cell is reduced.

Disclosure of Invention

The embodiment of the invention provides a thin-film solar cell and a preparation method thereof, which can solve the problem that harmful elements in a metal substrate in the related art diffuse to an absorption layer through a back electrode under the high-temperature preparation environment of the absorption layer, so that the photoelectric conversion performance of the thin-film solar cell is reduced. The technical scheme is as follows:

according to a first aspect of embodiments of the present invention, there is provided a thin film solar cell, comprising:

the metal substrate and the back electrode are provided with a barrier layer, the barrier layer comprises metal films and metal compound films which are alternately stacked, and the metal compound films are made of at least one of metal nitride and metal oxide.

Optionally, the metal compound film is made of at least one of molybdenum nitride, aluminum nitride, nickel nitride, molybdenum oxide, and nickel oxide.

Optionally, the metal thin film is made of at least one of molybdenum, chromium, titanium, aluminum, and nickel.

Optionally, the thickness of each film in the barrier layer is 0.01 to 1 micron.

Optionally, the barrier layer includes a first metal compound film, a first metal film, a second metal compound film, and a second metal film.

Optionally, the first metal compound film is made of molybdenum nitride, the first metal film is made of chromium, the second metal compound film is made of aluminum nitride, and the second metal film is made of titanium.

According to a second aspect of the embodiments of the present invention, there is provided a method for manufacturing a thin film solar cell, including:

forming a barrier layer on a metal substrate, the barrier layer including a metal thin film and a metal compound thin film alternately stacked, the metal compound thin film being made of at least one of a metal nitride and a metal oxide;

and forming a back electrode on the barrier layer.

Optionally, the barrier layer is formed on the metal substrate by vapor deposition.

Optionally, the vapor deposition mode is a magnetron sputtering coating mode.

Optionally, the metal compound film is made of at least one of molybdenum nitride, aluminum nitride, nickel nitride, molybdenum oxide, and nickel oxide.

Optionally, the metal thin film is made of at least one of molybdenum, chromium, titanium, aluminum, and nickel.

Optionally, the thickness of each film in the barrier layer is 0.01 to 1 micron.

Optionally, the forming the barrier layer on the metal substrate by using a vapor deposition method includes:

forming a first metal compound film on the metal substrate by adopting a magnetron sputtering coating mode;

forming a first metal film on the first metal compound film by adopting a magnetron sputtering coating mode;

forming a second metal compound film on the first metal film by adopting a magnetron sputtering coating mode;

and forming a second metal film on the second metal compound film by adopting a magnetron sputtering coating mode.

The technical scheme provided by the embodiment of the invention at least comprises the following beneficial effects:

the barrier layer is arranged between the metal substrate and the back electrode and comprises the metal thin film and the metal compound thin film which are alternately stacked, and the barrier layer can effectively prevent harmful elements in the metal substrate from diffusing to the absorption layer through the back electrode, so that the photoelectric conversion performance of the thin-film solar cell can be improved.

Drawings

In order to illustrate the embodiments of the present invention more clearly, the drawings that are needed in the description of the embodiments will be briefly described below, it being apparent that the drawings in the following description are only some embodiments of the invention, and that other drawings may be derived from those drawings by a person skilled in the art without inventive effort.

Fig. 1 is a schematic structural diagram of a thin film solar cell according to an embodiment of the present invention;

fig. 2 is a schematic structural diagram of another thin film solar cell provided by an embodiment of the invention;

fig. 3 is a schematic structural diagram of a thin film solar cell including a top electrode according to an embodiment of the present invention;

fig. 4 is a schematic structural diagram of a thin film solar cell including an anti-reflective layer according to an embodiment of the present invention;

fig. 5 is a schematic structural diagram of another thin film solar cell provided in an embodiment of the invention;

fig. 6 is a schematic structural diagram of another thin film solar cell provided in an embodiment of the invention;

fig. 7 is a flowchart of a method for manufacturing a thin film solar cell according to an embodiment of the present invention;

FIG. 8 is a schematic structural diagram of a barrier layer formed on a metal substrate according to an embodiment of the present invention;

fig. 9 is a flowchart of another method for manufacturing a thin film solar cell according to an embodiment of the present invention;

FIG. 10 is a flow chart of forming a barrier layer according to an embodiment of the present invention;

FIG. 11 is a schematic structural diagram of a metal compound film formed on a metal substrate according to an embodiment of the present invention;

FIG. 12 is a schematic structural diagram of a metal compound film formed with a metal thin film according to an embodiment of the present invention;

FIG. 13 is a flow chart of another method for forming a barrier layer according to an embodiment of the present invention;

fig. 14 is a schematic structural diagram of forming a second metal compound film on a first metal film according to an embodiment of the present invention.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention clearer, the present invention will be described in further detail with reference to the accompanying drawings, and it is apparent that the described embodiments are only some embodiments of the present invention, not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

At present, when the substrate is a metal substrate, harmful elements in the metal substrate can diffuse to the absorption layer through the back electrode in the high-temperature preparation environment of the absorption layer, and the photoelectric conversion performance of the thin-film solar cell is reduced. For example, when the substrate is a stainless steel substrate, elements such as Fe and Cu in the stainless steel substrate diffuse toward the absorption layer through the back electrode in a high-temperature preparation environment of the absorption layer, and these elements form deep level defects in the absorption layer, which causes changes in the structure of the absorption layer and in the composition ratio of each element in the absorption layer, and further affects the crystallization quality of the absorption layer, thereby reducing the photoelectric conversion performance of the thin-film solar cell.

In order to solve the above technical problem, an embodiment of the present invention provides a thin film solar cell, in which a barrier layer is disposed between a metal substrate and a back electrode, and the barrier layer includes a metal thin film and a metal compound thin film that are alternately stacked, where the metal compound thin film is made of at least one of a metal nitride and a metal oxide. The barrier layer can effectively prevent harmful elements in the metal substrate from diffusing to the absorption layer through the back electrode, so that the photoelectric conversion performance of the thin-film solar cell can be improved. Meanwhile, the thickness of each layer of film in the barrier layer can be set to be smaller, when the thickness of the film is smaller, the toughness of the film is better, the brittleness is smaller, in this way, under the high-temperature preparation environment of the absorption layer, the film is not easy to release heat through generation and expansion of cracks under the condition of overlarge thermal stress, so that the cracking or stripping phenomenon of each layer of film is avoided, a convenient channel for the diffusion of harmful elements in the metal substrate to the absorption layer is not provided, the blocking effect of the harmful elements in the metal substrate can be further improved, and the photoelectric conversion performance of the thin-film solar cell is improved.

Meanwhile, the invention also provides a preparation method of the thin film solar cell comprising the barrier layer, which comprises the following steps: forming a barrier layer including a metal thin film and a metal compound thin film alternately stacked on a metal substrate, wherein the metal compound thin film is made of at least one of a metal nitride and a metal oxide; a back electrode is formed on the barrier layer. The thin-film solar cell with high photoelectric conversion performance can be obtained by the preparation method, and meanwhile, the production cost of the cell is reduced.

Hereinafter, the present invention will be discussed in detail with reference to specific examples.