阅读说明：本技术 触摸传感器和包括触摸传感器的图像显示设备 (Touch sensor and image display apparatus including the same ) 是由 梁珍福 李建荣 于 2021-04-16 设计创作，主要内容包括：根据本发明的示例性实施方式,提供了一种触摸传感器和包括触摸传感器的图像显示设备。触摸传感器包括：基板层；形成在所述基板层上的感测电极；穿透所述感测电极中的至少一个的至少一个设备孔；沿着所述设备孔的外围形成的阻隔壁图案；以及设置在所述设备孔中以连接至所述阻隔壁图案的延伸图案。可以通过所述阻隔壁图案和所述延伸图案来防止由所述设备孔中的外部静电引起的缺陷。(According to exemplary embodiments of the present invention, a touch sensor and an image display device including the same are provided. The touch sensor includes: a substrate layer; a sensing electrode formed on the substrate layer; at least one device aperture penetrating at least one of the sensing electrodes; a barrier wall pattern formed along a periphery of the device aperture; and an extension pattern disposed in the device hole to be connected to the barrier wall pattern. Defects caused by external static electricity in the device hole may be prevented by the barrier wall pattern and the extension pattern.)

1. A touch sensor, comprising:

a substrate layer;

a sensing electrode formed on the substrate layer;

at least one device aperture penetrating at least one of the sensing electrodes;

a barrier wall pattern formed along a periphery of the device aperture; and

an extension pattern disposed in the device hole to connect to the barrier wall pattern.

2. The touch sensor of claim 1, wherein the sense electrode comprises:

a first sensing electrode arranged in a first direction parallel to a top surface of the substrate layer; and

a second sense electrode arranged along a second direction parallel to the top surface of the substrate layer, the first direction and the second direction intersecting one another.

3. The touch sensor of claim 2, further comprising:

a connection portion integrally formed with first sense electrodes adjacent in the first direction of the first sense electrodes to form a first sense electrode row extending in the first direction; and

bridge electrodes electrically connecting second sensing electrodes adjacent in the second direction of the second sensing electrodes to form a second sensing electrode column extending in the second direction.

4. The touch sensor of claim 3, wherein the device aperture is formed in at least one of the intersection regions of the first and second columns of sense electrodes.

5. The touch sensor of claim 4, wherein the device aperture penetrates a first pair of sensing electrodes of the first sensing electrodes that are adjacent to each other and a second pair of sensing electrodes of the second sensing electrodes that are adjacent to each other.

6. The touch sensor of claim 4, wherein the barrier wall pattern comprises: a first barrier rib pattern contacting a first sensing electrode of the device hole surrounding the first sensing electrode, and a second barrier rib pattern contacting a second sensing electrode of the device hole surrounding the second sensing electrode,

wherein the extension patterns include a first extension pattern connected to the first barrier rib pattern and a second extension pattern connected to the second barrier rib pattern.

7. The touch sensor of claim 6, further comprising a first dummy pattern extending between the first barrier rib pattern and the second extended pattern or between the second barrier rib pattern and the first extended pattern.

8. The touch sensor of claim 7, further comprising:

a first bridge pattern electrically connected to the first barrier rib pattern and the first extension pattern; and

a second bridge pattern electrically connected to the second barrier rib pattern and the second extension pattern.

9. The touch sensor of claim 8, wherein the first bridge pattern and the second bridge pattern intersect the first dummy pattern in a plan view.

10. The touch sensor of claim 7, further comprising:

a first coupling pattern integrally coupling the first barrier rib pattern and the first extension pattern to each other at the same level; and

a second coupling pattern integrally coupling the second barrier rib pattern and the second extension pattern to each other at the same level.

11. The touch sensor of claim 10, wherein the first dummy pattern has a shape cut by the first connection pattern or the second connection pattern.

12. The touch sensor of claim 7, further comprising a second dummy pattern extending between the first and second extended patterns.

13. The touch sensor of claim 12, wherein the first extended pattern, the second extended pattern, and the second dummy pattern are arranged along a same circumference.

14. The touch sensor of claim 1, wherein the sensing electrode comprises a transparent conductive oxide, and the barrier wall pattern and the extension pattern comprise a metal or an alloy.

15. A window stack structure comprising:

a window substrate; and

the touch sensor of claim 1.

16. The window stack-up structure of claim 15, further comprising a polarizer disposed between the touch sensor and the window substrate or on the touch sensor.

17. An image display apparatus comprising:

a display structure including at least one functional device selected from the group consisting of a camera, a speaker, an optical sensor, a recorder, and a light; and

the touch sensor of claim 1, stacked on the display structure.

18. The image display device of claim 17, wherein the device aperture of the touch sensor is aligned to overlap over the functional device.

Technical Field

The present invention relates to a touch sensor and an image display device including the same. More particularly, the present invention relates to a touch sensor including a patterned sensing electrode and an image display apparatus including the touch sensor.

Background

With the development of information technology, various demands for display devices having thinner sizes, light weights, high power consumption efficiency, and the like are increasing. The display device may include a flat panel display device such as a Liquid Crystal Display (LCD) device, a Plasma Display Panel (PDP) device, an electro-luminescence display device, an Organic Light Emitting Diode (OLED) display device, and the like.

A touch panel or a touch sensor capable of inputting a user's direction by selecting an instruction displayed on a screen with a finger or an input tool has also been developed. The touch panel or the touch sensor may be combined with a display device so that display and information input functions can be implemented in one electronic device.

The touch sensor may include a plurality of sensing electrodes for touch sensing. The sensing electrode may reduce image quality if the touch sensor is disposed on the front surface of the display device. Therefore, when used in a display device, a touch sensor having high transmittance or high transparency is advantageous.

Further, when various additional functional devices (e.g., cameras, speakers, recording devices, optical sensors, lights, etc.) are coupled to the display device, the desired functionality of the device may be disturbed or degraded by the touch sensor.

When the device area is allocated to a partial area of the touch sensor for the combination of the functional devices, the operation of the touch sensor may be disturbed by electrical interference in the device area.

Accordingly, there is a need for a touch sensor having improved compatibility with display devices/functional devices while also having improved sensitivity. For example, as disclosed in korean patent application publication No. 2014-.

Disclosure of Invention

According to an aspect of the present invention, there is provided a touch sensor having improved sensing reliability and device compatibility.

According to an aspect of the present invention, there is provided an image display device including the touch sensor.

The above aspects of the inventive concept are achieved by the following features or configurations:

(1) a touch sensor, comprising: a substrate layer; a sensing electrode formed on the substrate layer; at least one device aperture penetrating at least one of the sensing electrodes; a barrier wall pattern formed along a periphery of the device aperture; and an extension pattern disposed in the device hole to be connected to the barrier wall pattern.

(2) The touch sensor according to the above (1), wherein the sensing electrode includes: a first sensing electrode arranged in a first direction parallel to a top surface of the substrate layer; and a second sensing electrode arranged in a second direction parallel to the top surface of the substrate layer, the first direction and the second direction intersecting each other.

(3) The touch sensor according to the above (2), further comprising: a connection portion integrally formed with first sense electrodes adjacent in the first direction of the first sense electrodes to form a first sense electrode row extending in the first direction; and bridge electrodes electrically connecting second sensing electrodes adjacent in the second direction of the second sensing electrodes to form a second sensing electrode column extending in the second direction.

(4) The touch sensor according to the above (3), wherein the device hole is formed in at least one of intersection regions of the first sensing electrode row and the second sensing electrode column.

(5) The touch sensor according to the above (4), wherein the device hole penetrates a first sensing electrode pair adjacent to each other in the first sensing electrodes and a second sensing electrode pair adjacent to each other in the second sensing electrodes.

(6) The touch sensor according to the above (4), wherein the barrier wall pattern comprises: a first barrier rib pattern contacting a first sensing electrode surrounding the device hole of the first sensing electrode, and a second barrier rib pattern contacting a second sensing electrode surrounding the device hole of the second sensing electrode, wherein the extension pattern includes a first extension pattern connected to the first barrier rib pattern and a second extension pattern connected to the second barrier rib pattern.

(7) The touch sensor according to the above (6), further comprising a first dummy pattern extending between the first barrier rib pattern and the second extended pattern or between the second barrier rib pattern and the first extended pattern.

(8) The touch sensor according to the above (7), further comprising: a first bridge pattern electrically connected to the first barrier rib pattern and the first extension pattern; and a second bridge pattern electrically connected to the second barrier rib pattern and the second extension pattern.

(9) The touch sensor according to the above (8), wherein the first bridge pattern and the second bridge pattern intersect with the first dummy pattern in a plan view.

(10) The touch sensor according to the above (7), further comprising: a first coupling pattern integrally coupling the first barrier rib pattern and the first extension pattern to each other at the same level; and a second coupling pattern integrally coupling the second barrier rib pattern and the second extension pattern to each other at the same level.

(11) The touch sensor according to the above (10), wherein the first dummy pattern has a shape cut by the first connection pattern or the second connection pattern.

(12) The touch sensor according to the above (7), further comprising a second dummy pattern extending between the first extension pattern and the second extension pattern.

(13) The touch sensor according to the above (12), wherein the first extended pattern, the second extended pattern, and the second dummy pattern are arranged along the same circumference.

(14) The touch sensor according to the above (1), wherein the sensing electrode includes a transparent conductive oxide, and the barrier rib pattern and the extension pattern include a metal or an alloy.

(15) A window stack structure, comprising: a window substrate; and a touch sensor according to the embodiments described above.

(16) The window stack-up structure according to the above (15), further comprising a polarizing plate disposed between the touch sensor and the window substrate or on the touch sensor.

(17) An image display apparatus comprising: a display structure including at least one functional device selected from the group consisting of a camera, a speaker, an optical sensor, a recorder, and a light; and a touch sensor according to the embodiment as described above, which is stacked on the display structure.

(18) The image display device of (17) above, wherein the device aperture of the touch sensor is aligned to overlap over the functional device.

In the touch sensor according to the exemplary embodiment as described above, the device hole may be formed through the sensing electrode. The device hole may be formed to correspond to a function device of the image display device, such as a camera, a speaker, an optical sensor, a recorder, a lamp, etc., so that the operation and performance of the function device can be substantially and completely implemented without being interfered by the touch sensor.

In an exemplary embodiment, a wall pattern may be formed along the periphery of the device hole, and an extension pattern connected to the wall pattern may be formed at the inside of the device hole. Migration of external static electricity (external static electricity) within the device hole may be facilitated by the extended pattern. Accordingly, physical and electrical defects of the sensing electrode caused by external static electricity can be prevented, and durability and stability of the touch sensor can be improved.

In some embodiments, dummy patterns may be arranged at the interior of the device holes to further facilitate migration of external static electricity by the extended patterns while preventing charge flow and electrical interference with the sense electrodes.

Drawings

Fig. 1 and 2 are a schematic top plan view and a schematic cross-sectional view illustrating a touch sensor according to an exemplary embodiment, respectively.

Fig. 3 and 4 are a schematic top plan view and a schematic cross-sectional view, respectively, illustrating the configuration of a device hole included in a touch sensor according to an exemplary embodiment.

Fig. 5 is a schematic top plan view illustrating a configuration of a device hole included in a touch sensor according to an exemplary embodiment.

Fig. 6 is a schematic sectional view illustrating an image display apparatus according to an exemplary embodiment.

Detailed Description

According to an exemplary embodiment of the present invention, there is provided a touch sensor including a plurality of sensing electrodes and at least one device hole. Further, a window stack structure and an image display apparatus including the touch sensor are provided.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings. However, those skilled in the art will appreciate that such embodiments described with reference to the accompanying drawings are provided to further understand the spirit of the present invention, and not to limit the disclosed claimed subject matter to the specific embodiments and the appended claims.

Fig. 1 and 2 are a schematic top plan view and a schematic cross-sectional view illustrating a touch sensor according to an exemplary embodiment, respectively. For example, FIG. 2 is an enlarged partial cross-sectional view of the area labeled "C" in FIG. 1.

Referring to fig. 1 and 2, the touch sensor may include a substrate layer 100 and sensing electrodes 110 and 130 disposed on the substrate layer 100.

The substrate layer 100 may include a film-type substrate that may be used as a base layer for forming the sensing electrodes 110 and 130 or an object or workpiece on which the sensing electrodes 110 and 130 are formed. In some embodiments, the substrate layer 100 may include a display panel on which the sensing electrodes 110 and 130 may be directly formed.

For example, the substrate layer 100 may include substrates or film materials commonly used in touch sensors, such as glass, polymers, and/or inorganic insulating materials. The polymer may include, for example, Cyclic Olefin Polymer (COP), polyethylene terephthalate (PET), Polyacrylate (PAR), Polyetherimide (PEI), polyethylene naphthalate (PEN), polyphenylene sulfide (PPS), polyallylate, Polyimide (PI), Cellulose Acetate Propionate (CAP), Polyethersulfone (PES), cellulose Triacetate (TAC), Polycarbonate (PC), Cyclic Olefin Copolymer (COC), Polymethylmethacrylate (PMMA), and the like. The inorganic insulating material may include, for example, silicon oxide, silicon nitride, silicon oxynitride, metal oxide, or the like.

The sensing electrodes 110 and 130 may include a first sensing electrode 110 and a second sensing electrode 130.

For example, the first sensing electrodes 110 may be arranged along a first direction (e.g., an X-axis direction) parallel to the top surface of the substrate layer 100. Accordingly, a first sensing electrode row extending in the first direction may be formed by the first sensing electrode 110. The plurality of first sensing electrode rows may be arranged in the second direction.

In some embodiments, the first sensing electrodes 110 adjacent in the first direction may be physically or electrically connected to each other through the connection part 115. For example, the connection part 115 may be integrally formed with the first sensing electrode 110 on the same level.

The second sensing electrodes 130 may be arranged in a second direction (e.g., a Y-axis direction) that may be parallel to the top surface of the substrate layer 100. In some embodiments, the second sensing electrode 130 may include island-type cell electrodes physically separated from each other. In this case, the second sensing electrodes 130 adjacent in the second direction may be electrically connected to each other through the bridge electrode 135.

Accordingly, a second sensing electrode column extending in the second direction may be formed of the plurality of second sensing electrodes 130 and the bridge electrode 135. In addition, the plurality of second sensing electrode columns may be arranged in the first direction.

According to an exemplary embodiment, an insulating layer 120 may be formed on the substrate layer 100 to cover the first and second sensing electrodes 110 and 130. The bridge electrode 135 may be formed on the insulating layer 120 to penetrate the insulating layer 120 and electrically connect the adjacent second sensing electrodes 130 to each other.

The insulating layer 120 may include an inorganic insulating material such as silicon oxide or silicon nitride, or an organic insulating material such as acrylic resin or siloxane resin.

For example, the first and second directions may be parallel to the top surface of the substrate layer 100 and may be perpendicular to each other.

In some embodiments, the outer periphery or boundary portions of the first and second sensing electrodes 110 and 130 may be patterned in a wave shape. Accordingly, a moir e phenomenon (moir e phenomenon) due to regular overlap between the sensing electrodes 110 and 130 and electrodes or wirings (data lines, gate lines, etc.) included in the display panel disposed under the touch sensor may be reduced.

In some embodiments, the periphery or boundary of the first and second sensing electrodes 110 and 130 may be patterned into a zigzag shape, a diamond shape, a polygon shape, or the like.

The sensing electrodes 110 and 130 and/or the bridging electrode 135 may include a transparent conductive oxide such as, for example, Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), zinc oxide (ZnO), Indium Zinc Tin Oxide (IZTO), Cadmium Tin Oxide (CTO), and the like.

For example, sensing electrodes 110 and 130 and/or bridging electrode 135 may include: silver (Ag), gold (Au), copper (Cu), aluminum (Al), platinum (Pt), palladium (Pd), chromium (Cr), titanium (Ti), tungsten (W), niobium (Nb), tantalum (Ta), vanadium (V), iron (Fe), manganese (Mn), cobalt (Co), nickel (Ni), zinc (Zn), molybdenum (Mo), calcium (Ca), or an alloy containing at least one of the metals (e.g., silver-palladium-copper (APC), copper-calcium (CuCa)). These may be used alone or in combination thereof.

In some embodiments, sensing electrodes 110 and 130 and/or bridging electrode 135 may comprise a multilayer structure comprising a transparent conductive oxide layer and a metal layer. For example, the sensing electrodes 110 and 130 and/or the bridging electrode 135 may have a double-layer structure including a transparent conductive oxide layer-metal layer or a triple-layer structure including a transparent conductive oxide layer-metal layer-transparent conductive oxide layer. In this case, flexibility may be enhanced by the metal layer, and resistance may be reduced to increase a signal transmission speed. In addition, corrosion resistance and transmittance can be improved by the transparent conductive oxide layer.

In a preferred embodiment, the sensing electrodes 110 and 130 may include the above-described transparent conductive oxide. Accordingly, the overall transmittance of the touch sensor may be improved, and the imaging characteristics of the image display device into which the touch sensor is inserted may be enhanced.

A dummy region D may be defined between the adjacent first and second sensing electrodes 110 and 130. The first and second sensing electrodes 110 and 130 may be physically and electrically separated from each other by the dummy region D. Although not shown, a dummy electrode may be formed in the dummy region D. The dummy electrode can prevent or reduce visual recognition of the electrode due to deviation of pattern shapes and optical characteristics in the dummy region D.

The intersection region C may be defined by a region where the first sensing electrode row and the second sensing electrode column cross each other or a region where the connection portion 115 and the bridge electrode 135 may cross each other. According to an exemplary embodiment, at least one of the crossing regions may be formed as a hole region H. The aperture region H may include a device aperture 150. When the device hole 150 is formed, the connection portion 115 and the bridge electrode 135 may be omitted or removed in the hole region H.

The term "device aperture" as used in this application may include an opening where a conductive layer is removed or optionally not formed. The "device hole" may substantially include the vacant region and also include, for example, a structure in which a transparent insulating layer is at least partially formed in the opening. The structure and shape of the device aperture 150 will be described in more detail later with reference to fig. 3 and 4.

Fig. 3 and 4 are a schematic top plan view and a schematic cross-sectional view, respectively, illustrating the configuration of a device hole included in a touch sensor according to an exemplary embodiment. Specifically, fig. 4 is a sectional view taken along line I-I' of fig. 3 in the thickness direction.

In fig. 3 and 4, a device hole 150 may be formed through at least one sensing electrode 110 and 130. As described above, at least one of the intersection regions C of the first sensing electrode row and the second sensing electrode column may be set as the hole region H where the device hole 150 is formed.

In some embodiments, the device aperture 150 may penetrate a pair of first and second sensing electrodes 110, 130 that are adjacent to each other around the aperture region H.

In an exemplary embodiment, barrier wall patterns 160 and 170 defining the boundary of the device hole 150 may be formed along the periphery of the device hole 150. The barrier rib patterns 160 and 170 may contact sidewalls of the sensing electrodes 110 and 130.

The barrier rib pattern may include a first barrier rib pattern 160 contacting the sidewall of the first sensing electrode 110 and a second barrier rib pattern 170 contacting the sidewall of the second sensing electrode 130. The first and second barrier rib patterns 160 and 170 may be electrically and physically separated from each other.

As shown in fig. 3, when the device hole 150 has a substantially circular shape, the barrier wall pattern may be formed along a circumference, and may have an annular pattern shape that may be cut such that the first and second barrier wall patterns 160 and 170 may be spaced apart from each other. The boundaries of the device aperture 150 may be generally defined by a pattern of barrier walls.

The shape of the device hole 150 may be changed to a polygonal shape, an elliptical shape, or the like as appropriate according to the shape of the corresponding function device.

The extended pattern may be formed inside the device hole 150. The extension pattern may be electrically connected with the barrier rib pattern, and may be disposed inside the device hole 150 to be closer to the center of the device hole 150 than the barrier rib pattern.

The extension patterns may include a first extension pattern 162 connected to the first barrier rib pattern 160 and a second extension pattern 172 connected to the second barrier rib pattern 170. The first and second extension patterns 162 and 172 may be electrically and physically separated from each other in the device hole 150.

For example, the extended pattern may be formed along a contour around the device aperture 150, and may have, for example, a circular arc shape.

In an exemplary embodiment, a dummy pattern may be further formed in the device hole 150. The dummy patterns may include a first dummy pattern 182 formed between the barrier rib patterns 160 and 170 and the extension patterns 162 and 172, and a second dummy pattern 184 formed between the first extension pattern 162 and the second extension pattern 172.

The dummy pattern may also be formed along the outline around the device hole 150, and may be a circular arc pattern.

In an embodiment, the barrier wall patterns 160 and 170, the first dummy pattern 182, and the extension patterns 162 and 172 may be formed along circular arcs whose radii may sequentially decrease.

In an exemplary embodiment, the first dummy pattern 182 may be disposed between the first barrier rib pattern 160 and the first extension pattern 162. Accordingly, the first bridge pattern 164 may be formed to connect the first barrier rib pattern 160 and the first extension pattern 162 to each other. The first bridge pattern 164 may be disposed on the insulating layer 120 and may cross the first dummy pattern 182 in a plan view.

The first bridge pattern 164 may connect the first barrier rib pattern 160 and the first extension pattern 162 to each other through the first contact 165. For example, the first contact 165 may penetrate the insulating layer 120 and may contact the first barrier rib pattern 160 and the first extension pattern 162.

The first dummy pattern 182 may also be disposed between the second barrier rib pattern 170 and the second extension pattern 172. Accordingly, the second bridge pattern 174 may be formed to connect the second barrier rib pattern 170 and the second extension pattern 172 to each other. The second bridge pattern 174 may be disposed on the insulating layer 120 and may cross the first dummy pattern 182 in a plan view.

The second bridge pattern 174 may connect the second barrier rib pattern 170 and the second extension pattern 172 to each other through the second contact 175. For example, the second contact 175 may penetrate the insulating layer 120 and may contact the second barrier rib pattern 170 and the second extension pattern 172.

In some embodiments, the first and second bridge patterns 164 and 174 may be disposed at the same level or at the same layer as the bridge electrode 135 and may be formed together by substantially the same etching process. For example, the first and second bridge patterns 164 and 174 and the bridge electrode 135 may include the same metal or alloy.

The second dummy pattern 184 may be closer to the center of the device hole 150 than the first dummy pattern 182. In an exemplary embodiment, the second dummy pattern 184 may be formed along substantially the same circumference as the first and second extension patterns 162 and 172. The second dummy pattern 184 may be disposed between the first and second extension patterns 162 and 172.

The device hole 150 may be formed to correspond to a functional device of the image display device, such as a camera, a speaker, a recorder, an optical sensor, a lamp, and the like. For example, when the touch sensor is inserted into the image display device, the device hole 150 may be aligned so as to overlap with a position where the function device is located.

For example, the device hole 150 may be formed in a region of the touch sensor overlapping the camera so that a transmittance substantially close to 100% may be achieved, thereby improving the resolution and imaging quality of the camera. Further, optical interference and electrical interference caused by the sensing electrodes 110 and 130 included in the touch sensor may be substantially avoided, so that desired performance of the functional device may be achieved with high reliability in the image display device.

When external static electricity is applied to the touch sensor including the device hole 150, the external static electricity may be trapped in the device hole 150, and charging due to the static electricity may occur in the device hole 150.

In this case, physical damage or electrical short may occur in the sensing electrodes 110 and 130 adjacent to the device hole 150. Therefore, the electrical durability and mechanical durability of the touch sensor may be deteriorated.

However, according to the above-described exemplary embodiment, the barrier wall patterns 160 and 170 may be formed around the device hole 150 to effectively absorb external static electricity. In addition, extension patterns 162 and 172 connected to the barrier wall patterns 160 and 170 may be formed in the device hole 150, so that migration of external static electricity may be promoted.

Accordingly, a charging phenomenon due to external static electricity in the device hole 150 may be prevented, and electrical and mechanical durability of the sensing electrodes 110 and 130 around the device hole 150 may be improved.

In addition, for example, the first dummy pattern 182 may be disposed between the first barrier rib pattern 160 and the second extension pattern 172, and between the second barrier rib pattern 170 and the first extension pattern 162. The second dummy pattern 184 may be disposed between the first and second extension patterns 162 and 172.

Accordingly, it is possible to facilitate the flow of external static electricity in the device hole 150 while maintaining the operational reliability or independence between the first and second sensing electrodes 110 and 130.

In some embodiments, the barrier rib patterns 160 and 170, the dummy patterns 182 and 184, and the extension patterns 162 and 172 may be patterns formed of the above-described metal or alloy, thereby having relatively low resistance compared to the sensing electrodes 110 and 130. Therefore, the removal of external static electricity can be further promoted.

Fig. 5 is a schematic top plan view illustrating a configuration of a device hole included in a touch sensor according to an exemplary embodiment.

Referring to fig. 5, the barrier wall pattern and the extension pattern may be formed as a single member integrally connected to each other.

As shown in fig. 5, the first barrier rib patterns 160 and the first extension patterns 162 may be integrally connected to each other via the first connection patterns 163. The first barrier rib patterns 160, the first connection patterns 163, and the first extension patterns 162 may all be disposed at the same level or at the same layer. Accordingly, the first bridge pattern 164 and the first contact 165 shown in fig. 3 may be omitted.

The second barrier rib patterns 170 and the second extension patterns 172 may be integrally connected to each other via the second connection patterns 173. The second barrier wall patterns 170, the second connection patterns 173, and the second extension patterns 172 may all be disposed at the same level or at the same layer. Accordingly, the second bridge pattern 174 and the first contact 165 shown in fig. 3 may be omitted.

The first dummy pattern 182 may have a segmented shape so as not to contact the first and second connection patterns 163 and 173. Accordingly, as described above, the bridge patterns 164 and 174 may be omitted, and the conductive patterns included in the device hole 150 may be configured as a substantially single layer.

Fig. 6 is a schematic sectional view illustrating an image display apparatus according to an exemplary embodiment.

Referring to fig. 6, the image display apparatus may include a base substrate 200, a display structure 210, a touch sensor 220, a polarizing plate 230, and a window substrate 240. The display panel may be defined by a base substrate 200 and a display structure 210.

In addition, the window stack structure may be defined by the touch sensor 220, the polarizing plate 230, and the window substrate 240.

The base substrate 200 may be used as, for example, a backplane substrate of an image display apparatus, and may include a transparent insulating material such as glass or polyimide.

The display structure 210 may include a Thin Film Transistor (TFT) disposed on the base substrate 200, a pixel electrode electrically connected to the thin film transistor, and a display layer formed on the pixel electrode. The display layer may include, for example, a liquid crystal layer or an organic emission layer. The display structure 210 may further include a wiring electrically connected to the thin film transistor, such as a data line, a power line, a scan line, and the like. In addition, functional devices such as cameras, speakers, optical sensors, sound recorders, lights, etc. may be included in the display structure 210.

The touch sensor 220 may be stacked on the display structure 210. As described above, the touch sensor 220 may include the device aperture 150, and the device aperture 150 may be aligned to substantially overlap over the functional device.

The polarizing plate 230 may be stacked on the touch sensor 220. In some embodiments, polarizing plate 230 may also include an aperture 235 that covers the functional device. The hole 235 may be formed by cutting a partial region of the polarizing plate 230 or by a partial depolarization process. The device aperture 150 and the aperture 235 may be aligned to overlap each other.

In some embodiments, the polarizing plate 230 may be stacked on the display structure 210, and then the touch sensor 220 may be stacked on the polarizing plate 230.

The window substrate 240 may be stacked on the polarizing plate 230 or the touch sensor 220, and may be used as a protective film or a protective substrate of the image display device. The window substrate 240 may include, for example, a transparent insulating resin such as polyester, polyurethane, polyacrylate, etc., or glass such as ultra-thin glass (UTG).