阅读说明：本技术 高度不对称的三嵌段聚合物组合物及其制备方法 (Highly asymmetric triblock polymer compositions and methods of making the same ) 是由 D·杜波伊斯 M·杜邦 C·威利斯 R·Q·克卢兹 于 2018-06-09 设计创作，主要内容包括：本发明涉及具有优异的拉伸强度和高熔融指数的组合的苯乙烯类三嵌段共聚物组合物,其出色地用于制造、修整和处理、形成稳定的粒料,用于包括但不限于粘合剂、涂料和柔版印刷的应用。所述组合物包含：第一嵌段,其为单烯基芳烃的聚合物；第二嵌段,其为共轭二烯的聚合物；和第三嵌段,其为单烯基芳烃的聚合物,其中所述第三嵌段的峰值分子量为所述第一嵌段的峰值分子量的约0.06-0.4倍。(The present invention relates to styrenic triblock copolymer compositions having a combination of excellent tensile strength and high melt index that are excellent for manufacturing, finishing and handling, forming stable pellets, for applications including but not limited to adhesives, coatings, and flexographic printing. The composition comprises: a first block that is a polymer of a mono alkenyl arene; a second block which is a polymer of a conjugated diene; and a third block that is a polymer of a mono alkenyl arene, wherein the peak molecular weight of the third block is about 0.06 to 0.4 times the peak molecular weight of the first block.)

1. A highly asymmetric triblock ("HAT") copolymer composition comprising a first block that is a polymer of a mono alkenyl arene, a second block that is a polymer of a conjugated diene, and a third block that is a polymer of a mono alkenyl arene; wherein:

the block copolymer has a peak molecular weight of 10,000-500,000g/mol,

the peak molecular weight of the third block is 0.06 to 0.4 times the peak molecular weight of the first block, and

the composition has a total aromatics content of 15 to 40 wt.%.

2. The HAT copolymer composition of claim 1, wherein the composition comprises formula A1-B-A2 or (A2-B-A1)_nA mixture of copolymers of X, wherein both a1 and a2 are monoalkenyl arene blocks, B is a conjugated diene block, n is an integer from 2 to 6, X is the residue of a coupling agent, and the peak molecular weight of the a1 block is at least 2.5 times the peak molecular weight of the a2 block.

3. The HAT copolymer composition of claim 1, wherein the composition has the formula (A2-B-A1)_nX and wherein the copolymer is bonded to the coupling agent at the a2 block.

4. The HAT copolymer composition of any one of claims 1-3, wherein the HAT copolymer is blended with at least a second polymer different from the HAT copolymer to form a blended HAT copolymer.

5. The HAT copolymer composition of any one of claims 1-3, wherein the composition is characterized as having a tensile strength of 0.1 to 10MPa, as determined according to ASTM D412 or ASTM D638.

6. The HAT copolymer composition of any of claims 1-3, wherein the composition is characterized by having a melt index of 5 to 200g/10min, as determined by 5kg mass at 200 ℃ according to ASTM D1238.

7. The HAT copolymer composition of any one of claims 1-3, wherein the conjugated diene is hydrogenated for use in a hydrogenated highly asymmetric triblock copolymer.

8. The HAT copolymer composition of any one of claims 1-3, wherein the second block is a mixed mid-block of two dienes from 10:90 to 90: 10.

9. The HAT copolymer composition of any one of claims 1-3, wherein the second block is a mixed mid-block having isoprene and butadiene or a mixture of butadiene and myrcene, wherein the conjugated diene is formed from a butadiene monomer or an isoprene monomer that is a substantially pure monomer, and wherein the amount of butadiene is at least 20 wt% of the total weight of the total second block.

10. The HAT copolymer composition of any of claims 1-3, wherein the conjugated diene is formed from butadiene monomers, and wherein the conjugated diene block has a vinyl content of 8 to 95 mol%.

11. The HAT copolymer composition of any one of claims 1-3, wherein the conjugated diene is formed from butadiene monomers, and wherein the conjugated diene block has a vinyl content that gradually increases throughout the block.

12. A label or surface protective film formed by laminating or applying an adhesive layer comprising an adhesive composition comprising 30 to 60 wt% of the HAT copolymer composition of any of claims 1 to 3, 30 to 60 wt% of a tackifying resin, 0 to 45 wt% of an oil, and 0 to 3 wt% of an antioxidant, wherein the wt% is based on the total weight of the adhesive composition.

13. A bitumen composition or bitumen emulsion comprising: a) the HAT copolymer composition of claim 1, b) a bituminous binder, and c) optionally a chemical crosslinking agent, wherein the percentage of HAT polymer in the blend is from 2 to 20%.

14. A method of making a highly asymmetric triblock ("HAT") copolymer composition comprising:

polymerizing a sufficient amount of a first monoalkylaromatic hydrocarbon to form a first polymer block;

adding a conjugated diene and polymerizing the conjugated diene to form a second polymer block attached to the first polymer block;

adding a sufficient amount of a second monoalkylaromatic and polymerizing to form a third polymer block attached to the second polymer block, thereby forming the HAT copolymer; and

optionally adding a coupling agent X;

wherein the ratio of the peak molecular weight of the third block to the peak molecular weight of the first block is from 0.06 to 0.4.

Technical Field

The present invention relates to the use of styrenic block copolymers for applications including adhesives, flexographic printing, and paving and roofing.

Background

Pure styrenic diblock copolymers have a great commercial need in the adhesive industry because they can impart desirable properties such as high tack, low hot melt viscosity, and in the case of pressure sensitive adhesive label production, they allow for more efficient conversion. However, styrenic diblock copolymers cannot be readily prepared in convenient pellet form. Typically, such products are supplied in the form of rubber blocks. Furthermore, to obtain these conventional pelletized styrenic diblock copolymers, a cost investment is required so that they are sold at premium prices and are subject to excessive cold flow.

There is a continuing need to develop block copolymer compositions having desirable processing characteristics.

Summary of The Invention

In one aspect, a composition comprising a styrenic triblock copolymer and method of making the same are disclosed. The composition comprises: a first block that is a polymer of a mono alkenyl arene; a second block which is a polymer of a conjugated diene; and a third block which is a polymer of a mono alkenyl arene, wherein the block copolymer has a peak molecular weight of 10,000-500,000 g/mol; the peak molecular weight of the third block is 0.06-0.4 times the peak molecular weight of the first block; and the composition has a total aromatic content of 15 to 40 wt%.

In another aspect, a method for preparing a highly asymmetric triblock ("HAT") copolymer composition is disclosed. The method comprises the following steps: polymerizing a sufficient amount of a first monoalkylaromatic hydrocarbon to form a first polymer block (a1), adding a conjugated diene and polymerizing the conjugated diene to form a second polymer block (B) attached to the first polymer block, and adding a sufficient amount of a second monoalkylaromatic hydrocarbon and polymerizing to form a third polymer block attached to the second polymer block, thereby forming a HAT copolymer; wherein the ratio of the peak molecular weight of the third block to the peak molecular weight of the first block is from 0.06 to 0.4.

In yet another aspect, a method of preparing Highly Asymmetric Triblock (HAT) copolymer compositions by a coupled polymerization process is disclosed. The method comprises the following steps: polymerizing a sufficient amount of a first monoalkylaromatic hydrocarbon to form a first polymer block (A2), adding a conjugated diene and polymerizing the conjugated diene to form a second polymer block (B) attached to the first polymer block, adding a sufficient amount of a second monoalkylaromatic hydrocarbon and polymerizing to form a third polymer block body (a1) attached to the second polymer block, and adding a coupling agent X to form a HAT copolymer having the formula (A2BA1) nX, and wherein the ratio of the peak molecular weight of the first block (A2) to the peak molecular weight of the third block (a1) is 0.06-0.4.

Detailed Description

Unless otherwise specified, the following terms will be used throughout the specification and will have the following meanings.

"molecular weight" refers to the true molecular weight in g/mol of a block of a polymer or copolymer, which can be determined by Gel Permeation Chromatography (GPC) using polystyrene calibration standards according to ASTM 5296-11. It is understood by those skilled in the art that GPC analysis reports column residence time, which is then converted to normalized molecular weights, typically using polystyrene standards. These "styrene equivalent" molecular weights are commonly used in the polymer industry. For the purposes of this invention, peak molecular weight is reported as the true molecular weight based on molar mass rather than GPC "styrene equivalent" residence time.

Peel adhesion testing (FTM1, peel adhesion at 300 mm/min (180 °)) and loop adhesion testing (FTM 9, loop adhesion measurement) were performed using a RK K controlled coater (RK print coat Instruments Ltd) as described in Finat Technical Handbook, Test Methods, 9 th edition, Finat, the netherlands, 5 months 2014.

Tensile strength was determined according to ASTM D412.

Melt index refers to the melt flow of a polymer under conditions G, 200 ℃ under a 5kg load according to ASTM D1238. It is expressed in grams of polymer melt that passed through the orifice in 10 minutes.

"diblock copolymer" refers to the proportion of free diblock present in the composition.

"coupling efficiency" refers to the number of molecules of coupled polymer divided by the number of molecules of coupled polymer plus the number of molecules of uncoupled polymer. For example, if the coupling efficiency is 80%, the polymer will contain 20% diblock and 80% triblock and multiarm blocks.

"HAT" refers to a highly asymmetric triblock copolymer, where the term "highly asymmetric" refers to the difference between the polystyrene blocks of the HAT polymer. In some embodiments, the HAT is blended with a second polymer or other ingredient to form a blended HAT. The second polymer may comprise styrenic blocks or combinations thereof. References to HAT include HAT blends.

By "hydrogenated HAT polymer" is meant a HAT polymer that has been contacted with a hydrogenation catalyst for a period of time and under suitable conditions to generally improve the thermal stability, ultraviolet light stability, oxidative stability, and thus weatherability of the final polymer.

"vinyl content" refers to the polymer product when 1, 3-butadiene is polymerized by a1, 2-addition mechanism to produce a monosubstituted olefin or vinyl group adjacent to the polymer backbone. The effect of 3, 4-addition polymerization of isoprene on the final properties of any block copolymer will be similar to those of 1, 2-addition of butadiene.

HAT polymers and compositions comprising HAT and methods of making the same are disclosed herein. HAT polymers are characterized by physical properties typically associated with diblock copolymers at temperatures greater than 150 ℃ (e.g., lower cohesive strength, low melt viscosity, and improved tack), and handling characteristics similar to triblock copolymers, e.g., capable of forming pellets, at another temperature range (e.g., less than 110 ℃). HAT polymers are useful as adhesives, pressure sensitive adhesives, flexographic, paving, and roofing components.

HAT Polymer composition-triblock A1-B-A2: in one embodiment, the HAT composition is a triblock polymer of a1-B-a2, where a1 and a2 are both mono alkenyl arene blocks, B is a conjugated diene block and the smaller a2 block is at the end. A1 refers to the larger of two monoalkenyl arene blocks that differ significantly in Molecular Weight (MW). The peak MW of the a1 block is significantly greater than the peak MW of the a2 block so that the asymmetry can be expressed as a2 ═ a1 ×, where X ranges from about 0.06 to 0.40. In one embodiment, the peak MW of the a1 block is at least greater than 20%, greater than 30%, or greater than 40% of the peak MW of the a2 block. In some embodiments, the composition comprises a compound of formula (A2-B-A1)_nX, wherein n is an integer from 2 to 6 and X is the residue of a coupling agent. When n equals 2, a linear coupled HAT is formed. When n is equal to or greater than 2, dendritic or star-shaped coupled HATs are formed. In the case where the coupled HAT polymer is bound to the coupling agent with the A1 block, the coupled HAT comprises a compound of the formula (A2-B-A1)_nX。

In one embodiment, the a1 blocks are formed from mono alkenyl arene monomers different from the mono alkenyl arene monomers comprising the a2 blocks, for example in one example, the a1 blocks comprise substantially pure styrene and the a2 blocks comprise substantially pure para-methylstyrene. HAT polymers comprising a1 block and a2 block comprised of different monoalkylaromatic hydrocarbons may be referred to herein as unique edge HAT polymers.

In some embodiments, the HAT polymer may comprise, consist of, or consist essentially of: HAT, unique edge HAT, coupled HAT, hydrogenated HAT, or a combination thereof. The term "HAT polymer" will encompass any of the HAT polymers described herein.

In the above formula, the monoalkenyl arene block comprises any polymerized monoalkenyl arene monomer. Examples include styrene, o-methylstyrene, p-tert-butylstyrene, 2, 4-dimethylstyrene, alpha-methylstyrene, vinylnaphthalene, vinyltoluene and vinylxylene or mixtures thereof. In other embodiments, the mono alkenyl arene block comprises substantially pure mono alkenyl arene monomers. In some embodiments, the mono alkenyl arene block comprises styrene in which styrene may be used as a substantially pure monomer. For example, styrene may be the major component in a mixture having a minor proportion of structurally related vinyl aromatic monomers. Structurally related vinyl aromatic monomers that can be used as a minor component in a mixture having a major component comprising styrene can be o-methylstyrene, p-tert-butylstyrene, 2, 4-dimethylstyrene, alpha-methylstyrene, vinylnaphthalene, vinyltoluene, vinylxylene, or a combination thereof. In some embodiments, the proportion of vinyl aromatic monomer that constitutes a minor component in the styrene-containing mixture may not exceed about 10 wt%.

In some embodiments, the mono alkenyl arene content of the a1 blocks ranges from 5 to 50 weight percent, or from 5 to 40 weight percent, or from 10 to 35 weight percent, based on the total weight of the HAT polymer. In some embodiments, the mono alkenyl arene content of the a2 blocks of the HAT polymer is in the range of 1 to 20 weight percent, or 15 weight percent, or 1 to 10 weight percent, based on the total weight of the HAT polymer.

In some embodiments, the peak molecular weight of each A1 block is 5000-50,000g/mol, alternatively 10,000-40,000g/mol or 10,000-30,000 g/mol. In one embodiment, the peak molecular weight of each A2 block is 1000-10,000g/mol, alternatively 1000-8000g/mol or 1000-5000 g/mol.

In some embodiments, the molecular weights of the a1 and a2 block segments relative to each other can be expressed as a2 molecular weight in the (0.06) a1- (0.4) a1 range, where a1 and a2 are expressed as molecular weights, regardless of the unit.

In some embodiments, the conjugated diene block may comprise any suitable conjugated diene; alternatively, the conjugated diene has from four to ten carbon atoms. In one embodiment, the conjugated diene is formed from butadiene monomers or isoprene monomers which are substantially pure monomers or contains a minor proportion (up to 10 weight percent) of structurally related conjugated dienes such as 2, 3-dimethyl-1, 3-butadiene, 1, 3-pentadiene and 1, 3-hexadiene and 7-methyl-3-methylene-1, 6-octadiene (i.e., myrcene). Alternatively, the conjugated diene block is prepared using substantially pure butadiene or substantially pure isoprene, or substantially pure butadiene.

In some embodiments, the peak molecular weight of each conjugated diene block is from 10,000-500,000g/mol, alternatively from 10,000-200,000g/mol, alternatively from 10,000g/mol to 150,000 g/mol.

In embodiments where butadiene is the conjugated diene monomer, the vinyl content of the conjugated diene block (i.e., B block) is in the range of from 8 to 95 mol%, alternatively from 10 to 85 mol%, alternatively from 12 to 65 mol%. In embodiments where isoprene is a conjugated diene monomer, the vinyl content of the B block is in the range of from 8 to 95 mol%, alternatively from 10 to 85 mol%, alternatively from 12 to 65 mol%.

In one embodiment, the low vinyl B block is a conjugated diene block comprising a vinyl content of less than 15 mol% based on the total conjugated diene block composition. In another embodiment, the high vinyl B block is a conjugated diene block comprising a vinyl content of greater than 25 mol% based on the total conjugated diene block composition.

In some embodiments, the conjugated diene block (i.e., B block) of the HAT polymer comprises a progressively smaller vinyl content. "tapered" refers to a distribution such that the ends of the B blocks adjacent to the mono alkenyl arene blocks have a vinyl content of less than about 15 mol% and the opposite ends of the blocks (away from the mono alkenyl arene blocks) have a vinyl content of greater than about 25 mol% vinyl content.

In one embodiment, the vinyl content of the B block gradually increases throughout the expanse of the B block. In another embodiment, the B block contains regions of low vinyl content near the a1 block and these regions of lower vinyl content are followed by regions of high vinyl content far from the a1 or a2 block, depending on which of the two blocks is polymerized first. In some embodiments, the vinyl content of the B block will start in an amount less than 15 mol% and will increase gradually on average throughout the block. In another embodiment, the vinyl content at the first end of the B block is in the range of from 7 to 15 mol% and increases on average throughout the B block such that at least the last 10 to 49% of the B block or at least the last 25 to 49% of the B block contains a vinyl content of greater than 25 mol%, or 25 to 80 mol%, or 40 to 75 mol%, or 50 to 65 mol%.

In some embodiments, the conjugated diene block (i.e., B block) of the HAT polymer comprises a highly saturated B block in which hydrogen molecular addition occurs throughout the C ═ C portion within the B block. The highly saturated B block comprises a B block in which hydrogen molecular addition occurs in greater than 92 mol% or greater than 95 mol% or 98 mol% of the C ═ C moieties in the B block.

In some embodiments, the conjugated diene block (i.e., B block) of the HAT polymer comprises a partially saturated B block in which hydrogen molecular addition occurs to only a portion of the C ═ C moieties within the B block. The partially saturated B block comprises a B block wherein the hydrogen molecular addition occurs in the range of 20 to 90 mol% or 20 to 80 mol% or 20 to 50 mol% of the C ═ C moieties in the B block.

In another embodiment, the mixed B block comprises a mixture of butadiene and isoprene, or a mixture of substantially pure butadiene and substantially pure isoprene. In yet another embodiment, the molar ratio of butadiene to isoprene making up the mixed B block is any of 9:1, 4:1, 3:1, 2:1, 1:2, 1:3, 1:4, or 1: 9. In another embodiment, the amount of butadiene in the mixed B block comprising butadiene and isoprene is any of at least 20 wt%, at least 40 wt%, at least 60 wt%, or at least 80 wt%, based on the total weight of the total mixed B block.

In one embodiment, the B block of the HAT polymer may comprise, consist of, or consist essentially of: a low vinyl content, a high vinyl content, a gradually decreasing vinyl content B block. In another embodiment, the B block can be highly saturated, partially saturated second, unsaturated, or a combination thereof and wherein the B block can be a mixed B block. In one embodiment, the HAT polymer comprises a mixed mid-block of two dienes from 10:90 to 90:10, such as a mixture of isoprene and butadiene, a mixture of butadiene and myrcene. The HAT polymer may comprise, consist of, or consist essentially of any of the chemical and physical properties (e.g., melt viscosity, tensile strength, etc.) present in the components (e.g., coupled HAT, high vinyl content B block, etc.).

In one embodiment, the HAT polymer (A1-B-A2) has a peak MW of 10,000-500,000g/mol, alternatively 10,000-300,000g/mol, alternatively 10,000-100,000 g/mol.

Optional components: the HAT composition may further comprise one or more additional components such as tackifiers, waxes, stabilizers (e.g., antioxidants, UV stabilizers), plasticizers (e.g., benzoates, phthalates), paraffin oils, naphthenic oils, nucleating agents, optical brighteners, pigments, dyes, glitter, biocides, flame retardants, antistatic agents, anti-slip agents, anti-blocking agents, lubricants, fillers, or combinations thereof.

In some embodiments, the HAT composition may further contain a stabilizer; non-limiting examples of which include primary antioxidants and secondary antioxidants. The chemical structure typically distinguishes primary antioxidants from secondary antioxidants. Hindered phenols and arylamines are examples of common primary antioxidants that scavenge alkoxy and peroxy groups. The amount of primary antioxidant may be 0.3 to 1.5 wt% or 0.5 to 1 wt% based on the total weight of the HAT composition.

Secondary antioxidants may also be used with the primary antioxidant. Phosphites and thiosynergists are common secondary antioxidants that scavenge hydroperoxides generated during autoxidation cycles in which polymers are exposed to heat and oxygen. The amount of secondary antioxidant may be 0.5 to 2.5 wt% or 0.5 to 2 wt%.

The preparation method comprises the following steps: HAT polymers can be synthesized in the form of A1-B-A2 or A2-B-A1. In some embodiments, the polymer is prepared by continuous polymerization, wherein: i) polymerizing a monoalkyl arene block; ii) adding conjugated diene monomer to the reaction mixture, attaching to the monoalkylarene block and subsequently polymerizing; and iii) adding a monoalkylarene monomer to the reaction mixture, attaching to the conjugated diene block, and then polymerizing. For a continuous HAT polymerization process, either the a1 block or the a2 block may be the first step. For the coupling process, the a2 block was prepared first, followed by preparation of B, A1 and the final coupling reaction. In some embodiments, HAT may be prepared by anionic living polymerization, as shown in us patent 7,728,074 and us patent 7,622,519.

The HAT polymer may be prepared by contacting the monomer with an organic alkali metal compound in a suitable solvent at-150 ℃ to 300 ℃ or 0 ℃ to 100 ℃. Particularly effective polymerization initiators are organolithium compounds having the general formula RLi wherein R is an aliphatic, cycloaliphatic, alkyl-substituted cycloaliphatic, aromatic or alkyl-substituted aromatic radical having from 1 to 20 carbon atoms. Suitable solvents include aliphatic, cycloaliphatic, alkyl-substituted cycloaliphatic, aromatic and alkyl-substituted aromatic hydrocarbons, ethers and mixtures. Examples of the aliphatic hydrocarbon include butane, pentane, hexane and heptane; cycloaliphatic hydrocarbons such as cyclopentane, cyclohexane and cycloheptane; alkyl-substituted cycloaliphatic hydrocarbons, such as methylcyclohexane and methylcycloheptane; aromatic hydrocarbons such as benzene; and alkyl-substituted hydrocarbons such as toluene and xylene; and ethers such as tetrahydrofuran, diethyl ether and di-n-butyl ether.

In some embodiments, a vinyl modifier may be added to control the vinyl content of the conjugated diene block. In one example of a high vinyl conjugated diene block prepared in the presence of a vinyl modifier, the vinyl modifier can be added at once, simultaneously, or nearly simultaneously with the conjugated diene monomer. Conjugated diene blocks containing high vinyl content and their corresponding conjugated counterparts can be prepared as disclosed in U.S. Pat. No. 7,125,940. Conjugated diene blocks having a progressively lower vinyl content can be prepared by adding conjugated diene monomer to the reaction mixture and then adding the vinyl modifier stepwise in a controlled manner. Vinyl modifiers that can be used include polar compounds such as ethers, amines, and other lewis bases (e.g., dialkyl ethers of glycols). Examples include dialkyl ethers of ethylene glycol, which contain the same or different terminal alkoxy groups and optionally carry alkyl substituents on the ethylene group; (e.g., ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, diethoxyethane, 1, 2-diethoxypropane, 1-ethoxy-2, 2-tert-butoxyethane or 1, 2-diethoxypropane). The chemical structure and properties of the vinyl modifier will determine the amount of vinyl modifier required to achieve the desired vinyl content. Typically, the modifier will be added in an amount of 50 to 100,000 parts per million parts of base solvent.

In some embodiments, the HAT polymer is optionally subjected to catalytic hydrogenation to obtain a HAT polymer having the desired chemical and physical properties required for a particular application. The process includes the standard method of hydrogenating styrene butadiene block copolymers. Hydrogenation includes the use of hydrogenation catalysts, such as heterogeneous hydrogenation catalysts (e.g., palladium catalysts, such as palladium on carbon (Pd/C); platinum catalysts, such as PtO)₂(ii) a Nickel catalysts, such as Raney nickel (Ra-Ni); a rhodium catalyst or a ruthenium catalyst). Homogeneous or colloidal hydrogenation catalysts, such as aluminum alkyl reduced nickel octoate or similar metal complexes, may also be used. In some cases, the hydrogenation catalyst is present in an amount in the range of from 0.25 to 5 wt%, based on the total weight of the HAT. The source of hydrogen for the hydrogenation can be hydrogen (H)₂) Or a compound which generates hydrogen gas under the reaction conditions, such as formic acid, isopropanol, cyclohexene, cyclohexadiene, diimide or hydrazine.

The hydrogenation reaction may be carried out at elevated temperature, pressure, or a combination thereof. For example, the hydrogenation reaction may be carried out at 120 ℃ to 300 ℃ and at pressures of 30 to 2000psi or 100 and 1000 psi.

In some embodiments, the coupled HAT may be prepared by using a coupling agent selected from chemical compounds including: the alkylene oxides may be selected from the group consisting of dihaloalkanes, silicon halides, siloxanes, multifunctional epoxides, silica compounds, esters of monohydric alcohols with carboxylic acids (e.g., methyl benzoate and dimethyl adipate), and epoxidized oils. Non-limiting examples of coupling agents include tetraalkoxysilanes such as Tetramethoxysilane (TMOS) and Tetraethoxysilane (TEOS); trialkoxysilanes, such as methyltrimethoxysilane (MTMS); aliphatic diesters such as dimethyl adipate and diethyl adipate; and diglycidyl aromatic epoxy compounds, such as diglycidyl ethers derived from the reaction of bisphenol a, epichlorohydrin, and combinations thereof. The amount of coupling agent to be added depends on the desired coupling efficiency and, in the case of polyfunctional coupling agents, on the number of arms bonded to the coupling agent. This is a stoichiometric reaction determined by the ratio of polymer chain ends to coupling agent. The coupling agent may be contacted with the HAT at any time during the preparation of the HAT. In another embodiment, contacting the coupling agent with the HAT may occur when the polymerization reaction has substantially consumed the monomer.

Performance: in one embodiment, the HAT polymer is characterized as having a tensile strength of from 0.1 to 10MPa, or from 0.1 to 5MPa, or from 0.1 to 4MPa, as determined according to ASTM D412.

In one embodiment, the HAT block copolymer is characterized as having a flow rate or melt index greater than 5g/10min, as determined according to ASTM D1238 at 200 ℃ under a 5kg load. Alternatively, the HAT composition has a melt index of 5-200g/10min or 5-50g/10 min.

The application comprises the following steps: throughout this disclosure, reference to the properties of the HAT composition (unless specifically stated otherwise) refers to the characteristics preserved by the individual block copolymers present in the composition.

HAT compositions are useful in a variety of applications, including coatings, adhesives, hot melt adhesives, Pressure Sensitive Adhesives (PSAs), and flexographic applications. When used as PSA for label formulations, HAT compositions provide improved convertibility over conventional formulations.

During PSA label manufacture, the laminate of facestock, pressure sensitive layer, and release liner is passed through equipment that converts the laminate to give a commercial label. Processes involving converting operations include printing, die cutting and matrix stripping to retain the label on the release liner. The cost of converting the laminate into a finished product is a function of the speed at which the various processing operations occur. While the properties of all layers of the laminate can affect convertibility costs, the adhesive layer can be a limiting factor in ease of conversion and conversion costs due to its viscoelastic properties and tensile strength that interfere with precise and clean penetration of the die in die cutting operations and promote adhesion to the cutting blade. The filament tack of the adhesive also affects the matrix stripping operation after the die cutting operation. The diblock-type behavior of the HAT in the label adhesive formulation provides lower cohesive strength for better convertibility.

Achieving good convertibility is not necessarily consistent with achieving excellent adhesion. Good general purpose adhesives may have poor convertibility because the adhesive is difficult to cleanly cut. These adhesives may stick to the die or blade. In label manufacture, die cutting and matrix stripping operations occur at various speeds ranging from 0 to 300 meters per minute. Within this range, the adhesive may provide an area where the substrate will break, despite the fact that successful substrate peeling may occur at various speeds on either side of the area. The HAT composition can provide an adhesive system in which the adhesive can cleanly cut and the substrate peels off over the full range of operating speeds, thereby improving convertibility over conventional PSA label formulations.

In some embodiments, the HAT composition is used in a PSA label formulation. The composition is characterized by rapid mixing of the hot melt adhesive formulation due to its higher melt flow rate. PSA label formulations can include a HAT composition (e.g., 30-60 wt%), a tackifying resin (e.g., 30-60 wt%, such as Wingtack 86), a plasticizing oil (e.g., 0-45 wt%, such as Sontex450 oil), and optionally a stabilizer (e.g., 0-3 wt%, such as Irganox 1010) and optionally additional polymers and/or binders. The tackifying resin is selected from the group consisting of C5 hydrocarbon resins, C5/C9 hydrocarbon resins, hydrogenated and partially hydrogenated C9 hydrocarbon resins, rosin esters, terpenes, and styrenated terpenoid resins.

It will be appreciated by those skilled in the art that the properties of HAT polymers will find utility in other applications where good finishability and pelletizability are desired, while ease of blending is also desired. For example, HAT polymers can be used for asphalt modification where good high temperature performance is required for paving, roofing, waterproofing, sound insulation or carpet backing applications, while ease of blending is required for low shear asphalt blending. Paving applications include hot asphalt applications, such as asphalt concrete paving and hot in-situ recycling; and emulsion applications such as fog sealing, chip sealing, scrub sealing, kemp sealing, micro-surfacing, cold in-situ recycling, and cold central plant recycling. Roofing applications include modified asphalt low-pitch membranes, self-adhesive liners, and modified asphalt shingles.

Diblock copolymers cannot be easily prepared in convenient pellet form because they are readily cold-flowable to provide a rubber block. Even after powdering the material, it can cold flow quickly and cause end-use processing difficulties. For example, DYNASOL SOLPRENE 1205 is a very large volume diblock copolymer typically provided in the form of a rubber block. For granulation, it is sold at a premium price and suffers from excessive cold flow. In another aspect, the HAT compositions disclosed herein can be finished into stable pellets, which are easier to handle than most of the pure diblock, caoutchouc forms of the prior art.

Example 1: the polymer structures of different experimental SIS (styrene isoprene styrene), SBS (styrene butadiene styrene), SIBS (styrene isoprene butadiene styrene) can be seen in table 1. Samples A, B and C were continuous asymmetric triblock polymers with no detectable diblock. The difference is mainly due to the size of the PS end blocks.

TABLE 1

*SIS **SBS ***SIBS

The physical properties of these HAT SIS polymers are reported in table 2. The PS end blocks (16/7.5) of sample a were not sufficiently different to significantly reduce Tensile Strength (TS). The different end block sizes have reduced the TS but are insufficient to offset the lack of diblock and higher polystyrene content compared to commercially available SIS products (e.g., styrene and isoprene based coupled SIS with 55% diblock and 16% polystyrene content having a melt flow of 24g/10min at 5kg load and a temperature of 200 ℃, tensile strength of 4.14MPa, elongation at break of 1500%, 300% modulus of 0.345 MPa).

TABLE 2

Can not be measured