阅读说明：本技术 一种晶圆光刻胶及金属剥离工艺中的防雾气外溢装置 (wafer photoresist and antifog gas overflow device in metal stripping process ) 是由 关贺聲 王一 于 2018-07-19 设计创作，主要内容包括：本发明属于晶圆制造技术领域,特别涉及一种晶圆光刻胶及金属剥离工艺中的防雾气外溢装置。包括固定防溅环、内防溅环、一级过滤装置、升降防溅环、升降防溅环驱动机构及排风管路,其中固定防溅环、内防溅环及升降防溅环由外到内依次嵌套设置、且内防溅环与固定防溅环之间留有环隙,一级过滤装置设置于内防溅环的下端,升降防溅环驱动机构与升降防溅环连接,用于驱动升降防溅环升降,排风管路与固定防溅环连接、且与内防溅环与固定防溅环之间的环隙连通。本发明具有三层过滤系统以及特有的排风流场,阻止金属碎屑进入排风管道及雾气凝结后累积在排风管道中,解决了以往剥离腔体做工艺时出现的雾气外溢,风道堵塞及金属回收率低等问题。(The invention belongs to the technical field of wafer manufacturing, and particularly relates to an anti-fog overflow device in wafer photoresist and metal stripping processes, which comprises a fixed anti-splash ring, an inner anti-splash ring, a -level filter device, a lifting anti-splash ring driving mechanism and an exhaust pipeline, wherein the fixed anti-splash ring, the inner anti-splash ring and the lifting anti-splash ring are sequentially nested from outside to inside, an annular gap is reserved between the inner anti-splash ring and the fixed anti-splash ring, the -level filter device is arranged at the lower end of the inner anti-splash ring, the lifting anti-splash ring driving mechanism is connected with the lifting anti-splash ring and is used for driving the lifting anti-splash ring to ascend and descend, and the exhaust pipeline is connected with the fixed anti-splash ring and is communicated with the annular gap between the inner anti-splash ring and the fixed anti-splash ring.)

1, kinds of wafer photoresist and metal strip antifog gas overflow arrangement in technology, its characterized in that, including fixed splashproof ring (1), interior splashproof ring (3), level filter equipment, lift splashproof ring (15), lift splashproof ring actuating mechanism and exhaust pipe way (7), wherein fixed splashproof ring (1), interior splashproof ring (3) and lift splashproof ring (15) by outer in proper order nested setting, and in splashproof ring (3) and fixed splashproof ring (1) between leave the annular gap, level filter equipment set up in the lower extreme of interior splashproof ring (3), lift splashproof ring actuating mechanism with lift splashproof ring (15) are connected, are used for the drive lift splashproof ring (15) go up and down, exhaust pipe way (7) with fixed splashproof ring (1) are connected, and with the annular gap intercommunication between interior splashproof ring (3) and fixed splashproof ring (1).

2. The wafer photoresist and metal strip in technology anti-fog overflow arrangement of claim 1, characterized in that, fixed splashproof ring (1) includes fixed splashproof rampart (101), fixed splashproof ring bottom plate (102) and exhaust box (104), wherein fixed splashproof ring bottom plate sets up in the lower extreme of fixed splashproof rampart (101) and with unit bottom plate (19) sealing connection of technology cavity (24), be equipped with a plurality of air exit (106) along circumference on fixed splashproof rampart (101), each air exit (106) department all is equipped with second grade filter screen (6), exhaust box (104) set up in the outside of fixed splashproof rampart (101), air exit (106) are located exhaust box (104), exhaust pipeline (7) with exhaust box (104) intercommunication.

3. The wafer photoresist and metal stripping process anti-fog-gas overflow device as claimed in claim 2, wherein two of the exhaust boxes (104) are symmetrically arranged on the outer side of the fixed splash-proof ring wall (101), and the two exhaust boxes (104) are respectively connected with the two exhaust pipelines (7) through exhaust pipes (105).

4. The wafer photoresist and metal stripping process anti-fog gas overflow device as claimed in claim 3, wherein an exhaust filter screen (8) is arranged at the connection between the exhaust pipeline (7) and the exhaust pipe (105), and the exhaust pipeline (7) is led out from the inside of the process cavity (24) from bottom to top.

5. The wafer photoresist and metal stripping process anti-fog overflow device of claim 2, wherein a motor cover (103) connected to the fixed splash ring base plate (102) is disposed in the fixed splash ring wall (101).

6. The device for preventing the fog overflow in the photoresist and metal stripping process of the wafer according to claim 1, wherein the upper end of the inner splash ring (3) is connected with the fixed splash ring (1) through a flange.

7. The wafer photoresist and metal stripping process anti-fog-out device as claimed in claim 1, wherein the -grade filtering device is a -grade filtering screen (2), and the -grade filtering screen (2) is made of metal filtering screen.

8. The device for preventing the out-flowing of fog in the photoresist and metal stripping process of the wafer according to claim 1, wherein a cover plate (14) is arranged on the top of the lifting splash-proof ring (15), and a process hole is arranged in the center of the cover plate (14).

9. The wafer photoresist and metal stripping process anti-fog overflow device of claim 8, wherein a sealing ring (4) and a pressing sheet (5) arranged above the sealing ring (4) are arranged between the upper edge of the lifting splash-proof ring (15) and the top of the inner splash-proof ring (3).

10. The wafer photoresist and metal stripping process anti-fog overflow device as claimed in claim 1, wherein the lifting splash-proof ring driving mechanism comprises two lifting cylinders (11), the two lifting cylinders (11) are respectively disposed on two sides of the lifting splash-proof ring (15), and the output ends of the two lifting cylinders are connected to the lifting splash-proof ring (15) through connecting pieces.

Technical Field

The invention belongs to the technical field of wafer manufacturing, and particularly relates to an anti-mist overflow device for wafer photoresist and metal stripping processes.

Background

In the LED industry, wafer processing is divided into several processes, wherein the lift-off process is a method of using sacrificial materials (e.g., photoresist) to create a structure (patterning) of target materials on the surface of a substrate (e.g., wafer). when the sacrificial layer (photoresist in solvent) is washed away, the top material is stripped and washed with the underlying sacrificial layer . this process typically uses high temperature and high pressure solvent to strip off the photoresist and the overlying precious metals ( is typically gold, silver, etc.) and needs to be recycled, . in the case of wet lift-off process, due to the high temperature and high pressure, the cavity can generate a lot of mist and carry with precious metal swarf, which can easily enter the exhaust duct to be difficult to recycle, causing the duct to block, and the mist can accumulate in the duct after condensation, causing the solution to overflow and corrode components, even harm to operators.

Disclosure of Invention

In view of the above problems, the present invention provides kinds of wafer photoresists and anti-mist overflow devices for metal stripping process, so as to solve the problems of mist overflow, air duct blockage and low metal recovery rate during the existing stripping chamber process.

In order to achieve the purpose, the invention adopts the following technical scheme:

antifog gas overflow arrangement in wafer photoresist and metal stripping process, including fixed splashproof ring, interior splashproof ring, level filter equipment, lift splashproof ring actuating mechanism and exhaust pipe way, wherein fixed splashproof ring, interior splashproof ring and lift splashproof ring by outer in proper order nested setting, and leave the annular gap between interior splashproof ring and the fixed splashproof ring, level filter equipment set up in the lower extreme of interior splashproof ring, lift splashproof ring actuating mechanism with lift splashproof ring is connected, is used for the drive lift splashproof ring goes up and down, exhaust pipe way with fixed splashproof ring connect, and with the annular gap intercommunication between interior splashproof ring and the fixed splashproof ring.

Fixed splashproof ring is including fixed splashproof rampart, fixed splashproof ring bottom plate and exhaust box, wherein fixed splashproof ring bottom plate set up in the lower extreme of fixed splashproof rampart, and with the unit bottom plate sealing connection of technology cavity, be equipped with a plurality of air outlets along circumference on the fixed splashproof rampart, each air outlet department all is equipped with the second grade filter screen, exhaust box set up in the outside of fixed splashproof rampart, the air outlet is located exhaust box, the exhaust pipeline with exhaust box intercommunication.

The outer side of the fixed splash-proof ring wall is symmetrically provided with two air exhaust boxes, and the two air exhaust boxes are respectively connected with the two air exhaust pipelines through air exhaust pipes.

And an exhaust filter screen is arranged at the joint between the exhaust pipeline and the exhaust pipe, and the exhaust pipeline is led out from the inside of the process cavity from bottom to top.

And a motor buckle cover connected with the bottom plate of the fixed splash-proof ring is arranged in the wall of the fixed splash-proof ring.

The upper end of the inner splash-proof ring is connected with the fixed splash-proof ring through a flange.

The level filter equipment is level filter screen, level filter screen adopts metal filter screen to make.

The top of lift splashproof ring is equipped with the apron, the center of apron is equipped with the fabrication hole.

And a sealing ring and a pressing sheet arranged above the sealing ring are arranged between the upper end edge of the lifting splash-proof ring and the top of the inner splash-proof ring.

The lifting splash-proof ring driving mechanism comprises two lifting cylinders, and the two lifting cylinders are respectively arranged on two sides of the lifting splash-proof ring and the output end of the lifting splash-proof ring is connected with the lifting splash-proof ring through a connecting piece.

The invention has the advantages and positive effects that:

1. the air exhaust device is provided with the three layers of filtering devices, so that metal debris is prevented from entering the air duct to a great extent, the risk of blocking the air duct is reduced, and the metal recovery rate is increased.

2. The inner splash-proof ring blocks the air outlet of the fixed splash-proof ring, and an interlayer is formed between the air outlet and the fixed splash-proof ring, so that mist enters the interlayer through a filter screen at the lower end of the inner splash-proof ring and then is led to the air outlet, and an air exhaust flow field is optimized.

3. The lifting splash-proof ring cover plate effectively prevents fog and metal chips from overflowing, the size of the opening of the cover plate is 2mm to 7mm larger than the outer diameter of a wafer, the fog can overflow when the opening is too large, and the wafer is easy to scrape when the opening is too small, so that the wafer is damaged.

4. The lifting splash-proof ring is lifted in linkage with the unit through the two cylinders, so that the lifting stability of the splash-proof ring is improved.

5. In the invention, after the mist is condensed into liquid, the liquid flows back into the fixed splash-proof ring along the exhaust pipeline and is discharged. The damage to equipment after the mist condenses the hydrops is avoided.

6. According to the invention, the cavity gap is sealed by the sealing ring, and no mist overflows from the gap between the two splash-proof rings in the stripping process.

7. The fixed splash-proof ring is provided with a plurality of symmetrical air outlets, so that the flow field in the cavity is more uniform.

8. The invention can realize compatible processing of wafers with different sizes by replacing the lifting splash-proof ring cover plate.

9. The exhaust pipe is internally provided with the filter screen, the filter screen and the pipeline are cleaned by removing the clamp when the clamp is used for fixing and periodically cleaning and recovering metal, the operation is convenient, and the maintenance is simple.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is an enlarged view taken at I in FIG. 1;

FIG. 3 is a top view of FIG. 1;

FIG. 4 is an exploded view of the fixed splash ring and inner splash ring of the present invention;

FIG. 5 is an isometric view of a fixed splash ring of the present invention;

fig. 6 is an isometric view of the lift splash ring of the present invention.

The device comprises a fixed splash-proof ring 1, an -grade filter screen 2, an inner splash-proof ring 3, a sealing ring 4, a pressing sheet 5, a secondary filter screen 6, an exhaust pipeline 7, an exhaust filter screen 8, a filter screen gasket 9, a hoop 10, a lifting cylinder 11, a unit , a splash-proof ring adapter plate 13, a cover plate 14, a lifting splash-proof ring 15, a lifting splash-proof ring cylinder 16, a cylinder fixing plate 17, a splash-proof ring connecting plate 18, a unit bottom plate 19, a bearing platform 20, a vacuum shaft motor 21, a motor lower fixing plate 22, a sealing pad 23, a process cavity 24, a fixed splash-proof ring wall 101, a fixed splash-proof ring bottom plate 102, a motor buckle cover 103, an exhaust box 104, an L-shaped exhaust pipe 105 and an opening 106.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be described in detail with reference to the accompanying drawings and specific embodiments.

As shown in fig. 1 to 4, the anti-mist overflow device for kinds of wafer photoresists and metal stripping processes provided by the invention comprises a fixed splash-proof ring 1, an inner splash-proof ring 3, a -grade filter device, a lifting splash-proof ring 15, a lifting splash-proof ring driving mechanism and an exhaust pipeline 7, wherein the fixed splash-proof ring 1, the inner splash-proof ring 3 and the lifting splash-proof ring 15 are sequentially nested from outside to inside, an annular gap is reserved between the inner splash-proof ring 3 and the fixed splash-proof ring 1, the -grade filter device is arranged at the lower end of the inner splash-proof ring 3, the lifting splash-proof ring driving mechanism is connected with the lifting splash-proof ring 15 and used for driving the lifting splash-proof ring 15 to ascend and descend, and the exhaust pipeline 7 is connected with the fixed splash-proof ring 1 and is communicated with the annular gap between the inner splash.

As shown in fig. 5, the fixed splash-proof ring 1 includes a fixed splash-proof ring wall 101, a fixed splash-proof ring bottom plate 102 and an exhaust box 104, wherein the fixed splash-proof ring bottom plate is disposed at a lower end of the fixed splash-proof ring wall 101 and is hermetically connected to the unit bottom plate 19 of the process chamber 24, a plurality of air outlets 106 are circumferentially disposed on the fixed splash-proof ring wall 101, each air outlet 106 is provided with a secondary filter screen 6, the exhaust box 104 is disposed at an outer side of the fixed splash-proof ring wall 101, the air outlets 106 are located in the exhaust box 104, and the exhaust pipeline 7 is communicated with the exhaust box 104.

Two air exhaust boxes 104 are symmetrically arranged on the outer side of the fixed splash-proof annular wall 101, and the two air exhaust boxes 104 are respectively connected with the two air exhaust pipelines 7 through an air exhaust pipe 105. The exhaust duct 105 is of an L-shaped structure, and the exhaust pipeline 7 is a bent pipe. An exhaust filter screen 8 is arranged at the joint between the exhaust pipeline 7 and the exhaust pipe 105, and the exhaust pipeline 7 is led out from the inside of the process cavity 24 from bottom to top.

A motor buckle cover 103 connected with the fixed splash ring bottom plate 102 is arranged in the fixed splash ring wall 101. The upper end of the inner splash-proof ring 3 is connected with the fixed splash-proof ring 1 through a flange.

The grade filter device is grade filter screen 2, and grade filter screen 2 is made of metal filter screen.

As shown in fig. 6, a cover plate 14 is provided on the top of the lifting splash ring 15, and a process hole is provided in the center of the cover plate 14. A sealing ring 4 and a pressing sheet 5 arranged above the sealing ring 4 are arranged between the upper end edge of the lifting splash-proof ring 15 and the top of the inner splash-proof ring 3, as shown in fig. 2.

The lifting splash-proof ring driving mechanism comprises two lifting cylinders 11, wherein the two lifting cylinders 11 are respectively arranged on two sides of the lifting splash-proof ring 15, and the output ends of the two lifting cylinders are connected with the lifting splash-proof ring 15 through connecting pieces.