阅读说明：本技术 硫的生产 (The production of sulphur ) 是由 卡尔迈勒·杰弗里 于 2018-04-17 设计创作，主要内容包括：一种系统,包括：第一腔室、第二腔室、紫外光源和微波源。所述第一腔室具有入口。所述第二腔室与所述第一腔室相邻,所述第二腔室具有出口和波导。所述紫外光源位于所述第二腔室的波导内。也描述了相关的装置、系统、技术和制品。(A kind of system, comprising: first chamber, second chamber, ultraviolet source and microwave source.The first chamber has entrance.The second chamber is adjacent with the first chamber, and the second chamber has outlet and waveguide.The ultraviolet source is located in the waveguide of the second chamber.Also illustrate relevant device, system, technology and product.)

1. a kind of system, comprising:

First chamber has entrance；

Second chamber, adjacent with the first chamber, the second chamber has outlet and waveguide；

Ultraviolet source, in the waveguide of the second chamber；And

Microwave source is configured as microwave energy exposure into the first chamber.

2. system according to claim 1, wherein the microwave source is configured to arrive the microwave energy exposure In the waveguide of the second chamber, so that the microwave energy contacts the ultraviolet source, the ultraviolet source is included in contact institute The internal gas of ultraviolet light is generated when stating microwave energy.

3. system according to claim 1 or 2, wherein the waveguide includes being configured such that the microwave energy in institute State the end that standing wave is formed in waveguide.

4. system according to any one of the preceding claims, wherein the second chamber further comprises:

First electrode is configured with negative electrical charge；And

Second electrode is configured with positive charge, the first electrode and the second electrode in the outer of the ultraviolet source Portion and in the inside of the waveguide.

5. system according to any one of the preceding claims, further comprises:

Tube assembly in the waveguide, the tube assembly accommodate the ultraviolet source, the wall of the tube assembly to ultraviolet light and Microwave energy is transparent.

6. system according to any one of the preceding claims, wherein the first chamber is located at the microwave source and institute It states between second chamber, so that the microwave energy is generated by the microwave source and passed through the first chamber and reach described the Two chambers.

7. system according to any one of the preceding claims, further comprises:

Multiple tube assemblies, adjacent with the first chamber, each of the multiple tube assembly is exported including tube assembly, Mei Geguan It is transparent wall that component, which includes to ultraviolet light and microwave energy,；And

Multiple ultraviolet sources, each ultraviolet source are located in a respective tube assembly；

Wherein, the microwave source is configured as by the microwave energy exposure into the first chamber and the multiple tube assembly, So that the microwave energy contacts the multiple ultraviolet source, the multiple ultraviolet source is included in generation when contacting the microwave energy The internal gas of ultraviolet light.

8. system according to any one of the preceding claims, further comprises:

Hydrogen sulfide source is connected to the entrance；

Gas-solid separator, is connected to the outlet, the gas-solid separator be configured as making hydrogen and sulphur content from.

9. system according to any one of the preceding claims, wherein the ultraviolet source radiated wavelength range is about The ultraviolet light of 280nm to 300nm.

10. system according to any one of the preceding claims, wherein the second chamber is extended and along master Axis extends, and the ultraviolet source is to extend and be located at the second chamber along the main shaft along the main shaft It is interior, wherein the second chamber further comprises:

First electrode is configured with negative electrical charge；And

Second electrode is configured with positive charge, the first electrode and the second electrode in the outer of the ultraviolet source Portion and in the inside of the waveguide；

Wherein, the first electrode along the main shaft is extended and is disposed in above the ultraviolet source, described Second electrode along the main shaft is extended and is disposed in below the ultraviolet source.

11. system according to any one of the preceding claims, wherein the second chamber forms hydrocyclone.

12. system according to claim 11, wherein the light source is occupy in the vortex being located in the hydrocyclone On overflow pipe.

13. a kind of method, comprising:

Hydrogen sulfide is provided into the first chamber of neighbouring second chamber, and microwave source radiates microwave into the first chamber Energy；

The microwave energy for generating hydrogen sulfide with the microwave source contacts；

Hydrogen sulfide is supplied to the second chamber, the second chamber includes outlet and waveguide, and wherein ultraviolet light source is located at In the waveguide of the second chamber；And

Make hydrogen sulfide and ultraviolet light exposure in the second chamber, the ultraviolet light is generated by the ultraviolet source, described micro- Wave source is configured as to the first chamber microwave in heating chamber energy, wherein hydrogen sulfide and ultraviolet light exposure are to generate hydrogen and sulphur.

14. according to the method for claim 13, wherein the microwave source is configured to the microwave energy exposure Into the waveguide of the second chamber, so that the microwave energy contacts the ultraviolet source, the ultraviolet source is included in The internal gas of ultraviolet light is generated when contacting the microwave energy.

15. method described in 3 or 14 according to claim 1, wherein the waveguide includes being configured such that the microwave energy exists The end of standing wave is formed in the waveguide.

16. method described in any one of 3 to 15 according to claim 1, wherein the second chamber further comprises:

First electrode is configured with negative electrical charge；And

Second electrode is configured with positive charge, the first electrode and the second electrode in the outer of the ultraviolet source Portion and in the inside of the waveguide.

17. method described in any one of 3 to 16 according to claim 1, wherein the hydrogen sulfide to be supplied to and described first The adjacent multiple tube assemblies of chamber, each of the multiple tube assembly are exported including tube assembly, every in multiple ultraviolet sources It is a to be located in a respective tube assembly；

Wherein, the microwave source is configured as by the microwave energy exposure into the first chamber and the multiple tube assembly, So that the microwave energy contacts the multiple ultraviolet source, the multiple ultraviolet source is included in generation when contacting the microwave energy The internal gas of ultraviolet light.

18. method described in any one of 3 to 17 according to claim 1, further comprises:

Separation: using gas-solid separator by hydrogen and sulphur content from.

19. method described in any one of 3 to 18 according to claim 1, wherein the ultraviolet source radiated wavelength range is about The ultraviolet light of 280nm to 300nm.

20. method described in any one of 3 to 19 according to claim 1, wherein the second chamber be elongation and along Main shaft extends, and the ultraviolet source is to extend and be located at second chamber along the main shaft along the main shaft It is indoor, wherein the second chamber further comprises:

First electrode is configured with negative electrical charge；And

Second electrode is configured with positive charge, the first electrode and the second electrode in the outer of the ultraviolet source Portion and in the inside of the waveguide；

Wherein, the first electrode along the main shaft is extended and is disposed in above the ultraviolet source, described Second electrode along the main shaft is extended and is disposed in below the ultraviolet source.

21. method described in any one of 3 to 20 according to claim 1, wherein for decomposing the temperature of the hydrogen sulfide about It is performed within the temperature range of 0 to 125 degree Celsius.

22. method described in any one of 3 to 21 according to claim 1, wherein by the hydrogen sulfide with 0.1 to 10atm pressure Power is provided into the first chamber.

23. method described in any one of 3 to 22 according to claim 1, wherein make the ultraviolet light and the microwave energy and institute State contact with hydrogen sulfide about 0.01 second to 15 minutes.

24. method described in any one of 3 to 23 according to claim 1, further comprises: from natural gas collect hydrogen sulfide or Person handles to generate hydrogen sulfide petroleum.

25. a kind of system, comprising:

First heat exchanger, including first input end, the second input terminal, the first output end and second output terminal；

Second heat exchanger, including third input terminal, the 4th input terminal, third output end and the 4th output end, wherein described One output end is operably connected to the third input terminal；

First separator is operatively coupled between the third output end and second input terminal；

Third heat exchanger, including the 5th input terminal, the 6th input terminal, the 5th output end and the 6th output end, wherein described Five input terminals are operably connected to first separator；

4th heat exchanger, including the 7th input terminal, the 8th input terminal, the 7th output end and the 8th output end, wherein described Seven input terminals are operably connected to the 5th output end；And

Second separator, is operatively coupled between the 7th output end and the 6th input terminal and the described 7th Between output end and the 4th input terminal.

26. system according to claim 25, wherein

The first heat exchanger is configured to be supplied to the stream of the first input end and be supplied to second input terminal Stream between transmit heat, the stream for being supplied to the first input end leaves from first output end, is supplied to described second The stream of input terminal leaves from the second output terminal；

The second heat exchanger is configured as being supplied to the stream of the third input terminal and being supplied to the 4th input terminal Stream between transmit heat, the stream for being supplied to the third input terminal leaves from the third output end, is supplied to the described 4th The stream of input terminal leaves from the 4th output end；

The third heat exchanger is configured as being supplied to the stream of the 5th input terminal and being supplied to the 6th input terminal Stream between transmit heat, the stream for being supplied to the 5th input terminal leaves from the 5th output end, is supplied to the described 6th The stream of input terminal leaves from the 6th output end；And

4th heat exchanger is configured to be supplied to the stream of the 7th input terminal and be supplied to the 8th input terminal Stream between transmit heat, the stream for being supplied to the 7th input terminal leaves from the 7th output end, is supplied to the described 8th The stream of input terminal leaves from the 8th output end.

27. the system according to claim 25 or 26, wherein it is gentle that first separator is configured as separation liquid Body, and second separator is configured as separation liquids and gases.

28. the system according to any one of claim 25 to 27, further comprises:

Cooling unit is operably connected to the 8th input terminal and the 8th output end.

29. the system according to any one of claim 25 to 28, further comprises: gas source, the gas source connection To the first input end, and the gas including hydrogen sulfide, carbon dioxide and methane is provided to the first input end.

30. system according to claim 29, further comprises: methane holding unit is operably connected to described 6th output end.

31. the system according to claim 29 or 30, further comprises: carbon dioxide holding unit is operationally connected It is connected to the 4th output end.

32. the system according to any one of claim 29 to 31, further comprises: hydrogen sulfide holding unit can be grasped It is connected to the second output terminal with making.

33. the system according to any one of claim 25 to 32, wherein the second heat exchanger and first point described It include the first condenser from device.

34. the system according to any one of claim 25 to 33, wherein the 4th heat exchanger and second point described It include the second condenser from device.

35. the system according to any one of claim 25 to 35, further comprises: appointing according to claim 1 in 12 System described in one, wherein the second output terminal is operably connected to the entrance of the first chamber.

36. described herein or diagram device, product, system and method.

Technical field

Theme described herein is related to producing sulphur and/or hydrogen by sulphur compound.

Background technique

Crude oil or petroleum are processed and refine usually in industrial refinery, and can be based on the oil product refined out Different boiling and isolate the refined petroleum products such as asphaltic base, fuel oil, diesel oil, gasoline, kerosene and liquefied petroleum gas. Oil product mainly includes the various hydrocarbons with different carbon atom numbers or atomic structure of carbon, and further includes that oxidation is closed Object (such as phenol, ketone and carboxylic acid), nitrogen compound (such as indoles, acridine, oxyquinoline and aniline), sulphur compound mercaptan, sulphur Compound, thiophane, thiophene, alkylthrophene, benzothiophene, dibenzothiophenes, methyldibenzothiophene, contains disulphide The transistion metal compound and inorganic salts of nickel, vanadium, molybdenum etc..

Sulphur compound contained in petroleum can hydrogen sulfide gas (H to be also contained in most natural gases₂S it) releases It puts, and hydrogen sulfide gas is converted into elementary sulfur and hydrogen after treatment, this is referred to as " desulfurization ".Specific in the relevant technologies is shown In example, Claus method generates elementary sulfur by the hydrogen sulfide gas discharged in refining process by burning and catalytic chemistry reaction.

However, large-scale and complicated equipment is required, and the chemistry during desulfurization is anti-for conventional sulfur method Cope with those equipment be have it is corrosive.Moreover, sweetening process and the efficiency of operation are not enough to generate production efficiency.In addition, Other raw material can be used for current conventional desulfurization.

Summary of the invention

On the one hand, a kind of system, comprising: first chamber, second chamber, ultraviolet source and microwave source.First chamber includes Entrance.Second chamber is adjacent with first chamber, and second chamber includes outlet and waveguide.Ultraviolet source is located at the waveguide of second chamber It is interior.

One or more of following feature can be included in any feasible combination.For example, microwave source is matched It is set in the waveguide of microwave energy exposure to first chamber and second chamber, so that microwave energy contacts ultraviolet source.Ultraviolet source Internal gas including generating ultraviolet light in Microwave Exposure energy.Waveguide includes being configured such that microwave energy is formed in waveguide The end of standing wave.Second chamber may further include the first electrode for being configured with negative electrical charge and be configured with just The outside of the second electrode of charge, first electrode and second electrode in ultraviolet source and the inside in waveguide.

System may include the tube assembly in waveguide, and tube assembly accommodates ultraviolet source, and the wall of tube assembly can be to ultraviolet Light and microwave energy are transparent.The first chamber can be between the microwave source and the second chamber, so that described Microwave energy is generated by the microwave source and is passed through the first chamber and reach the second chamber.

System may include the multiple tube assemblies adjacent with the first chamber, and each of the multiple tube assembly includes Tube assembly outlet, it is transparent wall that each tube assembly, which includes to ultraviolet light and microwave energy,.System may include multiple ultraviolet lights Source, each ultraviolet source are located in a respective tube assembly.The microwave source can be configured as the microwave energy exposure Into the first chamber and the multiple tube assembly, so that the microwave energy contacts the multiple ultraviolet source.It is the multiple Ultraviolet source may include the internal gas that ultraviolet light is generated when contacting the microwave energy.

System may include being connected to the hydrogen sulfide source of the entrance.System may include being connected to the gas-solid of the outlet Separator, the gas-solid separator be configured as making hydrogen and sulphur content from.

The ultraviolet source can be the ultraviolet light of about 280nm to 300nm with radiated wavelength range.The second chamber can be with It is to extend and can extend along main shaft, the ultraviolet source can be elongation along the main shaft and can be with It is located in the second chamber along the main shaft.The second chamber may include be configured with negative electrical charge first Electrode and the second electrode for being configured with positive charge, the first electrode and the second electrode can be in the ultraviolet lights The outside in source and can be in the inside of the waveguide.The first electrode can be elongation along the main shaft and can be with It is disposed in above the ultraviolet source, the second electrode can be extended and can be arranged along the main shaft Below the ultraviolet source.

The second chamber can form hydrocyclone.The light source, which can occupy, to be located in the hydrocyclone Vortex overflow pipe on.

On the other hand, hydrogen sulfide is provided into the first chamber of neighbouring second chamber, and microwave source is to first chamber Microwave energy is radiated in room.Contact hydrogen sulfide with the microwave energy generated by the microwave source.Hydrogen sulfide is supplied to described second Chamber.The second chamber includes outlet and waveguide.Ultraviolet light source is located in the waveguide of the second chamber.Described second Make hydrogen sulfide and ultraviolet light exposure in chamber.The ultraviolet light is generated by the ultraviolet source.The microwave source be configured as to The waveguide microwave in heating chamber energy of the first chamber and second chamber, so that hydrogen sulfide and ultraviolet light exposure.Ultraviolet source includes The internal gas of ultraviolet light is generated when contacting the microwave energy.Make hydrogen sulfide and ultraviolet light exposure to generate hydrogen and sulphur.

One or more of following feature can be included in any feasible combination.For example, the waveguide can To include being configured such that the microwave energy forms the end of standing wave in the waveguide.The second chamber may include by The second chamber for being configured to the first chamber with negative electrical charge and being configured with positive charge, the first electrode and described Two electrodes the ultraviolet source outside and in the inside of the waveguide.The hydrogen sulfide can be supplied to and described first The adjacent multiple tube assemblies of chamber, each of the multiple tube assembly are exported including tube assembly, every in multiple ultraviolet sources It is a to be located in a respective tube assembly.The microwave source is configured as the microwave energy exposure to the first chamber and institute It states in multiple tube assemblies, so that the microwave energy contacts the multiple ultraviolet source.The multiple ultraviolet source may include The internal gas of ultraviolet light is generated when contacting the microwave energy.

Can use gas-solid separator by hydrogen and sulphur content from.The ultraviolet source can be about with radiated wavelength range The ultraviolet light of 280nm to 300nm.It is that the second chamber can be elongation and can extend along main shaft.It is described ultraviolet Light source can be extended and can be located in the second chamber along the main shaft along the main shaft.Described Two chambers may include the first electrode for being configured with negative electrical charge and the second electrode for being configured with positive charge, institute First electrode and the second electrode are stated in the outside of the ultraviolet source and in the inside of the waveguide.The first electrode can Along the main shaft extended and can be disposed in above the ultraviolet source, the second electrode can be along The main shaft is extended and can be disposed in below the ultraviolet source.

Temperature for decomposing the hydrogen sulfide can be performed within the temperature range of about 0 to 125 degree Celsius.It can incite somebody to action The hydrogen sulfide is provided with 0.1 to 10atm pressure into the first chamber.It can make the ultraviolet light and the microwave energy With the contact with hydrogen sulfide about 0.01 second to 15 minutes.It can be from collecting hydrogen sulfide in natural gas or can be carried out to petroleum Reason is to generate hydrogen sulfide.

Another aspect, a kind of system include: first heat exchanger, second heat exchanger, the first separator, third heat exchange Device, the 4th heat exchanger and the second separator.First heat exchanger includes first input end, the second input terminal, the first output end And second output terminal.Second heat exchanger includes third input terminal, the 4th input terminal, third output end and the 4th output end.Institute It states the first output end and is operably connected to the third input terminal.First separator is operatively coupled on the third Between output end and second input terminal.Third heat exchanger include the 5th input terminal, the 6th input terminal, the 5th output end and 6th output end.5th input terminal is operably connected to first separator.4th heat exchanger includes the 7th Input terminal, the 8th input terminal, the 7th output end and the 8th output end.7th input terminal is operably connected to described Five output ends.Second separator is operatively coupled between the 7th output end and the 6th input terminal and described Between 7th output end and the 4th input terminal.

One or more of following feature can be included in any feasible combination.For example, first heat Exchanger may be configured to pass being supplied between the stream of the first input end and the stream for being supplied to second input terminal Pass heat.The stream for being supplied to the first input end can leave from first output end, be supplied to second input terminal Stream can be left from the second output terminal.The second heat exchanger, which can be configured as, is being supplied to the third input Heat is transmitted between the stream at end and the stream for being supplied to the 4th input terminal.The stream for being supplied to the third input terminal can be from institute It states third output end to leave, the stream for being supplied to the 4th input terminal can leave from the 4th output end.The third heat exchange Device can be configured as transmits heat between the stream for being supplied to the stream of the 5th input terminal and being supplied to the 6th input terminal Amount.The stream for being supplied to the 5th input terminal can leave from the 5th output end, be supplied to the stream of the 6th input terminal It can be left from the 6th output end.4th heat exchanger may be configured to be supplied to the 7th input terminal It flows and is supplied between the stream of the 8th input terminal and transmit heat.The stream for being supplied to the 7th input terminal can be from described Seven output ends leave, and the stream for being supplied to the 8th input terminal can leave from the 8th output end.

First separator can be configured as separation liquids and gases, and second separator can be configured To separate liquids and gases.

System may include the cooling unit for being operably connected to the 8th input terminal and the 8th output end. System may include being connected to the gas source of the first input end, and it includes vulcanization that gas source is provided to the first input end The gas of hydrogen, carbon dioxide and methane.System may include being operably connected to the methane holding of the 6th output end Unit.System may include the carbon dioxide holding unit for being operably connected to the 4th output end.System can wrap Include the hydrogen sulfide holding unit for being operably connected to the second output terminal.

Second heat exchanger and first separator include the first condenser.4th heat exchanger and described second Separator includes the second condenser.System may include Photoreactor as described above, wherein the second output terminal can be grasped It is connected to the entrance of the first chamber with making.

The details of one or more modifications of subject matter described herein is elaborated in the the accompanying drawings and the following description.From froming the perspective of Bright book and attached drawing and from claims, other feature and advantage of subject matter described herein will be apparent.

Detailed description of the invention

Fig. 1 is shown for by hydrogen sulfide (H₂S) it is dissociated into the schematic diagram of the rate constant of hydrogen and sulphur；

Fig. 2 shows the illustrative methods by natural gas production sulphur according to the exemplary embodiment of this theme；

Fig. 3 shows the exemplary side by diesel oil or diesel vapor production sulphur of the exemplary embodiment according to this theme Method；

Fig. 4 A shows the exemplary reactor of the exemplary embodiment according to this theme；

Fig. 4 B shows the exemplary reactor of the exemplary embodiment according to this theme；

Fig. 5 is to show exemplary block diagram；

Fig. 6 and Fig. 7 shows exemplary photo；

Fig. 8 is the longitdinal cross-section diagram for hydrogen sulfide to be resolved into the exemplary light reactor of hydrogen and sulphur；

Fig. 9 is the sectional view of tube assembly；

Figure 10 shows the Photoreactor of Fig. 8 with standing wave；

Figure 11 is the sectional view with the another exemplary Photoreactor of multiple tube assemblies；

Figure 12 to Figure 17 is the view according to the exemplary light reactor of some embodiments of current topic；

Figure 18 shows the exemplary system for decomposing hydrogen sulfide；

Figure 19 to Figure 25 shows the various views of the exemplary system of Figure 18；

Figure 26 to Figure 29 shows the view in exemplary microwave source；

Figure 30 is the system block diagram for showing the exemplary process of desulfurization；

Figure 31 is system block diagram, which is that the biogas shown for handling unstrpped gas distills the exemplary of factory The system block diagram for the treatment of process；

Figure 32 is the exemplary system for exemplary process shown in implementing Fig. 31；

Figure 33 to Figure 35 is the view for showing exemplary gas-solid separator；

Figure 36 to Figure 41 shows the various views of the exemplary array of Photoreactor；

Figure 42 to Figure 48 shows the various views of the exemplary reactor of the exemplary embodiment according to this theme.

In the drawings, identical appended drawing reference indicates identical element.

Specific embodiment

Term as used herein " reactor " refers to the chamber or container that can be reacted.Reactor can be provided A constant volume of reaction is maintained, and may be provided with the function of the temperature of control reaction and/or the pressure of reaction.

Term as used herein " sulphur " and " sulphur product " refer to the compound comprising elementary sulfur.In certain embodiments, Elementary sulfur under normal operation can be with solid-state (such as S₆、S₇、S₈、S₉Or S₁₂、S₁₈Polyatomic molecule) exist.

Term " dissociation " refers to that the key between at least two atoms is broken.

Energy needed for term " bond dissociation energy " refers to the key between at least two atoms of fracture.

Term " radiation " refers in the form of light or heat to object emission energy.

Term as used herein is not intended to limit the present invention only for for the purpose of describing particular embodiments.As herein Used, unless the context clearly indicates otherwise, otherwise singular is also intended to include plural form.It will be further understood that When the term " comprising " and/or " including " is used in this specification, illustrate that there are the feature, region, entirety, step, behaviour Make, element and/or component, but does not preclude the presence or addition of one or more of the other feature, region, entirety, step, operation, member Part, component and/or their group.

Unless stated otherwise or from context, it is apparent that otherwise as used herein term " about " should be managed Solution is in the range of the proper tolerances of this field, such as within 2 standard deviations of average value." about " it is construed as 10%, 9%, 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, 0.5%, 0.1%, 0.05% or the 0.01% of specified value Within.Unless the context clearly dictates otherwise, otherwise all numerical value provided in this article are modified by term " about ".

This theme may include producing the sulphur product of sulphur or production including the generally elementary sulfur of homogeneous.Elementary sulfur can lead to Sulfur method is crossed to obtain, for example, by removing sulfur-containing compound from natural gas, coal, crude oil or petroleum, and by removal Sulfur-containing compound is converted into elementary sulfur to obtain.Current theme is not limited to processing fuel, but can extend to other application, Such as the desulfurization in molasses process equipment, the molasses process equipment may include a large amount of hydrogen sulfide and handle from waste The biogas of equipment.

In some embodiments, can by using microwave and ultraviolet radiation hydrogen sulfide by hydrogen sulfide resolve into hydrogen and Elementary sulfur executes desulfurization.Microwave can be used for thermal excitation hydrogen sulfide, thus be conducive to cause key chattering and increase key length, and it is ultraviolet Line can cause key to dissociate.Therefore, system and method is not related to ionizing, but is related to cracking vulcanization hydrogen bond.The heat of hydrogen sulfide Excitation beneficially improves the ability of hydrogen sulfide absorption ultraviolet light, so as to cause bigger key dissociation and therefore generates elementary sulfur. In addition, the thermal excitation of hydrogen sulfide provides the ability for realizing key dissociation using higher ultraviolet wavelength, the longer ultraviolet light Wavelength has bigger key penetration capacity, therefore can more efficiently crack hydrogen bond, otherwise under lower ultraviolet wavelength The cracking of hydrogen bond will not occur.

In addition, in some embodiments, compared with when not using standing wave, microwave can form standing wave, due to hydrogen sulfide Polarity, the molecular position of the adjustable hydrogen sulfide of the standing wave to increase effective ultraviolet radiation absorption area, and then improves member The production of plain sulphur.Electrodeless ultraviolet lamp is used as ultraviolet light source, and the electrodeless ultraviolet lamp can be by also radiating sulphur Change the microwave source driving of hydrogen.

Hydrogen sulfide (H₂S) gas can largely generate in oil refining process, or can be used as natural gas ingredient and by It collects.Therefore, hydrogen sulfide can provide useful resources for the production of sulphur.Compared with traditional system and method, the present invention is used System and method hydrogen sulfide can be decomposed into hydrogen and elementary sulfur, to facilitate higher yield.This is because with tradition System and method compare, system and method for the invention can with faster rate dissociate S-H key, thus when reducing maintenance Between, and system and method for the invention have also dissociated S-H key using less energy.Therefore, other objects during key dissociation The formation of matter can be reduced or minimize.

Hydrogen sulfide includes two S-H keys, the two S-H keys can be dissociated in energy input.H₂Vulcanization hydrogen bond in S Sequentially it can be broken off or dissociate.For example, when enough energy greater than the first bond dissociation energy amount (such as are at 298K When 381KJ/mol) being applied, the first key can be broken off, and when the energy greater than the second bond dissociation energy amount is (such as at 298K When for 344KJ/mol) by the time, the second key can be broken off.

H₂S(g)→S(s)+H₂(g) (1)

H₂(2) first key of S → H+SH 381KJ/mol fracture (298K at a temperature of)

(3) second key of H-S → H+S 344KJ/mol fracture (298K at a temperature of)

In fig. 1 it is shown that reacting the Theoretical Rate constant of (1) in various temperature ranges.For example, rate constant can be with By being determined under the conditions of certain temperature for the activation energy of the decomposition reaction of hydrogen sulfide.

However, in the case where being not wishing to be bound by theory, it can be enough by being provided to the reaction molecular of hydrogen sulfide Energy dissociates to cause and execute the first dissociation and second of vulcanization hydrogen bond.Energy for dissociating the S-H key of hydrogen sulfide can be with It is provided by radiant light.For example, light radiation can be in ultraviolet light range.Table 1 below lists the ultraviolet of various wavelength The energy of light.

It can be with illuminated appropriate with the ultraviolet light of the first S-H key and the 2nd S-H key that are broken hydrogen sulfide with enough energy Time, until obtain needed for production sulphur amount or yield.For example, ultraviolet radiation can be performed about 0.01 second to 15 points Clock, about 1 second to 30 seconds or this about 0.01 second to 15 seconds.It is also contemplated that ultraviolet radiation can be performed a period of time, This will not fall in other than the range that these are enumerated for a period of time.

Furthermore, it is possible to cause and execute each dissociation of S-H key in various temperature ranges.Preferably, temperature can be In the range of about 27 DEG C to 35 DEG C, about 20 DEG C to 40 DEG C or about 0 DEG C to 125 DEG C.For example, the bond dissociation energy or use of hydrogen sulfide It can change within the scope of different temperature in the activation energy of initiation reaction, and reacting (1) energy to needed for reacting (3) can Suitably to be determined based on reaction temperature.It is also contemplated that the temperature will not fall in it is any in the range that these are enumerated Other than one.

Hydrogen sulfide for generating sulphur can have greater than about 80 percents by volume (vol%), about 85 percents by volume (vol%), about 90 percents by volume (vol%), about 95 percents by volume (vol%) or about 99 percents by volume (vol%) Substantially homogeneous homogeneity.In some embodiments, hydrogen sulfide, which can be compressed into, has about 1 bar (bar) to 200 bars (bar) pressure.In some embodiments, hydrogen sulfide is compressed to have about 0.1 standard atmospheric pressure (atm) big to 10 standards Air pressure (atm), about 0.1 standard atmospheric pressure (atm) to 1 standard atmospheric pressure (atm) or about 0.1 standard atmospheric pressure (atm) are to 0.5 The pressure of standard atmospheric pressure (atm).It is also contemplated that the pressure will not fall in any one of the range that these are enumerated In addition.

In some embodiments, the feeding temperature that system can be entered based in part on hydrogen sulfide (to lead to hot gas Cross microwave generation) form heating or supply hydrogen sulfide.In certain embodiments, at about 25 DEG C to 200 DEG C, about 80 DEG C to 120 DEG C, hydrogen sulfide is heated or is supplied as hot gas at a temperature of about 100 DEG C.It is also contemplated that the temperature will not be fallen Other than any of these ranges enumerated.It is further contemplated that the temperature can be in any two in the value that these are enumerated Between.

In other embodiments, hydrogen can be heated or supply as a vapor.

The hydrogen sulfide of decomposition generates hydrogen and elementary sulfur.It after the reaction was completed, can be with molecular formula such as S₆、S₇、 S₈、S₉Or S₁₂、S₁₈Solid form obtain the product of sulphur.The product of sulphur can be substantially homogeneous, and has and be greater than About 80 atomic percentages (atom%), about 85 atomic percentages (atom%), about 90 atomic percentages (atom%), about 95 atoms The homogeneity of percentage (atom%) or about 99 atomic percentages (atom%).Preferably, the product of sulphur can be averagely straight Diameter be less than about 5mm, less than about 1mm, less than about 900 μm, less than about 800 μm, less than about 700 μm, less than about 600 μm, be less than about 500 μm of particle form, or can be the particle form of about 100 μm to 500 μm of average diameter.In addition, hydrogen can be with The product of sulphur is separated and is collected, and can have greater than about 80 percents by volume (vol%), about 85 percents by volume (vol%), about 90 percents by volume (vol%), about 95 percents by volume (vol%) or about 99 percents by volume (vol%) Homogeneity.In some embodiments, sulphur can be amorphous.

This theme may include the method for producing sulphur or elementary sulfur by sulfur removal technology.This method may include by hydrogen sulfide It provides in reactor and decomposing hydrogen sulfide.

Hydrogen sulfide can be continuously applied.In some embodiments, hydrogen sulfide gas can be supplied or be provided to tie up Holding its partial pressure in the reactor is about 0.1 standard atmospheric pressure (atm) to 10 standard atmospheric pressures (atm), about 0.1 standard atmospheric pressure (atm) is to 1 standard atmospheric pressure (atm) or about 0.1 standard atmospheric pressure (atm) to 0.5 standard atmospheric pressure (atm).It can also be pre- Phase, the pressure will not be fallen in other than any one of range that these are enumerated.

In addition, the initial pressure of hydrogen sulfide can be about 0.1 standard atmospheric pressure (atm) to 10 standard atmospheric pressures in reactor (atm), about 0.1 standard atmospheric pressure (atm) is big to 0.5 standard to 1 standard atmospheric pressure (atm), about 0.1 standard atmospheric pressure (atm) Air pressure (atm).It is also contemplated that initial pressure will not be fallen in other than any one of range that these are enumerated.Into one Step is it is expected that initial pressure can be between any two in the value that these are enumerated.

Reactor can have about 27 DEG C to 35 DEG C, the temperature model from 20 DEG C to 40 DEG C or from about 0 DEG C to about 125 DEG C Enclose, perhaps alternatively the decomposition of hydrogen sulfide can at 27 DEG C to 35 DEG C, from 20 DEG C to 40 DEG C or from about 0 DEG C to about 125 DEG C Within the temperature range of be performed.It is, for example, possible to use flame, electric furnace, air-flows etc. to carry out heating response device.In an embodiment In, the decomposition of hydrogen sulfide can be performed under about environment temperature.It is also contemplated that temperature will not fall in these models enumerated Except any one of enclosing.In other embodiments, temperature can be between any two in the value that these are enumerated.

Energy can be provided with the hydrogen sulfide in decomposition reactor.The energy for decomposing or dissociating hydrogen sulfide can be purple Outer light.UV light can have range from about 100nm to about 300nm, from about 200nm to about 300nm, from about 280nm to about 300nm Or from about 290nm to the wavelength of about 300nm.UV light can be radiated about 0.01 second to 15 minutes, about 1 second to 30 seconds or about 0.01 second to 15 seconds.It is also contemplated that UV light, which can be radiated one section, does not fall in appointing in the time range that these are enumerated Period except what one.It is further contemplated that UV light can be radiated one section of any two in the value that these are enumerated Period between a.

In the exemplary embodiment of this theme, a kind of method by natural gas production sulphur is provided.As shown in Fig. 2, can Will include a large amount of hydrogen sulfide (H₂S) or the natural gas of other sulphur compounds (for example, methane mixture) carries out desulfurization.Desulfurization Method can be not particularly limited, and be generally used in any method in oil plant and can be used without restriction.

Natural gas can (such as dry) processed with go water removal or vapor (H₂O), then it is further processed to separate Hydrogen sulfide and carbon dioxide (CO₂).Although being not required, however, it was found that this by hydrogen sulfide and vapor and carbon dioxide point From method be beneficial because this isolated method can be such that the presence of oxygen minimizes in current sweetening process. Be not intended to be limited to single theory, according to it is believed that in sweetening process the presence of oxygen the efficiency of this sweetening process can be generated it is negative Face is rung.Isolated hydrogen sulfide can be transferred to reaction chamber, and can decompose reaction in the reaction chamber.Hydrogen sulfide Can exist in controlled temperature and partial pressure or interior pressure with heat steam or gas phase.It can be by ultraviolet light radiation until obtaining Desired product yield executes decomposition.

In the exemplary embodiment of this theme, a kind of method by diesel oil (petroleum) production sulphur is provided.Such as Fig. 3 institute Show, the diesel oil containing sulphur compound can be subjected to desulfurization as described above.For example, diesel oil can be vaporized, and pass through addition Hydrogen can generate hydrogen sulfide by the sulphur compound in diesel steam, can then isolate hydrogen sulfide gas.The sulphur isolated Changing hydrogen can be transferred in the reactor of the product for producing sulphur.Hydrogen sulfide can be in controlled temperature and partial pressure or interior Pressure exists with heat steam or gas phase.Decomposition can be executed until obtaining desired product yield by ultraviolet light radiation.

Based on initial reaction condition (such as temperature and pressure of initial reaction gas (hydrogen sulfide)) or it can also pass through Product yield is monitored continuously to control the ultraviolet radiation for decomposing hydrogen sulfide gas.It can be by adjustment parameter (such as Time, intensity or wavelength) continuously control ultraviolet radiation equipment.

The method of production sulphur may include the product for separating and collecting sulphur from hydrogen after key dissociation.Hydrogen can example It is such as flowed out by the outlet of reactor, or gas-permeable membrane can be used to filter hydrogen.In some embodiments, hydrogen can To be collected separately and recycle.

The method of production sulphur may further include the product of cooling sulphur.The product of cooling sulphur can be stablized and particle Change.For example, the sulphur thus produced can be formed as particle, such as microparticle as described above, allow the sulphur product of processing by Raw material as various chemical reactions and chemical process.

Fig. 8 is the longitudinal cross-section for hydrogen sulfide to be resolved into the exemplary light reactor 800 of hydrogen and sulphur.It can be by light Reactor 800 is connected to hydrogen sulfide source (for example, in hydrocarbon processing equipment) and/or is connected to gas-solid separator, with By sulphur and Hydrogen Separation.Photoreactor 800 may include microwave source 805, first chamber 810, second chamber 815 and third chamber 835.Photoreactor 800 can be formed as a generally cylindrical shape (such as tubulose).

First chamber 810 may include for receiving the entrance 812 for wrapping hydrogen sulfide containing inlet flow.First chamber 810 can With adjacent with second chamber 815, and inlet flow may include hydrogen sulfide, and inlet flow can pass through from first chamber 810 Opening 814 and flow into second chamber 815.First chamber 810 can be by the suitable material (such as stainless steel) for PETROLEUM PROCESSING It is formed.

Second chamber 815 can be (or elongated) of elongation and the shape cylindrical along main shaft.Second Chamber 815 may include waveguide 820, and in the example shown, waveguide 820 is formed by the wall of second chamber 815.Therefore, second Chamber 815 is formed by suitable conductive material (such as stainless steel).In some embodiments, waveguide 820 can be by other one Kind structure is formed.Waveguide 820 includes first wave guide end 822 and second waveguide end 824, and first wave guide end 822 is second The not end adjacent with first chamber 810 of chamber 815, second waveguide end 824 are adjacent with first chamber 810.Ginseng According to Fig. 8, the end of first wave guide end 822 and second chamber 815 is integral.Second chamber 815 may include with first The non-conterminous outlet 826 of chamber 810.

Tube assembly 830 can be located in second chamber 815, and can extend along the main shaft of second chamber 815.It is purple Outer light source 825 can also be located in tube assembly 830.In addition, ultraviolet source 825, negative electrode 827 and positive electrode 829 can be located at In tube assembly 830.Negative electrode 827 and positive electrode 829 can ultraviolet source 825 outside and in the inside of waveguide 820.It is negative Electrode 827 and positive electrode 829 can be plate.Negative electrode 827 can be located at or be arranged in the top of ultraviolet source 825, and Positive electrode 829 can be located at or be arranged in the lower section of ultraviolet source 825.Fig. 9 is the section view of tube assembly 830.It is shown in Fig. 9 Section view perpendicular to Fig. 8 section view.

In other embodiments, other than ultraviolet source 825, proton exchange membrane can also be located in tube assembly 830.

In some embodiments, the wall 832 of tube assembly 830 is all transparent to ultraviolet light and microwave energy.Wall 832 can To be formed by suitable transparent material (such as quartzy).In some embodiments, wall 832 extends to waveguide 820 from inner surface. Quartz or other suitable materials (such as glass) appropriate can provide structural support and be to ultraviolet light and microwave energy Bright.

Ultraviolet source 825 may include electrodeless lamp, which may include gas-discharge lamp, and wherein the gas is put Power needed for electric light generates light is transmitted to internal gas from the outside of lamp via electric field or magnetic field.This with use by passing through The gas-discharge lamp that the conductor of lamp is connected to the internal electrode of power supply is opposite.Electrodeless lamp has many advantages, including by May break down and extend the service life of lamp in electrode, and due to can be used more efficient internal gas (if its Contacting with electrode can react) and save electric energy.

In addition, one of ordinary skill in the art will be understood that in system and method proposed in this paper, with plasma phase Instead, the use of electrodeless lamp can have advantage.For example, an advantage using electrodeless lamp is section compared with plasma Cost is saved, because plasma height relies on electric energy and therefore consumes a large amount of electric energy.Another advantage may include Extended service life of the electrodeless lamp relative to plasma.Unfortunately, since plasma-arc can generate high temperature, mobility drop Low, electrode prematurely can fail or damage in use, to reduce the service life of electrode.In addition, using plasma The shortcomings that body may have its own as radiation source, such as kindling, sustainability and closure.

Ultraviolet source 825 can produce such as 100um between 300um, in 280um to the wavelength between 300um Light in range.It include gas in lamp may include: argon gas, mercury and iodine.In some embodiments, lamp may include The argon gas of 25KPa and the mercury of 20mg.Other gases, amount and pressure are also possible.

Second chamber 815, ultraviolet source 825, negative electrode 827 and positive electrode 829 can be (or elongated) of elongation And extend along the main shaft of second chamber 815.

Third chamber 835 can be adjacent with second chamber 815, and may include two outlets (first outlet 837 and the Two outlets are 839).Third chamber 835 may be used as initially-separate space, which is used to pass through first outlet 837 It extracts hydrogen and sulphur and any other existing material is extracted by second outlet 839.In some embodiments, third chamber Room 835 may include gas-solid separator (such as cyclone separator), and need not be integrally formed with second chamber 815.

Microwave source 805 can be adjacent with first chamber 810, and may include the transmitter 807 for radiating microwave energy. Microwave source 805 can be sent out with frequency (corresponding to the wavelength between 100cm and 0.1cm) between 200MHz and 300GHz Radio magnetic energy.In one embodiment, microwave source 805 emits electromagnetism with frequency between about 900MHz and 2.45GHz Energy.In some embodiments, microwave source 805 emits electromagnetic energy with the frequency of about 2.45GHz.It is also contemplated that this Microwave source can emit microwave with frequency between any two in these enumerators.

Microwave source 805 can be arranged the waveguide 820 of radiation microwave energy to first chamber 810 and second chamber 815, and And microwave energy is contacted with ultraviolet source 825.When microwave energy contacts ultraviolet source 825, ultraviolet source 825 can produce ultraviolet Light.In some embodiments, microwave source 805 can be arranged radiation microwave energy, so that microwave energy passes through first chamber 810 And reach second chamber 815.The microwave energy that microwave source 805 generates can be present in the hydrogen sulfide in first chamber 810 with thermal excitation, And at the same time driving/excitation ultraviolet source 825.Because radiation energy not only can be used for thermal excitation hydrogen sulfide but also can be used for generating Ultraviolet light, and both of which facilitates key dissociation (for example, generating hydrogen and elementary sulfur by hydrogen sulfide), so energy loss by radiation Very little, therefore this arrangement may be effective.In addition, this arrangement can be such that microwave source is tuned, to be only to solve Amount from energy needed for key is input into system, and seldom energy dissipation is in unnecessary heat heating.

Because the microwave energy for being radiated second chamber 815 is reflected, first wave guide end 822 and second waveguide end 824 can be formed such that second chamber 815 and/or waveguide 820 are used as resonator.Due in second chamber 815 and/or waveguide Interference in 820 between the wave of roundtrip, this arrangement can cause to form standing wave in second chamber.Standing wave is (also referred to as Standing wave) it may include a wave, each point on medium wave axis has associated uniform amplitude.For example, Figure 10 shows tool There is the Photoreactor 800 of Fig. 8 of the standing wave 1005 shown.The smallest position of amplitude is referred to as node, and the maximum position of amplitude Referred to as antinode.Photoreactor 800 can be designed/control, so that the positive amplitude of standing wave is located on positive electrode 829, and make The negative amplitude of standing wave is located on negative electrode 827.

In operation, hydrogen sulfide gas stream is introduced into entrance 812 under pressure and temperature.Hydrogen sulfide gas is by microwave source The form of 805 radiation microwaves is contacted with microwave energy.When hydrogen sulfide gas and microwave energy contact, hydrogen sulfide is by thermal excitation.Heat shock The hydrogen sulfide of hair flows into the second chamber 815 being included in inside tube assembly 830.The hydrogen sulfide of thermal excitation is contacted with standing wave.Because Molecule is distributed with non-uniform electronics, so hydrogen sulfide is polar, so that molecule has positively charged side and with negative The side of charge.There are standing wave, itself is directed at (such as orientation) by hydrogen sulfide with standing wave.This will increase molecule Absorb the effective cross-sectional area of ultraviolet light.Therefore, with there is no compared with the hydrogen sulfide of standing wave, it is exposed to the sulphur of standing wave and ultraviolet light Changing hydrogen will be from the more energy of UV Absorption.

The hydrogen sulfide by thermal excitation for being exposed to ultraviolet light can lead to key dissociation and hydrogen ion (H⁺) and sulphion (S^2-) generation.Hydrogen can be attracted to negative electrode 827, and sulphur can be attracted to positive electrode 829.This can lead to hydrogen and sulphur It is physically separated, to reduce amount and possibility that reaction is formed hydrogen sulfide by these free radicals.This, which can be used as, is quenched A kind of form (for example, stopping or reduce back reaction).Because hydrogen is lighter than sulphur (thus sulphur will be pulled downwardly due to gravity), Negative electrode 827 can be disposed in 829 top of positive electrode.Alternatively, it is possible to proton exchange membrane substitution positive electrode 827 and bear Electrode 829, the proton exchange membrane can be used as a kind of form being quenched.

The flow of Photoreactor 800 can be entered by the length and hydrogen sulfide for controlling second chamber 815 to control second The residence time of hydrogen sulfide in chamber 815.In addition, the energy that microwave source 805 and ultraviolet source 825 give hydrogen sulfide will affect Residence time needed for hydrogen sulfide.

Hydrogen and sulphur can export 823 by second chamber and leave second chamber 815, and lighter hydrogen can go out by first Mouth 837 leaves, and heavier sulphur can be left by second outlet 839.In some embodiments, gas solid separation can be used Device, such as cyclone separator.

Although it have been described that providing the above-mentioned example operation of input of the pure hydrogen sulfide as Photoreactor 800, still It also may include pollutant.Common pollutant may include carbon dioxide, methane and other hydrocarbons.These pollutants Photoreactor 800 can be left by second outlet 839 together with sulphur.Because when pollutant is exposed to microwave energy and ultraviolet light When can consume more energy, so by reduce hydrogen sulfide in pollutant amount, the efficiency of system can be improved.

Furthermore it is possible to change the ultraviolet light generated by ultraviolet source 825 by controlling and/or modifying microwave source 805 Frequency/wavelength.By the frequency/wavelength for changing microwave energy, thus it is possible to vary by the frequency for the light that ultraviolet source 825 generates.Change The frequency/wavelength of ultraviolet light can enable the operator to tune Photoreactor 800 based on pollutant desired in inlet flow, To improve efficiency.It can be by ultraviolet frequencies/wavelength tuning to making hydrogen sulfide absorption coefficient with higher and pollutant has The frequency/wavelength of lower absorption coefficient.It therefore, there is no need to some implementations that Photoreactor 800 is redesigned for each application Mode.

Some embodiments may include multiple tube assemblies 830 of parallel (or in parallel) arrangement.For example, Figure 11 is with more The section view of the another exemplary second chamber 815 of a tube assembly 830.Section view cutting perpendicular to Fig. 8 shown in Figure 11 Face view.Tube assembly 830 is disposed in second chamber 815, and each tube assembly 830 can have the ultraviolet source of oneself 825, negative electrode 827 and positive electrode 829.Region 1105 between tube assembly can be by being transparent to ultraviolet light and microwave energy Material (such as quartz) is formed.It is corresponding that the arrangement of Figure 11 allows the light emitted by a ultraviolet source 825 not only to illuminate its Hydrogen sulfide in tube assembly 830, but also illuminate the hydrogen sulfide in other tube assemblies 830.Multiple ultraviolet sources 825 can be by altogether With microwave source 805 excite/drive, and reside in common waveguide.In some embodiments, each tube assembly 830 Including respective waveguide 820.

Figure 12 to Figure 17 is the view according to the exemplary light reactor 800 of some embodiments of current topic.

Figure 18 shows the exemplary system 1800 for decomposing hydrogen sulfide.System 1800 includes Photoreactor 800, vulcanization Hydrogen source 1805 and gas-solid separator 1810.Figure 19 to Figure 25 shows the various views of exemplary system 1800.

Figure 26 to Figure 29 shows the view in exemplary microwave source 805.In shown example, microwave source 805 is magnetic Keyholed back plate.

Figure 30 is the system block diagram for showing the exemplary process flow 3000 of desulfurization.At 3010, hydrogen sulfide is provided.In At 320, hydrogen sulfide is present in processing pipe (such as first chamber 810).At 3030, using photolysis (such as second In chamber 815) decomposing hydrogen sulfide.At 3040, the hydrogen sulfide of decomposition is separated by separator (such as cyclone separator) 3040 Hydrogen 3050 and sulphur 3060.

Figure 31 is system block diagram, which shows the exemplary system of the rat distillate factory for handling unstrpped gas System 3100.Unstrpped gas may include hydrogen sulfide, carbon dioxide and methane.Unstrpped gas can be produced by such as animal wastes It is raw.System 3100 removes hydrogen sulfide, carbon dioxide and methane from unstrpped gas, and hydrogen sulfide can also be resolved into hydrogen And sulphur.System 3100 may include one or more energy circulation circuits, the energy circulation circuit will in treatment process into The downward cold flow of one step is fed back into cool down inlet flow, to be further processed.This method can recycle the energy and reduce The load of cooling unit.

System 3100 includes unstrpped gas receiving unit 3105, unstrpped gas precooler 3110, hydrogen sulfide condenser 3115, carbon dioxide subcooler 3120, carbon dioxide condenser 3125 and rear cooling tank 3130.

Unstrpped gas receiving unit 3105 receives the original of the hydrocarbon including hydrogen sulfide, carbon dioxide and such as methane Expect gas.Unstrpped gas is pre-cooled in unstrpped gas precooler 3110, and it reduce the temperature of unstrpped gas.Unstripped gas Body precooler 3110 may include with hydrogen sulfide output stream 3112 carry out heat exchange heat exchanger (for example, inlet flow it Between carry out heat exchange, to increase the temperature of hydrogen sulfide output stream 3112, while reducing the temperature of raw material gas flow).Cooling Unstrpped gas can condense in hydrogen sulfide condenser 3115.Hydrogen sulfide condenser 3115 can isolate sulphur from unstrpped gas Change hydrogen, to generate the raw material gas flow 3117 of hydrogen sulfide output stream 3112 and desulfurization.Hydrogen sulfide output stream 3112 can be liquid It body and can be recycled by unstrpped gas precooler 3110 as described above.

The unstrpped gas 3117 of desulfurization includes the carbon dioxide and methane of gas phase, then in carbon dioxide subcooler 3120 In be cooled.Carbon dioxide subcooler 3120 may include heat exchanger, which makees the unstrpped gas 3117 of desulfurization For heat input stream, and further it regard cooling methane stream 3132 as cold inlet flow.Carbon dioxide subcooler 3120 increases cooling Methane stream 3132 temperature, while reducing the temperature of the unstrpped gas 3117 of desulfurization.Carbon dioxide condenser 3125 can be cold The carbon dioxide of the solidifying unstrpped gas 3117 from desulfurization.Carbon dioxide condenser 3125 can separate carbon dioxide and methane, To generate carbon dioxide output stream 3122 and methane stream 3127.Carbon dioxide output stream 3122 can pass through hydrogen sulfide condenser 3115 as cold inlet flow are recycled to heat exchanger.Similarly, methane stream 3127 can store in rear cooling tank 3130 In, the output of rear cooling tank 3130 can be methane stream 3132, which is used as carbon dioxide subcooler The cold inlet flow of 3120 heat exchanger.Cooling methane stream 3137 can store in storage tank 3140.

Carbon dioxide condenser 3125 can be driven by carbon dioxide thermoelectric cooling element 3145, the carbon dioxide thermoelectricity Cooling element 3145 includes the circuit for cooling down liquid, and carbon dioxide condenser 3125 condensed using the circuit/separate two Carbonoxide and methane.Carbon dioxide condenser 3125 may include heat exchanger, which is used for from thermoelectric-cooled member The cooling stream of part 3145 and between carbon dioxide subcooler 3120 received relatively warm carbon dioxide and methane gas into The exchange of row heat.Although other cooling elements are also possible this example illustrate thermoelectric cooling element.

Because system 3100 recycles output stream 3112,3122 and 3132, so as to what is more early occurred during processing It is cooled down in step, so the cooling load needed for reducing on carbon dioxide thermoelectric cooling element.

It warms once carbon dioxide output stream 3122 (it can be liquid when entering hydrogen sulfide condenser 3115), just It can be by as output gas 3147.Similarly, once hydrogen sulfide output stream 3112 is (when entrance unstrpped gas precooler 3110 When it can be liquid) warm, can serve as output gas 3150.

In some embodiments, it can be used as described above about the Photoreactor of Fig. 8 800 and gas-solid separator The hydrogen sulfide gas 3150 of output is resolved into sulphur 3155 and hydrogen 3160 by 1810.

At 3120, unstrpped gas is cooled with by hydrogen sulfide and hydrocarbon (such as methane) and other pollutants (such as carbon dioxide) separation.At 3130, it is, for example, possible to use techniques described in Figure 30 to handle the hydrogen sulfide isolated To generate sulphur and hydrogen.At 3140, not hydrogen sulfide containing hydrocarbon and other pollutants can handle.

Figure 32 is the system block diagram of the modification of exemplary system 3100 shown in Figure 31.

Figure 33 to Figure 35 is the view for showing the exemplary gas-solid separator 1810 in the form of cyclone separator.

It in some embodiments, can be parallel using Photoreactor array with any process flow of scale.For example, figure 36- Figure 41 shows the various views of exemplary light reactor array.Each Photoreactor includes that hydrogen sulfide can pass through Chamber.At least one is used to irradiate hydrogen sulfide and hydrogen sulfide is decomposed into the ultraviolet source of hydrogen and sulfide in chamber.Scheming In 36, reactor array include 9 reactors (3 × 3 array), this 9 reactors inlet flow can be divided into 9 it is independent Stream, and independently and concurrently handle each stream.This 9 output streams can be reconfigured to be further processed, can also be with It is kept as individual stream.Other embodiments are also possible, for example, Figure 41 shows 5 ultraviolet light chambers.In Figure 48 Another exemplary Photoreactor array is shown, wherein Photoreactor array 2000 includes 4 Photoreactors, this 4 light reactions Device is respectively Photoreactor 2000a, Photoreactor 2000b, Photoreactor 2000c and Photoreactor 2000d.

It may include electronic module according to the another exemplary system of current topic or device, lamp module, microwave module, anti- Answer device module, sensor module, extraction module, mounting structure, pipe/accessory, control module, blower module, separator/recycling Module and security module.Electronic module may include microcontroller and power controller.Lamp module may include electrodeless lamp With lamp installation part.Microwave module may include magnetron, power cell and waveguide.Reactor module may include continuously stirring instead Answer port (heat, pressure, flow, ultraviolet light, the H of device (CSTR), installation part, sensor₂Sensor, H₂Sensor, more gases pass Sensor etc.) and harness/conduit.Sensor module may include temperature, pressure, ultraviolet light, flow, valve/actuator position with And gas sensor (H₂, CH₄, CO₂Deng).Extraction module may include cyclone separator, cooling coil, thermoelectric (al) cooler, be used for Recycle the electrode (such as electrode plate) and gate/valve actuator of free radical.Mounting structure may include pipe, cyclone separator, Microwave module, sensor module, electronic module and frame (angle steel, channel steel, fashioned iron) etc..Pipe and accessory may include pipe, elbow, Reducing joint, threeway, cock and valve.Order and control module may include computer and data collecting card.Security module can be with Protection system is revealed including safety (pressure) release system, hydrogen control system, environmental monitoring system and unexpected ultraviolet light.Air blast Machine module may include: type: centrifugal, spiral etc.；Capacity (size): flow (cubic feet per minute, CFM)；Discharge Pressure gauge and control piece.Separator and recycling module may include for recycling CO from charging₂With the CO of other gases₂Liquefaction System, hydrogen treat system, CO₂Processing system and sulphuring treatment system.

In some embodiments, this system may include the chamber of at least two couplings and fluid communication.First chamber can Be configured to receive and thermal excitation include at least part hydrogen sulfide input charging.Second chamber can be configured to receive The charging of thermal excitation to generate hydrogen and elementary sulfur, and separates hydrogen and elementary sulfur and input to decompose the hydrogen sulfide in charging Any other component that may be present in charging.

If what is carried out below is discussed in greater detail, first chamber may include microwave source, which can be configured to It will flow in the first chamber and microwave energy is exposed to by the input of first chamber charging.Hydrogen sulfide can be improved in this exposure The ability of energy (such as ultraviolet light) is absorbed, so as to enhance the efficiency of photodissociation desulfurization.In addition, in some embodiments, the One chamber can be configured to promote the formation of standing wave, as described above, the standing wave allows hydrogen sulfide to be directed at standing wave itself, to increase Add the effective cross-sectional area of the absorption ultraviolet light of hydrogen sulfide.

In addition, second chamber may include light source (such as ultraviolet source), the light as what is carried out below is discussed in greater detail Source is configured as the charging of thermal excitation being exposed in a effective amount of electromagnetic energy, which can lead to hydrogen sulfide linkage Cracking, to form hydrogen and elementary sulfur.Although second chamber can be coupled to separator with separating element sulphur, some In embodiment, second chamber, which can be configured as, is divided remaining feed component existing in elementary sulfur and second chamber From.Second chamber, which also can be configured as, separates the hydrogen of cracking with remaining feed component.

Fig. 4 B shows the exemplary embodiment of desulphurization system 400.As shown, system 400 includes being coupled together simultaneously The two chambers 402,404 of fluid communication.First chamber 402 includes the entrance 406 for receiving input charging (not shown).Input into Material can be original feed or processing charging with the constituent including at least hydrogen sulfide.In some embodiments, it inputs Charging can be the form of gas vapor.

Entrance 406 can with constant flow supply input charging, the constant flow rate can according to the implementation of system come into Row changes.Entrance 406 may include meter or valve, to control the flow of input charging.Alternatively, it is possible to continuously change defeated Enter the flow of charging, such as with reduction, increase or the yield (such as elementary sulfur) for keeping product.

First chamber 402 can also include microwave source 408, the microwave source 408 be placed adjacent at entrance 406 (for example, At the distal end 402d of first chamber 402).Microwave source 408 emits microwave energy, to flow into and through the first chamber when input charging Hydrogen sulfide present in thermal excitation input charging when room 402.As shown, first chamber 402 can be the (or elongated of elongation ) and along main shaft shape cylindrical (for example, tubular structure).Here it is also contemplated that first chamber 402 It can have other constructions.Moreover, it is also contemplated that first chamber 402 can be and Photoreactor shown in Fig. 8 800 similar Photoreactors, or can be the Photoreactor array similar with array 2000 shown in Figure 48.

First chamber 402 may include waveguide, the waveguide be configured as guidance microwave energy by first chamber (for example, from Proximal end 402p of the distal end 402d of first chamber 402 to first chamber 402, wherein proximal end 404p).In some embodiments, wave Leading can be formed by the wall of first chamber 402.In this case, first chamber 402 can be by suitable reflecting material (such as Stainless steel) it is formed.In addition, at least part of the inner surface of wall can be coated the group for reflection in desired region Close object.Alternatively or can additionally, first chamber 402 may include independent waveguide (for example, not being the wall by first chamber The waveguide of formation).

It should be noted that in some embodiments, first chamber may include the array of sub-chamber, sub-chamber's structure It is upper to be similar to the first chamber 402 as shown in Fig. 4 B.These sub-chamber can be arranged in series or in parallel.

As shown in Figure 4 B, the proximal end 402p of first chamber 402 is connected to second chamber 404.Second chamber 404 includes light Source 410.In this way, second chamber 404 can be used as Photoreactor.Although it is various types of that light source 410 can be configured as transmitting Light, but in some embodiments, 410 emitting ultraviolet light of light source.In one embodiment, the radiation of light source 410 has from about 100nm to about 300nm, from about 200nm to about 300nm, from about 280nm to about 300nm or from about 290nm to about 300nm's The ultraviolet light of wave-length coverage.As shown, light source 410 can be attached at least part of the inner surface of second chamber 404. In one embodiment, light source 410 can be coupled to entire inner surface.It is contemplated herein that light source 410 can be pacified The component of second chamber 404 is set at other regions or be connected to, such as is coupled to as described in more detail below At vortex overflow pipe 1022 in Figure 42.

The radiated time of the light emitted in second chamber 404 can be suitably adjusted by modifying the parameter of light source 410 And/or the intensity of light.Light source 410 can be properly selected from that can enhance in the radiation device of particular range of wavelengths.Example Property light source may include LED, laser etc..

In use, it when input charging is flowed out into from first chamber 402 to second chamber 404, is sent out by light source 410 The ultraviolet light the penetrated hydrogen that at least partly cures is absorbed.Therefore key dissociation occurs, to generate hydrogen and elementary sulfur.Although the Two chambers 404 can have various shape, but second chamber 404 is in the form of whirlwind as shown in Fig. 4 B, therefore is produced Raw hydrogen is by being located at the first outlet 412 at the top of second chamber 404 from 404 pass-out of second chamber.In addition, generated Elementary sulfur leaves second chamber 404 by being located at the second outlet 414 of 404 bottom of second chamber.Additionally, there are in the second chamber The remaining ingredient of charging in room 404 can by first outlet 412 together with hydrogen pass-out, or second outlet can be passed through 414 together with elementary sulfur pass-out.Alternatively or additionally, the remaining ingredient can export 416 from the by third Two chambers, 404 pass-out.Any outlet of second chamber 404 may include meter or valve, to control the pass-out speed of each ingredient Rate.

Further, as shown in Figure 4 B, second chamber 404 may include gas permeable membrane 418 (for example, proton exchange Film), which can be configured to separate hydrogen with the remaining ingredient of charging and/or elementary sulfur.As schemed Show, the substantially separate hydrogen of gas permeable membrane 418, allows hydrogen by 412 pass-out of first outlet, and remaining charging group Third can be passed through by, which dividing, exports 416 pass-outs.In addition, in some embodiments, being present in second chamber 404 in reaction gas In the case where, gas permeable membrane 418 can also be configured to separate hydrogen with reaction gas.In some embodiments, gas Penetrating film 418 may include catalyst.

As shown in Figure 4 B, second chamber 404 may include cooling element 420.The cooling element 420 can be configured as Control or the temperature for changing elementary sulfur, such as temperature is reduced to make element sulfur particle.As shown, cooling element 420 can To be coupled to the inner surface of second chamber 404.In other embodiments, cooling element 420 can be incorporated into second chamber 404 wall is interior or is coupled to the outer surface of the wall of second chamber, to form the second chamber of jacketed.In another implementation In example, second chamber may be coupled to cooling equipment (for example, heat exchanger).The non-limiting example packet of suitable cooling element Include the empty gas and water etc. of suitable temperature.

In addition, second chamber 404 may include or be connected to heating equipment.Heating equipment, which can be configured as, to be decomposed Reaction temperature is controlled when reaction starts or during decomposition reaction.The non-limiting example of suitable heating equipment include flame, Electric furnace, heating plate and air draught.Alternatively or can additionally, heating element can be incorporated into the wall of second chamber 404 The outer surface of wall that is interior or being coupled to second chamber 404.The non-limiting example of suitable heating element includes suitable temperature Empty gas and water of degree etc..

In some embodiments, system 400 may include controller, or can carry out with controller wired or wireless logical Letter.The controller refer to may include memory and processor hardware device.Memory is configured as memory module, and handles Device is specifically configured to execute the module to execute one or more processes.The control logic of this theme can be embodied as Non-transitory computer-readable medium on computer-readable medium, the computer-readable medium include by processor, controller/ The executable program instructions of the execution such as control unit.The example of computer-readable medium includes but is not limited to ROM, RAM, CD (CD)-ROMs, tape, floppy disk, flash drive, smart card and optical data storage.Computer readable recording medium is also Can be distributed in the computer system of network connection stores and executes computer-readable medium in a distributed fashion, such as logical Cross telematics server or controller LAN (CAN).Controller can be properly connected at least the one of system A component, for example, entrance, outlet, first chamber, second chamber, microwave source and light source, so that controller control reaction (is decomposed Condition).Controller can have the control algolithm for capableing of suitably regulating system condition.

Figure 42 to Figure 47 shows the another exemplary embodiment of desulphurization system 1000.In addition to the difference being described below in detail Except not, system 1000 can be similar to system 400 shown in Fig. 4 B, therefore be not described in detail herein.In addition, for letter For the sake of list, certain components of system 1000 are not shown into Figure 47 by Figure 42.

As shown in Figure 42, Figure 44 and Figure 45, system 1000 includes the first chamber 1002 and second chamber being connected to each other 1004.First chamber 1002 can be Photoreactor, and the Photoreactor 800 as shown in Fig. 8, or to be also possible to light anti- Device array is answered, the array 2000 as shown in Figure 48.In some embodiments, as shown in Figure 42, Figure 44 and Figure 45, the One chamber 1002 is directly connected to second chamber.It in other embodiments, can be in first chamber 1002 and second chamber 1004 Between dispose other chamber or other component.

As shown in Figure 42, second chamber may include at the vortex overflow pipe 1022 being placed in second chamber 1004 Light source 1010.Although light source 1010 has various structures, as shown in Figure 42 and Figure 44 to Figure 47, light source 1010 has The helical structure being wrapped on the outer surface of vortex overflow pipe 1022.In use, microwave source (not shown) can be by microwave energy It is radiated in second chamber 1004, so that microwave energy is contacted with light source 1010.In some embodiments, light source 1010 may include interior Portion's gas, the internal gas can generate ultraviolet light when contacting with microwave energy.

Further, as shown in Figure 42 and Figure 45 to Figure 47, second chamber 1004 includes two gas permeable membranes 1018 (the gas permeable membrane 418 as shown in Fig. 4 B) and second gas penetrate film 1024.Second gas penetrates film and is located at vortex The distal end 1022d of overflow pipe 1022.Second gas penetrates film 1024 (for example, proton exchange membrane) and can be configured to be similar to gas Body penetrates film 418, therefore is no longer discussed in detail herein.

This theme may include rectification systems, which includes desulphurization system as described herein.This theme can wrap Desulphurization system is included, which includes reaction described herein device.Particularly, desulphurization system may include recycling list Member, the recycling unit utilize hydrogen fuel processing system as input for the hydrogen generated by reactor to be introduced into In another stage.

First experiment is confirmed the presence of sulphur by carrying out, and sulphur is extracted from hydrogen sulfide.

Fig. 5 is the block diagram for showing test device 500, and Fig. 6 and 7 shows the photo of test setting.The test device includes Be arranged to hydrogen sulfide source hydrogen sulfide being introduced into the entrance of the reaction chamber including UV-C lamp.UV-C lamp (being based on mercury) energy Enough irradiate the gas inside reaction chamber.The outlet of UV-C lamp (reaction chamber) is connected to the collection vessel equipped with water.Reaction chamber The length of room is about 115cm.UV-C lamp is driven with 234 volts of voltage and 0.002 ampere of electric current.

Under 1 standard atmospheric pressure (atm), the initial temperature of reaction chamber is 27 degrees Celsius.Use vulcanized sodium and hydrochloric acid Hydrogen sulfide is introduced into lamp.The output of UV-C lamp passes through the pure water (H in collection vessel₂O it) is bubbled.Hydrogen sulfide is allowed to flow through UV Lamp 15 minutes.As shown in Fig. 7, the H in collection vessel in left side₂O becomes milky, this shows the defeated of reaction chamber There are sulphur in stream out.After 15 min, the temperature of reaction chamber is 35 degrees Celsius.

Although some modifications have been described in detail above, other modifications or additional and possible.For example, purple Outer Photoreactor can be used for sterilizing, and with the key that cracks material in addition to hydrogen sulphide, (such as other are with key solution appropriate Binary molecule and ternary molecule from energy).

The one or more aspects or feature of theme described herein may be implemented in Fundamental Digital Circuit, integrated circuit, The specific integrated circuit (ASIC) that specially designs, field programmable gate array (FPGA), computer hardware, firmware, software and/or Their combination.These various aspects or feature may include the implementation in one or more computer programs, one Or multiple computer programs can be executed and/or be explained in programmable system containing at least one programmable processor, it should Programmable processor can be it is dedicated or general, the programmable processor may be coupled to and from storage system, at least one A input equipment and at least one output equipment receive data and instruction, the programmable processor to storage system, at least one Input equipment and at least one output equipment transmit data and instruction.Programmable system or computing system may include client and Server.Client and server is generally remote from each other, and is usually interacted by communication network.Client and server Between relationship be by run on the respective computers and each other with client-server relation computer program and produce Raw.

These computer programs (can also be referred to as program, software, software application, application, component or code) include can The machine instruction of programmed process device, and can be with high level procedural (object), Object-Oriented Programming Language, functional programming language Speech, logic programming language and/or compilation/machine language implement these computer programs.As used herein, term " machine Readable medium " refers to for providing any computer program product, the device of machine instruction and/or data to programmable processor And/or equipment (such as disk, CD, memory and programmable logic device (PLD)), the programmable processor include receiving to make For the machine readable media of the machine instruction of machine-readable signal.Term " machine-readable signal " refers to for programmable processing Device provides any signal of machine instruction and/or data.Machine readable media can with non-transitory store such machine and refer to It enables, as such as non-transitory solid-state memory or magnetic hard drive or any equivalent storage medium will be done.Machine Readable medium alternatively or additionally can store such machine instruction in temporary mode, such as processor cache or with As other associated random access memory of one or more physical processor cores will be done.

In order to provide the interaction with user, the one or more aspects or feature of theme described herein can be by Realize have display equipment (such as to user show information cathode-ray tube (CRT) or liquid crystal display (LCD) or Light emitting diode (LED) monitor), on the computer of keyboard and indicating equipment (such as mouse or trackball), user can lead to It crosses them and provides input to computer.Other kinds of equipment can be used for providing the interaction with user.For example, being provided to The feedback of user may be any type of sensory feedback, such as visual feedback, audio feedback or touch feedback, and to use by oneself The input at family can be received in any form, including sound, voice or tactile input.Other possible input equipments include touching Touch screen or other touch-sensitive devices (such as single-point or multi-point electric resistance or capacitive touch pad), voice recognition hardware and soft Part, optical scanner, optical indicator, digital image capturing device and relevant interpretation software etc..

In description above and claim, in fact it could happen that such as "at least one" or " one or more " etc Phrase is followed by the Assembly Listing of element or feature.Term "and/or" may also appear in two or more elements or feature List in.Unless otherwise the phrase is intended to individually impliedly or expressly with it in the contradicted by context wherein used Ground indicates any element listed or feature, or with any other cited by element or feature combine it is any cited Element or feature.For example, phrase " at least one of A and B ", " one or more of A and B " and " A and/or B " difference purport In expression " individual A, individual B or A and B are together ".Similar explanation is also applied for comprising three or more terms List.For example, phrase " at least one of A, B and C ", " one or more of A, B and C " and " A, B and/or C " respectively Be intended to indicate that " individual A, individual B, individual C, A and B together, A and C together, B and C together or A and B and C together ". Furthermore it is intended to indicate that " being based at least partially on " in above-mentioned and term "based" in the claims use, is not arranged in this way The feature or element of act are also admissible.

As expected subject matter described herein can configure and be embodied in system, device, method and/or product In.The embodiment illustrated in the foregoing written description does not represent and the consistent all embodiments of subject matter described herein.Phase Instead, they are only the consistent some examples of aspect related with described theme.Although being described in detail above Some modifications, but other modifications or addition are possible.Particularly, in addition to feature those of described herein and/or variation Except, other features and/or variation can also be provided.For example, implementations described above can be directed to disclosed spy The combination and sub-portfolio of the various combinations of sign and sub-portfolio and/or several other features disclosed above.In addition, in the accompanying drawings Logic flow describing and/or being described herein is not necessarily required to the order of shown certain order or sequence to realize the phase The result of prestige.Other embodiments can be within the scope of the appended claims.