Near-to-eye micro display and preparation method thereof

文档序号:1818488 发布日期:2021-11-09 浏览:30次 中文

阅读说明:本技术 一种近眼微显示器及其制备方法 (Near-to-eye micro display and preparation method thereof ) 是由 吕迅 刘胜芳 刘晓佳 陆瑞 王澳 颜强盖 于 2021-08-05 设计创作,主要内容包括:本发明提供一种应用于近眼微显示器技术领域的近眼微显示器,本发明还涉及一种近眼微显示器制备方法,所述的近眼微显示器制备方法的制备步骤为:在硅片(1)上制备驱动电路(2);介质层(3)沉积,介质层(3)选用氧化硅或氮化硅或氮氧化硅;介质层(3)离子束刻蚀制备曲面,通过改变离子束扫描方向、速度、气体配比、流量、功率,刻蚀出凹面层(4)或凸面层(5),本发明的凹面近眼显示器及近眼微显示器制备方法,通过开发凹面或凸面的曲面显示器,把平面像素变成曲面像素,曲面像素与近眼显示光学方案搭配,弥补光学传输和放大导致的图像边缘像素与中间像素不一致导致的图像扭曲问题,提升近眼微显示器性能。(The invention provides a near-to-eye microdisplay applied to the technical field of near-to-eye microdisplays, and also relates to a near-to-eye microdisplay preparation method, which comprises the following preparation steps: preparing a driving circuit (2) on a silicon chip (1); depositing a dielectric layer (3), wherein the dielectric layer (3) is silicon oxide, silicon nitride or silicon oxynitride; the invention relates to a concave near-eye display and a near-eye micro-display preparation method, which are characterized in that a medium layer (3) is etched by ion beams to prepare a curved surface, and a concave surface layer (4) or a convex surface layer (5) is etched by changing the scanning direction, speed, gas ratio, flow and power of the ion beams.)

1. A method for preparing a near-to-eye micro-display is characterized by comprising the following steps: the preparation method of the near-to-eye micro-display comprises the following preparation steps:

s1, preparing a driving circuit (2) on a silicon wafer (1);

s2, depositing a medium layer (3), wherein the medium layer (3) is made of silicon oxide, silicon nitride or silicon oxynitride;

and S3, preparing a curved surface by ion beam etching (ion beam etch) of the dielectric layer (3), etching a concave surface layer (4) or a convex surface layer (5) by changing the scanning direction, speed, gas ratio, flow and power of the ion beam, and increasing the middle etching amount to form the concave surface layer (4) along with the slowing of the middle scanning speed or the increase of the middle gas flow or power along with the ion beam scanning when the concave surface layer (4) is etched.

2. The near-to-eye microdisplay preparation method of claim 1 in which: the near-to-eye micro-display preparation method further comprises a via hole photoetching step.

3. A method of near-to-eye microdisplay preparation according to claim 2 in which: the near-to-eye micro-display preparation method further comprises a conducting hole etching and stripping step which is used for conducting the anode (6) and the driving circuit (2).

4. A method of near-to-eye microdisplay preparation according to claim 3 in which: the method for preparing the near-to-eye micro-display further comprises the steps of anode (6) deposition, anode (6) photoetching, anode (6) etching and stripping.

5. The near-to-eye microdisplay preparation method of claim 4 in which: the method for preparing the near-to-eye micro-display further comprises the step of evaporating an organic light emitting layer (7) and a cathode (8).

6. The near-to-eye microdisplay preparation method of claim 5 in which: the near-to-eye micro-display preparation method further comprises the step of depositing a thin film packaging layer (9).

7. A near-eye microdisplay, comprising: the near-to-eye micro-display comprises a silicon chip (1), a driving circuit (2), a dielectric layer (3), a concave surface layer (4) or a convex surface layer (5), an anode (6), an organic light emitting layer (7), a cathode (8) and a thin film packaging layer (9).

8. The near-to-eye microdisplay of claim 1 in which: the method is characterized in that a driving circuit (2) is prepared on a silicon wafer (1), a dielectric layer (3) is deposited on the driving circuit (2), and the dielectric layer (3) is made of silicon oxide, silicon nitride or silicon oxynitride.

9. The near-to-eye microdisplay of claim 8 in which: the medium layer (3) is subjected to ion beam etching to form a concave surface layer (4) or a convex surface layer (5), and an anode (6) and an organic light emitting layer (7) are sequentially arranged on the concave surface layer (4) or the convex surface layer (5).

10. The near-to-eye microdisplay of claim 9 in which: and the organic light-emitting layer (7) is sequentially provided with a cathode (8) and a thin film packaging layer (9).

Technical Field

The invention belongs to the technical field of near-to-eye microdisplays, and particularly relates to a near-to-eye microdisplay and a preparation method thereof.

Background

Near-eye display technology has been widely used in the fields of education, industry, medical care, gaming, entertainment, driving, military, etc., including Virtual Reality (VR), Augmented Reality (AR), Mixed Reality (MR), etc. Unlike conventional products such as mobile phones, televisions, computers and the like, VR generally uses a fresnel lens scheme, and an ultra-short focus scheme is gradually popularized. The AR and MR mostly adopt a semi-transparent and semi-reflective projection display technology, and the display is transmitted through an optical waveguide and amplified through an amplification grating, and finally presents a figure on human eyes. No matter VR, AR and MR, after the image is amplified or transmitted by long-distance optical waveguide, the image is distorted, for example, the ultra-short focus scheme of VR is easy to blur at the edge of the image; after the AR/MR optical waveguide is transmitted in a long distance, a semi-transparent and semi-reflective optical scheme is added, so that the sizes of the edge pixels and the middle pixels of an image are different, pixel distortion is generated, the image display proportion is not coordinated, and the like. The problem of image distortion affects the display effect and user experience, increases the optical debugging difficulty of a near-eye display terminal product, and limits the application of a plurality of optical schemes, so that the development of an image distortion resistant display technology is necessary to reduce the optical development difficulty and display near-eye. The pixels of the conventional display are planar, the planar pixels are transmitted or amplified through VR/AR/MR distorted optical paths, the image edges are easy to blur, the sizes of the image edge pixels and the image middle pixels are different, pixel distortion is generated, the image display proportion is not coordinated, and the like.

Disclosure of Invention

The technical problem to be solved by the invention is as follows: aiming at the defects of the prior art, the method for preparing the near-eye micro-display is simple in structure, plane pixels are changed into curved surface pixels through developing a concave surface or convex surface curved surface display, the curved surface pixels are matched with an optical scheme of near-eye display, the problem of image distortion caused by inconsistency of image edge pixels and middle pixels due to optical transmission and amplification is solved, and the performance of the near-eye micro-display is improved.

To solve the technical problems, the invention adopts the technical scheme that:

the invention relates to a method for preparing a near-to-eye micro-display, which comprises the following steps:

s1, preparing a driving circuit on a silicon chip;

s2, depositing a medium layer, wherein the medium layer is silicon oxide or silicon nitride or silicon oxynitride;

s3, preparing a curved surface by ion beam etching (ion beam etch) of the dielectric layer, etching a concave surface layer or a convex surface layer 5 by changing the scanning direction, speed, gas ratio, flow and power of the ion beam, and increasing the middle etching amount by slowing down the middle scanning speed or increasing the middle gas flow or power along with the ion beam scanning when etching the concave surface layer 4 to form the concave surface layer.

The near-to-eye micro-display preparation method further comprises a via hole photoetching step.

The method for manufacturing the near-to-eye micro-display further comprises the steps of conducting hole etching and stripping, and the conducting hole etching and stripping are used for conducting the anode and the driving circuit.

The preparation method of the near-to-eye micro-display further comprises the steps of anode deposition and anode photoetching, and anode etching and stripping.

The preparation method of the near-to-eye micro-display further comprises the steps of organic light emitting layer evaporation and cathode evaporation.

The method for preparing the near-to-eye micro-display further comprises the step of depositing a thin film packaging layer.

The invention also relates to a near-to-eye micro display which comprises a silicon chip, a driving circuit, a dielectric layer, a concave surface layer or a convex surface layer, an anode, an organic light emitting layer, a cathode and a thin film packaging layer.

A driving circuit is prepared on the silicon chip, a dielectric layer is deposited on the driving circuit, and the dielectric layer is made of silicon oxide or silicon nitride or silicon oxynitride.

And the medium layer is subjected to ion beam etching to form a concave surface layer or a convex surface layer, and the anode and the organic light-emitting layer are sequentially arranged on the concave surface layer or the convex surface layer.

And the organic light-emitting layer is sequentially provided with a cathode and a thin film packaging layer.

By adopting the technical scheme of the invention, the following beneficial effects can be obtained:

the invention provides a novel technical scheme for solving the problems in the prior art by using the concave near-eye display and the near-eye micro-display preparation method. By developing a concave or convex curved display, planar pixels are changed into curved pixels, and the curved pixels are matched with a near-eye display optical scheme. The problem of image distortion caused by inconsistency of image edge pixels and middle pixels caused by optical transmission and amplification is solved. Meanwhile, the curved-surface pixels have larger light-emitting areas and higher brightness.

Drawings

The contents of the description and the references in the drawings are briefly described as follows:

fig. 1 is a schematic structural diagram of a concave near-to-eye display prepared by a near-to-eye microdisplay preparation method according to the present invention;

FIG. 2 is a schematic structural diagram of a convex near-eye display fabricated by the method for fabricating a near-eye microdisplay according to the present invention;

fig. 3 is a schematic diagram illustrating a manufacturing process of a near-to-eye microdisplay manufacturing method according to the present invention;

in the drawings, the reference numbers are respectively: 1. a silicon wafer (silicon substrate); 2. a drive circuit; 3. a dielectric layer; 4. a concave surface layer; 5. a convex surface layer; 6. an anode (anode layer); 7. an organic light emitting layer; 8. a cathode (cathode layer); 9. and (7) a thin film packaging layer.

Detailed Description

The following detailed description of the embodiments of the present invention, such as the shapes and structures of the components, the mutual positions and connection relations among the components, the functions and operation principles of the components, will be made by referring to the accompanying drawings and the description of the embodiments:

as shown in fig. 1 to fig. 3, the present invention is a method for fabricating a near-to-eye microdisplay, which comprises the following steps: s1, preparing a driving circuit 2 on a silicon wafer 1; s2, depositing a medium layer 3, wherein the medium layer 3 is silicon oxide, silicon nitride or silicon oxynitride; s3, preparing a curved surface by ion beam etching (ion beam etch) of the dielectric layer 3, etching a concave surface layer 4 or a convex surface layer 5 by changing the scanning direction, speed, gas ratio, flow and power of the ion beam, and increasing the middle etching amount by slowing down the middle scanning speed or increasing the middle gas flow or power along with the ion beam scanning when the concave surface layer 4 is etched to form the concave surface layer 4. The near-to-eye micro display comprises a silicon chip 1, a driving circuit 2, a dielectric layer 3, a concave layer 4 or a convex layer 5, an anode 6, an organic light emitting layer 7, a cathode 8 and a thin film packaging layer 9. The process is claimed, and an improvement scheme is provided for solving the problems in the prior art. The invention changes the plane pixel into the curved pixel by developing the curved display with the concave surface or the convex surface, and the curved pixel is matched with the near-eye display optical scheme. The problem of image distortion caused by inconsistency of image edge pixels and middle pixels caused by optical transmission and amplification is solved. Meanwhile, the curved-surface pixels have larger light-emitting areas and higher brightness. According to the concave near-eye display and the near-eye micro-display manufacturing method, the concave or convex curved surface display is developed, the plane pixels are changed into the curved surface pixels, the curved surface pixels are matched with the near-eye display optical scheme, the problem of image distortion caused by inconsistency of image edge pixels and middle pixels due to optical transmission and amplification is solved, and the performance of the near-eye micro-display is improved.

The near-to-eye micro-display preparation method further comprises a via hole photoetching step. The near-to-eye micro-display preparation method further comprises a conducting hole etching and stripping step for conducting the anode 6 and the driving circuit 2. The near-to-eye micro-display preparation method further comprises the steps of anode 6 deposition, anode 6 photoetching, anode 6 etching and stripping. The near-eye micro-display preparation method further comprises the evaporation of the organic light-emitting layer 7 and the cathode 8. The near-to-eye microdisplay fabrication method further includes thin film encapsulation layer 9 deposition. By the steps, a complete near-to-eye micro-display preparation method is formed, and aiming at the problems of pixel distortion, inconsistent image display proportion and the like, the problem of image distortion caused by inconsistency of image edge pixels and middle pixels due to optical transmission and amplification is solved by developing a concave or convex curved-surface display and changing plane pixels into curved-surface pixels which are matched with an optical scheme for near-to-eye display. Concave or convex displays may be selected to compensate for image distortion caused by the optical system, depending on the degree of distortion of the image output by the near-eye display optical system. Besides the image distortion problem caused by the compensation optical system, the curved surface pixel has a larger light-emitting area and higher brightness.

The invention also relates to a near-to-eye micro display which comprises a silicon chip 1, a driving circuit 2, a dielectric layer 3, a concave surface layer 4 or a convex surface layer 5, an anode 6, an organic light emitting layer 7, a cathode 8 and a thin film packaging layer 9. A driving circuit 2 is prepared on a silicon wafer 1, a dielectric layer 3 is deposited on the driving circuit 2, and the dielectric layer 3 is made of silicon oxide, silicon nitride or silicon oxynitride. The dielectric layer 3 is subjected to ion beam etching to form a concave surface layer 4 or a convex surface layer 5, and an anode 6 and an organic light-emitting layer 7 are sequentially arranged on the concave surface layer 4 or the convex surface layer 5. And the organic light-emitting layer 7 is sequentially provided with a cathode 8 and a thin film packaging layer 9. The near-to-eye micro-display selects the concave or convex display according to the distortion degree of the image output by the near-to-eye display optical system, and is used for compensating the image distortion caused by the optical system. Besides the image distortion problem caused by the compensation optical system, the curved-surface pixels have larger light-emitting area and higher brightness, and the performance of the display is comprehensively improved.

The invention provides a novel technical scheme for solving the problems in the prior art by using the concave near-eye display and the near-eye micro-display preparation method. By developing a concave or convex curved display, planar pixels are changed into curved pixels, and the curved pixels are matched with a near-eye display optical scheme. The problem of image distortion caused by inconsistency of image edge pixels and middle pixels caused by optical transmission and amplification is solved. Meanwhile, the curved-surface pixels have larger light-emitting areas and higher brightness.

The present invention has been described in connection with the accompanying drawings, and it is to be understood that the invention is not limited to the specific embodiments disclosed, but is intended to cover various modifications, changes and equivalents of the embodiments of the invention, and its application to other applications without departing from the spirit and scope of the invention.

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