阅读说明：本技术 用于气相沉积设备的流体处理结构和方法 (Fluid handling structure and method for vapor deposition apparatus ) 是由 路德·奥利斯拉格斯 杰罗恩·安东尼斯·斯梅廷克 于 2020-03-24 设计创作，主要内容包括：用于气相沉积设备的流体处理结构,所述结构限定了具有入口和出口的流动路径,用于将加压流体从所述入口传输到所述出口,其中所述结构包括细长狭缝和一系列喷嘴,允许加压流体通过所述一系列喷嘴以进入所述细长狭缝,所述入口在所述一系列喷嘴的上游,并且其中所述出口形成在所述细长狭缝的间隙开口处的下游,允许加压流体从所述细长狭缝朝向基底排放,其中所述一系列喷嘴被构造成提供比所述细长狭缝更大的流动阻力,并且其中所述一系列喷嘴适于在加压流体通过所述流动路径传输时形成朝向所述结构的一个或多个撞击表面的一系列射流。(A fluid handling structure for a vapor deposition apparatus, the structure defining a flow path having an inlet and an outlet for conveying a pressurized fluid from the inlet to the outlet, wherein the structure comprises an elongated slit and a series of nozzles through which pressurized fluid is permitted to pass to enter the elongated slit, the inlet being upstream of the series of nozzles, and wherein the outlet is formed downstream of a gap opening of the elongated slit permitting pressurized fluid to be discharged from the elongated slit toward a substrate, wherein the series of nozzles are configured to provide a greater flow resistance than the elongated slit, and wherein the series of nozzles are adapted to form a series of jets toward one or more impingement surfaces of the structure as pressurized fluid is conveyed through the flow path.)