阅读说明：本技术 用于吸附用于沉积工艺的掩模的基板支撑件 (Substrate support for adsorbing a mask for a deposition process ) 是由 陈志坚 桑杰伊·D·雅达夫 元泰景 李军 邵寿潜 S·K·塞蒂 于 2020-01-17 设计创作，主要内容包括：本公开内容的实施方式包括用于在沉积腔室中将掩模静电耦接到基板支撑件的方法和设备。在一个实施方式中,公开了一种基板支撑件,所述基板支撑件包括：基板接收表面；凹陷部分,所述凹陷部分围绕所述基板接收表面的周边设置；静电吸盘,所述静电吸盘设置在所述基板接收表面下方；和多个可压缩按钮,所述多个可压缩按钮设置在形成于与所述静电吸盘形成电路的所述凹陷部分中的相应开口内。(Embodiments of the present disclosure include methods and apparatus for electrostatically coupling a mask to a substrate support in a deposition chamber. In one embodiment, a substrate support is disclosed, comprising: a substrate receiving surface; a recessed portion disposed about a perimeter of the substrate receiving surface; an electrostatic chuck disposed below the substrate receiving surface; and a plurality of compressible buttons disposed within respective openings formed in the recessed portion forming an electrical circuit with the electrostatic chuck.)