阅读说明：本技术 一种高效率及高的硼利用率涂硼方法 (Boron coating method with high efficiency and high boron utilization rate ) 是由 王琦标 邓超 庹先国 李怀良 冷阳春 吴亚东 刘福乐 杨红超 代亨 于 2021-01-05 设计创作，主要内容包括：本发明公开了一种高效率及高的硼利用率涂硼方法,该方法为：采用酒精分别溶解纳米硼粉和粘合剂,将两种溶液混合,并用酒精稀释制备涂硼液；将待涂硼的基材置于恒温干燥箱中,采用玻璃棒引流的方式将涂硼液水平铺于待涂硼的基材上,完成对基材的涂硼。本发明利用液体表面张力,将一定量的含有一定浓度的硼粉和粘合剂的涂硼液平铺在基材上,采用恒温干燥箱烘干的方式进行涂硼,利用液体张力将其平铺在基材上,可保证硼膜的均匀性,将涂硼液烘干后,可有效控制硼膜厚度,并且使硼粉利用率接近100％。(The invention discloses a boron coating method with high efficiency and high boron utilization rate, which comprises the following steps: dissolving nano boron powder and an adhesive by adopting alcohol respectively, mixing the two solutions, and diluting the mixed solution by using alcohol to prepare a boron coating solution; and (3) placing the base material to be coated with boron in a constant-temperature drying box, and horizontally spreading the boron coating liquid on the base material to be coated with boron in a glass rod drainage mode to finish the boron coating of the base material. The invention utilizes the liquid surface tension to flatly lay a certain amount of boron coating liquid containing boron powder and adhesive with certain concentration on a base material, adopts a drying mode of a constant-temperature drying oven to coat boron, and flatly lays the boron coating liquid on the base material by utilizing the liquid tension, thereby ensuring the uniformity of a boron film, effectively controlling the thickness of the boron film after drying the boron coating liquid, and ensuring that the utilization rate of the boron powder is close to 100 percent.)

1. A boron coating method with high efficiency and high boron utilization rate is characterized in that the method comprises the following steps: dissolving nano boron powder and an adhesive by adopting alcohol respectively, mixing the two solutions, and diluting the mixed solution by using alcohol to prepare a boron coating solution; and (3) placing the base material to be coated with boron in a constant-temperature drying box, and horizontally spreading the boron coating liquid on the base material to be coated with boron in a glass rod drainage mode to finish the boron coating of the base material.

2. The boron coating method with high efficiency and high boron utilization rate according to claim 1, characterized in that the constant temperature of the constant temperature drying oven is 70-80 ℃.

3. The boron coating method with high efficiency and high boron utilization rate according to claim 2, characterized in that in the process of horizontally spreading the boron coating liquid on the substrate to be coated with boron, the boron coating liquid is divided into at least three times of drainage and spreading on the substrate, and after each drainage and spreading, the boron coating liquid is dried for 20 minutes, and then the next drainage is carried out.

4. The boron coating method according to claim 1, wherein the binder is prepared from an epoxy resin and a curing agent thereof.

5. The boron coating method with high efficiency and high boron utilization rate according to claim 4, wherein the lipid-boron ratio of the epoxy resin to the nano boron powder is 0.1-0.2.

6. The boron coating method with high efficiency and high boron utilization rate according to claim 5, wherein the lipid-boron ratio of the epoxy resin to the nano boron powder is 0.16.

7. The boron coating method with high efficiency and high boron utilization rate according to claim 1, characterized in that after the substrate to be coated with boron is placed in a constant temperature drying oven, the level of the whole system is adjusted to keep the boron-coated substrate in a horizontal state.

8. The boron coating method according to claim 1, wherein the substrate is conductive or non-conductive.

9. The boron coating method of claim 8, wherein the substrate is made of glass, aluminum or stainless steel.

Technical Field

The invention relates to the field of neutron detection, in particular to a boron coating method with high efficiency and high boron utilization rate.

Background

Neutron detection and neutron imaging technologies are widely applied to the fields of aerospace, homeland security, large-scale neutron spectrometers, medical imaging, neutron radiation protection and the like. The neutrons are not charged, and need to be converted into charged particles by adopting a proper detection material, and a signal is led out by combining a proper detector structure and readout electronics, so that the detection of the neutrons is realized. The thermal neutron detection material commonly used at present is³He gas has the advantages of large thermal neutron reaction section, high n/gamma discrimination ratio, no toxicity, high neutron detection efficiency and the like, can realize high air pressure, is easy to realize large-area detection, and is widely applied to various large neutron detection fields. But the good scene is not long, and the first appearance all over the world in 2001³He gas starved conditions; 2008 year³He demand is 10 times of 2001, reaches 80000L/year, and is worldwide "³He supply crisis "occurs as such. Accordingly, neutron detection researchers and utilities around the world have begun different types of new neutron detector research to replace³He enables the detection of neutrons.³The research of He replacing neutron detector mainly takes several nuclides with larger reaction cross section with neutrons as main materials, including⁶Li、¹⁰B、¹⁵⁵Gd and¹⁵⁷gd, and the like. Wherein is based on¹⁰The boron-coated gas neutron detector of B nuclide has better neutron detection propertyIn place of the focus of neutron detector research, and much research has been conducted. The boron-coated conversion body is the core of the boron-coated gas neutron detector and plays a role in effectively converting neutrons into charged particles. Therefore, the excellent boron coating method becomes the core work of boron coating neutron detector research.

Currently, the commonly used boron coating methods are: chemical vapor deposition, physical vapor deposition, atomic layer deposition, electrophoresis, hand brushing, and dip coating, among others. The boron coating method of chemical vapor deposition, physical vapor deposition and atomic layer deposition is similar, and all adopt a chemical method or a physical method to contain¹⁰B is deposited on the surface of the substrate in a predetermined manner to form a boron film. The method can form films on conductor and non-conductor substrates, and the variety of film forming materials is more, but the boron coating efficiency is very low (less than 0.2 mu m/h), the boron utilization rate is very low (less than 8%), the single boron coating area is smaller, and the equipment cost and the operation cost of boron coating are high. The electrophoretic boron coating is prepared by coating the boron with the composition by an electrophoretic method¹⁰The boron coating technology for forming the film on the substrate by using the material of B ions can only form the film on the conductor substrate, and the film forming material can only be B₄C, the boron coating efficiency is high (less than 40 mu m/h), the boron utilization rate is very low (less than 10%), the single boron coating area is small, and the equipment cost and the operation cost of boron coating are high. The boron coating methods of the manual brush coating method and the dip coating method are similar, the methods are that the binder and the boron-containing material are uniformly mixed and then adhered to the base material, the method is almost suitable for all film-forming materials, the boron coating efficiency is slightly high (less than 10 mu m/h), the boron utilization rate is slightly high (less than 30%), the single boron coating area is large, and the boron coating equipment cost and operation are relatively low. The thickness and uniformity of a formed film cannot be guaranteed by manual brush coating, and the thickness of a boron film cannot be controlled by dip coating although the uniformity can be guaranteed to a certain extent.

Disclosure of Invention

In order to solve the problems, the invention provides a boron coating method with high efficiency and high boron utilization rate, which comprises the steps of flatly paving a certain amount of boron coating liquid containing boron powder and a binder with a certain concentration on a base material by using the surface tension of the liquid, coating boron by adopting a drying mode of a constant-temperature drying oven, flatly paving the boron coating liquid on the base material by using the liquid tension, ensuring the uniformity of a boron film, effectively controlling the thickness of the boron film after drying the boron coating liquid, and enabling the boron powder utilization rate to be close to 100%.

The technical scheme adopted by the invention is as follows:

a boron coating method with high efficiency and high boron utilization rate comprises the following steps: dissolving nano boron powder and an adhesive by adopting alcohol respectively, mixing the two solutions, and diluting the mixed solution by using alcohol to prepare a boron coating solution; and (3) placing the base material to be coated with boron in a constant-temperature drying box, and horizontally spreading the boron coating liquid on the base material to be coated with boron in a glass rod drainage mode to finish the boron coating of the base material.

In a further technical scheme, the constant temperature of the constant temperature drying oven is 70-80 ℃.

In a further technical scheme, in the process of horizontally spreading the boron coating liquid on the base material to be coated with boron, the boron coating liquid is divided into at least three times of drainage and leveling to be spread on the base material, and after each drainage and leveling, the drying is carried out for 20 minutes, and the next drainage is carried out.

In a further technical scheme, the adhesive is prepared from epoxy resin and a curing agent thereof. The type and the grease boron ratio of the adhesive can be adjusted according to specific requirements, and different types of adhesives such as epoxy resin, various water-based adhesives and the like can be selected.

In a further technical scheme, the lipid-boron ratio of the epoxy resin to the nano boron powder is 0.1-0.2.

In a further technical scheme, the lipid-boron ratio of the epoxy resin to the nano boron powder is 0.16.

In a further technical scheme, after the base material to be coated with boron is placed in a constant-temperature drying box, the level of the whole system is adjusted, and the boron-coated substrate is kept in a horizontal state.

In a further technical scheme, the base material is a conductor material or a non-conductor material.

In a further technical scheme, the substrate is made of glass, aluminum or stainless steel.

The invention has the beneficial effects that:

the method of the invention uses the liquid surface tension to lay a certain amount of boron coating liquid containing boron powder and adhesive with certain concentration on the base material, and adopts the drying mode of a constant temperature drying oven to coat boron, and the uniformity of a boron film can be ensured by laying the boron coating liquid on the base material by using the liquid tension; the boron coating liquid containing boron powder and adhesive with certain concentration is dried, the thickness of the boron film can be effectively controlled, and the utilization rate of the boron powder is close to 100%.

Drawings

FIG. 1 is a liquid film diagram of a boron coating liquid according to an embodiment of the present invention formed on a substrate by surface tension;

FIG. 2 is a graph of the effect of boron coating on a 10cm by 10cm glass substrate according to an embodiment of the present invention;

FIG. 3 is a surface topography of a boron film according to an embodiment of the present invention;

FIG. 4 is a cross-sectional view of a boron film according to an embodiment of the present invention.

Detailed Description

Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

Example (b):

a high-efficiency and high-boron-utilization-rate boron coating method specifically comprises two steps of preparing boron coating liquid and coating boron, firstly, when preparing the boron coating liquid, selecting 2 beakers of 100ml and 1 beaker of 25ml, respectively numbering, selecting two glass rods, respectively numbering, washing industrial oil stain by using alcohol, washing by using deionized water, drying for later use, and adjusting the size and the number of the beakers according to specific requirements.

Adding 0.16g of epoxy resin into a No. 1 100ml beaker, adding 30g of alcohol, and fully stirring by using a No. 1 glass rod to completely dissolve the resin in the alcohol; then 1g of nano boron powder is added into a No. 2 100ml beaker, 10g of alcohol is added, and a No. 2 glass rod is adopted for fully stirring to ensure that the nano boron powder and the alcohol are fully mixed, wherein the lipid-boron ratio selected in the embodiment is 0.16.

0.0392g of curing agent is added into a No. 1 100ml beaker, the mixture is fully stirred and mixed uniformly by a No. 1 glass rod, and then the resin-curing agent-alcohol solution in the No. 1 100ml beaker is poured into a No. 2 100ml beaker and is fully stirred by a No. 2 glass rod. Meanwhile, 5g of alcohol is adopted to wash all residual liquid in the No. 1 100ml beaker into the No. 2 100ml beaker, the operation is repeated twice, and the mixture is fully stirred to prepare boron-coated mother liquor. The quality of the curing agent is determined by the quality of the resin and can be fine-tuned as desired.

Then, selecting a plurality of 10cm × 10cm glass sheets, washing industrial oil stain by using alcohol, washing by using deionized water, and drying for later use. The type of the substrate can be adjusted according to the requirement, and the glass with better surface roughness is selected in the embodiment and is also representative of a non-conductor substrate.

Placing a culture dish with the diameter of 18cm in a constant-temperature drying box, placing an organic glass block with the size of 8cm multiplied by 2cm at the center of the culture dish, and adjusting the level of the whole system for horizontally supporting the boron-coated glass sheet. The cleaned glass pieces were placed on an organic glass block and prepared for boron coating.

The boron coating scheme can be formulated according to the area of the boron coating base material and the thickness of boron coating required, and a certain amount of boron coating mother liquor is taken according to the boron coating scheme and diluted by alcohol to prepare the boron coating liquor. In this example, a boron coating solution was prepared by placing 1.4g of the mother liquor in a No. 1 25ml beaker, and diluting the solution with 5.6g of ethanol. Spreading the boron-coated liquid horizontally on a glass sheet to be coated with boron by adopting a glass rod drainage mode, setting the temperature of a constant-temperature drying oven at 70-80 ℃, drying for 20 minutes, repeating the step for 3 times to prepare a boron film with the thickness of about 5 mu m, wherein the step can be modified according to the area size of a substrate and the thickness of the boron film to be coated. The boron coating effect is shown in fig. 1 and fig. 2, and the boron film scanning electron microscope topography is shown in fig. 3 and fig. 4.

In the prior art, for boron coating by chemical vapor deposition, physical vapor deposition, atomic layer deposition and electrophoresis methods, in order to improve boron coating efficiency, improve boron utilization rate and reduce equipment cost and operation cost, a method of adhering boron powder by using an adhesive is required to coat boron. However, in order to further improve the boron coating efficiency, increase the utilization rate of boron powder to nearly 100%, and ensure the uniformity and thickness of the boron film, the method of this embodiment, which is a method of coating boron by adhering boron powder with an adhesive, i.e., manual brush coating and dip coating, needs to be adopted: flatly paving a certain amount of boron coating liquid containing boron powder and an adhesive with a certain concentration on a base material by using the surface tension of the liquid, coating boron by adopting a drying mode of a constant-temperature drying oven, and flatly paving the boron coating liquid on the base material by using the liquid tension to ensure the uniformity of a boron film; the boron coating liquid containing boron powder and adhesive with certain concentration is dried, the thickness of the boron film can be effectively controlled, and the utilization rate of the boron powder is close to 100%.

In another embodiment, the lipid-to-boron ratio can also be 0.1, i.e., 0.1g of epoxy resin is added in a No. 1 100ml beaker, and 1g of nano boron powder is added in a No. 2 100ml beaker, and the rest steps are the same as the above embodiment.

In another embodiment, the lipid-to-boron ratio can also be 0.2, i.e., 0.2g of epoxy resin is added in a No. 1 100ml beaker, and 1g of nano boron powder is added in a No. 2 100ml beaker, and the rest steps are the same as the above embodiment.

In another embodiment, the substrate may be made of a conductive material, such as aluminum.

In another embodiment, the substrate may be made of a conductive material, such as stainless steel.

The above-mentioned embodiments only express the specific embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the present invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention.