阅读说明：本技术 离子布植机用的供气系统 (Air supply system for ion implanter ) 是由 不公告发明人 于 2019-05-09 设计创作，主要内容包括：本发明为一种离子布植机用的供气系统,该供气系统包含一金属室、一电性绝缘盒、一硬质绝缘管件及一可挠性管件；该金属室的内部设置有一第一及第二管路,其底部通过多个电性绝缘件固定在地板上；该电性绝缘盒悬挂在该金属室的一外侧,该硬质绝缘管件设置在该电性绝缘盒内,其一端连接自该金属室外壁穿出的该第二管路,另一端则连接至该穿入至该电性绝缘盒的该可挠性管件。因电性绝缘盒悬挂在该金属室一侧,为避免其中的硬质绝缘管件内的气体受金属室连接的高电压影响而产生电解离,此掺杂气体需为高压气体。且该硬质绝缘管件连接可挠性管件可吸收外界震动能量。(The invention relates to a gas supply system for an ion implanter, which comprises a metal chamber, an electrical insulation box, a hard insulation pipe fitting and a flexible pipe fitting; the metal chamber is internally provided with a first pipeline and a second pipeline, and the bottom of the metal chamber is fixed on the floor through a plurality of electrical insulation pieces; the electrical insulation box is hung on one outer side of the metal chamber, the hard insulation pipe fitting is arranged in the electrical insulation box, one end of the hard insulation pipe fitting is connected with the second pipeline penetrating out of the outer wall of the metal chamber, and the other end of the hard insulation pipe fitting is connected with the flexible pipe fitting penetrating into the electrical insulation box. Because the electrical insulation box is hung on one side of the metal chamber, in order to prevent the gas in the hard insulation pipe fitting from being influenced by the high voltage connected with the metal chamber to generate electric dissociation, the doping gas needs to be high-voltage gas. And the hard insulating pipe fitting is connected with the flexible pipe fitting to absorb external vibration energy.)

1. A gas supply system for an ion implanter, comprising:

the metal chamber is electrically connected with the high potential of a high voltage source, a first pipeline and a second pipeline are arranged in the metal chamber, one end of the second pipeline is communicated with the first pipeline, and the other end of the second pipeline penetrates out of one outer side of the metal chamber;

A plurality of electrical insulators fixed at the bottom of the metal chamber and electrically connected with a low potential of a high voltage source;

an electrically insulating case suspended at the outer side of the metal chamber;

the hard insulating pipe fitting is vertically arranged in the electric insulating box and is provided with a first end and a second end, and the first end is connected with one end of the second pipeline penetrating out of the outer side of the metal chamber; and

one end of the flexible pipe penetrates into the electrical insulation box and is connected with the second end of the hard insulation pipe, and the other end of the flexible pipe is used for being connected to a large amount of doped gas storage chamber; wherein:

the product of the length of the electrical insulation box and the gas pressure in the box is larger than the maximum dissociation voltage difference between the joint of the first end of the hard insulation pipe and the second pipeline and the joint of the second end of the hard insulation pipe and the flexible pipe;

the product of the length of the hard insulating pipe and the gas pressure of the hard insulating pipe for conveying the doping gas is larger than the maximum dissociation voltage difference between the joint of the first end of the hard insulating pipe and the second pipeline and the joint of the second end of the hard insulating pipe and the flexible pipe.

2. An air supply system as defined in claim 1, further comprising:

a third pipeline penetrating into the electrical insulation box; and

and the vacuum pump is connected in series with the third pipeline and provides a negative pressure environment for the electrical insulation box through the third pipeline.

3. An air supply system as defined in claim 1, further comprising:

a fourth pipeline penetrating into the electrical insulation box; and

a high-pressure inactive gas source connected to the fourth pipeline through a gas valve, and the high-pressure inactive gas is uninterruptedly input into the electrical insulation box through the opening of the gas valve; wherein, the gas pressure of the high-pressure inactive gas source is larger than the gas pressure of the doping gas conveyed by the hard insulating pipe fitting.

4. The gas supply system of claim 1, wherein the electrically insulating box is filled with epoxy and covers the rigid insulating tube.

5. An air supply system as claimed in any one of claims 1 to 4, further comprising:

and the air pressure monitoring and regulating valve is connected to the second pipeline so as to regulate the air inlet pressure of the second pipeline, monitor the air inlet pressure and output a monitoring pressure value.

6. The gas supply system of claim 5, wherein the first conduit delivers a gas at a pressure less than atmospheric pressure and the second conduit delivers a gas at a pressure greater than atmospheric pressure.

7. The gas supply system according to any one of claims 1 to 4, further comprising a gas cylinder storing dopant gas and connected to the first pipe through a gas valve.

8. The gas supply system according to any one of claims 1 to 4, wherein the rigid insulating tube is made of sapphire glass, ceramic or plasticized material; wherein the plasticizing material is one of a vinyl polymer, a phenyl ester polymer and a thioether polymer.

9. The gas supply system according to any one of claims 1 to 4, wherein the flexible tube is made of stainless steel.

10. The gas supply system according to any of claims 1 to 4, wherein the dopant gas is arsine, phosphine, boron trifluoride, carbon monoxide, germanium tetrafluoride, silicon tetrafluoride, fluorine phosphide, nitrogen trifluoride, germanium tetrahydride.

11. The gas supply system of any of claims 1-4, wherein the dopant gas is one of arsine, phosphine, boron trifluoride, carbon monoxide, germanium tetrafluoride, silicon tetrafluoride, fluorine phosphide, nitrogen trifluoride, and germanium tetrahydride mixed with one of fluorine, carbon dioxide, hydrogen, nitrogen, and argon.

12. A gas supply system according to any one of claims 1 to 4, wherein the electrically insulating box is suspended outside the metallic chamber against the bottom surface.

13. A gas supply system according to any one of claims 1 to 4, wherein the electrically insulating box is suspended outside the metallic chamber against the top surface.

Technical Field

The present invention relates to a gas supply system for an ion implanter, and more particularly, to a gas supply system capable of remotely delivering a gas for an ion implanter.

Background

An ion implanter for a semiconductor equipment factory comprises a plurality of reaction chambers, wherein the types of doping gases used in the reaction chambers can be changed along with different product process formulas, and the doping gases have the characteristic of being dissociated by high voltage and have toxicity to human bodies; the doping gases are arranged in a metal chamber of the ion implanter after being canned in advance, are connected with a pipeline in the metal chamber and are conveyed to the ion implanter through the pipeline; the metal chamber is electrically connected with a high voltage source, namely the metal chamber is connected with the high potential of the high voltage source, and a plurality of electrical insulation parts are arranged between the bottom surface of the metal chamber and the floor, so that a high-pressure difference environment is prevented from being generated in the metal chamber.

Because the capacity of the gas cylinder is limited, if the using amount of each reaction chamber in the ion implanter in the process is not controlled, the reaction chamber in the process is exhausted by doping gas, so that the process is forced to be stopped to cause loss; therefore, many semiconductor foundries are now developing ways to connect the pipelines of ion implanters to remote sources of bulk stored dopant gases, so that the gases can be supplied without concern. As shown in fig. 6, an electrical insulating tube 72 and a metal bellows 73 are disposed between a metal chamber 70 and a remote bulk doping gas storage chamber 71, and the metal bellows 73 can absorb external vibration energy due to its good ductility, thereby preventing the electrical insulating tube 72 from being damaged; furthermore, since the corrugated tube 73 is made of metal and the metal chamber is at high potential, in order to avoid dissociation of the transported dopant gas due to high pressure difference generated in the tube, as shown in the figure, the metal chamber 70 is further connected to a voltage dividing circuit 74, so that the corrugated tube 73 is electrically connected to the voltage dividing node of the voltage dividing circuit 74, and thus the potential of the corrugated tube 73 is lower than the potential of the metal chamber 70, thereby reducing the probability of forming a high pressure difference environment.

As can be seen from the above description, when the ion implanter uses a gas delivery device that remotely stores a bulk dopant gas source, external shock damage and high voltage dissociation problems must be considered.

Disclosure of Invention

In view of the safety concerns of the gas delivery device for the remote dopant gas source, it is a primary object of the present invention to provide a novel gas supply system for an ion implanter.

The main technical means used to achieve the above purpose is to make the air supply system include:

the metal chamber is electrically connected with the high potential of a high voltage source, a first pipeline and a second pipeline are arranged in the metal chamber, one end of the second pipeline is communicated with the first pipeline, and the other end of the second pipeline penetrates out of one outer side of the metal chamber;

a plurality of electrical insulators fixed at the bottom of the metal chamber and electrically connected with a low potential of a high voltage source;

an electrically insulating case suspended at the outer side of the metal chamber;

the hard insulating pipe fitting is vertically arranged in the electric insulating box and is provided with a first end and a second end, and the first end is connected with one end of the second pipeline penetrating out of the outer side of the metal chamber; and

one end of the flexible pipe penetrates into the electrical insulation box and is connected with the second end of the hard insulation pipe, and the other end of the flexible pipe is used for being connected to a large amount of doped gas storage chamber; wherein:

The product of the length of the electrical insulation box and the gas pressure in the box is larger than the maximum dissociation voltage difference between the joint of the first end of the hard insulation pipe and the second pipeline and the joint of the second end of the hard insulation pipe and the flexible pipe;

the product of the length of the hard insulating pipe and the gas pressure of the doping gas conveyed by the hard insulating pipe is larger than the maximum dissociation voltage difference between the joint of the first end of the hard insulating pipe and the second pipeline and the joint of the second end of the hard insulating pipe and the flexible pipe.

As can be seen from the above description, the gas supply system of the present invention mainly suspends the electrically insulating box on one side of the metal chamber, i.e. at a certain distance from the floor, and establishes a high voltage insulating environment without causing high voltage discharge. The product of the length of the high-pressure gas in the hard insulating pipe and the hard insulating pipe is designed to be larger than the maximum dissociation voltage difference, so that the metal chamber can be ensured to maintain a high-voltage operating environment; in addition, the design of hanging the electrical insulation box and the connection of the hard insulation pipe fitting with the flexible pipe fitting can both absorb the external vibration energy, thereby avoiding the damage of the hard insulation pipe fitting caused by vibration.

Drawings

Fig. 1 is a schematic configuration diagram of an air supply system according to a first embodiment of the present invention.

Fig. 2 is a schematic configuration diagram of an air supply system according to a second embodiment of the present invention.

Fig. 3 is a schematic configuration diagram of an air supply system according to a third embodiment of the present invention.

FIG. 4 is a Paschen graph of a dopant gas used in the gas supply system of the present invention.

FIG. 5 is a Paschen graph of an inert gas used in the gas supply system of the present invention.

FIG. 6 is a schematic diagram of a conventional gas delivery device.

Wherein, the reference numbers:

1 floor

10 Metal chamber

101 outside

102 bottom surface

11 first pipeline

12 second pipeline

13 air pressure monitoring and regulating valve

14 multi-way air valve

15 gas cylinder

20 an electrical insulator

30 electrical insulation box

31 gas cylinder

40 hard insulating pipe fitting

41 first end

42 second end

50 flexible pipe

60 third pipeline

61 vacuum pump

62 fourth pipeline

63 air valve

64 Inactive gas source

70 metal chamber

71 storage chamber for large amount of doping gas

72 electrical insulating tube

73 wave type tube

74 voltage dividing circuit

Detailed Description

The present invention provides a new gas supply system for an ion implanter, and the technical features of the present invention will be described in detail below with reference to the accompanying drawings.

Referring first to fig. 1, a first embodiment of the gas supply system according to the present invention comprises a metal chamber 10, a plurality of electrical insulators 20, an electrical insulation box 30, a rigid insulation tube 40, and a flexible tube 50.

The metal chamber 10 includes a first pipe 11 and a second pipe 12; wherein the first pipe 11 passes out of the outer side 101 of the metal chamber 10 for transporting a dopant gas of an ion implanter (not shown). One end of the second pipeline 12 is connected to the first pipeline 11, and the other end of the second pipeline passes through the outer side 101 of the metal chamber 10; in this embodiment, the second pipeline 12 is further connected in series with a gas pressure monitoring and regulating valve 13 for adjusting the gas pressure, for example, if the gas pressure delivered by the second pipeline 12 is 35psi, the gas pressure monitoring and regulating valve 13 will reduce the gas pressure in the second pipeline 12 to less than the atmospheric pressure ((<14.7psi) and then to the first pipe 11, and the gas pressure in the second pipe 12 is monitored at any time, and the pressure value S is monitored_pAnd transmitting to a remote console.

The electrical insulator 20 is disposed on the bottom surface 102 of the metal chamber 10, so that the bottom surface 102 of the metal chamber 10 is kept at a certain distance d1 from the floor 1; in the present embodiment, each of the electrically insulating members 20 can be an insulator, and the metal chamber 10 and the insulators are electrically connected to a high voltage source (e.g., 80KV) and a low voltage source (e.g., 80KV), respectively.

The electrically insulating box 30 is suspended at the outer side 101 of the metal chamber 10, and the second pipe 12 penetrates into the electrically insulating box 30; in the embodiment, the length of the electrical insulation box 30 is d3, and the first surface 31 of the electrical insulation box 30 closest to the floor 1 does not contact the floor 1.

The hard insulating tube 40 is vertically disposed in the electrical insulating box 30 and substantially parallel to the outer side 101 of the metal chamber 10, the length d2 of the hard insulating tube 40 includes a first end 41 and a second end 42, the first end 41 is connected to the second pipeline 12; in this embodiment, the material of the hard insulating tube 40 may be an electrically insulating hard material such as sapphire glass, ceramic, etc., or a plasticized material (e.g., polymers such as ethylene, benzene esters, thioethers, etc.).

One end of the flexible tube 50 penetrates the first surface 31 of the electrical insulation box 30 and is connected to the second end 42 of the hard insulation tube 40, and the other end is connected to the remote large amount doped gas storage chamber 71; in this embodiment, the flexible tube 50 can be made of metal, such as stainless steel or other metal flexible tubes; the flexible tube can penetrate into the lower part of the floor 1 and does not interfere with the electric insulation parts 20 or other devices on the floor 1. The dopant gas used in conjunction with the gas supply system of the present invention can be arsine, phosphine, boron trifluoride, carbon monoxide, germanium tetrafluoride, silicon tetrafluoride, fluorine phosphide, nitrogen trifluoride, germanium tetrahydride, or any of the previously disclosed dopant gases that can be mixed with a supplemental gas such as fluorine, carbon dioxide, hydrogen, nitrogen, or argon.

Furthermore, in order to prevent the hard insulating tube 40 from leaking the dopant gas to the electrical insulating box 30 and then leaking to the factory due to the rupture, the gas supply system further includes a vacuum pump 61 and a third pipeline 60 connected to the vacuum pump 61, the third pipeline 60 is connected to the electrical insulating box 30, the vacuum pump 61 vacuums the interior of the electrical insulating box 30 through the third pipeline 60, that is, a negative pressure environment is formed in the electrical insulating box 30, and the leaked dopant gas is timely exhausted through the third pipeline 60. Referring to fig. 2, another embodiment of the gas supply system according to the present invention provides another solution to the problem that the hard insulating tube 40 inadvertently leaks the dopant gas to the electrical insulating box 30 and then leaks to the factory, i.e. the electrical insulating box 30 is connected to a fourth pipeline 62, the fourth pipeline 62 is connected to a high-pressure inactive gas source 64 through a gas valve 63, once the gas valve 63 is opened, a high-pressure inactive gas is continuously introduced into the electrical insulating box 30, and the gas pressure of the inactive gas is constantly higher than the dopant gas pressure in the hard insulating tube 40. Therefore, when the hard insulating pipe 40 is broken, the pressure of the doped gas in the hard insulating pipe 40 is smaller than the pressure of the inactive gas in the electrical insulating box 30, so that the inactive gas can leak into the hard insulating pipe, the doped gas is prevented from leaking into the electrical insulating box, and the possibility of leaking to a factory is avoided. The inert gas may be N2, an inert gas source, or a combination thereof. In another possible implementation, the electrical insulating box 30 is filled with epoxy resin and covers the hard insulating tube 40; therefore, when the hard insulating tube 40 is broken, it can be coated with the epoxy resin without leaking out the dopant gas.

In addition, the present invention may further include a gas cylinder 15 storing dopant gas in the metal chamber 10, and the gas cylinder is connected to the first pipeline 11 through a gas valve 14, the gas valve 14 may be opened as needed, the dopant gas is provided from the gas cylinder 15 to the ion implanter through the first pipeline 11, the gas valve 14 may be closed, the dopant gas is still provided from the second pipeline 12 to the first pipeline 11, and the dopant gas is provided from the first pipeline 11 to the ion implanter.

Referring to fig. 3, a third embodiment of the gas supply apparatus according to the present invention is shown, which is substantially the same as the gas supply apparatus shown in fig. 1, but the electrically insulating box 30, the hard insulating tube 40 and the flexible tube 50 are disposed above the metal chamber 10; thus, the flexible tube 50 can be moved to the space above the factory building without interfering with the equipment on the floor 1 of the factory building.

As can be seen from the above description, the first end 41 of the hard insulating tube 40 in the air supply system of the present invention is connected to the second pipeline 12 and is accommodated in the electrically insulating box 30 suspended in the metal chamber, when the external vibration occurs, the electrically insulating box 30 and the hard insulating tube 40 synchronously shake with the metal chamber, and the second end 42 of the hard insulating tube 40 is connected to the flexible tube 50 and is not connected to a fixed object, so that the flexible tube 50 can absorb the vibration energy within a certain vibration. The flexible pipe 50 is a stainless steel pipe with a pipe diameter of 1/8 inches, the stainless steel pipe is wound at a fixed interval to form a spring shape, the spring-shaped stainless steel pipe forms a three-dimensional assembly, and when the three-dimensional direction changes, enough flexibility can be provided; therefore, when the shake causes severe shaking, the spring-like stainless steel tube can provide enough space for buffering, so that the hard insulating tube 40 is not broken by the force during shaking.

Furthermore, the gas supply system of the present invention also ensures that the dopant gas is not dissociated by high pressure in the rigid insulating tube 40 during the period of transporting the dopant gas to the high potential metal chamber, as shown in fig. 4, which is the paschen curve of 5 gases, where the function of the paschen curve is V ═ f (pd). Wherein V is the dissociation voltage for forming an arc or discharge between the two electrodes, p is the gas pressure, and d is the electrode distance. As can be seen from the graph of fig. 4, assuming that the pressure of the dopant gas to be delivered is a certain value, the different distances between the two electrodes can determine the dissociation voltage of the arc generated by the gas pressure, and the two electrodes of the present invention refer to the first end 41 and the second end 42 of the hard insulating tube 40; therefore, in order to avoid the doped gas in the hard insulating tube 40 from being dissociated by the arc formed by the high voltage, on the premise that the gas pressure delivered by the hard insulating tube 40 maintains a certain value, the length d2 of the hard insulating tube 40 is determined, and the product of the length and the gas pressure falls outside the product range of the gas pressure corresponding to the dissociable voltage and the electrode distance, that is, the product of the length d2 of the hard insulating tube 40 and the gas pressure of the doped gas delivered by the hard insulating tube 40 is greater than the maximum dissociation voltage difference between the connection between the first end 41 of the hard insulating tube 40 and the second pipe 12 and the connection between the second end 42 of the hard insulating tube 40 and the flexible tube 50, so as to ensure that the doped gas delivered by the hard insulating tube 40 is not dissociated by the high voltage.

In addition, paschen's law may also be used to adjust the gas pressure of the dopant gas delivered by the hard insulating tube 40, such that the product of the gas pressure and the electrode distance falls within the product range corresponding to the higher dissociation voltage, i.e. the product of the length of the hard insulating tube 40 and the pressure at which the hard insulating tube delivers the dopant gas is greater than the maximum dissociation voltage difference between the first end 41 of the hard insulating tube 40 and the second pipe 12 (metal) and the joint between the second end 42 of the hard insulating tube 40 and the flexible tube 50 (metal); furthermore, as shown in fig. 2, in the second embodiment of the gas supply system of the present invention, the insulating degree of the arc discharge path, which may be formed by high voltage applied to the electrically insulating box 30, is increased by evacuating the electrically insulating box 30, so that the dissociation voltage is much larger than the maximum dissociation voltage difference between the two ends of the insulating distance.

In addition, since the electrically insulating box 30 is also suspended outside the metal chamber 10 electrically connected to the high potential, the possibility of arcing in the electrically insulating box 30 is also considered, i.e. the product of the length d3 of the electrically insulating box 30 and the gas pressure inside the box is greater than the dissociation voltage difference between the connection between the first end 41 of the rigid insulating tube 40 and the second pipe 12 and the connection between the second end 42 of the rigid insulating tube 40 and the flexible tube 50; that is, as shown in FIG. 5, the product of the length d2 of the electrically insulating case 30 and the gas pressure inside the case falls outside the range of the product of the gas pressure corresponding to the dissociable voltage and the electrode distance to ensure the inert gas (nitrogen N) inside the electrically insulating case 30 ₂) Is not dissociated by high pressure.

In summary, the electrically insulating box of the gas supply system of the present invention is suspended at an outer side 101 of the metal chamber, the hard insulating tube 40 is disposed inside the electrically insulating box, one end of the hard insulating tube is connected to the second pipeline penetrating from the outer wall of the metal chamber, and the other end of the hard insulating tube is connected to the flexible tube 50 penetrating into the electrically insulating box. Because the electrical insulation box is hung at one side of the metal chamber, the gas in the hard insulation pipe 40 is prevented from being dissociated by the high pressure connected with the metal chamber, and the hard insulation pipe 40 is connected with the flexible pipe 50 to absorb the external vibration energy.

The present invention is capable of other embodiments, and various changes and modifications may be made by one skilled in the art without departing from the spirit and scope of the invention as defined in the appended claims.