阅读说明：本技术 一种刻蚀设备约束环的制造工艺 (Manufacturing process of etching equipment restraint ring ) 是由 李文明 郑广文 张少杰 于 2020-07-24 设计创作，主要内容包括：本发明是一种刻蚀设备约束环的制造工艺,其特征在于,集精密加工,精密清洗,硬质阳极,氧化钇涂层多种先进工艺于一体的关键零部件制造工艺；其中在零件的机械加工过程,精密加工采用精车环槽；环槽的尺寸外径直径为φ500mm圆,环槽宽度2.5±0.01mm,共有10组环槽,层层相连,形成约束环；环槽的精密加工使用刀具为名古屋刀具。本发明工艺的成功研发,使精密机械零部件的加工工艺,巧妙的车铣配合,精密的特殊刀具的设计,使本发明效率和加工质量得到提高。(The invention relates to a manufacturing process of a restraint ring of etching equipment, which is characterized by integrating various advanced processes of precision machining, precision cleaning, a hard anode and an yttrium oxide coating into a whole; in the mechanical processing process of the part, the precision processing adopts finish turning of a ring groove; the outer diameter of the ring groove is phi 500mm circle, the width of the ring groove is 2.5 +/-0.01 mm, and 10 groups of ring grooves are formed in total and connected layer by layer to form a binding ring; the cutter used for precisely machining the ring groove is a famous ancient house cutter. The successful research and development of the process of the invention leads the processing process of the precision mechanical parts, the ingenious turning and milling cooperation and the design of the precise special cutter to improve the efficiency and the processing quality of the invention.)

1. A manufacturing process of a restraint ring of etching equipment is characterized by integrating various advanced processes of precision machining, precision cleaning, hard anode and yttrium oxide coating into a whole;

in the mechanical processing process of the part, the precision processing adopts finish turning of a ring groove; the outer diameter of the ring groove is phi 500mm circle, the width of the ring groove is 2.5 +/-0.01 mm, and 10 groups of ring grooves are formed in total and connected layer by layer to form a binding ring; the cutter used for precisely machining the ring groove is a famous ancient house cutter.

2. The manufacturing process of the confinement ring of the etching equipment as recited in claim 1, wherein the specific requirements of the precise cleaning are as follows:

high-pressure cleaning at 40-60', 950 and 1050psi, transferring the mixture into a hundred-grade dust-free chamber for moisture preservation at 2-20', ultrasonically cleaning, vibrating at 15-20', and soaking at 90-95', 8-12W/in 2;

repeating the high-pressure cleaning of 40-60', 950 and 1050psi, the ultrasonic cleaning, the shaking of 15-20', the soaking of 60-75', 8-12W/in2 for twice cycles, and remarking: the water temperature is less than 50 ℃.

3. The process for manufacturing a confinement ring of an etching apparatus according to claim 1, wherein the hard anode process:

the current density is 2.5A/dm2, the rising flow is 20min, and the temperature is-1 ℃;

defatting at 10-30', 70-75 deg.C, washing with water at 60-90%, alkali-biting at 10-80%, 32-38 deg.C; 60-90% of alkaline water washing, 5-20% of acid washing, 60-90% of acid water washing, 60-90% of hard sun washing, 60-90% of water washing, 300 '-360', 92-99% of pure water hole sealing, 60-90% of water washing and CDA blow drying.

4. The process for manufacturing a confinement ring of an etching apparatus according to claim 1, wherein the yttrium oxide coating spraying process comprises:

sand blasting: 20# white corundum is used, the sand blasting pressure is 20-100PSI, the angle is 25 degrees, the nozzle is 5-10cm away from the workpiece, the moving speed is 3-7 cm/second, and the Ra is 200-;

the rotating speed of the yttrium oxide spraying rotating disc is 40-64r/min, and the spraying is carried out, so that the whole spraying is ensured to be 150-250 mu m.

Technical Field

The invention relates to a precision part of etching equipment, which is a key core part used for controlling the uniformity and the pressure level of plasma in dry etching equipment.

Background

The plasma formed by the interaction of the gas and the radio frequency power is controlled by the confinement rings to form a confined chamber region. The invention mainly introduces various manufacturing processes of mechanical processing, precise cleaning, hard anode, yttrium oxide spraying and the like of a restriction ring part.

Disclosure of Invention

The invention aims to provide a manufacturing process of a confinement ring of etching equipment.

The technical scheme adopted by the invention is as follows:

a manufacturing process of a restraint ring of etching equipment integrates multiple advanced processes of precision machining, precision cleaning, hard anode and yttrium oxide coating into a whole;

in the mechanical processing process of the part, the precision processing adopts finish turning of a ring groove; the outer diameter of the ring groove is phi 500mm circle, the width of the ring groove is 2.5 +/-0.01 mm, and 10 groups of ring grooves are formed in total and connected layer by layer to form a binding ring; the cutter used for precisely machining the ring groove is a famous ancient house cutter.

The specific requirements of precise cleaning are as follows:

high-pressure cleaning at 40-60', 950 and 1050psi, transferring the mixture into a hundred-grade dust-free chamber for moisture preservation at 2-20', ultrasonically cleaning, vibrating at 15-20', and soaking at 90-95', 8-12W/in 2;

repeating the high-pressure cleaning of 40-60', 950 and 1050psi, the ultrasonic cleaning, the shaking of 15-20', the soaking of 60-75', 8-12W/in2 for twice cycles, and remarking: the water temperature is less than 50 ℃.

The hard anode process comprises the following steps:

the current density is 2.5A/dm2, the rising flow is 20min, and the temperature is-1 ℃;

defatting at 10-30', 70-75 deg.C, washing with water at 60-90%, alkali-biting at 10-80%, 32-38 deg.C; 60-90% of alkaline water washing, 5-20% of acid washing, 60-90% of acid water washing, 60-90% of hard sun washing, 60-90% of water washing, 300 '-360', 92-99% of pure water hole sealing, 60-90% of water washing and CDA blow drying.

The spraying process of the yttrium oxide coating comprises the following steps:

sand blasting: 20# white corundum is used, the sand blasting pressure is 20-100PSI, the angle is 25 degrees, the nozzle is 5-10cm away from the workpiece, the moving speed is 3-7 cm/second, and the Ra is 200-;

the rotating speed of the yttrium oxide spraying rotating disc is 40-64r/min, and the spraying is carried out, so that the whole spraying is ensured to be 150-250 mu m.

The invention has the beneficial effects that:

1. the successful research and development of the process of the invention leads the processing process of the precision mechanical parts, the ingenious turning and milling cooperation and the design of the precise special cutter to improve the efficiency and the processing quality of the invention.

2. The process is successfully researched and developed, and various technologies such as precision cleaning, hard anode, yttrium oxide spraying and the like are applied to the same precision machining part, so that the complex surface treatment of the precision part is realized.

Detailed Description

The invention relates to a precision part of etching equipment, which is a key part integrating various advanced processes such as precision machining, precision cleaning, hard anode, yttrium oxide coating and the like, wherein in the mechanical machining process of parts, the main machining processes comprise rough turning, milling and finish turning of ring grooves. The external diameter of the ring groove is phi 500mm circle, the width of the ring groove is 2.5 +/-0.01 mm, and 10 groups of ring grooves are formed in total and connected layer by layer to form a binding ring. The cutter is used for the precision finishing of the ring groove and is a special customized cutter for the famous and ancient houses.

The precise cleaning method comprises the following specific requirements: high pressure cleaning (40',40-60', 950) 1050psi), moisture retention and transferring into a hundred-grade dust-free chamber (10', 2-20'); ultrasonic cleaning (shaking 15-20', soaking 90-95', 8-12W/in2) -E2 high-pressure cleaning (40',40-60', 950 and 1050 psi); ultrasonic cleaning (shaking 15-20', soaking 60-75', 8-12W/in2 cycle twice) for remarks: the water temperature should not exceed 50 deg.C

The hard anode process comprises the following steps: the current density is 2.5A/dm 2; rising flow for 20 min; the temperature is 0 ℃ (-1 ℃); defatting (20',10-30', 70 ℃, 70-75 ℃); water washing (60 ', 60-90'); alkali bite (50",10-80", 35 ℃, 32-38 ℃); alkali water washing (60 ', 60-90'); acid washing (5 ', 5-20'); acid water washing (60 ', 60-90'); hard sun (time based on actual film thickness) -A18 water washing (60 ', 60-90'); sealing with pure water (300 ', 300 ' -360 ', 92-99 ℃); water wash (60",60-90") -CDA blow dry

And (3) yttrium oxide spraying process: sand blasting: 20# white corundum (AL2O3) is used, the sand blasting pressure is 20-100PSI, the angle is 25 degrees, the nozzle is 5-10cm away from the workpiece, the moving speed is 3-7 cm/second, and the Ra is 200-.

The rotating speed of the yttrium oxide spraying turntable is 40-64r/min, and a corresponding programming route is selected for spraying. Ensuring the whole is 150-250 um.

The shielding is performed by silica gel, so that the leakage caused by shielding of a shielding adhesive tape or an aluminum foil is avoided. ICPMS test and PC test, the part passes through the test, satisfies customer's drawing requirement, and is not fluorescent.