阅读说明：本技术 基板处理装置和清洁方法 (Substrate processing apparatus and cleaning method ) 是由 菱屋晋吾 孙成德 于 2021-03-10 设计创作，主要内容包括：本发明涉及基板处理装置和清洁方法。提供一种能够选择性地清洁喷射器的内部的技术。本公开的一个方式的基板处理装置具有：处理容器,其容纳基板；喷射器,其包括第1连接口和第2连接口,内部与所述处理容器内连通；排气管,其供所述处理容器内排气；原料气体导入管,其与所述第1连接口连接,向所述喷射器内导入原料气体；清洁气体导入管,其经由所述第1连接口和所述第2连接口中的一者向所述喷射器内导入清洁气体；以及通气管,其连接所述第1连接口和所述第2连接口中的另一者与所述排气管,供所述喷射器内排气。(The invention relates to a substrate processing apparatus and a cleaning method. Provided is a technique capable of selectively cleaning the inside of an injector. A substrate processing apparatus according to an embodiment of the present disclosure includes: a processing container for accommodating a substrate; an ejector including a 1 st connection port and a 2 nd connection port, the ejector being internally communicated with the inside of the processing container; an exhaust pipe for exhausting the inside of the processing container; a raw material gas introduction pipe connected to the 1 st connection port for introducing a raw material gas into the injector; a clean gas introduction pipe that introduces a clean gas into the ejector through one of the 1 st connection port and the 2 nd connection port; and a breather pipe that connects the exhaust pipe and the other of the 1 st connection port and the 2 nd connection port, and that allows the inside of the injector to exhaust air.)

1. A substrate processing apparatus, wherein,

the substrate processing apparatus includes:

a processing container for accommodating a substrate;

an ejector including a 1 st connection port and a 2 nd connection port, the ejector being internally communicated with the inside of the processing container;

an exhaust pipe for exhausting the inside of the processing container;

a raw material gas introduction pipe connected to the 1 st connection port for introducing a raw material gas into the injector;

a clean gas introduction pipe that introduces a clean gas into the ejector through one of the 1 st connection port and the 2 nd connection port; and

and a breather pipe that connects the exhaust pipe and the other of the 1 st connection port and the 2 nd connection port, and that allows the inside of the injector to exhaust air.

2. The substrate processing apparatus according to claim 1,

the clean gas introduction pipe is configured to introduce the clean gas into the ejector through the 1 st connection port,

the breather pipe is connected with the No. 2 connecting port.

3. The substrate processing apparatus according to claim 1,

the clean gas introduction pipe is configured to introduce the clean gas into the ejector through the 2 nd connection port,

the breather pipe is connected with the 1 st connecting port.

4. The substrate processing apparatus according to any one of claims 1 to 3,

the injector includes a plurality of gas ejection holes communicating with the inside of the processing container.

5. The substrate processing apparatus according to any one of claims 1 to 4,

the substrate processing apparatus is configured to introduce a dilution gas into the cleaning gas introduction pipe.

6. The substrate processing apparatus according to any one of claims 1 to 5,

the processing vessel has an elongated substantially cylindrical shape,

the ejector has:

a 1 st gas pipe including the 1 st connection port, the 1 st gas pipe being provided in the processing chamber along a longitudinal direction of the processing chamber and having a plurality of gas ejection holes formed along the longitudinal direction;

a 2 nd gas pipe including the 2 nd connection port, the 2 nd gas pipe being provided in the processing container along a longitudinal direction of the processing container; and

and a connection pipe for connecting the 1 st gas pipe and the 2 nd gas pipe.

7. The substrate processing apparatus according to claim 6,

the substrate processing apparatus further includes:

a 1 st valve provided in the clean gas introduction pipe;

the 2 nd valve is arranged on the vent pipe; and

a control unit for controlling opening and closing of the 1 st valve and the 2 nd valve,

the control unit is configured to: the 1 st valve and the 2 nd valve are controlled such that the 1 st valve is opened after the 2 nd valve is opened in a case where clean gas is introduced into the ejector.

8. The substrate processing apparatus according to claim 7,

the substrate processing apparatus further comprises a 3 rd valve provided in the exhaust pipe,

the control unit is configured to: controlling the 1 st valve, the 2 nd valve, and the 3 rd valve in such a manner that the 1 st valve and the 2 nd valve are opened in a state where the 3 rd valve is closed.

9. A cleaning method for cleaning an injector for supplying a source gas into a process container,

the cleaning method sequentially comprises the following steps:

exhausting the inside of the ejector from one end thereof without introducing a cleaning gas into the ejector; and

and introducing a cleaning gas into the ejector from the other end of the ejector while exhausting gas from the ejector from the one end.

Technical Field

The present disclosure relates to a substrate processing apparatus and a cleaning method.

Background

In a semiconductor manufacturing process, for example, the following substrate processing apparatus is used: the substrate processing apparatus includes a processing container for accommodating a plurality of substrates, an injector for supplying a gas into the processing container, and a flow rate controller for controlling a flow rate of the gas, and performs a film formation process on the plurality of substrates in batch by an ALD method. In such a substrate processing apparatus, in order to prevent particles from being taken into the processing chamber due to by-products and the like adhering to the inside of the injector, a method of providing a purge line for purging the inside of the injector is known (for example, see patent document 1).

Documents of the prior art

Patent document

Patent document 1: japanese patent laid-open publication No. 2018-85393

Disclosure of Invention

Problems to be solved by the invention

The present disclosure provides a technique capable of selectively cleaning the inside of an injector.

Means for solving the problems

The substrate processing apparatus according to an aspect of the present disclosure includes: a processing container for accommodating a substrate; an ejector including a 1 st connection port and a 2 nd connection port, the ejector being internally communicated with the inside of the processing container; an exhaust pipe for exhausting the inside of the processing container; a raw material gas introduction pipe connected to the 1 st connection port for introducing a raw material gas into the injector; a clean gas introduction pipe that introduces a clean gas into the ejector through one of the 1 st connection port and the 2 nd connection port; and a breather pipe that connects the exhaust pipe and the other of the 1 st connection port and the 2 nd connection port, and that allows the inside of the injector to exhaust air.

ADVANTAGEOUS EFFECTS OF INVENTION

According to the present disclosure, the interior of the injector can be selectively cleaned.

Drawings

Fig. 1 is a diagram showing a configuration example of a substrate processing apparatus according to embodiment 1.

Fig. 2 is a perspective view showing an example of an injector of the substrate processing apparatus of fig. 1.

Fig. 3 is a flowchart illustrating an example of the operation of the substrate processing apparatus of fig. 1.

Fig. 4 is a flowchart showing an example of the injector cleaning process.

Fig. 5 is a schematic view showing an example of the substrate processing apparatus according to embodiment 2.

Detailed Description

Non-limiting exemplary embodiments of the present disclosure are described below with reference to the accompanying drawings. In all the drawings, the same or corresponding members or components are denoted by the same or corresponding reference numerals, and overlapping description is omitted.

[ embodiment 1 ]

(substrate processing apparatus)

A substrate processing apparatus according to embodiment 1 will be described with reference to fig. 1 and 2. Fig. 1 is a diagram showing a configuration example of a substrate processing apparatus according to embodiment 1.

The substrate processing apparatus 1 includes: a processing section 10, a gas introduction section 20, a gas discharge section 30, a heating section 40, and a control section 90.

The processing unit 10 includes: a process vessel 11, injectors 12, 13, a vent 14, and a shield 15.

The processing container 11 is formed to be long and accommodates the boat WB therein. The processing container 11 has a generally cylindrical shape with a ceiling open at the lower end. The processing container 11 may have a single-tube structure or a double-tube structure. The processing container 11 includes a reaction tube made of a heat-resistant material such as quartz, and a manifold made of stainless steel provided at the lower end of the reaction tube.

The wafer boat WB holds a plurality of semiconductor wafers (hereinafter referred to as "wafers W") in a rack shape with a predetermined interval in the vertical direction. The boat WB is placed on the lid CP and is lifted and lowered together with the lid CP by a lifting mechanism (not shown). The boat WB is moved upward and is loaded into the processing container 11, and the opening at the lower end of the processing container 11 is hermetically closed by the lid CP. On the other hand, the boat WB is fed out from the processing container 11 by moving downward, and the opening at the lower end of the processing container 11 is opened. In addition, the boat WB can freely rotate. Fig. 1 shows a state where the boat WB is being carried out from the processing container 11.

The injector 12 is provided through the processing container 11. The ejector 12 includes: a raw material gas supply pipe 121, a diluent gas supply pipe 122, a connection pipe 123, and a gas ejection hole 124.

The source gas supply pipe 121 is provided along the longitudinal direction of the processing chamber 11 in the processing chamber 11, and the lower end of the source gas supply pipe 121 is bent in an L shape and supported so as to penetrate through the processing chamber 11. A source gas introduction pipe 21b described later is connected to a connection port 121a of the source gas supply pipe 121 provided outside the processing chamber 11. The raw material gas, the purge gas, and the purge gas are introduced into the raw material gas supply pipe 121 through the raw material gas introduction pipe 21 b. The raw material gas supply pipe 121 has a plurality of gas ejection holes 124 formed at predetermined intervals along the longitudinal direction thereof. The gas ejection holes 124 eject the raw material gas, the cleaning gas, and the purge gas in a horizontal direction. Thereby, the source gas, the cleaning gas, and the purge gas are supplied substantially parallel to the main surface of the wafer W. The predetermined interval is set to be the same as the interval of the wafers W supported by the boat WB, for example. The position in the height direction is set such that the gas ejection hole 124 is located at the middle between the vertically adjacent wafers W. This enables the raw material gas, the cleaning gas, and the purge gas to be efficiently supplied to the space between the wafers W.

The diluent gas supply pipe 122 is provided along the longitudinal direction of the processing chamber 11 in the processing chamber 11, and the lower end of the diluent gas supply pipe 122 is bent in an L shape and supported so as to penetrate the processing chamber 11. A diluent gas introduction pipe 23b described later is connected to a connection port 122a of the diluent gas supply pipe 122 provided outside the processing chamber 11. The diluent gas is introduced into the diluent gas supply pipe 122 through the diluent gas introduction pipe 23 b. The diluent gas supply pipe 122 supplies a diluent gas to the raw material gas supply pipe 121 via the connection pipe 123.

The connection pipe 123 is a tubular member that connects the upper portion of the raw material gas supply pipe 121 and the upper portion of the diluent gas supply pipe 122, and communicates the inside of the raw material gas supply pipe 121 and the inside of the diluent gas supply pipe 122. In the present embodiment, the raw material gas supply pipe 121 and the diluent gas supply pipe 122 are connected by 1 connecting pipe 123, but the raw material gas supply pipe 121 and the diluent gas supply pipe 122 may be connected by two or more connecting pipes 123.

The injector 13 is provided through the processing container 11. The injector 13 includes a reaction gas supply pipe 131 and a gas ejection hole 132.

The reaction gas supply pipe 131 is provided along the longitudinal direction of the processing chamber 11 in the processing chamber 11, and the lower end of the reaction gas supply pipe 131 is bent in an L shape and supported so as to penetrate the processing chamber 11. A reaction gas introduction pipe 24b described later is connected to a connection port 131a of the reaction gas supply pipe 131 provided outside the processing chamber 11. The reaction gas supply pipe 131 is supplied with the reaction gas and the purge gas through the reaction gas supply pipe 24 b. The reaction gas supply pipe 131 has a plurality of gas ejection holes 132 formed at predetermined intervals along the longitudinal direction thereof. The gas ejection holes 132 eject the reaction gas and the purge gas in a horizontal direction. Thus, the reaction gas and the purge gas are supplied substantially parallel to the main surface of the wafer W. The predetermined interval is set to be the same as the interval of the wafers W supported by the boat WB, for example. The position in the height direction is set such that the gas ejection hole 132 is located at the middle between the vertically adjacent wafers W. This enables the reaction gas and the purge gas to be efficiently supplied to the space between the wafers W.

The exhaust port 14 is provided in a lower side wall of the processing container 11. The exhaust port 14 is configured to be able to exhaust gas in the processing chamber 11.

The shield 15 has a substantially disk shape larger than the opening at the lower end of the processing container 11. The shutter 15 is configured to be movable in the horizontal direction between a position where the opening at the lower end of the processing container 11 is hermetically closed and a position where the opening at the lower end of the processing container 11 is opened. The shield 15 airtightly closes the opening at the lower end of the processing container 11 when the boat WB is fed out from the processing container 11, for example. Fig. 1 shows a case where the shutter 15 is located at a position where the opening at the lower end of the processing container 11 is opened.

The gas introduction portion 20 includes: a raw material gas introduction part 21, a clean gas introduction part 22, a diluent gas introduction part 23, a reaction gas introduction part 24, a 1 st ventilation part 25, and a 2 nd ventilation part 26. The gas introducing portion 20 may further include a gas introducing portion for introducing another gas.

The raw material gas introduction unit 21 introduces the raw material gas into the injector 12 through a connection port 121a at one end of the injector 12. The raw material gas introducing portion 21 includes a raw material gas source 21a, a raw material gas introducing pipe 21b, and a valve 21 c.

The source gas source 21a supplies a source gas to the source gas introduction pipe 21 b. The source gas source 21a may include a flow rate controller for controlling the flow rate of the source gas supplied to the source gas introduction pipe 21b, a storage unit (buffer tank) for temporarily storing and pressurizing the source gas, and the like.

The raw material gas introduction pipe 21b has one end connected to the raw material gas source 21a and the other end connected to the connection port 121a of the raw material gas supply pipe 121. The source gas introduction pipe 21b introduces the source gas supplied from the source gas source 21a into the source gas supply pipe 121. The source gas is, for example, a gas used for film formation by an Atomic Layer Deposition (ALD) method or a Chemical Vapor Deposition (CVD) method. Examples of the source gas include a silicon source gas and a metal source gas. The source gas is supplied into the processing chamber 11 heated to a temperature equal to or higher than the thermal decomposition temperature, for example, through the source gas supply pipe 121.

The valve 21c is provided in the raw material gas introduction pipe 21b, and opens and closes a passage of the fluid in the raw material gas introduction pipe 21 b. In the present embodiment, 1 valve 21c is provided in the raw material gas introduction pipe 21b, but two or more valves 21c may be provided.

The cleaning gas introduction portion 22 introduces cleaning gas into the injector 12 through a connection port 121a at one end of the injector 12. The purge gas introduction part 22 includes a purge gas source 22a, a purge gas introduction pipe 22b, and a valve 22 c.

The cleaning gas source 22a supplies a cleaning gas and a purge gas to the cleaning gas introduction pipe 22 b. The purge gas source 22a may include a flow rate controller or the like for controlling the flow rates of the purge gas and the purge gas supplied to the purge gas introduction pipe 22 b.

The purge gas introduction pipe 22b has one end connected to the purge gas source 22a and the other end connected to the raw material gas introduction pipe 21 b. The purge gas introduction pipe 22b introduces the purge gas and the purge gas supplied from the purge gas source 22a into the source gas supply pipe 121 through the source gas introduction pipe 21 b. The cleaning gas is used for removing deposits accumulated in the processing container 11, the injector 12, and the like, and is selected according to the type of the source gas. Examples of the cleaning gas include gases containing halogen such as fluorine, chlorine, and bromine. The purge gas is used to replace the gas remaining in the process container 11, the injector 12, and the like. As an example of the purge gas, nitrogen (N) gas is exemplified₂) And inert gases such as argon (Ar).

The valve 22c is provided in the clean gas introduction pipe 22b, and opens and closes a passage of the fluid in the clean gas introduction pipe 22 b. In the present embodiment, 1 valve 22c is provided in the clean gas introduction pipe 22b, but two or more valves 22c may be provided.

The diluent gas introduction portion 23 introduces the diluent gas into the injector 12 through a connection port 122a at the other end of the injector 12. The diluent gas introducing portion 23 includes a diluent gas source 23a, a diluent gas introducing pipe 23b, and a valve 23 c.

The diluent gas source 23a supplies diluent gas to the diluent gas introduction pipe 23 b. The diluent gas source 23a may include a flow rate controller or the like for controlling the flow rate of the diluent gas supplied to the diluent gas introduction pipe 23 b.

The diluent gas inlet pipe 23b has one end connected to the diluent gas source 23a and the other end connected to the connection port 122a of the diluent gas supply pipe 122. The diluent gas introduction pipe 23b introduces the diluent gas supplied from the diluent gas source 23a into the diluent gas supply pipe 122. The diluent gas is used to dilute the raw material gas. As an example of the diluent gas, N is mentioned₂Inert gas such as gas, Ar gas, etc., hydrogen gas (H)₂) And the like.

The valve 23c is provided in the diluent gas introduction pipe 23b, and opens and closes a passage of the fluid in the diluent gas introduction pipe 23 b. In the present embodiment, 1 valve 23c is provided in the diluent gas introduction pipe 23b, but two or more valves 23c may be provided.

The reaction gas introduction part 24 includes a reaction gas source 24a, a reaction gas introduction pipe 24b, and a valve 24 c.

The reaction gas source 24a supplies a reaction gas and a purge gas to the reaction gas introduction pipe 24 b. The reaction gas source 24a may include a flow rate controller or the like for controlling the flow rates of the reaction gas and the purge gas supplied to the reaction gas introduction pipe 24 b.

The reaction gas introduction pipe 24b has one end connected to the reaction gas source 24a and the other end connected to a connection port 131a of the reaction gas supply pipe 131. The reaction gas introduction pipe 24b introduces the reaction gas and the purge gas supplied from the reaction gas source 24a into the injector 13. The reaction gas is a gas that reacts with the raw material gas to oxidize or nitrify the raw material. Examples of the reaction gas include an oxidizing gas and a nitriding gas. As an example of the purge gas, N is mentioned₂Inert gases such as gas and Ar gas.

The valve 24c is provided in the reaction gas introduction pipe 24b, and opens and closes a passage of the fluid in the reaction gas introduction pipe 24 b. In the present embodiment, 1 valve 24c is provided in the reaction gas introduction pipe 24b, but two or more valves 24c may be provided.

The 1 st ventilation part 25 includes a ventilation pipe 25b and a valve 25 c. The vent pipe 25b connects the raw material gas introduction pipe 21b and an exhaust pipe 31 described later. The valve 25c is provided in the vent pipe 25b and controls the communication state between the raw material gas introduction pipe 21b and the exhaust pipe 31. That is, when the valve 25c is opened, the raw material gas introduction pipe 21b communicates with the exhaust pipe 31, and when the valve 25c is closed, the raw material gas introduction pipe 21b is blocked from communicating with the exhaust pipe 31. In the present embodiment, the vent pipe 25b is provided with 1 valve 25c, but two or more valves 25c may be provided.

The 2 nd vent 26 includes a vent tube 26b and a valve 26 c. The vent pipe 26b connects the diluent gas introduction pipe 23b and an exhaust pipe 31 described later. The valve 26c is provided in the vent pipe 26b and controls the communication state between the diluent gas introduction pipe 23b and the exhaust pipe 31. That is, when the valve 26c is opened, the diluent gas introduction pipe 23b communicates with the exhaust pipe 31, and when the valve 26c is closed, the communication of the diluent gas introduction pipe 23b with the exhaust pipe 31 is blocked. In the present embodiment, the vent pipe 26b is provided with 1 valve 26c, but two or more valves 26c may be provided.

The gas discharge unit 30 includes an exhaust pipe 31, a pressure regulating valve 32, and a vacuum pump 33. One end of the exhaust pipe 31 is connected to the exhaust port 14, and the other end is connected to a vacuum pump 33. The pressure regulating valve 32 is provided in the exhaust pipe 31, and regulates the pressure in the processing container 11 by regulating the conductance of the exhaust pipe 31. The vacuum pump 33 exhausts the inside of the processing container 11 through the exhaust pipe 31. The vacuum pump 33 includes, for example, a mechanical booster pump and a dry pump.

The heating unit 40 has a substantially cylindrical shape and is provided so as to cover the processing container 11 around the processing container 11. The heating unit 40 includes, for example, a heating element and a heat insulator, and heats the wafer W accommodated in the processing container 11 by the heat generated by the heating element.

The control unit 90 controls the overall operation of the substrate processing apparatus 1. The control unit 90 may be a computer, for example. A program of a computer that performs the entire operation of the substrate processing apparatus 1 is stored in a storage medium (not shown). The storage medium may be, for example, a floppy disk, an optical disk, a hard disk, a flash memory, a DVD, etc.

(operation of substrate processing apparatus)

An example of the operation of the substrate processing apparatus 1 will be described with reference to fig. 3. Fig. 3 is a flowchart showing an example of the operation of the substrate processing apparatus 1 shown in fig. 1. In the initial state, the pressure regulating valve 32 and the valves 21c to 26c of the substrate processing apparatus 1 are closed.

First, the control unit 90 controls the operations of the respective units of the substrate processing apparatus 1 to execute the film formation process (step S1). In the present embodiment, the controller 90 controls the elevating mechanism to feed the boat WB holding a plurality of wafers W into the processing container 11. Next, the controller 90 controls the pressure regulating valve 32 to regulate the pressure in the processing container 11 to a predetermined pressure, and controls the heating unit 40 to heat the wafer W to a predetermined temperature. Then, the controller 90 controls the opening and closing of the valves 21c, 23c, and 24c to supply the source gas, the diluent gas, and the reactive gas into the processing container 11, thereby forming a predetermined film on the wafer W. Next, the controller 90 returns the inside of the processing container 11 to the atmospheric pressure, and controls the elevating mechanism to feed the boat WB out of the processing container 11.

Next, the control portion 90 determines whether or not cleaning of the injector 12 is required (step S2). In the present embodiment, the control unit 90 determines that cleaning of the injector 12 is necessary when the execution time of the film formation process exceeds a predetermined time, and determines that cleaning of the injector 12 is unnecessary when the execution time of the film formation process does not exceed the predetermined time. If it is determined that the injector 12 is not required to be cleaned, the control unit 90 returns the process to step S1. That is, the control unit 90 continues the film formation process without performing the cleaning process of the injector 12. On the other hand, when determining that the injector 12 needs to be cleaned, the control unit 90 executes the cleaning process for the injector 12 (step S3) and ends the process.

An example of the cleaning process (cleaning method) of the ejector 12 will be described with reference to fig. 4. Fig. 4 is a flowchart showing an example of the cleaning process of the injector 12.

First, the control unit 90 depressurizes the inside of the processing container 11 (step S31). In the present embodiment, the controller 90 controls the shutter 15 to hermetically close the opening at the lower end of the processing container 11 with the shutter 15. Next, the controller 90 opens the pressure regulating valve 32 to communicate the inside of the processing container 11 with the vacuum pump 33 through the exhaust pipe 31, and exhausts the inside of the processing container 11 to reduce the pressure. After the processing container 11 reaches a predetermined vacuum level, the controller 90 closes the pressure regulating valve 32.

Next, the control unit 90 depressurizes the inside of the injector 12 (step S32). In the present embodiment, the controller 90 opens the valve 26c to communicate the inside of the diluent gas supply pipe 122 of the ejector 12 with the vacuum pump 33 through the vent pipe 26b, and exhausts the inside of the diluent gas supply pipe 122 to reduce the pressure.

Next, the control unit 90 introduces the purge gas into the injector 12 (step S33). In the present embodiment, the controller 90 opens the valve 22c to introduce the purge gas from the purge gas source 22a into the source gas supply pipe 121. At this time, the inside of the diluent gas supply pipe 122 is depressurized. Therefore, the proportion of the purge gas ejected into the processing chamber 11 through the gas ejection holes 124 is reduced, and the proportion of the purge gas flowing through the diluent gas supply pipe 122 and the vent pipe 26b and discharged by the vacuum pump 33 is increased. That is, the purge gas introduced into the source gas supply pipe 121 selectively flows through the diluent gas supply pipe 122 and the vent pipe 26 b. As a result, the inside of the ejector 12 can be selectively cleaned. In step S33, the controller 90 preferably opens the valve 24c to supply the purge gas from the injector 13 into the process container 11. Accordingly, even when the cleaning gas is ejected into the process container 11 through the gas ejection holes 124 of the injector 12, the purge gas is filled in the process container 11, and therefore, the cleaning of the inside of the process container 11 by the cleaning gas can be suppressed. After a predetermined time has elapsed, the controller 90 closes the valve 22c to stop the introduction of the purge gas into the source gas supply pipe 121. The predetermined time may be, for example, a time required to remove all deposits in the raw material gas supply pipe 121 and the diluent gas supply pipe 122.

Next, the controller 90 replaces the inside of the injector 12 with the purge gas (step S34). In the present embodiment, the controller 90 opens the valve 22c to introduce the purge gas into the source gas supply pipe 121. At this time, the inside of the diluent gas supply pipe 122 is depressurized. Therefore, the proportion of the purge gas ejected into the process container 11 through the gas ejection holes 124 is reduced, and the proportion of the purge gas flowing through the diluent gas supply pipe 122 and the vent pipe 26b and discharged by the vacuum pump 33 is increased. That is, the purge gas introduced into the source gas supply pipe 121 selectively flows through the diluent gas supply pipe 122 and the vent pipe 26 b. This enables the vacuum pump 33 to efficiently discharge the cleaning residues in the raw material gas supply pipe 121 and the diluent gas supply pipe 122. After a predetermined time has elapsed, the controller 90 closes the valve 22c to stop the introduction of the purge gas into the source gas supply pipe 121. Further, the control unit 90 closes the valve 26c, and ends the process.

As described above, according to the substrate processing apparatus 1 of embodiment 1, the raw material gas introduction pipe 21b and the clean gas introduction pipe 22b are connected to one end of the injector 12, and the vent pipe 26b is connected to the other end. Thereby, the raw material gas and the clean gas can be introduced from the connection port 121a at one end of the injector 12, and the gas in the injector 12 can be discharged from the connection port 122a at the other end of the injector 12. Therefore, the inside of the injector 12 can be selectively cleaned with respect to the inside of the processing container 11.

Further, the substrate processing apparatus 1 according to embodiment 1 includes the shutter 15 that hermetically closes the opening at the lower end of the processing container 11 when the boat WB is fed out from the processing container 11. Thus, while the boat WB holding the wafers W after the film formation process is being carried out from the process container 11 and cooled (cooled), the inside of the ejector 12 can be cleaned. Therefore, the wafer cooling time can be effectively utilized, and the productivity can be improved.

[ 2 nd embodiment ]

(substrate processing apparatus)

The substrate processing apparatus according to embodiment 2 will be described with reference to fig. 5. Fig. 5 is a diagram showing a configuration example of the substrate processing apparatus according to embodiment 2.

The substrate processing apparatus 1A according to embodiment 2 is different from the substrate processing apparatus 1 according to embodiment 1 in that the cleaning gas introduction unit 22 is configured to introduce the cleaning gas into the injector 12 through the connection port 122a at the other end of the injector 12. Hereinafter, the following description will be focused on differences from the substrate processing apparatus 1 according to embodiment 1.

The substrate processing apparatus 1A includes: a processing section 10, a gas introduction section 20A, a gas discharge section 30, a heating section 40, and a control section 90.

The gas introduction portion 20A includes: a raw material gas introduction part 21, a clean gas introduction part 22, a diluent gas introduction part 23, a reaction gas introduction part 24, a 1 st ventilation part 25, a 2 nd ventilation part 26, and a purge gas introduction part 27. The gas introducing portion 20A may further include a gas introducing portion for introducing another gas.

The cleaning gas introduction portion 22 introduces cleaning gas into the injector 12 through a connection port 122a at the other end of the injector 12. The purge gas introduction part 22 includes a purge gas source 22a, a purge gas introduction pipe 22b, and a valve 22 c.

The cleaning gas source 22a supplies a cleaning gas and a purge gas to the cleaning gas introduction pipe 22 b. The purge gas source 22a may include a flow rate controller or the like for controlling the flow rates of the purge gas and the purge gas supplied to the purge gas introduction pipe 22 b.

The purge gas introduction pipe 22b has one end connected to the purge gas source 22a and the other end connected to the connection port 122a of the dilution gas supply pipe 122. The purge gas introduction pipe 22b introduces the purge gas and the purge gas supplied from the purge gas source 22a into the diluent gas supply pipe 122.

The valve 22c is provided in the clean gas introduction pipe 22b, and opens and closes a passage of the fluid in the clean gas introduction pipe 22 b. In the present embodiment, 1 valve 22c is provided in the clean gas introduction pipe 22b, but two or more valves 22c may be provided.

The diluent gas introduction portion 23 introduces the diluent gas into the injector 12 through a connection port 122a at the other end of the injector 12. The diluent gas introducing portion 23 includes a diluent gas source 23a, a diluent gas introducing pipe 23b, and a valve 23 c.

The diluent gas source 23a supplies diluent gas to the diluent gas introduction pipe 23 b. The diluent gas source 23a may include a flow rate controller or the like for controlling the flow rate of the diluent gas supplied to the diluent gas introduction pipe 23 b.

The diluent gas inlet pipe 23b has one end connected to the diluent gas source 23a and the other end connected to the cleaning gas inlet pipe 22 b. The diluent gas introduction pipe 23b introduces the diluent gas supplied from the diluent gas source 23a into the diluent gas supply pipe 122 through the clean gas introduction pipe 22 b.

The valve 23c is provided in the diluent gas introduction pipe 23b, and opens and closes a passage of the fluid in the diluent gas introduction pipe 23 b. In the present embodiment, 1 valve 23c is provided in the diluent gas introduction pipe 23b, but two or more valves 23c may be provided.

The purge gas introduction portion 27 introduces purge gas into the injector 12 through a connection port 121a at one end of the injector 12. The purge gas introduction portion 27 includes a purge gas source 27a, a purge gas introduction pipe 27b, and a valve 27 c.

The purge gas source 27a supplies purge gas to the purge gas introduction pipe 27 b. The purge gas source 27a may include a flow rate controller or the like for controlling the flow rate of the purge gas supplied to the purge gas introduction pipe 27 b.

The purge gas introduction pipe 27b has one end connected to the purge gas source 27a and the other end connected to the raw material gas introduction pipe 21 b. The purge gas introduction pipe 27b introduces the purge gas supplied from the purge gas source 27a into the raw material gas supply pipe 121 through the raw material gas introduction pipe 21 b. The purge gas is used to replace the gas remaining in the process container 11, the injector 12, and the like. As an example of the purge gas, N is mentioned₂Inert gases such as gas and Ar gas.

The valve 27c is provided in the purge gas introduction pipe 27b, and opens and closes a passage of the fluid in the purge gas introduction pipe 27 b. In the present embodiment, 1 valve 27c is provided in the purge gas introduction pipe 27b, but two or more valves 27c may be provided.

(operation of substrate processing apparatus)

An example of the operation of the substrate processing apparatus 1A will be described with reference to fig. 3. In the initial state, the pressure regulating valve 32 and the valves 21c to 27c of the substrate processing apparatus 1A are closed.

First, the control unit 90 controls the operations of the respective units of the substrate processing apparatus 1A to execute the film formation process (step S1). In the present embodiment, the controller 90 controls the elevating mechanism to feed the boat WB holding a plurality of wafers W into the processing container 11. Next, the controller 90 controls the pressure regulating valve 32 to regulate the pressure in the processing container 11 to a predetermined pressure, and controls the heating unit 40 to heat the wafer W to a predetermined temperature. Then, the controller 90 controls the opening and closing of the valves 21c, 23c, 24c, and 27c to supply the source gas, the diluent gas, the reactive gas, and the purge gas into the processing container 11, thereby forming a predetermined film on the wafer W. Next, the controller 90 returns the inside of the processing container 11 to the atmospheric pressure, and controls the elevating mechanism to feed the boat WB out of the processing container 11.

Next, the control portion 90 determines whether or not cleaning of the injector 12 is required (step S2). In the present embodiment, the control unit 90 determines that cleaning of the injector 12 is necessary when the execution time of the film formation process exceeds a predetermined time, and determines that cleaning of the injector 12 is unnecessary when the execution time of the film formation process does not exceed the predetermined time. If it is determined that the injector 12 is not required to be cleaned, the control unit 90 returns the process to step S1. That is, the control unit 90 continues the film formation process without performing the cleaning process of the injector 12. On the other hand, when determining that the injector 12 needs to be cleaned, the control unit 90 executes the cleaning process for the injector 12 (step S3) and ends the process.

An example of the cleaning process of the injector 12 will be described with reference to fig. 4.

First, the control unit 90 depressurizes the inside of the processing container 11 (step S31). In the present embodiment, the controller 90 controls the shutter 15 to hermetically close the opening at the lower end of the processing container 11 with the shutter 15. Next, the controller 90 opens the pressure regulating valve 32 to communicate the inside of the processing container 11 with the vacuum pump 33 through the exhaust pipe 31, and exhausts the inside of the processing container 11 to reduce the pressure. After the processing container 11 reaches a predetermined vacuum level, the controller 90 closes the pressure regulating valve 32.

Next, the control unit 90 depressurizes the inside of the injector 12 (step S32). In the present embodiment, the controller 90 opens the valve 25c to communicate the inside of the source gas supply pipe 121 of the injector 12 with the vacuum pump 33 through the breather pipe 25b, and exhausts the inside of the source gas supply pipe 121 to reduce the pressure.

Next, the control unit 90 introduces the purge gas into the injector 12 (step S33). In the present embodiment, the controller 90 opens the valve 22c to introduce the purge gas from the purge gas source 22a into the diluent gas supply pipe 122. At this time, the inside of the source gas supply pipe 121 is depressurized. Therefore, the ratio of the cleaning gas discharged into the processing container 11 through the gas discharge holes 124 is reduced, and the ratio of the cleaning gas flowing through the source gas supply pipe 121 and the vent pipe 25b and discharged by the vacuum pump 33 is increased. That is, the purge gas introduced into the diluent gas supply pipe 122 selectively flows through the raw material gas supply pipe 121 and the vent pipe 25 b. As a result, the inside of the ejector 12 can be selectively cleaned. In step S33, the controller 90 preferably opens the valve 24c to supply the purge gas from the injector 13 into the process container 11. Accordingly, even when the cleaning gas is ejected into the process container 11 through the gas ejection holes 124 of the injector 12, the purge gas is filled in the process container 11, and therefore, the cleaning of the inside of the process container 11 by the cleaning gas can be suppressed. After a predetermined time has elapsed, the controller 90 closes the valve 22c to stop the introduction of the purge gas into the diluent gas supply pipe 122. The predetermined time may be, for example, a time required to remove all deposits in the raw material gas supply pipe 121 and the diluent gas supply pipe 122.

Next, the controller 90 replaces the inside of the injector 12 with the purge gas (step S34). In the present embodiment, the controller 90 opens the valve 22c to introduce the purge gas into the diluent gas supply pipe 122. At this time, the inside of the source gas supply pipe 121 is depressurized. Therefore, the ratio of the purge gas discharged into the process container 11 through the gas discharge holes 124 is reduced, and the ratio of the purge gas flowing through the source gas supply pipe 121 and the vent pipe 25b and discharged by the vacuum pump 33 is increased. That is, the purge gas introduced into the diluent gas supply pipe 122 selectively flows through the raw material gas supply pipe 121 and the vent pipe 25 b. This enables the vacuum pump 33 to efficiently discharge the cleaning residues in the raw material gas supply pipe 121 and the diluent gas supply pipe 122. After a predetermined time has elapsed, the controller 90 closes the valve 22c to stop the introduction of the purge gas into the source gas supply pipe 121. Further, the control unit 90 closes the valve 25c, and ends the process.

In the above embodiment, the connection port 121a is an example of the 1 st connection port, and the connection port 122a is an example of the 2 nd connection port. The raw gas supply pipe 121 is an example of the 1 st gas pipe, and the diluent gas supply pipe 122 is an example of the 2 nd gas pipe. The valve 22c is an example of the 1 st valve, the valves 25c and 26c are examples of the 2 nd valve, and the pressure regulating valve 32 is an example of the 3 rd valve. The wafer W is an example of a substrate.

As described above, according to the substrate processing apparatus 1A of embodiment 2, the source gas introduction pipe 21b and the breather pipe 25b are connected to one end of the injector 12, and the purge gas introduction pipe 22b is connected to the other end. This allows clean gas to be introduced from the connection port 122a at the other end of the injector 12, and allows the gas in the injector 12 to be discharged from the connection port 121a at the other end of the injector 12. Therefore, the inside of the injector 12 can be selectively cleaned with respect to the inside of the processing container 11.

Further, the substrate processing apparatus 1A according to embodiment 2 includes the shutter 15 that hermetically closes the opening at the lower end of the processing container 11 when the boat WB is fed out from the processing container 11. Thus, while the boat WB holding the wafers W after the film formation process is being carried out from the process container 11 and cooled (cooled), the inside of the ejector 12 can be cleaned. Therefore, the wafer cooling time can be effectively utilized, and the productivity can be improved.

The presently disclosed embodiments are to be considered in all respects as illustrative and not restrictive. The above-described embodiments may be omitted, replaced, or modified in various ways without departing from the scope of the claims and the gist thereof.