阅读说明：本技术 显示装置的制造装置 (Manufacturing device of display device ) 是由 张喆旼 许明洙 奇圣勳 金定坤 全东杓 郑檭 于 2021-04-01 设计创作，主要内容包括：本发明的一实施例公开一种显示装置的制造装置,包括：第一喷嘴部,包括放出第一源气体的第一喷嘴单元以及布置于所述第一喷嘴单元的外侧并排出所述第一源气体的第一排气部；以及第二喷嘴部,沿第一方向与所述第一喷嘴部并排排列,并且包括放出第二源气体的第二喷嘴单元以及布置于所述第二喷嘴单元的外侧并排出所述第二源气体的第二排气部,其中,所述第一排气部以及所述第二排气部中的至少一个放出清洗气体。(An embodiment of the present invention discloses a manufacturing apparatus of a display device, including: a first nozzle part including a first nozzle unit emitting a first source gas and a first exhaust part disposed outside the first nozzle unit and discharging the first source gas; and a second nozzle part arranged side by side with the first nozzle part in a first direction and including a second nozzle unit emitting a second source gas and a second exhaust part disposed outside the second nozzle unit and discharging the second source gas, wherein at least one of the first exhaust part and the second exhaust part emits a purge gas.)

1. A manufacturing apparatus of a display device, comprising:

a first nozzle part including a first nozzle unit emitting a first source gas and a first exhaust part disposed outside the first nozzle unit and discharging the first source gas; and

a second nozzle part arranged side by side with the first nozzle part in a first direction and including a second nozzle unit emitting a second source gas and a second exhaust part disposed outside the second nozzle unit and discharging the second source gas,

wherein at least one of the first exhaust portion and the second exhaust portion emits a purge gas.

2. The manufacturing apparatus of a display device according to claim 1, further comprising:

a first piping part connected to the first exhaust part;

a first purge gas supply unit connected to the first piping unit via a first supply valve; and

and a first regulating unit connected to the first pipe unit via a first regulating valve and regulating a pressure of the first pipe unit.

3. The manufacturing apparatus of a display device according to claim 2, further comprising:

a second piping part connected to the second exhaust part;

a second purge gas supply unit connected to the second piping unit via a second supply valve; and

and a second regulating unit connected to the second pipe unit via a second regulating valve and regulating a pressure of the second pipe unit.

4. The manufacturing apparatus of a display device according to claim 1,

the first exhaust portion discharges a first cleaning gas,

the second exhaust unit exhausts the first cleaning gas.

5. The manufacturing apparatus of a display device according to claim 1,

the first exhaust unit and the second exhaust unit alternately discharge the purge gas.

6. The manufacturing apparatus of a display device according to claim 1,

the first exhaust unit and the second exhaust unit discharge the cleaning gas at the same time.

7. The manufacturing apparatus of a display device according to claim 1,

at least one of the first nozzle portion and the second nozzle portion further includes a plasma forming portion,

at least one of the first nozzle unit and the second nozzle unit emits a nozzle cleaning gas.

8. The manufacturing apparatus of a display device according to claim 1, further comprising:

a first nozzle piping part connected to the first nozzle unit; and

a third purge gas supply part supplying a first nozzle purge gas to the first nozzle pipe part.

9. The manufacturing apparatus of a display device according to claim 1,

the first exhaust portion includes: a first flow path defined by an outer surface of the first nozzle unit and an inner surface of the first exhaust portion; and a second flow path arranged on the first nozzle unit and connected to the first flow path,

the first nozzle unit includes a plurality of first nozzles,

the width of the first flow path is larger than the width of any one of the plurality of first nozzles.

10. The manufacturing apparatus of a display device according to claim 1, further comprising:

the chamber is provided with a plurality of cavities,

wherein the first nozzle portion and the second nozzle portion are arranged inside the chamber.

Technical Field

Embodiments of the present invention relate to an apparatus and a method, and more particularly, to an apparatus for manufacturing a display device and a method of cleaning the apparatus for manufacturing the display device.

Background

Mobility-based electronic devices are being widely used. As mobile electronic devices, tablet computers are being widely used recently, in addition to small electronic devices such as mobile phones.

Such mobile electronic devices include a display device in order to provide various functions (e.g., providing visual information such as images or movies to a user). Recently, as other components for driving the display device tend to be miniaturized, the proportion of the display device in the electronic apparatus is gradually increased, and a structure capable of being bent to have a predetermined angle in a flat state is also being developed.

In particular, in the case where the display device is formed to be flexible as described above, the display portion of the display device may be subjected to a packaging process in consideration of the lifetime of the display device and the like, and a Chemical Vapor Deposition method (CVD), an Atomic Layer Deposition method (ALD), or the like may be used as a packaging process.

In the manufacturing apparatus of the display device which performs the sealing process as described above, various researches such as development of the nozzle portion from the conventional time-sharing gas supply method to the divisional gas supply method have been carried out in order to improve the efficiency of the sealing process

Disclosure of Invention

Embodiments of the present invention provide a manufacturing apparatus of a display device and a cleaning method thereof, which cleans a nozzle portion of a manufacturing apparatus of a display device in situ in order to improve efficiency of the above-described partitioned gas supply system.

An embodiment of the present invention discloses a manufacturing apparatus of a display device, including: a first nozzle part including a first nozzle unit emitting a first source gas and a first exhaust part disposed outside the first nozzle unit and discharging the first source gas; and a second nozzle part arranged side by side with the first nozzle part in a first direction and including a second nozzle unit emitting a second source gas and a second exhaust part disposed outside the second nozzle unit and discharging the second source gas, wherein at least one of the first exhaust part and the second exhaust part emits a purge gas.

In one embodiment, the manufacturing apparatus of the display apparatus may further include: a first piping part connected to the first exhaust part; a first purge gas supply unit connected to the first piping unit via a first supply valve; and a first regulating unit connected to the first pipe unit via a first regulating valve and regulating a pressure in the first pipe unit.

In one embodiment, the manufacturing apparatus of the display apparatus may further include: a second piping part connected to the second exhaust part; a second purge gas supply unit connected to the second piping unit via a second supply valve; and a second regulator connected to the second pipe section via a second regulator valve, and configured to regulate a pressure in the second pipe section.

In one embodiment, the manufacturing apparatus of the display apparatus may further include: and a third nozzle part arranged side by side with the second nozzle part and including a third nozzle unit discharging a third source gas and a third exhaust part disposed outside the third nozzle unit and discharging the third source gas, wherein the third exhaust part may be connected to the first pipe part.

In one embodiment, the first exhaust part may discharge a first purge gas, and the second exhaust part may discharge the first purge gas.

In one embodiment, the first exhaust part and the second exhaust part may alternately discharge the purge gas.

In one embodiment, the first exhaust portion and the second exhaust portion may simultaneously emit the purge gas.

In an embodiment, at least one of the first nozzle part and the second nozzle part may further include a plasma forming part, and at least one of the first nozzle unit and the second nozzle unit may discharge a nozzle cleaning gas.

In one embodiment, the manufacturing apparatus of the display apparatus may further include: a first nozzle piping part connected to the first nozzle unit; and a third purge gas supply part supplying a first nozzle purge gas to the first nozzle pipe part.

In one embodiment, the manufacturing apparatus of the display apparatus may further include: a second nozzle piping part connected to the second nozzle unit; and a fourth purge gas supply part supplying the second nozzle purge gas to the second nozzle pipe part.

In an embodiment, the first exhaust portion may include: a first flow path defined by an outer surface of the first nozzle unit and an inner surface of the first exhaust portion; and a second flow path disposed on the first nozzle unit and connected to the first flow path, the first nozzle unit may include a plurality of first nozzles, and a width of the first flow path may be greater than a width of any one of the plurality of first nozzles.

In an embodiment, the manufacturing apparatus of the display device may further include a chamber, wherein the first nozzle part and the second nozzle part may be disposed inside the chamber.

Another embodiment of the present invention discloses a cleaning method as a cleaning method for a manufacturing apparatus of a display device including: a first nozzle part including a first nozzle unit emitting a first source gas and a first exhaust part disposed outside the first nozzle unit; and a second nozzle part including a second nozzle unit emitting a second source gas and a second exhaust part disposed outside the second nozzle unit, wherein the cleaning method includes the steps of: the first exhaust part discharges first cleaning gas; and the first cleaning gas cleans the first nozzle unit.

In an embodiment, the cleaning method may further include the steps of: the first cleaning gas moves to the second nozzle unit to clean the second nozzle unit and the second exhaust unit; and the second exhaust part exhausts the first cleaning gas.

In an embodiment, the cleaning method may further include the steps of: the second exhaust part discharges a second cleaning gas; the second cleaning gas moves to a first nozzle part to clean the first nozzle unit and the first exhaust part; and the first exhaust part exhausts the second cleaning gas.

In an embodiment, the cleaning method may further include the steps of: the second nozzle unit discharges a second nozzle cleaning gas; and the second nozzle cleaning gas is converted into a radical form.

In an embodiment, the cleaning method may further include the steps of: the first nozzle unit discharges a first nozzle cleaning gas; and the first nozzle cleaning gas is converted into a radical form.

In an embodiment, the cleaning method may further include the steps of: and discharging a second purge gas from the second exhaust part, wherein the second nozzle purge gas may be converted into a radical form in the step of discharging the first purge gas, and the first nozzle purge gas may be converted into a radical form in the step of discharging the second purge gas.

In one embodiment, in the step of discharging the first cleaning gas by the first gas discharge part, the second gas discharge part may discharge a second cleaning gas.

In one embodiment, the manufacturing apparatus of the display apparatus may further include: a first piping part connected to the first exhaust part; a first regulating unit connected to the first pipe unit via a first regulating valve and regulating a pressure of the first pipe unit; a second piping part connected to the second exhaust part; and a second regulating portion connected to the second pipe portion through a second regulating valve and regulating a pressure of the second pipe portion, wherein in the step of discharging the first purge gas from the first exhaust portion, the first regulating valve may be closed, and the second regulating valve may be opened.

As described above, an embodiment of the present invention may include the first nozzle portion including the first nozzle unit and the first exhaust portion, and the second nozzle portion including the second nozzle unit and the second exhaust portion, wherein at least one of the first exhaust portion and the second exhaust portion may exhaust the purge gas. Therefore, the first nozzle portion or the second nozzle portion can be cleaned in situ, and the first nozzle portion or the second nozzle portion can be cleaned efficiently.

Drawings

Fig. 1 is a sectional view illustrating a manufacturing apparatus of a display device according to an embodiment of the present invention.

Fig. 2 is a sectional view illustrating a part of a manufacturing apparatus of a display device according to an embodiment of the present invention.

Fig. 3 is a sectional view illustrating a nozzle group according to an embodiment of the present invention.

Fig. 4 and 5 are sectional views schematically showing pipes of the nozzle group according to the embodiment of the present invention.

Fig. 6 and 7 are sectional views illustrating a cleaning method according to an embodiment of the present invention.

Fig. 8 and 9 are sectional views illustrating a cleaning method according to another embodiment of the present invention.

Fig. 10 is a sectional view illustrating a cleaning method according to still another embodiment of the present invention.

Fig. 11 is a sectional view illustrating a cleaning method according to still another embodiment of the present invention.

Fig. 12 is a comparative example different from the embodiment of the present invention.

Fig. 13 is a graph comparing the cleaning rates of the example of the present invention and the comparative example.

Description of the symbols:

SV1, SV 2: first and second supply valves

NP1, NP 2: first and second nozzle piping parts

NCG1, NCG 2: cleaning gas for the first nozzle and cleaning gas for the second nozzle

P1, P2: a first pipe part and a second pipe part

SG1, SG2, SG 3: first source gas, second source gas, and third source gas

CV1, CV 2: first regulating valve and second regulating valve

C1: a first regulating part

CG1, CG 2: a first cleaning gas and a second cleaning gas

CGS1, CGS2, CGS3, CGS 4: a first cleaning gas supply unit, a second cleaning gas supply unit, a third cleaning gas supply unit, and a fourth cleaning gas supply unit

PF1, PF 2: first and second plasma forming parts

C3: third regulating part

1: manufacturing device of display device

100: chamber

210. 220, 230: a first nozzle part, a second nozzle part, and a third nozzle part

211. 221, 231: first nozzle unit, second nozzle unit, and third nozzle unit

213a, 213 b: a first flow path and a second flow path

213. 223, 233: first exhaust unit, second exhaust unit, and third exhaust unit

Detailed Description

While the invention is amenable to various modifications and alternative embodiments, specifics thereof have been shown by way of example in the drawings and will be described in detail. The effects and features of the present invention and a method for achieving the same will become apparent with reference to embodiments described in detail later together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various forms.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings, in which the same or corresponding constituent elements are given the same reference numerals, and repeated description thereof will be omitted.

In the following embodiments, the terms first, second, etc. are not used in a limiting sense, but are used for the purpose of distinguishing one constituent element from other constituent elements.

In the following embodiments, expressions in the singular number include expressions in the plural number as long as other meanings are not explicitly indicated in the context.

In the following embodiments, terms such as "including" or "having" indicate the presence of a feature or a component described in the specification, and do not exclude the possibility of adding one or more other features or components.

In the following embodiments, when a portion of a film, a region, a component element, or the like is referred to as being located on or above another portion, not only a case where it is located immediately above another portion but also a case where another film, a region, a component element, or the like is interposed therebetween are included.

In the drawings, the sizes of the constituent elements may be exaggerated or reduced for convenience of explanation. For example, the size and thickness of each component shown in the drawings are arbitrarily shown for convenience of explanation, and thus the present invention is not necessarily limited to the illustrated contents.

In the case where an embodiment can be implemented in different ways, the specific process sequence may be performed in a different order than that illustrated. For example, two steps described in succession may be performed substantially simultaneously, or may be performed in the order reverse to the order described.

In the following embodiments, when a film, a region, a component, or the like is connected, the film, the region, or the component is not only directly connected but also indirectly connected with another film, a region, or a component interposed therebetween. For example, in the present specification, when films, regions, components, and the like are electrically connected to each other, the films, regions, components, and the like are not only electrically connected to each other directly, but also electrically connected indirectly with each other with other films, regions, components, and the like interposed therebetween.

Fig. 1 is a sectional view illustrating a manufacturing apparatus 1 of a display device according to an embodiment of the present invention. Fig. 2 is a sectional view illustrating a part of a manufacturing apparatus of a display device according to an embodiment of the present invention.

Referring to fig. 1 and 2, the manufacturing apparatus 1 of the display device may include a chamber 100, a nozzle group 200, a pressure adjusting part 300, and a moving part MP.

The chamber 100 may have a space formed therein and an opening formed at one side so that the substrate S can be drawn out or received. In an embodiment, the first opening and closing part 110 and/or the second opening and closing part 120 including a gate valve may be disposed at a portion of the chamber 100 where the opening is formed, so as to be selectively opened and closed.

In one embodiment, the chamber 100 may be a chamber for Chemical Vapor Deposition (CVD) or Plasma Enhanced Chemical Vapor Deposition (PECVD). In another embodiment, the chamber 100 may be a chamber for an Atomic Layer Deposition (ALD) method or a Plasma Enhanced Atomic Layer Deposition (PEALD) method, or may be a chamber in which a chemical vapor Deposition (or Plasma CVD) method and an Atomic Layer Deposition (or Plasma ALD) method are selectively performed.

The nozzle set 200 may discharge or discharge a gas for forming an encapsulation layer on the substrate S. The nozzle group 200 may be disposed within the chamber 100. In one embodiment, the nozzle block 200 may be fixed within the chamber 100. In another embodiment, the nozzle block 200 may be movable within the chamber 100.

The nozzle block 200 may include a first nozzle portion 210 and a second nozzle portion 220. In another embodiment, the nozzle group 200 may include a first nozzle portion 210, a second nozzle portion 220, a third nozzle portion 230, a fourth nozzle portion 240, and a fifth nozzle portion 250. In yet another embodiment, the nozzle group 200 may include 3 or 4 nozzle portions, or may include more than 6 nozzle portions. Hereinafter, the detailed description will be given mainly on the case where the nozzle group 200 includes the first to fifth nozzle portions 210 to 250.

The first, second, third, fourth, and fifth nozzle portions 210, 220, 230, 240, and 250 may be arranged side by side in a first direction (e.g., the x-direction or the-x-direction). At this time, the first to fifth nozzle portions 210 to 250 may be sequentially arranged. That is, the second nozzle portion 220 may be disposed between the first nozzle portion 210 and the third nozzle portion 230, and the fourth nozzle portion 240 may be disposed between the third nozzle portion 230 and the fifth nozzle portion 250. In another embodiment, the order of the first to fifth nozzle portions 210 to 250 may be changed. For example, the first nozzle portion 210, the third nozzle portion 230, the second nozzle portion 220, the fourth nozzle portion 240, and the fifth nozzle portion 250 may be arranged in this order. As another example, the first nozzle portion 210, the third nozzle portion 230, the fifth nozzle portion 250, the second nozzle portion 220, and the fourth nozzle portion 240 may be arranged in this order. Hereinafter, the detailed description will be given mainly on the case where the first nozzle portion 210, the second nozzle portion 220, the third nozzle portion 230, the fourth nozzle portion 240, and the fifth nozzle portion 250 are arranged in this order.

The first nozzle portion 210 may include a first nozzle unit 211 and a first exhaust portion 213 disposed outside the first nozzle unit 211. First nozzle unit 211 may emit first source gas SG 1. The first nozzle unit 211 may include a first nozzle N1, a first plasma formation part PF1, a first nozzle support part 211SP, and an insulation part IP.

In one embodiment, the first nozzle N1 may be provided in plurality. The plurality of first nozzles N1 may be connected to the first nozzle pipe portion NP 1. The plurality of first nozzles N1 may discharge the first source gas SG1 flowing in through the first nozzle pipe portion NP 1. Fig. 2 illustrates 2 first nozzles N1, however, the first nozzle unit 211 may include more than 2 first nozzles N1.

The first plasma formation part PF1 can convert the gas discharged from the plurality of first nozzles N1 into a Radical (radial) form. That is, the first Plasma formation part PF1 can convert the gas discharged from the plurality of first nozzles N1 into a Plasma (Plasma) state. For example, first plasma formation part PF1 may convert first source gas SG1 into a radical form. The first plasma forming part PF1 may be arranged in a corresponding manner to the first nozzle unit 211, and may include an electrode.

The first nozzle support part 211SP may support the plurality of first nozzles N1, the first plasma formation part PF1, and the insulation part IP. Accordingly, the plurality of first nozzles N1, the first plasma formation part PF1, and the insulation part IP may be fixed to the first nozzle support part 211 SP.

The insulating part IP may insulate the plurality of first nozzles N1 and the first nozzle supporting part 211SP and/or the first plasma forming part PF1 and the first nozzle supporting part 211 SP. The insulating portion IP may include a ceramic material or may include a polyvinyl fluoride-based synthetic fiber.

In an embodiment, the insulation part IP may include a first insulation part IP1 surrounding the plurality of first nozzles N1 and a second insulation part IP2 on an upper portion of the first insulation part IP 1. At this time, the first insulation part IP1 may include a ceramic material, and the second insulation part IP2 may include a polyvinyl fluoride synthetic fiber.

The first exhaust part 213 may exhaust gas. For example, the first exhaust part 213 may exhaust the first source gas SG1, the radical form first source gas SG1, the second source gas SG2, a byproduct gas generated when forming an encapsulation layer on the substrate S, and the like. The first exhaust part 213 may be disposed around the first nozzle unit 211. The first exhaust unit 213 may exhaust gas through the first piping unit.

The second nozzle part 220 may include a second nozzle unit 221 and a second exhaust part 223 disposed outside the second nozzle unit 221. Second nozzle unit 221 may emit second source gas SG 2. The second nozzle unit 221 may include a second nozzle N2, a second plasma formation part PF2, a second nozzle support part, and an insulation part. At this time, since the second nozzle N2, the second plasma formation part PF2, the second nozzle support part, and the insulation part are similar to the first nozzle N1, the first plasma formation part PF1, the first nozzle support part 211SP, and the insulation part IP of the first nozzle unit 211, detailed description is omitted.

The second nozzle N2 may be connected to the second nozzle pipe portion NP 2. The second nozzle N2 may be provided in plurality. The plurality of second nozzles N2 may discharge the second source gas SG2 flowing in through the second nozzle pipe portion NP 2.

The second exhaust part 223 may exhaust gas. For example, the second exhaust part 223 may exhaust the second source gas SG2, the radical form second source gas SG2, the first source gas SG1, a byproduct gas generated when forming an encapsulation layer on the substrate S, and the like. The second exhaust part 223 may be disposed around the second nozzle unit 221. The second exhaust part 223 may exhaust gas through the second piping part.

The third nozzle part 230 may include a third nozzle unit 231 emitting a third source gas SG3, and a third exhaust part 233 disposed outside the third nozzle unit 231. At this time, the third nozzle unit 231 may include a plurality of third nozzles and a third plasma formation part PF 3.

The fourth nozzle part 240 may include a fourth nozzle unit 241 emitting a fourth source gas and a fourth exhaust part 243 disposed outside the fourth nozzle unit 241. At this time, the fourth nozzle unit 241 may include a plurality of fourth nozzles and a fourth plasma formation part PF 4.

The fifth nozzle part 250 may include a fifth nozzle unit 251 emitting a fifth source gas, and a fifth exhaust part 253 disposed at an outer side of the fifth nozzle unit 251. At this time, the fifth nozzle unit 251 may include a plurality of fifth nozzles and a fifth plasma formation part PF 5.

The third nozzle portion 230 and the fifth nozzle portion 250 may be similar to the first nozzle portion 210 and the fourth nozzle portion 240 may be similar to the second nozzle portion 220. Also, the third source gas SG3, the fifth source gas SG1 may be similar to the first source gas SG1, and the fourth source gas SG2 may be similar to the second source gas SG 2. Therefore, detailed descriptions of the third nozzle portion 230, the fourth nozzle portion 240, and the fifth nozzle portion 250 will be omitted.

In an embodiment, at least one of the first nozzle portion 210 and the second nozzle portion 220 may include a plasma forming portion. For example, as shown in FIG. 2, the first nozzle portion 210 may include a first plasma forming portion PF1, and the second nozzle portion 220 may include a second plasma forming portion PF 2. In some embodiments, the first nozzle portion 210 may include the first plasma formation portion PF1 and the second nozzle portion 220 may not include the second plasma formation portion PF 2. In some embodiments, the first nozzle portion 210 may not include the first plasma formation section PF1, and the second nozzle portion 220 may include the second plasma formation section PF 2. Hereinafter, for convenience of description, the first nozzle unit 210 and the second nozzle unit 220 will be mainly described in detail with reference to the case where the first plasma formation unit PF1 and the second plasma formation unit PF2 are respectively included.

In an embodiment, first source gas SG1 and second source gas SG2 may include different substances from each other, and may be emitted from first nozzle unit 211 and second nozzle unit 221, respectively. At this time, the first source gas SG1 may include a main deposition substance, and the second source gas SG2 may be a reaction gas reacting with the first source gas SG 1. In this case, the encapsulation layer may be formed on the substrate S using an atomic layer deposition method or a plasma atomic layer deposition method.

In another embodiment, first source gas SG1 and second source gas SG2 may include the same substance and may be emitted from first nozzle unit 211 and second nozzle unit 221, respectively. In this case, the encapsulation layer may be formed on the substrate S using a chemical vapor deposition method or a plasma chemical vapor deposition method. In yet another embodiment, first source gas SG1 may include inorganic substances, and second source gas SG2 may include organic substances.

The nozzle set 200 may further include a support part SP. The support portion SP may support the first to fifth nozzle portions 210 to 250. That is, the first to fifth nozzle portions 210 to 250 may be fixed to the support portion SP.

The nozzle group 200 may be arranged with purge gas nozzle portions that emit purge gas PG. The purge gas nozzle portion may be disposed between the plurality of nozzle portions or outside the plurality of nozzle portions. For example, the purge gas nozzle portions may be disposed between the first nozzle portion 210 and the second nozzle portion 220, between the second nozzle portion 220 and the third nozzle portion 230, between the third nozzle portion 230 and the fourth nozzle portion 240, and between the fourth nozzle portion 240 and the fifth nozzle portion 250. Also, the purge gas nozzle part may be disposed at an outer side of the first nozzle part 210 not facing the second nozzle part 220 and an outer side of the fifth nozzle part 250 not facing the fourth nozzle part 240. The purge gas PG can prevent the gases discharged from the adjacent nozzle portions from being mixed with each other. For example, the purge gas PG may prevent the first source gas SG1 emitted from the first nozzle unit 211 and the second source gas SG2 emitted from the second nozzle unit 221 from being mixed with each other. That is, the purge gas PG may function as an air curtain preventing the first source gas SG1 and the second source gas SG2 from being mixed with each other.

The pressure adjusting part 300 may be connected to the chamber 100 to adjust the pressure inside the chamber 100. In an embodiment, the pressure adjusting part 300 may adjust the pressure inside the chamber 100 to be the same as or similar to the atmospheric pressure. Also, the pressure adjusting part 300 may adjust the pressure inside the chamber 100 to be the same as or similar to the vacuum state. For example, the pressure adjusting part 300 may maintain a vacuum state during the process, and may maintain an atmospheric pressure state in a case where the substrate S is loaded or unloaded.

The pressure adjusting part 300 may include a connection pipe 310 connected to the chamber 100 and a pump 320 provided to the connection pipe 310. At this time, as the pump 320 is started, the external air may flow in through the connection pipe 310, or the gas inside the chamber 100 may be guided to the outside through the connection pipe 310.

The moving portion MP may be disposed at a lower portion of the nozzle group 200. At this time, the substrate S may be disposed at the moving part MP, and may be linearly reciprocated inside the chamber 100. For example, the moving part MP may move in a first direction (e.g., x-direction or-x-direction) or in a second direction (e.g., y-direction or-y-direction) crossing the first direction. As another example, the moving part MP may move in a first direction (e.g., x-direction or-x-direction), a second direction (e.g., y-direction or-y-direction), or a third direction (e.g., z-direction or-z-direction) intersecting the first direction and the second direction. In one embodiment, the moving part MP may include a roller and a motor. In this case, the roller may be rotated by the motor, so that the moving part MP may be transferred. In another embodiment, the moving part MP may include a Linear motion block (Linear motion block) and a Linear motion rail (Linear motion rail) guiding the Linear motion block. In this case, the linear motion block may be connected to the moving part MP. Therefore, the moving part MP can move along the linear motion track. In still another embodiment, the moving part MP may include a belt, a lead screw, and the like. The moving part MP may include all devices and all structures capable of transferring the substrate S.

Here, the substrate S may be a display device under manufacture. The substrate S may include glass, or may include a polymer resin such as polyether sulfone (polyethersulfone), polyarylate (polyarylate), polyetherimide (polyetherimide), polyethylene naphthalate (polyethylene naphthalate), polyethylene terephthalate (polyethylene terephthalate), polyphenylene sulfide (polyphenylene sulfide), polyimide (polyimide), Polycarbonate (PC: Polycarbonate), cellulose triacetate (TAC: Tri-cellulose Acetate), cellulose Acetate propionate (cellulose Acetate propionate), or the like.

In the manufacturing apparatus 1 for a display device as described above, the nozzle portions of the nozzle group 200 may be arranged side by side in the first direction, and the manufacturing apparatus 1 for a display device may form an encapsulation layer on the substrate S in a zoned gas supply manner. In this case, the by-product gas or the like may come into contact with each nozzle unit or exhaust portion, which may reduce the efficiency of the display device manufacturing apparatus 1, and therefore, the nozzle unit or exhaust portion needs to be cleaned. In this case, the nozzle portion or the exhaust portion of the nozzle group 200 can be cleaned in situ, so that the efficiency of the manufacturing apparatus 1 of the display device can be improved.

Fig. 3 is a sectional view illustrating a nozzle set 200 according to an embodiment of the present invention. In fig. 3, the same reference numerals as in fig. 2 denote the same components, and therefore, redundant description thereof will be omitted.

Referring to fig. 3, at least one of the first to fifth exhaust portions 213 to 253 may discharge the purge gas. At this time, the third exhaust unit 233 and the fifth exhaust unit 253 are similar to the first exhaust unit 213, and the fourth exhaust unit 243 is similar to the second exhaust unit 223, so the first exhaust unit 213 and the second exhaust unit 223 will be mainly described in detail.

The cleaning gas may be selected to be a gas or a radical form of the gas capable of cleaning the nozzle unit or the exhaust part. For example, the cleaning gas may include chlorine (Cl)₂) Nitrogen trifluoride (NF)₃) Boron trichloride (BCl)₃) Or carbon tetrachloride (CCl)₄). As another example, the purge gas may include chlorine (Cl)₂) Free radical form of (3), nitrogen trifluoride (NF)₃) Free radical form of (3), boron trichloride (BCl)₃) Free radical form of (A) or carbon tetrachloride (CCl)₄) The free radical form of (1).

At least one of the first exhaust part 213 and the second exhaust part 223 can discharge the purge gas. For example, the first exhaust part 213 may discharge the first purge gas CG1, and the second exhaust part 223 may discharge the discharged gas. In this case, the first cleaning gas CG1 may clean the first nozzle unit 211 and the first exhaust portion 213. The first cleaning gas CG1 may move from the first nozzle portion 210 to the second nozzle portion 220, and the first cleaning gas CG1 may clean the second nozzle unit 221 and the second exhaust part 223. Also, the first cleaning gas CG1 may be discharged through the second exhaust portion 223.

As another example, the first exhaust part 213 may exhaust the discharged gas, and the second exhaust part 223 may exhaust the second purge gas. In this case, the second cleaning gas may clean the second nozzle unit 221 and the second exhaust part 223. The second cleaning gas may move from the second nozzle portion 220 to the first nozzle portion 210 and/or the third nozzle portion 230. The second cleaning gas moved to the first nozzle part 210 may clean the first nozzle unit 211 and the first exhaust part 213, and may be exhausted through the first exhaust part 213. The second cleaning gas moved to the third nozzle part 230 may clean the third nozzle unit 231 and the third exhaust part 233 and be discharged through the third exhaust part 233.

As another example, the first exhaust unit 213 and the second exhaust unit 223 may discharge the first purge gas CG1 and the second purge gas, respectively. In this case, the first cleaning gas CG1 may clean the first nozzle unit 211 and the first exhaust portion 213. Further, a part of the first cleaning gas CG1 may move to the second nozzle unit 220 to clean the second nozzle unit 221 and the second exhaust portion 223. The second cleaning gas may clean the second nozzle unit 221 and the second exhaust part 223. Further, a part of the second cleaning gas may move to the first nozzle unit 210 to clean the first nozzle unit 211 and the first exhaust part 213, or may move to the third nozzle unit 230 to clean the third nozzle unit 231 and the third exhaust part 233.

In this embodiment, the first exhaust part 213 and the second exhaust part 223 may alternately discharge the purge gas. Specifically, when the first exhaust part 213 discharges the first cleaning gas CG1, the second exhaust part 223 may discharge the discharged gas. And, when the second exhaust part 223 discharges the second cleaning gas, the first exhaust part 213 may discharge the discharged gas. For example, as shown in fig. 3, when the first exhaust portion 213, the third exhaust portion 233, and the fifth exhaust portion 253 discharge the first cleaning gas CG1, the second exhaust portion 223 and the fourth exhaust portion 243 can discharge the discharged gas. When the second exhaust portion 223 and the fourth exhaust portion 243 discharge the second cleaning gas CG2, the first exhaust portion 213, the third exhaust portion 233, and the fifth exhaust portion 253 can discharge the discharged gas.

In another embodiment, the first exhaust part 213 and the second exhaust part 223 may simultaneously exhaust the cleaning gas. For example, the first to fifth exhaust portions 213 to 253 may simultaneously exhaust the purge gas.

In one embodiment, at least one of the first to fifth nozzle units 211 to 251 may discharge the nozzle cleaning gas. At this time, the third nozzle unit 231 and the fifth nozzle unit 251 are similar to the first nozzle unit 211, and the fourth nozzle unit 241 is similar to the second nozzle unit 221, and thus the first nozzle unit 211 and the second nozzle unit 221 will be mainly described in detail.

At least one of the first nozzle unit 211 and the second nozzle unit 221 may discharge nozzle cleaning gas. For example, the first nozzle unit 211 may discharge a first nozzle cleaning gas, and the second nozzle unit 221 may discharge a second nozzle cleaning gas. As another example, the first nozzle unit 211 may discharge the first nozzle cleaning gas, and the second nozzle unit 221 may not discharge the second nozzle cleaning gas. As another example, the first nozzle unit 211 may not discharge the first nozzle cleaning gas, and the second nozzle unit 221 may discharge the second nozzle cleaning gas. Hereinafter, for convenience of description, the first nozzle unit 211 and the second nozzle unit 221 discharge the first nozzle cleaning gas and the second nozzle cleaning gas, respectively, will be mainly described in detail.

At least one of the first plasma formation part PF1 and the second plasma formation part PF2 can convert the nozzle cleaning gas into a radical form. For example, the first plasma formation part PF1 may convert the first nozzle cleaning gas into a radical form. As another example, the second plasma formation part PF2 may convert the second nozzle cleaning gas into a radical form. As another example, the first plasma formation part PF1 and the second plasma formation part PF2 may convert the first nozzle cleaning gas and the second nozzle cleaning gas into radical forms, respectively. Hereinafter, the first plasma formation part PF1 and the second plasma formation part PF2 will be mainly described in detail with respect to the case where the first nozzle cleaning gas and the second nozzle cleaning gas are converted into radical forms, respectively.

In one embodiment, the first plasma formation part PF1 and the second plasma formation part PF2 may alternately convert the nozzle cleaning gas into a radical form. For example, the first plasma formation part PF1 may convert the first nozzle cleaning gas into a radical form. Subsequently, the second plasma formation part PF2 can convert the second nozzle cleaning gas into a radical form. As another example, the second plasma formation part PF2 may convert the second nozzle cleaning gas into a radical form. Subsequently, the first plasma formation part PF1 may convert the first nozzle cleaning gas into a radical form. In another embodiment, the first plasma formation part PF1 and the second plasma formation part PF2 may convert the nozzle cleaning gas into a radical form at the same time. For example, when the first plasma formation part PF1 converts the first nozzle cleaning gas into a radical form, the second plasma formation part PF2 may convert the second nozzle cleaning gas into a radical form.

In the present embodiment, at least one of the first exhaust part 213 and the second exhaust part 223 may discharge the cleaning gas in order to clean the first nozzle part 210 or the second nozzle part 220 in a relatively short time period. When the cleaning gas is in the form of radicals, there is a possibility that the radicals overlap (radial recombination) when the cleaning gas passes through a narrow flow path. If the cleaning gas is overlapped with radicals, the time for cleaning the nozzle portion may be increased, and the efficiency of cleaning the nozzle portion may be lowered.

The first exhaust portion 213 of the present embodiment may include: a first flow channel 213a defined by an outer surface 211S of the first nozzle unit 211 and an inner surface 213S of the first exhaust portion 213; and a second flow path 213b connected to the first flow path 213a and disposed on the first nozzle unit 211. At this time, the width W1 of the first flow path 213a may be greater than the width 211W of any one of the plurality of first nozzles N1. The width W1 of the first flow path 213a may be defined as the shortest distance between the outer side surface 211S of the first nozzle unit 211 and the inner side surface 213S of the first exhaust portion 213. The width 211W of any one of the plurality of first nozzles N1 may be defined as the maximum value among the widths of any one of the plurality of first nozzles N1.

In the embodiment of the present invention, the purge gas may be discharged through the exhaust unit, so that the overlap of the purge gas radicals when the purge gas passes through the flow path may be reduced. Accordingly, embodiments of the present invention may reduce cleaning time.

The plasma forming unit in the embodiment of the present invention may convert the nozzle cleaning gas discharged from the nozzle unit into a radical form. Therefore, the plasma forming section can convert the nozzle cleaning gas into a radical form with respect to the nozzle cleaning gas in which the radicals overlap through a relatively narrow flow path compared to the exhaust section, and can clean the nozzle section. Embodiments of the present invention may therefore reduce the cleaning time even more.

Fig. 4 and 5 are sectional views schematically showing pipes of the nozzle group 200 according to the embodiment of the present invention. In fig. 4 and 5, the same reference numerals as in fig. 3 denote the same components, and therefore, redundant description thereof is omitted.

Referring to fig. 4 and 5, the nozzle group 200 may include a first nozzle portion 210, a second nozzle portion 220, a third nozzle portion 230, a fourth nozzle portion 240, and a fifth nozzle portion 250. The first, second, third, fourth and fifth nozzle parts 210, 220, 230, 240 and 250 may include a first, second, third, fourth and fifth exhaust parts 213, 223, 233, 243 and 253, respectively.

In the present embodiment, the nozzle group 200 may include a purge gas supply part CGS, a regulator part C, a first pipe part P1, a second pipe part P2, a first nozzle pipe part NP1, and a second nozzle pipe part NP 2.

The cleaning gas supply part CGS may supply a cleaning gas. In one embodiment, the purge gas supply part CGS may include a first purge gas supply part CGS1 supplying a first purge gas CG1, a second purge gas supply part CGS2 supplying a second purge gas CG2, a third purge gas supply part CGS3 supplying a first nozzle purge gas, and a fourth purge gas supply part CGS4 supplying a second nozzle purge gas. In some embodiments, the first cleaning gas supply part CGS1 and the second cleaning gas supply part CGS2 may be integrally provided. In some embodiments, the third and fourth purge gas supplies CGS3 and CGS4 may be integrally provided.

The adjusting portion C can adjust the pressure of the piping portion. At this time, the adjusting part C may include a pump. Therefore, the outside air can be introduced or the gas inside the piping portion can be guided to the outside in accordance with the start of the pump. The regulation portion C may include a first regulation portion C1 that regulates the pressure of the first pipe portion P1, a second regulation portion C2 that regulates the pressure of the second pipe portion P2, and a third regulation portion C3 that regulates the pressure of the first nozzle pipe portion NP 1.

The first pipe part P1 may be connected to the first exhaust part 213, and the first pipe part P1 may be connected to the first cleaning gas supply part CGS 1. Accordingly, the first piping part P1 may supply the first cleaning gas CG1 supplied from the first cleaning gas supply part CGS1 to the first exhaust part 213. The first pipe portion P1 may be connected to the third exhaust portion 233 and the fifth exhaust portion 253. Accordingly, the first cleaning gas CG1 supplied from the first cleaning gas supply portion CGS1 may be supplied to the third exhaust part 233 and the fifth exhaust part 253.

The first piping part P1 may be connected to the first cleaning gas supply part CGS1 through a first supply valve SV 1. At this time, when the first supply valve SV1 is opened, the first cleaning gas CG1 supplied from the first cleaning gas supply portion CGS1 may flow into the first pipe portion P1.

The first pipe part P1 may be connected to the first adjustment part C1. At this time, the first piping portion P1 may be connected to the first regulator portion C1 through the first regulator valve CV 1. When the first regulating valve CV1 is opened, the pressure inside the first pipe portion P1 can be regulated.

When the first supply valve SV1 is opened, the first regulator valve CV1 may be closed. In this case, as shown in fig. 4, the first cleaning gas CG1 may flow into the first piping part P1. When the first supply valve SV1 is closed, the first regulator valve CV1 may be opened. In this case, as shown in fig. 5, the pump of the first regulation part C1 is activated, so that the gas inside the first piping part P1 can be guided to the outside. Accordingly, the gas inside the first exhaust portion 213, the third exhaust portion 233, and the fifth exhaust portion 253 may be guided to the outside.

The second pipe part P2 may be connected to the second exhaust part 223, and the second pipe part P2 may be connected to the second cleaning gas supply part CGS 2. Accordingly, the second piping part P2 may supply the second cleaning gas CG2 supplied from the second cleaning gas supply part CGS3 to the second exhaust part 223. The second pipe portion P2 may be connected to the fourth exhaust portion 243. Accordingly, the second cleaning gas CG2 supplied from the second cleaning gas supply portion CGS2 may be supplied to the fourth exhaust portion 243.

The second pipe portion P2 may be connected to the second cleaning gas supply portion CGS2 through a second supply valve SV 2. At this time, when the second supply valve SV2 is opened, the second cleaning gas CG2 supplied from the second cleaning gas supply portion CGS2 may flow into the second pipe portion P2.

The second pipe part P2 may be connected to the second adjusting part C2. At this time, the second piping portion P2 may be connected to the second regulator portion C2 through the second regulator valve CV 2. Therefore, when the second regulator valve CV2 is opened, the pressure inside the second pipe portion P2 can be regulated.

When the second supply valve SV2 is opened, the second regulator valve CV2 may be closed. In this case, as shown in fig. 5, the second cleaning gas CG2 may flow into the second piping part P2. When the second supply valve SV2 is closed, the second regulator valve CV2 may be opened. In this case, as shown in fig. 4, the pump of the second regulating portion C2 is activated, so that the gas inside the second piping portion P2 can be guided to the outside. Accordingly, the gas inside the second and fourth exhaust parts 223 and 243 may be guided to the outside.

In one embodiment, the second supply valve SV2 may be closed when the first supply valve SV1 is opened. At this time, the first regulating valve CV1 may be closed, and the second regulating valve CV2 may be opened. In this case, as shown in fig. 4, the first cleaning gas CG1 may be supplied to the first pipe part P1, and the second cleaning gas CG1 may not be supplied to the second pipe part P2. When the first supply valve SV1 is closed, the second supply valve SV2 may be opened. In this case, as shown in fig. 5, the first cleaning gas may not be supplied to the first pipe part P1, and the second cleaning gas CG2 may be supplied to the second pipe part P2. At this time, the first regulator valve CV1 is opened and the second regulator valve CV2 is closed.

In another embodiment, the first supply valve SV1 and the second supply valve SV2 may be opened simultaneously or closed simultaneously. In this case, the first and second regulating valves CV1 and CV2 may be closed at the same time, or may be opened at the same time.

The first nozzle pipe part NP1 may be connected to the third purge gas supply part CGS 3. The first nozzle pipe portion NP1 may be connected to the first nozzle unit, the third nozzle unit, and the fifth nozzle unit. At this time, the first nozzle pipe portion NP1 may be connected to the first nozzle unit, the third nozzle unit, and the fifth nozzle unit through respective valves. Accordingly, the first nozzle cleaning gas supplied from the third cleaning gas supply part CGS3 may be supplied to the first, third, and fifth nozzle units through the first nozzle pipe part NP 1.

The first nozzle pipe portion NP1 may be connected to the third adjusting portion C3. At this time, the first nozzle pipe portion NP1 may be connected to the third regulator portion C3 through the third regulator valve CV 3. When the third regulator valve CV3 is opened, the pressure inside the first nozzle pipe portion NP1 can be regulated. In some embodiments, the third regulation portion C3 may be omitted.

The second nozzle pipe part NP2 may be connected to the fourth purge gas supply part CGS 4. The second nozzle pipe portion NP2 may be connected to the second nozzle unit and the fourth nozzle unit. At this time, the second nozzle pipe portion NP2 may be connected to the second nozzle unit and the fourth nozzle unit through respective valves. The second nozzle cleaning gas supplied from the fourth cleaning gas supply part CGS4 may be supplied to the second nozzle unit and the fourth nozzle unit through the second nozzle pipe part NP 2. Although not illustrated in the drawings, in some embodiments, the second nozzle pipe portion NP2 may be connected with a fourth regulation portion that regulates the pressure of the second nozzle pipe portion NP 2. At this time, the fourth regulation portion may be connected to the second nozzle pipe portion NP2 through the fourth regulation valve, similarly to the third regulation portion C3.

Fig. 6 and 7 are sectional views illustrating a cleaning method according to an embodiment of the present invention. In fig. 6 and 7, the same reference numerals as in fig. 3 denote the same components, and therefore, redundant description thereof is omitted.

Referring to fig. 6, the nozzle set 200 may include a first nozzle part 210 and a second nozzle part 220, wherein the first nozzle part 210 may include a first nozzle unit 211 emitting a first source gas and a first exhaust part 213 disposed at an outer side of the first nozzle unit 211, and the second nozzle part 220 may include a second nozzle unit 221 emitting a second source gas and a second exhaust part 223 disposed at an outer side of the second nozzle unit 221.

The first exhaust part 213 may discharge the first cleaning gas CG 1. At this time, the first cleaning gas CG1 may clean the inner side surface of the first exhaust part 213 and/or the outer side surface of the first nozzle unit 211. Also, the first cleaning gas CG1 may clean the first nozzles N1 of the first nozzle unit 211.

The first cleaning gas CG1 may include chlorine (Cl)₂) Nitrogen trifluoride (NF)₃) Boron trichloride (BCl)₃) Or carbon tetrachloride (CCl)₄). Preferably, the first cleaning gas CG1 may include chlorine (Cl)₂) Free radical form of (3), nitrogen trifluoride (NF)₃) Free radical form of (3), boron trichloride (BCl)₃) Free radical form of (A) or carbon tetrachloride (CCl)₄) The free radical form of (1). In the present embodiment, the first cleaning gas CG1 is discharged through the first exhaust part 213 having a relatively wider width than that of the first nozzle N1, and thus free-radical polymerization occurs less, so that the cleaning time can be reduced.

The third exhaust portion 233 and the fifth exhaust portion 253 may discharge the first cleaning gas CG1 similarly to the first exhaust portion 213.

The first cleaning gas CG1 may move to the second nozzle unit 220 to clean the second nozzle unit 221 and the second exhaust section 223. Specifically, the first cleaning gas CG1 may clean the second nozzles N2 of the second nozzle unit 221, the outer side surfaces of the second nozzle unit 221, and the inner side surfaces of the second exhaust part 223.

The second exhaust part 223 may exhaust the first cleaning gas CG 1. At this time, the second adjusting part (not shown) connected to the second exhaust part 223 may adjust the pressure inside the second exhaust part 223 with respect to the first cleaning gas CG1, thereby guiding the first cleaning gas CG1 to the outside.

The fourth exhaust part 243 may exhaust the first cleaning gas CG1 similarly to the second exhaust part 223.

Referring to fig. 7, the second exhaust part 223 may discharge the second cleaning gas CG 2. At this time, the second cleaning gas CG2 may clean the inner side surface of the second exhaust part 223 and/or the outer side surface of the second nozzle unit 221. Also, the second cleaning gas CG2 may clean the second nozzles N2 of the second nozzle unit 221.

The second cleaning gas CG2 may be similar to the first cleaning gasIncluding chlorine (Cl)₂) Nitrogen trifluoride (NF)₃) Boron trichloride (BCl)₃) Or carbon tetrachloride (CCl)₄). Preferably, the second cleaning gas CG2 may include chlorine (Cl)₂) Free radical form of (3), nitrogen trifluoride (NF)₃) Free radical form of (3), boron trichloride (BCl)₃) Free radical form of (A) or carbon tetrachloride (CCl)₄) The free radical form of (1).

The fourth exhaust portion 243 may discharge the second cleaning gas CG2 similarly to the second exhaust portion 223.

The second cleaning gas CG2 can move to the first nozzle unit 210 to clean the first nozzle unit 211 and the first exhaust unit 213. Specifically, the second cleaning gas CG2 may clean the first nozzles N1 of the first nozzle unit 211, the outer side of the first nozzle unit 211, and the inner side of the first exhaust part 213. The second cleaning gas CG2 may move to the third nozzle unit 230 to clean the third nozzle unit 231 and the third exhaust unit 233.

The first exhaust part 213 may exhaust the second cleaning gas CG 2. At this time, a first adjusting part (not shown) connected to the first exhaust part 213 may adjust the pressure inside the first exhaust part 213, thereby guiding the second cleaning gas CG2 to the outside.

The third exhaust portion 233 and the fifth exhaust portion 253 may exhaust the second cleaning gas CG2 similarly to the first exhaust portion 213.

In the present embodiment, the first exhaust part 213 and the second exhaust part 223 may alternately discharge the purge gas. Specifically, when the first exhaust part 213 discharges the first cleaning gas CG1, the second exhaust part 223 may discharge the discharged gas. And, when the second exhaust part 223 discharges the second cleaning gas, the first exhaust part 213 may discharge the discharged gas.

In fig. 6 and 7, the first to fifth nozzle portions 210 to 250 are illustrated as being arranged side by side in order, however, in another embodiment, the first to fifth nozzle portions 210 to 250 may be arranged in the order of the first nozzle portion 210, the third nozzle portion 230, the second nozzle portion 220, the fourth nozzle portion 240, and the fifth nozzle portion 250. In yet another embodiment, the first through fifth nozzle portions 210 through 250 may be arranged in the order of the first nozzle portion 210, the third nozzle portion 230, the fifth nozzle portion 250, the second nozzle portion 220, and the fourth nozzle portion 240.

Fig. 8 and 9 are sectional views illustrating a cleaning method according to another embodiment of the present invention. In fig. 8, the same reference numerals as in fig. 6 denote the same components, and therefore, redundant description thereof will be omitted. In fig. 9, the same reference numerals as in fig. 7 denote the same components, and therefore, redundant description thereof will be omitted.

Referring to fig. 8, the first exhaust part 213 may discharge the first cleaning gas CG 1. The third exhaust portion 233 and the fifth exhaust portion 253 may discharge the first cleaning gas CG1 similarly to the first exhaust portion 213. The second exhaust part 223 may exhaust the first cleaning gas CG 1. The fourth exhaust part 243 may exhaust the first cleaning gas CG1 similarly to the second exhaust part 223.

The second nozzle unit 221 may discharge the second nozzle cleaning gas NCG 2. Specifically, the second nozzle cleaning gas NCG2 may be discharged through a second nozzle piping part connected to the second nozzle unit 221. The second nozzle purge gas NCG2 may include chlorine (Cl)₂) Nitrogen trifluoride (NF)₃) Boron trichloride (BCl)₃) Or carbon tetrachloride (CCl)₄). Preferably, the second nozzle cleaning gas NCG2 may include chlorine (Cl)₂) Free radical form of (3), nitrogen trifluoride (NF)₃) Free radical form of (3), boron trichloride (BCl)₃) Free radical form of (A) or carbon tetrachloride (CCl)₄) The free radical form of (1).

The first nozzle unit 211 may discharge the first nozzle cleaning gas NCG 1. Specifically, the first nozzle cleaning gas NCG1 can be discharged through a first nozzle piping portion connected to the first nozzle unit 211. The first nozzle purge gas NCG1 may be the same as or similarly include chlorine (Cl) as the second nozzle purge gas NCG2₂) Nitrogen trifluoride (NF)₃) Boron trichloride (BCl)₃) Or carbon tetrachloride (CCl)₄). Preferably, the first nozzle cleaning gas NCG1 may include chlorine (Cl)₂) Free radical form of (3), nitrogen trifluoride (NF)₃) In the form of free radicals, trichloroBoron sulfide (BCl)₃) Free radical form of (A) or carbon tetrachloride (CCl)₄) The free radical form of (1).

The third nozzle unit 231, the fifth nozzle unit 251 may discharge the first nozzle cleaning gas NCG1 similarly to the first nozzle unit 211. The fourth nozzle unit 241 may discharge the second nozzle cleaning gas NCG2 similarly to the second nozzle unit 221.

The second nozzle cleaning gas NCG2 may be converted into a radical form. Specifically, the second nozzle cleaning gas NCG2 can be converted into a radical form by the second plasma formation part PF 2. Therefore, the second plasma formation part PF2 can convert the second nozzle cleaning gas NCG2 into a radical form and clean the second nozzle N2 with respect to the second nozzle cleaning gas NCG2 in which radicals overlap with each other by the second nozzle N2 having a relatively narrow flow path compared to the second exhaust part 223. Therefore, the embodiment of the invention can improve the cleaning completion degree and reduce the cleaning time.

The fourth plasma formation part PF4 can transform the second nozzle cleaning gas NCG2 into a radical form similarly to the second plasma formation part PF 2.

Referring to fig. 9, the second exhaust part 223 may discharge the second cleaning gas CG 2. The fourth exhaust portion 243 may discharge the second cleaning gas CG2 similarly to the second exhaust portion 223. The first exhaust part 213 may exhaust the second cleaning gas CG 2. The third exhaust portion 233 and the fifth exhaust portion 253 may exhaust the second cleaning gas CG2 similarly to the first exhaust portion 213. The first nozzle unit 211 may discharge the first nozzle cleaning gas NCG1, and the second nozzle unit 221 may discharge the second nozzle cleaning gas NCG 2.

The first nozzle cleaning gas NCG1 may be converted into a radical form. Specifically, the first nozzle cleaning gas NCG1 can be converted into a radical form by the first plasma formation part PF 1. Therefore, in the first nozzle cleaning gas NCG1 in which radicals overlap due to the first nozzle N1 having a relatively narrow flow path compared to the first exhaust unit 213, the first plasma formation unit PF1 can clean the first nozzle N1 by converting the first nozzle cleaning gas NCG1 into a radical form.

The third plasma formation part PF3 and the fifth plasma formation part PF5 can convert the first nozzle cleaning gas NCG1 into radical forms similarly to the first plasma formation part PF 1.

In this embodiment, the first plasma formation part PF1 and the second plasma formation part PF2 may alternately convert the nozzle cleaning gas into a radical form. Specifically, when the first exhaust part 213 discharges the first cleaning gas CG1, the second plasma formation part PF2 may convert the second nozzle cleaning gas NCG2 into a radical form. Subsequently, when the second exhaust part 223 discharges the second cleaning gas CG2, the first plasma formation part PF1 may transform the first nozzle cleaning gas NCG1 into a radical form. Therefore, the nozzle group 200 can ensure the completeness of cleaning.

Fig. 10 is a sectional view illustrating a cleaning method according to still another embodiment of the present invention. In fig. 10, the same reference numerals as in fig. 3 denote the same components, and therefore, redundant description thereof will be omitted.

Referring to fig. 10, the nozzle set 200 may include a first nozzle part 210 and a second nozzle part 220, wherein the first nozzle part 210 may include a first nozzle unit 211 emitting a first source gas and a first exhaust part 213 disposed at an outer side of the first nozzle unit 211, and the second nozzle part 220 may include a second nozzle unit 221 emitting a second source gas and a second exhaust part 223 disposed at an outer side of the second nozzle unit 221.

The first exhaust part 213 may discharge the first cleaning gas CG 1. At this time, the second exhaust portion 223 may also discharge the second cleaning gas CG 2. That is, the first exhaust part 213 and the second exhaust part 223 can simultaneously discharge the purge gas. In this case, the first exhaust part 213, the second exhaust part 223, the third exhaust part 233, the fourth exhaust part 243, and the fifth exhaust part 253 may simultaneously discharge the purge gas. In some embodiments, at least one of the first exhaust portion 213 to the fifth exhaust portion 253 may discharge the discharged gas without discharging the purge gas. For example, the first exhaust part 213, the second exhaust part 223, the fourth exhaust part 243, and the fifth exhaust part 253 may discharge the purge gas, respectively, and the third exhaust part 233 may discharge the discharged gas.

Fig. 11 is a sectional view illustrating a cleaning method according to still another embodiment of the present invention. In fig. 11, the same reference numerals as in fig. 10 denote the same components, and therefore, redundant description thereof will be omitted.

Referring to fig. 11, the first exhaust part 213 may discharge the first cleaning gas CG 1. At this time, the second exhaust portion 223 may also discharge the second cleaning gas CG 2.

When the first exhaust part 213 emits the first cleaning gas CG1, the first nozzle unit 211 may emit the first nozzle cleaning gas NCG 1. Also, when the second exhaust part 223 discharges the second cleaning gas CG2, the second nozzle unit 221 may discharge the second nozzle cleaning gas NCG 2. For example, when the first to fifth exhaust parts 213 to 253 discharge the cleaning gas, respectively, the first to fifth nozzle units 211 to 251 may discharge the nozzle cleaning gas, respectively.

When the first exhaust unit 213 discharges the first cleaning gas CG1, the first nozzle cleaning gas NCG1 may be converted into a radical form. Specifically, the first nozzle cleaning gas NCG1 can be converted into a radical form by the first plasma formation part PF 1. When the second exhaust part 223 discharges the second purge gas CG2, the second nozzle purge gas NCG2 may be converted into a radical form. Specifically, the second nozzle cleaning gas NCG2 can be converted into a radical form by the second plasma formation part PF 2. For example, when the first to fifth exhaust parts 213 to 253 discharge the purge gas, respectively, the first to fifth nozzle units 211 to 251 may discharge the nozzle purge gas, respectively, and the first to fifth plasma formation parts PF1 to PF5 may convert the nozzle purge gas into radical forms, respectively.

In some embodiments, at least one of the first plasma formation part PF1 to the fifth plasma formation part PF5 may not convert the nozzle cleaning gas into a radical form. For example, the first plasma formation unit PF1, the second plasma formation unit PF2, the fourth plasma formation unit PF4, and the fifth plasma formation unit PF5 may convert the nozzle cleaning gas into a radical form, respectively, and the third plasma formation unit PF3 may not convert the first nozzle cleaning gas NCG1 into a radical form.

Fig. 12 is a comparative example different from the embodiment of the present invention. Fig. 13 is a graph comparing the cleaning rates of the example of the present invention and the comparative example.

Referring to FIG. 12, the nozzle group 200 may include first through fifth nozzle portions 210-1 through 250-1. The first to fifth nozzle portions 210-1 to 250-1 may include first to fifth nozzle units 211-1 to 251-1, respectively. The first to fifth nozzle portions 210-1 to 250-1 may include first to fifth exhaust portions 213-1 to 253-1, respectively. Since the first to fifth nozzle units 211-1 to 251-1 and the first to fifth exhaust parts 213-1 to 253-1 of fig. 12 are similar to the first to fifth nozzle units 211 to 251 and the first to fifth exhaust parts 213 to 253 of fig. 3 and 4, detailed description is omitted.

The first nozzle unit 211-1, the third nozzle unit 231-1, and the fifth nozzle unit 251-1 may discharge the first nozzle cleaning gas NCG 1. The second nozzle unit 221-1 and the fourth nozzle unit 241-1 may discharge the second nozzle cleaning gas NCG 2.

The first to fifth exhaust portions 213-1 to 253-1 may be connected with a regulation portion that regulates pressure. For example, first exhaust section 213-1 may be connected to first regulation section C1-1, second exhaust section 223-1 may be connected to second regulation section C2-1, third exhaust section 233-1 may be connected to third regulation section C3-1, fourth exhaust section 243-1 may be connected to fourth regulation section C4-1, and fifth exhaust section 253-1 may be connected to fifth regulation section C5-1. The first to fifth exhaust portions 213-1 to 253-1 do not discharge the purge gas.

Referring to fig. 13, the cleaning speed of the same comparative example as that of fig. 12 and the embodiment of the present invention can be compared. In this case, the case where the organic material formed in the nozzle portion is cleaned after the organic film is formed on the substrate by the manufacturing apparatus of the display device is compared. NF used as cleaning gas₃The organic substance may comprise SiOC_x。

Example 1 is the same Cleaning rate (Cleaning rate) as the comparative example shown in fig. 12. Under predetermined conditions, the cleaning rate of example 1 was

Example 2 is the cleaning speed of the embodiment of fig. 6 and 7. Under the same conditions as in example 1, the cleaning rate in example 2 wasThe cleaning speed of example 2 was increased to about 8 times the cleaning speed of example 1.

Example 3 is the cleaning speed of the embodiment of fig. 8 and 9. Under the same conditions as in example 1, the cleaning rate in example 3 wasThe cleaning speed of example 3 was increased to about 17 times the cleaning speed of example 1. The cleaning speed of example 3 was increased to about 2 times the cleaning speed of example 2.

Therefore, in the embodiment of the present invention, the cleaning gas can be discharged from at least one of the exhaust portions, so that the nozzle portion can be cleaned effectively.

As described above, although the present invention has been described with reference to one embodiment shown in the drawings, it is only exemplary, and those having ordinary knowledge in the art can understand that various modifications and variations of the embodiment can be made thereto. Therefore, the true technical scope of the present invention should be determined based on the technical idea of the claims.