阅读说明：本技术 一种异形玻璃掩膜版生产方法 (Production method of special-shaped glass mask ) 是由 荆学军 熊启龙 于 2020-07-06 设计创作，主要内容包括：本发明实施例涉及光刻技术领域,公开了一种异形玻璃掩膜版生产方法,该方法通过接收待生产掩膜版图形,通过CAM系统对所述待生产掩膜版图形进行处理；根据CAM系统的处理结果,对玻璃掩膜版进行常规工艺处理；对常规工艺处理后玻璃掩膜版进行异性工艺处理,则完成异性玻璃掩膜版生产进行包装出货,本发明实施例提供的异形玻璃掩膜版生产方法实现了异形玻璃掩膜版生产,尤其通过异形加工前的掩膜版保护和异形加工后的清洗,使得加工过程中不损坏掩膜版的功能。(The embodiment of the invention relates to the technical field of photoetching, and discloses a method for producing a special-shaped glass mask, which comprises the steps of receiving a mask graph to be produced, and processing the mask graph to be produced through a CAM system; carrying out conventional process treatment on the glass mask according to the processing result of the CAM system; the special-shaped glass mask production method provided by the embodiment of the invention realizes the production of the special-shaped glass mask, and particularly ensures that the mask is not damaged in the processing process through the protection of the mask before special-shaped processing and the cleaning after the special-shaped processing.)

1. A production method of a special-shaped glass mask is characterized by comprising the following steps:

receiving a mask pattern to be produced, and processing the mask pattern to be produced through a Computer Aided Manufacturing (CAM) system;

carrying out conventional process treatment on the glass mask according to the processing result of the CAM system;

and (4) carrying out the special-shaped process treatment on the glass mask plate treated by the conventional process, and then finishing the production of the special-shaped glass mask plate for packaging and shipment.

2. The method for producing a shaped glass mask according to claim 1, wherein the conventional process treatment comprises:

and sequentially carrying out the processes of exposure, development, etching, primary cleaning and drying, line distance measurement, defect scanning, repair, secondary cleaning and drying on the glass mask.

3. The method for producing a shaped glass mask according to claim 1, wherein the anisotropic process treatment comprises:

adding a protective film on the front and back sides of the glass mask plate treated by the conventional process by using a film sticking machine;

carrying out different-nature processing on the glass mask plate added with the protective film through different-nature processing equipment;

and finally, cleaning and checking the glass mask plate subjected to the anisotropic processing.

4. The shaped glass mask production method of claim 3, wherein the cleaning inspection comprises:

flushing the front and back surfaces of the glass mask plate treated by the anisotropic process by using high-flow ultrapure water for N minutes respectively, wherein N is more than or equal to 1;

putting the glass mask plate into a cleaning liquid tank to be soaked for M minutes, wherein M is more than or equal to 20;

washing the front side and the back side of the glass mask plate by using ultrapure water;

uniformly brushing the front side and the back side of the glass mask plate by using a cleaning brush;

and washing the front side and the back side of the glass mask plate by using ultrapure water, and drying.

Technical Field

The embodiment of the invention relates to the technical field of photoetching, in particular to a production method of a special-shaped glass mask.

Background

Photomask blanks (hereinafter referred to as reticles or glass reticles) are used to produce a structure for selective exposure of photoresist coatings in a variety of functional patterns and precisely positioned on a film, plastic or glass substrate material. The mask is widely used, and the mask is required to be used in the field related to the photolithography process, such as IC (Integrated Circuit), FPD (Flat Panel Display), PCB (Printed Circuit Boards), MEMS (Micro Electro Mechanical Systems), and the like.

The working characteristics of a platform of a mask plate photoetching machine have requirements on the thickness, the flatness, the chamfering and the chamfering of a mask plate substrate, the working principle of the mask plate photoetching machine is that graphic photoetching processing is carried out in the X/Y direction, and automatic focusing is required during moving photoetching, so that the appearance of a conventional mask plate is required to be a regular square material, such as a rectangle and a square. Meanwhile, due to the characteristics of part of industries, the substrate glass is required to be specially-shaped, for example, holes are punched on a mask; digging a groove on the surface of the mask plate; digging a circular groove on the surface of the mask plate; the shape of the conventional mask is changed by grooving the side surface of the mask and the like, however, the mask belongs to a precision product, the production of the conventional mask needs to be carried out under a purification condition, the general purification condition is required to be superior to Class 5 in ISO 14644-1, and the glass processed into a special shape is dusty and hard particles, so that the conflict exists.

Therefore, a production method of the special-shaped glass mask is needed to manufacture the special-shaped glass mask product so as to meet the customer requirements.

Disclosure of Invention

The embodiment of the invention mainly solves the technical problem of providing a production method of a special-shaped glass mask, and can solve the problem that the traditional photoetching machine cannot manufacture an opposite-shaped glass mask.

In order to solve the above technical problem, one technical solution adopted by the embodiments of the present invention is: the production method of the special-shaped glass mask comprises the following steps:

receiving a mask pattern to be produced, and processing the mask pattern to be produced through a Computer Aided Manufacturing (CAM) system;

carrying out conventional process treatment on the glass mask according to the processing result of the CAM system;

and (4) carrying out the special-shaped process treatment on the glass mask plate treated by the conventional process, and then finishing the production of the special-shaped glass mask plate for packaging and shipment.

Further, the conventional process treatment comprises:

and sequentially carrying out the processes of exposure, development, etching, primary cleaning and drying, line distance measurement, defect scanning, repair, secondary cleaning and drying on the glass mask.

Further, the anisotropic process treatment comprises:

adding a protective film on the front and back sides of the glass mask plate treated by the conventional process by using a film sticking machine;

carrying out different-nature processing on the glass mask plate added with the protective film through different-nature processing equipment;

and finally, cleaning and checking the glass mask plate subjected to the anisotropic processing.

Further, the cleaning check includes:

flushing the front and back surfaces of the glass mask plate treated by the anisotropic process by using high-flow ultrapure water for N minutes respectively, wherein N is more than or equal to 1;

putting the glass mask plate into a cleaning liquid tank to be soaked for M minutes, wherein M is more than or equal to 20;

washing the front side and the back side of the glass mask plate by using ultrapure water;

uniformly brushing the front side and the back side of the glass mask plate by using a cleaning brush;

and washing the front side and the back side of the glass mask plate by using ultrapure water, and drying.

The embodiment of the invention has the beneficial effects that: the method comprises the steps of receiving a mask graph to be produced, and processing the mask graph to be produced through a CAM system; carrying out conventional process treatment on the glass mask according to the processing result of the CAM system; the special-shaped glass mask production method provided by the embodiment of the invention realizes the production of the special-shaped glass mask, and particularly ensures that the mask is not damaged in the processing process through the protection of the mask before special-shaped processing and the cleaning after the special-shaped processing.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the embodiments of the present invention will be briefly described below. It is obvious that the drawings described below are only some embodiments of the invention, and that for a person skilled in the art, other drawings can be derived from them without inventive effort.

FIG. 1 is a flow chart of a method for manufacturing a shaped glass mask according to an embodiment of the present invention.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.

In addition, the technical features involved in the embodiments of the present invention described below may be combined with each other as long as they do not conflict with each other.

Referring to fig. 1, a flow chart of a method for producing a shaped glass mask is shown, which includes, but is not limited to, the following steps:

step 11: receiving a mask pattern to be produced, and processing the mask pattern to be produced through a Computer Aided Manufacturing (CAM) system.

In the embodiment of the invention, the computer aided manufacturing system processes the mask plate graph to be produced to form mask plate manufacturing data, data pre-exposure parameter setting and exposure data format conversion so as to control the later-stage whole production process of the glass mask plate.

Step 12: and carrying out conventional process treatment on the glass mask according to the processing result of the CAM system.

In an embodiment of the present invention, the conventional process treatment comprises: and sequentially carrying out the processes of exposure, development, etching, primary cleaning and drying, line distance measurement, defect scanning, repair, secondary cleaning and drying on the glass mask. The conventional process treatment is the processing of the common glass mask plate at present.

Step 13: and (4) carrying out the special-shaped process treatment on the glass mask plate treated by the conventional process, and then finishing the production of the special-shaped glass mask plate for packaging and shipment.

In an embodiment of the present invention, the anisotropic process treatment includes: adding a protective film on the front and back sides of the glass mask plate treated by the conventional process by using a film sticking machine; carrying out different-nature processing on the glass mask plate added with the protective film through different-nature processing equipment; and finally, cleaning and checking the glass mask plate subjected to the anisotropic processing. The manufacturing process of the glass mask is required to be carried out in a high-cleanliness cleaning workshop, and the glass mask can generate a large amount of dust when being processed into a special shape, so that the key processes of sticking a protective film, carrying out special-shape processing and cleaning and checking when the special-shape mask is manufactured are to realize the production of the special-shape glass mask, and particularly, the functions of the mask are not damaged in the processing process through the protection of the mask before the special-shape processing and the cleaning after the special-shape processing.

Wherein the cleaning check comprises: the front and back surfaces of the glass mask plate after the high-flow ultrapure water washing anisotropic process treatment are respectively 1 minute, and the time can be more than 1;

putting the glass mask plate into a cleaning solution tank to be soaked for 20 minutes, wherein the time can be more than 20;

washing the front side and the back side of the glass mask plate by using ultrapure water;

uniformly brushing the front side and the back side of the glass mask plate by using a cleaning brush;

and washing the front side and the back side of the glass mask plate by using ultrapure water, and drying.

The embodiment of the invention provides a method for producing a special-shaped glass mask, which comprises the steps of receiving a mask graph to be produced, and processing the mask graph to be produced through a CAM system; carrying out conventional process treatment on the glass mask according to the processing result of the CAM system; the special-shaped glass mask production method provided by the embodiment of the invention realizes the production of the special-shaped glass mask, and particularly ensures that the mask is not damaged in the processing process through the protection of the mask before special-shaped processing and the cleaning after the special-shaped processing.

Through the above description of the embodiments, those skilled in the art will clearly understand that each embodiment can be implemented by software plus a general hardware platform, and certainly can also be implemented by hardware. It will be understood by those skilled in the art that all or part of the processes of the methods of the embodiments described above can be implemented by hardware related to instructions of a computer program, which can be stored in a computer readable storage medium, and when executed, can include the processes of the embodiments of the methods described above. The storage medium may be a magnetic disk, an optical disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), or the like.

Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; within the idea of the invention, also technical features in the above embodiments or in different embodiments may be combined, steps may be implemented in any order, and there are many other variations of the different aspects of the invention as described above, which are not provided in detail for the sake of brevity; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.