Pretreatment device for substrate
阅读说明:本技术 一种基片的预处理装置 (Pretreatment device for substrate ) 是由 刘永 于 2020-07-04 设计创作,主要内容包括:本发明公开了一种基片的预处理装置,预处理箱的左侧壁上成型有预处理进料口、右侧壁上成型有预处理出料口;工艺箱的左侧壁上成型有工艺处理进出口;预处理箱的左端面上升降设置有左封闭板;工艺箱和预处理箱之间升降设置有右封闭板;预处理箱内设置有左右传递装置;左右传递装置包括上部的矩形框状的基片限位框和下部的矩形框状的左右移动框;左右移动框左右移动设置在预处理箱内;基片限位框左右移动设置在左右移动框的上端面上;左右移动框的左右侧壁之间成型有若干前后均匀分布的下支撑板。(The invention discloses a pretreatment device of a substrate.A pretreatment feeding hole is formed on the left side wall of a pretreatment box, and a pretreatment discharging hole is formed on the right side wall of the pretreatment box; a process treatment inlet and outlet is formed on the left side wall of the process box; a left closing plate is arranged on the left end face of the pretreatment tank in a lifting manner; a right closing plate is arranged between the process box and the pretreatment box in a lifting way; a left and a right transfer devices are arranged in the pretreatment box; the left and right transfer device comprises a rectangular frame-shaped substrate limiting frame at the upper part and a rectangular frame-shaped left and right moving frame at the lower part; the left and right moving frames are arranged in the pretreatment box in a left-right moving mode; the substrate limiting frame is arranged on the upper end surface of the left-right moving frame in a left-right moving mode; a plurality of lower supporting plates which are uniformly distributed front and back are formed between the left side wall and the right side wall of the left moving frame and the right moving frame.)
1. A pretreatment device for a substrate, characterized in that: comprises a pretreatment box (10) and a process box (20); the pretreatment tank (10) is positioned at the left side of the process tank (20); a temperature control unit is arranged on the inner top wall of the pretreatment box (10); the temperature control unit is used for heating or cooling the substrate (60); a pretreatment feeding hole (100) is formed in the left side wall of the pretreatment box (10), and a pretreatment discharging hole (101) is formed in the right side wall of the pretreatment box; a process treatment inlet and outlet (200) is formed on the left side wall of the process box (20); a left closing plate (30) is arranged on the left end surface of the pretreatment tank (10) in a lifting manner; the left closing plate (30) is used for sealing the pretreatment feeding hole (100); a right closing plate (41) is arranged between the process box (20) and the pretreatment box (10) in a lifting way; the right closing plate (41) is used for sealing the pretreatment discharge hole (101) and the process treatment inlet and outlet (200); a left and a right transfer devices (50) are arranged in the pretreatment box (10); the left-right transfer device (50) comprises a substrate limiting frame (55) in a rectangular frame shape at the upper part and a left-right moving frame (51) in a rectangular frame shape at the lower part; the left and right moving frame (51) is arranged in the pretreatment box (10) in a left and right moving way; the substrate limiting frame (55) is arranged on the upper end surface of the left and right moving frame (51) in a left-right moving mode; a plurality of lower supporting plates (511) which are uniformly distributed front and back are formed between the left side wall and the right side wall of the left moving frame (51) and the right moving frame; a loading and unloading device is arranged in the process box (20); the loading and unloading device is used for loading and unloading the substrate (60) of the left and right transfer device (50).
2. A pretreatment apparatus for a substrate according to claim 1, characterized in that: a pair of lower left and right driving racks (11) which are symmetrically arranged front and back are fixed between the lower ends of the left and right side walls of the pretreatment box (10); a lower guide bar (12), a left guide bar and a right guide bar are respectively formed on the front side wall and the rear side wall of the pretreatment box (10); the front end surface and the rear end surface of the left-right moving frame (51) are respectively provided with a left-right guide groove matched with the left-right guide strip (12); a lower left driving motor (52) and a lower right driving motor (52) are fixed on the left end surface of the left and right moving frame (51); a lower left driving rod (53) and a lower right driving rod (53) are pivoted between the left side wall and the right side wall of the left moving frame (51) and the right moving frame; the left end of the lower left and right driving rod (53) is fixedly connected with the output shaft of the lower left and right driving motor (52); the left part and the right part of the lower left and right driving rod (53) are respectively fixed with a driving worm (531); a driven central column (512) is respectively pivoted between the left end and the right end of the front side wall and the rear side wall of the left-right moving frame (51); a worm wheel (56) is fixed at the center of the driven central column (512); the worm wheel (56) is meshed with the driving worm (531) on the corresponding side; driven gears (54) are respectively fixed at the front end and the rear end of the driven central column (512); the driven gear (54) is meshed with the lower left and right driving racks (11) on the corresponding side.
3. A pretreatment apparatus for a substrate according to claim 1 or 2, characterized in that: front and rear stop plates are respectively formed at the front and rear ends of the upper end surface of the left and right moving frame (51); an upper left and right driving rack (513) is formed on the front and rear blocking plates; the substrate limiting frame (55) is positioned between the pair of front and rear blocking plates; the centers of the front end surface and the rear end surface of the substrate limiting frame (55) are respectively fixed with an upper driving motor; an upper driving gear (551) is fixed on an output shaft of the upper driving motor; the upper driving gear (551) is meshed with the upper left and right driving racks (513) on the corresponding side.
4. A pretreatment apparatus for a substrate according to claim 1, characterized in that: a central isolation chamber (40) is arranged between the pretreatment box (10) and the process box (20); a central isolation chamber (40) surrounding the gap between the pretreatment tank (10) and the process tank (20); the right closing plate (41) is located inside the central compartment (40).
5. A pretreatment apparatus for a substrate according to claim 1, characterized in that: the loading and unloading device comprises an loading and unloading cylinder (21); the feeding and discharging cylinder (21) is fixed on the upper end surface of the process box (20); a suction cup (22) is fixed at the lower end of a piston rod of the loading and unloading cylinder (21); the sucker (22) is positioned in the process box (20); a workbench (24) is arranged on the lower part of the process box (20) in a left-right moving manner; the upper end surface of the worktable (24) is lower than the lower end surface of the left and right moving frames (51).
6. A pretreatment apparatus for a substrate according to claim 5, characterized in that: a horizontally arranged centering cylinder (23) is fixed at the lower end of the right side wall of the process box (20); the workbench (24) is L-shaped; the vertical part of the workbench (24) is positioned at the left end of the horizontal part thereof; the vertical part of the workbench (24) is fixed at the left end of the piston rod of the centering cylinder (23).
Technical Field
The invention relates to the technical field of substrate pretreatment, in particular to a pretreatment device for a substrate.
Background
In the production process of products such as solar cells, liquid crystal display screens and the like, a workpiece which is used for carrying a plurality of silicon wafers for process coating or is called a substrate is subjected to process coating. The substrate is generally a thin plate-like object having a thickness dimension smaller than the web dimension, and a complete process is completed.
Generally, there are different temperature requirements on the substrate at different stages of the cell production process. For example, in a conventional PECVD coating process, the temperature of the process and the process chamber is usually maintained above 200 ℃, while the temperature of the substrate in the ambient atmosphere is generally only about 20 ℃. At this time, if the substrate can be reasonably preheated, the temperature of the substrate is raised to a certain value, so that the thermal stress and thermal deformation of the substrate caused by large temperature difference after the substrate is sent into the process chamber can be reduced, the temperature uniformity of the substrate can be effectively improved, the substrate can be prevented from being cracked or damaged, and the process effect can be improved.
For example, after a certain process is completed, the substrate needs to be taken out of the equipment, and at this time, the substrate will have a high temperature close to about 200 ℃, and if the substrate is taken out of the equipment directly, the substrate is not only dangerous at high temperature, unfavorable for operation and easy to cause accidents, but also easily causes cracks of a process film, cracks or damages of the substrate and the like due to thermal stress and thermal deformation caused by a large temperature difference when the substrate is directly exposed to the atmospheric environment at high temperature. In addition, the high-temperature substrate is easy to react with oxygen, moisture and the like in the atmosphere to directly influence the process result. Therefore, it is necessary to cool the substrate reasonably and take it out of the apparatus after the process.
In view of the above situation, in the prior art, a preheating chamber or a cooling chamber is often added to a vacuum apparatus to achieve a temperature adjustment function, or temperature control and a loading chamber may be combined together. However, in either of the above-mentioned methods, it is necessary to add a separate transfer chamber between the loading chamber and the process chamber, which results in an increase in the footprint of the apparatus.
Disclosure of Invention
The invention aims to solve the technical problem that the existing substrate pretreatment structure occupies large space, and provides a substrate pretreatment device.
The technical scheme for solving the technical problems is as follows: a pretreatment device of a substrate comprises a pretreatment box and a process box; the pretreatment box is positioned on the left side of the process box; the inner top wall of the pretreatment box is provided with a temperature control unit; the temperature control unit is used for heating or cooling the substrate; a pretreatment feeding hole is formed in the left side wall of the pretreatment box, and a pretreatment discharging hole is formed in the right side wall of the pretreatment box; a process treatment inlet and outlet is formed on the left side wall of the process box; a left closing plate is arranged on the left end face of the pretreatment tank in a lifting manner; the left closing plate is used for sealing the pretreatment feeding hole; a right closing plate is arranged between the process box and the pretreatment box in a lifting way; the right closing plate is used for sealing the pretreatment discharge port and the process treatment inlet and outlet; a left and a right transfer devices are arranged in the pretreatment box; the left and right transfer device comprises a rectangular frame-shaped substrate limiting frame at the upper part and a rectangular frame-shaped left and right moving frame at the lower part; the left and right moving frames are arranged in the pretreatment box in a left-right moving mode; the substrate limiting frame is arranged on the upper end surface of the left-right moving frame in a left-right moving mode; a plurality of lower supporting plates which are uniformly distributed front and back are formed between the left side wall and the right side wall of the left moving frame and the right moving frame; a loading and unloading device is arranged in the process box; the loading and unloading device is used for loading and unloading the substrates of the left and right transfer devices.
Preferably, a pair of lower left and right driving racks symmetrically arranged in front and back is fixed between the lower ends of the left and right side walls of the pretreatment tank; the front and rear side walls of the pretreatment box are respectively provided with a lower left guide bar and a lower right guide bar; the front end surface and the rear end surface of the left and right moving frame are respectively provided with a left guide groove and a right guide groove which are matched with the left guide bar and the right guide bar; a lower left driving motor and a lower right driving motor are fixed on the left end surface of the left and right moving frame; a lower left driving rod and a lower right driving rod are pivoted between the left side wall and the right side wall of the left moving frame and the right moving frame; the left end of the lower left and right driving rod is fixedly connected with the output shaft of the lower left and right driving motor; the left part and the right part of the lower left and right driving rods are respectively fixed with a driving worm; a driven central column is respectively pivoted between the left end and the right end of the front side wall and the rear side wall of the left moving frame and the right moving frame; a worm wheel is fixed in the center of the driven central column; the worm wheel is meshed with the driving worm on the corresponding side; driven gears are respectively fixed at the front end and the rear end of the driven central column; the driven gear is meshed with the lower left and right driving racks on the corresponding side.
Preferably, the front and rear ends of the upper end surface of the left and right moving frames are respectively formed with a front and rear blocking plate; the front and rear blocking plates are formed with upper left and right driving racks; the substrate limiting frame is positioned between the pair of front and rear blocking plates; the centers of the front end surface and the rear end surface of the substrate limiting frame are respectively fixed with an upper driving motor; an upper driving gear is fixed on an output shaft of the upper driving motor; the upper driving gear is meshed with the upper left and right driving racks on the corresponding side.
Preferably, a central isolation chamber is arranged between the pretreatment box and the process box; the central isolation chamber surrounds the gap between the pretreatment box and the process box; the right closing plate is positioned in the central isolation chamber.
Preferably, the feeding and discharging device comprises a feeding and discharging cylinder; the feeding and discharging cylinder is fixed on the upper end surface of the process box; a sucker is fixed at the lower end of a piston rod of the feeding and discharging cylinder; the sucker is positioned in the process box; a workbench is arranged on the lower part of the process box in a left-right moving manner; the upper end surface of the workbench is lower than the lower end surface of the left and right moving frame.
Preferably, a horizontally arranged center cylinder is fixed at the lower end of the right side wall of the process box; the workbench is L-shaped; the vertical part of the workbench is positioned at the left end of the horizontal part of the workbench; the vertical part of the workbench is fixed at the left end of the piston rod of the cylinder in the middle.
The invention has the beneficial effects that: the structure is simple, the substrate is effectively conveyed, but the occupied space is small, and the substrate is effectively heated or cooled.
Drawings
FIG. 1 is a schematic structural view of a cross section at the time of feeding of the present invention;
FIG. 2 is a schematic structural view of a cross section in pretreatment according to the present invention;
FIG. 3 is a schematic structural view of a section of the present invention as it passes to the
fig. 4 is a schematic plan view of the left-
In the figure, 10, pretreatment tank; 100. pretreating a feed inlet; 101. pretreating a discharge hole; 11. a lower left and right drive rack; 12. a lower left guide bar and a lower right guide bar; 20. a process box; 200. an inlet and an outlet for process treatment; 21. a feeding and discharging cylinder; 22. a suction cup; 23. a centering cylinder; 24. a work table; 30. a left closure plate; 40. a central isolation chamber; 41. a right closure plate; 50. a left and right transfer device; 51. moving the frame left and right; 511. a lower support plate; 512. a driven center post; 513. an upper left and right driving rack; 52. a lower left and right driving motor; 53. a lower left and right drive rod; 531. a drive worm; 54. a driven gear; 55. a substrate limiting frame; 551. an upper drive gear; 56. a worm gear; 60. a substrate.
Detailed Description
As shown in fig. 1 to 4, a substrate pretreatment apparatus includes a
As shown in fig. 1 to 4, a pair of lower left and right driving racks 11 symmetrically arranged in front and back are fixed between the lower ends of the left and right side walls of the
As shown in fig. 1 to 4, front and rear stoppers are formed on the front and rear ends of the upper end surface of the left and right moving
As shown in fig. 1 to 4, a
As shown in fig. 1 to 4, the loading and unloading device comprises a loading and unloading
As shown in fig. 1 to 4, a horizontally arranged centering
The working principle of the substrate pretreatment device;
when feeding, as shown in fig. 1, the
then the
then the
after processing, the
this effectively transfers the substrate but occupies a small space, and the heating or cooling of the substrate is effectively performed.
The above description is only a preferred embodiment of the present invention, and for those skilled in the art, the present invention should not be limited by the description herein, since various changes and modifications can be made in the details of the embodiment and the application range according to the spirit of the present invention.
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