阅读说明：本技术 可去除径向力的旋转装置、加热器旋转系统及半导体设备 (Rotary device capable of removing radial force, heater rotary system and semiconductor equipment ) 是由 潘学勤 李中云 宋维聪 于 2020-07-20 设计创作，主要内容包括：本发明提供一种可去除径向力的旋转装置、加热器旋转系统及半导体设备。旋转装置包括固定板、马达、第一同步轮、第二同步轮、第三同步轮及同步带；固定板上设置有通孔；第一同步轮、第二同步轮及第三同步轮均设置于固定板的第一表面,第二同步轮的轴孔与通孔相对应；第一同步轮和第三同步轮位于第二同步轮的相对两侧,且三者的中心点位于同一水平线上；马达与第三同步轮相连接,同步带绕设于第一同步轮、第二同步轮及第三同步轮上,待旋转件的旋转轴穿过固定板的通孔及第二同步轮的轴孔,且与第二同步轮相连接。本发明可以有效避免待旋转件及与待旋转件相连接的配件因受到径向力的作用而发生损坏变形,延长设备的使用寿命、降低生产成本。(The invention provides a rotating device capable of removing radial force, a heater rotating system and a semiconductor device. The rotating device comprises a fixing plate, a motor, a first synchronous wheel, a second synchronous wheel, a third synchronous wheel and a synchronous belt; the fixing plate is provided with a through hole; the first synchronizing wheel, the second synchronizing wheel and the third synchronizing wheel are all arranged on the first surface of the fixing plate, and the shaft hole of the second synchronizing wheel corresponds to the through hole; the first synchronizing wheel and the third synchronizing wheel are positioned at two opposite sides of the second synchronizing wheel, and the central points of the first synchronizing wheel and the third synchronizing wheel are positioned on the same horizontal line; the motor is connected with the third synchronizing wheel, the synchronous belt is wound on the first synchronizing wheel, the second synchronizing wheel and the third synchronizing wheel, and the rotating shaft of the rotating piece penetrates through the through hole of the fixing plate and the shaft hole of the second synchronizing wheel and is connected with the second synchronizing wheel. The invention can effectively avoid the damage and deformation of the part to be rotated and the accessory connected with the part to be rotated due to the action of radial force, prolong the service life of equipment and reduce the production cost.)

1. A rotary device capable of removing radial forces, comprising: the device comprises a fixing plate, a motor, a first synchronous wheel, a second synchronous wheel, a third synchronous wheel and a synchronous belt; the fixing plate is provided with a first surface and a second surface opposite to the first surface, and a through hole is formed in the fixing plate; the first synchronizing wheel, the second synchronizing wheel and the third synchronizing wheel are all arranged on the first surface of the fixing plate, and a shaft hole of the second synchronizing wheel corresponds to the through hole in the fixing plate; the first synchronizing wheel and the third synchronizing wheel are positioned on two opposite sides of the second synchronizing wheel, and the center points of the first synchronizing wheel, the second synchronizing wheel and the third synchronizing wheel are positioned on the same horizontal line; the motor with the third synchronizing wheel is connected, the hold-in range is around locating on first synchronizing wheel, second synchronizing wheel and the third synchronizing wheel, just the hold-in range is tight state that rises, treats that the rotation axis of rotating member passes the through-hole of fixed plate and the shaft hole of second synchronizing wheel, and with the second synchronizing wheel is connected.

2. The rotary device of claim 1, wherein: the diameter of the second synchronizing wheel is larger than the diameters of the first synchronizing wheel and the third synchronizing wheel.

3. The rotary device of claim 2, wherein: the diameters of the first synchronizing wheel and the third synchronizing wheel are the same, and the distance between the second synchronizing wheel and the first synchronizing wheel is equal to the distance between the second synchronizing wheel and the third synchronizing wheel.

4. The rotary device of claim 1, wherein: the rotating device further comprises a first support, the first support comprises a bending portion and a straight portion, one end of the bending portion is connected with the side face of the fixing plate, the other end of the bending portion extends to the position below the first synchronizing wheel, one end of the straight portion is connected with the bending portion, and the other end of the straight portion penetrates through a shaft hole of the first synchronizing wheel until the other end of the straight portion is connected with the first surface of the fixing plate.

5. The rotary device of claim 1, wherein: the rotating device further comprises a fixing frame, the fixing frame is located between the motor and the fixing plate and located on the periphery of the third synchronizing wheel, and the fixing frame connects the motor and the fixing plate.

6. The rotary device of claim 5, wherein: the rotating device further comprises a second support and a tensioning screw, the second support is located on the first surface of the fixing plate and located on one side, away from the second synchronizing wheel, of the fixing frame, and the tensioning screw is connected between the second support and the fixing frame.

7. A heater rotating system, comprising a heater and the rotating device according to any one of claims 1 to 6, wherein the heater comprises a bearing table and a rotating shaft connected to the bottom of the bearing table, the rotating shaft of the heater passes through the through hole and the shaft hole of the second synchronizing wheel from the second surface of the fixing plate, and the rotating shaft of the heater is connected to the second synchronizing wheel.

8. A semiconductor device comprising a chamber, a heater and the rotating device according to any one of claims 1 to 6, wherein the rotating device is located at the bottom of the chamber, the heater comprises a bearing table and a rotating shaft connected to the bottom of the bearing table, the rotating shaft of the heater extends from the inside to the outside of the chamber and sequentially passes through the through hole of the fixing plate and the shaft hole of the second synchronizing wheel, and the rotating shaft of the heater is connected to the second synchronizing wheel.

9. The semiconductor device according to claim 8, wherein: the semiconductor equipment further comprises a heater lifting assembly, the heater lifting assembly is located between the rotating device and the chamber, and the heater lifting assembly is connected with both the chamber and the rotating device.

10. The semiconductor device according to claim 8 or 9, characterized in that: the chamber includes one of a physical vapor deposition chamber and a chemical vapor deposition chamber.

Technical Field

The present invention relates to the field of semiconductor manufacturing equipment, and more particularly, to a rotary device capable of removing radial force, a heater rotary system, and a semiconductor device.

Background

A heater is a widely used component in a semiconductor manufacturing apparatus such as a thin film deposition apparatus. The heater usually includes the plummer and the bracing piece (also be the rotation axis) that is connected with the bottom surface of plummer, and the rotation through the bracing piece drives the plummer rotatory, drives the base plate rotation that is located on the plummer from this, can effectively improve the homogeneity of heating the base plate, and then improves the homogeneity of film deposition. The existing heater rotating equipment has the problem that the supporting rod is acted by radial force. During long-term rotation operation, the heater is easy to generate large deflection due to the influence of radial force, and the diameter of the support rod is usually small, so the heater is easy to wear and deform under the condition of receiving alternating load radial force for a long time, and further other parts of the heater and other structures of equipment connected with the heater are damaged. For example, in a thin film deposition apparatus, a support rod of a heater needs to penetrate through a bottom plate of a chamber and extend out of the chamber, and the support rod and the chamber are usually sealed by a magnetic fluid to ensure that the support rod can still normally rotate under the condition that the chamber meets the requirement of vacuum degree. However, the gap between the magnetic fluid and the magnetic fluid is very small, and the radial force generated by the long-term rotation of the heater easily causes the deformation and leakage of the magnetic fluid, so that the pollution of equipment and the reduction of the service life of the equipment are easily caused, and the production cost is increased.

Disclosure of Invention

In view of the above-mentioned drawbacks of the prior art, an object of the present invention is to provide a rotating device capable of removing a radial force, a heater rotating system and a semiconductor device, which are used to solve the problems in the prior art that, during a long-term rotation operation of a support rod of a heater, the radial force causes damage and deformation of parts of the heater and other structures of the device connected to the heater, which results in a reduction in the service life of the device, a contamination of the device, and an increase in the production cost.

In order to achieve the above and other related objects, the present invention provides a rotary device capable of removing radial force, including a fixed plate, a motor, a first synchronous pulley, a second synchronous pulley, a third synchronous pulley and a synchronous belt; the fixing plate is provided with a first surface and a second surface opposite to the first surface, and a through hole is formed in the fixing plate; the first synchronizing wheel, the second synchronizing wheel and the third synchronizing wheel are all arranged on the first surface of the fixing plate, and a shaft hole of the second synchronizing wheel corresponds to the through hole in the fixing plate; the first synchronizing wheel and the third synchronizing wheel are positioned on two opposite sides of the second synchronizing wheel, and the center points of the first synchronizing wheel, the second synchronizing wheel and the third synchronizing wheel are positioned on the same horizontal line; the motor with the third synchronizing wheel is connected, the hold-in range is around locating on first synchronizing wheel, second synchronizing wheel and the third synchronizing wheel, just the hold-in range is tight state that rises, treats that the rotation axis of rotating member passes the through-hole of fixed plate and the shaft hole of second synchronizing wheel, and with the second synchronizing wheel is connected.

Optionally, the diameter of the second synchronizing wheel is larger than the diameter of the first synchronizing wheel and the third synchronizing wheel.

Optionally, the diameters of the first synchronizing wheel and the third synchronizing wheel are the same, and the distance between the second synchronizing wheel and the first synchronizing wheel is equal to the distance between the second synchronizing wheel and the third synchronizing wheel.

Optionally, the rotating device further includes a first bracket, the first bracket includes a bending portion and a linear portion, one end of the bending portion is connected to the side surface of the fixing plate, the other end of the bending portion extends to the lower side of the first synchronizing wheel, one end of the linear portion is connected to the bending portion, and the other end of the linear portion penetrates through the shaft hole of the first synchronizing wheel until the linear portion is connected to the first surface of the fixing plate.

Optionally, the rotating device further includes a fixing frame, the fixing frame is located between the motor and the fixing plate and located at the periphery of the third synchronizing wheel, and the fixing frame connects the motor and the fixing plate.

Optionally, the rotating device further includes a second bracket and a tensioning screw, the second bracket is located on the first surface of the fixing plate and located on a side of the fixing frame away from the second synchronizing wheel, and the tensioning screw is connected between the second bracket and the fixing frame.

In order to achieve the above and other related objects, the present invention further provides a heater rotating system, which includes a heater and a rotating device as described in any one of the above aspects, wherein the heater includes a bearing platform and a rotating shaft connected to a bottom of the bearing platform, the rotating shaft of the heater passes through the through hole and the shaft hole of the second synchronizing wheel from the second surface of the fixing plate, and the rotating shaft of the heater is connected to the second synchronizing wheel.

In order to achieve the above and other related objects, the present invention further provides a semiconductor device, which includes a chamber, a heater and the rotating device according to any one of the above aspects, wherein the rotating device is located at the bottom of the chamber, the heater includes a bearing table and a rotating shaft connected to the bottom of the bearing table, the rotating shaft of the heater extends from the inside of the chamber to the outside and sequentially passes through the through hole of the fixing plate and the shaft hole of the second synchronizing wheel, and the rotating shaft of the heater is connected to the second synchronizing wheel.

Optionally, the semiconductor apparatus further comprises a heater lifting assembly, the heater lifting assembly is located between the rotating device and the chamber, and the heater lifting assembly is connected with both the chamber and the rotating device.

Optionally, the chamber comprises one of a physical vapor deposition chamber and a chemical vapor deposition chamber.

As described above, the rotating device, the heater rotating system and the semiconductor apparatus capable of removing radial force according to the present invention have the following advantageous effects: the improved structure design of the invention is that three synchronous wheels with three central points positioned on the same horizontal line are arranged to drive the synchronous belt, the rotating shaft of a member to be rotated (such as a heater) is connected with the synchronous wheel positioned in the middle, when a motor drives one of the synchronous wheels to rotate, the synchronous belt is stretched and tightened to clamp the synchronous wheel in the middle, and the radial forces acting on the synchronous wheel in the middle on two sides of the synchronous belt are exactly counteracted oppositely, so that the member to be rotated and the accessory connected with the member to be rotated are effectively prevented from being damaged and deformed due to the action of the radial force, the service life of the equipment can be effectively prolonged, the pollution of the equipment is reduced, and the production cost is reduced.

Drawings

Fig. 1 to 3 are schematic structural diagrams of a rotating device capable of removing radial force according to a first embodiment of the invention, which are presented from different directions.

Fig. 4 and 5 are schematic structural diagrams of a semiconductor device according to a second embodiment of the invention from different directions.

Description of the element reference numerals

11-a fixed plate; 12-a motor; 13-a first synchronizing wheel; 14-a second synchronizing wheel; 141-axle hole; 15-a third synchronizing wheel; 16-a synchronous belt; 17-a first scaffold; 171-a bend section; 172-linear portion; 18-a holder; 19-a second scaffold; 20-tensioning screws; 21-a chamber; 22-a heater lifting assembly; 23-a cylinder; 24-magnetic fluid.

Detailed Description

The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will become apparent to those skilled in the art from the present disclosure.

Please refer to fig. 1 to 5. It should be understood that the structures, ratios, sizes, and the like shown in the drawings and described in the specification are only used for matching with the disclosure of the specification, so as to be understood and read by those skilled in the art, and are not used to limit the conditions under which the present invention can be implemented, so that the present invention has no technical significance, and any structural modification, ratio relationship change, or size adjustment should still fall within the scope of the present invention without affecting the efficacy and the achievable purpose of the present invention. In addition, the terms such as "upper", "lower", "left", "right", "middle" and "one" used in the present specification are for clarity of description, and are not intended to limit the scope of the present invention, and changes or modifications of the relative relationship may be made without substantial technical changes.