阅读说明：本技术 一种led用单晶硅片清洗设备 (Monocrystalline silicon piece cleaning equipment for LED ) 是由 马光辉 尤业明 于 2019-08-22 设计创作，主要内容包括：本发明公开了一种LED用单晶硅片清洗设备,包括带支脚的工作台,所述工作台的顶部靠近其一端处设有高温烘烧箱,工作台的顶部位于其另一端处设有由驱动组件驱动的旋转清洗筒,工作台的顶部位于高温烘烧箱和旋转清洗筒之间设有冷却区,所述冷却区的上方设有位于工作台的一侧的其置于地面上的喷水组件,所述旋转清洗筒的上方设有位于工作台的一侧的其置于地面上的盛装筒起吊组件；本发明由于在清洗前将单晶硅片先置于高温烘烧箱内加热,使单晶硅片表面的贴覆的贴纸或者有机物燃烧掉,烘烧后采用冷却水进行冷却的同时又进行了初次清洗,经酸洗和两次水洗后达到将单晶硅片清洗干净的目的,且清洗效率高。(The invention discloses monocrystalline silicon wafer cleaning equipment for an LED (light-emitting diode), which comprises a workbench with support legs, wherein a high-temperature baking box is arranged at the top of the workbench close to one end of the workbench, a rotary cleaning barrel driven by a driving assembly is arranged at the top of the workbench at the other end of the workbench, a cooling area is arranged at the top of the workbench between the high-temperature baking box and the rotary cleaning barrel, a water spraying assembly which is arranged on the ground and is positioned at one side of the workbench is arranged above the cooling area, and a containing barrel hoisting assembly which is arranged on the ground and is positioned at one side of the workbench is arranged above the rotary cleaning barrel; according to the invention, the monocrystalline silicon wafer is firstly placed in the high-temperature baking box for heating before cleaning, so that the sticker or organic matter stuck on the surface of the monocrystalline silicon wafer is burnt, cooling is carried out by using cooling water after baking, primary cleaning is carried out simultaneously, the aim of cleaning the monocrystalline silicon wafer is achieved after acid cleaning and twice water cleaning, and the cleaning efficiency is high.)

1. The utility model provides a monocrystalline silicon piece cleaning equipment for LED, includes the workstation of taking the stabilizer blade, its characterized in that: the top of workstation is close to its one end department and is equipped with high temperature stoving case, and the top of workstation is located its other end department and is equipped with the rotary cleaning tube by drive assembly driven, and the top of workstation is located and is equipped with the cooling zone between high temperature stoving case and the rotary cleaning tube, the top in cooling zone is equipped with its subaerial water spray assembly of arranging in that is located one side of workstation, the top of rotary cleaning tube is equipped with its subaerial splendid attire section of thick bamboo of arranging in that is located one side of workstation and lifts by crane the subassembly.

2. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 1, wherein: the high-temperature baking box comprises a box body, a transverse drawing component is arranged at the top of the box body, a longitudinal drawing component is arranged on one side of the box body, a plurality of heating pipes are arranged at the positions, located at the bottom, of the inside of the box body, and a porous material guide plate which is located inside the box body and inclines to one side of the longitudinal drawing component is arranged above the heating pipes.

3. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 2, wherein: the horizontal drawing component comprises horizontal sliding grooves which are fixed at the top of the box body and symmetrically arranged, the horizontal sliding grooves are connected with horizontal drawing plates in a sliding mode, the vertical drawing components are fixed on the side wall of the box body and symmetrically arranged vertical sliding grooves, and the horizontal sliding grooves are connected with vertical drawing plates in a sliding mode.

4. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 1, wherein: the rotary cleaning barrel comprises a barrel body, and the inside of the barrel body is divided into an acid washing area, a primary water washing area and a secondary water washing area by a dividing piece.

5. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 1, wherein: the driving assembly comprises a gear ring fixed on the outer wall of the cylinder body, and a gear driven by a motor is meshed on the gear ring.

6. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 1, wherein: the cooling area comprises a notch formed in the workbench, a cooling plate with a hole is installed in the notch, and a water receiving tank arranged on the ground is arranged below the cooling plate.

7. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 1, wherein: the water spraying assembly comprises a cooling water tank, a water guide pipe with a pump body is arranged at the top of the cooling water tank, and the tail end of the water guide pipe is connected with a water spraying pipe through an elbow.

8. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 1, wherein: the loading barrel hoisting assembly comprises a base arranged on the ground, a telescopic rod is installed on the base, the tail end of the telescopic rod is connected with a hoisting rod through a bent rod, the tail end of the hoisting rod is located at the bottom of the hoisting rod and is provided with a mounting ring, and a loading barrel is hung on the mounting ring.

9. The apparatus for cleaning a monocrystalline silicon wafer for an LED according to claim 8, wherein: the containing cylinder comprises a hollowed-out cylinder body, a cross beam is arranged at the top of the hollowed-out cylinder body, and a hanging ring is arranged at the center of the top of the cross beam.

Technical Field

The invention relates to monocrystalline silicon wafer cleaning equipment for an LED, and belongs to the technical field of LED processing equipment.

Background

Monocrystalline silicon is a relatively active non-metallic element, is an important component of crystal materials, and is in the front of the development of new materials. The monocrystalline silicon can be used as a semiconductor material and used for solar photovoltaic power generation, heat supply and the like, the monocrystalline silicon can be used for the production and deep processing manufacture of diode-level, rectifier device-level, circuit-level and solar cell-level monocrystalline products, the subsequent product integrated circuit and semiconductor separation device are widely applied to various fields and also play an important role in military electronic equipment, and when the monocrystalline silicon is used for an LED, a series of processing treatments are needed, most importantly, the monocrystalline silicon rod raw material is cut into monocrystalline silicon wafers, and then the monocrystalline silicon wafers are subjected to a cleaning procedure. Therefore, the cleaning equipment for the monocrystalline silicon wafer for the LED is provided.

Disclosure of Invention

The invention mainly aims to provide a cleaning device for a monocrystalline silicon wafer for an LED, which can effectively solve the problems in the background technology.

In order to achieve the purpose, the invention adopts the technical scheme that:

the utility model provides a monocrystalline silicon piece cleaning equipment for LED, is including the workstation of taking the stabilizer blade, the top of workstation is close to its one end department and is equipped with the high temperature case of drying by the fire, and the top of workstation is located its other end department and is equipped with the rotary cleaning tube by drive assembly driven, and the top of workstation is located and is equipped with the cooling space between high temperature case of drying by the fire and the rotary cleaning tube, the top of cooling space is equipped with its subaerial water spray assembly of arranging in that is located one side of workstation, the top of rotary cleaning tube is equipped with its subaerial splendid attire section of thick bamboo of arranging in that is located one side of workstation and.

Furthermore, the high-temperature baking oven comprises a box body, a transverse drawing component is arranged at the top of the box body, a longitudinal drawing component is arranged on one side of the box body, a plurality of heating pipes are arranged at the positions, located at the bottom, of the inside of the box body, and a porous material guide plate which is located inside the box body and inclines to one side of the longitudinal drawing component is arranged above the heating pipes.

Further, horizontal pull subassembly is including being fixed in the horizontal spout of just symmetry setting at box top, the sliding connection has horizontal pull board in the horizontal spout, indulge the pull subassembly all including the vertical spout that is fixed in the box lateral wall and the symmetry sets up, the sliding connection has vertical pull board in the horizontal spout.

Further, the rotary cleaning barrel comprises a barrel body, and the inside of the barrel body is divided into an acid washing area, a primary water washing area and a secondary water washing area by a dividing piece.

Furthermore, the driving assembly comprises a gear ring fixed on the outer wall of the cylinder body, and a gear driven by a motor is meshed on the gear ring.

Furthermore, the cooling area comprises a notch formed in the workbench, a cooling plate with a hole is installed in the notch, and a water receiving tank arranged on the ground is arranged below the cooling plate.

Furthermore, the water spray assembly comprises a cooling water tank, a water guide pipe with a pump body is arranged at the top of the cooling water tank, and the tail end of the water guide pipe is connected with a water spray pipe through an elbow.

Further, the containing barrel hoisting assembly comprises a base arranged on the ground, a telescopic rod is installed on the base, the tail end of the telescopic rod is connected with a hoisting rod through a bent rod, the tail end of the hoisting rod is located at the bottom of the hoisting rod and is provided with a mounting ring, and a containing barrel is hung on the mounting ring.

Further, the splendid attire section of thick bamboo includes the fretwork barrel, the top of fretwork barrel is equipped with the crossbeam, the top of crossbeam is located its central department and is equipped with rings.

When the cleaning device is used, the transverse pulling plate is pulled out, a monocrystalline silicon piece to be cleaned is put into the box body and is positioned on the porous guide plate, the transverse pulling plate is closed, the temperature of the heating pipe is adjusted to 200-300 ℃, the heating pipe is closed after the monocrystalline silicon piece is prevented for a period of time in the box body, the longitudinal pulling plate is pulled out, the monocrystalline silicon piece slides to the cooling plate along the porous guide plate, the pump body is opened to carry out water dispersion cooling and primary cleaning on the monocrystalline silicon piece, sewage flows into the water receiving box, the monocrystalline silicon piece is placed in the containing barrel after cooling is finished, the containing barrel is placed in the pickling area through lowering the telescopic rod, pickling is carried out after the cooling is finished, the telescopic rod rises after the containing barrel is lifted, the motor drives the toothed ring to rotate 120 degrees, the motor stops working to enable the primary washing area to be positioned under the containing barrel, the telescopic rod descends to place the containing barrel in the primary washing area for primary washing, the telescopic rod rises after primary washing is The motor stops working to enable the secondary water washing area to be located right below the containing barrel, the telescopic rod descends to enable the containing barrel to be placed in the secondary water washing area to be washed for secondary water washing and then to be lifted up again to drain, the monocrystalline silicon wafer is placed in the high-temperature baking box to be heated before washing, stickers or organic matters attached to the surface of the monocrystalline silicon wafer are burnt, due to the fact that the monocrystalline silicon wafer is stable in property, the stickers or the organic matters on the surface of the silicon wafer are effectively treated through baking treatment under the condition that the influence on the silicon wafer is avoided, cooling water is adopted to cool the monocrystalline silicon wafer after baking, primary washing is conducted, the aim of cleaning the monocrystalline silicon wafer is achieved after acid washing and twice water washing, and washing efficiency is high.

Drawings

FIG. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic structural view of a rotary cleaning drum according to the present invention;

FIG. 3 is a schematic structural diagram of the high-temperature baking oven of the present invention;

FIG. 4 is a schematic structural diagram of a workbench according to the present invention;

FIG. 5 is a schematic structural view of a lifting assembly of the containing drum of the present invention;

FIG. 6 is a schematic view of the structure of the water spraying assembly of the present invention.

In the figure: 1. a work table; 2. bending the pipe; 3. a support leg; 4. a pump body; 5. a water conduit; 6. a cooling water tank; 7. a base; 8. a telescopic rod; 9. a water receiving tank; 10. bending a rod; 11. lifting the suspender; 12. a cross beam; 13. a toothed ring; 14. a gear; 15. a motor; 16. hollowing out the cylinder body; 17. a barrel; 18. a mounting ring; 19. cutting the parts; 20. a cooling plate; 21. a water spray pipe; 22. a longitudinal drawing plate; 23. a longitudinal chute; 24. a transverse chute; 25. a transverse drawing plate; 26. a box body; 27. an acid washing zone; 28. a primary water washing zone; 29. a secondary water washing zone; 30. a porous material guide plate; 31. heating a tube; 32. a notch; 33. a lifting ring.

Detailed Description

In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further described with the specific embodiments.

As shown in fig. 1 to 6, the embodiment provides a monocrystalline silicon wafer cleaning apparatus for an LED, which includes a workbench with support legs, a high-temperature baking box is disposed at a position, close to one end of the workbench, of the top of the workbench, a rotary cleaning drum driven by a driving assembly is disposed at the other end of the workbench, a cooling area is disposed between the high-temperature baking box and the rotary cleaning drum at the top of the workbench, a water spraying assembly disposed on the ground and located on one side of the workbench is disposed above the cooling area, and a container lifting assembly disposed on the ground and located on one side of the workbench is disposed above the rotary cleaning drum.

Furthermore, the high-temperature baking oven comprises a box body, a transverse drawing component is arranged at the top of the box body, a longitudinal drawing component is arranged on one side of the box body, a plurality of heating pipes are arranged at the positions, located at the bottom, of the inside of the box body, and a porous material guide plate which is located inside the box body and inclines to one side of the longitudinal drawing component is arranged above the heating pipes.

Further, horizontal pull subassembly is including being fixed in the horizontal spout of just symmetry setting at box top, the sliding connection has horizontal pull board in the horizontal spout, indulge the pull subassembly all including the vertical spout that is fixed in the box lateral wall and the symmetry sets up, the sliding connection has vertical pull board in the horizontal spout.

Further, the rotary cleaning barrel comprises a barrel body, and the inside of the barrel body is divided into an acid washing area, a primary water washing area and a secondary water washing area by a dividing piece.

Furthermore, the driving assembly comprises a gear ring fixed on the outer wall of the cylinder body, and a gear driven by a motor is meshed on the gear ring.

Furthermore, the cooling area comprises a notch formed in the workbench, a cooling plate with a hole is installed in the notch, and a water receiving tank arranged on the ground is arranged below the cooling plate.

Furthermore, the water spray assembly comprises a cooling water tank, a water guide pipe with a pump body is arranged at the top of the cooling water tank, and the tail end of the water guide pipe is connected with a water spray pipe through an elbow.

Further, the containing barrel hoisting assembly comprises a base arranged on the ground, a telescopic rod is installed on the base, the tail end of the telescopic rod is connected with a hoisting rod through a bent rod, the tail end of the hoisting rod is located at the bottom of the hoisting rod and is provided with a mounting ring, and a containing barrel is hung on the mounting ring.

Further, the splendid attire section of thick bamboo includes the fretwork barrel, the top of fretwork barrel is equipped with the crossbeam, the top of crossbeam is located its central department and is equipped with rings.

The method comprises the steps of drawing a transverse drawing plate out, adding a monocrystalline silicon wafer to be cleaned into a box body and placing the monocrystalline silicon wafer on a porous guide plate, closing the transverse drawing plate, adjusting the temperature of a heating pipe to 200-300 ℃, closing the heating pipe after the monocrystalline silicon wafer is prevented from one end time in the box body, drawing a longitudinal drawing plate out, sliding the monocrystalline silicon wafer to a cooling plate along the porous guide plate, opening a pump body to carry out water dispersion cooling and primary cleaning on the monocrystalline silicon wafer, allowing sewage to flow into a water receiving box, placing the monocrystalline silicon wafer into a containing cylinder after cooling, placing the containing cylinder into an acid washing area through lowering a telescopic rod to carry out acid washing, lifting the telescopic rod after acid washing, lifting the containing cylinder, driving a toothed ring to rotate 120 degrees through a motor driving gear, stopping the motor to work, enabling a primary water washing area to be located under the containing cylinder, lowering the telescopic rod to place the containing cylinder into the primary water washing area to carry out primary water washing, lifting the telescopic rod to lift the The secondary water washing area is located right below the containing barrel, the telescopic rod descends to place the containing barrel in the secondary water washing area for washing the secondary water and then lift the containing barrel for draining, the monocrystalline silicon wafer is firstly placed in the high-temperature baking box for heating before washing, so that stickers or organic matters attached to the surface of the monocrystalline silicon wafer are burnt, the stickers or the organic matters on the surface of the monocrystalline silicon wafer are effectively treated by baking treatment under the condition of not influencing the silicon wafer, the cooling water is adopted for cooling after baking and primary washing is carried out, the aim of cleaning the monocrystalline silicon wafer is fulfilled after acid washing and twice water washing, and the washing efficiency is high.

The foregoing shows and describes the general principles, essential features, and advantages of the invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the invention as claimed.