阅读说明：本技术 一种用于清洗激光全息模压版的清洗剂 (Cleaning agent for cleaning laser holographic die pressing plate ) 是由 王霞 于 2021-08-26 设计创作，主要内容包括：本发明涉及工业清洗剂技术领域,且公开了一种用于清洗激光全息模压版的清洗剂,包括以下质量分数配比的原料：由纳米二氧化钛和聚乙炔组成的清洗催化剂3～8％,辛基酚聚氧乙烯醚(OPE)5％,脂肪醇聚氧乙烯醚(AEO)2.5％,N,N’-双油酰基乙二胺二乙磺酸钠(DTM)3％,乙二醇单丁醚(EB)5～12％,余量为去离子水。本发明的清洗催化剂在光线照射时,能够使污渍的分子接受光生电子-空穴对发生降解,并溶解在本发明的清洗剂中,从而对于激光全息模压版上大面积的污渍达到去污力99％以上的技术效果。(The invention relates to the technical field of industrial cleaning agents, and discloses a cleaning agent for cleaning a laser holographic die pressing plate, which comprises the following raw materials in parts by mass: 3-8% of a cleaning catalyst consisting of nano titanium dioxide and polyacetylene, 5% of octyl phenol polyoxyethylene ether (OPE), 2.5% of fatty alcohol polyoxyethylene ether (AEO), 3% of N, N' -dioleoyl ethylenediamine sodium Diethylsulfonate (DTM), 5-12% of ethylene glycol monobutyl Ether (EB), and the balance of deionized water. The cleaning catalyst can degrade molecules of stains by receiving photo-generated electron-hole pairs when irradiated by light, and is dissolved in the cleaning agent, so that the technical effect of more than 99% of detergency on large-area stains on laser holographic molding plates is achieved.)

1. The cleaning agent for cleaning the laser holographic die pressing plate is characterized by comprising the following raw materials in parts by mass: 3-8% of a cleaning catalyst consisting of nano titanium dioxide and polyacetylene, 5% of octyl phenol polyoxyethylene ether (OPE), 2.5% of fatty alcohol polyoxyethylene ether (AEO), 3% of N, N' -dioleoyl ethylenediamine sodium Diethylsulfonate (DTM), 5-12% of ethylene glycol monobutyl Ether (EB), and the balance of deionized water.

2. The cleaning agent for cleaning the laser holographic embossing plate as claimed in claim 1, wherein the cleaning catalyst is composed of 30-60% of nano titanium dioxide and 40-70% of polyacetylene.

3. The cleaning agent for cleaning the laser holographic embossing plate as claimed in claim 2, wherein the cleaning catalyst is composed of 30-60% of nano titanium dioxide with an average particle size of 50nm or less and 40-70% of polyacetylene.

4. The cleaning agent for cleaning a laser holographic embossing plate as claimed in claim 3, wherein the method of cleaning a laser holographic embossing plate comprises the steps of:

step one, heating the stained mould pressing plate to 100 ℃ in an oven, taking out the stained mould pressing plate, and then soaking the stained mould pressing plate into a cleaning agent for soaking;

irradiating the mould pressing plate by adopting ultraviolet light;

and step three, under the irradiation of ultraviolet light, cleaning the mould pressing plate by ultrasonic oscillation, taking out the mould pressing plate, fully cleaning the mould pressing plate by deionized water, soaking the mould pressing plate in the deionized water with the temperature of more than 100 ℃, and immediately drying the mould pressing plate in an oven with the temperature of 100 ℃.

Technical Field

The invention relates to the technical field of industrial cleaning agents, in particular to a cleaning agent for cleaning a laser holographic die-pressing plate.

Background

The laser holographic anti-counterfeiting material has high anti-counterfeiting strength, lower manufacturing cost and good packaging effect, and is applied to the fields of anti-counterfeiting and packaging in a billion scales at present. The anti-counterfeiting information of the laser holographic anti-counterfeiting material is transferred from a nickel plate to the material through a mould pressing process. Generally, the material for recording the anti-counterfeit information is a high molecular thermoplastic resin. In the molding process, the resin is softened by the high temperature of the plate roller of the molding machine (the molding temperature is usually 185 ℃ +/-5 ℃), and then the laser holographic information on the nickel plate fixed on the plate roller is imprinted on the high polymer resin by pressure. In the molding process, the nickel plate can inevitably adhere to some high molecular resin, and the adhered stains can cover the laser holographic information on the molding plate, so that the imprinting transfer port of the laser holographic information is influenced. Therefore, the cleaning of the laser holographic die-pressing plate is very important for the batch production of laser holographic anti-counterfeiting materials.

At present, the stain on the nickel plate is usually removed by using the plate wiping paste in the industry, the method is effective to a small amount of local stain and cannot be used for large-area stain, and the production environment is full of oil mist due to the use of the plate wiping paste to influence the product quality.

Disclosure of Invention

Technical problem to be solved

Aiming at the defects of the prior art, the invention provides a cleaning agent for cleaning a laser holographic die pressing plate, which aims to solve the technical problem that the cleaning of stains on a nickel plate by using a plate wiping paste cannot be done to the stains with large area.

(II) technical scheme

In order to achieve the purpose, the invention provides the following technical scheme:

a cleaning agent for cleaning a laser holographic die pressing plate comprises the following raw materials in parts by mass: 3-8% of a cleaning catalyst consisting of nano titanium dioxide and polyacetylene, 5% of octyl phenol polyoxyethylene ether (OPE), 2.5% of fatty alcohol polyoxyethylene ether (AEO), 3% of N, N' -dioleoyl ethylenediamine sodium Diethylsulfonate (DTM), 5-12% of ethylene glycol monobutyl Ether (EB), and the balance of deionized water.

Further, the cleaning catalyst is composed of 30-60% of nano titanium dioxide and 40-70% of polyacetylene.

Further, the cleaning catalyst is composed of 30-60% of nano titanium dioxide with the average particle size of less than or equal to 50nm and 40-70% of polyacetylene.

Further, the method for cleaning the laser holographic die pressing plate by using the cleaning agent comprises the following steps:

step one, heating the stained mould pressing plate to 100 ℃ in an oven, taking out the stained mould pressing plate, and then soaking the stained mould pressing plate into a cleaning agent for soaking;

irradiating the mould pressing plate by adopting ultraviolet light;

and step three, under the irradiation of ultraviolet light, cleaning the mould pressing plate by ultrasonic oscillation, taking out the mould pressing plate, fully cleaning the mould pressing plate by deionized water, soaking the mould pressing plate in the deionized water with the temperature of more than 100 ℃, and immediately drying the mould pressing plate in an oven with the temperature of 100 ℃.

(III) advantageous technical effects

Compared with the prior art, the invention has the following beneficial technical effects:

the laser holographic molded plate stain is characterized in that high polymer resin and toner are in a semi-solidified state after being heated at high temperature for a long time, and the stain is dissolved and swelled by a water-soluble solubilizer, and molecules of the stain are degraded by photo-generated electron-hole pairs and dissolved in the cleaning agent when the cleaning catalyst disclosed by the invention is irradiated by light, so that the technical effect that the detergency reaches more than 99% is achieved.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The first embodiment is as follows:

a cleaning agent for cleaning a laser holographic die pressing plate comprises the following raw materials in parts by mass: 3% of cleaning catalyst consisting of 50% of titanium dioxide with the average particle size of less than or equal to 10nm and 50% of polyacetylene, 5% of octyl phenol polyoxyethylene ether (OPE), 2.5% of fatty alcohol polyoxyethylene ether (AEO), 3% of N, N' -dioleoyl ethylenediamine sodium Diethylsulfonate (DTM), 5% of ethylene glycol monobutyl Ether (EB) and the balance of deionized water;

the method for cleaning the laser holographic die pressing plate by using the cleaning agent comprises the following steps:

step one, heating the stained mould pressing plate to 100 ℃ in an oven, taking out the stained mould pressing plate, and then soaking the stained mould pressing plate in a cleaning agent with the temperature of 60 ℃ for 5 min;

irradiating the mould pressing plate for 10min by adopting 800w ultraviolet light;

step three, under the irradiation of 800w ultraviolet light, oscillating and cleaning the mould pressing plate for 10min by using ultrasonic waves (80kHz), taking out the mould pressing plate, fully cleaning the mould pressing plate by using deionized water, soaking the mould pressing plate in the deionized water with the temperature of more than 100 ℃ for about 2min, and immediately drying the mould pressing plate in an oven with the temperature of 100 ℃ for about 5 min;

example two:

a cleaning agent for cleaning a laser holographic die pressing plate comprises the following raw materials in parts by mass: 5% of cleaning catalyst consisting of 30% of titanium dioxide with the average particle size of less than or equal to 5nm and 70% of polyacetylene, 5% of octyl phenol polyoxyethylene ether (OPE), 2.5% of fatty alcohol polyoxyethylene ether (AEO), 3% of N, N' -dioleoyl ethylenediamine sodium Diethylsulfonate (DTM), 9% of ethylene glycol monobutyl Ether (EB) and the balance of deionized water;

the method for cleaning the laser holographic die pressing plate by using the cleaning agent comprises the following steps:

step one, heating the stained mould pressing plate to 100 ℃ in an oven, taking out the stained mould pressing plate, and then soaking the stained mould pressing plate in a cleaning agent with the temperature of 80 ℃ for 5 min;

irradiating the mould pressing plate for 5min by adopting 800w ultraviolet light;

step three, under the irradiation of 800w ultraviolet light, oscillating and cleaning the mould pressing plate for 5min by using ultrasonic waves (80kHz), taking out the mould pressing plate, fully cleaning the mould pressing plate by using deionized water, soaking the mould pressing plate in the deionized water with the temperature of more than 100 ℃ for about 1min, and immediately drying the mould pressing plate in an oven with the temperature of 100 ℃ for about 10 min;

example three:

a cleaning agent for cleaning a laser holographic die pressing plate comprises the following raw materials in parts by mass: 8 percent of cleaning catalyst consisting of 60 percent of titanium dioxide with the average grain diameter less than or equal to 50nm and 40 percent of polyacetylene, 5 percent of octyl phenol polyoxyethylene ether (OPE), 2.5 percent of fatty alcohol polyoxyethylene ether (AEO), 3 percent of N, N' -dioleoyl ethylenediamine sodium Diethylsulfonate (DTM), 12 percent of ethylene glycol monobutyl Ether (EB) and the balance of deionized water;

the method for cleaning the laser holographic die pressing plate by using the cleaning agent comprises the following steps:

step one, heating the stained mould pressing plate to 100 ℃ in an oven, taking out the stained mould pressing plate, and then soaking the stained mould pressing plate in a cleaning agent with the temperature of 100 ℃ for 5 min;

irradiating the mould pressing plate for 8min by adopting 800w ultraviolet light;

step three, under the irradiation of 800w ultraviolet light, oscillating and cleaning the mould pressing plate for 8min by using ultrasonic waves (80kHz), taking out the mould pressing plate, fully cleaning the mould pressing plate by using deionized water, soaking the mould pressing plate in the deionized water with the temperature of more than 100 ℃ for about 3min, and immediately drying the mould pressing plate in an oven with the temperature of 100 ℃ for about 8 min;

and (3) performance testing:

sampling the stained nickel plate according to the specification of 10cm multiplied by 10cm, and weighing the mass of the stained nickel plate; meanwhile, taking an unused nickel plate, sampling and weighing according to the same specification to obtain a standard nickel plate; the part of the stained nickel plate exceeding the standard nickel plate quality is regarded as stain quality;

and (3) testing detergency: because the laser holographic molded plate is cleaned after being slightly cooled during high-temperature operation, the test of the detergency of the experiment is also carried out at high temperature; taking the stained nickel plate according to a specified specification, weighing the mass, and taking the difference between the mass and the mass of the standard nickel plate as the stain mass; after the cleaning method is adopted for cleaning, the mass of the product is weighed; and the stained nickel plate and the difference value are the stain removal quality.

Calculating the detergency from the mass of the removed stains and the total mass of the stains;

and (3) testing results:

the first embodiment is as follows: the detergency is 99.2%;

example two: the detergency is 99.6%;

example three: the detergency is 99.1%;

although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.