阅读说明：本技术 一种环抛机用倾斜度可调节多孔质陶瓷吸附平台 (Adjustable porous ceramic adsorption platform of gradient for ring polishing machine ) 是由 魏志忠 于 2020-05-13 设计创作，主要内容包括：本发明公开了一种环抛机用倾斜度可调节多孔质陶瓷吸附平台,包括底座,所述底座上端中部通过转轴活动设置有转动盘,所述转动盘上端固定设置有固定框架,所述固定框架内部下端两侧均固定设置有第一固定块,所述第一固定块内部通过销轴活动设置有第一电动推杆,所述第一电动推杆上端通过销轴活动设置有第二固定块,所述第二固定块上端固定设置有安装板,所述安装板上端固定设置有多孔陶瓷板,所述安装板内部上端开设有真空槽,所述真空槽下端固定设置有通气管,所述固定框架上端中部固定设置有弧形基座。本发明使用效果好,可以便于调节多孔陶瓷板的角度,从而可以方便对需要进行环抛的物品进行固定。(The invention discloses an inclination-adjustable porous ceramic adsorption platform for a ring polishing machine, which comprises a base, wherein a rotating disc is movably arranged in the middle of the upper end of the base through a rotating shaft, a fixed frame is fixedly arranged at the upper end of the rotating disc, first fixed blocks are fixedly arranged on two sides of the lower end in the fixed frame, a first electric push rod is movably arranged in the first fixed block through a pin shaft, a second fixed block is movably arranged at the upper end of the first electric push rod through a pin shaft, an installation plate is fixedly arranged at the upper end of the second fixed block, a porous ceramic plate is fixedly arranged at the upper end of the installation plate, a vacuum groove is formed in the upper end of the installation plate, a vent pipe is fixedly arranged at the lower end of the vacuum groove, and an arc-shaped base is fixedly arranged in the middle of the upper end of the fixed frame. The angle adjustable porous ceramic plate has a good use effect, and the angle of the porous ceramic plate can be conveniently adjusted, so that objects needing to be circularly polished can be conveniently fixed.)

1. The utility model provides an adjustable porous ceramic adsorption platform of gradient for ring polishing machine, includes base (1), its characterized in that: the device is characterized in that a rotating disc (2) is movably arranged in the middle of the upper end of a base (1) through a rotating shaft, a fixed frame (3) is fixedly arranged at the upper end of the rotating disc (2), first fixed blocks (4) are fixedly arranged on two sides of the lower end in the fixed frame (3), a first electric push rod (5) is movably arranged in the first fixed blocks (4) through a pin shaft, a second fixed block (6) is movably arranged at the upper end of the first electric push rod (5), a mounting plate (7) is fixedly arranged at the upper end of the second fixed block (6), a porous ceramic plate (8) is fixedly arranged at the upper end of the mounting plate (7), a vacuum groove (9) is formed in the upper end in the mounting plate (7), a vent pipe (10) is fixedly arranged at the lower end of the vacuum groove (9), an arc-shaped base (11) is fixedly arranged in the middle of the upper end of the fixed frame (3), the arc-shaped base (11) is movably clamped with a ball body (12), and the upper end of the ball body (12) is fixedly connected with the mounting plate (7).

2. The inclination-adjustable porous ceramic adsorption platform for the ring polishing machine according to claim 1, characterized in that: the surface of a rotating shaft where the rotating disc (2) is located is fixedly provided with a gear (13), one side of the interior of the base (1) is fixedly provided with a second electric push rod (14) through a mounting seat, a rack (15) is fixedly arranged at the shaft end of a telescopic rod of the second electric push rod (14), and the rack (15) and the gear (13) are meshed with each other.

3. The inclination-adjustable porous ceramic adsorption platform for the ring polishing machine according to claim 2, wherein: the electric control device is characterized in that a control box (16) is fixedly arranged on one side of the surface of the base (1), and the control box (16) is electrically connected with the first electric push rod (5) and the second electric push rod (14) respectively.

4. The inclination-adjustable porous ceramic adsorption platform for the ring polishing machine according to claim 1, characterized in that: and a connecting flange (17) is fixedly arranged at one end of the vent pipe (10) far away from the mounting plate (7).

5. The inclination-adjustable porous ceramic adsorption platform for the ring polishing machine according to claim 1, characterized in that: the base (1) surface both sides lower extreme all fixedly is provided with fixed plate (18), mounting hole (19) have been seted up in fixed plate (18) outside surface middle part.

Technical Field

The invention relates to the technical field of ceramic adsorption platforms, in particular to an inclination-adjustable porous ceramic adsorption platform for a ring polishing machine.

Background

The microporous ceramic adsorption heating disk is a special tool for adsorption and bearing in the processing process of various semiconductor wafers, and is widely applied to the working procedures of thinning machines, dicing saws, ring polishing machines and the like.

The method has the characteristics of high flatness and parallelism, compact and uniform structure, high strength and high permeability, uniform adsorption force, easiness in finishing and the like.

Porous ceramic is called nano micropore vacuum sucker at the same time, which means that uniform solid or vacuum spheres are produced by a special nano powder manufacturing process, a large amount of mutually connected or closed ceramic materials are generated inside the materials through high-temperature sintering, and the micropore ceramic vacuum sucker has the advantages of high temperature resistance, wear resistance, chemical corrosion resistance, high mechanical strength, easy regeneration, excellent thermal shock resistance and the like by virtue of a special structure, has the characteristics of high porosity, high strength, high flatness, very strong adsorption capacity and the like, and is widely applied to the industries of semiconductors, magnetic materials and electronics.

But its angle of the pottery adsorption platform of using at present is difficult for adjusting, can not drive the goods multi-angle slope according to its needs of throwing the machine all around, and its result of use is relatively poor.

Disclosure of Invention

The invention aims to provide a gradient-adjustable porous ceramic adsorption platform for a ring polishing machine, which aims to solve the problems in the background technology.

In order to achieve the purpose, the invention provides the following technical scheme: an inclination-adjustable porous ceramic adsorption platform for a ring polishing machine comprises a base, wherein a rotating disc is movably arranged in the middle of the upper end of the base through a rotating shaft, a fixed frame is fixedly arranged at the upper end of the rotating disc, first fixed blocks are fixedly arranged on both sides of the lower end in the fixed frame, a first electric push rod is movably arranged in the first fixed block through a pin shaft, a second fixed block is movably arranged at the upper end of the first electric push rod through a pin shaft, the upper end of the second fixed block is fixedly provided with a mounting plate, the upper end of the mounting plate is fixedly provided with a porous ceramic plate, the upper end of the inside of the mounting plate is provided with a vacuum groove, the lower end of the vacuum groove is fixedly provided with a vent pipe, the fixed frame upper end middle part is fixed and is provided with the arc base, the inside activity block of arc base is provided with the spheroid, fixed connection between spheroid upper end and the mounting panel.

Preferably, the surface of the rotating shaft where the rotating disc is located is fixedly provided with a gear, one side of the inside of the base is fixedly provided with a second electric push rod through a mounting seat, the shaft end of a telescopic rod of the second electric push rod is fixedly provided with a rack, the rack and the gear are mutually meshed, and the gear can be driven to rotate through the stretching of the second electric push rod.

Preferably, the fixed control box that is provided with in base surface one side, the control box respectively with first electric putter and second electric putter between electric connection, can control first electric putter and second electric putter's work through the control box.

Preferably, the end of the vent pipe far away from the mounting plate is fixedly provided with a connecting flange, and the vent pipe can be conveniently connected with an external pipeline through the connecting flange.

Preferably, the lower ends of the two sides of the surface of the base are fixedly provided with fixing plates, the middle part of the surface of the outer side of each fixing plate is provided with a mounting hole, and the device can be conveniently and fixedly mounted in a target area through the fixing plates and the mounting holes.

Compared with the prior art, the invention has the beneficial effects that:

1. according to the invention, the mounting plate, the porous ceramic plate and the sphere can be inclined around the arc-shaped base by controlling the first electric push rods on the two sides to extend and contract one by one through the control box, so that the angle of the porous ceramic plate can be conveniently adjusted, and thus, objects needing to be circularly thrown can be conveniently adsorbed and fixed.

2. According to the invention, the rack can be driven to move by the second electric push rod after the second electric push rod is extended or shortened, and the rotating disc can be driven to rotate by the gear after the rack moves, so that the mounting plate and the porous ceramic plate can be inclined at any angle within the range of 360 degrees, and the using effect of the device can be further improved.

Drawings

FIG. 1 is a schematic view of the overall structure of an inclination-adjustable porous ceramic adsorption platform for a ring polishing machine according to the present invention;

FIG. 2 is a view of the internal structure of a base of an inclination-adjustable porous ceramic adsorption platform for a ring polishing machine according to the present invention;

FIG. 3 is a view of the internal structure of an inclination-adjustable porous ceramic adsorption platform mounting plate for a ring polishing machine according to the present invention.

In the figure: 1. a base; 2. rotating the disc; 3. a fixed frame; 4. a first fixed block; 5. a first electric push rod; 6. a second fixed block; 7. mounting a plate; 8. a porous ceramic plate; 9. a vacuum tank; 10. a breather pipe; 11. an arc-shaped base; 12. a sphere; 13. a gear; 14. a second electric push rod; 15. a rack; 16. a control box; 17. a connecting flange; 18. a fixing plate; 19. and (7) installing holes.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Referring to fig. 1-3, the present invention provides a technical solution: a gradient-adjustable porous ceramic adsorption platform for a ring polishing machine comprises a base 1, wherein a rotating disc 2 is movably arranged in the middle of the upper end of the base 1 through a rotating shaft, a fixed frame 3 is fixedly arranged at the upper end of the rotating disc 2, first fixed blocks 4 are fixedly arranged on two sides of the lower end in the fixed frame 3, a first electric push rod 5 is movably arranged in each first fixed block 4 through a pin shaft, a second fixed block 6 is movably arranged at the upper end of each first electric push rod 5 through a pin shaft, a mounting plate 7 is fixedly arranged at the upper end of each second fixed block 6, a porous ceramic plate 8 is fixedly arranged at the upper end of each mounting plate 7, a vacuum groove 9 is formed in the upper end in each mounting plate 7, a vent pipe 10 is fixedly arranged at the lower end of each vacuum groove 9, an arc-shaped base 11 is fixedly arranged in the middle of the upper end of the fixed frame 3, and a ball 12 is movably clamped in each arc-shaped base 11, the upper end of the sphere 12 is fixedly connected with the mounting plate 7.

The surface of a rotating shaft where the rotating disc 2 is located is fixedly provided with a gear 13, one side inside the base 1 is fixedly provided with a second electric push rod 14 through a mounting seat, the shaft end of a telescopic rod of the second electric push rod 14 is fixedly provided with a rack 15, the rack 15 and the gear 13 are mutually meshed, the gear 13 can be driven to rotate through the extension and retraction of the second electric push rod 14, one side of the surface of the base 1 is fixedly provided with a control box 16, the control box 16 is respectively electrically connected with the first electric push rod 5 and the second electric push rod 14, the work of the first electric push rod 5 and the second electric push rod 14 can be controlled through the control box 16, one end of the vent pipe 10, far away from the mounting plate 7, is fixedly provided with a connecting flange 17, the external pipeline of the vent pipe 10 can be conveniently connected through the connecting flange 17, and the lower ends of two sides of the surface of the base 1 are both fixedly provided with a fixing plate 18, the middle part of the outer side surface of the fixing plate 18 is provided with a mounting hole 19, and the device can be conveniently and fixedly mounted in a target area through the fixing plate 18 and the mounting hole 19.

The working principle is as follows: when the device is used, the device can be fixedly arranged in a target area through the fixing plate 18 and the mounting hole 19, then air in the vacuum groove 9 can be discharged through the vent pipe 10, negative pressure is formed in the vacuum groove 9, negative pressure can be formed in small holes in the surface of the porous ceramic plate 8, goods can be adsorbed through the small holes in the surface of the porous ceramic plate 8, after adsorption is completed, the control box 16 can control the first electric push rods 5 on the two sides to extend and shorten, the mounting plate 7, the porous ceramic plate 8 and the ball body 12 can incline around the arc-shaped base 11, the angle of the porous ceramic plate 8 can be conveniently adjusted, and therefore, objects needing to be circularly thrown can be conveniently adsorbed, fixed and processed, and after the inclination angle of the porous ceramic plate 8 is adjusted, the second electric push rod 14 can be controlled to extend or shorten, the rack 15 can be driven to move by the second electric push rod 14, and the rack 15 can drive the rotating disc 2 to rotate by the gear 13 after moving, so that the mounting plate 7 and the porous ceramic plate 8 can be inclined at any angle within the range of 360 degrees, the using effect of the device can be further improved, and the working principle of the inclination-adjustable porous ceramic adsorption platform for the circular polisher is the working principle.

It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.