用于使聚酰胺质地化的方法

文档序号:473966 发布日期:2021-12-31 浏览:9次 >En<

阅读说明:本技术 用于使聚酰胺质地化的方法 (Method for texturing polyamides ) 是由 T.蒙塔纳里 C.雷科奎尔 于 2020-04-07 设计创作,主要内容包括:本发明涉及用于制备包含至少一个膜(F)的物体的方法,所述膜(F)包含至少一个层(1),所述层(1)包括包含至少一种半结晶聚酰胺(Psc)的组合物,所述半结晶聚酰胺(Psc)具有在25J/g和75J/g之间的熔融焓(根据ISO11357-3:2013的以40℃/min的第一DSC加热),所述膜在其表面的至少一个的全部或部分上具有质地化元件(T)的质地,其特征在于,该方法包含以下步骤:a.提供模具(M),其被设置到小于或等于120℃、特别地在20℃和90℃之间的温度;b.将至少一个质地化元件(T)施加至模具的壁,并且至少部分地具有质地化的表面,所述质地化的表面在与面向模具的面相反的面上;c.将至少一个膜(F)施加至质地化元件(T)的质地化的表面,所述膜(F)包含至少一个层(1),所述层(1)旨在与质地化元件(T)的质地化的表面接触,所述层(1)的厚度为至少10μm;d.将至少一种加热方式(H)施加至步骤(c)的所述膜,以在面向质地化媒介物(T)的膜的侧面上达到温度(TT),温度(TT)在组合物(CPO)的Tg和熔融温度(Tm)减15℃之间,并且用在1.5和2000bar之间的压力,持续在0.1s和5h之间的时间t,将压力方式(P)施加至所述膜,以使其与质地化元件(T)接触;e.从模具移出并且获得物体,该物体包含所述半结晶聚酰胺膜(Psc)、并且在其表面的至少一个的全部或部分上具有所述质地化元件(T)的质地。(The invention relates to a process for preparing an object comprising at least one film (F) comprising at least one layer (1), said layer (1) comprising a composition comprising at least one semi-crystalline polyamide (Psc) having a melting enthalpy between 25J/g and 75J/g (first DSC heating at 40 ℃/min according to ISO11357-3: 2013), said film having the texture of a texturing element (T) on all or part of at least one of its surfaces, characterized in that it comprises the steps of a. providing a mould (M) set to a temperature less than or equal to 120 ℃, in particular between 20 ℃ and 90 ℃; b. applying at least one texturizing element (T) to a wall of the mold and having at least in part a texturized surface on a face opposite to a face facing the mold; c. applying at least one film (F) to the textured surface of the texturing element (T), said film (F) comprising at least one layer (1), said layer (1) being intended to be in contact with the textured surface of the texturing element (T), the thickness of said layer (1) being at least 10 μ ι η; d. applying at least one heating means (H) to the film of step (c) to reach a temperature (TT) on the side of the film facing texturing medium (T), temperature (TT) being between Tg and melting temperature (Tm) of Composition (CPO) minus 15 ℃, and applying a pressure means (P) to the film to bring it into contact with texturing element (T) with a pressure between 1.5 and 2000bar for a time T of between 0.1s and 5H; e. removing from the mould and obtaining an object comprising said semi-crystalline polyamide film (Psc) and having the texture of said texturisation elements (T) on all or part of at least one of its surfaces.)

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