阅读说明：本技术 多个层系统、制造方法以及在多个层系统上形成的saw设备 (Multi-layer system, method of manufacture, and SAW device formed on multi-layer system ) 是由 T·梅茨格 木原善和 T·波拉德 于 2019-02-04 设计创作，主要内容包括：提出一种特别用于在其上形成SAW设备的层系统,该层系统包括单晶蓝宝石衬底和晶体压电层,单晶蓝宝石衬底具有第一表面,晶体压电层包括AlN,被沉积到所述第一表面上并具有第二表面。蓝宝石的晶体学R平面被用作第一表面,使得压电层的c轴的定向能够平行于第一表面和第二表面。(A layer system is proposed, in particular for forming a SAW device thereon, comprising a single crystal sapphire substrate having a first surface and a crystalline piezoelectric layer comprising AlN deposited onto said first surface and having a second surface. The crystallographic R-plane of sapphire is used as the first surface so that the orientation of the c-axis of the piezoelectric layer can be parallel to the first surface and the second surface.)

1. A layer system, comprising:

a single crystal sapphire substrate having a first surface;

a crystalline piezoelectric layer comprising AlN epitaxially grown on the first surface and having a second surface facing away from the first surface;

wherein the first surface is a crystallographic R-plane of sapphire;

wherein an epitaxial relationship between the sapphire substrate and the piezoelectric layer is as follows:

the (11-20) plane of the piezoelectric layer (x-cut) is parallel to the (1-102) plane of the sapphire (R-plane),

the in-plane [1-100] direction of the piezoelectric layer is parallel to the [ -1-120] direction of sapphire, and

the in-plane [000-1] direction (crystallographic c-axis) of the piezoelectric layer is parallel to the [1-10-1] direction of sapphire.

2. Layer system according to one of the preceding claims,

wherein the piezoelectric layer comprises AlN doped with a dopant that improves piezoelectric coupling.

3. Layer system according to one of the preceding claims,

wherein the piezoelectric layer comprises AlScN, and wherein the amount of dopant Sc contained in the piezoelectric layer is between 5 at% and 45 at%.

4. Layer system according to one of the preceding claims,

wherein the piezoelectric layer comprises Sc-doped AlN, and wherein a seed layer of pure AlN is arranged between the substrate and the piezoelectric AlScN layer.

5. Layer system according to one of the preceding claims,

comprising SiO deposited onto the second surface₂And (3) a layer.

6. A SAW device comprising the layer system of any of the preceding claims and having an interdigital electrode structure arranged on top of the second surface.

7. The SAW device of any preceding claim,

wherein said interdigital electrode structure is adapted to excite a SAW in said piezoelectric layer having a given wavelength λ, wherein the thickness d of said piezoelectric layer_PAccording to the relationship 0.3 λ ≦ d_P3 lambda is less than or equal to the total weight of the mixture.

8. The SAW device of any preceding claim,

wherein the first surface is inclined at an angle of 0.5 ° to 6 ° with respect to the R-plane.

9. The SAW device of any preceding claim,

wherein the interdigital electrode structure has an in-plane orientation having a rotation angle around the surface normal of between 0 ° and 90 °.

10. The SAW device of any preceding claim,

wherein the interdigital electrode structure comprises Cu and/or Al.

11. The SAW device of any preceding claim,

including other functional layers selected from the group of: a passivation layer, a SiN trimming layer, and a temperature compensation layer.

12. A method of manufacturing a layer system comprising an AlN layer having a c-axis parallel to the layer, the method comprising the steps of:

A) providing a sapphire substrate having a planar first surface, the planar first surface being a crystallographic R-plane;

B) depositing a seed layer of pure AlN onto the first surface;

C) epitaxially growing a piezoelectric layer onto the seed layer comprising AlScN by using a deposition technique selected from the group consisting of: metal organic cvd (mocvd), plasma enhanced cvd (pecvd), Molecular Beam Epitaxy (MBE), Atomic Layer Deposition (ALD), sol-gel deposition, high temperature sputtering, and pulsed laser deposition PLD.

13. Method according to the preceding claim, comprising the steps of:

D) forming an electrode structure comprising interdigital electrodes on top of the piezoelectric layer, the interdigital electrodes being adapted to generate a SAW wave having an intermediate frequency,

wherein the step C) comprises the following steps: during the epitaxial growth process, the thickness d of the epitaxial piezoelectric layer is adjusted_PControlled to satisfy d is not less than 0.3 lambda_PA value ≦ 3 λ, where λ coincides with a wavelength of the SAW wave at the intermediate frequency.

Technical Field

The invention relates to a layer system comprising a thin piezoelectric film, to a method for producing the same, and to a SAW device formed on a layer system having a piezoelectric layer.

Background

In recent years, standard SAW technology based on lithium tantalate LT wafers to implement RF filters in the 500MHz to 3GHz range has been increasingly replaced by advanced micro-acoustic technology (such as BAW or temperature compensated SAW) to meet the increasing performance requirements for mobile phone systems.

WCDMA and LTE based mobile phones require minimum loss RF filters, duplexers and multiplexers to support advanced RF concepts like carrier aggregation, diversity antennas and MIMO concepts or new modulation schemes. With the new 5G standard, the requirements for micro-acoustic devices with respect to several key characteristics, such as minimum loss, reduced temperature drift with temperature, higher linearity and power durability, new frequency bands between 3 and 6GHz, and larger filter bandwidths, will be further increased. In addition, there is a continuing need to reduce the cost, size and height of microacoustic devices.

Today, two micro-acoustic technologies (SAW and BAW) are basically used to implement high performance resonators, filters, duplexers and multiplexers for mobile phone applications. SAW technology primarily utilizes a single crystal wafer material (such as lithium tantalate LT or lithium niobate LN) as a piezoelectric substrate upon which a suitable metal-based electrode structure (e.g., an interdigital transducer) is implemented to excite surface acoustic waves. Additional functional layers, such as passivation layers consisting of e.g. silicon nitride, temperature compensation layers consisting of e.g. amorphous silicon oxide or thick metal interconnects, are used to further improve the device performance.

More advanced SAW devices use a thin piezoelectric single crystal layer bonded to a carrier wafer. Within these devices, energy confinement in the piezoelectric layer can be achieved by the wave-guiding effect, thereby further reducing losses as a whole. By suitably selecting the layer system, additional characteristics of the micro-acoustic device may be enhanced, for example by: by introducing additional layers as mentioned above or by using high resistivity silicon wafers with good thermal conductivity to improve heat dissipation and power durability. A thin piezoelectric single crystal layer is usually achieved by bonding a single crystal wafer to a carrier substrate by the well-known wafer bonding method, and then thinning the piezoelectric wafer by a wafer grinding and polishing method to a desired layer thickness, which is usually in the range of half a quarter wavelength to one wavelength of the micro-acoustic wave.

Achieving a highly uniform piezoelectric layer requires advanced thinning methods for the layer thickness. Typically, the orientation of the piezoelectric layer (crystallographic orientation) is carefully selected based on advanced simulation and modeling methods, such as finite element simulation (FEM), to achieve optimal device performance. Since piezoelectric wafer materials are typically grown from a melt by single crystal growth methods, a variety of possible crystal orientations can be obtained. The main disadvantage is that large diameter wafer solutions, such as 200mm and 300mm wafers, cannot be obtained, since for example lithium tantalate wafers with such large diameters cannot be mass produced at present.

Different methods to realize a thin piezoelectric layer will deposit such a layer by the following well known thin film deposition methods: such as sputtering, Pulsed Laser Deposition (PLD), Chemical Vapor Deposition (CVD) including metal organic CVD (mocvd) and plasma enhanced CVD (pecvd), Molecular Beam Epitaxy (MBE), Atomic Layer Deposition (ALD) or sol-gel deposition. Using these techniques, a piezoelectric layer (typically aluminum nitride AlN or scandium-doped aluminum nitride AlScN) for BAW devices can be grown on a suitable wafer substrate (e.g., high resistivity silicon). Generally, currently, AlN-based piezoelectric films for BAW devices are grown by a sputtering method, in which a highly oriented but polycrystalline thin film is realized by orienting the crystallographic c-axis perpendicular to the substrate surface. These highly oriented polycrystalline piezoelectric layers support well propagation of longitudinal waves along the crystallographic c-axis of AlN-based piezoelectric layers. With this design and structure, low loss BAW resonators and devices can be realized. However, since epitaxial growth of AlN-based piezoelectric layers cannot be achieved with commonly used low temperature sputtering methods, the in-plane orientation of AlN-based crystallites is less pronounced than with real single crystals or epitaxial layers.

In general, the implementation of a thin film piezoelectric layer by a thin film deposition method has significant advantages such as excellent thickness control, good layer adhesion, low cost process, low material consumption, full integration into a wafer production line, implementation of layers on large diameter wafers, and easy variation in chemical layer composition, compared to bonding and thinning methods using single crystal wafers.

Accordingly, several approaches have been made to implement SAW devices using such AlN-based thin films, thereby benefiting from the following approaches: thin film approach compared to single crystal approach as mentioned above, and SAW design flexibility compared to BAW design. The SAW is patterned with excellent uniformity by a photolithographic method, allowing all resonators with different frequencies to be realized in one process step. In BAW technology, the thickness of the piezoelectric layer is the primary frequency-defining feature. The trimming method allows high frequency uniformity to be achieved. Implementing resonators with different frequencies on one wafer requires multiple process steps such as subsequent layer deposition and layer patterning.

The main limitation of growing AlN-based piezoelectric layers by thin film deposition methods in conjunction with SAW design principles at this time is the orientation of the AlN-based layer. Since the crystallographic c-axis is always oriented more or less perpendicular to the substrate surface when using low temperature sputtering, the main piezoelectric coupling is also perpendicular to the substrate surface, whereas laterally propagating surface acoustic waves on the substrate surface require a significant tilt of the c-axis with respect to the surface normal to achieve a sufficiently large filter bandwidth.

Moreover, while the crystallographic c-axis of the AlN-based layer is perpendicular to the substrate surface, certain electrode configurations may help excite surface acoustic waves or lamb/plate wave modes with lateral propagation directions. However, even when using AlN layers with significant levels of e.g. Sc doping, ultimately limiting the combination of SAW structures and AlN-based thin piezoelectric films to some applications requiring only a small filter bandwidth, it is almost impossible to achieve an effective coupling coefficient for the micro-acoustic resonator of more than 5% with this design.

It is therefore advantageous to achieve a layer system exhibiting a piezoelectric film based on AlN grown by thin-film deposition methods, in which the crystallographic c-axis is strongly inclined with respect to the normal to the substrate surface.

This and other objects are achieved by a layer system according to claim 1. The other claims specify a method of manufacturing and a SAW device formed on the layer system.

Disclosure of Invention

The invention provides a different approach as to how to implement a layer system with an AlN-based piezoelectric layer having a c-axis more or less parallel to the substrate surface.

It is proposed to use a single crystal sapphire substrate having a crystallographic R-plane (expressed as a (1-102) plane in the form of a bravavler index) of sapphire as a first surface. A crystalline piezoelectric layer comprising AlN may be epitaxially grown onto the first surface according to the law of epitaxy, wherein the (11-20) plane of the AlN-based layer is parallel to the (1-102) plane of the sapphire, the in-plane [1-100] direction of the AlN-based layer is parallel to the [ -1-120] direction of the sapphire, and the in-plane [000-1] direction (crystallographic c-axis) of the AlN-based layer is parallel to the [1-10-1] direction of the sapphire. The epitaxial growth of the AlN-based layer produces a preferred orientation with the crystallographic c-axis more or less parallel to the substrate surface. Therefore, the second surface as the surface of the crystalline piezoelectric layer is a (11-20) plane.

With the novel layer system, a high coupling parallel to the c-axis and thus parallel to the layer plane can be produced. Thus, the piezoelectric layer is suitable for forming thereon a SAW device that achieves a high coupling coefficient. The layer may be formed by commonly used layer growth techniques that are controllable to enable epitaxial growth.

Sapphire, which has high thermal conductivity, low electrical conductivity and low RF loss, and high acoustic velocity, is an ideal substrate material for implementing micro-acoustic RF devices, and is available in wafer form, with the R-plane as the first surface. Furthermore, sapphire wafers having a larger wafer diameter than a single crystal piezoelectric wafer in LT or LN sliced from a melt-drawn ingot can be obtained. However, R-plane sapphire has hardly been used as a substrate for micro-acoustic devices, although it is considered to be available and its previous use, for example, as a substrate for a growth layer for photoelectric applications.

A layer system with an additionally improved high-voltage galvanic coupling parallel to the substrate surface comprises: an AlN-based piezoelectric layer doped with a suitable dopant (e.g., Sc). Dopants (e.g., Sc) may be used to improve the piezoelectric coupling of AlN and to increase the piezoelectric response of the piezoelectric layer.

AlScN can also be epitaxially grown on the newly proposed R-plane sapphire by means of a suitable deposition method, such as high temperature sputtering, PLD, MOCVD, ALD or MBE.

Depending on the use of the layer system, different amounts of doping may be used. Thus, according to an embodiment, the piezoelectric layer comprises AlScN, wherein the amount of Sc comprised in the piezoelectric layer is between 5 at% and 45 at%. However, any dopant that improves piezoelectric coupling may also be advantageous.

In a preferred embodiment, the layer system comprises a crystallographic orientation of the piezoelectric AlN layer, wherein the (11-20) plane of the AlN layer is parallel to the (1-102) plane of the sapphire, the in-plane [1-100] direction of the AlN layer is parallel to the [ -1-120] direction of the sapphire, and the in-plane [000-1] direction (crystallographic c-axis) of the AlN layer is parallel to the [1-10-1] direction of the sapphire.

In a preferred embodiment, the piezoelectric layer comprises Sc-doped AlN and is arranged on a seed layer of epitaxial, undoped pure AlN. Thus, a seed layer is arranged between the substrate and the piezoelectric AlScN layer. The AlN seed layer also contributes to the waveguide effect, due to the higher acoustic speed in AlN compared to that in Sc-doped AlN, for example. The waveguiding piezoelectric layer allows the SAW to propagate with lower loss and therefore higher efficiency. The occurrence of parasitic modes is also suppressed in the waveguide layer system.

Furthermore, in order to clearly define the growth direction of the polar c-axis of the piezoelectric layer, a slight tilt in the range of 0.5 to 6 degrees of the R-plane sapphire surface may be necessary.

The layer system may further comprise SiO deposited onto the second surface₂And/or a temperature compensation layer.

Using this wafer with an AlN-based layer system epitaxially grown on top, electrode structures (such as interdigital transducers) for exciting acoustic waves can be realized on the surface of the AlN-based layer system, wherein the orientation of these structures with respect to the crystal orientation can be selected in such a way that an optimum performance with respect to the following parameters is achieved: modes of operation, piezoelectric coupling, absence of spurious modes, frequency temperature coefficient, loss mechanisms, and other critical parameters. Changes can be made to a given layer system by rotating the IDT orientation around the surface normal of the layer system. The interdigital transducer IDT can have any in-plane orientation with a rotation angle around the surface normal between 0 and 90.

The speed of sound along the direction of propagation and spacing of the interdigital electrode structures defines the frequency and wavelength of the SAW so excitable. Then, a preferable thickness of the doped AlN layer may be generally set to be in the range of 0.3 to 3.0 times the wavelength λ of the surface acoustic wave SAW.

According to an embodiment, the interdigital electrode structure comprises Cu and/or Al.

Selected from the group: the passivation layer, the trimming layer of SiN and the further functional layers of the temperature compensation layer can be incorporated into the layer sequence of the layer system, preferably above the piezoelectric layer.

Drawings

Hereinafter, the present invention will be described in more detail with reference to specific embodiments and the accompanying drawings. The illustrations are merely schematic and are not drawn to scale. Some details may be drawn in exaggerated form for better understanding.

Fig. 1 schematically shows the position of the R plane within a sapphire basic crystal structure.

Fig. 2 shows a schematic cross-sectional view through a layer system according to a first embodiment, comprising a sapphire R-plane substrate, an AlScN layer arranged on the sapphire R-plane substrate, and an electrode structure for a SAW device.

Fig. 3 shows a similar layer system with an electrode structure according to a second embodiment.

Fig. 4 shows a schematic top view on a wafer with a layer system and an electrode structure according to a first embodiment.

Fig. 5 shows a schematic top view on a wafer with a layer system and an electrode structure according to a second embodiment.

Fig. 6A and 6B show admittances of SAW resonators constructed on the layer system of the first embodiment with different amounts of Sc in AlScN.

Fig. 7A and 7B show admittances of SAW resonators constructed on the layer system of the second embodiment with different amounts of Sc in AlScN.

Detailed Description

Fig. 1 schematically shows the position of the R-plane within a sapphire crystal.

An AlScN layer with a Sc content of 40 mol% can be epitaxially grown directly onto the R-plane sapphire wafer. In this case, the [11-20] direction of the AlScN layer is perpendicular to the substrate surface (x cuts AlScN). According to an advantageous embodiment, a seed layer system, for example made of pure and undoped AlN, may be grown as an underlayer onto the sapphire substrate. Such AlN layers may support epitaxial growth. The thickness of the seed layer can be as thin as 30nm, but can be adjusted as desired.

For the epitaxial growth of the AlScN layer onto the seed layer, the deposition technique is selected from the group consisting of metal organic cvd (mocvd), plasma enhanced cvd (pecvd), Molecular Beam Epitaxy (MBE), Atomic Layer Deposition (ALD), sol-gel deposition, high temperature sputtering and pulsed laser deposition PLD.

Furthermore, due to the fact that the speed of sound within such a material is different from the speed of sound within AlScN, improved acoustic properties are achieved, such as e.g. waveguide effects of layer systems. The c-axis of the grown AlScN layer is oriented parallel to the first surface of the sapphire substrate.

On top of the AlScN layer, an interdigital transducer, e.g. based on Al or Cu electrodes, is implemented with a specific orientation with respect to the crystallographic axis of the AlScN.

FIG. 2 shows a principle layer stack with a thin seed layer of AlN, a thin layer of AlScN, and an electrode structure IDT with a thin seed layer of AlN with respect to Al according to a first embodiment₂O₃And a first possible orientation of the crystallographic axes of both AlScN. In this embodiment, the SAW device realized by the electrode structure IDT in fig. 2 excites a main acoustic wave having a shear characteristic. The propagation direction is the crystallography of AlScN [1-100]And (4) direction. The thickness of the piezoelectric AlScN layer is selected to be in the range of 0.5 to 1.5 times the wavelength λ, depending on the intermediate frequency set by the pitch of the electrode structures. Higher thicknesses are possible, but not required. The thickness ratio of the different layers can be modified in such a way that a maximum waveguide effect is achieved.

Fig. 3 shows the same layer stack, but provided with an electrode structure IDT according to a second embodiment with a cross section with respect to Al₂O₃And a second possible orientation of the crystallographic axes of both AlScN. In practice, the IDT is rotated 90 about the surface normal relative to the IDT orientation of FIG. 2. In this embodiment of fig. 3, the SAW device excites a primary acoustic wave having rayleigh characteristics. The propagation direction is the crystallography of AlScN [0001]And (4) direction.

Additional functional layers (e.g., passivation layers, temperature compensation layers, or frequency trimming layers) may be applied on top of the SAW electrode structure.

The benefits of such a micro-acoustic device with the proposed layer system are: the advantages associated with the design flexibility of SAW devices are combined with the advantages of ease of manufacture of BAW devices. In SAW devices, predominantly frequency-defined planar structures are patterned with excellent uniformity by photolithographic methods, allowing all resonators with different frequencies to be realized in one process step. The benefits provided by BAW technology are due to the possible thin film processing. These benefits are, for example, excellent thickness control, good layer adhesion, low cost processing, low material consumption, full integration into the wafer production line, realization of layers on large diameter wafers, and ease of chemical layer composition changes. The benefits of thin film technology compared to previous processes for manufacturing thin film SAW devices by bonding and thinning single crystal piezoelectric wafers have made new layer systems and SAW devices produced thereon superior to "old" technologies.

An additional benefit associated with the use of sapphire wafers is the reduction of RF losses, eliminating the need for complex trap rich layer technology that is typically necessary when using high resistivity Si wafers. Furthermore, the excellent thermal conductivity that improves the power durability of the micro-acoustic device must be emphasized. Furthermore, the high acoustic speed in the layer system supports the wave guiding of the micro-acoustic layer. With AlN-based material systems, relatively high acoustic speeds can be achieved, also enabling high frequency surface acoustic wave devices with relaxed requirements with respect to the lithography technology used.

Fig. 4 and 5 show top views of two exemplary orientations of the SAW electrode structure IDT with respect to the crystallographic axis of the AlScN layer.

In FIG. 4, the c-axis [000-1] of the AlScN layer is tilted 90 with respect to the surface normal, and the orientation of the electrode structure IDT enables the primary SAW propagation along the [1-100] direction.

In FIG. 5, the c-axis [000-1] of the AlScN layer is tilted 90 with respect to the surface normal, and the orientation of the electrode structure IDT direction enables the main SAW propagation direction to be along the crystallographic c-axis ([000-1] direction). In this second embodiment, the electrode structure IDT is rotated by 90 ° compared to the electrode structure IDT shown in fig. 4.

Fig. 6A, 6B show admittance curves of a SAW resonator according to the given configuration in fig. 4. For the simulations, the disclosed material properties for AlScN piezoelectric layers with 7% Sc content (fig. 6A) and 37.5% Sc content (fig. 6B), respectively, have been used. The layer thickness of AlScN is approximately 1200nm/3700nm (first value for low Sc content and second value for high Sc content). The electrode structure IDT is embodied by Cu electrodes having a height of about 100 nm. In both cases, the respective pitch of the transducers of the electrode structure is set to 0.8 μm. The metallization ratio a/p is set to about 0.45, where a is the width and p is the distance between the centers of adjacent electrode fingers.

The propagation direction of the SAW is parallel to the [ -1100] direction of AlScN. With this configuration, a shear horizontal SAW mode can be excited.

Fig. 7A and 7B show admittance curves of the SAW resonator according to the given configuration in fig. 5. Again, for the simulations, the same disclosed material properties for AlScN piezoelectric layers with 7% Sc content (fig. 7A) and 37.5% Sc content (fig. 7B), respectively, have been used. The layer thickness of the AlScN is approximately 1000nm/800nm (first value for low Sc content and second value for high Sc content). The electrode structure IDT is embodied by Cu electrodes having a height of about 150 nm. In both cases, the respective pitch of the transducers of the electrode structure is set to 0.8 μm. The metallization ratio a/p is set to about 0.5/0.4 (first value for low Sc content, second value for high Sc content), where a is the width and p is the distance between the centers of adjacent electrode fingers. The propagation direction of SAW is parallel to the crystallographic c-axis ([000-1] direction). With this configuration, a pure rayleigh mode SAW can be excited. A smaller piezoelectric coupling can be achieved by reducing the Sc content of the AlScN layer (as set for the embodiment of fig. 7A with 7% Sc when compared to the higher Sc content of 37.5% in fig. 7B).

The present invention should not be limited to these embodiments due to the limited number of embodiments. The layer system may be used to implement other devices having other electrode structures, different layer thicknesses, and combinations with additional layers that may be helpful for specific purposes. The implementation and effect of such variations are known per se in the art. The full scope of the invention is defined by the claims.