阅读说明：本技术 一种消除耐药大肠杆菌对抗生素耐药性的方法 (Method for eliminating antibiotic resistance of drug-resistant escherichia coli ) 是由 杨伟国 吴水林 毛丛杨 于 2020-07-30 设计创作，主要内容包括：本发明公开了一种消除耐药大肠杆菌对抗生素耐药性的方法,该方法为：将光热材料和对耐药大肠杆菌具有抗菌作用的抗生素的混合溶液与耐药大肠杆菌混合,得到待处理菌液,采用近红外激光照射待处理菌液,并控制激光的功率,使待处理菌液的温度维持在45～100℃。本发明将光热材料和抗生素的混合溶液与耐药大肠杆菌混合,再采用近红外激光照射,即基于光热辅助的机制,利用光热材料在近红外激光照射下产生的热量消除耐药大肠杆菌对抗生素的耐药性,有效解决了目前普通抗生素对耐药大肠杆菌的治疗效率大幅度减弱,甚至是无效的问题；同时本发明的方法简单,设备投入少,资源消耗少,实施难度小,适用于工业化使用。(The invention discloses a method for eliminating antibiotic resistance of drug-resistant escherichia coli, which comprises the following steps: mixing a photo-thermal material and a mixed solution of antibiotics with an antibacterial effect on drug-resistant escherichia coli with the drug-resistant escherichia coli to obtain a to-be-treated bacterial liquid, irradiating the to-be-treated bacterial liquid by adopting near-infrared laser, and controlling the power of the laser to keep the temperature of the to-be-treated bacterial liquid at 45-100 ℃. According to the invention, a mixed solution of a photo-thermal material and an antibiotic is mixed with drug-resistant escherichia coli, and then near-infrared laser irradiation is adopted, namely based on a photo-thermal auxiliary mechanism, the drug resistance of the drug-resistant escherichia coli to the antibiotic is eliminated by using heat generated by the photo-thermal material under the irradiation of the near-infrared laser, so that the problem that the treatment efficiency of the conventional common antibiotic to the drug-resistant escherichia coli is greatly weakened or even ineffective is effectively solved; meanwhile, the method is simple, low in equipment investment, low in resource consumption and low in implementation difficulty, and is suitable for industrial use.)

1. A method for eliminating antibiotic resistance of drug-resistant Escherichia coli is characterized by comprising the following steps: mixing a photo-thermal material and a mixed solution of antibiotics with an antibacterial effect on drug-resistant escherichia coli with the drug-resistant escherichia coli to obtain a to-be-treated bacterial liquid, irradiating the to-be-treated bacterial liquid by adopting near-infrared laser, and controlling the power of the laser so that the temperature of the to-be-treated bacterial liquid is maintained at 45-100 ℃.

2. The method for eliminating the antibiotic resistance of drug-resistant escherichia coli according to claim 1, wherein the irradiation time of the near-infrared laser is 10min or more.

3. The method for eliminating the antibiotic resistance of the drug-resistant escherichia coli according to claim 2, wherein the temperature of the bacterial liquid to be treated is maintained at 45-55 ℃, and the irradiation time of the near-infrared light is 10-25 min.

4. The method for eliminating the antibiotic resistance of drug-resistant escherichia coli according to any one of claims 1 to 3, wherein the wavelength of the near-infrared laser is 808 nm.

5. The method for eliminating the antibiotic resistance of drug-resistant escherichia coli according to claim 1, wherein the preparation process of the mixed solution of the photothermal material and the antibiotic having an antibacterial effect on the drug-resistant escherichia coli comprises the following steps: and uniformly dispersing the photo-thermal material into deionized water to obtain a photo-thermal material solution, and then adding the antibiotic having an antibacterial effect on drug-resistant escherichia coli into the photo-thermal material solution to obtain the mixed solution.

6. The method for eliminating the antibiotic resistance of drug-resistant escherichia coli as claimed in claim 5, wherein the mass concentration of the photothermal material solution is 1-150 mg/mL.

7. The method for eliminating the antibiotic resistance of the drug-resistant escherichia coli according to claim 6, wherein the concentration of the antibiotic having an antibacterial effect on the drug-resistant escherichia coli in the mixed solution is above the minimum inhibitory concentration of 1/8.

8. The method for eliminating antibiotic resistance of drug-resistant escherichia coli according to any one of claims 5 to 7, wherein the photo-thermal material is at least one of two-dimensional nano materials of titanium carbide MXene, black phosphorus and graphene oxide.

9. The method for eliminating the antibiotic resistance of drug-resistant escherichia coli according to any one of claims 5 to 7, wherein the antibiotic having an antibacterial effect on the drug-resistant escherichia coli is any one of a beta-lactam antibiotic, an aminoglycoside antibiotic and a tetracycline antibiotic.

10. The method of claim 1, wherein the effective viable count of the drug-resistant escherichia coli is 1 x 10⁷CFU/mL or less.

Technical Field

The invention belongs to the technical field of drug resistance of drug-resistant escherichia coli, and particularly relates to a method for eliminating drug resistance of drug-resistant escherichia coli to antibiotics.

Background

Escherichia coli is one of the normal flora abundantly present in the human and animal intestinal tracts and has become an important nosocomial infection pathogen in recent years. With the use of a large amount of antibiotics, particularly third-generation cephalosporins, the escherichia coli continuously develops the drug resistance mechanism under selective pressure, which causes increasingly serious drug resistance problems and brings great difficulty to clinical treatment. At present, the treatment efficiency of common antibiotics to drug-resistant escherichia coli is greatly weakened and even ineffective. Therefore, it is necessary to develop a method for eliminating the resistance of drug-resistant E.coli to antibiotics, i.e., a method capable of making "ineffective" antibiotics effective again.

Disclosure of Invention

In view of the above, the present invention provides a method for eliminating drug resistance of drug-resistant escherichia coli to antibiotics, which utilizes heat generated by a photothermal material under near-infrared laser irradiation to eliminate drug resistance of drug-resistant escherichia coli to antibiotics based on a photothermal-assisted mechanism, enhances antibacterial efficacy of antibiotics to drug-resistant escherichia coli, and effectively solves the problem that the treatment efficiency of the existing common antibiotics to drug-resistant escherichia coli is greatly reduced or even ineffective.

The invention adopts the technical scheme that a method for eliminating the drug resistance of drug-resistant escherichia coli to antibiotics comprises the following steps: mixing a photo-thermal material and a mixed solution of antibiotics with an antibacterial effect on drug-resistant escherichia coli with the drug-resistant escherichia coli to obtain a to-be-treated bacterial liquid, irradiating the to-be-treated bacterial liquid by adopting near-infrared laser, and controlling the power of the laser so that the temperature of the to-be-treated bacterial liquid is maintained at 45-100 ℃.

Drawings

FIG. 1 is a graph showing data on the antibacterial ratio of samples treated according to examples 1 to 9 of the present invention and comparative examples 1 to 11;

FIG. 2 shows the antibiotic concentrations of 1/4MIC of the samples of examples 10 to 18 of the present invention and comparative examples 1 to 2₉₀A data graph of the antibacterial rate of the photo-thermal treatment and the photo-thermal treatment;

FIG. 3 shows the antibiotic concentrations of 1/8MIC of the samples of examples 10 to 18 and comparative examples 1 to 2 of the present invention₉₀A data graph of the antibacterial rate of the photo-thermal treatment and the photo-thermal treatment;

FIG. 4 shows the antibiotic concentrations of 1/16MIC for the samples of comparative examples 1-2 and 12-20 of the present invention₉₀Data graph of the antimicrobial rate of time-on-light and no-on-light

FIG. 5 is a graph showing data on the antibacterial ratio of the samples of examples 19 to 21 according to the present invention;

FIG. 6 is a graph showing the antibacterial ratio data of the samples of examples 22 to 24 and comparative examples 21 to 23 according to the present invention;

FIG. 7 is a graph showing data on the antibacterial ratio of samples of examples 25 to 27 of the present invention;

FIG. 8 is a graph showing data on the antibacterial ratio of samples of examples 28 to 30 according to the present invention;

FIG. 9 is a graph showing the data of the antibacterial ratio of the samples of examples 31 to 33 of the present invention.

In specific implementation, the antibiotics having an antibacterial effect on the drug-resistant escherichia coli can comprise antibiotics having an antibacterial effect on the drug-resistant escherichia coli, antibiotics having a low-efficiency antibacterial effect on the drug-resistant escherichia coli, and antibiotics having an 'ineffective' antibacterial effect on the drug-resistant escherichia coli, namely, the antibacterial rate of the antibiotics on the drug-resistant escherichia coli can be lower, and even the antibacterial rate is as low as infinite and close to zero; the low efficiency is not limited by specific antibacterial rate, but is only a relative concept, and is applicable to the method of the present invention, and antibiotics with improved antibacterial property to drug-resistant escherichia coli after the method is applied are all applicable to the present invention.

Preferably, the irradiation time of the near-infrared laser is 10min or more.

Preferably, the temperature of the bacterial liquid to be treated is maintained at 45-55 ℃, and the irradiation time of the near-infrared light is 10-25 min.

Preferably, the wavelength of the near-infrared laser is 808 nm.

Preferably, the preparation process of the mixed solution of the photothermal material and the antibiotic having an antibacterial effect against drug-resistant escherichia coli is as follows: and uniformly dispersing the photo-thermal material into deionized water to obtain a photo-thermal material solution, and then adding the antibiotic having an antibacterial effect on drug-resistant escherichia coli into the photo-thermal material solution to obtain the mixed solution.

Preferably, the mass concentration of the photo-thermal material solution is 1-150 mg/mL.

Preferably, the concentration of the antibiotic having an antibacterial effect against drug-resistant escherichia coli in the mixed solution is above the minimum inhibitory concentration of 1/8.

Preferably, the photo-thermal material is at least one of two-dimensional nano materials of titanium carbide MXene, black phosphorus and graphene oxide.

Preferably, the antibiotic having an antibacterial effect against drug-resistant escherichia coli is any one of a β -lactam antibiotic, an aminoglycoside antibiotic, and a tetracycline antibiotic.

Preferably, the effective viable count of the drug-resistant escherichia coli is 1 x 10⁷CFU/mL or less.

The invention has the beneficial effects that: according to the invention, a mixed solution of a photothermal material and an antibiotic having an antibacterial effect on drug-resistant escherichia coli is mixed with the drug-resistant escherichia coli, near-infrared laser irradiation is adopted, the power of laser is controlled, so that a to-be-treated bacterial liquid is maintained at a stable temperature, namely based on a photothermal auxiliary mechanism, the drug resistance of the drug-resistant escherichia coli to the antibiotic is eliminated by using heat generated by the photothermal material under the irradiation of the near-infrared laser, namely the antibacterial effect of the antibiotic on the drug-resistant escherichia coli is enhanced, and the problem that the treatment efficiency of the conventional common antibiotic to the drug-resistant escherichia coli is greatly weakened or even ineffective is effectively solved; meanwhile, the method is simple, low in equipment investment, low in resource consumption and low in implementation difficulty, and is suitable for industrial use.