阅读说明：本技术 一种钛屑回收方法 (Titanium chip recovery method ) 是由 *** 于 2020-06-01 设计创作，主要内容包括：本发明公开了一种钛屑回收方法,其步骤包括：去油污→清水洗→去氧化层→去杂质→一次烘干→粉碎→磁选→二次烘干。经该工艺回收处理后的钛屑,杂质含量低,经测试质量与三级海绵钛等同,满足回收利用条件,对钛屑的回收率达到95％以上,极大降低生产成本。(The invention discloses a titanium chip recovery method, which comprises the following steps: degreasing → washing with clear water → oxide layer removal → impurity removal → primary drying → pulverization → magnetic separation → secondary drying. The titanium chips recovered by the process have low impurity content, the tested quality is equal to that of the three-level titanium sponge, the recovery condition is met, the recovery rate of the titanium chips reaches over 95 percent, and the production cost is greatly reduced.)

1. A titanium chip recovery method comprises the following steps: degreasing → washing with clear water → oxide layer removal → impurity removal → primary drying → pulverization → magnetic separation → secondary drying.

2. A titanium chip recovery method according to claim 1, characterized in that: the degreasing step comprises the steps of putting titanium chips into a sodium hydroxide aqueous solution with the mass fraction of 1.5% -2%, completely immersing the titanium chips into the sodium hydroxide aqueous solution, heating to 155 +/-2 ℃, and continuously stirring for at least 15 min.

3. A titanium chip recovery method according to claim 1, characterized in that: washing with water at the temperature of 45-50 ℃; washing until the pH value is 7-7.5.

4. A titanium chip recovery method according to claim 1, characterized in that: in the oxidation removal layer, titanium chips are subjected to acid cleaning twice in acid liquor, and the acid liquor adopted in the first cleaning is mixed acid of hydrochloric acid and hydrofluoric acid; the acid solution adopted in the second acid cleaning is a mixed acid of nitric acid and hydrofluoric acid.

5. The titanium chip recovery method according to claim 4, wherein: the volume ratio of the hydrochloric acid to the hydrofluoric acid is 5: 1, and the concentration of the hydrochloric acid in the mixed acid is 5.5-6 wt%; the volume ratio of the nitric acid to the hydrofluoric acid is 5: 1, and the concentration of the nitric acid in the mixed acid is 5.5-6 wt%; the pickling time is more than 30min, and the pickling temperature is 50-60 ℃.

6. A titanium chip recovery method according to claim 1, characterized in that: the primary drying is vacuum drying, the drying temperature is 90-105 ℃, the pressure is 50-80mbar, and the drying time is at least 3 hours.

7. A titanium chip recovery method according to claim 1, characterized in that: and crushing to obtain the particle size of 0.83-20 mm.

8. A titanium chip recovery method according to claim 1, characterized in that: in the magnetic selection, the field intensity of the used magnetic force is more than 5000 gauss.

9. A titanium chip recovery method according to claim 1, characterized in that: and the secondary drying is vacuum drying, the drying temperature is 90-105 ℃, the pressure is 50-80mbar, and the drying is carried out until the water content is less than or equal to 0.5 Wt.%.

Technical Field

The invention relates to the technical field of titanium processing, in particular to a titanium chip recovery method.

Background

In the production and processing processes of titanium ingots, oxidized substances, mixed mechanical oil, saponification liquid, dust and other impurities on the surfaces of a large amount of formed scraps and micro parts of equipment enter a molten pool together with titanium scraps if the impurities are not completely removed, so that the quality of the formed ingots is greatly influenced.

The traditional treatment method of the company cannot meet the production requirements, and only can be sold as waste titanium scraps, so that the economic benefit is extremely low, and economic loss exists.

Disclosure of Invention

The technical problem to be solved by the invention is as follows: the titanium scrap recovery method is provided, the quality of the titanium scrap recovered and treated by the process is equal to that of three-level titanium sponge, and the recovery and utilization conditions are met.

In order to solve the technical problems, the technical scheme provided by the invention is as follows: a titanium chip recovery method comprises the following steps: degreasing → washing with clear water → oxide layer removal → impurity removal → primary drying → pulverization → magnetic separation → secondary drying.

The degreasing step comprises the steps of putting titanium chips into a sodium hydroxide aqueous solution with the mass fraction of 1.5% -2%, completely immersing the titanium chips into the sodium hydroxide aqueous solution, heating to 155 +/-2 ℃, and continuously stirring for at least 15 min.

Washing with water at the temperature of 45-50 ℃; washing until the pH value is 7-7.5.

In the oxidation removal layer, titanium chips are subjected to acid cleaning twice in acid liquor, and the acid liquor adopted in the first cleaning is mixed acid of hydrochloric acid and hydrofluoric acid; the acid solution adopted in the second acid cleaning is a mixed acid of nitric acid and hydrofluoric acid. The HF-HCI solution is adopted for acid cleaning for the first time, and the surface oxide layer is removed as soon as possible, so that the efficiency is improved; second time using HF-HNO₃And (4) pickling with the solution to enable the surface of the material to be bright.

The volume ratio of the hydrochloric acid to the hydrofluoric acid is 5: 1, and the concentration of the hydrochloric acid in the mixed acid is 5.5-6 wt%; the volume ratio of the nitric acid to the hydrofluoric acid is 5: 1, and the concentration of the nitric acid in the mixed acid is 5.5-6 wt%; the pickling time is more than 30min, and the pickling temperature is 50-60 ℃.

The primary drying is vacuum drying, the drying temperature is 90-105 ℃, the pressure is 50-80mbar, and the drying time is at least 3 hours.

And crushing to obtain the particle size of 0.83-20 mm.

In the magnetic selection, the field intensity of the used magnetic force is more than 5000 gauss.

And the secondary drying is vacuum drying, the drying temperature is 90-105 ℃, the pressure is 50-80mbar, and the drying is carried out until the water content is less than or equal to 0.5 Wt.%.

Has the advantages that: the titanium chips recovered by the process have low impurity content, the tested quality is equal to that of the three-level titanium sponge, the recovery condition is met, the recovery rate of the titanium chips reaches over 95 percent, and the production cost is greatly reduced.

Detailed Description

The process of the present invention is further illustrated below with reference to examples, but the invention is not limited thereto.