阅读说明：本技术 半导体装置
(Semiconductor device with a plurality of semiconductor chips
) 是由 郭书铭
石建中 于 2018-12-03 设计创作，主要内容包括：本发明一些实施例提供一种半导体装置。上述半导体装置包含第一基板、第二基板、第一发光二极管、第一绝缘层、粘着结构及光学结构。第一发光二极管设置于第一基板上。第一绝缘层设置于第一基板上,且与第一发光二极管相邻。粘着结构设置于第一绝缘层上,且包含面向第一发光二极管的第一侧及第二侧,且第二侧与第一侧位于相反侧。第二基板设置于粘着结构上。光学结构与粘着结构的第一侧或第二侧的至少一者接触。(Some embodiments of the present invention provide a semiconductor device. The semiconductor device comprises a first substrate, a second substrate, a first light emitting diode, a first insulating layer, an adhesion structure and an optical structure. The first light emitting diode is arranged on the first substrate. The first insulating layer is disposed on the first substrate and adjacent to the first light emitting diode. The adhesive structure is arranged on the first insulating layer and comprises a first side and a second side facing the first light-emitting diode, and the second side and the first side are located on opposite sides. The second substrate is arranged on the adhesion structure. The optical structure is in contact with at least one of the first side or the second side of the adhesive structure.)
1. A semiconductor device, comprising:
a first substrate;
a first light emitting diode disposed on the first substrate;
a first insulating layer disposed on the first substrate and adjacent to the first light emitting diode;
an adhesion structure disposed on the first insulating layer, comprising:
a first side facing the first light emitting diode; and
a second side opposite to the first side;
a second substrate disposed on the adhesive structure; and
an optical structure in contact with at least one of the first side and the second side of the adhesive structure.
2. The semiconductor device of claim 1, wherein the material of the optical structure comprises at least one of an absorbing material, a metal material, and a metal oxide material.
3. The semiconductor device of claim 1, further comprising:
the second light emitting diode is arranged on the first substrate, wherein the first insulating layer is positioned between the first light emitting diode and the second light emitting diode, the first insulating layer is provided with a first through hole, and the optical structure is arranged in the first through hole.
4. The semiconductor device according to claim 3, wherein the optical structure comprises a reflective layer and an absorbing layer, and the absorbing layer is disposed on the reflective layer.
5. The semiconductor device of claim 1, further comprising:
a light conversion layer disposed between the second substrate and the second side of the adhesive structure; and
a second insulating layer disposed on the second side of the adhesive structure and adjacent to the light conversion layer.
6. The semiconductor device of claim 5, further comprising:
the second light-emitting diode is arranged on the first substrate, and the first insulating layer is positioned between the first light-emitting diode and the second light-emitting diode;
wherein the optical structure is in contact with the first side of the adhesive structure, and a distance between the optical structure and the light conversion layer is D1A distance between the first and second light emitting diodes is P, a width of the light conversion layer is W, and the distance D is1Satisfies the following formula:
0.5μm≦D1≦((P-W)/2)-1μm。
7. the semiconductor device of claim 5, further comprising:
the second light-emitting diode is arranged on the first substrate, and the first insulating layer is positioned between the first light-emitting diode and the second light-emitting diode;
wherein the optical structure is in contact with the second side of the adhesive structure, and a distance between the optical structure and the light conversion layer is D2A distance between the first and second light emitting diodes is P, a width of the light conversion layer is W, and the distance D is2Satisfies the following formula:
0.5μm≦D2≦((P-W)/2)-1μm。
8. the semiconductor device according to claim 5, wherein the second insulating layer has a second through hole, and the optical structure is disposed in the second through hole.
9. The semiconductor device according to claim 8, wherein the optical structure comprises a reflective layer and an absorbing layer, and the absorbing layer is disposed between the reflective layer and the adhesive structure.
10. The semiconductor device of claim 1, further comprising:
and a light conversion layer arranged between the first light emitting diode and the adhesion structure.
Technical Field
The present invention relates to a semiconductor device, and more particularly, to a semiconductor device including a light emitting diode.
Background
In addition to the trend toward light weight, thinness and fashion, the performance (or quality) of semiconductor devices is still required to be improved.
Disclosure of Invention
Some embodiments of the present invention provide a semiconductor device. The semiconductor device comprises a first substrate, a second substrate, a first light emitting diode, a first insulating layer, an adhesion structure and an optical structure. The first light emitting diode is arranged on the first substrate. The first insulating layer is disposed on the first substrate and adjacent to the first light emitting diode. The adhesive structure is arranged on the first insulating layer and comprises a first side and a second side facing the first light-emitting diode, and the second side and the first side are located on opposite sides. The second substrate is arranged on the adhesion structure. The optical structure is in contact with at least one of the first side or the second side of the adhesive structure.
Drawings
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below, wherein:
fig. 1 is a schematic cross-sectional view of a semiconductor device according to an embodiment of the present invention;
FIG. 2 is a cross-sectional view of an LED according to an embodiment of the present invention;
fig. 3 is a top view of the semiconductor device of fig. 1 in accordance with one embodiment of the present invention;
fig. 4 is a top view of the semiconductor device of fig. 1 in accordance with one embodiment of the present invention;
FIG. 5 is a cross-sectional view of a semiconductor device according to an embodiment of the present invention;
FIG. 6 is a cross-sectional view of a semiconductor device according to an embodiment of the present invention;
FIG. 7 is a cross-sectional view of a semiconductor device according to an embodiment of the present invention;
fig. 8 is a schematic cross-sectional view of a semiconductor device according to an embodiment of the present invention;
fig. 9 is a top view of the semiconductor device of fig. 8 in accordance with one embodiment of the present invention;
fig. 10 is a top view of the semiconductor device of fig. 8 in accordance with one embodiment of the present invention;
fig. 11 is a schematic cross-sectional view of a semiconductor device according to an embodiment of the invention.
Reference numerals
100A-100E semiconductor device
110 first substrate
110S surface
120 light emitting diode
120A first light emitting diode
120B second light emitting diode
121 semiconductor layer
122 luminescent layer
123 semiconductor layer
124. 125 electric conduction pad
130 first insulating layer
130U first through hole
140 adhesive structure
140S1 first side
140S2 second side
150. 160 optical structure
150O, 160O, 200O openings
170 second substrate
180 filter layer
190 light conversion layer
200 shading structure
210 second insulating layer
210U second through hole
220. 230, 240, 250 optical structure
241. 251 reflective layer
242. 252 absorbent layer
C1 center point
L1 extension line
D1、D2、D3、D4Distance between two adjacent plates
Distance D120 and D130
Width W
P pitch
I1、I2、I3Light ray
T1、T2、T3、T4Thickness of
Upper surface of US1, US2
X, Y, Z direction
Tangent lines of A-A' and B-B
Detailed Description
The following description is directed to semiconductor devices and methods of fabricating semiconductor devices in accordance with some embodiments of the present invention. Reference numerals may be repeated among the various embodiments to provide a simplified and clear description of certain embodiments of the invention, and are not intended to represent any relationship between the various embodiments and/or structures discussed. Furthermore, when a first material layer is located on or above a second material layer, the first material layer and the second material layer are in direct contact. Alternatively, one or more layers of other materials may be present, in which case there may not be direct contact between the first and second layers of material.
As used herein, the terms "about," "approximately," and the like generally mean within 20%, within 3%, within 2%, within 1%, or within 0.5% of a given value or range. The amounts given herein are approximate, that is, the meanings of "about", "about" and "approximately" may be implied without specifically stating "about", "about" or "approximately".
It is noted that the term "substrate" may include a device or a film formed on a substrate, and may include a plurality of active devices (e.g., transistor devices) thereon, for example, although only a flat substrate is illustrated herein for simplicity of the drawings.
The semiconductor device includes, for example, a display apparatus, a light emitting device, a tile device, a sensing device, or other suitable semiconductor devices, but is not limited thereto.
Fig. 1 is a cross-sectional view of a semiconductor device 100A according to an embodiment of the invention. As shown in fig. 1, the semiconductor device 100A includes a first substrate 110, and a plurality of light emitting diodes 120 disposed on the first substrate 110. The plurality of light emitting diodes 120 may be disposed on the first substrate 110, for example, by Surface-mount technology (SMT), dual in-line package (DIP), or other suitable methods. In some embodiments, the material of the first substrate 110 includes glass, ceramic, plastic, sapphire, or the likeHis suitable materials or combinations of the above, but not limited thereto. For example, the first substrate 110 material includes silicon dioxide (SiO)2) Polyether sulfone (PES), Polyacrylate (PAR), Polyetherimide (PEI), polyethylene naphthalate (PEN), polyethylene terephthalate (PET), polyphenylene sulfide (PPS), polyacrylate (polyacrylate), Polyimide (PI), Polycarbonate (PC), cellulose Triacetate (TAC), Cellulose Acetate Propionate (CAP), or other suitable materials, but not limited thereto. In some embodiments, the light emitting diode 120 includes, for example, a light-emitting diode (LED), a micro-LED (micro LED and/or mini LED), a quantum dot LED (QLED), an Organic Light Emitting Diode (OLED), a phosphorescent material, a fluorescent material, and a quantum dot material, but not limited thereto. In some embodiments, the light emitting diode 120 may emit, for example, blue light, red light, green light, yellow light, infrared light, ultraviolet light, or other suitable wavelengths of light, but is not limited thereto.
Fig. 2 is a schematic cross-sectional view of a light emitting diode 120 according to some embodiments of the invention. The light emitting diode 120 includes a semiconductor layer 121, a light emitting layer 122, a semiconductor layer 123, a conductive pad 124, and a conductive pad 125, wherein the semiconductor layer 121 and the semiconductor layer 123 are electrically connected to the conductive pad 125 and the conductive pad 124, respectively, and the light emitting layer 122 is disposed between the semiconductor layer 121 and the semiconductor layer 123. It should be noted that the led 120 shown in fig. 2 only shows some components, and other structures or components may be added as needed. The stack structure of the light emitting diode 120 is not limited to fig. 2, and may vary according to the type of the light emitting diode 120, and the light emitting diode 120 includes, for example, a Lateral structure (lareral), a Vertical structure (Vertical), or other types of light emitting diodes.
As shown in fig. 1, the semiconductor device 100A includes a first insulating layer 130, wherein the first insulating layer 130 is disposed on the first substrate 110 and adjacent to the plurality of light emitting diodes 120. In some embodiments, the first insulating layer 130 has a plurality of openings (not labeled), for example, and the light emitting diode 120 is disposed in the opening of the first insulating layer 130, for example. That is, in the Z direction, the openings of the light emitting diode 120 and the first insulating layer 130 may substantially overlap. The Z direction is defined as a normal direction of the first substrate 110. In some embodiments, at least one light emitting diode 120 is disposed in one opening of the first insulating layer 130. In some embodiments, two light emitting diodes 120 are disposed in the two openings of the first insulating layer 130, and the light emitted by the two light emitting diodes 120 may have substantially the same optical band, but is not limited thereto. In some embodiments, the material of the first insulating layer 130 may include a transparent material, a white material, a translucent material, other suitable materials, or a combination thereof, but is not limited thereto. In some embodiments, the material of the first insulating layer 130 may include silicone, Epoxy, polymethyl methacrylate, polycarbonate, other suitable materials, or a combination thereof, but is not limited thereto. In some embodiments, the first insulating layer 130 may be a single layer material, a multi-layer material, or a composite material, for example. In some embodiments, the first insulating layer 130 may include a light-curable adhesive (such as a UV adhesive or other light-curable adhesive), an acrylic adhesive, a moisture-curable adhesive, an Optically Clear Adhesive (OCA), an Optically Clear Resin (OCR), or other suitable polymer or combination thereof, but is not limited thereto.
The semiconductor device 100A includes an adhesive structure 140, for example, the adhesive structure 140 is disposed on the light emitting diode 120 and the first insulating layer 130. In some embodiments, the material of the adhesion structure 140 includes, for example, a transparent material, but is not limited thereto. The material of the adhesive structure 140 may include, but is not limited to, an optically transparent adhesive, an optical resin, a photo-curable adhesive, an epoxy adhesive, an acrylic adhesive, a moisture-curable adhesive, other suitable adhesive materials, or a combination thereof. The adhesive structure 140 includes a first side 140S1 and a second side 140S2, the second side 140S2 is opposite to the first side 140S1, and the first side 140S1 faces the light emitting diode 120. That is, the first side 140S1 is a side adjacent to the led 120, and the second side 140S2 is a side away from the led 120.
In some embodiments, the semiconductor device 100A includes an optical structure. The optical structures may contact at least one of the first side 140S1 and the second side 140S2 of the adhesive structure 140, respectively. In some embodiments, the optical structure 150 is disposed adjacent to the first side 140S1, for example. In some embodiments, the optical structure 160 is disposed adjacent to the second side 140S2, for example. In some embodiments, optical structure 150 (and/or optical structure 160) is disposed in, for example, adhesive structure 140. In some embodiments, the material of the optical structure 150 (and/or the optical structure 160) includes, for example, but not limited to, a masking material, an absorbing material, or a reflecting material. Taking the absorbing material as an example, in some embodiments, when the led 120 emits blue light, the optical structure 150 (and/or the optical structure 160) has an absorption rate of at least greater than 60% (or even greater than 70%), for example, for blue light. In some embodiments, the light emitting diodes 120 emit light of different colors (or different wavelength bands), the optical structure 150 (and/or the optical structure 160) has an absorption rate of at least greater than 60% (or even greater than 70%), for example, but not limited thereto, for the light emitted by the light emitting diodes 120. In some embodiments, the material of the optical structure 150 (and/or the optical structure 160) includes, for example, a black photoresist, a black printing ink, a black resin, a white ink, a composite material with a reflective material (or an absorbing material) coated on the periphery, other suitable materials, or a combination thereof. In some embodiments, the material of the optical structure 150 (and/or the optical structure 160) includes a metal material, a metal alloy material, a metal oxide material, but is not limited thereto. In some embodiments, the optical structure 150 (and/or the optical structure 160) is disposed on a portion of the upper surface US1 of the first insulating layer 130 (i.e., the surface of the first insulating layer 130 away from the first substrate 110), for example, while the optical structure 150 (and/or the optical structure 160) is not disposed on a portion of the upper surface US1 of the first insulating layer 130. In some embodiments, in the Z-direction, the optical structure 150 (and/or the optical structure 160) overlaps a portion of the first insulating layer 130. In some embodiments, the led 120 and the optical structure 150 do not overlap in the Z direction. In some embodiments, in the Z direction, the first insulating layer 130 may at least overlap a portion of the light emitting diode 120, and the first insulating layer 130 may contact at least a portion of the upper surface US2 (not shown) of the light emitting diode 120. In some embodiments, in the Z direction, a distance D130 between the upper surface US1 of the first insulating layer 130 and the surface 110S of the first substrate may be, for example, less than or equal to a distance D120 between the upper surface US2 of the light emitting diode 120 and the surface 110S of the first substrate. The distance D130 is defined as the maximum distance between the upper surface US1 of the first insulating layer 130 and the surface 110S of the first substrate in the Z direction, and the distance D120 is defined as the maximum distance between the upper surface US2 of the light emitting diode 120 and the surface 110S of the first substrate in the Z direction. In some embodiments, the upper surface US2 of the light emitting diode 120 may be defined by, for example, the semiconductor layer 121 as in fig. 2, but is not limited thereto. The upper surface US2 of the led 120 can be defined differently according to the kind of led used, such as Lateral (lareral), Vertical (Vertical) or other kinds of leds. In some embodiments, the surface of the component, such as the uppermost layer of the led 120, may be defined as the upper surface US2, but is not limited thereto. The upper surface US2 may be defined as the light exit surface. In some embodiments, the upper surface US2 of the light emitting diode 120 is in contact with the adhesive structure 140, for example. In some embodiments, the adhesion structure 140 has patterning, for example. In some embodiments, the adhesion structure 140 does not overlap or partially overlaps the led 120 in the Z direction, for example.
As shown in fig. 1, the semiconductor device 100A includes a second substrate 170, the second substrate 170 is disposed opposite to the first substrate 110, and the second substrate 170 is disposed on the adhesive structure 140, i.e., the adhesive structure 140 is disposed between the second substrate 170 and the first substrate 110. The material of the second substrate 170 may be similar to or different from that of the first substrate 110, and the description will not be repeated.
In some embodiments, the semiconductor device 100A includes, for example, a light conversion layer 190 and/or a filter layer 180. As shown in fig. 1, the light conversion layer 190 and/or the filter layer 180 are disposed on the light emitting diode 120, for example. In some embodiments, the light conversion layer 190 and/or the filter layer 180 overlap the leds 120 in the Z direction, for example. In some embodiments, the light conversion layer 190 is disposed between the second substrate 170 and the second side 140S2 of the adhesive structure 140, for example. In some embodiments, the light conversion layer 190 is disposed between the light emitting diode 120 and the adhesion structure 140, for example. In some embodiments, the filter layer 180 is disposed between the second substrate 170 and the light conversion layer 190, but not limited thereto, the positions of the light conversion layer 190 and the filter layer 180 may be reversed as required. In some embodiments, the light conversion layer 190 and/or the filter layer 180 are disposed between the first substrate 110 and the adhesion structure 140, for example. In some embodiments, the light conversion layer 190 (or the filter layer 180) is, for example, in contact with the adhesion structure 140. In some embodiments, the optical structure 160 and the light conversion layer 190 (and/or the filter layer 180) do not overlap or partially overlap in the Z-direction.
In some embodiments, the light conversion layer 190 is used, for example, to convert light emitted by the light emitting diode 120 into light having other wavelength bands. In some embodiments, when the led 120 emits blue light, the light conversion layer 190 may convert the blue light into red light, green light, or light having other wavelength bands, for example. The material of the light conversion layer 190 may include quantum dot materials, phosphorescent materials, fluorescent materials, other suitable materials, or combinations thereof, and is not limited thereto. The quantum dots may be made of semiconductor nanocrystal structures and may include, but are not limited to, zinc, cadmium, selenium, sulfur, indium phosphide (InP), gallium antimonide (GaSb), gallium arsenide (GaAs), or other suitable materials or combinations of the above. The quantum dots generally have a particle size of 1nm to 30nm, 1nm to 20nm, or 1nm to 10nm, but are not limited thereto. When the quantum dots are excited by incident light, the incident light will be converted by the quantum dots into emitted light having other colors. In other embodiments, the quantum dots may comprise spherical particles, rod-shaped particles, or particles having any other suitable shape.
In some embodiments, the semiconductor device 100A may include a color conversion enhancing layer (not shown). The color conversion enhancing layer may be disposed between the filter layer 180 and the light conversion layer 190, for example, but is not limited thereto. The color conversion enhancing layer, for example, includes a reflective material, which reflects unconverted light to the light conversion layer 190 for conversion, thereby enhancing the light conversion efficiency.
As shown in fig. 1, the semiconductor device 100A includes a second insulating layer 210 and/or a light shielding structure 200. In some embodiments, the second insulating layer 210 is disposed on the second side 140S2 of the adhesive structure 140, for example, and is adjacent to the light-converting layer 190 (and/or the filter layer 180). In some embodiments, the second insulating layer 210 has a plurality of openings, for example, and the light conversion layer 190 (and/or the filter layer 180) overlaps the openings of the second insulating layer 210 in the Z direction, for example. In some embodiments, the material of the second insulating layer 210 is the same as or different from the material of the first insulating layer 130, and thus, the description is not repeated.
In some embodiments, the light shielding structure 200 is disposed between the second substrate 170 and the adhesion structure 140, for example. In some embodiments, the light shielding structure 200 is, for example, in contact with the second substrate 170. In some embodiments, the light shielding structure 200 is disposed between the first substrate 110 and the adhesion structure 140, for example. In some embodiments, the second insulating layer 210 is disposed between the light shielding structure 200 and the second substrate 170, for example. In some embodiments, the second insulating layer 210 is disposed between the adhesion structure 140 and the second substrate 170, for example. In some embodiments, the light conversion layer 190 (and/or the filter layer 180) is disposed adjacent to the light blocking structure 200, for example. As shown in fig. 1, the light shielding structure 200 has a plurality of openings 200O, and the light conversion layer 190 (and/or the filter layer 180) overlaps the openings 200O of the light shielding structure 200 in the Z direction. In some embodiments, in the Z direction, the light conversion layer 190 (and/or the filter layer 180) may overlap with a portion of the light shielding structure 200, for example. In some embodiments, the light shielding structure 200 includes, for example, an absorbing material or a shielding material, other suitable materials, or combinations thereof, but is not limited thereto. In some embodiments, the light shielding structure 200 may be, for example, a single layer structure, a multi-layer structure, or a composite structure. In some embodiments, the material of the light shielding structure 200 includes, but is not limited to, black photoresist, black printing ink, black resin, other suitable materials, or a combination thereof. In some embodiments, the material of the light shielding structure 200 may be similar to or different from the optical structure 150 (and/or the optical structure 160). The light shielding structure 200 may be used to absorb or shield ambient light, for example, to reduce the influence of the ambient light reflected by the semiconductor device 100A on the light emitting (or display) quality.
Fig. 3 is a top view of the semiconductor device 100A shown in fig. 1 according to some embodiments of the invention. FIG. 3 shows the LED 120, the optical structure 150 and the light conversion for clarityThe layer 190 is positioned so that other components are omitted. As shown in fig. 3, the light emitting diode 120 overlaps the opening 150O of the optical structure 150 in the Z direction, i.e., the light emitting diode 120 does not overlap the optical structure 150 in the Z direction. In some embodiments, the outline of the opening 150O of the optical structure 150 in the Z direction includes, but is not limited to, a circle, a rectangle, a polygon or other irregular shape. In some embodiments, the outline of the light emitting diode 120 (e.g., the upper surface US2 of the light emitting diode 120) includes, for example, but is not limited to, a circle, a rectangle, a polygon, or other irregular shape. In some embodiments, in the Z direction, the outline of the opening 150O of the optical structure 150 is, for example, the same as or different from the outline of the light emitting diode 120 (e.g., the upper surface US2 of the light emitting diode 120). In some embodiments, in the Z direction, the outline of the opening 150O of the optical structure 150 is different from or the same as the outline of the light emitting diode 120 (e.g., the upper surface US2 of the light emitting diode 120), for example. In some embodiments, the outline of the opening 150O of the optical structure 150 is equal to or greater than the outline of the light emitting diode 120 (e.g., the upper surface US2 of the light emitting diode 120), for example. In some embodiments, the outline of the opening 150O of the optical structure 150 is equal to or smaller than the outline of the light emitting diode 120 (e.g., the upper surface US2 of the light emitting diode 120), for example. In some embodiments, the optical structure 150 and the light-converting layer 190 have a distance D in the Z direction1. In detail, the distance D1Which may be defined as the minimum distance between the optical structure 150 and the light-converting layer 190 in the X-direction. The X direction may be defined as a direction in which the plurality of leds 120 are disposed, for example, an extension line L1 is obtained by connecting center points of two adjacent leds 120, and the extension direction of the extension line L1 may be defined as the X direction, but is not limited thereto. Distance D1The following relational expression (1) can be satisfied:
0.5μm≦D1≦((P-W)/2)-1μm (1)
the pitch P (pitch) is defined as a distance between two adjacent leds 120, such as a distance between center points C1 of two adjacent leds 120, or alternatively, the pitch P is defined as a distance between left sides (or right sides) of two adjacent leds 120. In addition, the width W is defined as the width of the light conversion layer 190. For example, in some embodiments, when the outline of the light conversion layer 190 is substantially circular, the width W may be defined as the diameter of the light conversion layer 190. In some embodiments, when the outline of the light-converting layer 190 is rectangular or irregular, the width W may define an extension line L1 passing through the center points C1 of two adjacent leds 120, and the extension line L1 intersects the light-converting layer 190 at two points, for example, and the maximum distance between the two points in the X direction is defined as the width W. Note that when the semiconductor device 100A includes the filter layer 180 but does not include the light conversion layer 190, the width W in the above relation (1) may be defined as the width of the filter layer 180, and the width W of the filter layer 180 is defined in a similar manner to the light conversion layer 190, so that the description thereof will not be repeated.
Fig. 4 is a top view of the semiconductor device 100A shown in fig. 1 according to some embodiments of the invention. Fig. 4 omits other components for clarity of the relationship between the optical structure 160 and the light conversion layer 190. The light conversion layer 190 and the opening 160O of the optical structure 160 have a circular, rectangular, polygonal or other irregular outline, for example. In the Z direction, the optical structure 160 and the light-converting layer 190 have a distance D therebetween2. Distance D2Which may be defined as the minimum distance between the optical structure 160 and the light conversion layer 190 in the X-direction. Distance D2The following relational expression (2) can be satisfied:
0.5μm≦D2≦((P-W)/2)-1μm (2)
when the distance D1And/or distance D2When the ranges of the relations (1) and (2) are satisfied, the light emitted from the light emitting diode 120 can be reduced to other light emitting units (or pixel units). For example, when the distance D is1And/or distance D2When the above relation is satisfied, the light emitted from the light emitting diode 120 may be directed to the light conversion layer 190 (or the filter layer 180) of the adjacent light emitting unit (or pixel unit) to reduce the influence on the light emitting (or displaying) quality. As shown in FIG. 1, the side light I emitted from the LED 1201For example can be coveredThe light I emitted from the upper surface US2 of the LED 120 is absorbed (or reflected) by the optical structure 1502The light I can be partially absorbed (or reflected) by the optical structure 160 (and/or the optical structure 150) and partially not converted by the light conversion layer 190 or absorbed (or reflected) by the optical structure 1603May be absorbed by the light shielding structure 200, for example. Therefore, by providing the optical structure 150 (or the optical structure 160) and designing the distance between the optical structure 150 (or the optical structure 160) and the light conversion layer 190 (or the filter layer 180) to conform to the above-mentioned relational expressions (1) and (2), it is helpful to reduce the light emitted from the light emitting diode 120 from being emitted to other (adjacent) light emitting units (or pixel units), reduce the mutual interference between different (adjacent) light emitting units (or pixel units), and improve the light emitting (display) quality of the semiconductor device 100A or the color purity of each light emitting unit (or pixel unit). It should be noted that, although the distance D in the relations (1) and (2) is shown1And a distance D2The minimum distance between the optical structure 150 (or the optical structure 160) and the light conversion layer 190 (or the filter layer 180) in the Y direction, for example, is perpendicular to the Z direction and the X direction, respectively. Similarly, the minimum distance between the optical structure 150 (or the optical structure 160) and the light conversion layer 190 (or the filter layer 180) in other directions (different from the X direction and the Y direction, and perpendicular to the Z direction) also satisfies the above relationship.
Fig. 5 is a cross-sectional schematic view of a semiconductor device 100B according to some embodiments of the invention. The semiconductor device 100B is similar to the semiconductor device 100A, one of which differs in that: the semiconductor device 100B does not include the optical structure 160, i.e., the optical structure 160 is not disposed between the second side 140S2 of the adhesive structure 140 and the second substrate 170.
Fig. 6 is a cross-sectional schematic view of a semiconductor device 100C according to some embodiments of the invention. The semiconductor device 100C is similar to the semiconductor device 100A, one of which differs in that: the semiconductor device 100C does not include the optical structure 150, i.e., the optical structure 150 is not disposed between the first side 140S1 of the adhesive structure 140 and the first substrate 110.
Fig. 7 is a cross-sectional schematic view of a semiconductor device 100D according to some embodiments of the invention. The semiconductor device 100D is similar to the semiconductor device 100A, one of which differs in that: the light-converting layer 190 of the semiconductor device 100D is disposed between the light-emitting diode 120 and the adhesion structure 140. In some embodiments, the adhesion structure 140 is disposed between the light conversion layer 190 and the filter layer 180, for example. In some embodiments, the light conversion layer 190 is disposed on (or covers) the upper surface US2 of the light emitting diode 120, for example, and is in contact with the light emitting diode 120. In some embodiments, the light conversion layer 190 is disposed on (or covers) a side surface of the led 120 (not shown), for example. In some embodiments, the first insulating layer 130 is disposed, for example, adjacent to the light emitting diode 120 and the light conversion layer 190.
Fig. 8 is a cross-sectional schematic view of a semiconductor device 100E according to some embodiments of the invention. In some embodiments, the optical structure 220 may be disposed, for example, within the first insulating layer 130. In detail, in some embodiments, the first insulating layer 130 is located between adjacent light emitting diodes (between the first light emitting diode 120A and the second light emitting diode 120B), the first insulating layer 130 has a first through hole 130U, and the optical structure 220 is disposed (or filled) in the first through hole 130U. In some embodiments, the optical structure 230 may be disposed, for example, within the second insulating layer 210. In detail, the second insulating layer 210 has a second through hole 210U, and the optical structure 230 is disposed (or filled) in the second through hole 210U. In some embodiments, the first through hole 130U and/or the second through hole 210U may be formed by performing a developing or etching process on the first insulating layer 130 and/or the second insulating layer 210. In some embodiments, the material of optical structure 220 and/or optical structure 230 may be the same as or different from optical structure 150. In some embodiments, the optical structure 230 may be in contact with the light shielding structure 200, for example. In some embodiments, the optical structure 220 may be disposed, for example, partially on the upper surface US1 of the first insulating layer 130. In some embodiments, the optical structure 230 may be, for example, partially in contact with the surface 210S of the second insulating layer 210.
Fig. 9 is a plan view of the semiconductor device 100E shown in fig. 8. For clarity, the LED 120, the optical structure 220 and the light conversion layer 19 are shown0, and other components are omitted. As shown in fig. 9, the optical structure 220 is disposed between the adjacent light emitting diodes 120 in the XY plane, for example. In some embodiments, the optical structure 220 divides the first insulating layer 130 into a plurality of portions, for example, which are respectively disposed adjacent to the light emitting diodes 120. In some embodiments, the light conversion layer 190 and the optical structure 220 have a distance D therebetween, for example3. Distance D3For example, the shortest distance between the light conversion layer 190 and the optical structure 220 in the X direction. In some embodiments, distance D3Conforms to the relation (3):
0.5μm≦D3≦((P-W)/2)-1μm (3)
in relation (3), pitch P and width W are defined as described above.
Fig. 10 is a plan view of the semiconductor device 100E shown in fig. 8. Other components are omitted for clarity of the arrangement of the light conversion layer 190 and the optical structure 230. As shown in fig. 10, the optical structure 230 is disposed between the adjacent light conversion layers 190 in the XY plane, for example. In some embodiments, the optical structure 230, for example, divides the second insulating layer 210 into a plurality of portions, which are respectively disposed adjacent to the light conversion layer 190. In some embodiments, the light conversion layer 190 and the optical structure 230 have a distance D therebetween, for example4. Distance D4For example, the distance D is defined as the shortest distance between the light-converting layer 190 and the optical structure 230 in the X direction4Conforms to the relation (4):
0.5μm≦D4≦((P-W)/2)-1μm (4)
in relation (4), the pitch P and the width W are defined as described above. When the distance D3Or a distance D4When the above formula ranges are satisfied, it is helpful to reduce the light emitted from the light emitting diode 120 from being emitted to other (adjacent) light emitting units (or pixel units), so as to reduce the mutual interference between different (adjacent) light emitting units or pixel units, thereby improving the light emitting (display) quality of the semiconductor device 100A or improving the color purity of the respective light emitting units (or pixel units).
Note that when the semiconductor device 100E includes the filter layer 180 but does not include the light conversion layer 190, the width W in the above relations (3) and (4) may be defined as the width of the filter layer 180, and the width W of the filter layer 180 is defined similarly to the above light conversion layer 190, so that the description thereof will not be repeated.
As shown in fig. 8, 9, and 10, in the Z direction, the optical structure 220 may at least partially overlap the optical structure 230, for example. In other embodiments, the optical structure 220 may not overlap with the optical structure 230 in the Z direction, for example. In other embodiments, the optical structure 220 may be the same size (or different shape) as the optical structure 230 or different. It is noted that although the optical structures 220 and 230 shown in fig. 9 and 10 are cross-shaped, if the top view of the semiconductor device 100E is enlarged, the optical structures 220 and 230 are, for example, grid-shaped structures formed by a plurality of cross-shaped structures, and the grid-shaped structures may have, for example, arc-shaped edges, but not limited thereto. In some embodiments, the optical structures 220 and 230 may include a plurality of discontinuous patterns on the XY plane, wherein the discontinuous patterns correspond to the outer edge profile of the light emitting diode 120 or the light conversion layer 190 (or the filter layer 180), respectively, but not limited thereto.
Fig. 11 is a cross-sectional schematic view of a semiconductor device 100F according to some embodiments of the invention. The semiconductor device 100F may be similar to the semiconductor device 100E, one of which differs in that: the optical structures 220 and 230 of the semiconductor device 100E are replaced by optical structures 240 and 250, respectively. In some embodiments, the optical structure 240 and/or the optical structure 250 are disposed (or filled) in the first through hole 130U and/or the second through hole 210U, respectively. In some embodiments, the optical structure 240 includes a reflective layer 241 and an absorbing layer 242. In some embodiments, the absorption layer 242 is disposed on the reflection layer 241, for example, i.e., the absorption layer 242 is closer to the first side 140S1 of the adhesion structure 140 than the reflection layer 241, for example. In some embodiments, the absorbing layer 242 is, for example, in contact with the adhesive structure 140. In some embodiments, the reflective layer 241 is disposed on the absorption layer 242, for example, i.e., the reflective layer 241 is closer to the first side 140S1 of the adhesion structure 140 than the absorption layer 242, for example. In some embodiments, the optical structure 250 includes a reflective layer 251 and an absorbing layer 252. In some embodiments, the absorbing layer 252 is disposed between the reflective layer 251 and the adhesive structure 140, for example, i.e., the absorbing layer 252 is closer to the adhesive structure 140 than the reflective layer 251, for example. In some embodiments, the absorbent layer 252 is, for example, in contact with the adhesive structure 140. In some embodiments, the absorbing layer 252 is, for example, disposed on the reflective layer 251, i.e., the reflective layer 251 is, for example, more adjacent to the adhesive structure 140 than the absorbing layer 252. The reflective layer 241 and/or the reflective layer 251 may comprise, for example, a metal alloy, a white reflective material (white ink), other suitable materials, or combinations thereof, but is not limited thereto. The material of the absorption layer 242 and/or the absorption layer 252 may be, for example, the same or similar absorption material as the optical structure 220, and will not be described herein again. The reflective layer 241 (or the reflective layer 251) may be used to reflect light emitted from the light emitting diode 120 to other (adjacent) light emitting units (or pixel units) to the light conversion layer 190 (and/or the filter layer 180) corresponding to the light emitting diode 120, for example, so as to improve the light emitting (or displaying) quality of each light emitting unit (or pixel unit) or improve the color purity of the semiconductor device. The absorption layer 242 (or the absorption layer 252) may be used, for example, to absorb light emitted from the light emitting diode 120 to other (adjacent) light emitting units (or pixel units), reduce interference between different (adjacent) light emitting units (or pixel units), improve light emitting (display) quality of the semiconductor device 100A, or improve color purity of the respective light emitting units (or pixel units).
In some embodiments, one light conversion layer 190 (and/or the filter layer 180) may overlap a plurality of leds 120 on the XY plane, and the leds 120 may emit light with the same wavelength, for example, but not limited thereto (not shown). In some embodiments, the semiconductor device may not include the light conversion layer 190 and the filter layer 180, and the plurality of light emitting diodes 120 may emit light with different wavelengths (or different colors), respectively.
As shown in FIG. 11, the reflective layer 241 has a first thickness T1A first thickness T1Defined as the maximum thickness of the reflective layer 241 in the Z direction. The absorption layer 242 has a second thickness T2A second thickness T2Defined as the maximum thickness of the absorbing layer 242 in the Z direction. In some embodiments, the first thickness T1Equal to or greater than the second thickness T2. In some embodiments, the first thickness T1Equal to or less than the second thickness T2. The reflective layer 251 has a third thickness T3Third thickness T3Is the maximum thickness of the reflective layer 251 in the Z direction. The absorption layer 252 has a fourth thickness T4Fourth thickness T4Is the maximum thickness of the absorbing layer 252 in the Z-direction. In some embodiments, the third thickness T3Equal to or greater than the fourth thickness T4. In some embodiments, the third thickness T3Equal to or less than the fourth thickness T4. Thickness (e.g., first thickness T) of the above-mentioned layer (or assembly)1A second thickness T2A third thickness T3And a fourth thickness T4) The thickness of the layer (or device) may be defined by taking an SEM image of a cross-section of the layer (or device), for example, by measuring the maximum thickness of the layer (or device) in the SEM image, or by other suitable measurement methods. Note that the width (e.g., width W) of the above-described elements (structures, layers), the pitch (e.g., pitch P) between the elements, and the distance (e.g., distance D) between the elements1、D2、D3、D4) For example, the image can be captured by an Optical Microscope (OM), and the width, spacing, and distance of the component (structure, layer) in the image can be measured to define the definition, or can be measured by other suitable measuring methods. In addition, depending on the design of the semiconductor device, it may be selected whether the first substrate 110 and the second substrate 170 need to be disassembled before the optical microscope is performed, or the optical microscope may be performed without disassembling. In some embodiments, if the light-shielding layer 200 is disposed on the semiconductor device and the light-shielding layer 200 may affect the image capture of the optical structure, the optical structure may be observed after removing the light-shielding layer 200 by wet etching or dry etching, but the method is not limited to the above removal method. In some embodiments, the cross-sectional structure can also be photographed by using a scanning electron microscope, for example, observing the cross-sectional structure in the tangential direction of A-A 'like FIG. 1 or B-B' like FIG. 8Cross-sectional structure, and measuring the width (e.g., width W), pitch (e.g., pitch P), and distance (e.g., distance D) via SEM icons1、D2、D3、D4) But is not limited thereto.
Although embodiments of the present invention and their advantages have been described above, it should be understood that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims. Moreover, the scope of the present application is not intended to be limited to the particular embodiments of the process, machine, manufacture, composition of matter, means, methods and steps described in the specification, but rather, the process, machine, manufacture, composition of matter, means, methods and steps described in connection with the embodiments disclosed herein will be understood to one skilled in the art to which the present application relates from the disclosure of the embodiments of the present application to include any means, method, or step in the art that performs the specified function or achieves the specified result in the described embodiments. Accordingly, the scope of the present application includes the processes, machines, manufacture, compositions of matter, means, methods, and steps described above. In addition, each claim constitutes an individual embodiment, and the scope of protection of the present invention also includes combinations of the respective claims and embodiments.
