阅读说明：本技术 光学膜及包括光学膜的显示装置 (Optical film and display device including the same ) 是由 边炳勳 李德珍 郑又硕 崔东旭 于 2021-04-29 设计创作，主要内容包括：本申请涉及光学膜和包括光学膜的显示装置。光学膜包括：偏振层,包括用碘染色的聚合物；相位延迟层,设置在偏振层下方；以及无机阻挡层,包括非极性无机材料。无机阻挡层设置在偏振层的至少一个表面上,具有等于或小于约100g/天·m～(2)的水蒸气透过率(WVTR)且具有等于或小于约5μm的厚度。还提供了包括光学膜的显示装置。(The present application relates to an optical film and a display device including the same. The optical film includes: a polarizing layer comprising a polymer dyed with iodine; a phase retardation layer disposed below the polarizing layer; and an inorganic barrier layer comprising a non-polar inorganic material. An inorganic barrier layer disposed on at least one surface of the polarizing layer and having a thickness equal to or less than about 100 g/day-m 2 And has a thickness equal to or less than about 5 μm. A display device including the optical film is also provided.)

1. An optical film, comprising:

a polarizing layer comprising a polymer dyed with iodine;

a phase retardation layer disposed below the polarizing layer; and

an inorganic barrier layer comprising a non-polar inorganic material, wherein,

the inorganic blocking layer is disposed on at least one surface of the polarizing layer,

the inorganic barrier layer has an amount of 100 g/day-m or less²Water vapor transmission rate of (a); and

the inorganic barrier layer has a thickness equal to or less than 5 μm.

2. The optical film of claim 1, wherein the inorganic barrier layer comprises NaF, Na₃AlF₃、LiF、MgF₂、CaF₂、BaF₂、SiO₂、LaF₃、CeF、Al₂O₃、ZrO_x、NbO_xATO and SiN_xAt least one of (1).

3. The optical film of claim 1, wherein the inorganic barrier layer comprises SiO₂。

4. The optical film of claim 1, wherein the inorganic blocking layer is disposed between the polarizing layer and the phase retarding layer.

5. The optical film of claim 1, further comprising a protective layer disposed on the polarizing layer and comprising at least one of polymethyl methacrylate, triacetyl cellulose, cyclic olefin polymer, and polyethylene terephthalate.

6. The optical film of claim 5, wherein the inorganic barrier layer is disposed between the polarizing layer and the protective layer.

7. The optical film of claim 5, wherein the inorganic barrier layer comprises:

a first inorganic barrier layer disposed between the polarizing layer and the phase retardation layer; and

a second inorganic barrier layer disposed between the polarizing layer and the protective layer.

8. The optical film of claim 1, further comprising an adhesive layer in contact with the inorganic barrier layer, the adhesive layer comprising an adhesive binder and a silane coupling agent.

9. The optical film of claim 1, wherein the phase retardation layer comprises:

a first phase retardation layer which is a half-wave plate; and

a second phase retardation layer which is a quarter-wave plate.

10. A display device, comprising:

a panel section including a display panel; and

an optical film disposed on at least one surface of the panel portion, the optical film comprising:

a polarizing layer comprising a polymer dyed with iodine;

a phase retardation layer disposed below the polarizing layer; and

an inorganic barrier layer comprising a non-polar inorganic material, wherein,

the inorganic barrier layer has an amount of 100 g/day-m or less²Water vapor transmission rate of (a); and

the inorganic barrier layer has a thickness equal to or less than 5 μm.

11. The display device according to claim 10, wherein the inorganic barrier layer comprises NaF, Na₃AlF₃、LiF、MgF₂、CaF₂、BaF₂、SiO₂、LaF₃、CeF、Al₂O₃、ZrO_x、NbO_xATO and SiN_xAt least one of (1).

12. The display device of claim 10, wherein the inorganic barrier layer comprises SiO₂。

13. The display device according to claim 10,

the optical film further includes a protective layer disposed on the polarizing layer and including at least one of polymethyl methacrylate, triacetyl cellulose, cyclic olefin polymer, and polyethylene terephthalate; and

the inorganic blocking layer is disposed between the polarizing layer and the protective layer.

14. The display device according to claim 10, the optical film further comprising a protective layer disposed on the polarizing layer and comprising at least one of polymethyl methacrylate, triacetyl cellulose, cyclic olefin polymer, and polyethylene terephthalate, wherein the inorganic barrier layer comprises:

a first inorganic barrier layer disposed between the polarizing layer and the phase retardation layer; and

a second inorganic barrier layer disposed between the polarizing layer and the protective layer.

15. The display device of claim 10, wherein the inorganic blocking layer is disposed directly on the polarizing layer.

16. The display device of claim 10, wherein the optical film further comprises an adhesive layer in contact with the inorganic barrier layer, the adhesive layer comprising an adhesive binder and a silane coupling agent.

17. The display device according to claim 10, wherein the display panel includes a touch sensing portion.

18. The display device according to claim 10, further comprising a protective window provided on the optical film.

19. The display device according to claim 18, further comprising a metal functional layer provided between the protective window and the optical film.

20. The display device according to claim 19, wherein the metal functional layer comprises at least one of a fingerprint sensing portion, a pressure sensing portion, and an antenna.

Technical Field

Embodiments relate to an optical film and a display device including the same.

Background

Light entering the display panel may be reflected by electrodes, metal wirings, and the like, and the reflected light may cause deterioration in visibility and contrast of the display device.

To reduce the reflected light, the display device may comprise a polarizer. The polarizer may include a polarizing layer and a phase retardation layer to convert linearly polarized light into circularly polarized light. As a result, the reflected light emitted from the display device can be reduced.

Disclosure of Invention

Embodiments provide an optical film having improved reliability.

Embodiments provide a display device including an optical film.

According to an embodiment, an optical film may include: a polarizing layer comprising a polymer dyed with iodine; a phase retardation layer disposed below the polarizing layer; and an inorganic blocking layer comprising a non-polar inorganic material disposed on at least one surface of the polarizing layer. The inorganic barrier layer can have an inorganic barrier layer of equal to or less than about 100 g/day-m²And may have a thickness equal to or less than about 5 μm.

In an embodiment, the inorganic barrier layer may include NaF, Na₃AlF₃、LiF、MgF₂、CaF₂、BaF₂、SiO₂、LaF₃、CeF、Al₂O₃、ZrO_x(zirconium oxide), NbO_xNiobium oxide, ATO (antimony tin oxide), and SiN_x(silicon nitride).

In an embodiment, the inorganic barrier layer may include SiO₂。

In an embodiment, an inorganic blocking layer may be disposed between the polarizing layer and the phase retardation layer.

In an embodiment, the optical film may further include a protective layer disposed on the polarizing layer and including at least one of polymethylmethacrylate, triacetyl cellulose, a cyclic olefin polymer, and polyethylene terephthalate.

In embodiments, an inorganic blocking layer may be disposed between the polarizing layer and the protective layer.

In an embodiment, the inorganic blocking layer may include a first inorganic blocking layer disposed between the polarizing layer and the phase retardation layer and a second inorganic blocking layer disposed between the polarizing layer and the protective layer.

In embodiments, the optical film may further include an adhesive layer in contact with the inorganic barrier layer. The adhesive layer may include an adhesive binder and a silane coupling agent.

In an embodiment, the phase retardation layer may include a first phase retardation layer that is a half-wave plate and a second phase retardation layer that is a quarter-wave plate.

According to an embodiment, a display device may include a panel portion having a display panel and an optical film disposed on at least one surface of the panel portion. The optical film may include: a polarizing layer comprising a polymer dyed with iodine; a phase retardation layer disposed below the polarizing layer; and an inorganic barrier layer comprising a non-polar inorganic material. The inorganic barrier layer can have an inorganic barrier layer of equal to or less than about 100 g/day-m²And may have a thickness equal to or less than about 5 μm.

In an embodiment, the inorganic barrier layer may include NaF, Na₃AlF₃、LiF、MgF₂、CaF₂、BaF₂、SiO₂、LaF₃、CeF、Al₂O₃、ZrO_x(zirconium oxide), NbO_xNiobium oxide, ATO (antimony tin oxide), and SiN_x(silicon nitride).

In an embodiment, the inorganic barrier layer may include SiO₂。

In an embodiment, the optical film may further include a protective layer disposed on the polarizing layer and including at least one of polymethyl methacrylate, triacetyl cellulose, cyclic olefin polymer, and polyethylene terephthalate, and the inorganic barrier layer may be disposed between the polarizing layer and the protective layer.

In an embodiment, the optical film further includes a protective layer disposed on the polarizing layer and including at least one of polymethyl methacrylate, triacetyl cellulose, cyclic olefin polymer, and polyethylene terephthalate, and the inorganic barrier layer may include a first inorganic barrier layer disposed between the polarizing layer and the phase retardation layer and a second inorganic barrier layer disposed between the polarizing layer and the protective layer.

In embodiments, the inorganic blocking layer may be disposed directly on the polarizing layer.

In an embodiment, the optical film may further include an adhesive layer in contact with the inorganic barrier layer, and the adhesive layer may include an adhesive binder and a silane coupling agent.

In an embodiment, the display panel may include a touch sensing part.

In an embodiment, the display panel may further include a protective window disposed on the optical film.

In an embodiment, the display panel may further include a metal functional layer disposed between the protective window and the optical film.

In an embodiment, the metal functional layer may include at least one of a fingerprint sensing portion, a pressure sensing portion, and an antenna.

According to the embodiment, migration of ions or polar solvents from the optical film including the polarizing layer may be prevented. Accordingly, damage to the metal pattern or the metal functional layer adjacent to the optical film may be prevented. Accordingly, the reliability of the display device including the optical film may be improved.

Drawings

Aspects of embodiments of the inventive concept will be more clearly understood from the following detailed description taken in conjunction with the accompanying drawings.

Fig. 1 is a schematic sectional view illustrating a display device according to an embodiment.

Fig. 2 is a schematic sectional view illustrating a panel portion of a display device according to an embodiment.

Fig. 3 is a schematic cross-sectional view illustrating an optical film according to an embodiment.

Fig. 4 is a perspective view illustrating a process of forming an optical film according to an embodiment.

Fig. 5 is a schematic sectional view illustrating a display device according to an embodiment.

Fig. 6 to 9 are schematic cross-sectional views illustrating an optical film according to an embodiment.

Fig. 10 is a schematic sectional view illustrating a display device according to an embodiment.

Detailed Description

Embodiments of an optical film and a display device according to the inventive concept will be described below with reference to the accompanying drawings, in which some embodiments are shown. The features of the present disclosure and methods of accomplishing the same may be understood more readily by reference to the following detailed description of the embodiments and the accompanying drawings. However, the present disclosure is not limited to the embodiments described below, but may be implemented in various forms.

In the embodiments, terms such as "first" and "second" are used to distinguish one component from another component, but the components are not limited by the terms. These terms are only used to distinguish one element from another.

In embodiments, expressions in the singular form include the plural meaning unless clearly used otherwise.

In embodiments, terms such as "comprising," "comprises," "including," "includes," "including," "has," "having," "contains," and/or "containing" as used herein specify the presence of stated features or elements, but do not preclude the presence or addition of one or more other features or elements.

In embodiments, when an element such as a film, region, or component is referred to as being "on," "over," or "under" another element, it can be directly on, over, or under the other element or intervening elements may also be present.

The components in the figures may be expanded or reduced in size for ease of description. For example, the size and thickness of each component shown in the drawings are arbitrarily illustrated for convenience of description, and thus the present disclosure is not necessarily limited to the size and thickness illustrated in the drawings.

In this specification, the phrase "a and/or B" may be understood to mean "A, B or a and B". The terms "and" or "may be used in a combined or separated sense and may be understood to be equivalent to" and/or ". Throughout this disclosure, the expression "at least one of A, B and C" may denote all or a variation of a, B, C, A, B, C, A, B, C.

The term "about" or "approximately" as used herein includes the stated value and the average value over an acceptable range of deviation of the specified value as determined by one of ordinary skill in the art taking into account the measurement in question and the error associated with the measurement of the specified quantity (i.e., the limitations of the measurement system). For example, "about" may mean within one or more standard deviations, or within ± 20%, ± 10%, or ± 5% of the stated value.

Unless otherwise defined or implied herein, all terms (including technical and scientific terms) used have the same meaning as commonly understood by one of ordinary skill in the art to which this disclosure belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

Hereinafter, embodiments of the present disclosure will be described in detail with reference to the accompanying drawings, and the same or corresponding components will be denoted by the same reference numerals.

Fig. 1 is a schematic sectional view illustrating a display device according to an embodiment.

Referring to fig. 1, the display device includes a panel portion PN, an optical film PL, and a protection window WN. The optical film PL may be disposed on the upper surface of the panel portion PN. For example, the optical film PL may be bonded to the upper surface of the panel portion PN. The upper surface of the panel part PN may be a light exit surface through which light generated in the panel part PN may be outwardly emitted. The protection window WN may be disposed on the upper surface of the optical film PL. For example, the protection window WN may be combined with the upper surface of the optical film PL. Therefore, the optical film PL may be disposed between the panel portion PN and the protection window WN. The optical film PL may function as a polarizer.

An adhesive layer may be provided between the panel portion PN and the optical film PL and between the optical film PL and the protection window WN to bond the panel portion PN and the optical film PL to each other and to bond the optical film PL and the protection window WN to each other. For example, the adhesive layer may include an acrylic adhesive or an optically clear adhesive.

For example, the protective window WN may comprise glass, polymeric material, or a combination thereof. In an embodiment, the protection window WN may include a glass film or a polymer material having flexibility.

Fig. 2 is a schematic sectional view illustrating a panel portion of a display device according to an embodiment. The panel portion may include a display panel having an array of pixels. In an embodiment, the display panel may include an organic light emitting display panel.

Referring to fig. 2, the pixel unit of the panel part PN may include a driving element and a light emitting element electrically connected to the driving element. In an embodiment, the light emitting element may be an organic light emitting diode. The driving element may include at least one thin film transistor.

In an embodiment, the buffer layer 220 may be disposed on the base substrate 210. The active pattern AP may be disposed on the buffer layer 220.

For example, the base substrate 210 may include glass, quartz, sapphire, polymeric materials, and the like. In an embodiment, the base substrate 210 may be a flexible substrate comprising a polymeric material. For example, the base substrate 210 may include polyethylene naphthalate, polyethylene terephthalate, polyetherketone, polycarbonate, polyarylate, polyethersulfone, polyimide, or a combination thereof.

The panel portion PN may further include a support substrate disposed below the base substrate 210.

The buffer layer 220 may prevent or reduce permeation of impurities, moisture, or external gas from the underside of the base substrate 210, and may reduce roughness of the upper surface of the base substrate 210. For example, the buffer layer 220 may include an inorganic material such as oxide, nitride, or the like.

A first gate metal pattern including the gate electrode GE may be disposed on the active pattern AP. The first insulating layer 230 may be disposed between the active pattern AP and the gate electrode GE.

A second gate metal pattern including the capacitor electrode pattern CE may be disposed on the gate electrode GE. The second gate metal pattern may further include a wiring for transmitting various signals and the like.

The second insulating layer 240 may be disposed between the gate electrode GE and the capacitor electrode pattern CE. The third insulating layer 250 may be disposed on the capacitor electrode pattern CE.

For example, the active pattern AP may include silicon or a metal oxide semiconductor. In an embodiment, the active pattern AP may include polycrystalline silicon (polysilicon) that may be doped with n-type impurities or p-type impurities.

In another embodiment not shown or in another transistor not shown, the active pattern AP may include a metal oxide semiconductor. For example, the active pattern AP may include a two-component compound (AB) that may include indium (In), zinc (Zn), gallium (Ga), tin (Sn), titanium (Ti), aluminum (Al), hafnium (Hf), zirconium (Zr), or magnesium (Mg)_x) Ternary compounds (AB)_xC_y) Or a tetra-component compound (AB)_xC_yD_z). For example, the active pattern AP may include zinc oxide (ZnO)_x) Gallium oxide (GaO)_x) Titanium oxide (TiO)_x) Tin oxide (SnO)_x) Indium oxide (InO)_x) Indium Gallium Oxide (IGO), Indium Zinc Oxide (IZO), Indium Tin Oxide (ITO), Gallium Zinc Oxide (GZO), Zinc Magnesium Oxide (ZMO), Zinc Tin Oxide (ZTO), zinc zirconium oxide (ZnZr)_xO_y) Indium Gallium Zinc Oxide (IGZO), Indium Zinc Tin Oxide (IZTO), Indium Gallium Hafnium Oxide (IGHO), Tin Aluminum Zinc Oxide (TAZO), Indium Gallium Tin Oxide (IGTO), and the like.

The first, second, and third insulating layers 230, 240, and 250 may each independently include silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, or a combination thereof. The first, second, and third insulating layers 230, 240, and 250 may each include an insulating metal oxide, such as aluminum oxide, tantalum oxide, hafnium oxide, zirconium oxide, titanium oxide, or the like. For example, the first, second, and third insulating layers 230, 240, and 250 may each have a multi-layer structure or a single-layer structure including silicon nitride and/or silicon oxide, or may have different structures from each other.

The gate electrode GE and the capacitor electrode pattern CE may include a metal, a metal alloy, a metal nitride, a conductive metal oxide, and the like. For example, the gate electrode GE and the capacitor electrode pattern CE may each independently include gold (Au), silver (Ag), aluminum (Al), copper (Cu), nickel (Ni), platinum (Pt), magnesium (Mg), chromium (Cr), tungsten (W), molybdenum (Mo), titanium (Ti), tantalum (Ta), or an alloy thereof, and may have a single layer structure or a multi-layer structure including different metal layers.

The first source metal pattern may be disposed on the third insulating layer 250. The first source metal pattern may include a source pattern SE and a drain pattern DE electrically contacting the active pattern AP. The source pattern SE and the drain pattern DE may respectively pass through an insulating layer disposed thereunder to contact the active pattern AP.

The first source metal pattern may include a metal, a metal alloy, a metal nitride, a conductive metal oxide, and the like. For example, the first source metal pattern may include gold (Au), silver (Ag), aluminum (Al), copper (Cu), nickel (Ni), platinum (Pt), magnesium (Mg), chromium (Cr), tungsten (W), molybdenum (Mo), titanium (Ti), tantalum (Ta), or an alloy thereof, and may have a single layer structure or a multi-layer structure including different metal layers. In an embodiment, the first source metal pattern may have a multi-layer structure including an aluminum layer.

The fourth insulating layer 260 may be disposed on the first source metal pattern. The fourth insulating layer 260 may include an organic material. For example, the fourth insulating layer 260 may include an organic insulating material such as a phenol resin, an acrylic resin, a polyimide resin, a polyamide resin, a siloxane resin, an epoxy resin, or the like.

The organic light emitting diode 280 may be disposed on the fourth insulating layer 260. The organic light emitting diode 280 may include a first electrode 282 electrically contacting the drain electrode pattern DE, an organic light emitting layer 284 disposed on the first electrode 282, and a second electrode 286 disposed on the organic light emitting layer 284. The organic light emitting layer 284 of the organic light emitting diode 280 may be disposed at least in the opening of the pixel defining layer 270, wherein the pixel defining layer 270 is disposed on the fourth insulating layer 260. The first electrode 282 may be a lower electrode of the organic light emitting diode 280, and the second electrode 286 may be an upper electrode of the organic light emitting diode 280.

The first electrode 282 may function as an anode. For example, the first electrode 282 may be formed as a transmissive electrode or a reflective electrode according to an emission type of the display device. When the first electrode 282 is a transmissive electrode, the first electrode 282 may include indium tin oxide, indium zinc oxide, zinc tin oxide, indium oxide, zinc oxide, tin oxide, or the like. When the first electrode 282 is a reflective electrode, the first electrode 282 may include gold (Au), silver (Ag), aluminum (Al), copper (Cu), nickel (Ni), platinum (Pt), magnesium (Mg), chromium (Cr), tungsten (W), molybdenum (Mo), titanium (Ti), or a combination thereof, and may have a stacked structure further including a material usable for a transmissive electrode.

The pixel defining layer 270 may have an opening overlapping at least a portion of the first electrode 282. For example, the pixel defining layer 270 may include an organic insulating material.

The organic light emitting layer 284 may include at least a light emitting layer, and may further include at least one of a Hole Injection Layer (HIL), a Hole Transport Layer (HTL), an Electron Transport Layer (ETL), and an Electron Injection Layer (EIL). For example, the organic light emitting layer 284 may include a low molecular weight organic compound or a high molecular weight organic compound.

In an embodiment, the organic light emitting layer 284 may emit red, green, or blue light. In another embodiment, the organic light emitting layer 284 may emit white light. The organic light emitting layer 284 emitting white light may have a multi-layered structure including a red emitting layer, a green emitting layer, and a blue emitting layer, or it may have a single-layered structure including a mixture of a red emitting material, a green emitting material, and a blue emitting material.

The second electrode 286 may be formed as a transmissive electrode or a reflective electrode according to an emission type of the display device. For example, the second electrode 286 may include a metal, a metal alloy, a metal nitride, a metal fluoride, a conductive metal oxide, or a combination thereof.

For example, at least one of the second electrode 286 and the organic light emitting layer 284 may be formed as a common layer continuously extending over the pixels in the display region. However, the embodiment is not limited thereto. For example, the organic light emitting layers 284 may be formed in a pattern corresponding to the pixel region and separated from each other.

The encapsulation layer 290 may be disposed on the organic light emitting diode 280. The encapsulation layer 290 may have a stacked structure of an inorganic thin film and an organic thin film. For example, the encapsulation layer 290 may include a first inorganic thin film 292, an organic thin film 294 disposed on the first inorganic thin film 292, and a second inorganic thin film 296 disposed on the organic thin film 294. However, the embodiment is not limited thereto. For example, the encapsulation layer 290 may include at least two organic thin films and at least three inorganic thin films.

The touch sensing portion TP may be disposed on the encapsulation layer 290. For example, the touch sensing portion TP may sense an external input by detecting a change in capacitance, thereby obtaining coordinate information of the external input. However, the embodiment is not limited thereto. The touch sensing portion TP may sense an external input by detecting pressure.

For example, the touch sensing portion TP may include a lower touch insulation layer 212, a sensing conductive pattern 214, and a protective layer 216.

The sensing conductive pattern 214 may include first sensing electrodes arranged in a first direction and second sensing electrodes arranged in a second direction perpendicular to the first direction. For example, the first sensing electrodes may be electrically connected to each other through a connection portion disposed in the same layer as the first sensing electrodes. The second sensing electrodes may be electrically connected to each other through a bridge pattern disposed in a layer different from the second sensing electrodes.

The lower touch insulating layer 212 and the protective layer 216 may each independently include an inorganic insulating material. For example, the lower touch insulating layer 212 and the protective layer 216 may each independently include silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, or a combination thereof. Lower touch insulator layer 212 and protective layer 216 can each independently comprise an insulating metal oxide such as aluminum oxide, tantalum oxide, hafnium oxide, zirconium oxide, titanium oxide, and the like.

The sensing conductive pattern 214 may include a conductive material. For example, the sensing conductive pattern 214 may include a metal, a conductive metal oxide, a conductive polymer, graphene, carbon nanotubes, or a combination thereof. For example, the metal may include molybdenum, silver, titanium, copper, aluminum, or alloys thereof. For example, the metal may be provided in the shape of a continuous thin film or a nanowire. For example, the conductive metal oxide can include indium tin oxide, indium zinc oxide, zinc tin oxide, indium oxide, zinc oxide, tin oxide, or a combination thereof. The sensing conductive pattern 214 may have a multi-layer structure or a single-layer structure including different materials.

The bridge pattern may include the same material as the sensing conductive pattern 214 or a different material.

Fig. 3 is a schematic cross-sectional view illustrating an optical film according to an embodiment.

Referring to fig. 3, the optical film PL according to an embodiment may include a polarizing layer 110, a protective layer 150, an inorganic barrier layer 120, a first phase retardation layer 130a, a second phase retardation layer 130b, a first adhesive layer 140a, and a second adhesive layer 140 b.

The polarizing layer 110 may function as a polarizer that converts incident light into linearly polarized light. For example, the polarizing layer 110 may be obtained by dyeing a polymer film including polyvinyl alcohol (PVA) or the like with, for example, iodine and stretching (e.g., drawing) the dyed film. In an embodiment, the polarizing layer 110 may further include boric acid, moisture, or the like.

The first phase retardation layer 130a and the second phase retardation layer 130b may each function as a circular polarizer converting linearly polarized light into circularly polarized light (including elliptically polarized light). For example, the first phase retardation layer 130a and the second phase retardation layer 130b may each independently function as a half-wave plate or a quarter-wave plate.

In an embodiment, at least one of the first phase retardation layer 130a and the second phase retardation layer 130b may each independently include a cyclic olefin polymer, polyacrylate, Polycarbonate (PC), Polystyrene (PS), polyethylene terephthalate (PET), cellulose-based polymer, liquid crystal molecules, or a combination thereof. For example, the first phase retardation layer 130a may include a cycloolefin polymer, and the second phase retardation layer 130b may include polyacrylate. In another embodiment, the first phase retardation layer 130 and the second phase retardation layer 130b may include the same material.

For example, the first phase retardation layer 130a may include a positively birefringent material having a slow axis representing a maximum refractive index in a stretching direction. For example, the first phase retardation layer 130a may include at least one of cyclic olefin polymer, PC, PET, and cellulose-based polymer. In embodiments, an unstretched film comprising positively birefringent material may be prepared and rolled to form a rolled film. The rolled film may be unwound and advanced. The traveling film may be stretched substantially in a direction oblique to the traveling direction, and may be rolled up again to form a roll of the first phase retardation layer 130a having an oblique slow axis (optical axis).

For example, the second phase retardation layer 130b may comprise a negatively birefringent material having a slow axis representing a maximum refractive index in a direction substantially perpendicular to the stretching direction. For example, the second phase retardation layer 130b may include at least one of PS, polyacrylate, PC, and acrylate-styrene copolymer. In embodiments, an unstretched film comprising a negative birefringent material may be prepared and rolled to form a rolled film. The rolled film may be unwound and advanced. The traveling film may be stretched in a direction substantially perpendicular to the traveling direction, and may be rolled up again to form a roll of the second phase retardation layer 130b having a slow axis substantially parallel to the traveling direction of the traveling film.

The protective layer 150 may be disposed on the polarizing layer 110 to protect the polarizing layer 110. For example, the protective layer 150 may be combined with the polarizing layer 110.

For example, the protective layer 150 may include Polymethylmethacrylate (PMMA), triacetyl cellulose (TAC), cyclic olefin polymer, PET, or a combination thereof. In an embodiment, the protective layer 150 may include TAC.

The first adhesive layer 140a may combine the first phase retardation layer 130a with the polarization layer 110. The second adhesive layer 140b may combine the first phase retardation layer 130a with the second phase retardation layer 130 b. For example, the first adhesive layer 140a may be disposed between the inorganic blocking layer 120 and the first phase retardation layer 130a, and the inorganic blocking layer 120 may be disposed directly on the surface of the polarizing layer 110. For example, the inorganic blocking layer 120 may be directly combined with the surface of the polarizing layer 110 and the first phase retardation layer 130 a.

For example, the first and second adhesive layers 140a and 140b may each independently include an acrylic adhesive, a UV glue, a PVA-based adhesive, or the like. In an embodiment, the first adhesive layer 140a and the second adhesive layer 140b may each include a UV glue. The first and second adhesive layers 140a and 140b formed of the UV glue may have a small thickness and a large durability against an external force such as a bending force.

In an embodiment, the first adhesive layer 140a may include a silane coupling agent and an adhesive binder to increase adhesion to the inorganic barrier layer 120.

The inorganic barrier layer 120 may prevent migration of ions from the polarizing layer 110.

The inorganic barrier layer 120 may include a non-polar inorganic material. For example, the inorganic barrier layer 120 may include NaF, Na₃AlF₃、LiF、MgF₂、CaF₂、BaF₂、SiO₂、LaF₃、CeF、Al₂O₃、ZrO_x(zirconium oxide), NbO_xNiobium oxide, ATO (antimony tin oxide), SiN_x(silicon nitride) or a combination thereof.

The inorganic barrier layer 120 may include a material that has no birefringence, has a refractive index of about 1.5, has a light transmittance of greater than or equal to about 90%, and has a light transmittance of equal to or less than about 100 g/day-m²Water Vapor Transmission Rate (WVTR). For example, WVTR can be measured according to ASTM F1249. In view of the above, the inorganic barrier layer 120 may include, for example, SiO₂。

The thickness of the inorganic barrier layer 120 may be equal to or less than about 5 μm, and high thickness uniformity may be a desirable quality to prevent or reduce interference patterns. For example, the thickness of the inorganic barrier layer 120 may be in the range of about 0.1 μm to about 5 μm.

Under conditions with high humidity, iodide ions in the polarizing layer 110 may be dissolved by water as a polar solvent. When the iodine ions enter the panel part PN, the conductive pattern of the touch sensing part TP may be corroded, thereby reducing the reliability of the touch sensing part TP.

The inorganic barrier layer 120 may prevent migration of polar solvents or ions dissolved by polar solvents. Therefore, the iodine ions coming out of the polarizing layer 110 can be prevented from damaging the metal pattern or the like of the panel portion PN.

In an embodiment, the inorganic barrier layer 120 may be formed by deposition. As shown in fig. 3, the inorganic blocking layer 120 may be directly formed on the surface of the polarizing layer 110. Since the deposition process for forming the inorganic barrier layer 120 may be performed at a high temperature, the inorganic barrier layer 120 may shrink with cooling. The optical film PL including the inorganic blocking layer 120 directly formed on the polarizing layer 110 may have increased reliability as compared to an optical film including inorganic blocking layers directly formed on the first phase retardation layer 130a and the second phase retardation layer 130 b. Therefore, cracking of the inorganic barrier layer 120 can be reduced or prevented, and the reliability of the optical film PL can be improved.

Fig. 4 is a perspective view illustrating a process of forming an optical film according to an embodiment.

The optical film according to an embodiment may include an inorganic blocking layer disposed on the polarizing layer. For example, an inorganic blocking layer may be combined with a polarizing layer. Fig. 4 may illustrate a process of forming an inorganic blocking layer on a polarizing layer.

In embodiments, a roll-to-roll deposition apparatus may be used to form an inorganic barrier layer on a polarizing layer.

In an embodiment, the roll-to-roll deposition apparatus may include a film supply roll 22, a cooling drum 50, a deposition section 40, an inspection section 30, and a take-up roll 24.

The film supply roll 22 may supply the film 10. For example, the film 10 may be a polarizing layer. In another embodiment, the film 10 may include a polarizing layer and a protective layer disposed on the polarizing layer. For example, the film 10 may include a protective layer in combination with a polarizing layer. In another embodiment, the film 10 may include a phase retardation layer.

The cooling drum 50 may cool the film 10 to prevent the film 10 from being damaged by heat applied thereto in the deposition process. A coolant or the like may be supplied to the cooling drum 50 so that the cooling drum 50 can cool the film 10. The cooling drum 50 may serve as a table to support the film 10 during the deposition process.

The film 10 may be conveyed along the surface of the cooling drum 50, which may be the outer circumferential surface. The deposition portion 40 may be disposed above the surface of the cooling drum 50. For example, the deposition portion 40 may be disposed along the surface of the cooling drum 50. The film 10 may be disposed between the cooling drum 50 and the deposition portion 40. The film 10 may contact the surface of the cooling drum 50 and may be conveyed by the rotation of the cooling drum 50.

The deposition portion 40 may provide a deposition source to the film 10 by sputtering, chemical vapor deposition, or the like. Thus, an inorganic barrier layer may be formed on the surface of the film 10. In an embodiment, the deposition portions 40 may provide the same deposition source. In another embodiment, the deposition portion 40 may provide different deposition sources according to the composition of the inorganic barrier layer.

The combination of the deposition section 40 and the cooling drum 50 may be appropriately repeated according to the desired thickness of the inorganic barrier layer.

The inspection section 30 may inspect the inorganic barrier layer for defects or may measure the thickness of the inorganic barrier layer. Based on the result of the inspection, the deposition conditions may be adjusted, or a product having a defect may be identified.

The take-up roll 24 may wind the film 10 with the inorganic barrier layer to form a roll of film.

In an embodiment, the film 10 may be a polarizing layer. The polarizing layer disposed on the inorganic blocking layer may be disposed on the phase retardation layer through an adhesive layer to form an optical film. For example, the optical film may be formed of a polarizing layer combined with an inorganic blocking layer and a phase retardation layer.

Fig. 5 is a schematic sectional view illustrating a display device according to an embodiment.

Referring to fig. 5, the display device includes a panel portion PN, an optical film PL, a metal functional layer ML, and a protection window WN. The optical film PL may be disposed on the upper surface of the panel portion PN. For example, the optical film PL may be bonded to the upper surface of the panel portion PN. The optical film PL may function as a polarizer.

The metal functional layer ML may be disposed between the protection window WN and the optical film PL.

The metal functional layer ML may include at least one metal layer. For example, the metal functional layer ML may include a metal layer and an inorganic layer, may include a metal layer and an organic layer, or may include a metal layer, an inorganic layer, and an organic layer. In an embodiment, the metal functional layer ML may include at least one of a fingerprint sensing portion, a pressure sensing portion, and an antenna.

As shown in fig. 5, when the metal functional layer ML is disposed on the optical film PL, the optical film PL may have a suitable configuration to prevent ions or polar solvents in the optical film PL from entering the metal functional layer ML. For example, the embodiments may be explained with reference to the embodiments shown in fig. 6 to 8.

Referring to fig. 6, the optical film PL according to an embodiment may include a polarizing layer 110, a protective layer 150, an inorganic barrier layer 120, a first phase retardation layer 130a, a second phase retardation layer 130b, a first adhesive layer 140a, and a second adhesive layer 140 b.

In an embodiment, the inorganic blocking layer 120 may be disposed on an upper surface of the polarizing layer 110. For example, the inorganic blocking layer 120 may be combined with the upper surface of the polarizing layer 110. Accordingly, the inorganic barrier layer 120 may be disposed between the polarizing layer 110 and the protective layer 150. The optical film PL may prevent ions or polar solvents in the optical film PL from entering the metal functional layer provided on the optical film PL.

Referring to fig. 7, the optical film PL according to an embodiment may include a polarizing layer 110, a protective layer 150, a first inorganic barrier layer 120a, a second inorganic barrier layer 120b, a first phase retardation layer 130a, a second phase retardation layer 130b, a first adhesive layer 140a, and a second adhesive layer 140 b.

In an embodiment, the first inorganic barrier layer 120a may be disposed on the lower surface of the polarizing layer 110. For example, the first inorganic barrier layer 120a may be combined with the lower surface of the polarizing layer 110. The second inorganic blocking layer 120b may be disposed on the upper surface of the polarizing layer 110. For example, the second inorganic barrier layer 120b may be combined with the upper surface of the polarizing layer 110. Accordingly, the first inorganic barrier layer 120a is disposed between the polarizing layer 110 and the first adhesive layer 140a, and the second inorganic barrier layer 120b is disposed between the polarizing layer 110 and the protective layer 150.

The first inorganic barrier layer 120a and the second inorganic barrier layer 120b may each prevent ions or polar solvents in the optical film PL from migrating in two directions.

Referring to fig. 8, the optical film PL according to an embodiment may include a polarizing layer 110, a protective layer 150, an inorganic barrier layer 120, a first phase retardation layer 130a, a second phase retardation layer 130b, a first adhesive layer 140a, and a second adhesive layer 140 b.

In an embodiment, the protective layer 150 is disposed on the polarizing layer 110, and the inorganic barrier layer 120 is disposed on the protective layer 150. Therefore, the optical film PL can prevent ions or polar solvents in the optical film PL from entering the metal functional layer ML provided on the optical film PL.

Fig. 9 is a schematic cross-sectional view illustrating an optical film according to an embodiment.

Referring to fig. 9, the optical film PL according to an embodiment may include a polarizing layer 110, a protective layer 150, an inorganic barrier layer 120, a first phase retardation layer 130a, a second phase retardation layer 130b, a first adhesive layer 140a, and a second adhesive layer 140 b.

In an embodiment, the inorganic barrier layer 120 may be disposed on at least one of the first phase retardation layer 130a and the second phase retardation layer 130 b. For example, the inorganic barrier layer 120 may be disposed on the first phase retardation layer 130a such that it may be disposed between the first phase retardation layer 130a and the first adhesive layer 140 a. For example, the inorganic barrier layer 120 may be combined with the first phase retardation layer 130 a.

For example, as shown in fig. 4, the inorganic barrier layer 120 may be formed by depositing an inorganic material on a film including the first phase retardation layer 130 a.

Fig. 10 is a schematic sectional view illustrating a display device according to an embodiment.

Referring to fig. 10, the display device includes a panel portion PN, an optical film PL, and a protection window WN. The optical film PL may be disposed on the upper surface of the panel portion PN. The upper surface of the panel part PN may be a light exit surface through which light generated in the panel part PN may be outwardly emitted. The protection window WN may be disposed on the upper surface of the optical film PL. For example, the protection window WN may be combined with the upper surface of the optical film PL. Therefore, the optical film PL may be disposed between the panel portion PN and the protection window WN.

The optical film PL may include a polarizing layer functioning as a polarizer. For example, the optical film PL may include a polarizing layer, a protective layer disposed on an upper surface of the polarizing layer, and at least one phase retardation layer disposed on a lower surface of the polarizing layer. For example, in the optical film PL, a protective layer may be bonded to an upper surface of the polarizing layer, and at least one phase retardation layer may be bonded to a lower surface of the polarizing layer. For example, as shown in fig. 2, the panel portion PN may include a touch sensing portion.

The display device may include an inorganic barrier layer BL disposed between the optical film PL and the panel part PN. Accordingly, the inorganic barrier layer BL may be disposed between the polarizing layer of the optical film PL and the touch sensing portion of the panel portion PN. For example, the inorganic barrier layer BL may be deposited on the lower surface of the optical film PL or on the upper surface of the touch sensing part.

The inorganic barrier layer BL can prevent ions or polar solvents in the optical film PL from entering the touch sensing portion of the panel portion PN.

The above embodiments provide an organic light emitting display device. However, the embodiment is not limited thereto. For example, the embodiments may be applied to various display devices such as a liquid crystal display device, an electro-luminescence display device, a micro LED display device, and the like.

The embodiments can be applied to various display devices. In the embodiments, for example, the embodiments may be applied to a vehicle display device, a ship display device, an airplane display device, a portable communication device, a display device for display or for information transmission, a medical display device, and the like.

The foregoing is illustrative of embodiments and is not to be construed as limiting thereof. Although embodiments have been described, those skilled in the art will readily appreciate that many modifications are possible in the embodiments without materially departing from the novel teachings and aspects of the inventive concept. Accordingly, all such modifications are intended to be included within the scope of the present inventive concept. Therefore, it is to be understood that the foregoing is illustrative of various embodiments and is not to be construed as limited to the specific embodiments disclosed, and that modifications to the disclosed embodiments, as well as other embodiments, are intended to be included within the scope of the inventive concept as set forth in the appended claims and their equivalents.