阅读说明：本技术 一种适于溅射环批量电子束焊接的组件及方法 (Assembly and method suitable for batch electron beam welding of sputtering rings ) 是由 张延宾 张晓娜 宋泽鹏 李嘉 郭凤岐 丁照崇 冯昭伟 李武林 邱明亮 于 2021-06-25 设计创作，主要内容包括：本发明提出了一种溅射环批量电子束焊接的组件及方法,包括芯轴、隔板、套筒、挡板和螺栓。芯轴固定在电子束焊机卡盘上,尾部可通过电子束焊机工作台上的尾座顶尖支撑。批量焊接溅射环时,可一次安装多个溅射环,两个隔板固定一个溅射环,最后依靠挡板和螺栓固定。焊接时,只需要进行第一个溅射环支撑件和电极坐标、高压、束流和线速度等参数设定,其他溅射环可通过编程自动进行焊接。该溅射环批量电子束焊接组件及方法减少了多次抽真空和冷却时间,也减少了多次设定坐标参数的时间,提高了生产效率,降低了企业生产成本。(The invention provides a sputtering ring batch electron beam welding assembly and a method. The mandrel is fixed on a chuck of the electron beam welding machine, and the tail part of the mandrel can be supported by a tailstock center on a workbench of the electron beam welding machine. When the sputtering rings are welded in batches, a plurality of sputtering rings can be installed at one time, one sputtering ring is fixed by two clapboards, and finally, the sputtering rings are fixed by the baffle plates and the bolts. During welding, only the first sputtering ring support piece and parameters such as electrode coordinates, high voltage, beam current, linear speed and the like need to be set, and other sputtering rings can be automatically welded through programming. The sputtering ring batch electron beam welding assembly and the method reduce multiple times of vacuumizing and cooling time, also reduce multiple times of setting coordinate parameters, improve production efficiency and reduce production cost of enterprises.)

1. An assembly suitable for batch electron beam welding of sputtering rings is used for welding the sputtering rings by a vacuum electron beam welding machine and comprises a mandrel, a partition plate, a baffle plate and a bolt; the method is characterized in that: one end of the mandrel is a cylinder and is arranged on a chuck of the vacuum electron beam welding machine, the other end of the mandrel is provided with a threaded hole, a bolt is arranged in the threaded hole, and a tailstock center of the welding machine props against the bolt for fixing; the mandrel is provided with a plurality of steps, and the height of the steps is gradually reduced from the cylindrical end to the threaded hole end; the number of the baffle plates is multiple, and sputtering rings are arranged among the baffle plates; the partition plate is in a disc shape, bosses are arranged on two sides close to the edge of the partition plate, the diameter of each boss is slightly smaller than the inner diameter of the sputtering ring, and a large hole is formed in the circle center to ensure that the mandrel passes through the large hole; and a baffle plate is arranged in front of the bolt and used for blocking the partition plate.

2. The assembly of claim 1 adapted for sputter ring batch electron beam welding, wherein: the mandrel is made of steel materials or aluminum materials, and the partition plate is made of aluminum materials.

3. The assembly of claim 1 adapted for sputter ring batch electron beam welding, wherein: and a plurality of lightening holes are formed in the partition plate.

4. The assembly adapted for sputter ring batch electron beam welding according to claim 1 or 3, wherein: six lightening holes are formed in the partition plate.

5. The assembly of claim 1 adapted for sputter ring batch electron beam welding, wherein: the number of the baffles is set according to the number of the sputtering rings, and the number of the baffles is one less than the number of the sputtering rings.

6. The assembly of claim 1 adapted for sputter ring batch electron beam welding, wherein: the number of steps on the mandrel is 7.

7. The assembly of claim 1 adapted for sputter ring batch electron beam welding, wherein: a sleeve is arranged between the baffle and the baffle adjacent to the baffle according to the number of sputtering rings assembled during welding, and is used for blocking the baffle.

8. The assembly of claim 1 adapted for sputter ring batch electron beam welding, wherein: the assembly can be used for batch welding of a plurality of sputtering rings and can also be used for single-piece welding of the sputtering rings.

9. A method of sputter ring welding using an assembly suitable for sputter ring batch electron beam welding according to any of the preceding claims 1-8, characterized in that: installing the assembly in an electronic vacuum beam welding machine, adjusting the sputtering rings to be in the same direction, setting coordinate parameters of a first sputtering ring supporting piece and an electrode, and completing welding of the first sputtering ring; in the same vacuum environment, the automatic welding of other sputtering rings is realized in sequence by programming.

Technical Field

The invention belongs to the technical field of magnetron sputtering, and particularly relates to a batch electron beam welding assembly and method suitable for a sputtering ring.

Background

Magnetron sputtering is a film deposition technique commonly used in the production process of modern semiconductor chips, which utilizes high-energy particles to bombard a target material with high purity, so that target material atoms escape from the surface and are uniformly deposited on a substrate to form a uniform film layer, and after the working procedures of grinding, polishing and the like, a barrier layer, an interconnection line and a contact layer of an integrated circuit are formed on the substrate. In the cavity of the magnetron sputtering machine, the sputtering ring is a component which is used together with the corresponding target and is arranged between the target and the substrate, and the sputtering ring is mainly used for restraining the movement of sputtered target atoms through an electromagnetic field generated by an electric field applied to the sputtering ring, so that the coating incidence angle is more vertically concentrated, the deep hole filling of a chip is facilitated, and large particles possibly occurring in the sputtering process are adsorbed.

The magnetron sputtering ring structurally comprises a ring body, a supporting piece and an electrode, wherein the ring body, the supporting piece and the electrode are combined together through a welding method, and in order to ensure the purity of materials, not introduce other impurity components, and simultaneously ensure the welding strength and the smooth surface of a welding seam, electron beam welding is the optimal choice. The vacuum electron beam welding efficiency is low, the objective factors are that the welding needs to be carried out in a vacuum environment, the vacuum pumping is needed before the welding, the workpiece needs to be cooled after the welding is finished, and the vacuum pumping and cooling need time for each welding. In order to fully utilize the effective welding time, reduce the ineffective time of vacuumizing and cooling, improve the production efficiency and reduce the enterprise cost, an assembly and a method capable of carrying out batch electron beam welding on sputtering rings need to be provided.

Disclosure of Invention

The invention aims to provide an assembly and a method suitable for batch electron beam welding of sputtering rings, which can carry out batch welding of the sputtering rings, have high welding efficiency and high flexibility, and can be combined randomly to weld a single piece or multiple pieces.

In order to achieve the above object, in one aspect, the present invention provides an assembly suitable for batch electron beam welding of sputtering rings, which is used for welding the sputtering rings by a vacuum electron beam welding machine, and comprises a mandrel, a partition plate, a baffle plate and a bolt; the method is characterized in that: one end of the mandrel is a cylinder and is arranged on a chuck of the vacuum electron beam welding machine, the other end of the mandrel is provided with a threaded hole, a bolt is arranged in the threaded hole, and a tailstock center of the welding machine props against the bolt for fixing; the mandrel is provided with a plurality of steps, and the height of the steps is gradually reduced from the cylindrical end to the threaded hole end; the number of the baffle plates is multiple, and sputtering rings are arranged among the baffle plates; the partition plate is in a disc shape, bosses are arranged on two sides close to the edge of the partition plate, the diameter of each boss is slightly smaller than the inner diameter of the sputtering ring, and a large hole is formed in the circle center to ensure that the mandrel passes through the large hole; and a baffle plate is arranged in front of the bolt and used for blocking the partition plate.

Preferably, the mandrel is made of steel or aluminum, and the spacer is made of aluminum.

Preferably, the partition plate is provided with a plurality of lightening holes.

More preferably, six lightening holes are formed in the partition plate.

Preferably, the number of the spacers is set according to the number of the sputtering rings, and the number of the spacers is one less than the number of the sputtering rings.

Preferably, the number of steps on the mandrel is 7.

Preferably, a sleeve is provided between the baffle and the baffle adjacent thereto for blocking the baffle according to the number of spattering rings assembled at the time of welding.

Preferably, the assembly can be welded in batch by a plurality of sputtering rings, and can also be welded in a single piece by the sputtering rings.

In another aspect, the present invention provides a method for sputter ring batch electron beam welding using the above-mentioned assembly for sputter ring batch electron beam welding, characterized in that: installing the assembly in an electronic vacuum beam welding machine, adjusting the sputtering rings to be in the same direction, setting coordinate parameters of a first sputtering ring supporting piece and an electrode, and completing welding of the first sputtering ring; in the same vacuum environment, the automatic welding of other sputtering rings is realized in sequence by programming.

The invention has the beneficial effects that: the assembly and the method suitable for batch electron beam welding of the sputtering rings can be used for batch electron beam welding of the sputtering rings, so that multiple times of vacuumizing and cooling time during welding are saved, and the production efficiency is improved; meanwhile, when a plurality of sputtering rings are welded, after the program of the first sputtering ring is set, the subsequent sputtering rings are automatically welded in a programmable setting mode; the baffle plate and the sleeve are combined according to the number of sputtering rings to be welded, so that a plurality of parts can be welded, single-piece welding can be performed, and the combination is convenient and flexible.

Drawings

FIG. 1 is a schematic view of an assembly of sputtering rings of the present invention being batch sputtered;

FIG. 2 is a general schematic view of the components of the present invention suitable for batch electron beam welding of sputter rings and the assembly of the sputter rings;

FIG. 3 is a schematic assembly view of an assembly suitable for sputter ring batch electron beam welding of four sputter rings according to one embodiment of the present invention;

FIG. 4 is a schematic assembly view of an assembly suitable for sputter ring batch electron beam welding of three sputter rings according to one embodiment of the present invention;

FIG. 5 is a schematic view of an assembly of an embodiment of the present invention adapted for sputter ring batch electron beam welding to weld two sputter rings;

FIG. 6 is an assembly view of an assembly adapted for sputter ring batch electron beam welding of one sputter ring according to one embodiment of the present invention.

Detailed Description

The present invention is further described below in conjunction with the following figures and specific examples so that those skilled in the art may better understand the present invention and practice it, but the examples are not intended to limit the present invention.

As shown in FIG. 1, the sputtering ring 200 welded by the present invention includes a ring body 201, an electrode 202 and a support 203. The electrode 202 and the support 203 have been fixed to the ring 201 by other means prior to welding.

As shown in fig. 2-6, an embodiment 100 of the present invention is an assembly for batch electron beam welding of sputter rings, which is mainly used in a vacuum electron beam welding machine for batch welding of sputter rings 200, and comprises a mandrel 101, a spacer 102, a bolt 103, a baffle 105, and a sleeve.

The mandrel 101 is made of steel materials or aluminum materials, one end of the mandrel 101 is a cylinder and is installed on a chuck of the vacuum electron beam welding machine, the other end of the mandrel 101 is provided with a threaded hole, and the bolt 103 is installed in the threaded hole; the mandrel is provided with a plurality of steps, the number of the steps can be set according to the size of the worktable of the vacuum electron beam welding machine, and in a general electron beam welding machine, the number of the steps on the mandrel is preferably 7; the height of the step is gradually reduced from the cylindrical end to the threaded bore end to facilitate assembly.

The partition plate 102 is disc-shaped, bosses are arranged on two sides close to the edge of the partition plate, the diameter of the boss is slightly smaller than the inner diameter of the sputtering ring 200, a large hole is formed in the circle center to ensure that the mandrel 101 can penetrate through the boss, and a plurality of lightening holes, preferably six lightening holes, are formed in the partition plate 102 and are convenient for operators to take, place and install. The number of the partition plates 102 is multiple, the sputtering rings 200 are arranged between the partition plates, the number of the partition plates is one less than that of the sputtering rings according to the number of the sputtering rings 200, and two adjacent partition plates are used for fixing the middle sputtering ring. The separator is generally made of an aluminum material.

The bolt 103 is installed in a threaded hole of the mandrel 101, and a baffle 105 is arranged in front of the bolt 103 and used for blocking the partition plate and reducing abrasion of the bolt on the partition plate.

In practice, depending on the number of sputtering rings, a sleeve is provided in front of the baffle 105, i.e. between the baffle 105 and its adjacent baffle, for blocking the baffle, as shown in the embodiments of fig. 4-6, with a first sleeve 104, a second sleeve 106 or a third sleeve 107, respectively. The size of the sleeve is determined by the distance between the baffle and the partition adjacent thereto.

Before welding the sputtering ring, the mandrel 101 needs to be installed on a chuck of a vacuum electron beam welding machine, one end of a cylinder of the mandrel 101 is clamped by a clamping jaw on the chuck, the chuck is multi-grab, preferably three-grab or four-grab, and after the mandrel 101 is clamped, the jumping of the mandrel 101 is adjusted to be within +/-0.1 mm.

Example 1

Fig. 3 is a schematic view of the assembly of the welding of four sputtering rings. After the mandrel 101 is fixed on a chuck of a vacuum electron beam welding machine and adjusted, a partition plate 102 is firstly installed on the mandrel 101, then a sputtering ring 200 and the partition plate 102 are sequentially installed, the sputtering ring 200 and the partition plate 102 are installed for 4 times, finally a baffle plate 105 is installed behind the last partition plate, the relative positions of a supporting piece 203 and an electrode 202 of four sputtering rings 200 are adjusted, the supporting piece 203 of the four sputtering rings 200 is located on the same straight line parallel to the central line of the mandrel, the electrode 202 of the four sputtering rings 200 is located on the same straight line parallel to the central line of the mandrel, a bolt 103 is screwed, the top tip on a worktable of the vacuum electron beam welding machine is jacked on the bolt 103, and therefore the batch welding assembly of the sputtering rings is completed. Closing the furnace door, and vacuumizing to 5X 10 of vacuum degree^-2And (6) welding after Pa. Before welding, an electron beam is led at low power and is struck on a welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the position of a circle center X coordinate is determined. Similarly, in the cross direction, an electron beam is firstly led with low power and is shot at the position of the welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the Y coordinate position of the circle center is determined. After the coordinate of the circle center is determined, parameters of high voltage, beam current and scanning linear velocity are set, and circular scanning is conducted on a vacuum electron beam welding machine in a programming mode. And (4) firstly, carrying out simulated scanning without beam guiding, and verifying the accuracy of a coordinate point of the circle center of the accessory and the programmed sequence. And after the verification is correct, beam-leading welding can be carried out. And the like, welding the support 203 and the electrode 202. After the first sputtering ring 200 is welded, the welding of the subsequent sputtering rings 200 can be programmed to be automatically carried out.

Example 2

As shown in FIG. 4, which is an assembly diagram for welding three sputtering rings, after the mandrel 101 is fixed on the chuck of the vacuum electron beam welding machine and adjusted, a partition plate 102 is first installed on the mandrel 101, and then the sputtering rings 200 and the partition plate 102 are sequentially installed, so as to form a wholeInstalling the sputtering ring 200 and the baffle plate 102 for 3 times, adjusting the relative positions of the support member 203 and the electrode 202 of the three sputtering rings 200 to ensure that the support member 203 of the three sputtering rings 200 are positioned on the same straight line parallel to the central line of the mandrel, the electrode 202 of the three sputtering rings 200 is positioned on the same straight line parallel to the central line of the mandrel, sleeving the first sleeve 104 on the mandrel 101, finally installing the baffle plate 105 on the first sleeve 104, screwing the bolt 103, and ejecting the top tip on the worktable of the vacuum electron beam welding machine onto the bolt 103, thus finishing the batch welding assembly of the sputtering rings. Closing the furnace door, and vacuumizing to 5X 10 of vacuum degree^-2And (6) welding after Pa. Before welding, an electron beam is led at low power and is struck on a welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the position of a circle center X coordinate is determined. Similarly, in the cross direction, an electron beam is firstly led with low power and is shot at the position of the welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the Y coordinate position of the circle center is determined. After the coordinate of the circle center is determined, parameters of high voltage, beam current and scanning linear velocity are set, and circular scanning is conducted on a vacuum electron beam welding machine in a programming mode. And (4) firstly, carrying out simulated scanning without beam guiding, and verifying the accuracy of a coordinate point of the circle center of the accessory and the programmed sequence. And after the verification is correct, beam-leading welding can be carried out. And the like, welding the support 203 and the electrode 202. After the first sputtering ring 200 is welded, the welding of the subsequent sputtering rings 200 can be programmed to be automatically carried out.

Example 3

As shown in FIG. 5, which is an assembly diagram for welding two sputtering rings, after a mandrel 101 is fixed on a chuck of a vacuum electron beam welding machine and adjusted, a partition plate 102 is firstly installed on the mandrel 101, then the sputtering rings 200 and the partition plate 102 are sequentially installed, the sputtering rings 200 and the partition plate 102 are installed for 3 times, the relative positions of the supporting members 203 and the electrodes 202 of the two sputtering rings 200 are adjusted, so that the supporting members 203 of the two sputtering rings 200 are positioned on the same straight line parallel to the central line of the mandrel, the electrodes 202 of the two sputtering rings 200 are positioned on the same straight line parallel to the central line of the mandrel, a second sleeve 106 is sleeved on the mandrel 101, finally, after the baffle plate 105 is installed on the second sleeve 106, the bolts 103 are tightened, and the top of a vacuum electron beam welding worktable is jacked to the bolts103 so that the sputter ring batch weld assembly is complete. Closing the furnace door, and vacuumizing to 5X 10 of vacuum degree^-2And (6) welding after Pa. Before welding, an electron beam is led at low power and is struck on a welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the position of a circle center X coordinate is determined. Similarly, in the cross direction, an electron beam is firstly led with low power and is shot at the position of the welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the Y coordinate position of the circle center is determined. After the coordinate of the circle center is determined, parameters of high voltage, beam current and scanning linear velocity are set, and circular scanning is conducted on a vacuum electron beam welding machine in a programming mode. And (4) firstly, carrying out simulated scanning without beam guiding, and verifying the accuracy of a coordinate point of the circle center of the accessory and the programmed sequence. And after the verification is correct, beam-leading welding can be carried out. And the like, welding the support 203 and the electrode 202. After the first sputtering ring 200 is welded, the welding of the next sputtering ring 200 can be programmed to be automatically performed.

Example 4

As shown in fig. 6, which is an assembly diagram for welding a sputtering ring, after a mandrel 101 is fixed on a chuck of a vacuum electron beam welding machine and adjusted, a partition plate 102 is firstly installed on the mandrel 101, then the sputtering ring 200 and the partition plate 102 are sequentially installed, the sputtering ring 200 and the partition plate 102 are installed for 3 times, a third sleeve 107 is sleeved on the mandrel 101, finally, after a baffle 105 is installed on the third sleeve 107, a bolt 103 is screwed, and a top on a worktable of the vacuum electron beam welding machine is jacked on the bolt 103, so that the batch welding assembly of the sputtering rings is completed. Closing the furnace door, and vacuumizing to 5X 10 of vacuum degree^-2And (6) welding after Pa. Before welding, an electron beam is led at low power and is struck on a welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the position of a circle center X coordinate is determined. Similarly, in the cross direction, an electron beam is firstly led with low power and is shot at the position of the welding seam, a current beam leading coordinate point is taken, then another point coordinate is taken in the diameter direction, and the Y coordinate position of the circle center is determined. After the coordinate of the circle center is determined, parameters of high voltage, beam current and scanning linear velocity are set, and circular scanning is conducted on a vacuum electron beam welding machine in a programming mode. Firstly, the beam is not led, analog scanning is carried out, and the coordinate point and the position of the circle center of the accessory are verifiedCorrectness of programming sequence. And after the verification is correct, beam-leading welding can be carried out. And the like, welding the support 203 and the electrode 202.

It can be seen from examples 1-4 that only one evacuation and one cooling time is required when welding a plurality of sputtering rings 200, as is the case when welding one sputtering ring 200, which corresponds to saving N-1 evacuation and cooling times when welding N sputtering rings 200. Moreover, during batch welding, only coordinate adjustment and determination are needed to be carried out on the first sputtering ring to be welded, and other sputtering rings 200 can be automatically welded after being programmed, so that the time for coordinate adjustment and determination for N-1 times is reduced. In conclusion, the sputtering ring batch welding assembly and the method save time, improve production efficiency, improve equipment utilization rate and correspondingly reduce production cost of enterprises.

The foregoing embodiments are merely illustrative of the principles of the present invention and its efficacy, and are not to be construed as limiting the invention. Many modifications may be made to the present invention without departing from the spirit or scope of the general inventive concept, and those skilled in the art may make modifications and variations to the above-described embodiments without departing from the spirit or scope of the invention. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.