阅读说明：本技术 一种深孔抛光装置及抛光方法 (Deep hole polishing device and polishing method ) 是由 郭江 侯飞 秦璞 赵勇 高菲 于 2021-06-08 设计创作，主要内容包括：一种深孔抛光装置及抛光方法,属于光学零件深孔抛光技术领域,包括工件自转装置、工件往复移动装置、抛光工具旋转装置及抛光液循环装置。工件往复移动装置设于工件自转装置侧面,其移动方向平行于工件深孔轴线,其中,工件自转装置固定在往复移动装置上,工件沿工件自转装置的轴线穿过固定连接在转盘上,转盘带动工件做回转运动。抛光工具旋转装置带动抛光刷做回转运动,抛光刷穿过抛光孔并对抛光工具旋转装置进行XYZ方向微调,调整抛光刷位置。抛光液循环装置用于实现抛光过程中的抛光液循环作用。本发明能够避免抛光装置顺着深孔内壁抛光中出现局部差异度较高的问题,改善抛光质量,可适应多种孔径深孔和抛光毛刷,保证灵活可调性。(A deep hole polishing device and a polishing method belong to the technical field of deep hole polishing of optical parts and comprise a workpiece self-rotating device, a workpiece reciprocating device, a polishing tool rotating device and a polishing solution circulating device. The workpiece reciprocating device is arranged on the side surface of the workpiece self-rotating device, the moving direction of the workpiece reciprocating device is parallel to the axis of the deep hole of the workpiece, the workpiece self-rotating device is fixed on the reciprocating device, the workpiece penetrates through the rotating disc along the axis of the workpiece self-rotating device and is fixedly connected to the rotating disc, and the rotating disc drives the workpiece to do rotary motion. The polishing tool rotating device drives the polishing brush to do rotary motion, the polishing brush penetrates through the polishing hole and conducts fine adjustment in the XYZ direction on the polishing tool rotating device, and the position of the polishing brush is adjusted. The polishing solution circulating device is used for realizing the polishing solution circulating function in the polishing process. The invention can avoid the problem of higher local difference degree in the polishing process of the polishing device along the inner wall of the deep hole, improve the polishing quality, can adapt to deep holes with various apertures and polishing brushes, and ensures the flexibility and adjustability.)

1. A deep hole polishing device is characterized in that the device is used for polishing a deep hole on a rotary optical component, and the deep hole polishing device comprises a workpiece self-rotating device (4), a workpiece reciprocating device (1), a polishing tool rotating device (2) and a polishing solution circulating device (3); the workpiece reciprocating device (1) is arranged on the side surface of the workpiece self-rotating device (4), and the moving direction of the workpiece reciprocating device (1) is parallel to the axis of the deep hole of the workpiece, wherein the workpiece self-rotating device (4) is fixed on the reciprocating device (1), and the workpiece (25) penetrates through and is fixedly connected to a turntable (20) of the workpiece self-rotating device (4) along the axis of the workpiece self-rotating device (4); the polishing tool rotating device (2) is used for clamping two ends of the polishing brush (22) and driving the polishing brush (22) to do rotary motion; the polishing solution circulating device (3) is arranged on the side surface of the integral device to realize the polishing solution circulating action in the polishing process;

the workpiece rotation device (4) comprises a rotary table clamp (7), a hollow rotary table (23), a rotary table (20), a flange guide shaft support (21) and an XY-axis hollow fine adjustment platform (24); the turntable clamp (7) is used for fixing the hollow rotary turntable (23) and is fixedly connected with the workpiece reciprocating device (1) through the adapter plate (8), wherein, a turntable (20) is arranged on the hollow rotating turntable (23), the turntable (20) does rotary motion relative to the hollow rotating turntable (23) through a motor, an XY-axis hollow fine tuning platform (24) is fixed on the turntable (20), a flange guide shaft support (21) is fixed on the table surface of the XY-axis hollow fine tuning platform (24), a workpiece (25) passes through and is fastened together along the axis of the flange guide shaft support (24), the rotation of the workpiece (25) is driven by the rotation of the turntable (20) on the hollow rotating turntable (23), the XY-direction fine adjustment is carried out on the XY-axis hollow fine adjustment platform (24), so that the center of a polishing hole of the workpiece (25) is ensured to be a rotation center, and the workpiece (25) can reciprocate along the axis direction of the polishing hole (26) under the condition of rotating around the axis of the polishing hole;

the workpiece reciprocating device (1) comprises a moving module (14), an XZ axis fine-tuning platform (9) and an adapter plate (8); the XZ-axis fine-tuning platform (9) is connected to the moving module (14), the adapter plate (8) is fixed to the z-axis table top of the XZ-axis fine-tuning platform (9), and the adapter plate (8) is fixedly connected with the turntable clamp (7) on the workpiece rotation device (4) so that the moving module (14) drives the workpiece (25) to reciprocate;

the polishing tool rotating device (2) comprises a polishing brush (22), an electric spindle a (6), an electric spindle b (11), an XYZ axis fine adjustment platform a (16), an XYZ axis fine adjustment platform b (12), an electric spindle clamp a (5) and an electric spindle clamp b (10); the polishing brush (22) is arranged to be cylindrical, the polishing brush (22) penetrates through the workpiece (25) in parallel along the axis of a polishing hole (26), two ends of the polishing brush (22) are fixed with chucks of the electric spindle a (6) and the electric spindle b (11) respectively to realize the rotary motion of the polishing brush (22), and the polishing brush (22) can perform XYZ direction fine adjustment on the polishing tool rotating device (2) through an XYZ axis fine adjustment platform b (12) and an XYZ axis fine adjustment platform a (16) so as to adjust the position of the polishing brush (22); the electric spindle a (6) and the electric spindle b (11) are respectively fixed by an electric spindle clamp a (5) and an electric spindle clamp b (10), the electric spindle clamp a (5) and the electric spindle clamp b (10) are respectively fixed on an XYZ axis fine tuning platform a (16) and an XYZ axis fine tuning platform b (12), and the eccentricity between the central line of the polishing brush (22) and the axial line of the polishing hole (26) can be adjusted by synchronously adjusting the XYZ axis fine tuning platforms a (16) and b (12), so that the pressure of the polishing brush (22) on the pipe wall of the polishing hole (26) is controlled;

the polishing solution circulating device (3) comprises a polishing solution upper sealing disc (13), a polishing solution box (15) and a peristaltic pump (17); the polishing solution upper sealing disc (13) is arranged on the upper end surface of the workpiece (25) along the axis of the workpiece (25) and is used for dropping polishing solution; the polishing solution box (15) is arranged at the bottom of the lower end face of the workpiece (25) and is used for collecting polishing solution; polishing liquid is injected into the polishing liquid upper sealing disc (13) through the peristaltic pump (17), the amount of the injected polishing liquid is required to ensure that the end face of the polishing hole (26) of the workpiece (25) is immersed into the polishing liquid, and the peristaltic pump (17) is used for realizing the recycling of the polishing liquid;

the above devices are all arranged on an optical flat plate 27.

2. The deep hole polishing device according to claim 1, wherein two polishing brush holding discs are additionally arranged on the deep hole polishing device, and a plurality of deep holes on a workpiece can be polished simultaneously; the polishing brush clamping disc comprises a disc (28), a bearing (29), a shaft (30), a large gear (31) with a rod and a small gear (32); the disc (28) is fixedly connected with the electric spindle clamp, a through hole for penetrating through the bearing (29) is formed in the center of the disc (28), and a shaft (30) is arranged along the circumferential direction of the through hole; the large gear (31) with the rod is connected with the electric spindle chuck through a bearing (29), a small gear (32) internally comprises a bearing sleeve on a shaft (30), and the small gear (32) is circumferentially arranged along the large gear (31) with the rod; the pinion (32) is fixedly connected with a plurality of polishing brushes (22); the electric spindle makes a rotary motion to drive the large gear (31) to rotate, the large gear (31) drives the small gear (32) to rotate through a meshing motion, and then the polishing brush (22) is driven to make a rotary motion, and a plurality of inner holes of the porous workpiece are polished simultaneously.

3. A deep hole polishing device according to claim 1, characterized in that said flat plate 27 is angularly adjusted within 0-90 degrees according to an angle adjuster (19).

4. The deep hole polishing device according to claim 1, wherein displacement sensors and force sensors are additionally arranged on the XYZ axis fine adjustment platforms a (16) and b (12), and are connected with a controller and a driving device; the displacement sensor and the force sensor are used for sensing pressure change of the polishing brush (22) to the workpiece (25) in the polishing process and feeding back the pressure change to the controller, the power device is controlled to adjust the displacement of the XYZ-axis fine adjustment platforms a (16) and b (12), the eccentricity degree of the central line of the polishing brush (22) and the axis of the workpiece polishing hole (26) is further adjusted, the pressure of the polishing brush (22) to the pipe wall of the workpiece polishing hole (26) is changed, and finally automatic control of polishing pressure in the polishing process is achieved.

5. A deep hole polishing device according to claim 1, characterized in that the polishing of deep holes with different specifications and lengths is realized by changing the length of the bristle carrying section of the polishing brush (22) and simultaneously adjusting the distance between two electric spindles.

6. A multi-pitch deep hole polishing method implemented based on the polishing apparatus according to any one of claims 1 to 5, comprising the steps of:

shaping a polishing hairbrush (22), enabling the polishing hairbrush (22) to penetrate through a polishing hole (26) of a workpiece (25) to be polished, and enabling the workpiece (25) to penetrate through and be fixed along the axis of a flange guide shaft support (21);

step two, adjusting the XY-axis hollow fine adjustment platform (24) to enable the axis of the polishing hole (26) to be consistent with the central line of the turntable (20), and locking the XY-axis hollow fine adjustment platform (24) after the adjustment is finished;

thirdly, connecting chucks of the electric main shaft a (6) and the electric main shaft b (11) to two ends of a polishing brush (22) respectively, adjusting an XYZ axis fine adjustment platform a (16), an XYZ axis fine adjustment platform b (12) and an XZ axis fine adjustment platform (9), tightening the polishing brush (22), keeping the central line of the polishing brush (22) and the axis of a polishing hole (26) at the same position, and locking the Y axis direction of the XYZ axis fine adjustment platform;

step four, carrying out fine adjustment in any direction of XZ on the XYZ axis fine adjustment platforms a (16) and b (12) or the XZ axis fine adjustment platform (9), adjusting the eccentricity degree of the central line of the polishing brush (22) and the axis of the workpiece polishing hole (26), and locking all the fine adjustment platforms after adjusting to a proper position; the polishing pressure of the polishing brush (22) to the pipe wall of the polishing hole (26) of the workpiece is set and controlled by controlling the eccentricity of the central line of the polishing brush (22) and the axis of the polishing hole (26);

step five, sleeving the upper sealing disc (13) of the polishing solution on the upper end of the workpiece (25), arranging the polishing solution box (15) on the lower end of the workpiece (25), respectively injecting the polishing solution into the upper sealing disc (13) of the polishing solution and the polishing solution box (15), starting the peristaltic pump (17), and circulating the polishing solution;

step six, setting all movement working parameters of the device, starting the electric spindles a (6) and b (11), the hollow rotary turntable (23) and the moving module (14): the polishing brush (22) rotates and reciprocates along the axial direction of a workpiece polishing hole (26) by setting the rotating speed of the electric spindle and setting the displacement and the speed of the moving module (14); meanwhile, the workpiece performs uniform rotary motion along the axis of the polishing hole (26) by setting the rotating speed of the hollow rotary turntable (23), so that the polishing quality of the cambered surface of the pipe wall of the polishing hole (26) is consistent; in the polishing process, the electric spindle a (6) and the electric spindle b (11) move in the same direction relatively, and the rotating speeds of the electric spindle a (6) and the electric spindle b (11) are consistent;

seventhly, closing the moving module (14), the hollow rotating rotary table (23), the electric spindles a (6) and b (11) and the peristaltic pump (17) in sequence; the chucks of the electric spindles a (6) and b (11) are released, the workpiece (25) is taken down, and the polishing brush (22) is drawn out.

Technical Field

The invention belongs to the technical field of deep hole polishing of optical parts, and relates to a deep hole polishing device and a deep hole polishing method.

Background

With the development of miniaturization, high precision and array of optical devices, the difficulty of processing and manufacturing the optical devices is increasing. The deep small hole is widely applied to optical components such as optical fibers, lasers and the like as a common difficult-to-process structure. For example, the stress hole on the polarization maintaining optical fiber preform is a typical deep small hole when applied to the polarization maintaining optical fiber in the fields of optical fiber gyroscopes, polarization sensing and the like. The fiber stress rods are inserted into the stress holes and a sliding fit with minimal clearance is ensured. Therefore, the straightness of the hole, the surface roughness of the inner hole, the symmetry of the two holes and the like can directly influence the performance and the strength of the polarization-maintaining optical fiber obtained after drawing.

However, the existing deep hole polishing device has several problems, and patent CN112123184A proposes a polishing device and a polishing method, which can stabilize pipelines of different specifications, and at the same time, adjust the device according to the diameter of the pipeline, thereby ensuring the polishing effect on the premise of having certain flexibility, but when polishing inner holes of longer workpieces, the device and the method need to gradually adjust the position of the polishing device, ensure that the inner ends of deep holes are polished, and the polishing of all inner hole wall surfaces cannot be completed at one time, which is time-consuming and labor-consuming, and affects the polishing efficiency. Patent CN111975468A provides a quartzy deep hole burnishing device and polishing method, and the device and method can realize the rotation of polishing felt in the deep hole and the compound polishing motion of axial displacement to make the polishing solution can carry out self-priming circulation, improved polishing efficiency, but when the device and method throws light to many apertures, the device is adjusted complicatedly, and can not guarantee to polish 360 degrees abundant deep hole inner walls, can cause the great problem of local difference degree, can not satisfy the polishing precision requirement. Meanwhile, because the diameter of the stress hole of the prefabricated rod part is small and the length is large, the polishing equipment of the above patent and other deep holes is complex, and most polishing tools are large-size polishing wheels or large-size inserted rod type polishing brushes, the polishing requirements of the deep and thin holes of the components can not be met. Therefore, it is necessary to provide an apparatus and a method for polishing a deep hole of a small hole, which ensure polishing efficiency and polishing accuracy.

Disclosure of Invention

Aiming at the problems in the prior art, the invention provides a multi-space deep small hole polishing device and a polishing method, which aim to solve the problem of low polishing efficiency of the polishing precision of a multi-small hole deep hole on a (rotary) optical component.

In order to achieve the purpose, the invention provides the following technical scheme:

a deep hole polishing device is used for polishing each deep hole on a rotary optical component, wherein the axis of each deep hole on the rotary optical component is parallel to and penetrates through a rotary optical component workpiece. The deep hole polishing device comprises a workpiece self-rotating device 4, a workpiece reciprocating device 1, a polishing tool rotating device 2 and a polishing solution circulating device 3. The workpiece reciprocating device 1 is arranged on the side surface of the workpiece self-rotating device 4, and the moving direction of the workpiece reciprocating device 1 is parallel to the axis of a deep hole of a workpiece, wherein the workpiece self-rotating device 4 is fixedly connected on the reciprocating device 1 through a clamp and an adapter plate bolt, the workpiece 25 penetrates through a rotary table 20 fixedly connected on the workpiece self-rotating device 4 along the axis of the workpiece self-rotating device 4, and the rotary table 20 drives the workpiece 25 to do rotary motion, so that the workpiece 25 can do reciprocating motion along the axis direction of the workpiece 25 under the condition of rotating motion around the axis of the polishing hole 26; the polishing tool rotating device 2 clamps two ends of the polishing brush 22 to drive the polishing brush 22 to rotate, the polishing brush 22 passes through the polishing hole 26 in parallel along the axis of the deep hole of the workpiece 25, and the polishing tool rotating device 2 can be subjected to XYZ direction fine adjustment through an XYZ axis fine adjustment platform b12 and an XYZ axis fine adjustment platform a16 so as to adjust the position of the polishing brush 22. The polishing solution circulating device 3 is arranged on the side face of the whole device, and the polishing solution circulating function in the polishing process is realized. The device can realize high-quality and high-efficiency polishing of the deep holes of the multi-interval rotary optical component.

The workpiece rotation device 4 comprises a turntable clamp 7, a hollow rotating turntable 23, a turntable 20, a flange guide shaft support 21 and an XY-axis hollow fine adjustment platform 24. The turntable clamp 7 is used for fixing a hollow rotating turntable 23 through bolts and is fixedly connected with the workpiece reciprocating device 1 through an adapter plate 8 through bolts, wherein a turntable 20 is arranged on the hollow rotating turntable 23, the turntable 20 rotates relative to the hollow rotating turntable 23 through a motor, an XY-axis hollow fine adjustment platform 24 is fixed on the surface of the turntable 20 through bolts, a flange guide shaft support 21 is fixed on the surface of the XY-axis hollow fine adjustment platform 24 through bolts, a workpiece 25 penetrates through the axis of the flange guide shaft support 24 and is fastened together through screws, the rotation of the workpiece 25 is driven through the rotation of the turntable 20 on the hollow rotating turntable 23, and the polishing hole center of the workpiece 25 is ensured to be the rotation center through carrying out XY-direction fine adjustment on the XY-axis hollow fine adjustment platform 24.

The workpiece reciprocating device 1 comprises a moving module 14, an XZ axis fine adjustment platform 9 and an adapter plate 8. The XZ axis fine-tuning platform 9 is fixedly connected to the moving module 14 through bolts, the adapter plate 8 is fixedly connected to the z axis table board of the XZ axis fine-tuning platform 9 through bolts, and the adapter plate 8 is fixedly connected with the rotary table clamp 7 on the workpiece rotation device 4 through bolts, so that the moving module 14 drives the workpiece 25 to reciprocate, and polishing efficiency is improved.

The polishing tool rotating apparatus 2 includes a polishing brush 22, an electric spindle a6, an electric spindle b11, an XYZ axis fine adjustment stage a16, an XYZ axis fine adjustment stage b12, an electric spindle chuck a5, and an electric spindle chuck b 10. The polishing brush 22 is cylindrical, a spiral groove is formed in the surface of the polishing brush 22 for shaping, the polishing brush 22 penetrates through the workpiece 25 in parallel along the axis of the polishing hole 26, and two ends of the polishing brush 22 are fixed with chucks of the electric spindle a6 and the electric spindle b11 respectively, so that the rotation motion of the polishing brush 22 is realized. The electric spindle a6 and the electric spindle b11 are fixed by an electric spindle clamp a5 and an electric spindle clamp b10 respectively, the electric spindle clamp a5 and the electric spindle clamp b10 are fixed on the table surfaces of an XYZ axis fine adjustment platform a16 and an XYZ axis fine adjustment platform b12 respectively by long bolts, and the eccentricity between the central line of the polishing brush 22 and the axial line of the polishing hole 26 can be adjusted by synchronously adjusting the XYZ axis fine adjustment platforms a16 and b12 so as to control the pressure of the polishing brush 22 on the pipe wall of the polishing hole 26.

The polishing solution circulating device 3 comprises a polishing solution upper sealing disc 13, a polishing solution box 15, a peristaltic pump 17 and a hose 18. The polishing solution upper sealing disc 13 is arranged on the upper end surface of the workpiece 25 along the axis of the workpiece 25 and is used for dripping polishing solution; the polishing solution box 15 is arranged at the bottom of the lower end face of the workpiece 25 and is used for collecting polishing solution; the peristaltic pump 17 injects the polishing liquid into the polishing liquid upper sealing disk 13 through the hose 18, wherein the amount of the polishing liquid injected into the polishing liquid upper sealing disk 13 is such that the end face of the polishing hole 26 of the workpiece 25 is immersed in the polishing liquid. Meanwhile, the peristaltic pump 17 is connected with the polishing solution box 15 through a hose 18, and the polishing solution is recycled in the polishing process through the movement of the peristaltic pump 17.

The devices are all arranged on an optical flat plate 27, the flat plate 27 is fixed on an angle adjuster 19 through bolts, and the flat plate 27 can be adjusted in an angle within 0-90 degrees according to the angle adjuster 19.

Furthermore, after the deep hole polishing device is additionally provided with the two polishing brush clamping discs, a plurality of deep holes in a workpiece can be simultaneously polished. The polishing brush clamping disc comprises a disc 28, a bearing 29, a shaft 30, a large gear 31 with a rod and a small gear 32. The disc 28 is fixedly connected with the electric spindle clamp, a through hole for penetrating through the bearing 29 is formed in the center of the disc 28, and a shaft 30 is arranged along the circumferential direction of the through hole. The large gear 31 with the rod is connected with the electric spindle chuck through a bearing 29, a small gear 32 is internally provided with a bearing sleeve on a shaft 30, the small gear 32 is circumferentially arranged along the large gear 31 with the rod, and the large gear 31 with the rod and the small gear 32 are in meshed motion; the pinion 32 is fixedly connected to the plurality of polishing brushes 22. The electric spindle makes a rotary motion to drive the large gear 31 to rotate, the large gear 31 drives the small gear 32 to rotate through a meshing motion, and then the polishing brush 22 is driven to make a rotary motion, so that a plurality of inner holes of the porous workpiece are polished simultaneously.

Furthermore, the deep hole polishing device can be additionally provided with displacement sensors and force sensors on the XYZ axis fine adjustment platforms a16 and b12, and the displacement sensors and the force sensors are connected with a controller and a driving device. The displacement sensor and the force sensor can sense the pressure change of the polishing brush 22 on the workpiece 25 in the polishing process and feed back the pressure change to the controller, so that the power device is controlled to adjust the displacement of the XYZ-axis fine adjustment platforms a16 and b12, the pressure of the polishing brush 22 on the pipe wall of the workpiece polishing hole 26 is changed by adjusting the eccentricity degree of the central line of the polishing brush 22 and the axial line of the workpiece polishing hole 26, and the polishing pressure in the polishing process is automatically controlled.

Further, the polishing brush 22 is a flexible polishing brush, two ends are polish rods, the middle is a section with bristles, and the diameter of the section with bristles corresponding to the diameter of the deep hole is not more than +/-0.5 mm.

Further, the rotary optical component workpiece 25 is a quartz glass rod with a diameter of 26mm and a length of 350mm, two deep holes are preset in the quartz rod, the diameter of each deep hole is 2mm, the axial intervals of the two deep holes are 2mm, and the two deep holes are parallel along the axial lines and penetrate through the quartz glass rod.

A multi-space deep hole polishing method based on the polishing device comprises the following steps:

step one, shaping the polishing hairbrush 22, penetrating the polishing hairbrush 22 through a polishing hole 26 of the workpiece 25 to be polished, and penetrating and fixing the workpiece 25 along the axis of the flange guide shaft support 21.

And step two, adjusting the XY-axis hollow fine adjustment platform 24 to enable the axis of the polishing hole 26 to be consistent with the central line of the hollow rotary turntable 20, and locking the XY-axis hollow fine adjustment platform 24 after the adjustment is finished.

And thirdly, respectively connecting chucks of the electric spindle a6 and the electric spindle b11 to two ends of the polishing brush 22, adjusting the XYZ axis fine adjustment platform a16, the XYZ axis fine adjustment platform b12 and the XZ axis fine adjustment platform 9, so that the polishing brush 22 is tightened, the central line of the polishing brush 22 is kept at the same position as the axis of the polishing hole 26, and then the Y axis direction of the XYZ axis fine adjustment platform is locked.

And step four, carrying out fine adjustment on the XYZ axis fine adjustment platforms a16 and b12 or the XZ axis fine adjustment platform 9 in any XZ direction, adjusting the eccentricity degree of the central line of the polishing brush 22 and the axis of the workpiece polishing hole 26, and locking all the fine adjustment platforms after the polishing brush is adjusted to a proper position. In the step, the eccentric degree of the central line of the polishing brush 22 and the axial line of the polishing hole 26 is controlled, so that the polishing pressure of the polishing brush 22 on the pipe wall of the polishing hole 26 of the workpiece is set and controlled.

And step five, sleeving the polishing solution upper sealing disc 13 on the upper end of the workpiece 25, arranging the polishing solution box 15 at the lower end of the workpiece 25, respectively injecting polishing solution into the polishing solution upper sealing disc 13 and the polishing solution box 15, and starting the peristaltic pump 17 to circulate the polishing solution.

Step six, setting the motion working parameters of the device, starting the electric spindles a6 and b11, the hollow rotary turntable 23 and the moving module 14: the polishing brush 22 does reciprocating motion along the axial direction of the workpiece polishing hole 26 while rotating automatically by setting the rotating speed of the electric spindle and setting the displacement and the speed of the moving module 14; meanwhile, the workpiece performs uniform rotary motion along the axis of the polishing hole 26 by setting the rotating speed of the hollow rotary turntable 23, so that the consistent polishing quality of the cambered surface of the pipe wall of the polishing hole 26 is ensured. During polishing, the electric spindle a6 and the electric spindle b11 move in the same direction, and the rotating speeds of the electric spindle a6 and the electric spindle b11 are consistent.

Seventhly, closing the moving module 14, the hollow rotary turntable 23, the electric spindles a6 and b11 and the peristaltic pump 17 in sequence; the chucks of the motorized spindles a6 and b11 are loosened, the workpiece 25 is removed from the flange guide shaft support 21, the polishing brush 22 is drawn out, and the workpiece 25 is cleaned.

The invention has the following beneficial results:

(1) the application provides a many intervals deep hole burnishing device and polishing method, with the unsettled centre gripping of work piece on cavity rotation carousel, pour into the polishing solution dish, the electricity main shaft drives the polishing brush at the deep hole internal rotation of treating processing and do axial reciprocating motion, realize the high-speed high-efficient polishing to the pipeline inner wall, cavity rotation carousel drives the work piece simultaneously and is the rotation motion along treating processing deep hole axis, realize the 360 degrees abundant polishing to work piece deep hole inner wall, avoid burnishing device along appearing the higher problem of local difference degree in the deep hole inner wall polishing. Meanwhile, the fine adjustment device is utilized to change the inclination degree of the central line position of the polishing hairbrush and the axis position of the inner hole to be processed, the polishing pressure is controlled, the polishing speed is increased, the polishing quality is improved, flexible adjustment can be carried out according to the diameter of the deep hole to be processed and the diameter of the polishing hairbrush, the device is suitable for various hole diameters of the deep hole and the polishing hairbrush, and the flexibility and adjustability of the device are guaranteed through the mutual cooperation of the whole device.

(2) According to the invention, the hollow XY-axis fine-tuning device is arranged, when the multi-space deep-hole workpiece is fixed, the XY direction of the hollow XY-axis fine-tuning device is adjusted according to the eccentricity degree of the axis of the inner hole to be machined and the center line of the workpiece, so that the axis of the inner hole to be machined is consistent with the rotating center line of the hollow rotating turntable, and the polishing of each space hole of the multi-hole workpiece is realized.

(3) According to the invention, the length of the bristle section of the polishing hairbrush belt is changed, and the spacing distance between the two electric spindles is adjusted, so that deep holes with different specifications and lengths can be completely polished, and the polishing efficiency is improved.

(4) According to the invention, by adjusting the inclination angle of the flat plate, when the polishing brush polishes in the deep hole to be processed, the polishing liquid quickly flows into the inner hole for circulation under the action of gravity and pressure caused by high-speed rotation of the polishing brush, so that the polishing speed is increased, and the polishing quality is ensured.

(5) The invention can save cost and bring great environmental protection benefit by realizing the recycling of the polishing solution in the polishing process.

Drawings

FIG. 1 is a top view of an embodiment of the present application;

FIG. 2 is a perspective view of an embodiment of the present application;

FIG. 3 is a side view of an embodiment of the present application;

FIG. 4 is a detailed view of the workpiece rotation device;

FIG. 5 is a schematic view of the adjustment of the axis of the distance polishing hole;

FIG. 6 is a schematic view of porous workpiece polishing;

FIG. 7 is a detailed schematic view of a porous workpiece polisher brush holding tray;

the text labels in the figures are represented as: 1 a workpiece reciprocating device; 2 a polishing tool rotating device; 3, a polishing solution circulating device; 4, a workpiece self-rotating device; 5 electric main shaft clamp a; 6, an electric spindle a; 7, a turntable clamp; 8, an adapter plate; 9 XZ axis fine tuning platform; 10 electric spindle clamp b; 11 an electric spindle b; 12 XYZ axis fine tuning platform b; 13 sealing the disc on the polishing solution; 14 a moving module; 15 a polishing solution box; 16 XYZ axis fine tuning platform a; 17 a peristaltic pump; 18 a hose; 19 an angle adjuster; 20 a turntable; 21, a flange guide shaft support; 22 a polishing brush; 23 hollow rotary turntable; a 24 XY axis hollow fine tuning platform; 25, workpiece; 26 polishing the hole; 27 flat plate; 28 disks; 29 a bearing; 30 shafts; 31 a bull gear with a rod; 32 pinion gears.

Detailed Description

In order that those skilled in the art will better understand the technical solutions of the present invention, the following detailed description of the present invention is provided in conjunction with the accompanying drawings, and the description of the present section is only exemplary and explanatory, and should not be construed as limiting the scope of the present invention in any way.

Example 1

As shown in fig. 1, fig. 2, fig. 3, fig. 4, and fig. 5, which are schematic diagrams of a first embodiment of the present application, the polishing apparatus of the present application is used for polishing a multi-pitch deep hole on a rotary optical component, in this embodiment, a processing workpiece 25 is a panda-type polarization-maintaining optical fiber preform, and has a rod length of 350mm and a diameter of 26 mm. In this embodiment, the optical fiber preform is provided with two deep holes 26, the diameter of each deep hole is 2mm, the distance between the two deep holes is 2mm, and the axes of the two deep holes are parallel and penetrate through a preform workpiece.

The polishing device comprises a workpiece rotation device 4, a workpiece reciprocating device 1, a polishing tool rotating device 2 and a polishing liquid circulating device 3. The workpiece reciprocating device 1 is arranged on the side surface of the workpiece self-rotating device 4, and the moving direction of the workpiece reciprocating device 1 is parallel to the axis of a deep hole of a workpiece, wherein the workpiece self-rotating device 4 is fixedly connected on the reciprocating device 1 through a clamp and an adapter plate bolt, the workpiece 25 penetrates through a rotary table 20 fixedly connected on the workpiece self-rotating device 4 along the axis of the workpiece self-rotating device 4, and the rotary table 20 drives the workpiece 25 to do rotary motion, so that the workpiece 25 can do reciprocating motion along the axis direction of the workpiece 25 under the condition of rotating motion around the axis of the polishing hole 26; the polishing tool rotating device 2 clamps two ends of the polishing brush 22 to drive the polishing brush 22 to rotate, the polishing brush 22 passes through the polishing hole 26 in parallel along the axis of the deep hole of the workpiece 25, and the polishing tool rotating device 2 can be subjected to XYZ direction fine adjustment through an XYZ axis fine adjustment platform b12 and an XYZ axis fine adjustment platform a16 so as to adjust the position of the polishing brush 22. The polishing solution circulating device 3 is arranged on the side face of the whole device, and the polishing solution circulating function in the polishing process is realized. The device can realize high-quality and high-efficiency polishing of the deep holes of the multi-interval rotary optical component.

The workpiece rotation device 4 comprises a turntable clamp 7, a hollow rotating turntable 23, a turntable 20, a flange guide shaft support 21 and an XY-axis hollow fine adjustment platform 24. The turntable clamp 7 is used for fixing a hollow rotating turntable 23 through bolts and is fixedly connected with the workpiece reciprocating device 1 through an adapter plate 8 through bolts, wherein a turntable 20 is arranged on the hollow rotating turntable 23, the turntable 20 rotates relative to the hollow rotating turntable 23 through a motor, an XY-axis hollow fine adjustment platform 24 is fixed on the surface of the turntable 20 through bolts, a flange guide shaft support 21 is fixed on the surface of the XY-axis hollow fine adjustment platform 24 through bolts, a workpiece 25 penetrates through the axis of the flange guide shaft support 24 and is fastened together through screws, the rotation of the workpiece 25 is driven through the rotation of the turntable 20 on the hollow rotating turntable 23, and the polishing hole center of the workpiece 25 is ensured to be the rotation center through carrying out XY-direction fine adjustment on the XY-axis hollow fine adjustment platform 24.

The workpiece reciprocating device 1 comprises a moving module 14, an XZ axis fine adjustment platform 9 and an adapter plate 8. The XZ axis fine-tuning platform 9 is fixedly connected to the moving module 14 through bolts, the adapter plate 8 is fixedly connected to the z axis table board of the XZ axis fine-tuning platform 9 through bolts, and the adapter plate 8 is fixedly connected with the rotary table clamp 7 on the workpiece rotation device 4 through bolts, so that the moving module 14 drives the workpiece 25 to reciprocate, and polishing efficiency is improved.

The polishing tool rotating apparatus 2 includes a polishing brush 22, an electric spindle a6, an electric spindle b11, an XYZ axis fine adjustment stage a16, an XYZ axis fine adjustment stage b12, an electric spindle chuck a5, and an electric spindle chuck b 10. The polishing brush 22 is cylindrical, a spiral groove is formed in the surface of the polishing brush 22 for shaping, the polishing brush 22 penetrates through the workpiece 25 in parallel along the axis of the polishing hole 26, and two ends of the polishing brush 22 are fixed with chucks of the electric spindle a6 and the electric spindle b11 respectively, so that the rotation motion of the polishing brush 22 is realized. The electric spindle a6 and the electric spindle b11 are fixed by an electric spindle clamp a5 and an electric spindle clamp b10 respectively, the electric spindle clamp a5 and the electric spindle clamp b10 are fixed on the table surfaces of an XYZ axis fine adjustment platform a16 and an XYZ axis fine adjustment platform b12 respectively by long bolts, and the eccentricity between the central line of the polishing brush 22 and the axial line of the polishing hole 26 can be adjusted by synchronously adjusting the XYZ axis fine adjustment platforms a16 and b12 so as to control the pressure of the polishing brush 22 on the pipe wall of the polishing hole 26.

The polishing solution circulating device 3 comprises a polishing solution upper sealing disc 13, a polishing solution box 15, a peristaltic pump 17 and a hose 18. The polishing solution upper sealing disc 13 is arranged on the upper end surface of the workpiece 25 along the axis of the workpiece 25 and is used for dripping polishing solution; the polishing solution box 15 is arranged at the bottom of the lower end face of the workpiece 25 and is used for collecting polishing solution; the peristaltic pump 17 injects the polishing liquid into the polishing liquid upper sealing disk 13 through the hose 18, wherein the amount of the polishing liquid injected into the polishing liquid upper sealing disk 13 is such that the end face of the polishing hole 26 of the workpiece 25 is immersed in the polishing liquid. Meanwhile, the peristaltic pump 17 is connected with the polishing solution box 15 through a hose 18, and the polishing solution is recycled in the polishing process through the movement of the peristaltic pump 17.

The devices are all arranged on an optical flat plate 27, the flat plate 27 is fixed on an angle adjuster 19 through bolts, and the flat plate 27 can be adjusted in an angle within 0-90 degrees according to the angle adjuster 19.

Example 2

The invention can also simultaneously polish and process a plurality of small holes (deep holes) of a workpiece, as shown in fig. 6 and fig. 7, which are schematic diagrams of a second embodiment of the application. As shown in fig. 6, which is a schematic view of polishing a porous workpiece, a polishing brush holding disc is added to the polishing apparatus, that is, the structure and function are the same as those of embodiment 1 except for the polishing brush holding disc. Fig. 7 shows a detailed schematic diagram of a polish brush holding plate, which includes a circular plate 28, a bearing 29, a shaft 30, a rack gear 31 with a rod, and a pinion gear 32. The disc 28 is fixedly connected with the electric spindle clamp, a through hole for penetrating through the bearing 29 is formed in the center of the disc 28, and a shaft 30 is arranged along the circumferential direction of the through hole. The large gear 31 with the rod is connected with the electric spindle chuck through a bearing 29, a small gear 32 is internally provided with a bearing sleeve on a shaft 30, the small gear 32 is circumferentially arranged along the large gear 31 with the rod, and the large gear 31 with the rod and the small gear 32 are in meshed motion; the pinion 32 is fixedly connected to the plurality of polishing brushes 22. The electric spindle makes a rotary motion to drive the large gear 31 to rotate, the large gear 31 drives the small gear 32 to rotate through a meshing motion, and then the polishing brush 22 is driven to make a rotary motion, so that a plurality of inner holes of the porous workpiece are polished simultaneously.

According to the device of the embodiment, the invention discloses a polishing method of a multi-space deep hole, which comprises the following steps:

step one, shaping the polishing hairbrush 22, penetrating the polishing hairbrush 22 through a polishing hole 26 of the workpiece 25 to be polished, and penetrating and fixing the workpiece 25 along the axis of the flange guide shaft support 21.

And step two, adjusting the XY-axis hollow fine adjustment platform 24 to enable the axis of the polishing hole 26 to be consistent with the central line of the hollow rotary turntable 20, and locking the XY-axis hollow fine adjustment platform 24 after the adjustment is finished.

And thirdly, respectively connecting chucks of the electric spindle a6 and the electric spindle b11 to two ends of the polishing brush 22, adjusting the XYZ axis fine adjustment platform a16, the XYZ axis fine adjustment platform b12 and the XZ axis fine adjustment platform 9, so that the polishing brush 22 is tightened, the central line of the polishing brush 22 is kept at the same position as the axis of the polishing hole 26, and then the Y axis direction of the XYZ axis fine adjustment platform is locked.

And step four, carrying out fine adjustment on the XYZ axis fine adjustment platforms a16 and b12 or the XZ axis fine adjustment platform 9 in any XZ direction, adjusting the eccentricity degree of the central line of the polishing brush 22 and the axis of the workpiece polishing hole 26, and locking all the fine adjustment platforms after the polishing brush is adjusted to a proper position. In the step, the eccentric degree of the central line of the polishing brush 22 and the axial line of the polishing hole 26 is controlled, so that the polishing pressure of the polishing brush 22 on the pipe wall of the polishing hole 26 of the workpiece is set and controlled.

And step five, sleeving the polishing solution upper sealing disc 13 on the upper end of the workpiece 25, arranging the polishing solution box 15 at the lower end of the workpiece 25, respectively injecting polishing solution into the polishing solution upper sealing disc 13 and the polishing solution box 15, and starting the peristaltic pump 17 to circulate the polishing solution.

Step six, setting the motion working parameters of the device, starting the electric spindles a6 and b11, the hollow rotary turntable 23 and the moving module 14: the polishing brush 22 does reciprocating motion along the axial direction of the workpiece polishing hole 26 while rotating automatically by setting the rotating speed of the electric spindle and setting the displacement and the speed of the moving module 14; meanwhile, the workpiece performs uniform rotary motion along the axis of the polishing hole 26 by setting the rotating speed of the hollow rotary turntable 23, so that the consistent polishing quality of the cambered surface of the pipe wall of the polishing hole 26 is ensured. During polishing, the electric spindle a6 and the electric spindle b11 move in the same direction, and the rotating speeds of the electric spindle a6 and the electric spindle b11 are consistent.

Seventhly, closing the moving module 14, the hollow rotary turntable 23, the electric spindles a6 and b11 and the peristaltic pump 17 in sequence; the chucks of the motorized spindles a6 and b11 are loosened, the workpiece 25 is removed from the flange guide shaft support 21, the polishing brush 22 is drawn out, and the workpiece 25 is cleaned.

The principles and embodiments of the present application are explained herein using specific examples, which are presented only to assist in understanding the method and its core concepts of the present application. The foregoing is only a preferred embodiment of the present application, and it should be noted that there are objectively infinite specific structures due to the limited character expressions, and it will be apparent to those skilled in the art that a plurality of modifications, decorations or changes may be made without departing from the principle of the present application, and the technical features described above may be combined in a suitable manner; such modifications, variations, combinations, or adaptations of the invention using its spirit and scope, as defined by the claims, may be directed to other uses and embodiments, or may be learned by practice of the invention.