阅读说明：本技术 一种高稳定性耐高温硅胶保护膜 (High-stability high-temperature-resistant silica gel protective film ) 是由 陈敬师 杨培建 于 2021-06-17 设计创作，主要内容包括：本发明公开了一种高稳定性耐高温硅胶保护膜,包括基底层,所述基底层为硅胶基底膜；所述基底层的上下均设置有防静电结构；粘结结构,所述粘结结构设置在基底层的下方,粘结结构用于整个硅胶保护膜的粘结；稳定层,所述稳定层设置在基底层的上表面；防刮层,所述防刮层设置在上防静电层的上表面；保护层,所述保护层连接在防刮层的上表面,所述防静电结构包括下防静电层和上防静电层,其中下防静电层通过第一粘结层与基底层的上表面相连接,上防静电层通过第四粘结层与稳定层的上表面相连接。该高稳定性耐高温硅胶保护膜,具有很好的稳定性,且在防静电处理方面,效果较好,并且在贴敷硅胶保护膜时,便于对气泡进行消除。(The invention discloses a high-stability high-temperature-resistant silica gel protective film which comprises a substrate layer, wherein the substrate layer is a silica gel substrate film; the upper part and the lower part of the substrate layer are both provided with an antistatic structure; the bonding structure is arranged below the substrate layer and used for bonding the whole silica gel protective film; a stabilization layer disposed on an upper surface of the base layer; the anti-scraping layer is arranged on the upper surface of the upper anti-static layer; the protective layer, the upper surface on anti-scratch layer is connected to the protective layer, prevent that the static structure includes antistatic backing and last antistatic backing down, and wherein antistatic backing is connected with the upper surface on stratum basale through first tie coat down, goes up the antistatic backing and is connected with the upper surface on stabilizing layer through the fourth tie coat. This high temperature resistant silica gel protection film of high stability has fine stability, and in the aspect of preventing static processing, the effect is better to when applying the silica gel protection film, be convenient for eliminate the bubble.)

1. The utility model provides a high temperature resistant silica gel protection film of high stability which characterized in that includes:

the substrate layer (1), the substrate layer (1) is a silica gel basement membrane;

the upper part and the lower part of the substrate layer (1) are provided with antistatic structures;

the bonding structure (4), the bonding structure (4) is arranged below the substrate layer (1), and the bonding structure (4) is used for bonding the whole silica gel protective film;

a stabilizing layer (7), the stabilizing layer (7) being disposed on an upper surface of the base layer (1);

the anti-scratch layer (10), the anti-scratch layer (10) is arranged on the upper surface of the upper anti-static layer (9);

and the protective layer (11), wherein the protective layer (11) is connected to the upper surface of the scratch-resistant layer (10).

2. The high-stability high-temperature-resistant silica gel protective film according to claim 1, wherein: the anti-static structure comprises a lower anti-static layer (3) and an upper anti-static layer (9), wherein the lower anti-static layer (3) is connected with the upper surface of the substrate layer (1) through a first bonding layer (2), and the upper anti-static layer (9) is connected with the upper surface of the stabilizing layer (7) through a fourth bonding layer (8).

3. The high-stability high-temperature-resistant silica gel protective film according to claim 2, wherein: the lower anti-static layer (3) and the upper anti-static layer (9) are both composed of anti-static films with the thickness of 1-2 mu m, and the lower anti-static layer (3) and the upper anti-static layer (9) are both made of transparent materials.

4. The high-stability high-temperature-resistant silica gel protective film according to claim 1, wherein: the bonding structure (4) comprises a bonding primer (401), a bubble hole (402), a cross bar (403) and a second bonding layer (404), wherein:

the bonding base glue (401) is provided with a bubble hole (402), a transverse bar (403) is arranged above the bonding base glue (401), and the upper surface of the transverse bar (403) is connected with a second bonding layer (404).

5. The high-stability high-temperature-resistant silica gel protective film according to claim 4, wherein: the bubble holes (402) are uniformly distributed on the bonding base glue (401), the cross section of each bubble hole (402) is in a cross shape, and the cross bars (403) are arranged between the bonding base glue (401) and the second bonding layer (404) at equal intervals.

6. The high-stability high-temperature-resistant silica gel protective film according to claim 1, wherein: the lower surface of the stabilizing layer (7) is connected with the upper surface of the substrate layer (1) through a third bonding layer (6), and the stabilizing layer (7) is processed by perhydropolysilazane and N-propyl ethylenediamine.

7. The high-stability high-temperature-resistant silica gel protective film according to claim 6, wherein: the processing mode of the stabilizing layer (7) is mainly realized by the following modes:

firstly, uniformly mixing perhydropolysilazane and N-propyl ethylenediamine, and then coating the mixed liquid on a substrate;

then drying the substrate coated with the mixed liquid of perhydropolysilazane and N-propyl ethylenediamine in a dryer;

and forming a film structure on the dried substrate, taking down the film structure, coating a third bonding layer (6) on the lower surface of the film structure, and applying the film structure on the upper surface of the substrate layer (1) to form a stable layer (7).

8. The high-stability high-temperature-resistant silica gel protective film according to claim 1, wherein: the anti-scratch layer (10) is composed of a polyester film, and the anti-scratch layer (10) is connected with the upper surface of the upper anti-static layer (9) through a fifth bonding layer (13).

9. The high-stability high-temperature-resistant silica gel protective film according to claim 1, wherein: protective layer (11) are the same with the material of leaving type layer (5), and protective layer (11) are connected with the upper surface of preventing scraping layer (10) through bonding strip (12) to bonding strip (12) are at the equidistant setting of the lower surface of protective layer (11).

10. The high-stability high-temperature-resistant silica gel protective film according to claim 2, wherein: the first bonding layer (2), the second bonding layer (404), the third bonding layer (6), the fourth bonding layer (8) and the fifth bonding layer (13) are all polyamide adhesives.

Technical Field

The invention relates to the technical field of silica gel protective films, in particular to a high-stability high-temperature-resistant silica gel protective film.

Background

Protection film electronic product screen protection common membrane structure, common in the protection of cell-phone, flat board, car display screen and other digital products, along with electronic product's development, the kind and the function of protection film are also developing gradually, and the material is by the earliest PP material to the silica gel material that is popular today, more and more helps protect function's performance.

The existing silicone protective film is one of protective films widely used, but the existing silicone protective film still has certain defects, such as:

if the authorized bulletin number is: CN205800373U, the date of authorized announcement is: 2016.12.14's a high temperature resistant silica gel protection film', the utility model discloses a high temperature resistant silica gel protection film relates to electronic product protection film technical field, including compound rete of PET, silica gel layer and high temperature resistant PET layer, the compound rete of PET the silica gel layer with the vertical range upon range of setting on high temperature resistant PET layer, the compound rete of PET with be provided with the first adhesive layer that prevents both from coming unstuck between the silica gel layer, the silica gel layer with be provided with the second adhesive layer that prevents both from coming unstuck between the high temperature resistant PET layer. The utility model discloses the protection film back has high temperature resistant characteristic, has antistatic effect in the silica gel, and the protection film surface has wear-resisting characteristic for the use of various electronic product can be applied to the protection film.

However, the prior art has poor antistatic treatment effect and cannot play a good antistatic effect;

and if the application publication number is: CN112208155A, application publication date is: 2021.01.12, the invention discloses a high temperature resistant silica gel protective film, which comprises a first silica gel base film layer, an acrylate film layer, a heat insulation hole, a pasting mechanism and a protection mechanism, wherein the upper end of the first silica gel base film layer is bonded with the acrylate film layer through acrylate pressure sensitive adhesive, the upper end of the acrylate pressure sensitive adhesive is bonded at the lower end of the acrylate film layer, and the lower end of the acrylate pressure sensitive adhesive is bonded at the upper end of the first silica gel base film layer, the invention has the following beneficial effects: can effectually prevent through the intraformational heat insulating hole of acrylic ester rete that outside heat transfer from the type rete to bottom fluorine, can effectually guarantee that fluorine is from the adsorptivity of type rete under the high temperature condition, fluorine is too high from the temperature on type rete surface under the effectual high temperature weather of avoiding, lead to not hard up the problem that drops even with electronic screen surface connection, the effectual light that prevents is propagated from the side, thereby the privacy of protection private cell-phone when using that can be fine is not seen by the people on next door.

However, in the above-mentioned conventional techniques, the stability of the protective film is poor in use, and bubbles generated when the silicone protective film is applied are difficult to be eliminated.

Therefore, we propose a high-stability high-temperature resistant silica gel protective film in order to solve the above-mentioned problems.

Disclosure of Invention

The invention aims to provide a high-stability high-temperature-resistant silica gel protective film to solve the problems that most silica gel protective films proposed in the background art have poor antistatic treatment effect, cannot play a good antistatic effect, have poor stability and are difficult to eliminate bubbles generated when the silica gel protective films are attached.

In order to achieve the purpose, the invention provides the following technical scheme: a high-stability high-temperature-resistant silica gel protective film comprises:

the basal layer is a silica gel basement membrane;

the upper part and the lower part of the substrate layer are both provided with an antistatic structure;

the bonding structure is arranged below the substrate layer and used for bonding the whole silica gel protective film;

a stabilization layer disposed on an upper surface of the base layer;

the anti-scraping layer is arranged on the upper surface of the upper anti-static layer;

and the protective layer is connected to the upper surface of the anti-scraping layer.

Preferably, the anti-static structure comprises a lower anti-static layer and an upper anti-static layer, wherein the lower anti-static layer is connected with the upper surface of the substrate layer through a first bonding layer, and the upper anti-static layer is connected with the upper surface of the stabilizing layer through a fourth bonding layer.

Preferably, the lower anti-static layer and the upper anti-static layer are both composed of anti-static films with the thickness of 1-2 μm, and the lower anti-static layer and the upper anti-static layer are both made of transparent materials.

Preferably, the bonding structure comprises a bonding primer, a bubble hole, a cross bar and a second bonding layer, wherein:

the bubble holes are formed in the bonding primer, the transverse strips are arranged above the bonding primer, and the upper surfaces of the transverse strips are connected with the second bonding layer.

Preferably, the bubble holes are uniformly distributed on the bonding primer, the cross section of each bubble hole is in a cross shape, and the cross bars are arranged between the bonding primer and the second bonding layer at equal intervals.

Preferably, the lower surface of the stabilizing layer is connected with the upper surface of the substrate layer through a third bonding layer, and the stabilizing layer is processed by perhydropolysilazane and N-propyl ethylenediamine.

Preferably, the processing mode of the stabilizing layer is mainly realized by the following modes:

firstly, uniformly mixing perhydropolysilazane and N-propyl ethylenediamine, and then coating the mixed liquid on a substrate;

then drying the substrate coated with the mixed liquid of perhydropolysilazane and N-propyl ethylenediamine in a dryer;

and forming a film structure on the dried substrate, taking down the film structure, smearing a third bonding layer on the lower surface of the film structure, and pasting the film structure on the upper surface of the basal layer to form the stable layer.

Preferably, the scratch-resistant layer is made of a polyester film, and the scratch-resistant layer is connected with the upper surface of the upper antistatic layer through a fifth bonding layer.

Preferably, the protective layer is the same with the material from the type layer, and the protective layer is connected with the upper surface on scratch-proof layer through the bonding strip to the bonding strip is equidistant to be set up at the lower surface of protective layer.

Preferably, the adhesives adopted by the first bonding layer, the second bonding layer, the third bonding layer, the fourth bonding layer and the fifth bonding layer are polyamide adhesives.

Compared with the prior art, the invention has the beneficial effects that: the high-stability high-temperature-resistant silica gel protective film has good stability, has good effect in the aspect of antistatic treatment, and is convenient for eliminating bubbles when being applied with the silica gel protective film;

1. the stable layer is arranged on the substrate layer, and is prepared by mixing perhydropolysilazane and N-propyl ethylenediamine, coating the mixture to form a film structure and drying the film structure, so that the stability of the silica gel protective film can be improved, and the silica gel protective film still keeps good performance at high temperature;

2. the upper anti-static layer and the lower anti-static layer are respectively arranged in the upper direction and the lower direction of the substrate layer, so that the upper direction and the lower direction of the substrate layer can be simultaneously subjected to anti-static treatment, and the anti-static effect of the silica gel protective film is better;

3. through the bonding structure who sets up, be provided with the bubble hole on the bonding primer of bonding structure, when the application uses this silica gel protection film, if produce the bubble between silica gel protection film and the screen, then can make the bubble discharge from the bubble hole to discharge gradually from bonding between primer and the second tie coat, prevent that the bubble can't eliminate.

Drawings

FIG. 1 is a schematic front sectional view of the present invention;

FIG. 2 is an enlarged view of the structure at A in FIG. 1 according to the present invention;

FIG. 3 is a schematic bottom view of the passivation layer of the present invention;

FIG. 4 is a schematic front sectional view of a bonding structure according to the present invention;

FIG. 5 is a schematic top view of the adhesive primer of the present invention.

In the figure: 1. a base layer; 2. a first adhesive layer; 3. a lower antistatic layer; 4. a bonding structure; 401. bonding a primer; 402. bubble holes; 403. a horizontal bar; 404. a second adhesive layer; 5. a release layer; 6. a third adhesive layer; 7. a stabilizing layer; 8. a fourth adhesive layer; 9. an upper antistatic layer; 10. a scratch-resistant layer; 11. a protective layer; 12. a bonding strip; 13. a fifth tie layer.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments, and all other embodiments obtained by a person of ordinary skill in the art without creative efforts based on the embodiments of the present invention belong to the protection scope of the present invention.

Referring to fig. 1-5, the present invention provides a technical solution: a high-stability high-temperature-resistant silica gel protective film comprises:

the substrate layer 1 is a silica gel substrate film;

the upper part and the lower part of the substrate layer 1 are both provided with an antistatic structure;

the bonding structure 4 is arranged below the substrate layer 1, and the bonding structure 4 is used for bonding the whole silica gel protective film;

a stabilizing layer 7, the stabilizing layer 7 being disposed on an upper surface of the base layer 1;

the anti-scratch layer 10 is arranged on the upper surface of the upper anti-static layer 9;

and a protective layer 11, wherein the protective layer 11 is connected to the upper surface of the scratch-resistant layer 10.

Furthermore, the antistatic structure comprises a lower antistatic layer 3 and an upper antistatic layer 9, wherein the lower antistatic layer 3 is connected with the upper surface of the substrate layer 1 through the first bonding layer 2, the upper antistatic layer 9 is connected with the upper surface of the stabilizing layer 7 through the fourth bonding layer 8, and the antistatic effect on the upper direction and the lower direction of the substrate layer 1 can be achieved through the arranged lower antistatic layer 3 and the upper antistatic layer 9, so that the antistatic effect of the silica gel protective film is better.

In a further aspect of the present invention, the lower anti-static layer 3 and the upper anti-static layer 9 are both composed of anti-static films with a thickness of 1-2 μm, and the lower anti-static layer 3 and the upper anti-static layer 9 are both made of transparent materials, and the lower anti-static layer 3 and the upper anti-static layer 9 are made of transparent materials, so as to prevent the use effect of the whole protective film from being affected by the lower anti-static layer 3 and the upper anti-static layer 9 while preventing static electricity.

Further to the present invention, the bonding structure 4 comprises a bonding primer 401, a bubble hole 402, a cross bar 403 and a second bonding layer 404, wherein:

the bonding base glue 401 is provided with a bubble hole 402, a cross bar 403 is arranged above the bonding base glue 401, and the upper surface of the cross bar 403 is connected with a second bonding layer 404.

In a further aspect of the present invention, the bubble holes 402 are uniformly distributed on the adhesive base 401, the cross-sectional shape of the bubble holes 402 is cross-shaped, and the cross bars 403 are disposed between the adhesive base 401 and the second adhesive layer 404 at equal intervals, so that bubbles generated during the application process can be eliminated by the action of the bubble holes 402.

In a further aspect of the present invention, the lower surface of the stabilizing layer 7 is connected to the upper surface of the substrate layer 1 through a third adhesive layer 6, and the stabilizing layer 7 is formed by processing perhydropolysilazane and N-propylethylenediamine.

In a further aspect of the present invention, the processing of the stabilizing layer 7 is mainly realized by:

firstly, uniformly mixing perhydropolysilazane and N-propyl ethylenediamine, and then coating the mixed liquid on a substrate;

then drying the substrate coated with the mixed liquid of perhydropolysilazane and N-propyl ethylenediamine in a dryer;

and forming a film structure on the dried substrate, taking down the film structure, coating a third bonding layer 6 on the lower surface of the film structure, and applying the film structure on the upper surface of the substrate layer 1 to form a stable layer 7.

In a further aspect of the present invention, the scratch-resistant layer 10 is made of a polyester film, and the scratch-resistant layer 10 is connected to the upper surface of the upper anti-static layer 9 through a fifth adhesive layer 13, so that the scratch-resistant layer 10 can protect the whole silica gel protective film from being scratched, thereby preventing the protective film from being damaged.

In a further aspect of the present invention, the protective layer 11 and the release layer 5 are made of the same material, the protective layer 11 is connected to the upper surface of the scratch-resistant layer 10 through the bonding strips 12, the bonding strips 12 are disposed at equal intervals on the lower surface of the protective layer 11, the protective layer 11 can be adhered to the scratch-resistant layer 10 through the disposition of the bonding strips 12, and the bonding strips 12 disposed at equal intervals can reduce the adhesive residue compared with the case that the bonding strips 12 are completely covered.

In a further aspect of the present invention, the adhesives used for the first bonding layer 2, the second bonding layer 404, the third bonding layer 6, the fourth bonding layer 8, and the fifth bonding layer 13 are all polyamide adhesives.

When the high-stability high-temperature-resistant silica gel protective film is used, a display screen needing to be pasted is wiped clean, then the release layer 5 is torn off, the whole silica gel protective film is pasted on the display screen, the bonding structure 4 is arranged below the substrate layer 1, the bonding primer 401 in the bonding structure 4 can enable the whole silica gel protective film to be adhered on the display screen, and the bonding stability is ensured, in addition, a bubble hole 402 is arranged on the bonding primer 401, when the silica gel protective film is pasted, because a cross bar 403 is arranged between the bonding primer 401 and a second bonding layer 404, a certain gap can be generated between the bonding primer 401 and the second bonding layer 404 under the action of the cross bar 403, if bubbles appear between the bonding primer 401 and the display screen, the bubbles enter the gap between the bonding primer 401 and the second bonding layer 404 under the action of the bubble hole 402, further discharging to the outside of the silica gel protective film to prevent the use from being influenced because bubbles cannot be eliminated;

through being provided with antistatic backing 9 and antistatic backing 3 down respectively in the upper and lower direction of stratum basale 1, can play the effect of antistatic backing under the effect of antistatic backing 9 and lower antistatic backing 3 to whole silica gel protection film, and under the effect of stabilizing layer 7, can guarantee the holistic stability of this silica gel protection film.

The standard parts used in the invention can be purchased from the market, the special-shaped parts can be customized according to the description of the specification and the accompanying drawings, the specific connection mode of each part adopts conventional means such as bolts, rivets, welding and the like mature in the prior art, the machinery, parts and equipment adopt conventional models in the prior art, and the circuit connection adopts the conventional connection mode in the prior art, and the details are not described, and the content not described in detail in the specification belongs to the prior art known by persons skilled in the art.

Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that various changes in the embodiments and/or modifications of the invention can be made, and equivalents and modifications of some features of the invention can be made without departing from the spirit and scope of the invention.