阅读说明：本技术 半导体存储装置 (Semiconductor memory device with a plurality of memory cells ) 是由 小林祐介 于 2020-08-10 设计创作，主要内容包括：至少一个实施方式提供了一种电特性得到改善的半导体存储装置。一种半导体存储装置包括第一布线、第二布线、绝缘部和电阻变化膜。第一布线在第一方向上延伸。第二布线在与第一方向相交的第二方向上延伸,并且在与第一方向和第二方向相交的第三方向上设置在与第一布线不同的位置。绝缘部在第三方向上设置在第一布线和第二布线之间。电阻变化膜在第三方向上设置在第一布线和第二布线之间,并从第一侧和在第一方向上与第一侧相反的第二侧与绝缘膜相邻,电阻变化膜在第一方向上小于第二布线。(At least one embodiment provides a semiconductor memory device having improved electrical characteristics. A semiconductor memory device includes a first wiring, a second wiring, an insulating portion, and a resistance change film. The first wiring extends in a first direction. The second wiring extends in a second direction intersecting the first direction, and is disposed at a position different from the first wiring in a third direction intersecting the first direction and the second direction. The insulating portion is disposed between the first wiring and the second wiring in the third direction. The resistance change film is provided between the first wiring and the second wiring in the third direction and is adjacent to the insulating film from a first side and a second side opposite to the first side in the first direction, the resistance change film being smaller than the second wiring in the first direction.)

1. A semiconductor memory device, comprising:

a first wiring extending in a first direction;

a second wiring which extends in a second direction intersecting the first direction and is provided at a position different from the first wiring in a third direction intersecting the first direction and the second direction;

an insulating film provided between the first wiring and the second wiring in the third direction, the insulating film having a first side and a second side opposite to the first side in the first direction; and

a resistance change film provided between the first wiring and the second wiring in the third direction and adjacent to the insulating film from the first side and the second side, the resistance change film being smaller than the second wiring in the first direction.

2. The semiconductor memory device according to claim 1,

the insulating film is provided in a first region where the first wiring and the second wiring overlap with each other when viewed from the third direction,

the resistance change film includes: a first resistance change portion adjacent to the insulating film from the first side of the first region in the first direction, and a second resistance change portion adjacent to the insulating film from the second side of the first region in the first direction.

3. The semiconductor memory device according to claim 2,

the resistance change film further includes: a third resistance change portion adjacent to the insulating film from a third side of the first region in the third direction, and a fourth resistance change portion adjacent to the insulating film from a fourth side opposite to the third side of the third region in the third direction.

4. The semiconductor memory device according to claim 2,

the resistance change film further includes: a fifth resistance change portion adjacent to the insulating film from a fifth side of the first region in the second direction.

5. The semiconductor memory device according to claim 1, further comprising:

a conductive film provided between the resistance change film and the insulating film and the first wiring in the third direction; and

a selector film provided between the resistance change film and the insulating film and the second wiring in the third direction,

the resistance change film is provided in a first region where the first wiring and the second wiring overlap with each other when viewed from the third direction,

the insulating film includes: a first adjacent insulating portion adjacent to the variable resistance film from the first side of the first region in the first direction, and a second adjacent insulating portion adjacent to the variable resistance film from the second side of the first region in the first direction.

6. A semiconductor memory device, comprising:

a first wiring extending in a first direction;

a second wiring extending in a second direction intersecting the first direction and located at a position different from the first wiring in a third direction intersecting the first direction and the second direction;

a selector film provided between the first wiring and the second wiring in the third direction;

an insulating film provided between the first wiring and the second wiring in the third direction, the insulating film having a first side and a second side opposite to the first side in the first direction, and the insulating film being adjacent to the selector film from the first side and the second side; and

a resistance change film provided between the first wiring and the second wiring in the third direction and connected to the selector film in the third direction.

7. A semiconductor memory device, comprising:

a first wiring extending in a first direction;

a second wiring extending in a second direction intersecting the first direction and located at a position different from the first wiring in a third direction intersecting the first direction and the second direction;

a first insulating film provided between the first wiring and the second wiring in the third direction;

a first resistance change film provided between the first wiring and the second wiring in the third direction and adjacent to the first insulating film in the first direction; and

a first insulating portion adjacent to the first insulating film from the same side as a part of the first resistance change film in the first direction.

8. The semiconductor memory device according to claim 7,

the first resistance change film is provided at the center of the second wiring in the first direction.

9. The semiconductor memory device according to claim 8,

the first resistance change film is provided between a center of the second wiring in the first direction and an edge of the second wiring in the first direction.

10. The semiconductor memory device according to claim 7,

the first resistance change film is in contact with the first insulating film in the first direction.

11. The semiconductor memory device according to claim 7,

a maximum thickness of the first resistance change film in the first direction is smaller than a maximum thickness of the first insulating film in the first direction.

12. The semiconductor memory device according to claim 7,

the maximum thickness of the first resistance change film in the first direction is equal to or less than half of the maximum width of the second wiring in the first direction.

13. The semiconductor memory device according to claim 7,

a portion of the first insulating portion is adjacent to the selector film in the first direction.

14. The semiconductor memory device according to claim 7,

a maximum thickness of the first resistance change film in the first direction is smaller than a maximum thickness of the selector film in the third direction.

15. The semiconductor memory device according to claim 7, further comprising:

a third wiring adjacent to the second wiring in the first direction and extending in the second direction;

a second insulating film provided between the first wiring and the third wiring in the third direction;

a second resistance change film provided between the first wiring and the third wiring in the third direction and adjacent to the second insulating film in the first direction; and

a second insulating portion adjacent to the second insulating film from the same side as a part of the second resistance change film in the first direction.

16. The semiconductor memory device according to claim 15,

the first resistance change film is provided in a central portion of the second wiring in the first direction,

the second resistance variable film is provided in a central portion of the third wiring in the first direction.

17. The semiconductor memory device according to claim 16, further comprising:

a fourth wiring adjacent to the second wiring from a side opposite to the third wiring in the first direction and extending in the second direction;

a third insulating film provided between the first wiring and the fourth wiring in the third direction; and

a third resistance change film provided between the first wiring and the fourth wiring in the third direction and adjacent to the third insulating film in the first direction,

the second insulating portion includes a portion provided between the first wiring and the fourth wiring in the third direction.

18. The semiconductor memory device according to claim 15,

the first resistance change film is provided in a central portion of the second wiring in the first direction,

the third resistance variable film is provided in a central portion of the fourth wiring in the first direction.

19. The semiconductor memory device according to claim 17,

the second insulating portion is in contact with the first variable resistance film from a side opposite to the first insulating film.

20. The semiconductor memory device according to claim 17,

a part of the second insulating portion is disposed between the second wiring and the third wiring in the first direction.

Technical Field

Embodiments described herein relate generally to a semiconductor memory device.

Background

As an example of a Storage Class Memory (SCM), a semiconductor memory device having a cross-point structure using a Phase Change Memory (PCM) is known.

Disclosure of Invention

Embodiments provide a semiconductor memory device having improved electrical characteristics.

In general, according to at least one embodiment, a semiconductor memory device includes a first wiring, a second wiring, an insulating film, and a resistance change film. The first wiring extends in a first direction. The second wiring extends in a second direction intersecting the first direction, and is disposed at a position different from the first wiring in a third direction intersecting the first direction and the second direction. The insulating portion is disposed between the first wiring and the second wiring in the third direction. The resistance change film is provided between the first wiring and the second wiring in the third direction and is adjacent to the insulating film from a first side and a second side opposite to the first side in the first direction, the resistance change film being smaller than the second wiring in the first direction.

According to at least one other embodiment, a semiconductor memory device includes a first wiring, a second wiring, a selector film, an insulating film, and a resistance change film. The first wiring extends in a first direction. The second wiring extends in a second direction intersecting the first direction, and is disposed at a position different from the first wiring in a third direction intersecting the first direction and the second direction. The selector film is disposed between the first wiring and the second wiring in the third direction. The insulating film is provided between the first wiring and the second wiring in the third direction, and is adjacent to the selector film from a first side and a second side opposite to the first side in the first direction. The resistance change film is provided between the first wiring and the second wiring in the third direction, and is connected to the selector film in the third direction.

Drawings

Fig. 1 is a schematic oblique view of a semiconductor memory device according to a first embodiment.

Fig. 2 is an oblique view of one storage unit according to the first embodiment.

Fig. 3 is a cross-sectional view of a resistance change film and an insulating film of one memory cell according to the first embodiment.

Fig. 4 is a cross-sectional view of a plurality of memory cells according to a first embodiment.

Fig. 5 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 6 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 7 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 8 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 9 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 10 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 11 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 12 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the first embodiment.

Fig. 13 is an oblique view of a storage unit according to a second embodiment.

Fig. 14 is a cross-sectional view of the resistance variable film and the insulating film of one memory cell of the second embodiment.

Fig. 15 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 16 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 17 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 18 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 19 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 20 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 21 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the second embodiment.

Fig. 22 is an oblique view of one storage unit according to the third embodiment.

Fig. 23 is a cross-sectional view of the resistance variable film and the insulating film of one memory cell of the third embodiment.

Fig. 24 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 25 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 26 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 27 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 28 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 29 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 30 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 31 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 32 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 33 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 34 is a sectional view and a plan view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 35 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the third embodiment.

Fig. 36 is a sectional view showing an example of manufacturing steps of a plurality of memory cells according to a modification of the third embodiment.

Fig. 37 is an oblique view of a storage unit according to the fourth embodiment.

Fig. 38 is a cross-sectional view of a selector film and an insulating film of one memory cell according to a fourth embodiment.

Fig. 39 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Fig. 40 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Fig. 41 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Fig. 42 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Fig. 43 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Fig. 44 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Fig. 45 is a sectional view showing an example of a manufacturing step of a plurality of memory cells according to the fourth embodiment.

Detailed Description

Hereinafter, a semiconductor memory device according to at least one embodiment will be described with reference to the accompanying drawings. In the following description, configurations having the same function or similar functions to each other are denoted by the same reference numerals. The description of the configurations having the same function or similar functions to each other may not be repeated. "parallel", "orthogonal", "identical" and "equivalent" described in this specification include cases of "substantially parallel", "substantially orthogonal", "substantially identical" and "substantially equivalent", respectively.

"connection" described in this specification is not limited to the case of physical connection but includes the case of electrical connection. That is, "connected" is not limited to the case where two members are in direct contact, but also includes the case where another member is interposed between the two members. The term "contact" as used in this specification means direct contact. The "overlapping", "facing", and "adjacent" described in this specification are not limited to two members that directly face or contact each other, and include a case where a member other than the two members is present between the two members.

(first embodiment)

First, the configuration of the semiconductor storage device 1 according to the first embodiment will be described. Fig. 1 is a schematic perspective view of a semiconductor memory device 1. In the following description, the X direction (second direction) is a direction parallel to the surface 11a of the silicon substrate 11, and is a direction in which the word lines WL extend. The Y direction (first direction) is a direction parallel to the surface 11a of the silicon substrate 11, is a direction intersecting the X direction, and is a direction in which the bit line BL extends. For example, the Y direction is substantially orthogonal to the X direction. The Z direction (third direction) is a thickness direction of the silicon substrate 11, and is a direction intersecting the X direction and the Y direction. For example, the Z direction is substantially orthogonal to the X and Y directions.

The semiconductor memory device 1 is a so-called cross-point type semiconductor memory device using PCM. The semiconductor memory device 1 includes, for example, a silicon substrate 11, an interlayer insulating layer 12, a plurality of word lines WL, a plurality of bit lines BL, and a plurality of memory cells MC.

On the surface 11a of the silicon substrate 11, a drive circuit (not shown) of the semiconductor memory apparatus 1 is formed. An interlayer insulating layer 12 is formed on the surface 11a of the silicon substrate 11 and covers the driving circuit. The interlayer insulating layer 12 is made of, for example, silicon oxide (SiO)₂) And (4) forming.

Each of the plurality of word lines WL is formed in a band shape along the X direction and extends in the X direction. A plurality of word lines WL are arranged at intervals in the Y direction and the Z direction. Specifically, a plurality of word lines WL arranged in the Y direction are in the same position in the Z direction, and constitute one word line layer 25. A plurality of word line layers 25 are arranged at intervals in the Z direction. The word line WL is formed of, for example, tungsten (W). One word line WL is an example of "second wiring". A word line WL adjacent to a word line as a second wiring in the Y direction is an example of the "third wiring". A word line WL adjacent to a word line as the second wiring from the opposite side of the third wiring in the Y direction is an example of the "fourth wiring".

The plurality of bit lines BL are formed in a stripe shape along the Y direction and extend in the Y direction. A plurality of bit lines BL are arranged at intervals in the X direction and the Z direction. The plurality of bit lines BL arranged in the X direction are at the same position in the Z direction, and constitute one bit line layer 27. The bit line layer 27 is disposed between two word line layers 25 adjacent in the Z direction with a space from the two word line layers 25 in the Z direction. The plurality of word line layers 25 and the plurality of bit line layers 27 are alternately arranged one by one in the Z direction. The bit line BL is formed of, for example, tungsten (W). The bit line BL is an example of "first wiring".

The size of each word line WL in the Y direction and the size of each bit line BL in the X direction are substantially equal to a minimum feature size (minimum feature size) F of the semiconductor memory apparatus 1. An interlayer insulating layer (not shown in fig. 1) is interposed between a plurality of adjacent word lines WL in each word line layer 25 and between a plurality of adjacent bit lines BL in each bit line layer 27.

The word lines WL and the bit lines BL are arranged in such a manner as to intersect each other when viewed from the Z direction. The word lines WL and the bit lines BL are, for example, orthogonal to each other when viewed from the Z direction. When viewed from the Z direction, the memory cell MC is disposed in an overlapping portion CP where the word line WL and the bit line BL overlap each other. In the overlapping portion CP in the Z direction, a memory cell MC is interposed between the word line WL and the bit line BL. That is, by providing a plurality of memory cells MC in the plurality of overlapping portions CP, the plurality of memory cells MC are arranged in a three-dimensional matrix shape spaced apart from each other in the X direction, the Y direction, and the Z direction.

Fig. 2 is a perspective view showing one memory cell MC of the semiconductor memory device 1. As shown in fig. 2, the memory cell MC is constituted by a pillar 35 having a substantially prism shape whose longitudinal direction is the Z direction. An end surface 35a of one side of the pillar 35 in the Z direction is in contact with the word line WL over the entire overlapping portion CP. The end surface 35b of the pillar 35 on the other side in the Z direction is in contact with the bit line BL over the entire overlapping portion CP. The interlayer insulating portions 38 are provided between the adjacent memory cells MC in the X direction and the Y direction.

The memory cell MC includes, for example, a conductive film 81, a resistance change film 51, an insulating film 43, and a selector film 61.

The conductive film 81 is provided between the word line WL and the bit line BL in the Z direction. The conductive film 81 is interposed between the resistance change film 51 and the bit line BL in the Z direction. An end surface 81a of the conductive film 81 on one side in the Z direction is in contact with the resistance change film 51. The end surface 81b of the other side of the conductive film 81 in the Z direction is in contact with the bit line BL. The dimension of the conductive film 81 as viewed from the Z direction is the same as the dimension of the overlapping portion CP. The conductive film 81 is adjacent to the interlayer insulating portion 38 in the Y direction. The conductive film 81 functions as an electrical connection layer between the bit line BL and the resistance change film 51, and also functions as a hard mask (hard mask) layer of the memory cell MC. The conductive film 81 is formed of tungsten, for example.

The resistance change film 51 is provided between the word line WL and the bit line BL in the Z direction, and is interposed between the selector film 61 and the conductive film 81 in the Z direction. That is, the end face 51a of the resistance change film 51 on one side in the Z direction is in contact with the selector film 61. The end surface 51b of the other side of the resistance change film 51 in the Z direction is in contact with the conductive film 81. The variable resistance film 51 is adjacent to the interlayer insulating portion 38 in the Y direction.

Fig. 3 is a cross-sectional view of the variable resistance film 51 and the insulating film 43 of one memory cell MC, which is orthogonal to the Z direction. As shown in fig. 3, the resistance change film 51 is adjacent to the insulating film 43 from a first side and a second side opposite to the first side in the Y direction.

The resistance change film 51 is formed of PCM. The resistance change film 51 is formed by, for example, a chalcogenide alloy of germanium (Ge), antimony (Sb), and tellurium (Te) called GST. For example, the composition ratio of Ge, Sb, and Te is 2: 2: 5. the resistance change film is in a crystalline state by being overheated and gradually cooled at a temperature lower than the melting temperature and higher than the crystallization temperature, and is in a low resistance state. The resistance change film is in an amorphous state by being heated at a temperature equal to or higher than the melting temperature and rapidly cooled, and is in a high-resistance state.

That is, when the current applied to the resistance change film 51 increases and the voltage reaches a prescribed value, carriers inside the resistance change film 51 multiply, and the resistance of the resistance change film 51 rapidly decreases. When a voltage equal to or higher than a prescribed value is applied to the resistance change film 51, a large current flows, joule heat is generated, and the temperature of the resistance change film 51 increases. When the voltage to be applied is controlled and the temperature of the resistance change film 51 is maintained in the crystallization temperature region, the resistance change film 51 is transited to the polycrystalline state, and the resistance of the resistance change film 51 decreases. When the resistance change film 51 is in the polycrystalline state, even when the applied voltage is zero, the polycrystalline state is maintained and the resistance of the resistance change film 51 is kept low. When a high voltage is applied to the resistance change film 51 in the low resistance state, a large current flows, and the temperature of the resistance change film 51 exceeds the melting point of the chalcogenide alloy or the like, the chalcogenide alloy of the resistance change film 51 is melted. When the applied voltage is rapidly decreased, although the resistance-change film 51 is rapidly cooled, the resistance of the resistance-change film 51 remains high. In the principle of operation of the variable resistance film 51, a state in which the resistance of the variable resistance film 51 is smaller than a predetermined value is referred to as a "set state", and a state in which the resistance of the variable resistance film 51 is equal to or higher than the predetermined value is referred to as a "reset state". The rewriting operation for decreasing the resistance of the resistance-change film 51 is referred to as "set operation", and the rewriting operation for increasing the resistance of the resistance-change film 51 is referred to as "reset operation".

The resistance change film 51 is a layer that maintains the low resistance state or the high resistance state described above. The resistance variable films 51 are phase-changed to selectively operate the memory cells MC. The resistance change film 51 can take at least two different resistance values as a bistable state at room temperature by applying a voltage or supplying a current. At least one binary memory operation can be achieved by two stable resistance values for the write and the reader. For example, when a binary memory operation is performed on the resistance change film 51, the set state of the resistance change film 51 is set to 1, and the reset state of the resistance change film 51 is set to 0.

The variable resistance film 51 includes a first variable resistance portion 52, a second variable resistance portion 53, a third variable resistance portion 58, and a fourth variable resistance portion 59. The resistance change film 51 includes four resistance change portions and is integrally formed. The first resistance change portion 52 is adjacent to the insulating film 43 from the first side in the Y direction. The second resistance change portion 53 is adjacent to the insulating film 43 from the second side in the Y direction. First resistance change portion 52 and second resistance change portion 53 are separated from each other in the Y direction. When viewed in a cross section orthogonal to the Z direction at an arbitrary position in the Z direction, the first resistance change portion 52 and the second resistance change portion 53 do not contact each other.

The third resistance variable portion 58 and the fourth resistance variable portion 59 are adjacent to the insulating film 43 from the opposite sides in the Z direction, respectively. The third resistance variable portion 58 is adjacent to the insulating film 43 from the third side of the first region R in the Z direction. The fourth resistance variable portion 59 is adjacent to the insulating film 43 from the fourth side of the first region R in the Z direction.

The Y-direction maximum width of the end faces 52e and 52f of the first resistance change portion 52 in the X-direction is smaller than the Y-direction minimum width of the overlapping portion CP and smaller than the Y-direction minimum width of the word line WL. The Y-direction maximum widths of the end faces 53e and 53f of the second resistance change portion 53 are smaller than the Y-direction minimum width of the overlapping portion CP and smaller than the Y-direction minimum width of the word line WL. The Y-direction minimum widths of the end faces 52e and 52f of the first resistance change portion 52 and the end faces 53e and 53f of the second resistance change portion 53, and the Z-direction minimum thicknesses of the end faces of the third resistance change portion 58 and the fourth resistance change portion 59 in the X direction are, for example, equal to or more than 20% of the smaller of the Y-direction minimum width of the overlap portion CP and the Z-direction minimum thickness of the overlap portion CP, and equal to or less than 50% thereof. When the resistance change film 51 is formed as described below, the Y-direction minimum width of the first resistance change portion 52, the Y-direction minimum width of the second resistance change portion 53, and the Z-direction minimum thickness of the resistance change portions 58 and 59 are, for example, equal to or greater than 5 μm.

As shown in fig. 3, the insulating film 43 is disposed in the first region R of the overlap region CP in the Y direction when viewed in the Z direction. The first region R is a central portion of the overlap region CP in the Y direction. The insulating film 43 is adjacent to the first resistance change portion 52 and the second resistance change portion 53 in the Y direction, and is interposed between the first resistance change portion 52 and the second resistance change portion 53Between the second resistance change portions 53. The insulating film 43 is surrounded by the first resistance change portion 52, the second resistance change portion 53, and the resistance change portions 58 and 59 when viewed from the X direction, and is buried in the central portion of the first region R. The insulating film 43 is made of, for example, silicon oxide (SiO)₂) Silicon nitride (SiN), etc.

The area of the end face of the resistance change film 51 (i.e., the total area of the end faces of the first resistance change portion 52, the second resistance change portion 53, and the resistance change portions 58 and 59) is smaller than the area of the end face of the resistance change film where the insulating film 43 is not embedded when viewed from the X direction. For example, when viewed from the X direction, the area of the end face of the resistance change film 51 (i.e., the total area of the end faces of the first resistance change portion 52, the second resistance change portion 53, and the resistance change portions 58 and 59) is equal to or more than 50% and equal to or less than 80% of the area of the end face of the resistance change film without the insulating film 43 embedded therein.

As shown in fig. 2, the selector film 61 is disposed between the word line WL and the bit line BL in the Z direction, and is interposed between the word line WL and the resistance change film 51 in the Z direction. That is, an end face 61a of one side of the selector film 61 in the Z direction is in contact with the word line WL. A prescribed end face 61p on a first side of the end face 61b on the other side of the selector film 61 in the Z direction is in contact with the resistance change film 51. A prescribed end face 61q on the second side of the end face 61b of the selector film 61 is in contact with the insulating film 43. The selector film 61 is adjacent to the insulating portion 71 from the first side in the Y direction, and is provided only in a region of the first side of the insulating portion 71 in the Y direction. The size of the selector film 61 in the Y direction, the length from the end portion on the first side of the first resistance change portion 52 to the end portion on the second side of the second resistance change portion 53 in the Y direction, and the size of the conductive film 81 in the Y direction are smaller than F, for example, (2F/3).

The selector film 61 is a film serving as a selection element of the memory cell MC. The selector film 61 may be, for example, a two-terminal switch element. When a voltage to be applied between the two terminals is equal to or less than a threshold value, the switching element is in a "high-resistance" state (e.g., a non-conductive state). When a voltage to be applied between the two terminals is equal to or higher than a threshold value, the switching element changes to a "low-resistance" state (e.g., a conductive state). The switching element may have a function independent of the polarity of the voltage. The switching element includes at least one chalcogen element selected from the group consisting of tellurium (Te), selenium (Se), and sulfur (S). The switching element may include a chalcogenide compound which is a compound including a chalcogen element. In addition to the above elements, the switching element may include at least one element selected from the group consisting of boron (B), aluminum (Al), gallium (Ga), indium (In), carbon (C), silicon (Si), germanium (Ge), tin (Sn), arsenic (As), phosphorus (P), and antimony (Sb).

By the above-described relative arrangement of the respective structures, the end face 35a of the column 35 is constituted by the end face 61a in the Y direction of the selector film 61. The end face 35b of the post 35 is constituted by an end face 81b of the conductive film 81 in the Y direction. The end faces 35a, 35b of the pillar 35 substantially coincide with the overlapping portion CP when viewed from the Z direction.

Fig. 4 is a sectional view showing a plurality of memory cells MC arranged in the Y direction in the semiconductor memory device 1. As shown in fig. 4, one memory cell MC is defined as a first memory cell MCA. The memory cell MC adjacent to the first memory cell MCA and the first memory cell MCA from the first side with the second insulating portion 38B interposed therebetween is the second memory cell MCB. The memory cell MC adjacent to the first memory cell MCA from a second side opposite to the first side with the first insulating portion 38A interposed therebetween is a third memory cell MCC. Hereinafter, at the end of the reference numeral of the constituent element, the constituent element of the first memory unit MCA is denoted by a. At the end of the reference numeral of the constituent element, the constituent element of the second memory cell MCB is denoted by B. At the end of the reference numeral of the component, the component of the third memory cell MCC is denoted by C.

For example, the semiconductor memory device 1 includes a bit line BL, a word line WLA, a first insulating film 43A, a first resistance change film 51A, a first conductive film 81A, and a first insulating portion 38A. As shown in fig. 4, the bit line BL is common to the first memory cell MCA, the second memory cell MCB, and the third memory cell MCC, and extends in the Y direction. The word line WLA extends in the X direction and is disposed at a position different from the bit line BL in the Z direction. The word line WLA is an example of "second wiring".

For example, the first memory cell MCA includes a first insulating film 43A, a first resistance change film 51A, a selector film 61A, a first conductive film 81A, and a first insulating portion 38A.

The first insulating film 43A is disposed between the bit line BL and the word line WLA in the Z direction. The first resistance change film 51A is disposed between the bit line BL and the word line WLA in the Z direction. When viewed from the Z direction, the first resistance change film 51A and the first insulating film 43A overlap the overlapping portion CPA. The first resistance change film 51A is adjacent to the first insulating portion 38A from the first side and the second side.

The first resistance change film 51A is provided at the center in the Y direction of the word line WLA. The center of the word line WLA in the Y direction is a center equidistant from an end of a first side and an end of a second side (which is opposite to the first side in the Y direction) of the word line WLA in the Y direction. The first resistance change films 51A are in contact with the first insulating portions 38A and 38B, respectively, in the Y direction. The first resistance change film 51A is provided between the center of the word line WLA in the Y direction and the edge of the word line WLA in the Y direction.

The first insulating film 38A is adjacent to the first insulating film 43A from the second side in the Y direction via the second variable resistance portion 53B of the first variable resistance film 51A. The second variable resistance portion 53B is an example of "a part of the first variable resistance film". The second side is an example of "the same side as a part of the first resistance change film". The second insulating portion 38B is in contact with the first resistance variable film 51A from the first side in the Y direction. The first side is an example of "the opposite side of the first insulating film".

The total maximum thickness of the first variable resistance films 51A in the Y direction is smaller than the maximum thickness of the first insulating film 41A in the Y direction. The total maximum thickness of the first variable resistance film 51A in the Y direction is the sum of the maximum thickness of the first variable resistance portion 52A in the Y direction and the maximum thickness of the second variable resistance portion 53A in the Y direction. The total maximum thickness of the first resistance change films 51A in the Y direction is equal to or less than half of the maximum width of the word line WLA in the Y direction. The total maximum thickness of the first resistance change films 51A in the Y direction is smaller than the maximum thickness of the selector film 61A in the Z direction.

The semiconductor memory device 1 further includes, for example, a word line WLB, a second insulating film 43B, a second resistance change film 51B, and a second insulating portion 38Z. The word line WLB is adjacent to the word line WLA from the first side in the Y direction through the insulating portion 72B, and extends in the X direction. The word line WLB is an example of "third wiring". The second resistance change film 51B is disposed between the bit line BL and the word line WLB in the Z direction, and is adjacent to the second insulating portion 38Z from the second side in the Y direction. The second insulating portion 38Z is adjacent to the second variable resistance film 51B from the first side and the second side in the Y direction.

The second resistance change film 51B is arranged in the center portion in the Y direction of the word line WLB. The second insulating portion 38Z is adjacent to the second insulating film 43B from the first side in the Y direction through the first resistance variable portion 52B of the second resistance variable film 51B. The first variable resistance portion 52B is an example of "a part of the first variable resistance film". The first side is an example of "the same side as a part of the first resistance change film".

The semiconductor memory device 1 further includes, for example, a word line WLC, a third insulating film 43C, and a third resistance change film 51C. The word line WLC is adjacent to the word line WLA from the second side in the Y direction through the insulating portion 72A, and extends in the X direction. Word line WLC is an example of "fourth wiring". The second side is an example of "the opposite side of the third wiring".

The third resistance change film 51C is arranged in the center portion in the Y direction of the word line WLC. The third insulating film 43C is provided between the bit line BL and the word line WLC in the Z direction. The third resistance change film 51C is disposed between the bit line BL and the word line WLC in the Z direction, and is adjacent to the third insulating film 43C from the first side and the second side in the Y direction.

The first insulating portion 38A includes an insulating portion 72A disposed between the word line WLA and the word line WLC in the Y direction. The insulating portion 72A is adjacent to the selector films 61A and 61C in the Y direction. The insulating portion 72A is an example of "a part of the first insulating portion". The second insulating portion 38B includes an insulating portion 72B disposed between the word line WLA and the word line WLB in the Y direction. The insulating portion 72B is adjacent to the selector films 61A and 61B in the Y direction. The insulating portion 72B is an example of "a part of the second insulating portion".

Next, a method for manufacturing the memory cell MC of the semiconductor memory device 1 will be briefly described. Fig. 5 shows an example of manufacturing steps of the memory cell MC, and is a cross-sectional view of a stacked body for forming the word line WL and the pillar 35. The upper part of each of fig. 5 to 12 is a sectional view of each member in each manufacturing step as viewed in the X direction at the position of the XX line shown in the lower part of each figure. The middle portion of each of fig. 5 to 12 is a sectional view of each member in each manufacturing step as viewed in the Y direction at the position of the YY line shown in the lower portion of each figure. The lower part of each of fig. 5 to 12 is a plan view of the component in each manufacturing step when viewed in the Z direction.

Fig. 5 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a first hard mask forming step. As shown in fig. 5, the selector forming film 65, the sacrifice film 88, and the barrier film 47 are stacked on the surface 21a of the first conductor 21 extending in the X direction and the Y direction in the Z direction. The first conductor 21 and the barrier film 47 are, for example, tungsten (W). The selector formation film 65 is formed by, for example, a Physical Vapor Deposition (PVD) method. The sacrificial film 88 is formed of, for example, amorphous silicon (aSi). Subsequently, on the surface 47a of the barrier film 47, a plurality of hard masks HM1 are formed at regular intervals in the Y direction. The hard mask HM1 is formed of a known resist or the like. The size of each of the plurality of hard masks HM1 in the Y direction is set to be substantially the same as the size of the pillar 35 of the semiconductor memory apparatus 1 in the Y direction.

Fig. 6 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a first trench forming step. For example, by performing patterning, the groove G1 is formed in the stack of the first conductor 21, the selector formation film 65, the sacrificial film 88, and the barrier film 47 in which the hard mask HM1 is not formed when viewed from the Z direction. The plurality of grooves G1 extend in the X direction and are formed at intervals in the Y direction. After the plurality of grooves G1 are formed, by removing the remaining hard mask HM1, a plurality of first conductors 21, selector formation films 65, sacrificial films 88, and barrier films 47 are present separately at intervals in the Y direction, as shown in fig. 6. That is, a plurality of pillars 36 are formed in the Y direction.

FIG. 7Is an example showing a manufacturing step of the memory cell MC, and shows a sectional view and a plan view of a second hard mask forming step. The insulating film 39 is buried in the groove G1 of the constituent member shown in fig. 6. The insulating film 39 is made of, for example, silicon oxide (SiO)₂) And (4) forming. The insulating film 39 buried in the groove G1 is an interlayer insulating portion 38. As shown in fig. 7, the surface 47a of the barrier film 47 and the surface 39a of the insulating film 39 are located on the same plane.

Subsequently, as shown in fig. 7, the second conductor 22 is formed on the surface 47a of the barrier film 47 and the surface 39a of the insulating film 39. The second conductor 22 is, for example, tungsten (W). On the surface 22a of the second conductor 22, a plurality of hard masks HM2 are formed at regular intervals in the X direction. The hard mask HM2 is formed of a known resist or the like. The size in the X direction of each of the plurality of hard masks HM2 is set to be substantially the same as the size in the X direction of the pillar 35 of the semiconductor memory apparatus 1.

Fig. 8 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a second trench forming step. For example, by performing patterning, the groove G2 is formed in the stack of the selector formation film 65, the sacrificial film 88, the barrier film 47, and the second conductor 22 in which the hard mask HM2 is not formed when viewed from the Z direction. The plurality of grooves G2 extend in the Y direction and are formed at intervals in the X direction. After the plurality of grooves G2 are formed, by removing the remaining hard mask HM2, a plurality of selector forming films 65, sacrificial films 88, barrier films 47, and second conductors 22 are present separately at intervals in the X direction, as shown in fig. 8. That is, a plurality of columns 136 are formed in the X direction and the Y direction.

By performing the above-described steps, the first conductor 21 is divided in the Y direction, and a plurality of word lines WL are formed in the Y direction. The second conductor 22 is divided in the X direction, and a plurality of bit lines BL are formed in the X direction.

Fig. 9 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a sacrificial film peeling step. For example, only the sacrificial film 88 is removed using a chemical solution. For example, a chemical solution that reacts only with the sacrificial film 88 may be injected into the groove G2, the sacrificial film 88 may be dissolved by the chemical solution, and then the chemical solution may be discharged. As shown in fig. 9, a space S is formed at a portion where the sacrificial film 88 is provided.

Fig. 10 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a resistance-change-film forming step. For example, as shown in fig. 10, the resistance change film forming film 55 is formed at a prescribed film thickness on the wall surface communicating with the groove G2 and exposed to the space S using an Atomic Layer Deposition (ALD) method or a Chemical Vapor Deposition (CVD) method. Specifically, the wall surfaces are the surface of the selector formation film 65 facing the space S, the surface of the barrier film 47, the side surface of the selector formation film 65 constituting the side surface of the groove G2, the side surface of the barrier film 47, and the side surface of the second conductor 22. The maximum film thickness of the resistance-change film forming film 55 is, for example, at least equal to or less than 50% (preferably equal to or less than 25%) of the size of the selector forming film 65 in the Y direction.

Subsequently, the insulating film 45 is formed to fill the gap of the selector formation film 65. As shown in fig. 10, the insulating film 45 is surrounded by the selector forming film 65 in the Y direction and the Z direction when viewed in the X direction.

Fig. 11 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a partial removal step of the resistance change film. For example, as shown in fig. 11, using a chemical solution or patterning, only the selector forming film 65 and the insulating film 45 of the groove G2 are removed, and only the selector forming film 65 and the insulating film 45 set in the space S are left. At this time, the groove G2 is exposed again. Each of the plurality of insulating films 45 is sandwiched between two resistance change film forming films 55 in the Z direction when viewed in the Y direction. The pillars 35 of the semiconductor memory device 1 are formed by removing only the selector formation film 65 and the insulating film 45 of the groove G2.

Fig. 12 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing an interlayer insulating film forming step. As shown in fig. 12, an insulating film is buried in the groove G2. The insulating film is formed of the same material as the insulating film 39, and is made of, for example, silicon oxide (SiO)₂) And (4) forming. Therefore, the insulating film 39 and the above-described insulating film buried in the groove G2 are integrated, and the interlayer insulating portion 38 is formed.

By performing the above steps, the memory cell MC shown in fig. 1 to 3 can be manufactured. The semiconductor memory apparatus 1 is formed by performing known preprocessing before the above-described steps and performing known post-processing after the above-described steps. However, the method for manufacturing the semiconductor memory apparatus 1 is not limited to the above method.

Next, the operational effects of the semiconductor storage device 1 according to the first embodiment described above will be described. According to the semiconductor memory device 1, the thickness of the resistance change film 51 in contact with the insulating film 43 in the Y direction and the Z direction, respectively, is smaller than the width of the word line WL in the Y direction and the Z direction, respectively, when viewed in the X direction. Therefore, the sectional area of the resistance change film 51 can be reduced, and the reset current for changing the resistance change film 51 from the low resistance state to the high resistance state in the semiconductor memory device 1 can be reduced.

According to the semiconductor memory device 1, the resistance change film 51 is formed to have the same size as the overlapping portion CP when viewed in the X direction. The insulating film 43 is disposed in the center portion of the resistance change film 51 in the Y direction and the Z direction when viewed in the X direction. That is, according to the semiconductor memory device 1, since the resistance change film 51 is arranged only on a part of the overlapping portion CP when viewed from the X direction, the sectional area of the resistance change film 51 can be reduced as compared with a case where the resistance change film is formed in the Y direction and the Z direction as a rectangular parallelepiped of the entire overlapping portion CP as in the semiconductor memory device of the related art. By reducing the sectional area of the resistance change film 51 when viewed from the Z direction, the current density per unit area flowing through the resistance change film 51 can be increased, that is, the PCM can be increased, so that the reset current of the semiconductor memory device 1 can be reduced.

According to the semiconductor memory device 1, by forming the PCM approximately equal to the film thickness at the time of film formation, the sectional area of the resistance variable film 51 in the X direction can be reduced to equal to or less than HP × HP, and the reset current can be reduced.

(second embodiment)

Next, the configuration of the semiconductor memory device according to the second embodiment will be described. Although not shown, the semiconductor memory device according to the second embodiment is a so-called cross-point type semiconductor memory device using a PCM similar to the semiconductor memory device 1 according to the first embodiment. The semiconductor memory device according to the second embodiment includes, for example, a silicon substrate 11, an interlayer insulating layer 12, a plurality of word lines WL, a plurality of bit lines BL, and a plurality of memory cells MC. Hereinafter, regarding the constituent elements of the semiconductor memory device of the second embodiment, only the differences from the constituent elements of the semiconductor memory device 1 will be described, and detailed description of the common elements with the constituent elements of the semiconductor memory device 1 will be omitted.

Fig. 13 is a perspective view showing one memory cell MC of the semiconductor memory device according to the second embodiment. Fig. 14 is a cross-sectional view of the resistance change film 51 and the insulating film 43 of the memory cell MC shown in fig. 13, perpendicular to the Z direction. As shown in fig. 13 and 14, the resistance change film 51 includes a fifth resistance change portion 60 in addition to the first resistance change portion 52, the second resistance change portion 53, the third resistance change portion 58, and the fourth resistance change portion 59.

The fifth variable resistance portion 60 is adjacent to the insulating film 43 from the fifth side of the first region R in the X direction. The resistance variable film 51 includes a first resistance variable portion 52, a second resistance variable portion 53, a third resistance variable portion 58, a fourth resistance variable portion 59, and a fifth resistance variable portion 60, and these resistance variable portions are integrally formed.

In one memory cell MC of the semiconductor memory apparatus according to the second embodiment, although the insulating film 43 is in contact with the interlayer insulating portion 38 from the fifth side in the X direction, the insulating film 43 is not in contact with the interlayer insulating portion 38 from the sixth side, which is opposite to the fifth side in the X direction. The insulating film 43 is in contact with the fifth resistance change portion 60 from the sixth side in the X direction, and is connected to the interlayer insulating portion 38 through the fifth resistance change portion 60.

The X-direction minimum width of the end faces 60e and 60f of the fifth resistance variable portion 60 in the Y direction is smaller than the X-direction minimum length of the overlapping portion CP and smaller than the Y-direction minimum width of the word line WL. When the resistance change film 51 is formed as described below, the minimum width of the end faces 60e and 60f of the fifth resistance change portion 60 in the X direction is, for example, equal to or greater than 5 μm.

Next, a method for manufacturing the memory cell MC of the semiconductor memory device according to the second embodiment will be briefly described. The memory cell MC of the semiconductor memory device according to the second embodiment may be manufactured by performing steps similar to the method for manufacturing the semiconductor memory device 1 from the first hard mask forming step shown in fig. 5 to the second trench forming step shown in fig. 8.

The upper part of each of fig. 15 to 21 is a sectional view of the constituent elements in each manufacturing step when viewed in the X direction at the position of the XX line shown in the lower part of each drawing. The middle portion of each of fig. 15 to 21 is a sectional view of the constituent elements in each manufacturing step when viewed in the Y direction at the YY line shown in the lower portion of each figure. The lower part of each of fig. 15 to 21 is a plan view of the constituent elements in each manufacturing step when viewed in the Z direction.

Fig. 15 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing an insulating film forming step. After the second trench forming step shown in fig. 8, as shown in fig. 15, the insulating film 140 is buried in the trench G2 using, for example, an ALD method or a CVD method. The insulating film 140 is formed of, for example, silicon nitride (SiN).

Fig. 16 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a resist film forming step. As shown in fig. 16, a resist film 150 is formed on the surface 140a of every other insulating film 140 among the plurality of insulating films 140 formed in the X direction and on only a part of the surface 22a of the second conductor 22 adjacent to the surface 140a in the X direction. The resist film 150 extends in the Y direction.

Fig. 17 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a patterning step. As shown in fig. 17, the insulating film 140 which is not covered with the resist film 150 when viewed from the Z direction is removed using the resist film 150 as a mask. Since the insulating film 140 is removed, the groove G3 is formed.

Fig. 18 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a sacrificial film removing step. For example, only the sacrificial film 88 is removed using a chemical solution. For example, a chemical solution that reacts only with the sacrificial film 88 may be injected into the groove G3, the sacrificial film 88 may be dissolved by the chemical solution, and then the chemical solution may be discharged. As shown in fig. 18, a space S is formed in a portion where the sacrificial film 88 is provided.

Fig. 19 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a resistance-change-film forming step. For example, as shown in fig. 19, the variable resistance film forming film 55 is formed on the wall surface communicating with the groove G3 and exposed to the space S by the ALD method or the CVD method at a predetermined film thickness. Specifically, the wall surfaces are the surface of the selector formation film 65 facing the space S, the surface of the barrier film 47, the side surface of the insulating film 140, the side surface of the selector formation film 65 constituting the side surface of the groove G2, the surface of the barrier film 47, and the side surface of the second conductor 22. The maximum film thickness of the resistance-change film forming film 55 is, for example, at least equal to or less than 50% (preferably equal to or less than 25%) of the size of the selector forming film 65 in the Y direction.

Fig. 20 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a partial removal step of the resistance change film. For example, as shown in fig. 20, using a Chemical Mechanical Polishing (CMP) method, the insulating film 140 is removed, and the insulating film 45, the resistance-change film forming film 55, and the resist film 150 are removed up to a position where the second conductor 22 starts to be exposed in the Z direction. Thereafter, the insulating film 45 and the resistance change film forming film 55 exposed and formed on the side surfaces of the grooves G4 between the insulating films 140 in the X direction are removed using, for example, a chemical solution or patterning. At this time, the insulating film 45 and the resistance change film forming film 55 formed in the space S remain.

Fig. 21 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing an interlayer insulating film adding step. The insulating film 142 is buried in the groove G5 by, for example, an ALD method or a CVD method. The insulating film 142 is made of, for example, silicon oxide (SiO)₂) And (4) forming. By performingThe steps described above, as shown in fig. 21, form the pillars 35 of the semiconductor memory device according to the second embodiment. In the method for manufacturing the semiconductor memory device according to the second embodiment, the resistance change film forming film 55 serving as the fifth resistance change portion 60 is in contact with the insulating film 140 in the X direction. The interlayer insulating portion 38 includes an insulating film 140 formed of silicon nitride or the like, and insulating films 39 and 142 formed of silicon oxide or the like.

By performing the above steps, the memory cell MC shown in fig. 13 and 14 can be manufactured. The semiconductor memory device according to the second embodiment is formed by performing known preprocessing before the above-described steps and performing known post-processing after the above-described steps. However, the method for manufacturing the semiconductor memory device according to the second embodiment is not limited to the above-described method.

Next, the operational effects of the semiconductor memory device according to the second embodiment described above will be described. According to the semiconductor memory device of the second embodiment, the thickness of the resistance change film 51 in contact with the insulating film 43 in the Y direction and the Z direction, respectively, is smaller than the width of the word line WL in the Y direction and the Z direction, respectively, when viewed in the X direction. Therefore, similarly to the semiconductor memory device 1 according to the first embodiment, the sectional area of the resistance change film 51 can be reduced, and the reset current for changing the resistance change film 51 from the low resistance state to the high resistance state in the semiconductor memory device 1 can be reduced.

Since the semiconductor memory device according to the second embodiment has a configuration similar to that of the semiconductor memory device 1, an action and effect similar to those of the semiconductor memory device 1 can be obtained.

According to the semiconductor memory device of the second embodiment, since the resistance variable film 51 further includes the fifth resistance variable portion 60, the speed and condition of removing the resistance variable film forming film 55 can be kept constant in the resistance variable film portion removing step at the time of manufacturing, and variation in the amount of removing the resistance variable film forming film 55 can be prevented. Therefore, the electrical characteristics of the semiconductor memory apparatus according to the second embodiment can be improved, and the variation in the performance of each device can be prevented.

(third embodiment)

Next, the configuration of the semiconductor memory device according to the third embodiment will be described. Although not shown, the semiconductor memory device according to the third embodiment is a so-called cross-point type semiconductor memory device using a PCM similar to the semiconductor memory device 1 according to the first embodiment. The semiconductor memory device according to the third embodiment includes, for example, a silicon substrate 11, an interlayer insulating layer 12, a plurality of word lines WL, a plurality of bit lines BL, and a plurality of memory cells MC. Hereinafter, regarding the components of the semiconductor memory device of the third embodiment, only the differences from the components of the semiconductor memory device 1 will be described, and detailed description of the components common to the components of the semiconductor memory device 1 will be omitted.

Fig. 22 is a perspective view showing one memory cell MC of the semiconductor memory device according to the third embodiment. Fig. 23 is an enlarged side view showing the relative arrangement of the resistance change film 51 and the insulating film 43 of the memory cell MC. As shown in fig. 22 and 23, each memory cell MC of the semiconductor memory device according to the third embodiment includes, for example, a conductive film 81, a resistance change film 51, an insulating film 43, and a selector film 61, similarly to each memory cell MC of the semiconductor memory device 1 according to the first embodiment. However, the relative positions of the variable resistance film 51 and the insulating film 43 of each memory cell MC of the semiconductor memory device according to the third embodiment are opposite to the relative positions of the variable resistance film 51 and the insulating film 43 of each memory cell MC of the semiconductor memory device 1. That is, basically, in the description of the semiconductor memory device 1 according to the first embodiment, the resistance change film 51 in the memory cell MC may be replaced with and read as the insulating film 43, and the insulating film 43 in the memory cell MC may be replaced with and read as the resistance change film 51.

The resistance change film 51 is disposed in the first region R in the Y direction of the overlap region CP when viewed from the Z direction. The insulating film 43 includes at least a first adjacent insulating portion 46 and a second adjacent insulating portion 49. The resistance change film 51 is adjacent to the first adjacent insulating portion 46 and the second adjacent insulating portion 49 in the Y direction, and is interposed between the first adjacent insulating portion 46 and the second adjacent insulating portion 49. The variable resistance film 51 is surrounded by the insulating film 43 and buried in the center of the first region R when viewed from the X direction.

However, in the third embodiment, the insulation between the selector film 61 and the variable resistance film 51 is broken. That is, the dielectric breakdown part 241 is provided between the selector film 61 and the resistance change film 51 in the Z direction. The insulation between the conductive film 81 and the variable resistance film 51 is broken. That is, in the Z direction, the dielectric breakdown part 242 is provided between the conductive film 81 and the variable resistance film 51.

Next, a method for manufacturing the memory cell MC of the semiconductor memory device according to the third embodiment will be briefly described. However, in the following description, a method for manufacturing the memory cells MC stacked in the Z direction will be described. The memory cell MC of the semiconductor memory apparatus according to the third embodiment can be manufactured by performing steps similar to the method for manufacturing the semiconductor memory apparatus 1 from the first hard mask forming step shown in fig. 5 to the first trench forming step shown in fig. 6.

The upper part of each of fig. 24 to 35 is a sectional view of the constituent elements in each manufacturing step when viewed in the X direction at the position of the XX line shown in the lower part of each drawing. The middle portion of each of fig. 24 to 35 is a sectional view of the constituent elements in each manufacturing step when viewed in the Y direction at the YY line shown in the lower portion of each figure. The lower part of each of fig. 24 to 35 is a plan view of the constituent elements in each manufacturing step when viewed in the Z direction.

Fig. 24 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a second hard mask forming step. As shown in fig. 24, after the insulating film 39 is buried in the groove G1, the second conductor 22, the selector forming film 65-2, the sacrificial film 88-2, and the barrier film 47-2 are stacked in this order on the surface 47a of the barrier film 47 and the surface 39a of the insulating film 39. On the surface 47a of the barrier film 47-2, a plurality of hard masks HM2 are formed at regular intervals in the X direction. The size in the X direction of each of the plurality of hard masks HM2 is set to be substantially the same as the size in the X direction of the pillar 35 of the semiconductor memory apparatus 1.

Fig. 25 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a second trench forming step. By performing the patterning, the groove G2 is formed in the stack formed of the selector forming film 65, the sacrificial film 88, the barrier film 47, the second conductor 22, the selector forming film 65-2, the sacrificial film 88-2, and the barrier film 47-2 in which the hard mask HM2 is not formed when viewed from the Z direction. The plurality of grooves G2 extend in the Y direction and are formed at intervals in the X direction.

Fig. 26 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a sacrificial film addition forming step. For example, as shown in fig. 26, a sacrificial film 88-3 is formed in the trench G2 using the same method as the method of forming the sacrificial film 88. Next, a plurality of hard masks HM3 are formed on the surface 47a of the barrier film 47-2 and the surface 88a of the sacrificial film 88-3. In the Y direction, hard masks HM3 are formed at prescribed intervals. The size in the Y direction of each of the plurality of hard masks HM3 is set to be substantially the same as the size in the Y direction of the pillar 35 of the semiconductor memory apparatus 1.

Fig. 27 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a partial removal step of the stacked body. For example, by performing patterning, the groove G6 is formed in the stack including the selector formation film 65-2, the sacrificial film 88-2, and the barrier film 47-2 in which the hard mask HM3 is not formed when viewed from the Z direction. The plurality of grooves G6 extend in the X direction and are formed at intervals in the Y direction.

Fig. 28 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing an insulating film forming step. The insulating film 160 is buried in the groove G6 using, for example, an ALD method or a CVD method. The insulating film 160 is made of, for example, silicon oxide (SiO)₂) And (4) forming. The surface 160a of the insulating film 160 and the surface 47a of the barrier film 47-2 are located on the same line.

Fig. 29 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a sacrificial film removing step. For example, when the sacrificial films 88, 88-2 and 88-3 are removed using a chemical solution, the groove G7 and the space S are formed.

Fig. 30 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing an insulating film and resistance change film forming step. For example, as shown in fig. 30, an insulating film 45 is formed on the surface exposed in the space S using an ALD method or a CVD method. Subsequently, in a portion where the insulating film 45 is not formed in the space S, a resistance change film forming film 55 is formed.

Fig. 31 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a partial removal step of the resistance change film. For example, the resistance change film formation film 55 formed at a position corresponding to the groove G7 shown in fig. 29 is processed and removed from the groove G7 using a chemical solution or Reactive Ion Etching (RIE).

Fig. 32 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a partial removal step of the insulating film. The insulating film 45 remaining on the side and bottom surfaces of the groove G8 is removed by performing wet etching, for example.

Fig. 33 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing an insulating film forming step. The insulating film 162 is buried in the groove G10 by, for example, an ALD method or a CVD method. The insulating film 162 is made of, for example, silicon oxide (SiO)₂) And (4) forming.

Fig. 34 is a sectional view and a plan view showing an example of a manufacturing step of the memory cell MC, and showing a second word line forming step. The first conductor 21-2 is formed on the surface 162a of the insulating film 162 and the surface 47a of the barrier film 47-2 using, for example, an ALD method or a CVD method.

Fig. 35 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing an insulation breakdown step. For example, the voltage V [ V ] output to the first conductor 21-2 through the selector formation film 65-2, the dielectric breakdown portion 244, the resistance change film formation film 55, the dielectric breakdown portion 245, and the barrier film 47-2, in which the second conductor 22 is set to the base potential of 0[ V ], may be detected. When the insulation of the insulating film 45 adjacent to the resistance change film forming film 55 in the Z direction is broken and the voltage V output to the first conductor 21-2 sharply increases, it is considered that the insulation breakdown has been completed. The insulation-destroyed portions 244 and 245 are completed by destroying the insulation of the insulating film 45 adjacent to the resistance change film forming film 55 in the Z direction. The insulation-breaking portions 244 and 245 may be formed in the insulating film 45 between the barrier film 47 and the resistance change film forming film 55 in the Z direction and in the insulating film 45 between the resistance change film forming film 55 and the selector forming film 65 in the Z direction by causing the voltage V [ V ] to be output to the first conductor 21 through the barrier film 47, the resistance change film forming film 55, the selector forming film 65, the insulation-breaking portion 244, and the insulation-breaking portion 245 with the second conductor 22 set to the basic potential 0[ V ] to be detected.

By performing the above steps, each of the first conductors 21 and 21-2 serves as the word line WL shown in fig. 22. Each of the selector forming films 65 and 65-2 is the selector film 61 shown in fig. 22. The resistance-change film forming film 55 is the resistance-change film 51 shown in fig. 22 and 23, and the insulating film 45 is the insulating film 43 shown in fig. 22 and 23. Each of insulation-breaking portions 244 and 245 is any one of insulation-breaking portions 241 and 242 shown in fig. 22 and 23. Each of the barrier films 47 and 47-2 is a conductive film 81 shown in fig. 22. The second conductor 22 serves as a bit line BL common to the stacks stacked on both sides in the Z direction.

By performing the above steps, the memory cell MC shown in fig. 22 and 23 can be manufactured. The semiconductor memory device according to the third embodiment is formed by performing known preprocessing before the above-described steps and performing known post-processing after the above-described steps. However, the method for manufacturing the semiconductor memory device according to the third embodiment is not limited to the above-described method.

Next, the operational effects of the semiconductor memory device according to the third embodiment described above will be described. According to the semiconductor memory device of the third embodiment, the thickness of the resistance change films 51 which are in contact with the insulating films 43 in the Y direction, respectively, is smaller than the width of the word line WL in the Y direction, respectively, when viewed in the X direction. Therefore, similarly to the semiconductor memory device 1 according to the first embodiment, the sectional area of the resistance change film 51 can be reduced, and the reset current for changing the resistance change film 51 from the low resistance state to the high resistance state in the semiconductor memory device 1 can be reduced.

In the semiconductor storage device according to the third embodiment, the insulating film 43 is in contact with the resistance change film 51 from the first side and the second side in the Y direction. Therefore, for example, in manufacturing the semiconductor memory device according to the third embodiment, when RIE is performed on the end face of the resistance change film forming film 55, a processing residual is less likely to occur in each film or configuration (for example, the selector forming films 65 and 65-2 that are in contact with the resistance change film forming film 55). Therefore, according to the semiconductor memory device of the third embodiment, the thickness of the variable resistance film 51 can be easily designed, and damage to each component element in contact with the variable resistance film 51 can be reduced.

In the semiconductor memory device according to the third embodiment, since the insulating film 43 is in contact with the resistance change film 51 from the first side and the second side in the Y direction, one memory cell MC is less susceptible to the influence of the adjacent memory cell MC in the Y direction than in the semiconductor memory device in the related art. According to the semiconductor memory device of the third embodiment, the influence of the memory cells MC adjacent in the Y direction can be reduced.

(fourth embodiment)

Next, the configuration of the semiconductor memory device according to the fourth embodiment will be described. Although not shown, the semiconductor memory device according to the fourth embodiment is a so-called cross-point type semiconductor memory device using a PCM similar to the semiconductor memory device 1 according to the first embodiment. The semiconductor memory device according to the fourth embodiment includes, for example, a silicon substrate 11, an interlayer insulating layer 12, a plurality of word lines WL, a plurality of bit lines BL, and a plurality of memory cells MC. Hereinafter, regarding the constituent elements of the semiconductor memory device of the fourth embodiment, only the differences from the constituent elements of the semiconductor memory device 1 will be described, and detailed description of the common elements with the constituent elements of the semiconductor memory device 1 will be omitted.

The memory cell MC includes, for example, a conductive film 81, a resistance change film 51, a selector film 61, and an insulating film 343. Fig. 37 is a perspective view showing one memory cell MC of the semiconductor memory device according to the fourth embodiment. Fig. 38 is an enlarged side view showing the relative arrangement of the selector film 61 and the insulating film 343 of the memory cell MC.

The size of the resistance change film 51 as viewed from the Z direction is the same as the size of the overlapping portion CP. That is, the sizes of the resistance change film 51 in the Y direction and the X direction are the same as the size of the overlapping portion CP.

The selector film 61 is adjacent to the insulating film 343 from the first side and the second side in the Y direction. Specifically, the insulating film 343 includes a first adjacent insulating section 352, a second adjacent insulating section 353, and insulation-destruction sections 358 and 359. The resistance variable film 51 includes these resistance variable portions, and is integrally formed. The first adjacent insulating portion 352 is adjacent to the selector film 61 from the first side in the Y direction. The second adjacent insulating portion 353 is adjacent to the selector film 61 from the second side in the Y direction. The insulation breakdown parts 358 and 359 are adjacent to the selector film 61 from opposite sides in the Z direction, respectively. The insulating film 343 is formed of, for example, silicon oxide or silicon nitride.

Since the insulation breakdown portions 358 and 359 are formed, the selector film 61 is electrically connected to the word line WL and the resistance change film 51 in the Z direction, respectively, similarly to the semiconductor memory device 1 according to the first embodiment and the semiconductor memory devices according to the second and third embodiments.

Next, a method for manufacturing the memory cell MC of the semiconductor memory device according to the fourth embodiment will be briefly described. However, similarly to the third embodiment, a method for manufacturing the memory cells MC stacked in the Z direction will be described in the following description. The memory cell MC of the semiconductor memory device according to the fourth embodiment can be manufactured by performing steps similar to the method for manufacturing the semiconductor memory device 1 from the first hard mask forming step shown in fig. 5 to the first trench forming step shown in fig. 6. However, in the first hard mask forming step shown in fig. 5, the selector forming film 65 is not formed, and the resistance change film forming film 55 is formed between the sacrifice film 88 and the barrier film 47 in the Z direction.

The upper part of each of fig. 39 to 45 is a sectional view of the constituent elements in each manufacturing step when viewed in the X direction. The lower part of each of fig. 39 to 45 is a sectional view of the constituent elements in each manufacturing step when viewed in the Y direction.

Fig. 39 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing a second hard mask forming step. As shown in fig. 39, after the insulating film 39 is buried in the groove G1 as shown in fig. 6, the second conductor 22, the sacrificial film 88-2, the resistance-change film forming film 55-2, and the barrier film 47-2 are stacked in this order on the surface 47a of the barrier film 47 and the surface 39a of the insulating film 39. A plurality of hard masks HM2 extending in the Y direction on the surface 47f of the barrier film 47-2 are formed at regular intervals in the X direction. The size in the X direction of each of the plurality of hard masks HM2 is set to be substantially the same as the size in the X direction of the pillar 35 of the semiconductor memory apparatus 1.

Fig. 40 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing a second trench forming step. For example, by performing patterning, the groove G2 is formed in the stack including the sacrificial film 88, the resistance change film forming film 55, the barrier film 47, the second conductor 22, the sacrificial film 88-2, the stack of the resistance change film forming film 55-2, and the barrier film 47-2, in which the hard mask HM2 is not formed when viewed from the Z direction. The plurality of grooves G6 extend in the Y direction and are formed at intervals in the X direction.

For example, by performing patterning or CMP, the hard mask HM2 and the barrier film 47-2 are removed at a time, and the first conductor 21-2 is formed on the surface 55f of the resistance change film formation film 55-2. Fig. 41 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing a sacrificial film addition forming step. In the groove G2 shown in fig. 40, the sacrificial film 88-3 is formed to the same height as the first conductor 21-2. As shown in fig. 41, a plurality of hard masks HM3 are formed on the surface 21f of the first conductor 21-2 and the surface 83f of the sacrificial film 83-3. The hard masks HM3 extend in the X direction and are formed at intervals in the Y direction. When viewed from the Z direction, the first conductor 21-2, the resistance change film forming film 55-2, and the sacrificial film 88-2 at the position where the hard mask HM3 is not formed are removed, and a groove G20 is formed. .

Fig. 42 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing an insulating film forming step. As shown in fig. 42, the hard mask HM3 is removed, and the insulating film 180 is buried in the trench G20. The barrier film 47-2 is formed at a position overlapping with the first conductor 21-2 in the X direction.

Fig. 43 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing a sacrificial film removing step. For example, as shown in fig. 43, the sacrificial films 88, 88-2, and 88-3 are removed using a chemical solution, and a space Q is formed.

Fig. 44 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing a selector film forming step. For example, the insulating film 300 is formed on the wall surface exposed to the space Q by an ALD method or a CVD method. Subsequently, as shown in fig. 44, in the space Q inside the insulating film 300, a selector forming film 65 is formed. The insulating film 300 is formed of, for example, silicon nitride.

Fig. 45 is a sectional view showing an example of a manufacturing step of the memory cell MC, and showing an insulation-breakdown-portion forming step. For example, as shown in fig. 45, when viewed in the Y direction, only the selector formation film 65 extending in the Z direction is removed by performing patterning or the like, and the insulating film 182 is formed in a space formed by partial removal of the selector formation film 65. Subsequently, in a similar manner to the third embodiment, the insulating property of the insulating film 300 adjacent to the selector forming film 65 in the Z direction is destroyed, and the insulation destruction portions 344 and 345 are formed.

By performing the steps described above, each of the first conductors 21 and 21-2 serves as the word line WL shown in fig. 37. The selector forming film 65 becomes the selector film 61 shown in fig. 37. The resistance-change film forming film 55 becomes the resistance-change film 51 shown in fig. 37, and the insulating film 300 becomes the insulating film 343 shown in fig. 37. Each of the dielectric breakdown parts 344 and 345 becomes any one of the dielectric breakdown parts 358 and 359 shown in fig. 22 and 23. Each of the barrier films 47 and 47-2 becomes a conductive film 81 shown in fig. 22. The second conductor 22 serves as a bit line BL common to the stacks stacked on both sides in the Z direction.

By performing the above steps, the memory cell MC shown in fig. 37 and 38 can be manufactured. The semiconductor memory device according to the fourth embodiment is formed by performing known preprocessing before the above-described steps and performing known post-processing after the above-described steps. However, the method for manufacturing the semiconductor memory device according to the fourth embodiment is not limited to the above-described method.

Next, the operational effects of the semiconductor memory device according to the above-described fourth embodiment will be described. According to the semiconductor memory device of the fourth embodiment, since the configuration is provided in which the selector film 61 can be formed at least after the formation of the hard mask or the like, the selector film 61 is protected from heat at the time of forming the resistance change film 51, and the electric characteristics of the selector film 61 can be prevented from being lowered.

For example, in the manufacture of the semiconductor memory device according to the above-described third embodiment, the insulating film 45 on the side and bottom surfaces of the groove G8 is removed by performing the insulating film portion removing step as shown in fig. 32. However, the steps subsequent to fig. 33 may be performed while the insulating film 45 on the side and bottom surfaces of the groove G8 remains. In this case, as shown in the middle part of fig. 36, in addition to the insulating films 32, 160, and 162, among the insulating films as the interlayer insulating portions 38 of the memory cells MC in the X direction, the insulating films 45 remaining on the side surfaces and the bottom surface of the groove G8 are provided.

Hereinafter, several semiconductor memory devices will be additionally described.

[1] A semiconductor memory device, comprising:

a first wiring extending in a first direction;

a second wiring which extends in a second direction intersecting the first direction and is provided at a position different from the first wiring in a third direction intersecting the first direction and the second direction;

a first insulating film provided between the first wiring and the second wiring in the third direction;

a first resistance change film provided between the first wiring and the second wiring in the third direction and adjacent to the first insulating film in the first direction; and

a first insulating portion adjacent to the first insulating film from the same side as a part of the first resistance change film in the first direction.

[2] The semiconductor memory device according to [1], wherein,

the first resistance change film is arranged in the center of the second wiring in the first direction.

[3] The semiconductor memory device according to [2], wherein,

the first resistance change film is arranged between a center of the second wiring in the first direction and an edge of the second wiring in the first direction.

[4] The semiconductor memory device according to [1], wherein,

the first resistance change film is in contact with the first insulating film in the first direction.

[6] The semiconductor memory device according to [1], wherein,

a maximum thickness of the first resistance change film in the first direction is smaller than a maximum thickness of the first insulating film in the first direction.

[7] The semiconductor memory device according to [1], wherein,

the maximum thickness of the first resistance change film in the first direction is equal to or less than half of the maximum width of the second wiring in the first direction.

[8] The semiconductor memory device according to [1], wherein,

a portion of the first insulating portion is adjacent to the selector film in the first direction.

[9] The semiconductor memory device according to [1], wherein,

a maximum thickness of the first resistance change film in the first direction is smaller than a maximum thickness of the selector film in the third direction.

[10] The semiconductor memory device according to [1], further comprising:

a third wiring adjacent to the second wiring in the first direction and extending in the second direction;

a second insulating film provided between the first wiring and the third wiring in the third direction;

a second resistance change film provided between the first wiring and the third wiring in the third direction and adjacent to the second insulating film in the first direction; and

a second insulating portion adjacent to the second insulating film from the same side as a part of the second resistance change film in the first direction.

[11] The semiconductor memory device according to [10], wherein,

the first resistance change film is arranged at a central portion of the second wiring in the first direction, an

The second resistance change film is arranged in a central portion of the third wiring in the first direction.

[12] The semiconductor memory device according to [11], further comprising:

a fourth wiring adjacent to the second wiring from a side opposite to the third wiring in the first direction and extending in the second direction;

a third insulating film provided between the first wiring and the fourth wiring in the third direction; and

a third resistance change film provided between the first wiring and the fourth wiring in the third direction and adjacent to the third insulating film in the first direction, wherein

The second insulating portion includes: a portion provided between the first wiring and the fourth wiring in the third direction.

[13] The semiconductor memory device according to [10], wherein,

the first resistance change film is arranged at a central portion of the second wiring in the first direction, an

The third resistance change film is arranged in a central portion of the fourth wiring in the first direction.

[14] The semiconductor memory device according to [12], wherein,

the second insulating portion is in contact with the first variable resistance film from a side opposite to the first insulating film.

[15] The semiconductor memory device according to [12], wherein,

a part of the second insulating portion is disposed between the second wiring and the third wiring in the first direction.

While certain embodiments have been described, these embodiments have been presented by way of example only, and are not intended to limit the scope of the claimed invention. Indeed, the novel embodiments described herein may be embodied in various other forms; furthermore, various omissions, substitutions and changes in the form of the embodiments described herein may be made without departing from the spirit of the inventions as claimed. The accompanying claims and their equivalents are intended to cover such forms or modifications as would fall within the scope and spirit of the claimed invention.

Description of the reference symbols

1: semiconductor memory device with a plurality of memory cells

43, 343: insulating film

43A: a first insulating film

43B: second insulating film

51: resistance change film

51A: first resistance change film

51B: second resistance change film

BL: bit line (first wiring)

WL, WLA: word line (second wiring)

WLB: word line (third wiring)

X: direction (second direction)

Y: direction (first direction)

Z: direction (third direction)