阅读说明：本技术 二氧化硅（SiO2）化学镀膜后处理的工艺技术方法 (Silicon dioxide (SiO)2) Process technology method for chemical coating post-treatment ) 是由 王东明 于 2020-03-31 设计创作，主要内容包括：本发明公开一种二氧化硅化学镀膜后处理工艺技术方法,专用于化学镀膜后处理工序(采用专利申请号201910902177.3配方制备的浆液),对镀完SiO2膜的工件按本发明工艺技术方法进行处理,可得到硬度高、耐磨性好、绝缘性好、致密度高、光透过率高、附着力强、形状任意的二氧化硅覆膜产品；处理后的SiO2膜获得的优异理化特性,在新型半导体器件、量子器件研发、超导薄膜应用、燃料电池堆体制造、生物工程、等高新技术领域有广泛用途。(The invention discloses a technical method for post-treatment of silicon dioxide chemical coating, which is specially used for the post-treatment process of chemical coating (slurry prepared by adopting the formula of patent application No. 201910902177.3), and a silicon dioxide coated product with high hardness, good wear resistance, good insulativity, high density, high light transmittance, strong adhesive force and any shape can be obtained by treating a workpiece coated with a SiO2 film according to the technical method; the excellent physical and chemical properties of the treated SiO2 film can be widely applied to the high and new technical fields of novel semiconductor devices, quantum device research and development, superconducting thin film application, fuel cell stack body manufacturing, bioengineering, and the like.)