阅读说明：本技术 反应腔室 (Reaction chamber ) 是由 王晓飞 袁正 于 2018-11-19 设计创作，主要内容包括：一种反应腔室,包括反应石英管(22)、衬管(25)和进气弥散管(28)；其中,衬管(25)设于反应石英管(22)内,用于容纳硅片(27),进气弥散管(28)通过设于衬管(25)端部的进气孔(251)插设于衬管(25)内,进气弥散管(28)的至少一端用于连接至气源,进气弥散管(28)的管壁上设有多个出气孔(288)。该反应腔室有利于工艺气体在衬管内均匀分布,提高衬管内部的工艺均匀性。(A kind of reaction chamber, including reaction quartz ampoule (22), bushing pipe (25) and air inlet disperse pipe (28)；Wherein, bushing pipe (25) is set in reaction quartz ampoule (22), for accommodating silicon wafer (27), air inlet disperse pipe (28) is inserted in bushing pipe (25) by being set to the air inlet (251) of bushing pipe (25) end, at least one end of air inlet disperse pipe (28) is equipped with multiple ventholes (288) for being connected to gas source, the tube wall of air inlet disperse pipe (28).The reaction chamber is conducive to process gas and is uniformly distributed in bushing pipe, improves the process uniformity inside bushing pipe.)

1. a kind of reaction chamber, which is characterized in that including reaction quartz ampoule (22), bushing pipe (25) and air inlet disperse pipe (28)；Its In, the bushing pipe (25) is set in the reaction quartz ampoule (22), and for accommodating silicon wafer (27), the air inlet disperse pipe (28) is logical The air inlet (251) set on the bushing pipe (25) end is crossed to be inserted in the bushing pipe (25), the air inlet disperse pipe (28) At least one end is equipped with multiple ventholes (288) for being connected to gas source, the tube wall of the air inlet disperse pipe (28).

2. reaction chamber according to claim 1, which is characterized in that further include tail portion seal assembly (24), the tail portion Seal assembly includes tail portion sealing flange (241), tail portion mounting flange (242) and tail portion inlet flange (243)；

The tail portion sealing flange (241) is sheathed on the tail end of reaction quartz ampoule (22), the tail portion sealing flange (241) Inner wall be equipped with tail portion sealing flange seal groove, the tail portion sealing flange seal groove for accommodate tail portion sealing flange sealing Circle；

The inner wall of the tail portion mounting flange (242) is equipped with radial step surface, and the step surface is equipped with anti-collision ring (247), institute It states tail portion mounting flange (242) and is fixedly connected on the tail portion sealing flange (241), and the anti-collision ring (247) pressure is set to institute On the end face for stating the tail end of reaction quartz ampoule (22)；

The tail portion inlet flange (243) is fixedly connected on the axially external of the tail portion mounting flange (242), the tail portion into Gas flange (243) is equipped with the tail portion inlet flange stomata for allowing the air inlet disperse pipe (28) to pass through.

3. reaction chamber according to claim 2, which is characterized in that the first end face of the tail portion sealing flange (241) It is contacted with the first end face of the tail portion mounting flange (242), the second end face of the tail portion sealing flange (241) is equipped with first Cooling trough；The first end face of the tail portion mounting flange is equipped with the second cooling trough.

4. reaction chamber according to claim 1, which is characterized in that further include front sealing component (23), the front Seal assembly includes front sealing flange (231), front mounting flange (232) and front inlet flange (233)；

The front sealing flange (231) is sheathed on the front end of reaction quartz ampoule (22), the front sealing flange (231) Inner wall be equipped with front sealing flange sealing trough, the front sealing flange sealing trough is for accommodating front sealing flange seal Circle；

The inner wall of the front mounting flange (232) is equipped with radial step surface, and the step surface is equipped with anti-collision ring (237), institute It states front mounting flange (232) and is fixedly connected on the front sealing flange (231), and the anti-collision ring (237) pressure is set to institute On the end face for stating the front end of reaction quartz ampoule (22)；

The front inlet flange (233) is fixedly connected on the axially external of the front mounting flange (232), the front into Gas flange (233) is equipped with the front inlet flange stomata for allowing the air inlet disperse pipe (28) to pass through.

5. reaction chamber according to claim 1, which is characterized in that the first end face of the front sealing flange (231) It is contacted with the first end face of the front mounting flange (232), the second end face of the front sealing flange (231) is equipped with first Cooling trough；The first end face of the front mounting flange (232) is equipped with the second cooling trough.

6. reaction chamber according to claim 1, which is characterized in that at least one end of the bushing pipe (25) has arc Shape inner surface.

7. reaction chamber according to claim 1, which is characterized in that the tube wall of the bushing pipe (25) is equipped with and vacuumizes hole (253) and thermocouple hole (252).

8. reaction chamber according to claim 1, which is characterized in that further include furnace body (21), the furnace body (21) is arranged In the periphery of reaction quartz ampoule (22), the furnace body (21) includes annular sidewall and is connected to the annular sidewall two Two fire doors at end.

9. reaction chamber according to claim 8, which is characterized in that further include disperse pipe air intake assembly, the disperse pipe Air intake assembly includes inlet suction port (281), seal plug (283), furnace body connector (284), air inlet end cap (282)；

One end of the inlet suction port (281) is inserted in the air inlet disperse pipe (28) from the end of the air inlet disperse pipe (28) It is interior, other end indwelling in the air inlet disperse pipe (28) outside, for being connected to the gas source；

The furnace body connector (284) is sheathed on the end of the air inlet disperse pipe (28), and the one of the furnace body connector (284) End is fixedly connected on the fire door of the furnace body, and the inner wall of the other end is equipped with seal groove, and the seal groove is for accommodating the first sealing It encloses (287)；

The seal plug (283) is sheathed on the inlet suction port (281) outside and is located at the axial direction of the furnace body connector (284) The first end face in outside, the seal plug (283) is equipped with seal convexity, and the seal convexity is inserted into the seal groove To compress first sealing ring (287)；

The air inlet end cap set (282) be set to the seal plug (283) and the furnace body connector (284) outside, and with institute Furnace body connector (284) threaded connection is stated, the end face pressure of the air inlet end cap (282) is set to the second of the seal plug (283) End face, the first end face are opposite with the second end face.

10. reaction chamber according to claim 9, which is characterized in that the disperse pipe air intake assembly further includes second close Seal (285), outer wall and the air inlet disperse pipe (28) of second sealing ring (285) set on the inlet suction port (281) Inner wall between.

Technical field

The present invention relates to consersion unit, in particular to a kind of reaction chamber for photovoltaic art.

Background technique

The transformation efficiency for improving solar battery is of great significance for the development of photovoltaic industry.It is a kind of passivation contact N-type back junction solar battery has the effect of the invalid absorption reduced polysilicon layer to incident light, promotion battery short circuit electric current, and And the passivation contact of front surface may be implemented, the recombination rate of battery front surface is greatly reduced, open-circuit voltage and short is improved Road electric current, so as to promote cell conversion efficiency.

The structure of the N-type back junction solar battery of this passivation contact are as follows: front surface successively includes tunnelling oxygen from inside to outside Change layer, intrinsically polysilicon layer, the n+ polysilicon region locally adulterated, passivated reflection reducing membrane and n+ metal electrode；Back surface from it is interior to It outside successively include p+ doped region, passivating film and p+ metal electrode.The preparation of the N-type back junction solar battery of this passivation contact Process is main including the following steps: grows tunnel oxide in the front surface of N-type crystalline silicon matrix, and in tunnel oxide Upper growth intrinsically polysilicon layer or intrinsic amorphous silicon layer, the then selectively office in intrinsically polysilicon layer or intrinsic amorphous silicon layer Phosphonium ion is injected in portion.It needs to carry out low-pressure chemical vapor deposition (Low-pressure to N-type crystalline silicon matrix in this course CVD, LPCVD), intrinsically polysilicon layer or intrinsic amorphous silicon layer are grown on front surface tunnel oxide.

LPCVD is that operating pressure when reaction gas to be carried out to deposition reaction in reactor is reduced to about 100Torr A kind of (1Torr=133.332Pa) CVD reaction below.Has preferable stepcoverage energy with the film that LPCVD method deposits Power, good component and structure control, very high deposition rate and output quantity, therefore it is widely used in high additive value In semiconductor industry, but there is presently no be applied to photovoltaic art.

Fig. 1 shows a kind of typically applied to the horizontal LPCVD reaction chamber in semiconductor industry.It includes for heating Furnace body 1, preceding fixed cooling flange 3, reaction gas air inlet pipe 4, the quartz boat 5 of bearing wafer, vacuum-pumping pipeline 6, tail portion it is close Seal flange 7 and reaction quartz ampoule 8.The chip 2 of deposition film is needed to be set on quartz boat 5, furnace body 1 is heated, and preceding fixation is cold But flange 3 have cooling line, reaction gas air inlet pipe 4 be set to reaction chamber front end, include single or multiple tracheaes, for into Gas.

When horizontal LPCVD reaction chamber is applied to semicon industry, chip spacing will not be less than 4.76mm, furnace body warm area one As in 1000mm hereinafter, one time carrier sheet 200 or less.And photovoltaic industry production capacity is big, needs carrier sheet 1000 or more, Back-to-back intensive film releasing, chip spacing are less than 4.76mm, and furnace body warm area is in 1000mm or more.Since furnace body warm area is elongated, need It lengthens and increases entire reaction chamber, the fire door process gas intake method of existing LPCVD reaction chamber will lead to wafer loading area The front and back process uniformity in domain is poor, influences product quality, is unable to satisfy the need that photovoltaic industry carries out low-pressure chemical vapor deposition It asks.

In addition, the tail end of the reaction quartz ampoule of existing LPCVD reaction chamber narrows structure using arc, as shown in Fig. 2, tail End is sealed with flange method.Since reaction quartz ampoule works under vacuum state, reaction chamber is inside and outside, and there are an atmosphere The pressure difference of pressure frequently vacuumizes and is broken the tail end stress raiser that will lead to reaction quartz ampoule, shortens reaction quartz ampoule Service life, when increase lengthen reaction quartz ampoule when, more exacerbate this defect.And the disassembly of flange form sealing structure is not Just, reaction quartz ampoule is easy to cause to be broken in dismounting because of collision.

Therefore, expect to develop a kind of reaction chamber suitable for photovoltaic industry.

Summary of the invention

The object of the present invention is to provide a kind of reaction chamber suitable for photovoltaic industry, to meet, load amount is big, furnace body temperature The demand of the head of district.

The invention proposes a kind of reaction chambers, including reaction quartz ampoule, bushing pipe and air inlet disperse pipe；Wherein, the lining Pipe is set in the reaction quartz ampoule, and for accommodating silicon wafer, the air inlet disperse pipe passes through the air inlet set on the bushing pipe end Hole is inserted in the bushing pipe, and at least one end of the air inlet disperse pipe is for being connected to gas source, the pipe of the air inlet disperse pipe Wall is equipped with multiple ventholes.

Preferably, the reaction chamber further includes tail portion seal assembly, and the tail portion seal assembly includes tail portion Sealing Method Blue, tail portion mounting flange and tail portion inlet flange；The tail portion sealing flange is sheathed on the tail end of the reaction quartz ampoule, described The inner wall of tail portion sealing flange is equipped with tail portion sealing flange seal groove, and the tail portion sealing flange seal groove is close for accommodating tail portion Seal flange seal ring；The inner wall of the tail portion mounting flange is equipped with radial step surface, and the step surface is equipped with anti-collision ring, described Tail portion mounting flange is fixedly connected on the tail portion sealing flange, and anti-collision ring pressure is set to the tail end of the reaction quartz ampoule End face on；The tail portion inlet flange is fixedly connected on the axially external of the tail portion mounting flange, the tail portion air inlet method Orchid is equipped with the tail portion inlet flange stomata for allowing the air inlet disperse pipe to pass through.

Preferably, the first end face of the tail portion sealing flange is contacted with the first end face of the tail portion mounting flange, institute The second end face for stating tail portion sealing flange is equipped with the first cooling trough；The first end face of the tail portion mounting flange is equipped with the Two cooling troughs.

Preferably, the reaction chamber further includes front sealing component, and the front sealing component includes front sealing method Blue, front mounting flange and front inlet flange；The front sealing flange sleeve is set to the front end of the reaction quartz ampoule, described The inner wall of front sealing flange is equipped with front sealing flange sealing trough, and the front sealing flange sealing trough is close for accommodating front Seal flange seal ring；The inner wall of the front mounting flange is equipped with radial step surface, and the step surface is equipped with anti-collision ring, described Front mounting flange is fixedly connected on the front sealing flange, and anti-collision ring pressure is set to the described of the reaction quartz ampoule On the end face of front end；The front inlet flange is fixedly connected on the axially external of the front mounting flange, the front into Gas flange is equipped with the front inlet flange stomata for allowing the air inlet disperse pipe to pass through.

Preferably, the first end face of the front sealing flange is contacted with the first end face of the front mounting flange, institute The second end face for stating front sealing flange is equipped with the first cooling trough；The first end face of the front mounting flange is equipped with the Two cooling troughs.

Preferably, at least one end of the bushing pipe has arc-shaped inner surface.

Preferably, the tube wall of the bushing pipe is equipped with and vacuumizes hole and thermocouple hole.

Preferably, the reaction chamber further includes furnace body, and the furnace body is sheathed on the periphery of the reaction quartz ampoule, described Furnace body includes annular sidewall and two fire doors for being connected to the annular sidewall both ends.

Preferably, the reaction chamber further includes disperse pipe air intake assembly, and the disperse pipe air intake assembly includes air inlet connecting Head, seal plug, furnace body connector, air inlet end cap；One end of the inlet suction port is inserted in from the end of the air inlet disperse pipe In the air inlet disperse pipe, other end indwelling is in outside the air inlet disperse pipe, for being connected to the gas source；The furnace body connector It is sheathed on the end of the air inlet disperse pipe, one end of the furnace body connector is fixedly connected on the fire door of the furnace body, separately The inner wall of one end is equipped with seal groove, and the seal groove is for accommodating the first sealing ring；The seal plug is sheathed on the air inlet Connector exterior and it is located at the axially external of the furnace body connector, the first end face of the seal plug is equipped with seal convexity, institute It states seal convexity and is inserted into the seal groove to compress first sealing ring；The air inlet end cap is sheathed on the seal plug The outside of head and the furnace body connector, and connect with the furnace body joint screw thread, the end face pressure of the air inlet end cap is set to described The second end face of seal plug, the first end face are opposite with the second end face.

Preferably, the disperse pipe air intake assembly further includes the second sealing ring, and second sealing ring is set to the air inlet Between the outer wall of connector and the inner wall of the air inlet disperse pipe.

The beneficial effects of the present invention are:

1, reaction quartz ampoule in setting accommodate silicon wafer bushing pipe, to protect reaction quartz ampoule, by insertion bushing pipe into Gas disperse pipe air inlet is conducive to process gas and is uniformly distributed in bushing pipe, significantly improves process gas in the prior art and is quickly taken out The larger problem in reaction quartz ampoule front and tail portion technique gap caused by walking, improves the process uniformity inside bushing pipe；

2, reaction quartz ampoule is cylindrical shape, and front and tail portion are sealed by seal assembly, and stress is avoided to concentrate, and real Now safe air inlet.

The device of the invention has other characteristics and advantages, these characteristics and advantages from the attached drawing being incorporated herein and with It will be apparent in specific embodiment afterwards, or will be in the attached drawing and subsequent specific embodiment being incorporated herein Middle to be stated in detail, the drawings and the detailed description together serve to explain specific principles of the invention.

Detailed description of the invention

Exemplary embodiment of the present is described in more detail in conjunction with the accompanying drawings, of the invention is above-mentioned and other Purpose, feature and advantage will be apparent, wherein in exemplary embodiments of the present invention, identical appended drawing reference is usual Represent same parts.

Fig. 1 shows the structural schematic diagram applied to the horizontal LPCVD reaction chamber in semiconductor industry at present；

Fig. 2 shows the tail end stress state schematic diagram of current horizontal LPCVD reaction chamber；

Fig. 3 shows the structural schematic diagram of reaction chamber according to an exemplary embodiment of the present invention；

Fig. 4 shows the perspective view of reaction chamber according to an exemplary embodiment of the present invention；

Fig. 5 shows the cross-sectional view of the front sealing component of reaction chamber according to an exemplary embodiment of the present invention；

Fig. 6 shows the partial enlarged view in Fig. 5 in circle A；

Fig. 7 shows the cross-sectional view of the tail portion seal assembly of reaction chamber according to an exemplary embodiment of the present invention；

Fig. 8 shows the partial enlarged view in Fig. 7 in circle B；

Fig. 9 shows the tail end stress state schematic diagram of reaction chamber according to an exemplary embodiment of the present invention；

Figure 10 shows the structural schematic diagram of the air inlet disperse pipe of reaction chamber according to an exemplary embodiment of the present invention；

Figure 11 shows the structural representation of another air inlet disperse pipe of reaction chamber according to an exemplary embodiment of the present invention Figure；

Figure 12 shows the cross-sectional view of the disperse pipe air intake assembly of reaction chamber according to an exemplary embodiment of the present invention；

Figure 13 a and Figure 13 b show respectively the bushing pipe of reaction chamber according to an exemplary embodiment of the present invention main view and Side view.

Description of symbols:

1 furnace body, 2 chips fix cooling flange, 4 reaction gas air inlet pipe, 5 quartz boats, 6 vacuum-pumping pipelines, 7 tail portions before 3 Sealing flange, 8 reaction quartz ampoules, 9 vacuum chambers；

21 furnace bodies, 22 reaction quartz ampoules, 23 front sealing components, 24 tail portion seal assemblies, 25 bushing pipes, 26 quartz boats, 27 Silicon wafer, 28 air inlet disperse pipes, 29 vacuum-pumping pipelines, 30 vacuum chambers；

231 front sealing flanges, 232 front mounting flanges, 233 front inlet flanges, 234 sealing rings, 235 sealing rings, 236 second cooling troughs, 237 anti-collision rings, 238 front sealing flange seal rings, 239 first cooling troughs；

241 tail portion sealing flanges, 242 tail portion mounting flanges, 243 tail portion inlet flanges, 244 sealing rings, 245 sealing rings, 246 second cooling troughs, 247 anti-collision rings, 248 tail portion sealing flange sealing rings, 249 first cooling troughs；

251 air inlets, 252 thermocouple holes, 253 vacuumize hole；

281 inlet suction ports, 282 air inlet end caps, 283 seal plugs, 284 furnace body connectors, 285 second sealing rings, furnace after 286 Door, 287 first sealing rings, 288 ventholes.

Specific embodiment

The present invention will be described in more detail below with reference to accompanying drawings.Although showing the preferred embodiment of the present invention in attached drawing, However, it is to be appreciated that may be realized in various forms the present invention and should not be limited by the embodiments set forth herein.On the contrary, providing These embodiments are of the invention more thorough and complete in order to make, and can will fully convey the scope of the invention to ability The technical staff in domain.

The embodiment of the present invention proposes a kind of reaction chamber, including reaction quartz ampoule, bushing pipe and air inlet disperse pipe；Wherein, it serves as a contrast Pipe is set in reaction quartz ampoule, and for accommodating silicon wafer, air inlet disperse pipe is inserted in bushing pipe by being set to the air inlet of bushing pipe end Interior, at least one end of air inlet disperse pipe is equipped with multiple ventholes for being connected to gas source, the tube wall of air inlet disperse pipe.

The application requirement that the reaction chamber is big especially suitable for photovoltaic industry load quantity, furnace body warm area is long.Applied to light When lying prostrate industry, reaction quartz ampoule is longer, and inside is constantly in evacuated state.It, can by the way that bushing pipe is arranged in reaction quartz ampoule Play the role of protection reaction quartz ampoule, frequent clean is avoided to react quartz ampoule.After a period of time, bushing pipe need to be only dismantled It is cleaned, the service life of reaction quartz ampoule can be greatly prolonged.In addition, being conducive to technique by air inlet disperse pipe air inlet Gas is uniformly distributed in bushing pipe, significantly improves process gas reaction quartz ampoule front caused by quickly taking away in the prior art The larger problem with tail portion technique gap improves the process uniformity inside bushing pipe.This reaction chamber can be used for deposited oxide Silicon, polysilicon, amorphous silicon, DOPOS doped polycrystalline silicon, doped amorphous silicon film, maximum processing capability is up to 1200.

In one example, reaction chamber includes tail portion seal assembly and/or front sealing component.

Tail portion seal assembly includes tail portion sealing flange, tail portion mounting flange and tail portion inlet flange；Tail portion sealing flange It is sheathed on the tail end of reaction quartz ampoule, the inner wall of tail portion sealing flange is equipped with tail portion sealing flange seal groove, tail portion sealing flange Seal groove is for accommodating tail portion sealing flange sealing ring；The inner wall of tail portion mounting flange is equipped with radial step surface, sets on step surface There is anti-collision ring, tail portion mounting flange is fixedly connected on tail portion sealing flange, and anti-collision ring pressure is set to the tail end of reaction quartz ampoule On end face；Tail portion inlet flange (such as passing through bolt) is fixedly connected on the axially external of tail portion mounting flange, tail portion air inlet method Orchid is equipped with the tail portion inlet flange stomata for allowing air inlet disperse pipe to pass through.

The first end face of tail portion sealing flange is contacted with the first end face of tail portion mounting flange, and the second of tail portion sealing flange End face is equipped with the first cooling trough；The first end face of tail portion mounting flange is equipped with the second cooling trough.First cooling trough and Two cooling troughs are respectively used to cooling tail portion sealing flange sealing ring and anti-collision ring.Each sealing ring and anti-collision ring can be by fluorubber It is made.

Front sealing component includes front sealing flange, front mounting flange and front inlet flange；Front sealing flange It is sheathed on the front end of reaction quartz ampoule, the inner wall of front sealing flange is equipped with front sealing flange sealing trough, front sealing flange Seal groove is for accommodating front sealing flange seal ring；The inner wall of front mounting flange is equipped with radial step surface, sets on step surface There is anti-collision ring, front mounting flange is fixedly connected on front sealing flange, and anti-collision ring pressure is set to the front end of reaction quartz ampoule On end face；Front inlet flange is fixedly connected on the axially external of front mounting flange, front inlet flange be equipped with allow into The front inlet flange stomata that gas disperse pipe passes through.

The first end face of front sealing flange is contacted with the first end face of front mounting flange, and the second of front sealing flange End face is equipped with the first cooling trough；The first end face of front mounting flange is equipped with the second cooling trough.First cooling trough and Two cooling troughs are respectively used to cooling front sealing flange seal ring and anti-collision ring, and each sealing ring and anti-collision ring can be by fluorubber It is made.

By being sealed in the front of reaction quartz ampoule and tail portion using straight pipe type, because collision causes when greatly reducing assembly Risk of breakage.

In one example, the diameter range of air inlet disperse pipe is 10~30mm, and length range is 100~3000mm；Institute State venthole diameter range be 0.5~3mm, multiple ventholes along bushing pipe and reaction quartz ampoule axial spaced set, with Reach best air inlet effect.Air inlet disperse pipe can be single, or more；Can with one end air inlet, can also with both ends into Gas.Under normal circumstances, air inlet disperse pipe is made of quartz.

Preferably, lining pipe is made of SIC or quartz.At least one end of bushing pipe has arc-shaped inner surface, this has Conducive to the deposition film amount for reducing inner wall.It can be equipped on the tube wall of bushing pipe and vacuumize hole and thermocouple hole, by vacuumizing hole connection Vacuum evacuation device is inserted into thermocouple by thermocouple hole convenient for will vacuumize inside bushing pipe, convenient for measurement bushing pipe internal temperature.

In one example, reaction chamber further includes furnace body, and furnace body is sheathed on the periphery of reaction quartz ampoule, and furnace body includes ring Shape side wall and two fire doors for being connected to annular sidewall both ends.Furnace body is used to heat reaction quartz ampoule, to reach Required reaction temperature.

In one example, reaction chamber further includes disperse pipe air intake assembly, disperse pipe air intake assembly include inlet suction port, Seal plug, furnace body connector, air inlet end cap；One end of inlet suction port is inserted in air inlet disperse pipe from the end of air inlet disperse pipe Interior, other end indwelling is in outside air inlet disperse pipe, for being connected to the gas source；Furnace body fitting sleeve is set to the described of air inlet disperse pipe End, one end of furnace body connector are fixedly connected on the fire door of furnace body, and the inner wall of the other end is equipped with seal groove, and seal groove is for accommodating First sealing ring；Seal plug is sheathed on inlet suction port outside and is located at the axially external of furnace body connector, and the first of seal plug End face is equipped with seal convexity, and seal convexity is inserted into seal groove to compress the first sealing ring；Air inlet end cap is sheathed on sealing The outside of plug and furnace body connector, and connect with furnace body joint screw thread, the end face pressure of air inlet end cap is set to the second of seal plug End face, first end face are opposite with second end face.Disperse pipe air intake assembly can also include the second sealing ring, and the second sealing ring is set to Between the outer wall of inlet suction port and the inner wall of air inlet disperse pipe.

Compressible first sealing ring of seal convexity on seal plug, prevents process gas from leaking outside；Second sealing ring can shape At the sealing between inlet suction port and air inlet disperse pipe, prevent process gas from leaking outside.It can by the design of disperse pipe air intake assembly Realize the safe air inlet of air inlet disperse pipe.Preferably, inlet suction port can be made of stainless steel, and furnace body connector is solderable to be connected to fire door.

In one example, reaction quartz ampoule is cylindrical shape, and the outer diameter for reacting quartz ampoule is a constant constant.It is existing horizontal The tail portion that there is the reaction quartz ampoule of LPCVD reaction chamber arc to narrow, tail end is flange arrangement, and to realize sealing, this is easy Stress is caused to concentrate.When reacting quartz ampoule lengthening, this stress concentration phenomenon is become apparent.The embodiment of the present invention uses cylinder The reaction quartz ampoule of shape, external diameter constant is constant, i.e. the front and tail portion of reaction quartz ampoule do not form flange arrangement, but special Not She Ji front sealing component and tail portion seal assembly realize the sealing of reaction quartz ampoule, so as to avoid stress to the maximum extent Concentration phenomenon, as shown in Figure 9.