阅读说明：本技术 一种电容薄膜真空计膜片张紧机构、系统、方法及装置 (Diaphragm tensioning mechanism, system, method and device of capacitance film vacuum gauge ) 是由 刘乔 侯少毅 胡强 胡琅 卫红 何斌 于 2021-08-30 设计创作，主要内容包括：本发明公开了一种电容薄膜真空计膜片张紧机构、系统、方法及装置,其中,张紧机构包括：压紧机构,用于压紧中心膜片外周以固定中心膜片；多点顶出机构,设置在所述压紧机构下方,其设有通过顶出而张紧固定在所述压紧机构上的中心膜片的顶杆组；对位机构,安装在所述压紧机构与多点顶出机构之间,用于对位调节压紧机构和多点顶出机构,所述顶杆组包括若干通过液压驱动伸缩的顶杆；该张紧机构通过多点顶出机构的顶杆组顶出对中心膜片进行张紧即可完成中心膜片的张紧处理,使得中心膜片达到预定张紧力,具有张紧度可控、中心膜片各区域张紧效果均匀等优点。(The invention discloses a diaphragm tensioning mechanism, a system, a method and a device of a capacitance film vacuum gauge, wherein the tensioning mechanism comprises: the pressing mechanism is used for pressing the periphery of the central diaphragm so as to fix the central diaphragm; the multi-point ejection mechanism is arranged below the pressing mechanism and is provided with an ejector rod group which is used for tensioning and fixing a central membrane on the pressing mechanism through ejection; the alignment mechanism is arranged between the pressing mechanism and the multi-point ejection mechanism and is used for aligning and adjusting the pressing mechanism and the multi-point ejection mechanism, and the ejector rod group comprises a plurality of ejector rods which are driven to stretch by hydraulic pressure; the tensioning mechanism can complete tensioning treatment of the central diaphragm by ejecting the central diaphragm through the ejector rod group of the multi-point ejection mechanism to tension the central diaphragm, so that the central diaphragm reaches a preset tensioning force, and the tensioning mechanism has the advantages of controllable tensioning degree, uniform tensioning effect of each area of the central diaphragm and the like.)

1. A capacitive thin film gauge diaphragm tensioning mechanism for tensioning a central diaphragm of a capacitive thin film gauge comprising:

a pressing mechanism (1) for pressing the outer periphery of the central diaphragm to fix the central diaphragm;

the multipoint ejection mechanism (2) is arranged below the pressing mechanism (1) and is provided with an ejector rod group (21) which is used for tensioning a central membrane fixed on the pressing mechanism (1) through ejection;

the alignment mechanism (3) is arranged between the pressing mechanism (1) and the multi-point ejection mechanism (2) and is used for aligning and adjusting the pressing mechanism (1) and the multi-point ejection mechanism (2);

the ejector rod group (21) comprises a plurality of ejector rods which are driven to stretch by hydraulic pressure.

2. The diaphragm tensioning mechanism of the capacitance thin film vacuum gauge according to claim 1, wherein the pressing mechanism (1) comprises an upper pressing ring (11) and a lower pressing ring (12) for pressing the periphery of the central diaphragm in cooperation with the upper pressing ring (11), and a tensioning hole (121) for a top rod set (21) to pass through is formed in the middle of the lower pressing ring (12).

3. The tension mechanism of claim 1, wherein the plurality of push rods are uniformly distributed in multiple circular rings.

4. A central diaphragm tensioning system for a capacitance thin film vacuum gauge for tensioning a central diaphragm of the capacitance thin film vacuum gauge, comprising:

the capacitive thin film gauge diaphragm tensioning mechanism of any of claims 1-3 for tensioning the central diaphragm by extension of the set of push rods (21);

the simulation module is used for simulating and calculating the simulation ejection information of the ejector rod group (21) required by the central diaphragm;

the hydraulic module is used for driving the ejector rod group (21) to extend out to tension the central diaphragm;

and the main control module is used for controlling the hydraulic module to output and drive the ejector rod group (21) to stretch out to tension the central diaphragm according to the simulation ejection information, and controlling the hydraulic module to keep hydraulic pressure to perform pressure maintaining and shaping treatment on the central diaphragm when the central diaphragm is in a tensioned state.

5. The central diaphragm tensioning system of a capacitance thin film vacuum gauge according to claim 4, further comprising an online measurement module for online measuring actual ejection information of the ejector pin group (21); and the main control module corrects the output condition of the hydraulic module based on the actual ejection information and the simulated ejection information.

6. The system of claim 5, further comprising an overflow module for performing overflow processing on the hydraulic module, wherein when the actual ejection information exceeds the simulated ejection information, the main control module controls the overflow module to perform overflow processing on the hydraulic module so that the actual ejection information is consistent with the simulated ejection information.

7. The system of claim 4, wherein the simulated ejection information comprises ejection distance information and ejection speed information.

8. A method of central diaphragm tensioning based on the capacitive thin film gauge diaphragm tensioning mechanism of any of claims 1-3, characterized in that the method comprises the steps of:

s1, acquiring simulation ejection information of the ejector rod group (21) required by the central membrane calculated by simulation;

s2, controlling the multi-point ejection mechanism (2) to tension the central membrane based on the simulation ejection information;

and S3, controlling the multi-point ejection mechanism (2) to keep the position under the tension state of the central membrane to perform pressure maintaining and shaping treatment on the central membrane.

9. A central diaphragm tensioning arrangement based on the capacitive thin film gauge diaphragm tensioning mechanism of any one of claims 1 to 3, comprising:

the acquisition module is used for acquiring simulation ejection information of the ejector rod group (21) required by the central membrane calculated by simulation;

the sending module is used for sending hydraulic control information based on the simulation ejection information obtained by the obtaining module so as to drive the multipoint ejection mechanism (2) to tension the central diaphragm;

and the holding module sends out holding information to control the multi-point ejection mechanism (2) to hold the position when the central membrane is in a tensioning state so as to carry out pressure-maintaining shaping treatment on the central membrane.

Technical Field

The application relates to the technical field of measuring instruments, in particular to a diaphragm tensioning mechanism, a system, a method and a device of a capacitance film vacuum gauge.

Background

The capacitance film vacuum gauge (also called capacitance film gauge) is a full pressure vacuum measuring instrument, has the advantages of high stability, high precision, corrosion resistance and the like, and is widely applied to important fields of aerospace, nuclear industry, semiconductor equipment and the like.

The capacitance film gauge is mainly manufactured according to the principle that an elastic element (central diaphragm) generates strain under the action of pressure difference to cause capacitance change. The key part of the capacitance film gauge is a central diaphragm, and the mechanical property of the central diaphragm is directly related to the measurement accuracy and the working performance of the vacuum gauge.

The key technology of the central membrane is membrane material, tensioning of the membrane and welding of the membrane. When the membrane material is determined, the central membrane needs to be tensioned by a tensioning tool before being welded on the base, and the best welding effect and working state can be achieved only when the central membrane reaches a preset tensioning force.

A conventional membrane tensioning welding tool is shown in fig. 1. The main process is that under the effect of the compression screw, the upper and lower compression rings clamp the diaphragm tightly, then the rotating body rotates and moves downwards to drive the tension ring to press the diaphragm, so that the diaphragm is tensioned. The tensioning device has a relatively simple structure, but has low efficiency and has the following technical problems:

(1) the tension is limited. In the clamping and tensioning mode, only the inner edge part of the central membrane is extruded and deformed by the tensioning ring, so that the stress concentration of the contact part is larger, and the membrane is thinner, so that the membrane is easy to be exploded in the outer area of the tensioning ring, and the tensioning force of the whole tensioning device is limited.

(2) The tension of the membrane is not evenly distributed. The tensioning mode of the tensioning device only generates larger tension on the tensioning ring at the outer side of the diaphragm, and generates smaller tension on the central area of the diaphragm due to small deformation of the central area of the diaphragm, so that the tension distribution at each position of the central diaphragm is not uniform.

In view of the above problems, no effective technical solution exists at present.

Disclosure of Invention

The application aims to provide a central diaphragm tensioning method and a tensioning device of a capacitance film vacuum gauge, and the effect that the central diaphragm is uniformly tensioned and is effectively prevented from being pulled and exploded when being tensioned is achieved.

In a first aspect, the present application provides a capacitance thin film gauge diaphragm tensioning mechanism for tensioning a center diaphragm of a capacitance thin film gauge, comprising:

the pressing mechanism is used for pressing the periphery of the central diaphragm so as to fix the central diaphragm;

the multi-point ejection mechanism is arranged below the pressing mechanism and is provided with an ejector rod group which is used for tensioning and fixing a central membrane on the pressing mechanism through ejection;

the alignment mechanism is arranged between the pressing mechanism and the multi-point ejection mechanism and is used for aligning and adjusting the pressing mechanism and the multi-point ejection mechanism;

the ejector rod group comprises a plurality of ejector rods which are driven to stretch by hydraulic pressure.

According to the diaphragm tensioning mechanism of the capacitance film vacuum gauge, the central diaphragm can be tensioned by ejecting the central diaphragm through the ejector rod group of the multipoint ejection mechanism, so that the central diaphragm reaches a preset tensioning force, and the best welding effect and working state can be achieved; in addition, the central diaphragm is tensioned by adopting the ejector rod group structure, so that the central diaphragm is only subjected to the acting force in the ejection direction of the ejector rod group, and the central diaphragm can be effectively prevented from being pulled and exploded when tensioned.

The diaphragm tensioning mechanism of the capacitance film vacuum gauge comprises an upper pressing ring and a lower pressing ring, wherein the lower pressing ring is used for being matched with the upper pressing ring to tightly press the periphery of a central diaphragm, and a tensioning hole for a mandril set to pass through is formed in the middle of the lower pressing ring.

The diaphragm tensioning mechanism of the capacitance film vacuum gauge is characterized in that a plurality of ejector rods are uniformly distributed in a multiple circular ring mode.

In a second aspect, the present application further provides a central diaphragm tensioning system of a capacitance thin film vacuum gauge for tensioning a central diaphragm of the capacitance thin film vacuum gauge, comprising:

the diaphragm tensioning mechanism of the capacitance film vacuum gauge is used for tensioning the central diaphragm by extending the ejector rod group;

the simulation module is used for simulating and calculating the simulation ejection information of the ejector rod group required by the central diaphragm;

the hydraulic module is used for driving the ejector rod group to extend out to tension the central diaphragm;

and the main control module is used for controlling the hydraulic module to output and drive the ejector rod group to stretch out to tension the central diaphragm according to the simulation ejection information, and controlling the hydraulic module to maintain hydraulic pressure to perform pressure maintaining and shaping treatment on the central diaphragm when the central diaphragm is in a tensioning state.

The central diaphragm tensioning system of capacitance film vacuum gauge of this application embodiment drives hydraulic module through host system and makes straining device's ejector pin group stretch out and take up the central diaphragm and handle, and the ejecting condition of ejector pin group is gone on based on emulation ejection information of emulation module specifically for central diaphragm reaches predetermined tension, is drawn explosion when can effectively avoiding central diaphragm tensioning, has that degree of automation is high, the tensile force scope is big, the rate of tension is controllable, each regional tensioning effect of central diaphragm is even advantage such as.

The central diaphragm tensioning system of the capacitance film vacuum gauge further comprises an online measurement module, a central diaphragm tensioning module and a central diaphragm tensioning module, wherein the online measurement module is used for online measuring actual ejection information of the ejector rod group; and the main control module corrects the output condition of the hydraulic module based on the actual ejection information and the simulated ejection information.

The central diaphragm tensioning system of the capacitance thin film vacuum gauge further comprises an overflow module, wherein the overflow module is used for performing overflow processing on a hydraulic module, and when the actual ejection information exceeds the simulation ejection information, the main control module controls the overflow module to perform overflow processing on the hydraulic module so that the actual ejection information is consistent with the simulation ejection information.

The central diaphragm tensioning system of the capacitance thin film vacuum gauge is characterized in that the simulation ejection information comprises ejection distance information and ejection speed information.

In a third aspect, the present application further provides a central diaphragm tensioning method based on the diaphragm tensioning mechanism of the capacitance thin film vacuum gauge, including the following steps:

s1, acquiring simulation ejection information of the ejector rod group required by the central membrane calculated by simulation;

s2, controlling the multipoint ejection mechanism to tension the central membrane based on the simulation ejection information;

and S3, controlling the multi-point ejection mechanism to keep the position under the tension state of the central membrane to perform pressure maintaining and shaping treatment on the central membrane.

According to the central membrane tensioning method, the ejector rod group in the multi-point ejection mechanism is controlled to eject quantitatively to tension the central membrane based on the acquired simulation ejection information, and then the central membrane is tensioned and formed stably through qualitative processing.

In a fourth aspect, the present application further provides a central diaphragm tensioning device based on the above diaphragm tensioning mechanism of the capacitance thin film vacuum gauge, including:

the acquisition module is used for acquiring simulation ejection information of the ejector rod group required by the central diaphragm through simulation calculation;

the sending module is used for sending hydraulic control information based on the simulation ejection information acquired by the acquisition module so as to drive the multipoint ejection mechanism to tension the central diaphragm;

and the holding module sends out holding information to control the multi-point ejection mechanism to hold the position when the central membrane is in a tensioning state so as to perform pressure-maintaining and shaping treatment on the central membrane.

According to the central diaphragm tensioning method, the simulation ejection information is acquired based on the acquisition module, then the sending module is used for sending the control information to control the ejector rod group in the multi-point ejection mechanism to eject quantitatively so as to tension the central diaphragm, and then the maintaining module is used for sending the maintaining information to perform pressure maintaining and shaping processing on the central diaphragm, so that the central diaphragm is tensioned and formed stably, and the method has the advantages of accurate and controllable tensioning force, uniform tensioning effect of each region of the central diaphragm and the like.

From the above, the application provides a diaphragm tensioning mechanism, a system, a method and a device of a capacitance film vacuum gauge, wherein the tensioning mechanism can perform tensioning treatment on a central diaphragm by ejecting a central diaphragm through an ejector rod group of a multipoint ejection mechanism, so that the central diaphragm reaches a preset tensioning force, and the diaphragm tensioning mechanism has the advantages of controllable tensioning degree, uniform tensioning effect of each area of the central diaphragm and the like; in addition, the central diaphragm is tensioned by adopting the ejector rod group structure, so that the central diaphragm is only subjected to the acting force in the ejection direction of the ejector rod group, and the central diaphragm can be effectively prevented from being pulled and exploded when tensioned.

Drawings

Fig. 1 is a schematic structural view of a conventional tensioning tool.

Fig. 2 is a schematic perspective view of a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge according to an embodiment of the present application.

Fig. 3 is a schematic diagram of a cross-sectional structure of a middle portion of a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge according to an embodiment of the present application.

Fig. 4 is a schematic sectional structure view of the chamber.

Fig. 5 is a schematic structural diagram of a tensioning system provided in an embodiment of the present application.

Fig. 6 is a detailed structural schematic diagram of a tensioning system provided in an embodiment of the present application.

Fig. 7 is a process diagram of the mandril group extending.

Fig. 8 is a flowchart of a tensioning method provided in an embodiment of the present application.

Fig. 9 is a schematic structural diagram of a tensioning device provided in an embodiment of the present application.

FIG. 10 is a structural diagram of a finite element model during simulation.

Fig. 11 is a diagram showing a result of a tension simulation of the conventional tensioner.

Fig. 12 is a diagram illustrating a result of a tension simulation of a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge according to an embodiment of the present disclosure.

Fig. 13 is a schematic stress point diagram of a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge according to an embodiment of the present disclosure.

Reference numerals: 1. a hold-down mechanism; 2. a multi-point ejection mechanism; 3. an alignment mechanism; 11. an upper compression ring; 12. pressing the ring downwards; 21. a set of ejector rods; 31. a cavity; 32. a compression screw; 121. tensioning the hole.

Detailed Description

The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present application without making any creative effort, shall fall within the protection scope of the present application.

It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures. Meanwhile, in the description of the present application, the terms "first", "second", and the like are used only for distinguishing the description, and are not to be construed as indicating or implying relative importance.

In a first aspect, please refer to fig. 2-4, fig. 2-4 illustrate a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge for tensioning a central diaphragm of the capacitance thin film vacuum gauge in some embodiments of the present application, including:

the pressing mechanism 1 is used for pressing the periphery of the central diaphragm to fix the central diaphragm;

the multipoint ejection mechanism 2 is arranged below the pressing mechanism 1 and is provided with an ejector rod group 21 which is used for tensioning and fixing a central membrane on the pressing mechanism 1 through ejection;

the alignment mechanism 3 is arranged between the pressing mechanism 1 and the multi-point ejection mechanism 2 and is used for aligning and adjusting the pressing mechanism 1 and the multi-point ejection mechanism 2;

the ejector rod group 21 comprises a plurality of ejector rods which are driven to extend and retract through hydraulic pressure.

Specifically, the ejector rod is ejected in a hydraulic driving mode, so that the ejector rod has enough ejection force and speed to tension the central diaphragm, and secondly, the ejection depth of the ejector rod can be changed by adjusting hydraulic pressure, so that the tensioning effect of the central diaphragm is changed, and the central diaphragm tensioning device has the characteristics of convenience in adjustment and good tensioning effect.

When the diaphragm tensioning mechanism of the capacitance film vacuum gauge in the embodiment of the application is used, the periphery of a central diaphragm is fixed by the aid of the pressing mechanism 1, the pressing mechanism 1 and the central diaphragm are arranged on the multipoint ejection mechanism 2 through the alignment mechanism 3, the middle of the central diaphragm is aligned to the ejector rod group 21 of the multipoint ejection mechanism 2, the central diaphragm is tensioned through ejection of the ejector rod group 21 of the multipoint ejection mechanism 2, and tensioning processing of the central diaphragm can be completed, so that the central diaphragm reaches a preset tensioning force, and the best welding effect and the best working state can be achieved.

Specifically, the diaphragm tensioning mechanism of the capacitance film vacuum gauge in the embodiment of the application adopts the structure of the ejector rod group 21 to tension the central diaphragm, so that the central diaphragm is only subjected to acting force in the ejection direction of the ejector rod group 21, and the central diaphragm can be effectively prevented from being pulled and exploded during tensioning.

Specifically, the process of pushing out the ejector pin group 21 to tension the central film is a process of making the central film protrude upward.

More specifically, the central membrane is tensioned by ejecting the ejector rod group 21, so that the tensioning effect of the central membrane can be accurately adjusted according to the design distribution and the ejection depth of the ejector rod group 21, namely the stress distribution of the central membrane is accurately adjusted, the tensioning force and the tensioning position are accurately controlled, and the tensioning effect of the central membrane is optimized.

In some preferred embodiments, the pressing mechanism 1 comprises an upper pressing ring 11 and a lower pressing ring 12 for pressing the periphery of the central membrane in cooperation with the upper pressing ring 11, and the middle of the lower pressing ring 12 is provided with a tensioning hole 121 for the ejector rod group 21 to pass through.

Specifically, when the tensioning mechanism of the application embodiment is used, the peripheral edge of the central membrane is pressed and locked by the upper pressing ring 11 and the lower pressing ring 12 in a mutually matched mode, so that the upper ejector rod group 21 of the multipoint ejection mechanism 2 is ejected out to apply pressure to the middle of the central membrane to generate tensioning deformation, and the peripheral edge is fixed, so that the central membrane reaches a preset tensioning force, and the central membrane in a required shape is obtained.

Specifically, the middle part of the upper clamp ring 11 is provided with an avoidance hole corresponding to the size and the position of the tensioning hole 121, so that the ejector rod group 21 ejects the tensioning central diaphragm to enable the central diaphragm to protrude in the avoidance hole, and the central diaphragm is tensioned and deformed.

More specifically, when the tensioning mechanism of the embodiment of the present application is used, the ejector rod group 21 is located in the tensioning hole 121 of the lower pressing ring 12, and the central membrane can be tensioned by being ejected toward the central membrane.

More specifically, when the outer periphery of the central film is fixed by the upper clamp ring 11 and the lower clamp ring 12, whether the upper clamp ring 11 and the lower clamp ring 12 successfully fix the outer periphery of the central film can be observed from the relief hole.

In some preferred embodiments, the plurality of lift pins are evenly distributed in multiple circular rings.

In some preferred embodiments, the heights of the top ends of the push rods which are uniformly distributed in multiple circular rings are designed to be flush; in addition, a plurality of ejector rods can be ejected out simultaneously, or the middle ejector rod is ejected out first and then is gradually radiated to the outer ring ejector rod for ejection; in the second ejection process, the ejector rod positioned at the center is firstly ejected to a preset position to tension the central membrane, and then the central membrane is diffused from the center to the outer ring, namely the ejector rods from the middle to the outer ring are gradually contacted with the central membrane in the ejection process one by one, so that the middle part of the central membrane uniformly protrudes upwards; compared with the traditional single circular ring-shaped tensioning ring, the central diaphragm is tensioned, the ejector rods which are uniformly distributed in multiple circular rings are used for tensioning, the tensioning forming quality of the central diaphragm can be improved, the central diaphragm can be ejected by the ejector rods and uniformly protrudes, and the central diaphragm is effectively prevented from being exploded by pulling.

In the embodiment of the present application, the push rods preferably extend gradually from the middle to the outer ring to tension the central diaphragm, that is, as shown in fig. 7, the push rod set 21 is designed as a triple ring, as shown in fig. 7 (a), the push rods at the central portion of the tensioning mechanism first eject the tensioned diaphragm, as shown in fig. 7 (b), the push rods at the central portion of the tensioning mechanism eject the tensioned diaphragm, and finally, the push rods at the outer ring eject the tensioned diaphragm, and in the final tensioning state, the extension distances of all the push rods are the same, and the tensioning process can effectively reduce stress concentration, thereby improving the tolerance of the diaphragm and effectively preventing the diaphragm from being popped.

Specifically, at the end stage of the central membrane tensioning process, the central membrane tensioning process further comprises pressure maintaining and shaping, in the embodiment of the application, after the ejector rods eject the required convex shape of the central membrane, hydraulic output is maintained, so that the ejector rods are kept at the ejection positions for a period of time to shape the central membrane, the central membrane can be supported by the plurality of ejector rods in a multi-point mode to achieve multi-point shaping, and the shaping effect of the central membrane can be better.

Specifically, the number and the distribution density of the ejector rods are designed according to the tensioning precision in the actual design, and in the embodiment, the ejector rods are preferably arranged in 5 circles and 62 rods in total, so that the ejector rods can be ejected and tensioned in 1-5 stages when being tensioned.

In some preferred embodiments, the multi-point ejection mechanism 2 includes a push rod set 21 and an ejection base, wherein a plurality of through holes are formed in the ejection base, and the push rods in the push rod set 21 are slidably connected with the through holes and are driven by an external hydraulic driving mechanism to slide on the through holes.

In particular, the provision of the through holes defines the ejection direction of the ejector pin group 21, ensuring that the ejector pins are initially tensioned perpendicularly to the central diaphragm surface.

In some preferred embodiments, the alignment mechanism 3 includes a cavity 31.

Specifically, the ejection base is in a stepped cylindrical shape, the cavity 31 is sleeved on the base, and the lower pressing ring 12 is arranged in the cavity 31, so that the pressing mechanism 1 is arranged on the cavity 31 to realize automatic alignment with the multipoint ejection mechanism 2.

In some preferred embodiments, the alignment mechanism 3 further comprises a compression screw 32; specifically, the upper pressing ring 11 is provided with a through hole, the cavity 31 is provided with a screw hole, and the pressing screw 32 penetrates through the through hole and is in threaded connection with the screw hole to fix the upper pressing ring 11 and the lower pressing ring 12, so that the upper pressing ring 11 and the lower pressing ring 12 can firmly fix the central diaphragm, and the central diaphragm is prevented from loosening when the ejector rod is tensioned.

In some preferred embodiments, the outer circumference of the lower pressing ring 12 is provided with a plurality of circumferentially arrayed grooves, the inner circumference of the cavity 31 is provided with a plurality of projections corresponding to the grooves and capable of being matched with the grooves, and the screw holes are vertically arranged on the projections; the matching of the groove and the bump can ensure that the lower pressing ring 12 and the cavity 31 are tightly matched, and the accurate alignment of the pressing mechanism 1 and the multi-point ejection mechanism 2 is ensured.

Specifically, the bottom of the upper pressing ring 11 is provided with a plurality of inserting strips which can be matched with the grooves, so that the upper pressing ring 11 can be tightly matched with the lower pressing ring 12, and the upper pressing ring 11 and the lower pressing ring 12 can be effectively prevented from rotating relatively.

More specifically, the compression screw 32 penetrates through the insert to be in threaded connection with the screw hole, so that the upper compression ring 11, the central diaphragm and the lower compression ring 12 are fastened on the alignment mechanism 3, and the central diaphragm is effectively prevented from loosening due to looseness between the upper compression ring 11 and the lower compression ring 12.

In a second aspect, referring to fig. 5-7, fig. 5-7 illustrate a central diaphragm tensioning system of a capacitance thin film vacuum gauge for tensioning a central diaphragm of the capacitance thin film vacuum gauge, according to some embodiments of the present application, comprising:

the capacitance thin film vacuum gauge diaphragm tensioning mechanism of the above embodiment for tensioning the center diaphragm by extending the ejector pin group 21;

the simulation module is used for simulating and calculating the simulation ejection information of the ejector rod group 21 required by the central diaphragm;

the hydraulic module is used for driving the ejector rod group 21 to extend out to tension the central diaphragm;

and the main control module is used for controlling the hydraulic module to output driving ejector rod groups 21 to stretch out to tension the central diaphragm according to the simulation ejection information, and controlling the hydraulic module to keep hydraulic pressure to perform pressure maintaining and shaping treatment on the central diaphragm when the central diaphragm is in a tensioning state.

According to the central diaphragm tensioning system of the capacitance film vacuum gauge, the hydraulic module is driven through the main control module to enable the ejector rod group 21 of the tensioning mechanism to stretch out to tension the central diaphragm, the specific ejection condition of the ejector rod group 21 is carried out based on the simulation ejection information of the simulation module, the central diaphragm reaches the preset tensioning force, and the central diaphragm can be effectively prevented from being pulled and exploded during tensioning.

Specifically, the simulated ejection information is ejection conditions required when the ejector rod group performs central membrane tensioning, such as ejection speed and ejection distance.

Specifically, the simulation module simulates the whole central diaphragm tensioning process in advance, and calculates simulation ejection information about the ejection condition of the ejector rod group 21 required by central diaphragm tensioning forming, the main control module controls the hydraulic module to provide appropriate hydraulic driving force based on the simulation ejection information so as to enable the ejector rods in the tensioning mechanism to eject out to tension the central diaphragm, the ejector rods are effectively ensured to be ejected in place so that the central diaphragm has a good tensioning forming effect, and the central diaphragm tensioning device has the advantages of high automation degree, large tensioning force range, controllable tensioning degree, uniform tensioning effect of each area of the central diaphragm and the like.

Specifically, the ejector rod group 21 is composed of ejector rods distributed in multiple circular rings, correspondingly, the hydraulic module is provided with a plurality of hydraulic assemblies, the number of the hydraulic assemblies is preferably consistent with the number of the circular rings, and therefore the ejector rods on different circular rings can be independently driven to eject, so that the ejector rods can be ejected from the middle to the outer ring one by one and are in contact with the central membrane to be tensioned, and the purposes of reducing stress concentration, improving the tolerance of the membrane and preventing the membrane from being pulled and exploded are achieved.

In some preferred embodiments, the device further comprises an online measurement module, which is used for online measurement of the actual ejection information of the ejector rod group 21; the main control module corrects the output condition of the hydraulic module based on the actual ejection information and the simulated ejection information.

Specifically, the main control module reads actual ejection information measured by the online measurement module in real time, compares the actual ejection information with the simulated ejection information, adjusts the hydraulic pressure of the hydraulic module in real time according to the difference value of the comparison result to change the ejection depth of the ejector rod group 21 in the tensioning mechanism, ensures that the ejector rod group 21 is ejected in place to ensure the tensioning effect of the central membrane, and avoids the damage to the central membrane caused by excessive ejection of the ejector rod group 21.

In some preferred embodiments, the online measuring module may detect the extension depth of the ejector rod set 21 to directly measure the actual ejection information of the ejector rod set 21, may measure the position of the hydraulic moving end of the hydraulic module to indirectly measure the actual ejection information of the ejector rod set 21, or may measure the hydraulic pressure of the hydraulic module to indirectly measure the actual ejection information of the ejector rod set 21.

In some preferred embodiments, the ejection control device further comprises an overflow module for performing overflow processing on the hydraulic module, and when the actual ejection information exceeds the simulated ejection information, the main control module controls the overflow module to perform overflow processing on the hydraulic module so that the actual ejection information is consistent with the simulated ejection information.

Specifically, when the main control module recognizes that the actual ejection information exceeds the simulated ejection information, that is, the surface ejector rod group 21 is excessively ejected, at this time, the main control module controls the overflow module to start and overflow the liquid in the hydraulic module, so that the ejector rod group 21 is compressed and reduced, and the ejector rod group 21 is retracted by using the elastic acting force of the central membrane, thereby avoiding that the central membrane is stabilized in a non-demand tensioning state due to the excessively long ejection time of the ejector rod group 21.

In some preferred embodiments, the simulated ejection information includes ejection distance information and ejection speed information.

Specifically, the ejection distance information is used for defining the ejection depth of the ejector rod group 21 when the central diaphragm is tensioned and protruded, the ejection speed information is used for defining the extension speed of the ejector rod group 21 in the tensioning process of the central diaphragm, and the two types of information are matched to define the motion condition of the ejector rod group 21 in the tensioning process, so that the tensioning process of the central diaphragm is ensured to be smoothly carried out.

More specifically, the actual ejection information is used to reflect the actual ejection of the ejector rod group 21, and includes an actual ejection distance corresponding to the ejection distance information in the simulated ejection information, and an actual ejection speed corresponding to the ejection speed information in the simulated ejection information.

In some preferred embodiments, the simulated ejection information further comprises dwell information; after the central membrane is tensioned and protruded, the central membrane needs to be kept in a tensioned state for a period of time to enable the shape of the central membrane to be formed and fixed, so that the ejector rod group 21 needs to be kept in an ejection state for a period of time after the central membrane is tensioned, and the pressure maintaining information defines the time for the hydraulic module to stably supply pressure when the central membrane is tensioned, namely the duration of the ejector rod group 21 in the ejection position.

In some preferred embodiments, the hydraulic module comprises an oil pump, a filter, a one-way valve, a throttle valve, a reversing valve and a hydraulic cylinder which are connected through oil passages, wherein the other end of the reversing valve is connected with an oil tank, the oil pump is connected with a motor for supplying pressure, and the hydraulic cylinder is used for driving the ejector rod group 21 of the tensioning mechanism to eject or withdraw.

The overflow module is an electromagnetic overflow valve and is arranged in the oil way, so that the hydraulic module can be prevented from supplying too large pressure.

Specifically, the main control module controls oil supply of the oil pump to boost pressure to enable the ejector rod group 21 to be ejected out, withdrawal of the ejector rod group 21 is achieved by switching a connection position of a hydraulic cylinder through a reversing valve and then supplying pressure, in addition, after the ejector rod group 21 is ejected excessively, the hydraulic cylinder connection mode needs to be switched through the reversing valve, and then an electromagnetic overflow valve is started to overflow under the condition of no pressure supply to avoid overlarge pressure supply.

In a third aspect, please refer to fig. 8, fig. 8 is a method for tensioning a central diaphragm of a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge according to some embodiments of the present application, where the method includes the following steps:

s1, acquiring simulation ejection information of the ejector rod group 21 required by the central membrane calculated by simulation;

s2, controlling the multipoint ejection mechanism 2 to tension the central membrane based on the simulation ejection information;

and S3, controlling the multi-point ejection mechanism 2 to keep the position under the tension state of the central membrane to perform pressure maintaining and shaping treatment on the central membrane.

According to the central membrane tensioning method, the ejector rod group 21 in the multi-point ejection mechanism 2 is controlled to eject quantitatively to tension the central membrane based on the acquired simulation ejection information, and then the central membrane is tensioned and formed stably through qualitative processing.

In some preferred embodiments, the step of controlling the multipoint ejection mechanism 2 to tension the central membrane based on the simulated ejection information includes acquiring actual ejection information of the ejector rod group 21, comparing the actual ejection information with the simulated ejection information, and adjusting and controlling the multipoint ejection mechanism 2 to tension the central membrane in real time according to a difference value of a comparison result, so as to ensure that the ejector rod group 21 is ejected in place, ensure the tensioning effect of the central membrane, and avoid damaging the central membrane due to excessive ejection.

Specifically, the process of controlling the multipoint ejection mechanism 2 to tension the central membrane based on the simulated ejection information in step S2 is as follows: and controlling the ejector rods in the ejector rod group to eject one by one from the middle to the outer ring based on the speed information, the distance information and the time sequence information in the simulation ejection information so as to tension the central membrane. The tensioning process can effectively reduce stress concentration, thereby improving the tolerance of the diaphragm and effectively preventing the diaphragm from being pulled and exploded.

In a fourth aspect, please refer to fig. 9, fig. 9 is a central diaphragm tensioning apparatus of a diaphragm tensioning mechanism of a capacitance thin film vacuum gauge according to some embodiments of the present application, including:

the acquisition module is used for acquiring simulation ejection information of the ejector rod group 21 required by the central membrane calculated by simulation;

the sending module is used for sending hydraulic control information based on the simulation ejection information obtained by the obtaining module so as to drive the multipoint ejection mechanism 2 to tension the central membrane;

and the holding module sends out holding information to control the multi-point ejection mechanism 2 to hold the position when the central membrane is in a tensioning state so as to carry out pressure-maintaining and shaping treatment on the central membrane.

According to the central membrane tensioning method, the simulation ejection information is acquired based on the acquisition module, then the sending module is used for sending the control information to control the ejector rod group 21 in the multipoint ejection mechanism 2 to eject quantitatively so as to tension the central membrane, and then the maintaining module is used for sending the maintaining information to perform pressure maintaining and shaping processing on the central membrane, so that the central membrane is stable in tensioning and forming, and the method has the advantages of accurate and controllable tensioning force, uniform tensioning effect of each area of the central membrane and the like.

Specifically, the hydraulic control information is a control command for controlling the output of the hydraulic module.

Specifically, the holding information is a control instruction for controlling the hydraulic module to output for a certain time while maintaining the hydraulic pressure.

In some preferred embodiments, the method further comprises:

the measuring module is used for acquiring actual ejection information of the ejector rod group 21 on line;

and the comparison module is used for comparing the actual ejection information with the simulation ejection information.

Specifically, the tensioning device of the embodiment of the application obtains the actual ejection information of the ejector rod group 21 through the measuring module, compares the actual ejection information with the simulation ejection information through the comparing module, adjusts and controls the multi-point ejection mechanism 2 to tension the central membrane in real time according to the difference value of the comparison result, ensures that the ejector rod group 21 is ejected in place, ensures the tensioning effect of the central membrane, and avoids damaging the central membrane due to excessive ejection.

In order to more clearly reflect the advantages and disadvantages of the diaphragm tensioning mechanism, system, method and device of the thin film capacitance gauge according to the embodiments of the present application and the existing diaphragm tensioning method, the embodiments of the present application are based on a finite element analysis method, and a Deform software is used to perform simulation analysis as shown in FIGS. 10-13 on the existing diaphragm tensioning process and the tensioning process of the diaphragm tensioning mechanism, system, method and device of the thin film capacitance gauge according to the embodiments of the present application.

Specifically, in the simulation analysis process, in order to meet the analysis requirement of the Deform software, the following assumptions are made:

1. assuming that an upper pressing ring, a lower pressing ring and a tensioning ring are rigid bodies;

2. assuming that the membrane is uniformly stressed, the aim is to simplify the model;

3. assuming that the materials of the membranes are uniformly distributed, the thickness of the membranes is 0.25 mu m, and the diameter of the membranes is 80 mm;

4. as shown in fig. 10, the membrane stress is assumed to be a two-dimensional axisymmetric model, in order to improve the calculation efficiency.

Based on the above assumption, a simulation model is established in the Deform software, and then simulation of tensioning the diaphragm by the existing tensioning device and the tensioning mechanism of the embodiment of the application is performed respectively, wherein in the simulation process, the ejector rod group in the tensioning mechanism of the embodiment of the application is designed by three rings of ejector rods so as to simplify the calculation process.

In the simulation process, the three rings of ejector rods of the tensioning mechanism of the embodiment of the application stagger the tensioning time, namely the middle ring ejector rod starts to eject after the inner ring ejector rod is ejected to a set distance, the outer ring ejector rod starts to eject after the middle ring ejector rod is ejected to the set distance, and the three rings of ejector rods are ejected by the same distance. The ejector rod of the outermost ring is consistent with the position of the tensioning ring of the traditional tensioning method so as to ensure the reliability of control variables and results, and meanwhile, parameters such as friction force, pressing speed, pressing distance and the like of the existing tensioning device and the tensioning mechanism of the embodiment of the application are required to be consistent, so that the final finite element stress analysis result is shown in figures 11-12.

Referring to fig. 11-12, the existing tension device generates a significantly concentrated stress up to 516MPa when the diaphragm is tensioned, while the stress of the tension mechanism of the embodiment of the present application is up to 433MPa during tensioning. Therefore, under the same parameter condition, when the straining device of this application embodiment was used for tensioning the diaphragm, can effectively reduce stress concentration to improve the tolerance of diaphragm, effectively prevent that the diaphragm from being pulled and exploded.

In order to further analyze the stress condition of the diaphragm, the stress analysis results of the two tensioning modes are further analyzed respectively: in the horizontal direction of the diaphragm, the stress values from the leftmost end (the central position of the diaphragm) to the position where the diaphragm is in contact with the outside of the tension ring are measured for 100 uniformly arranged reference points, and then the stress values for each 10 reference points are averaged to obtain the following table:

TABLE 1 stress value distribution and its dispersion degree when tensioning a conventional tensioning device and a tensioning mechanism of the embodiment of the present application

	#1	#2	#3	#4	#5	#6	#7	#8	#9	#10	Extreme difference	Standard deviation of
													Existing tensioner	153.68	154.43	156.19	160.49	157.30	157.80	157.96	158.40	159.00	197.80	44.11	12.31
This application	143.32	143.32	143.32	143.32	143.32	143.32	143.33	143.37	143.94	178.55	35.22	10.54

As can be seen from the above table, the range and standard deviation of the conventional tensioning device are 44.11 and 12.31, respectively, while the range and standard deviation of the tensioning mechanism of the embodiment of the present application are 35.22 and 10.5, respectively. In statistics, the dispersion degree of a group of data is generally measured by a standard deviation and a range difference, so that the simulation result can reflect the uniformity of the tension distribution of each position inside the diaphragm, and therefore, the tensioning mechanism of the embodiment of the application has more uniform distribution of the radial stress generated by the diaphragm compared with the existing tensioning device when used for tensioning the diaphragm. In summary, the embodiment of the present application provides a diaphragm tensioning mechanism, a system, a method and a device for a capacitance film vacuum gauge, wherein the tensioning mechanism performs tensioning on a central diaphragm by ejecting a central diaphragm through an ejector rod group 21 of a multipoint ejection mechanism 2, so that the central diaphragm reaches a predetermined tensioning force, and the tensioning mechanism has the advantages of controllable tensioning degree, uniform tensioning effect in each area of the central diaphragm, and the like; in addition, the central membrane is tensioned by adopting the structure of the ejector rod group 21, so that the central membrane is only acted by the action force in the ejection direction of the ejector rod group 21, and the central membrane can be effectively prevented from being pulled and exploded when tensioned.

In the embodiments provided in the present application, it should be understood that the disclosed apparatus and method may be implemented in other ways. The above-described embodiments of the apparatus are merely illustrative, and for example, the division of the units is only one logical division, and there may be other divisions when actually implemented, and for example, a plurality of units or components may be combined or integrated into another system, or some features may be omitted, or not executed. In addition, the shown or discussed mutual coupling or direct coupling or communication connection may be an indirect coupling or communication connection of devices or units through some communication interfaces, and may be in an electrical, mechanical or other form.

In addition, units described as separate parts may or may not be physically separate, and parts displayed as units may or may not be physical units, may be located in one place, or may be distributed on a plurality of network units. Some or all of the units can be selected according to actual needs to achieve the purpose of the solution of the embodiment.

Furthermore, the functional modules in the embodiments of the present application may be integrated together to form an independent part, or each module may exist separately, or two or more modules may be integrated to form an independent part.

In this document, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions.

The above description is only an example of the present application and is not intended to limit the scope of the present application, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, improvement and the like made within the spirit and principle of the present application shall be included in the protection scope of the present application.