阅读说明：本技术 用于cvd设备的方法及相应的cvd设备 (Method for a CVD system and corresponding CVD system ) 是由 吴科俊 陈金元 胡宏逵 于 2020-08-05 设计创作，主要内容包括：本发明提供用于CVD设备的方法及相应的CVD设备。所述方法首先将托盘的温度控制成不高于第一预设温度,并将完成制绒清洗的硅片放置到所述托盘中；然后将承载有硅片的托盘传送至CVD设备的CVD反应腔,并在所述CVD反应腔中通过CVD工艺在硅片上形成CVD膜；接着将承载有完成CVD工艺的硅片的托盘传送出CVD反应腔。本发明能有效抑制太阳能电池制造中因托盘温度过高导致的硅片边缘氧化及电池黑边现象,能有效提高电池良率和推动太阳能电池的量产化进程。(The invention provides a method for a CVD apparatus and a corresponding CVD apparatus. The method comprises the steps of firstly, controlling the temperature of a tray to be not higher than a first preset temperature, and placing a silicon wafer which is subjected to texturing cleaning into the tray; then conveying the tray carrying the silicon wafer to a CVD reaction cavity of CVD equipment, and forming a CVD film on the silicon wafer in the CVD reaction cavity through a CVD process; and then conveying the tray carrying the silicon wafers which are subjected to the CVD process out of the CVD reaction chamber. The invention can effectively inhibit the phenomena of silicon chip edge oxidation and battery black edge caused by overhigh tray temperature in the manufacturing process of the solar battery, can effectively improve the yield of the battery and can promote the mass production process of the solar battery.)

1. A method for a CVD apparatus comprising a CVD reaction chamber, the method comprising the steps of:

(a) controlling the temperature of the tray to be not higher than a first preset temperature, and placing the silicon wafer subjected to texturing cleaning into the tray;

(b) conveying the tray loaded with the silicon wafer to a CVD reaction cavity of the CVD equipment, and forming a CVD film on the silicon wafer in the CVD reaction cavity through a CVD process; and

(c) and conveying the tray loaded with the silicon wafer which finishes the CVD process out of the CVD reaction chamber.

2. The method according to claim 1, characterized in that the method further comprises the steps of: (d) controlling the temperature of the tray which is conveyed out of the CVD reaction chamber and unloaded with the silicon wafer to be not higher than a second preset temperature; wherein the first preset temperature is in the range of 145-155 ℃, the second preset temperature is equal to the sum of the first preset temperature and the cooling amplitude of the process that the tray returns to the feeding module from the blanking module, and the cooling amplitude is 10-30 ℃.

3. The method of claim 2, wherein the controlling the tray temperature to be no higher than the first preset temperature in step (a) and the controlling the tray temperature to be no higher than the second preset temperature in step (d) each comprises the steps of:

(ad0) measuring the temperature of the tray on a front section of a feeding module or a rear section of a discharging module for transferring the tray;

(ad1) judging whether the temperature of the tray is higher than a first preset temperature or a second preset temperature, if so, performing the step (ad2), and if not, returning to the step (ad 0); and

(ad2) correspondingly controlling the temperature of the tray to be not higher than the first preset temperature or the second preset temperature by blowing air, nitrogen or inert gas at normal temperature or lower.

4. The method of claim 3, wherein the trays are conveyed on the front stage of the loading module and the rear stage of the loading module before being conveyed to the CVD reaction chamber, and wherein the temperature of the trays is measured by a plurality of first thermometric modules disposed in the front stage of the loading module in step (ad0), and wherein the temperature of the trays is controlled to be not higher than the first preset temperature before the trays leave the front stage of the loading module by purging the trays with normal or lower temperature air, nitrogen, or an inert gas in step (ad2).

5. The method of claim 3, wherein after said trays are conveyed out of said CVD reaction chamber, said trays are conveyed on a front stage of said blanking module and a rear stage of said blanking module, and wherein in step (ad0) the temperature of said trays is measured by a plurality of second thermometric modules disposed in said rear stage of said blanking module, and in step (ad2) the temperature of said trays is controlled to be no higher than said second predetermined temperature before they leave said rear stage of said blanking module by purging said trays with ambient or lower temperature air, nitrogen or inert gas.

6. The method according to claim 4, wherein the first temperature measuring module and the second temperature measuring module are used for measuring the temperature in the middle area of the tray, and are respectively arranged in the middle of the front section of the feeding module and the middle of the rear section of the discharging module; in step (ad2), the temperature of the tray near the carrying surface is only reduced by blowing air, nitrogen or inert gas with normal temperature or lower temperature on the carrying surface of the tray for carrying the silicon wafer, and the temperature of the other side of the tray opposite to the carrying surface is kept unchanged basically.

7. A CVD apparatus, comprising:

a CVD reaction chamber for performing a CVD process to form a CVD film on a silicon wafer disposed therein;

the feeding module is connected with one side of the CVD reaction cavity and used for conveying the tray bearing the silicon wafers to the CVD reaction cavity, and the feeding module comprises a feeding module front section and a feeding module rear section;

the first temperature measurement module is arranged on the front section of the feeding module and used for measuring the temperature of the tray conveyed by the feeding module; and

and the first cooling module is arranged on the front section of the feeding module and used for reducing the temperature of the tray to be not higher than a first preset temperature before the tray leaves the front section of the feeding module when the temperature of the tray measured by the temperature measuring module is higher than the first preset temperature.

8. The CVD apparatus of claim 7, further comprising:

the blanking module is arranged on the other side, opposite to the feeding module, of the CVD reaction cavity and comprises a front blanking module section and a rear blanking module section;

the second temperature measuring module is arranged on the rear section of the blanking module and used for measuring the temperature of the tray conveyed on the rear section of the blanking module; and

and the second cooling module is arranged on the rear section of the blanking module and used for reducing the temperature of the tray measured by the second temperature measuring module to be not higher than a second preset temperature before the tray leaves the rear section of the blanking module when the temperature of the tray is higher than the second preset temperature, wherein the second preset temperature is equal to the sum of the first preset temperature and the cooling amplitude of the process that the tray returns to the feeding module from the blanking module, and the cooling amplitude is 10-30 ℃.

9. The CVD apparatus according to claim 8, wherein the first preset temperature is in a range of 145 ℃ to 155 ℃, the first temperature measurement module and the second temperature measurement module are respectively and correspondingly arranged in the middle of the front section of the feeding module and the middle of the rear section of the discharging module, and both the first temperature measurement module and the second temperature measurement module are used for measuring the temperature of the middle area of the tray.

10. The CVD apparatus according to claim 8, wherein the first and second cool-down modules each cool down the tray to not higher than the first and second preset temperatures by uniformly blowing clean, dry, oil-free air, nitrogen or inert gas at normal or lower temperature, respectively.

Technical Field

The invention relates to the field of solar cell manufacturing, in particular to a method for a CVD device and a corresponding CVD device.

Background

In the manufacturing process of the heterojunction solar cell, amorphous silicon is deposited on the surface of a monocrystalline silicon wafer through a vapor deposition (CVD) technology to form a PN junction, and the yield of the cell is particularly easily interfered by the external environment. The black edge of the battery is an important factor influencing the yield of the heterojunction solar battery, and when the battery is detected by an Electroluminescent (EL) instrument, the black edge of the battery shows that the battery has different degrees of blackening at the edge, the edge area has more defects, and the current carriers are seriously compounded.

The generation of black edges in heterojunction solar cells has been mistaken for the following reasons: because the edge of the silicon wafer is tilted, a large gap exists between the silicon wafer and the carrier plate, and the doping layer is deposited on the edge of the silicon wafer which is not deposited beyond the gap. However, in actual production, even with continuous optimization of the silicon wafer tray and the automation device, the black edge problem still exists and occasionally the ratio is high. The black edge problem of the battery always restricts the improvement of the yield of the solar battery.

It has been found through long-term research that another major source of battery black edge is: the edge of the clean silicon wafer is abnormally oxidized due to the reason that the temperature of the tray is overhigh and the like before the clean silicon wafer enters the CVD equipment to deposit the amorphous silicon, and the edge oxide layer can cause serious carrier recombination in the edge area of the battery and cause the problem of battery black edge.

Therefore, how to provide a method for a CVD apparatus and a corresponding CVD apparatus to solve the problem of battery black edge caused by silicon wafer edge oxidation has become a technical problem to be solved in the industry.

Disclosure of Invention

In view of the above problems of the prior art, the present invention proposes a method for a CVD apparatus including a CVD reaction chamber, the method comprising the steps of: (a) controlling the temperature of the tray to be not higher than a first preset temperature, and placing the silicon wafer subjected to texturing cleaning into the tray; (b) conveying the tray bearing the silicon wafer to a CVD reaction cavity of a CVD device, and forming a CVD film on the silicon wafer in the CVD reaction cavity through a CVD process; and (c) conveying the tray loaded with the silicon wafer which completes the CVD process out of the CVD reaction chamber.

The method further comprises the steps of: (d) controlling the temperature of the tray which is conveyed out of the CVD reaction chamber and unloaded with the silicon wafer to be not higher than a second preset temperature; wherein the first preset temperature is in the range of 145-155 ℃, the second preset temperature is equal to the sum of the first preset temperature and the cooling amplitude of the process that the tray returns to the feeding module from the blanking module, and the cooling amplitude is 10-30 ℃.

In an embodiment, the controlling the tray temperature to be not higher than the first preset temperature in the step (a) and the controlling the tray temperature to be not higher than the second preset temperature in the step (d) each include the following steps: (ad0) measuring the temperature of the tray on a front section of a feeding module or a rear section of a discharging module for transferring the tray; (ad1) judging whether the temperature of the tray is higher than a first preset temperature or a second preset temperature, if so, performing the step (ad2), and if not, returning to the step (ad 0); and (ad2) correspondingly controlling the temperature of the tray to be not higher than the first preset temperature or the second preset temperature by blowing air, nitrogen or inert gas at normal temperature or lower.

In one embodiment, the trays are transported on the front loading module section and the rear loading module section before being transported to the CVD reaction chamber, the temperature of the trays is measured by a plurality of first thermometric modules disposed in the front loading module section in step (ad0), and the temperature of the trays is controlled to be not higher than the first preset temperature before the trays leave the front loading module section by purging the trays with air, nitrogen or inert gas at normal or lower temperature in step (ad2).

In one embodiment, after the tray is transferred out of the CVD reaction chamber, the tray is transferred on the front and rear stages of the unloading module, and in step (ad0), the temperature of the tray is measured by a plurality of second temperature measuring modules disposed in the rear stage of the unloading module, and in step (ad2), the temperature of the tray is controlled to be not higher than the second preset temperature before the tray leaves the rear stage of the unloading module by purging the tray with normal or lower temperature air, nitrogen, or inert gas.

In an embodiment, the first temperature measuring module and the second temperature measuring module both measure the temperature in the middle region of the tray, and the first temperature measuring module and the second temperature measuring module are respectively arranged in the middle of the front section of the feeding module and the middle of the rear section of the discharging module.

In one embodiment, in step (ad2), the temperature of the tray near the carrying surface is reduced by purging the carrying surface of the tray for carrying the silicon wafer with air, nitrogen or inert gas at normal temperature or lower, while the temperature of the other side of the tray opposite to the carrying surface is maintained substantially constant.

The present invention also provides a CVD apparatus, comprising: a CVD reaction chamber for performing a CVD process to form a CVD film on a silicon wafer disposed therein; the feeding module is connected with one side of the CVD reaction cavity and used for conveying the tray bearing the silicon wafers to the CVD reaction cavity, and the feeding module comprises a feeding module front section and a feeding module rear section; the first temperature measurement module is arranged on the front section of the feeding module and used for measuring the temperature of the tray conveyed by the feeding module; and the first cooling module is arranged on the front section of the feeding module and used for reducing the temperature of the tray to be not higher than a first preset temperature before the tray leaves the front section of the feeding module when the temperature of the tray measured by the temperature measuring module is higher than the first preset temperature.

In one embodiment, the CVD apparatus further comprises: the blanking module is arranged on the other side, opposite to the feeding module, of the CVD reaction cavity and comprises a front blanking module section and a rear blanking module section; the second temperature measuring module is arranged on the rear section of the blanking module and used for measuring the temperature of the tray conveyed on the rear section of the blanking module; and the second cooling module is arranged on the rear section of the blanking module and used for reducing the temperature of the tray measured by the second temperature measuring module to be not higher than a second preset temperature before the tray leaves the rear section of the blanking module when the temperature of the tray is higher than the second preset temperature, wherein the second preset temperature is equal to the sum of the first preset temperature and the cooling amplitude of the process that the tray returns to the feeding module from the blanking module, and the cooling amplitude is 10-30 ℃.

In an embodiment, the first preset temperature is in a range of 145 ℃ to 155 ℃, the first temperature measuring module and the second temperature measuring module are respectively and correspondingly arranged in the middle of the front section of the feeding module and the middle of the rear section of the discharging module, and both the first temperature measuring module and the second temperature measuring module are used for measuring the temperature of the middle area of the tray.

In an embodiment, the first cooling module and the second cooling module both uniformly blow clean, dry, oil-free air, nitrogen or inert gas at normal temperature or lower temperature to the tray to reduce the temperature thereof to not higher than the first preset temperature and the second preset temperature, respectively.

Compared with the prior art that battery black edges are serious due to the fact that the temperature of a tray in contact with a silicon wafer is not controlled, the method for the CVD equipment firstly controls the temperature of the tray to be not higher than a first preset temperature, and the silicon wafer which is subjected to texturing cleaning is placed in the tray; then conveying the tray carrying the silicon wafer to the CVD reaction cavity, and forming a CVD film on the silicon wafer in the CVD reaction cavity through a CVD process; and finally, conveying the tray loaded with the silicon wafer which finishes the CVD process out of the CVD reaction chamber. The invention can effectively inhibit the phenomena of silicon chip edge oxidation and battery black edge caused by overhigh tray temperature in the manufacturing process of the solar battery, can effectively improve the yield of the battery and can promote the mass production process of the solar battery.

Drawings

The above features and advantages of the present disclosure will be better understood upon reading the detailed description of embodiments of the disclosure in conjunction with the following drawings. In the drawings, components are not necessarily drawn to scale, and components having similar relative characteristics or features may have the same or similar reference numerals.

FIG. 1 is a schematic view of the constitution of a CVD apparatus according to the present invention.

FIG. 2 is a schematic flow diagram of a method for a CVD apparatus.

Fig. 3 is a schematic view of a process for controlling the temperature of the tray to be not higher than a preset temperature.

Detailed description of the preferred embodiments

The invention will be described in detail below with reference to the accompanying drawings and specific embodiments so that the objects, features and advantages of the invention can be more clearly understood. It should be understood that the aspects described below in connection with the figures and the specific embodiments are exemplary only, and should not be construed as limiting the scope of the invention in any way. The singular forms "a", "an" and "the" include plural referents unless the context clearly dictates otherwise.

Referring to fig. 1, there is shown a schematic view of the constitution of an embodiment of a CVD apparatus 1 of the present invention. As shown in fig. 1, a CVD apparatus 1 includes a CVD reaction chamber 10, a feeding module 11, a first temperature measuring module 12, a first temperature reducing module 13, and a discharging module 14.

The CVD reaction chamber 10 is used to perform a CVD process to form a CVD thin film on a silicon wafer disposed therein. In some embodiments, the CVD chamber 10 is a Plasma Enhanced Chemical Vapor Deposition (PECVD) chamber.

The feeding module 11 is connected with one side of the CVD reaction cavity 10 and used for conveying a tray bearing silicon wafers to the CVD reaction cavity 10, the feeding module 11 comprises a feeding module front section 110 and a feeding module rear section 112, the tray 2 does not load the silicon wafers on the feeding module front section 110, temperature detection and temperature control are carried out, and the silicon wafers are loaded on the tray 2 on the feeding module rear section 112. Such as 125mm x 125mm, 156mm x 156mm, 166mm x 166mm or 210mm x 210mm, the size of the tray 2 may be, for example, 1.1m x 1.3m, etc. The tray can be made of graphite, aluminum, stainless steel, ceramics, glass and the like.

In the embodiment shown in fig. 1, the rear loading module section 112 is used for transferring the tray 2 carrying the silicon wafers to the CVD chamber 10, the rear loading module section 112 may transfer the tray 2 to the CVD chamber 10 by means commonly used in the art, such as a robot arm, a roller, a belt, etc., and the front loading module section 110 may also transfer the tray 2 by using a similar robot arm, a roller, a belt, etc.

The first temperature measurement module 12 is disposed on the feeding module front section 110, and is configured to measure the temperature of the pallet 2 conveyed by the first temperature measurement module. The first temperature measurement module 12 includes a plurality of first temperature measurement units 120, the plurality of first temperature measurement units 120 are disposed in the loading module front section 110, and the specific number of the first temperature measurement units 120 can be determined according to specific situations. In some embodiments, because the heat dissipation of the middle position of the tray 2 is slower, the temperature of the middle part of the tray can more accurately reflect the temperature control effect of the whole tray, the first temperature measurement module 12 is correspondingly arranged in the middle of the front section 11 of the feeding module, and the first temperature measurement module 12 is used for measuring the temperature of the middle area of the passing tray 2.

First cooling module 13 sets up on material loading module anterior segment 110 for when the tray temperature that first temperature measurement module 12 measured is higher than first preset temperature, it is not higher than first preset temperature to reduce tray 2 temperature before tray 2 leaves material loading module anterior segment 110, make tray 2 with after reducing, the temperature that is not higher than first preset temperature gets into unloading module back end 112, thereby can avoid making the silicon chip edge of contact with it by the oxidation because of tray 2 temperature is higher than first preset temperature. The first cooling module 13 may include a plurality of first cooling units 130, and the specific number of the first cooling units may be determined according to specific situations. The first preset temperature can be in the range of 145-155 ℃, and when the temperature of the tray 2 exceeds the first preset temperature, the edge of the silicon wafer contacted with the tray is oxidized and generates a black edge phenomenon. The first cooling module 13 cools the tray 2 to a first preset temperature by uniformly blowing clean, dry, oil-free air, nitrogen or inert gas at normal temperature or lower. The inert gas may be argon or helium. First cooling module 13 not only can make 2 surperficial cooling of tray, can also clear away tray surface impurity simultaneously, guarantees tray surface cleanliness factor.

With continued reference to fig. 1, the CVD apparatus 1 may further include a second temperature measurement module 15 and a second temperature reduction module 16 for the rear section 142 of the blanking module, in addition to the first temperature measurement module 12 and the first temperature reduction module 13 for the front section 110 of the feeding module.

The blanking module 14 is arranged on the other side of the CVD reaction chamber 10 opposite to the feeding module 11 and used for conveying the tray 2 from the CVD reaction chamber 10, and the blanking module 14 comprises a front blanking module section 140 and a rear blanking module section 142. The silicon wafer is taken out from the tray 2 at the end of the front section 140 of the blanking module, and the tray 2 which does not bear the silicon wafer enters the rear section 142 of the blanking module. The front and rear blanking module sections 140 and 142 can convey trays 2 from the CVD reactor chamber 10 by means commonly used in the art, such as robotic arms or rollers or belts.

The second temperature measuring module 15 is disposed in the rear section 142 of the blanking module and is used for measuring the temperature of the tray 2 conveyed by the second temperature measuring module. The second temperature measuring module 15 includes a plurality of second temperature measuring units 150 disposed in the rear section 142 of the blanking module, and the specific number of the second temperature measuring units 150 can be determined according to specific situations. In some embodiments, because the heat dissipation of the middle portion of the tray 2 is slower, the temperature of the middle portion of the tray can more accurately reflect the temperature control effect of the whole tray, the second temperature measurement module 15 is correspondingly arranged in the middle of the rear section 142 of the blanking module, and the second temperature measurement module 15 is used for measuring the temperature of the middle area of the tray 2.

The second temperature-reducing module 16 is disposed on the rear section 142 of the blanking module, and is configured to reduce the temperature of the tray 2 to be not higher than a second preset temperature before the tray 2 leaves the rear section of the blanking module when the temperature of the tray measured by the second temperature-measuring module 15 is higher than the second preset temperature. The second cooling module 16 may include a plurality of second cooling units 160, and the specific number of the cooling units 160 may be determined according to specific situations. The second preset temperature is equal to the sum of the first preset temperature and the cooling amplitude of the process that the tray returns to the front section 110 of the feeding module from the rear section 142 of the blanking module, the cooling amplitude is 10-30 ℃, and the second preset temperature can be in the range of 155-185 ℃ for example. The cooling pressure of the first cooling module 13 can be effectively relieved through the second cooling module 16, so that the first cooling module 13 can more quickly and efficiently reduce the temperature of the tray exceeding the first preset temperature to be not higher than the first preset temperature.

The second cooling module 16 cools the temperature of the tray 2 to a second preset temperature before leaving the rear section 142 of the blanking module by uniformly blowing clean, dry, oil-free, ambient or lower temperature air, nitrogen or inert gas over the tray. The second cooling module 16 can not only cool the surface of the tray 2, but also remove impurities on the surface of the tray, thereby ensuring the surface cleanliness of the tray.

In other embodiments of the present invention, in addition to the temperature measuring module and the temperature reducing module corresponding to the front section 110 of the feeding module and the rear section 142 of the discharging module, the CVD apparatus 1 may further include a third temperature measuring module and a third temperature reducing module corresponding to the tray returning module (not shown) for returning the tray 2 from the discharging module 14 to the feeding module 11, so as to control the temperature of the tray in the tray returning module to be not higher than a third preset temperature, where the third preset temperature is higher than the first preset temperature and lower than the second preset temperature, and the third preset temperature is equal to the sum of the first preset temperature and the temperature reducing range of the tray in the process of returning from the returning module to the feeding module, and the temperature reducing range is 5 ℃ to 15 ℃. The third temperature measurement module and the third temperature reduction module are arranged to further relieve the temperature reduction pressure of the first temperature reduction module 13, and the phenomena of silicon wafer edge oxidation and battery black edge caused by overhigh temperature of the tray on the front section 110 of the feeding module are avoided.

Referring to fig. 2 showing a flow chart of a first embodiment of the method for a CVD apparatus according to the present invention, wherein the CVD apparatus may be the CVD apparatus 1 including the CVD reaction chamber 10 as shown in fig. 1, the method 20 first performs step S200 of measuring the temperature of the tray 2 on the front section 110 of the loading module 11 for transferring the tray 2 to the CVD reaction chamber 10. Referring to fig. 1, before the trays 2 are transferred into the CVD reaction chamber 10, the trays 2 are transferred on the front section 110 and the rear section 112 of the loading module, and step S210 measures the temperature of the trays 2 through a plurality of first temperature measuring modules 12 disposed in the front section 110 of the loading module, and the first temperature measuring modules 12 may be correspondingly disposed in the middle of the front section 110 of the loading module to measure the temperature in the middle of the trays 2.

The method 20 then proceeds to step S210, where it is determined whether the temperature of the tray 2 is higher than a first preset temperature, if so, step S220 is performed, otherwise, the method returns to step S200.

In step S220, the temperature of the tray 2 is controlled to be not higher than the first preset temperature before the tray leaves the front section 110 of the loading module by purging the tray with air, nitrogen or inert gas at normal temperature or lower. Step S220 may be performed by uniformly blowing clean, dry, oil-free air, nitrogen or inert gas at normal temperature or lower temperature to the tray 2 through the first temperature reduction module 13 of fig. 1 to reduce the temperature thereof to the first preset temperature. The inert gas may be argon or helium. Purging normal-temperature or lower-temperature air, nitrogen or inert gas to the tray 2 in the step S220 not only can play a role of cooling, but also can remove impurities on the surface of the tray, thereby ensuring the surface cleanliness of the tray.

In this embodiment, the first predetermined temperature is in the range of 145 ℃ to 155 ℃. In other embodiments, the first predetermined temperature may be specifically adjusted according to the clean room environment, the material of the tray, and the thickness of the silicon wafer, for example, to 165 ℃ or 135 ℃.

The method 20 proceeds to step S230 after step S220, and the silicon wafer after the texturing cleaning is placed on the tray 2 at the rear section 112 of the loading module, as described above, and the silicon wafer is not loaded on the tray 2 at the front section 110 of the loading module, but is loaded on the tray 2 at the rear section 112 of the loading module.

In step S230, the silicon wafer may be placed in the tray 2 by a conventional means such as a chuck or a robot, which are commonly used in the art.

The method 20 then proceeds to step S240, where the tray 2 carrying the silicon wafer is conveyed into the CVD reaction chamber 10, and a CVD film is formed on the silicon wafer by a CVD process in the CVD reaction chamber 10. In step S240, the silicon wafer may be transferred into the CVD reaction chamber 10 by a conventional means such as a conveyor or a robot, which is commonly used in the art.

In the present embodiment, the CVD reaction chamber 10 is a PECVD reaction chamber, the CVD film is a P-type amorphous silicon film, an N-type amorphous silicon film, an intrinsic amorphous silicon film or a combination of the P-type amorphous silicon film, the N-type amorphous silicon film and the intrinsic amorphous silicon film of the heterojunction solar cell, and the CVD process is a PECVD process capable of generating a corresponding CVD film.

The method 20 then proceeds to step S250, where the tray 2 carrying the silicon wafer having completed the CVD process is conveyed out of the CVD reaction chamber 10. In step S250, the silicon wafer may be transferred out of the CVD reaction chamber 10 by a conventional means such as a conveyor or a robot, which is commonly used in the art.

Referring to fig. 3, fig. 3 shows a flow chart of a second embodiment of the method for a CVD apparatus of the invention, steps S200 to S250 of the method 30 being identical to those of the method 20 shown in fig. 2, the method 30 in fig. 3 being different from the method 20 in fig. 2 in that the method 30 also measures and controls the temperature of the tray conveyed by the blanking module after step S250.

Specifically, the method 30 further proceeds to step S260 after step S250, receives the tray 2 carrying the silicon wafers from the CVD reaction chamber 10 by the front stage of the material discharging module 140, and completes unloading of the silicon wafers on the tray 2 before the tray leaves the front stage of the material discharging module 140.

The method 30 continues with step S270 of measuring the temperature of the tray 2 on the blanking module rear section 142 for conveying the tray 2 from the blanking module front section 140. Referring to fig. 1, after the tray 2 is transferred out of the CVD reaction chamber 10, the tray 2 is transferred on the feeding module front section 140 and the feeding module rear section 142, and step S260 measures the temperature of the tray 2 through a plurality of second temperature measuring modules 15 disposed in the feeding module rear section 142, the second temperature measuring modules 15 being correspondingly disposed in the middle of the feeding module rear section 142 to perform temperature measurement in the middle surface area of the tray 2.

The method 30 continues with step S280, and determines whether the temperature of the tray 2 is higher than the second preset temperature, if so, step S290 is performed, otherwise, step S270 is returned to.

In step S290, the temperature of the tray 2 is controlled to be not higher than the second preset temperature before the tray 2 leaves the rear section 142 of the blanking module by purging the tray 2 with air, nitrogen or inert gas at normal temperature or lower. The second preset temperature is equal to the sum of the first preset temperature and the cooling amplitude of the tray in the process of returning from the blanking module to the feeding module, and the cooling amplitude is 10-30 ℃. In step S290, the tray may be uniformly purged with clean, dry, oil-free air, nitrogen or inert gas at normal temperature or lower temperature by the second cooling module 16 of fig. 1 to reduce the temperature thereof to the second preset temperature or below. Purging normal-temperature or lower-temperature air, nitrogen or inert gas to the tray 2 in the step S290 not only can play a role of cooling, but also can remove impurities on the surface of the tray, thereby ensuring the surface cleanliness of the tray.

In this embodiment, the second preset temperature may be in the range of 155 ℃ to 185 ℃. The purpose of controlling the temperature of the tray 2 to be not higher than the second preset temperature in step S290 is to: the cooling pressure for controlling the temperature of the tray 2 to be not higher than the first preset temperature in the step S220 is reduced, so that the temperature of the tray 2 conveyed on the rear section 112 of the feeding module is not higher than the first preset temperature, and the edge oxidation and the corresponding black edge phenomenon of the silicon wafer generated thereby are avoided.

Aiming at the situation that the tray temperature is controlled to be not higher than the first preset temperature and the second preset temperature in the steps S220 and S290, because the tray 2 needs to be heated after subsequently entering the CVD reaction cavity 10 after being cooled, the first cooling module 13 or the second cooling module 16 can only reduce the temperature of the tray near the bearing surface by blowing air, nitrogen or inert gas with normal temperature or lower temperature on the bearing surface of the tray 2 for bearing the silicon wafer, and the temperature of the other surface of the tray opposite to the bearing surface is basically kept unchanged, so that the temperature of the tray can be quickly heated after the pushing tray enters the CVD reaction cavity.

The method for the CVD equipment firstly controls the temperature of a tray to be not higher than a first preset temperature, and places a silicon wafer which is subjected to texturing cleaning into the tray; then conveying the tray loaded with the silicon wafer into the CVD reaction cavity, and forming a CVD film on the silicon wafer in the CVD reaction cavity through a CVD process; and finally, conveying the tray loaded with the silicon wafer which finishes the CVD process out of the CVD reaction chamber. The invention can effectively inhibit the phenomena of silicon chip edge oxidation and battery black edge caused by overhigh tray temperature in the manufacturing process of the solar battery, can effectively improve the yield of the battery and can promote the mass production process of the solar battery.

The embodiments described above are provided to enable persons skilled in the art to make or use the invention and that modifications or variations can be made to the embodiments described above by persons skilled in the art without departing from the inventive concept of the present invention, so that the scope of protection of the present invention is not limited by the embodiments described above but should be accorded the widest scope consistent with the innovative features set forth in the claims.