阅读说明：本技术 一种功能陶瓷片的湿式洁片装置 (Wet-type cleaning device for functional ceramic wafer ) 是由 孙鑫 庞驰 祝飞 费自豪 王卫 杨靖 葛鹏 于 2021-08-26 设计创作，主要内容包括：本发明公开了一种功能陶瓷片的湿式洁片装置,包括有支架,支架的上方设有滚磨桶,滚磨桶的周面上设有凸环,凸环下方的支架上设有与凸环配合的带动轮,带动轮经传动装置连接有驱动电机；所述滚磨桶包括有洁片段,洁片段的两端分别连接有呈喇叭状的出料段和进料段,其中洁片段和出料段的内壁上设有若干呈螺旋状排列的肋条,相邻肋条之间的间距小于功能陶瓷片的最小宽度；所述滚磨桶内的上方悬空设有喷淋管,喷淋管的下方设有喷淋头,喷淋管的一端伸出滚磨桶后连接有给水装置。本发明具有洁片效率高,陶瓷片损坏率小,人工投入低,灰尘散布少,工作环境好的特点。(The invention discloses a wet-type wafer cleaning device for functional ceramic wafers, which comprises a support, wherein a barreling barrel is arranged above the support, a convex ring is arranged on the circumferential surface of the barreling barrel, a driving wheel matched with the convex ring is arranged on the support below the convex ring, and the driving wheel is connected with a driving motor through a transmission device; the tumbling barrel comprises a cleaning section, two ends of the cleaning section are respectively connected with a horn-shaped discharging section and a horn-shaped feeding section, wherein a plurality of ribs which are arranged spirally are arranged on the inner walls of the cleaning section and the discharging section, and the distance between every two adjacent ribs is smaller than the minimum width of the functional ceramic sheet; and a spray pipe is arranged above the tumbling barrel in a hanging manner, a spray head is arranged below the spray pipe, and one end of the spray pipe extends out of the tumbling barrel and is connected with a water supply device. The invention has the characteristics of high wafer cleaning efficiency, small damage rate of the ceramic wafer, low labor investment, less dust dispersion and good working environment.)

1. The utility model provides a clean piece device of wet-type of function potsherd which characterized in that: the device comprises a support (1), a barreling barrel is arranged above the support (1), a convex ring (2) is arranged on the circumferential surface of the barreling barrel, a driving wheel (3) matched with the convex ring (2) is arranged on the support (1) below the convex ring (2), and the driving wheel (3) is connected with a driving motor (5) through a transmission device (4);

the tumbling barrel comprises a cleaning section (6), two ends of the cleaning section (6) are respectively connected with a trumpet-shaped discharging section (7) and a feeding section (8), wherein the inner walls of the cleaning section (6) and the discharging section (7) are provided with a plurality of ribs (9) which are spirally arranged, and the distance between every two adjacent ribs (9) is smaller than the minimum width of the functional ceramic wafer;

a spray pipe (11) is arranged above the tumbling barrel in a hanging mode, a spray head (12) is arranged below the spray pipe (11), and one end of the spray pipe (11) extends out of the tumbling barrel and is connected with a water supply device (14).

2. The wet type wafer cleaning device of the functional ceramic wafer as claimed in claim 1, wherein: the transmission device (4) is a transmission rod which is fixedly connected with the driving wheel (3) in the axial direction, and the transmission rod is fixedly connected with a rotating shaft of the driving motor (5).

3. The wet type wafer cleaning device of the functional ceramic wafer as claimed in claim 1, wherein: the barrel wall of the cleaning segment (6) is provided with drain holes (10) which are arranged in a ring shape.

4. The wet cleaning device of the functional ceramic sheet according to claim 3, wherein: the central axis of the cleaning segment (6) is horizontal, the cleaning segment (6) is integrally of a structure with a large diameter at one end close to the feeding section (8) and a small diameter at one end close to the feeding section (8), and the drain hole (10) is positioned at one end of the cleaning segment (6) close to the feeding section (8).

5. The wet cleaning device of the functional ceramic sheet according to claim 4, wherein: the slope of the lower side surface of the cleaning segment (6) is 1-3 degrees.

6. The wet cleaning device of the functional ceramic sheet according to claim 3, wherein: a water collecting tank (15) is arranged below the drain hole (10), and a drain pipe (16) is arranged at the bottom of the water collecting tank (15).

7. The wet type wafer cleaning device of the functional ceramic wafer as claimed in claim 1, wherein: and a water pump (13) is arranged in the middle of the spray pipe (11).

8. The wet type wafer cleaning device of the functional ceramic wafer as claimed in claim 1, wherein: the water supply device (14) is a water storage barrel and is arranged above the tumbling barrel.

9. The wet type wafer cleaning device of the functional ceramic wafer as claimed in claim 1, wherein: the thickness of the rib (9) is 3-5 mm.

10. The wet type wafer cleaning device of the functional ceramic wafer as claimed in claim 1, wherein: the side of the rib (9) contacting the ceramic plate is arc-shaped.

Technical Field

The invention relates to a cleaning device for functional ceramic chips, in particular to a wet-type cleaning device for functional ceramic chips.

Background

Functional ceramics, which refers to materials that primarily utilize their non-mechanical properties when applied, typically have one or more functions, such as electrical, magnetic, optical, thermal, chemical, biological, etc.; some have coupling functions, such as piezoelectric, piezomagnetic, pyroelectric, electrooptical, acousto-optic, magneto-optic, etc. With the rapid development of material science, various new properties and new applications of functional ceramic materials are continuously known and actively developed.

With the large-scale development and application of functional ceramics, the market demand is getting bigger, the traditional preparation process and the matching device do not meet the requirement of large-scale processing, and the cleaning of the sheet is one of the links.

Generally, the ceramic sheets are all subjected to a densification process by adopting a stacking sintering mode, the ceramic sheets are in the shape shown in fig. 4, in order to prevent the ceramic sheets from being adhered due to high-temperature sintering, a layer of adhesion-preventing powder is generally scattered among the ceramic sheets, after the functional ceramic sheets are sintered and discharged from a furnace, a large amount of adhesion-preventing powder adheres to the surfaces of the functional ceramic sheets, the functional ceramic sheets need to be manually dispersed into the sheet-shaped functional ceramic sheets shown in fig. 5, and then the adhesion-preventing powder on the surfaces is removed, which is commonly called as cleaning sheets. Because the functional ceramic wafer is large in brittleness, some common automatic polishing and grinding machines are not suitable for cleaning the functional ceramic wafer, and the ceramic wafer is easily broken in the process. Therefore, the common method for cleaning the wafer at present is that workers tile the functional ceramic wafer in a special wafer cleaning disc, then manually polish the wafer by using sand paper, and turn over the wafer to polish the other side of the wafer after polishing one side of the wafer. Although the mode is safe and cannot damage the ceramic plates, the efficiency is very low, the manual input is large, part of dust which is ground can be scattered in the surrounding air, the working environment is poor, the physical health of workers is damaged, and today with large market demands, the requirement of large-scale production and processing cannot be met at all. Therefore, there is a need for a highly efficient and safe cleaning device for functional ceramic sheets.

Disclosure of Invention

The invention aims to provide a wet type cleaning device for functional ceramic sheets. The invention has the characteristics of high efficiency of cleaning the ceramic wafer, no damage to the ceramic wafer, low labor investment, no dust scattering and good working environment.

The technical scheme of the invention is as follows: a wet-type wafer cleaning device for functional ceramic wafers comprises a support, wherein a barreling barrel is arranged above the support, a convex ring is arranged on the circumferential surface of the barreling barrel, a driving wheel matched with the convex ring is arranged on the support below the convex ring, and the driving wheel is connected with a driving motor through a transmission device;

the tumbling barrel comprises a cleaning section, two ends of the cleaning section are respectively connected with a horn-shaped discharging section and a horn-shaped feeding section, wherein a plurality of ribs which are arranged spirally are arranged on the inner walls of the cleaning section and the discharging section, and the distance between every two adjacent ribs is smaller than the minimum width of the functional ceramic sheet;

and a spray pipe is arranged above the tumbling barrel in a hanging manner, a spray head is arranged below the spray pipe, and one end of the spray pipe extends out of the tumbling barrel and is connected with a water supply device.

In the wet type wafer cleaning device for the functional ceramic wafer, the transmission device is a transmission rod fixedly connected with the axial direction of the driving wheel, and the transmission rod is fixedly connected with the rotating shaft of the driving motor.

In the wet type wafer cleaning device for the functional ceramic wafer, the barrel wall of the wafer cleaning section is provided with the drain holes which are annularly arranged.

In the wet-type cleaning device for the functional ceramic wafer, the central axis of the cleaning segment is horizontal, the cleaning segment is integrally in a structure with a large diameter at one end close to the feeding section and a small diameter at one end close to the feeding section, and the drain hole is located at one end of the cleaning segment close to the feeding section.

In the wet type cleaning device for the functional ceramic wafer, the slope of the lower side surface of the cleaning section is 1-3 degrees.

In the wet type sheet cleaning device for the functional ceramic sheet, the water collecting tank is arranged below the water discharging hole, and the water discharging pipe is arranged at the bottom of the water collecting tank.

In the wet type wafer cleaning device for the functional ceramic wafer, the water pump is arranged in the middle of the spray pipe.

In the wet type wafer cleaning device for the functional ceramic wafer, the water supply device is a water storage barrel and is arranged above the tumbling barrel.

In the wet type wafer cleaning device for the functional ceramic wafer, the thickness of the rib is 3-5 mm.

In the wet-type wafer cleaning device for the functional ceramic wafer, the side of the rib, which is in contact with the ceramic wafer, is in an arc shape.

The invention has the advantages of

1. According to the invention, the barreling barrel is driven by the driving motor, and the ceramic wafer is polished in a machining mode, so that compared with the traditional manual wafer cleaning mode, the wafer cleaning efficiency is greatly improved, the manual investment is reduced, and the requirement of large-scale production can be completely met.

2. The invention arranges the ribs distributed in a spiral shape in the tumbling barrel, and controls the space between the ribs to be smaller than the minimum width of the ceramic chip, and the invention has the following three functions: (1) when the tumbling barrel rotates forwards and backwards, the functions of polishing and discharging can be respectively realized; (2) the roughness of the barrel wall is increased, the friction force between the barrel wall and the grinding material and between the barrel wall and the ceramic plate is improved, so that the grinding material and the ceramic plate are subjected to rolling friction in the tumbling barrel, and the grinding frequency is improved; (3) avoid taking the potsherd to the eminence from the low, especially the potsherd after being stained with water can be attached at the inner wall of tumbling barrel and is taken the top to, and when the potsherd dropped from very high even top, just cracked very easily, consequently, narrower rib design can play the effect of bridge, avoid potsherd and tumbling barrel inner wall closely attached, when the potsherd is taken certain height (can not surpass the height that the tumbling barrel is half usually), will fall and roll along with the abrasive material under self action of gravity, still avoid breaking into pieces when accomplishing to polish. Therefore, the invention improves the efficiency of cleaning the ceramic wafer through the design, and simultaneously has the advantages that the ceramic wafer cannot be broken and cannot be damaged. In addition, according to the actual processing situation at present, the cracked ceramic wafer is microcracked caused by the processes of forming, sintering and the like, and the crack is cracked due to the expansion of the crack in the wet wafer cleaning process, so that the method also has the effect of automatically removing defective products compared with the manual wafer cleaning mode.

3. According to the invention, the thickness of the rib is reasonably set, so that the ceramic wafer is prevented from being brought to a higher position after the rib is too thick to form a platform; in addition, the contact side of the rib and the ceramic wafer is set to be arc-shaped, so that the rib and the ceramic wafer are smoothly contacted in the rotating process, and the damage of sharp corners to the surface of the ceramic wafer is avoided. Therefore, the safety in the process of cleaning the ceramic wafer is further improved, the ceramic wafer is prevented from being broken, and the ceramic wafer cleaning method has the advantage of no damage.

4. The wet type cleaning sheet is characterized in that a water spraying pipeline is arranged in the barreling barrel, so that dust in the barreling barrel can be prevented from being scattered all around, and a good working environment is guaranteed; meanwhile, the ceramic wafer can be thoroughly cleaned by the sprayed water, so that the subsequent cleaning link is omitted, and the overall processing efficiency of the ceramic wafer is further improved.

In conclusion, the invention has the advantages of high wafer cleaning efficiency, small damage rate of the ceramic wafer, low labor input, less dust scattering and good working environment.

Drawings

FIG. 1 is a schematic diagram of the overall structure of the present invention;

FIG. 2 is a schematic view of the internal structure of the barrel of the present invention;

FIG. 3 is a cross-sectional view of a cleaning segment of the barreling drum of the present invention;

FIG. 4 is a schematic structural diagram of a functional ceramic sheet just sintered and discharged;

fig. 5 is a schematic structural view of a single functional ceramic sheet after the ceramic sheet of fig. 4 is peeled.

Description of reference numerals: 1-support, 2-convex ring, 3-driving wheel, 4-transmission device, 5-driving motor, 6-cleaning segment, 7-discharging segment, 8-feeding segment, 9-rib, 10-water discharging hole, 11-spraying pipe, 12-spraying head, 13-water pump, 14-water supply device, 15-water collecting tank and 16-water discharging pipe.

Detailed Description

The present invention is further illustrated by the following examples, which are not to be construed as limiting the invention.

Examples of the invention

A wet-type wafer cleaning device of a functional ceramic wafer is shown in attached figures 1-3 and comprises a support 1, a barreling barrel is arranged above the support 1, a convex ring 2 is arranged on the circumferential surface of the barreling barrel, a driving wheel 3 matched with the convex ring 2 is arranged on the support 1 below the convex ring 2, and the driving wheel 3 is connected with a driving motor 5 through a transmission device 4; the tumbling barrel comprises a cleaning section 6, two ends of the cleaning section 6 are respectively connected with a horn-shaped discharging section 7 and a feeding section 8, wherein a plurality of ribs 9 which are spirally arranged are arranged on the inner walls of the cleaning section 6 and the discharging section 7, and the space between the adjacent ribs 9 is smaller than the minimum width of the functional ceramic wafer; a spray pipe 11 is arranged above the tumbling barrel in a hanging mode, a spray head 12 is arranged below the spray pipe 11, and one end of the spray pipe 11 extends out of the tumbling barrel and is connected with a water supply device 14.

When the device works, firstly, the grinding materials and the stripped ceramic chips are placed into the barreling barrel from the feeding port of the feeding section 8, the driving motor 5 is started to drive the barreling barrel to rotate, and the rotation direction is the direction in which the materials cannot be discharged from the discharging section 7. Pivoted in-process, inside material is improved towards ascending one side under the effect of the frictional force that rib 9 provided, thereby reach the constant rolling of whereabouts after certain height, make constantly rub between abrasive material and the function potsherd, accomplish polishing to the function potsherd, the in-process that rolls, water supply installation 14 sprays water to inside through shower 11 and shower head 12, the water that sprays can adsorb the dust in the air, simultaneously, rolls the in-process at the material and washs the function potsherd. After the piece cleaning time is finished, the driving motor 5 is rotated reversely, the grinding materials and the functional ceramic pieces move towards one side of the discharging section 7 under the action of the spiral ribs and are discharged from the discharging port of the discharging section 7, the discharged materials can be separated from the grinding materials after being simply screened, the grinding materials are continuously sent into the barreling barrel to be cleaned, and the functional ceramic pieces are sent into the next processing procedure.

Furthermore, the transmission device 4 is a transmission rod fixedly connected with the driving wheel 3 in the axial direction, the transmission rod is fixedly connected with a rotating shaft of the driving motor 5, transmission is achieved through the transmission rod, and the structure is simpler.

Furthermore, the barrel wall of the cleaning segment 6 is provided with drain holes 10 which are annularly arranged, and water in the cleaning process is drained from the drain holes 10, so that firstly, dust is timely drained, secondary pollution caused by deposition is avoided, and secondly, the drainage is more convenient.

Furthermore, the central axis of the cleaning segment 6 is horizontal, the cleaning segment 6 is integrally in a structure with a large diameter at one end close to the feeding section 8 and a small diameter at one end close to the feeding section 8, and the drain hole 10 is located at one end of the cleaning segment 6 close to the feeding section 8, so that water can be collected at the lower part of one end of the feeding section 8 and drained from the drain hole 10 at the lower part in the cleaning process, and sewage is drained more thoroughly.

Further, the slope of the 6 downside of clean piece is 1-3, and when the slope is too little, be unfavorable for water to assemble toward the low place, the slope is too big, and the material can concentrate on the low place and form and pile up, influences clean piece effect, therefore sets up 1-3 comparatively suitable.

Further, a water collecting tank 15 is arranged below the drain hole 10, a drain pipe 16 is arranged at the bottom of the water collecting tank 15, and water discharged from the drain hole 10 is collected by the water collecting tank 15 and then is uniformly transferred to a sewage treatment area through the drain pipe 16.

Furthermore, a water pump 13 is installed in the middle of the spray pipe 11, and the water pump 13 provides a certain water pressure, so that water sprayed from the spray header 12 has a certain impact force, and the surface cleaning effect of the functional ceramic sheet is improved.

Further, the water supply device 14 is a water storage barrel and is arranged above the tumbling barrel.

Further, the thickness of the rib 9 is 3-5 mm.

Furthermore, the side of the rib 9 contacting the ceramic plate is arc-shaped, and in the actual manufacturing process, the rib 9 is directly made of a steel wire with the diameter of 3-5 mm.

The above description is only for the purpose of illustrating the present invention and the appended claims, and the scope of the present invention is not limited thereto, and any person skilled in the art can substitute or change the technical solution and the inventive concept of the present invention within the technical scope of the present invention.