阅读说明：本技术 用于表面处理粉末的表面处理设备和方法 (Surface treatment apparatus and method for surface treating powder ) 是由 洪雄杓 吴升贞 朴贞姸 车振赫 朴炯相 金在雄 尹泰皓 朴坤佑 于 2019-06-10 设计创作，主要内容包括：本发明涉及用于表面处理粉末的表面处理设备和方法。该表面处理设备,包括：在其中限定容纳空间的腔室；设置在腔室的第一端的注入部,以便将气体注入到容纳空间中；设置在腔室的与第一端相对的第二端的排放部,以便从容纳空间排放未反应气体；以及至少一个子腔室,该至少一个子腔室装载在腔室的容纳空间中的第一端和第二端之间,其中,粉末被填充在子腔室中,并且子腔室包括设置在子腔室的至少一个表面中的网格结构,以允许气体被引入子腔室中,并且子腔室可以从第一端移动到第二端。(The present invention relates to a surface treatment apparatus and method for surface treating powder. The surface treatment apparatus includes: a chamber defining a receiving space therein; an injection part provided at a first end of the chamber to inject gas into the accommodating space; a discharge portion provided at a second end of the chamber opposite to the first end so as to discharge the unreacted gas from the accommodating space; and at least one sub-chamber loaded between the first end and the second end in the accommodation space of the chamber, wherein the powder is filled in the sub-chamber, and the sub-chamber comprises a mesh structure provided in at least one surface of the sub-chamber to allow gas to be introduced into the sub-chamber, and the sub-chamber is movable from the first end to the second end.)

1. A surface treatment apparatus for surface treating a powder, comprising:

a chamber defining a receiving space therein;

an injection part provided at a first end of the chamber to inject gas into the accommodating space;

a discharge portion provided at a second end of the chamber opposite to the first end so as to discharge unreacted gas from the accommodating space; and

at least one sub-chamber loaded in the receiving space of the chamber between the first end and the second end,

wherein the powder is filled into the sub-chamber,

wherein the sub-chamber comprises a grid structure disposed in at least one surface of the sub-chamber to allow the gas to be introduced into the sub-chamber, and

wherein the sub-chamber is movable from the first end to the second end.

2. The surface treatment apparatus according to claim 1,

wherein the gas is injected into the receiving space from the injection portion at least once when the sub-chamber moves from the first end toward the second end.

3. The surface treatment apparatus according to claim 1,

wherein the gas contacts the powder filled in the sub-chamber so as to perform atomic layer deposition.

4. The surface treatment apparatus according to claim 1, wherein:

the lattice structure includes micropores, and

the size of the micropores is larger than the size of the particles contained in the gas, but smaller than the size of the powder.

5. The surface treatment apparatus according to claim 4,

wherein the size of the micropores is in the range of 10 μm to 100 μm.

6. The surface treatment apparatus according to claim 1, further comprising:

a controller for controlling the operation of the electronic device,

wherein the controller is configured to load the sub-chamber into the accommodation space towards the first end and remove the sub-chamber from the accommodation space after the sub-chamber has been moved towards the second end.

7. The surface treatment apparatus according to claim 1, further comprising:

the pump part is arranged at the position of the pump,

wherein the pumping part is configured to discharge the unreacted gas in the accommodating space to the outside of the accommodating space through the discharge part.

8. The surface treatment apparatus according to claim 1,

wherein a second sub-chamber is added near the first end of the chamber to move towards the second end when a first sub-chamber of the chambers moves towards the second end.

9. The surface treatment apparatus according to claim 1,

wherein an accommodation space between the first end and the second end in the chamber is divided into N sections, N being a natural number greater than or equal to 2, and

wherein the sub-chamber is progressively moved from a first section located proximate the first end towards an nth section proximate the second end.

10. The surface treatment apparatus according to claim 9,

wherein, when a first sub-chamber moves from the first section towards the nth section, a second sub-chamber is added to the first section so as to move towards the nth section.

11. The surface treatment apparatus according to claim 9,

the gas is injected from the injection portion into the accommodation space when the sub-chamber moves to the next section and is positioned there.

12. The surface treatment apparatus according to claim 9, further comprising a controller,

wherein the controller is configured to load the sub-chamber into the first section of the receiving space and remove the sub-chamber from the receiving space when the sub-chamber is in the Nth section.

13. The surface treatment apparatus according to claim 1,

wherein the powder comprises carbon (C) and the gas comprises a metal precursor.

14. A method of surface treating a powder using a surface treatment apparatus, comprising:

providing a surface treatment apparatus including a chamber defining a receiving space therein, an injection portion provided at a first end of the chamber so as to inject a gas into the receiving space, and a discharge portion provided at a second end of the chamber opposite to the first end so as to discharge an unreacted gas from the receiving space;

loading a first sub-chamber in the receiving space such that the first sub-chamber is closer to the first end than the second end;

moving the first sub-chamber toward the second end; and is

Loading a second sub-chamber into the receiving space between the first sub-chamber and the first end,

wherein the gas is injected into the receiving space from the injection portion at least once when the first sub-chamber moves.

15. The method of claim 14, wherein the first and second light sources are selected from the group consisting of,

wherein the accommodating space between the first end and the second end is divided into N sections, N being a natural number greater than or equal to 2,

wherein loading the first sub-chamber into the receiving space comprises loading the first sub-chamber into a first section near the first end,

wherein moving the first sub-chamber toward the second end comprises moving the first sub-chamber stepwise from the first section to an Nth section near the second end, and

wherein loading the second sub-chamber into the receiving space comprises additionally loading the second sub-chamber into the first section as the first sub-chamber moves towards the nth section.

16. The method of claim 15, wherein the first and second light sources are selected from the group consisting of,

wherein, when the first sub-chamber is moved stepwise from the first section toward the nth section, the second sub-chamber that has been added to the first section is also moved toward the nth section.

17. The method of claim 15, wherein the first and second light sources are selected from the group consisting of,

wherein the gas is injected from the injection portion into the receiving space at least once when the first sub-chamber is moved from one section to another adjacent section and positioned there.

18. The method of claim 15, wherein the first and second light sources are selected from the group consisting of,

wherein the first sub-chamber is removed under control of a controller when the first sub-chamber is located in the nth section of the receiving space.

19. The method of claim 14, wherein the first and second light sources are selected from the group consisting of,

wherein injecting the gas comprises:

a first operation of supplying a gas including a metal precursor;

a second operation of performing purging with an inert gas;

a third operation of supplying a reaction gas for converting the metal precursor into a metal; and

the fourth operation of purging is performed with an inert gas.

20. The method of claim 19, wherein the first and second portions are selected from the group consisting of,

wherein the first to fourth operations are set as one cycle, and the operations are performed for at least one cycle.

Technical Field

The present invention relates to a surface treatment apparatus for surface-treating powder and a method of surface-treating powder using the same.

Background

In order to coat the surface of the powder with a specific material, an Atomic Layer Deposition (ALD) process or the like may be used. Referring to fig. 1 (prior art), there is shown a conventional surface treatment apparatus for surface treating a powder, which is used to perform an atomic layer deposition (hereinafter, referred to as "ALD") process. In particular, the method may be performed in such a manner that a material to be coated (particularly, powder) is introduced into a gas deposition chamber (or reaction chamber), and then a metal precursor gas or the like is introduced into the reaction chamber. Thus, since the surface of the particle of the material to be coated is exposed to the metal precursor gas, the metal precursor gas can be deposited on the surface of the particle. In addition, processes for removing air, water vapor, contaminants, etc. unnecessary for deposition from the reaction chamber may also be performed in conjunction with the ALD process.

In addition, ALD techniques may be used to produce metal/carbon catalysts (e.g., platinum/carbon (Pt/C) catalysts) for fuel cells. In particular, the ALD process may be performed in a dry manner or a wet manner. The dry ALD process can shorten the production time of the catalyst. Furthermore, since the dry ALD process is different from the wet ALD process, it does not discharge waste water, and thus is a more environment-friendly process.

However, such a conventional ALD process has disadvantages in that it is difficult to mass-produce, and it is impossible to uniformly deposit a metal precursor on the surface of a material particle to be coated. Accordingly, it is desirable to provide a surface treatment apparatus for surface-treating powder and a method of surface-treating powder using the same, which are capable of depositing a metal catalyst on powder (i.e., a carrier) by maximizing the surface area of the powder (i.e., the carrier), even though the expensive metal catalyst is used in a small amount.

Disclosure of Invention

The present disclosure provides a surface treatment apparatus for surface-treating powder and a method of surface-treating powder using the same, which can uniformly coat the surface of powder with a metal precursor and reduce consumption of the metal precursor due to continuous flow of the metal precursor.

Another object of the present disclosure is to produce a powder uniformly carried by a metal precursor by uniformly depositing the metal precursor on a surface of the powder in an atomic layer unit even when a size of a chamber of a surface treatment apparatus is increased.

Another object of the present disclosure is to prevent powder having a nano-size (nm) or a micro-size (μm) and floating in a reaction chamber from being lost due to pumping and discharging unreacted gas.

The object of the present disclosure is not limited to the above object. Other specific details of the disclosure will be apparent from the following detailed description and the accompanying drawings.

In one aspect, the present invention provides a surface treatment apparatus for surface-treating powder, the surface treatment apparatus including: a chamber defining a receiving space therein; an injection part provided at a first end of the chamber to inject gas into the accommodating space; a discharge portion provided at a second end of the chamber opposite to the first end so as to discharge the unreacted gas from the accommodating space; and at least one sub-chamber loaded in the accommodation space of the chamber between the first end and the second end, wherein the powder is filled in the sub-chamber, wherein the sub-chamber comprises a grid structure provided in at least one surface of the sub-chamber to allow gas to be introduced into the sub-chamber, and wherein the sub-chamber is movable from the first end to the second end.

In a preferred embodiment, the gas may be injected into the receiving space from the injection part at least once when the sub-chamber moves from the first end toward the second end.

In another preferred embodiment, the gas may contact the powder filled in the sub-chamber so as to perform Atomic Layer Deposition (ALD).

In yet another preferred embodiment, the mesh structure may include micropores, and the size of the micropores may be larger than the size of the particles contained in the gas, but smaller than the size of the powder.

In yet another preferred embodiment, the size of the micropores may be in the range of 10 μm to 100 μm.

In a further preferred embodiment, the surface treatment apparatus may further comprise a controller capable of loading the sub-chamber into the receiving space towards the first end and capable of removing the sub-chamber from the receiving space after the sub-chamber has been moved towards the second end.

In another preferred embodiment, the surface treatment apparatus may further include a pumping part discharging the unreacted gas in the accommodating space to the outside of the accommodating space through the discharging part.

In another further preferred embodiment, a second sub-chamber may be added near the first end of the chamber to move towards the second end as a first sub-chamber in the chamber moves towards the second end.

In yet another preferred embodiment, the receiving space in the chamber between the first end and the second end may be divided into N sections (N is a natural number greater than or equal to 2), and the sub-chamber may be moved stepwise from the first section near the first end to the nth section near the second end.

In a further preferred embodiment, the second sub-chamber may be added to the first section so as to move towards the nth section when the first sub-chamber moves from the first section towards the nth section.

In a further preferred embodiment, the gas can be injected from the injection part into the receiving space when the sub-chamber is moved to the next section and positioned there.

In yet another preferred embodiment, the surface treatment apparatus may further comprise a controller capable of loading the sub-chamber into the first section of the receiving space and removing the sub-chamber from the receiving space when the sub-chamber is positioned in the nth section.

In yet another preferred embodiment, the powder may include carbon (C) and the gas may include a metal precursor.

In another aspect, the present disclosure provides a method of surface treating a powder using a surface treating apparatus, including loading a first sub-chamber in a containing space so as to be closer to a first end than a second end, moving the first sub-chamber toward the second end, and loading a second sub-chamber into the containing space between the first sub-chamber and the first end, wherein a gas is injected into the containing space from an injection portion at least once when the first sub-chamber is moved.

In a preferred embodiment, the receiving space between the first end and the second end may be divided into N sections (N is a natural number greater than or equal to 2), the loading of the first sub-chamber into the receiving space may comprise loading the first sub-chamber into the first section near the first end, the moving the first sub-chamber towards the second end may comprise moving the first sub-chamber stepwise from the first section to the nth section near the second end, and the loading of the second sub-chamber into the receiving space may comprise additionally loading the second sub-chamber into the first section as the first sub-chamber moves towards the nth section.

In another preferred embodiment, when the first sub-chamber is gradually moved from the first section toward the nth section, the second sub-chamber that has been added to the first section may also be moved toward the nth section.

In a further preferred embodiment, the gas can be injected into the receiving space from the injection part at least once when the sub-chamber is moved from one section to another adjacent section and positioned there.

In a further preferred embodiment, the sub-chamber may be removed under the control of the controller when the sub-chamber is located in the nth section in the receiving space.

In still another preferred embodiment, the injecting of the gas may include a first operation of supplying a gas including a metal precursor, a second operation of performing purging with an inert gas, a third operation of supplying a reaction gas for converting the metal precursor into a metal, and a fourth operation of performing purging with an inert gas.

In further preferred embodiments, the first to fourth operations may be set as one cycle, and may be performed for one or more cycles.

Other aspects and preferred embodiments of the disclosure are discussed below.

The above and other features of the present disclosure are discussed below.

Drawings

The above and other features of the present disclosure will now be described in detail with reference to certain exemplary embodiments thereof as illustrated in the accompanying drawings, which are given by way of example only, and thus are not limiting of the present disclosure, and wherein:

fig. 1 (prior art) is a sectional view showing a conventional surface treatment apparatus for surface treating powder;

fig. 2 is a sectional view illustrating a surface treatment apparatus for surface treating powder according to some embodiments of the present disclosure;

fig. 3 is a cross-sectional view showing a sub-chamber according to an embodiment of the present disclosure;

fig. 4 to 6 are views illustrating a surface treatment apparatus for surface-treating powder according to some embodiments of the present disclosure;

fig. 7 and 8 are cross-sectional views illustrating sub-chambers according to other embodiments of the present disclosure;

fig. 9 and 10 are flow charts illustrating methods of surface treating powders according to some embodiments of the present disclosure;

FIG. 11 is a flow chart showing the operation of the controller; and

fig. 12 to 14 are images of a Scanning Transmission Electron Microscope (STEM) showing the results of the experimental example of the present disclosure.

It should be understood that the drawings are not necessarily to scale, presenting a somewhat simplified representation of various preferred features illustrative of the basic principles of the disclosure. The specific design features of the present disclosure, including, for example, specific dimensions, orientations, locations, and shapes, as disclosed herein, will be determined in part by the particular intended application and use environment.

In the drawings, like or equivalent parts of the disclosure are designated by reference numerals throughout the several views of the drawings.

Detailed Description

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the disclosure. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of stated features, integers, steps, operations, elements, and/or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items. Throughout this specification, unless explicitly described to the contrary, the word "comprise", and variations such as "comprises" or "comprising", will be understood to imply the inclusion of stated elements but not the exclusion of any other elements. Also, the terms "unit", "device", "means", and "module" described in the specification mean a unit for processing at least one function and operation, and may be implemented by hardware components or software components, and a combination thereof.

Further, the control logic of the present disclosure may be implemented as a non-transitory computer readable medium on a computer readable medium containing executable program instructions executed by a processor, controller, or the like. Examples of computer readable media include, but are not limited to, ROM, RAM, Compact Disc (CD) -ROM, magnetic tape, floppy disk, flash drive, smart card, and optical data storage. The computer readable medium CAN also be distributed over a network-coupled computer system so that the computer readable medium is stored and executed in a distributed fashion, such as by a telematics server or Controller Area Network (CAN).

Reference will now be made in detail to various embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings and described below. While the disclosure will be described in conjunction with the exemplary embodiments, it will be understood that the description is not intended to limit the disclosure to the exemplary embodiments. On the contrary, the present disclosure is intended to cover not only the exemplary embodiments, but also various alternatives, modifications, equivalents and other embodiments within the spirit and scope of the present disclosure as defined by the appended claims. In the following description of the embodiments, the same elements are denoted by the same reference numerals even though they are shown in different drawings.

Hereinafter, the present disclosure will be described in detail with reference to the accompanying drawings.

Fig. 2 and 3 are cross-sectional views illustrating a surface treatment apparatus and a sub-chamber according to some embodiments of the present disclosure.

Referring first to fig. 2, the surface treatment apparatus 1 for surface-treating powder may include a chamber 10 defining a receiving space 100 therein, an injection part 200 provided at a first end 11 of the chamber 10 to inject gas into the receiving space 100, and a discharge part 300 provided at a second end 12 of the chamber 10 opposite to the first end 11 to discharge unreacted gas from the receiving space 100.

In this embodiment, at least one sub-chamber 110 may be loaded in the receiving space 100 defined in the chamber 10 so as to be disposed between the first end 11 and the second end 12. The sub-chamber 110 may be filled with a powder to be surface treated. As shown in fig. 2, the sub-chamber 110 may be loaded in the receiving space 100 near the first end 11 and may be moved from the first end 11 toward the second end 12. Thus, when the sub-chamber 110 moves closer to the second end 12 than the first end 11, the sub-chamber 110 may become distant from the injection part 200. Therefore, the contact area between the gas supplied from the injection part 200 and the powder in the sub-chamber 110 can be reduced.

Although fig. 2 shows a structure in which a groove is formed in a portion of the chamber 10 and a portion of the sub-chamber 110 is engaged with the groove such that the sub-chamber 110 is loaded and moved, the present disclosure is not limited thereto and the sub-chamber 110 may be loaded into the receiving space 100 in various ways.

In the chamber 10 of the surface treatment apparatus 1 for surface-treating powder according to the embodiment of the present disclosure, when the first sub-chamber 110 is moved toward the second end 12, the second sub-chamber additionally disposed near (i.e., close to) the first end 11 may also be moved toward the second end 12. In other words, one or more sub-chambers may be moved together from the first end 11 towards the second end 12, thereby achieving a continuous process. As used herein, the terms "adjacent," "proximate," and the like refer to a location in the chamber 10, for example, near or adjacent to the first end 11 or the second end 12.

Although not shown in fig. 2, the surface treatment apparatus 1 for surface-treating powder according to some embodiments of the present disclosure may further include a controller. For example, the controller may load the sub-chamber 110 into the receiving space 100 such that the sub-chamber 110 is closer to the first end 11 than the second end 12. Further, the controller may remove (i.e., unload) the sub-chamber 110 from the receiving space 100 after the sub-chamber 110 has been moved toward the second end 12.

Although not shown in fig. 2, the surface treatment apparatus for surface-treating powder according to some embodiments of the present disclosure may further include a pumping part. The pumping part may move the unreacted gas in the accommodating space 100 (e.g., gas remaining after the powder and the gas in the sub-chamber 110 are contacted) to the discharge part 300 so as to discharge the unreacted gas to the outside.

The powder loaded in the sub-chamber 110 and to be surface-treated may include, for example, carbon C. Although the powder may include carbon black, the disclosure is not so limited. The gas supplied from the injection part 200 may include a metal precursor. Preferably, the metal precursor may include a Pt precursor. The Pt precursor may be stored in, for example, a tank. In this case, although the Pt precursor may be injected into the receiving space 100 in the chamber 10 by opening the injection port of the can, the present disclosure is not limited thereto. After the metal precursor is deposited on the powder, the metal precursor may be converted to a metal.

Before filling the sub-chamber 110 with the powder, an operation of acid-treating the powder or screening the powder to a predetermined size range (for example, a grain size of 200 μm to 500 μm) may be performed. Therefore, contact between the powder and the gas can be more effectively achieved, and the powder can be prevented from being lost from the sub-chamber 110.

Although the internal pressure in the chamber 10 may be maintained in a vacuum state of 1 torr, the present disclosure is not limited thereto. Further, although the internal temperature in the chamber 10 may be preferably maintained at a temperature of 200 ℃ to 250 ℃ for 1 hour or more, the present disclosure is not limited thereto.

The structure of the sub-chamber 110 is particularly shown in figure 3.

As shown in fig. 3, at least one surface of the sub-chamber 110 may be provided with a mesh structure 111. The lattice structure 111 may include micropores. Accordingly, the gas supplied from the injection part 200 (see fig. 2) into the receiving space 100 (see fig. 2) may move into the sub-chamber 110 through the mesh structure 111. The unreacted gas may move to the discharge portion 300 (see fig. 2), and then be discharged to the outside.

Each of the micro holes may be larger than particles included in the gas supplied from the injection part 200, but may be smaller than the powder loaded into the sub-chamber 110. As a result, it is possible to prevent the loss of powder caused by nano-sized (e.g., 30-50nm) or micro-sized (e.g., 200-500 μm) powder floating in the accommodating space 100 when pumping and discharging the unreacted gas.

When a plurality of sub-chambers are loaded into the receiving space 100, the micro-holes in the sub-chambers may have the same size.

In particular, the size of the micropores may be, for example, in the range of 10 μm to 100 μm. Since the size of the micropores is greater than or equal to 10 μm, the gas can move therethrough, and thus there is no influence on the pumping performance. When the powder loaded in the sub-chamber is, for example, carbon black, since the size of the carbon black is in the range of 200 μm to 500 μm, the powder cannot pass through the micropores and thus cannot move to the outside of the sub-chamber 110. Even when the size of the powder initially loaded in the sub-chamber is in the range of 30nm to 50nm, the powder can be aggregated together by the contact between the powders, and thus can have various sizes (i.e., 200 μm to 500 μm). Thus, the powder cannot pass through the pores and cannot move out of the sub-chamber 110.

When a metal precursor (for example, a Pt precursor) is included in the gas, the powder having the metal precursor carried thereon, which is produced by the contact of the powder with the gas, can be prevented from moving from one sub-chamber 110 into the other sub-chamber.

The mesh structure 111 may be configured to face the injection part 200 and the discharge part 300, for example. Accordingly, the gas supplied from the injection part 200 may move to the discharge part 300 through the sub-chamber 110. Although the mesh structure 111 is illustrated in fig. 3 as being disposed at a single surface of the sub-chamber 110, the present disclosure is not limited thereto. In other words, various numbers of mesh structures 111 may be provided at various locations of the sub-chamber 110. For example, the mesh structure 111 may be disposed at opposing surfaces of the sub-chamber 110.

Referring again to fig. 2, in the surface treatment apparatus for surface-treating powder according to the present disclosure, gas may be injected from the injection part 200 into the accommodating space 100 one or more times when the sub-chamber 110 (see fig. 3) moves from the first end 11 to the second end 12. Accordingly, when the sub-chamber 110 is loaded in the accommodating space 100, the gas may be injected into the sub-chamber 110 through the mesh structure 111 of the sub-chamber 110. Therefore, the powder loaded in the sub-chamber 110 may be contacted with the gas. In other words, the powder may be subjected to Atomic Layer Deposition (ALD) by means of gas injection into the sub-chamber 110.

Fig. 4 to 6 are views illustrating a surface treatment apparatus for surface-treating powder according to some embodiments of the present disclosure.

For convenience of explanation, description will be mainly given of components different from those described with reference to fig. 1 to 3.

First, the surface treatment apparatus 1 for surface-treating powder in which the sub-chambers (see fig. 3) are not loaded in the accommodation space 100 will be described with reference to fig. 4.

Referring to fig. 4, the accommodating space 100 between the first end 11 and the second end 12 in the chamber 10 may be divided into four sections 101, 102, 103, and 104. Thus, the sub-chamber (see fig. 3) may be moved stepwise from a first section 101 near the first end 11 to a fourth section 104 near the second end 12. In particular, the sub-chamber 110 may move stepwise from the first section 101 to the second section 102, from the second section 102 to the third section 103, and from the third section 103 to the fourth section 104.

The gas may be injected into the receiving space 100 from the injection portion 200 provided at the first end 11 of the chamber 10 each time the sub-chamber is located at the next section (i.e., each time the sub-chamber moves from a section closer to the first end 11 to the next section in a direction toward the second end 12). Thus, the amount of gas in contact with the powder in the sub-chamber may be reduced as the sub-chamber moves from the first section 101 towards the fourth section 104.

As described above, the surface treatment apparatus 1 for surface-treating powder may further include a controller, and the controller may load the sub-chamber into the first section 101 of the containing space 100. Further, when the sub-chamber is positioned in the fourth section 104 after passing through the preceding section, the controller may remove the sub-chamber from the receiving space 100.

When the first sub-chamber is moved from the first section 101 towards the fourth section 104, the second sub-chamber may additionally be provided in the first section 101 and may be moved towards the fourth section 104. In particular, the second sub-chamber may additionally be loaded in the first section 101 when the first sub-chamber is moved from the first section 101 to the second section 102. Thus, the first and second sub-chambers may be located adjacent to each other and may be moved together towards the fourth section.

Although the receiving space 100 is illustrated in fig. 4 as being divided into four sections, the present disclosure is not limited thereto. In other words, in the chamber 10 of the surface treatment apparatus 1 for surface-treating powder according to some embodiments of the present disclosure, the accommodation space 100 defined between the first end 11 and the second end 12 may be partitioned into N sections (N is a natural number greater than or equal to 2), and the sub-chambers may be sequentially moved from the first section near (or near) the first end 11 to the nth section near (or near) the second end 12. Therefore, when the first sub-chamber is moved stepwise from the first section toward the nth section, the second sub-chamber may be additionally provided in the first section and may be moved toward the nth section. The controller may remove the sub-chamber located in the nth section from the receiving space 100.

Next, the surface treatment apparatus 1, which is loaded with sub-chambers in all 4 sections 101, 102, 103, 104 (see fig. 4) shown in fig. 4, respectively, and is in the process of injecting gas, is explained with reference to fig. 5.

Referring to fig. 5, the first subchamber 110 is shown as having been moved from the first section 101 to the fourth section 104 near (or proximate to) the second end 12. The second to fourth sub-chambers 120, 130 and 140 are sequentially disposed in the receiving space 100. The sub-chambers 110, 120, 130 and 140 may move together to a section closer to the second end 12. Accordingly, when the first sub-chamber 110 is positioned in the fourth section 104 as shown in fig. 5, the second to fourth sub-chambers 120, 130 and 140 may be sequentially positioned in the third to first sections 103, 102 and 101. Here, the first sub-chamber 110 may be removed from the fourth section 104. As the first sub-chamber 110 is removed, the second sub-chamber 120 may move from the third section 103 to the fourth section 104.

The loading, unloading or moving of the sub-chambers 110 to 140 may be performed manually or automatically. For example, when the sub-chambers 110 to 140 are automatically loaded, unloaded, or moved, the surface treatment apparatus 1 for surface-treating powder may further include an automatic control system.

Referring to fig. 6, gas may be injected into the accommodating space 100 in the chamber 10 from the injection part 200, and unreacted gas may be discharged to the outside of the chamber 10 through the discharge part 300. For example, the gas may be injected into the accommodation space 100 from the injection portion 200 provided at the first end 11 of the chamber 10 each time each of the sub-chambers 110 to 140 moves to the next section (i.e., each time the sub-chamber moves from a section near the first end 11 to a section closer to the second end 12). Thus, the amount of powder-contacting gas located in first chamber 110 closer to second end 12 than first end 11 may be less than the amount of powder-contacting gas located in fourth sub-chamber 140 closer to first end 11 than second end 12.

In particular, because the second to fourth sub-chambers 120 to 140 are located between the first sub-chamber 110 and the injection portion 200, the gases are supplied in order near (or near) the injection portion 200 (i.e., in order from the fourth sub-chamber 140 to the first sub-chamber 110). Thus, the powder in the sub-chamber proximate the second end 12 (e.g., the second sub-chamber 120) may contact the residual gas that has passed through the sub-chamber proximate the first end 11 (e.g., the third sub-chamber 130) and has reached the second sub-chamber 120. Thus, the sub-chambers proximate the second end 12 may be exposed to a smaller amount of gas than the sub-chambers proximate the first end 11.

Compared to a process of filling the entire accommodation space 100 with the powder and then repeatedly supplying the gas from the injection part 200 (for example, supplying the gas 20 times) without dividing the chamber into sub-chambers, repeating the process of supplying the gas while sequentially moving the plurality of sub-chambers loaded in the accommodation space 100 toward the second end 12 (for example, sequentially moving the sub-chambers from the first end 11 toward the second end 12 4 times and supplying the gas 5 times per movement of the sub-chambers) can prevent excessive growth and can uniformly coat the powder with the gas. In other words, even if the same amount of gas is supplied the same number of times (or the same duration), the powder can be subjected to uniform surface treatment.

The addition and removal of the sub-chamber may be performed, for example, automatically. After the entire process is completed, the surface treatment powder can be recovered from the surface treatment apparatus.

Fig. 7 and 8 are sectional views illustrating a sub-chamber according to another embodiment of the present disclosure. For convenience of explanation, description will be mainly given of components different from those described with reference to fig. 1 to 3.

Referring first to fig. 7, eight sub-chambers 10 including a mesh structure 111 may be disposed in the receiving space 100 (see fig. 6) of the chamber 10 (see fig. 6). The surface area of the sub-chamber 110 may be twice the surface area of the sub-chamber as shown, for example, in fig. 3. Accordingly, the amount of powder (e.g., 50g) that can be loaded and surface-treated in all of the sub-chambers 110 shown in fig. 7 can be increased as compared to the amount of powder (e.g., 3g) that can be loaded and surface-treated in the entire sub-chambers shown in fig. 3.

Referring to fig. 8, the total number of sub-chambers 110 may be five, and the surface area of the sub-chamber 110 may be three times that of the sub-chamber shown in fig. 3. Accordingly, the amount of powder (e.g., 50g) that can be loaded and surface-treated in all of the sub-chambers 110 shown in fig. 8 can be increased as compared to the amount of powder (e.g., 3g) that can be loaded and surface-treated in the entire sub-chambers shown in fig. 3. Therefore, by controlling the size or the number of the sub-chambers 110 loaded in the receiving space, the effect of the surface treatment of the powder loaded in the sub-chambers can be maximized.

Hereinafter, a method of surface treating powder using a surface treating apparatus according to some embodiments of the present disclosure will be described with reference to fig. 9 to 11. For convenience of explanation, a description will be given of components different from those described with reference to fig. 1 to 8.

Referring first to fig. 9, a method of surface-treating powder according to an embodiment of the present disclosure may include an operation of loading a first sub-chamber into a receiving space so as to be closer to a first end than a second end (S100), an operation of moving the first sub-chamber toward the second end (S200), and an operation of loading a second sub-chamber into the receiving space between the first sub-chamber and the first end (S300).

In this method of surface treating the powder, the gas may be injected into the containing space one or more times after moving the first sub-chamber.

Here, the operation of injecting the gas into the accommodating space may include a first operation of supplying a gas including the metal precursor, a second operation of performing purging with an inert gas, a third operation of supplying a reaction gas for converting the metal precursor into the metal, and a fourth operation of performing purging with an inert gas.

In the operation of injecting the gas into the accommodating space, the process of sequentially performing the first to fourth operations may be set to one cycle, and one or more cycles may be performed.

Referring now to fig. 10, the receiving space in the chamber between the first end and the second end may be divided into two sections. In this case, a method of surface treating powder according to another embodiment of the present disclosure may include an operation (S110) of loading a first sub-chamber to a first section near (or near) a first end, an operation (S120) of moving the first sub-chamber from the first section to a second section closer to a second end, and an operation (S310) of additionally loading the second sub-chamber to the first section after the first sub-chamber is moved to the second section.

The operation of injecting gas (including, for example, metal precursor) from the injection part into the accommodation space may be performed each time each of the sub-chambers moves from one section to another adjacent section (S150 and S350).

Subsequently, an operation of removing the first sub-chamber from the accommodation space in the chamber by the controller after injecting the gas into the accommodation space after moving the first sub-chamber to the second section in the accommodation space may be performed (S400).

Although the receiving space is shown in fig. 10 as being divided into two sections, the present disclosure is not limited thereto. In other words, the accommodating space defined between the first end and the second end may be divided into N sections (N is a natural number greater than or equal to 2). Here, the first sub-chamber may be moved stepwise from the first section to the nth section to be closer to the second end. Thus, the second sub-chamber may be additionally loaded into the first section and may be moved to the nth section.

In addition to the first and second sub-chambers, another sub-chamber may be additionally loaded into the first section. In particular, when the previously loaded sub-chamber is moved stepwise from the first section towards the nth section, the sub-chamber that has been additionally loaded may also be moved towards the nth section. As described above, the gas may be injected into the accommodation space once each time each of the sub-chambers moves from one section to another adjacent section for the purpose of surface treating the powder.

Referring now to fig. 11, a flow chart of the operation of removing the first sub-chamber by the controller (S400, see fig. 10) is shown.

After the sub-chambers are sequentially moved from the first end toward the second end, the controller may determine whether the sub-chambers are located at the second end near (or near) the discharge. The sub-chamber determined to be positioned at the second end may be removed from the chamber (i.e., the receiving space). Thus, additional sub-chambers may be loaded into the first section near (or near) the first end 11.

When the controller does not determine that the sub-chamber is positioned at the second end, the sub-chamber already loaded in the chamber may be moved to the second end to allow a new additional sub-chamber to be loaded. When the sub-chamber already loaded in the chamber is positioned at the second end by loading a new additional sub-chamber, the controller may perform control to remove the sub-chamber positioned at the second end from the chamber.

Hereinafter, the present disclosure will be described in detail with reference to embodiments and experimental examples. The following embodiments are for illustrative purposes, and the scope of the present disclosure is not limited to the embodiments.

Examples of the invention

(1) The carbon black was screened to a size of 200 μm to 500 μm.

(2) The containing space in the chamber (fluidized bed reactor, FBR) was divided into first to fourth sections from the injection portion toward the discharge portion, and 3g of carbon black sieved in operation (1) was loaded into the sub-chamber.

(3) The internal pressure of the chamber was maintained at 1 torr. The room temperature was maintained at 200 ℃ to 250 ℃ for 1 hour.

(4) The Pt precursor was introduced into the chamber by opening the inlet of a tank containing the Pt precursor.

(5) As the ALD process, the injection of the Pt precursor, the purging with the inert gas, and the purging with the reaction gas (oxygen (O) gas) are sequentially performed₂) Ozone (O)₃) Etc.) and the inert gas purge is set to 1 cycle, and the process is repeatedly performed for a total of 5 cycles.

(6) The subchambers provided in the first section are moved to the second section and new subchambers are loaded into the first section.

(7) Repeating the operations (1) to (5), and then moving the sub-chamber disposed in the second section to the third section. Subsequently, the sub-chambers provided in the first section are moved to the second section, and new sub-chambers are loaded into the first section.

(8) Repeating the operations (1) to (5), and then moving the sub-chamber provided in the third section to the fourth section. Subsequently, the sub-chamber provided in the second section is moved to the third section, and then the sub-chamber provided in the first section is moved to the second section. Thereafter, a new subchamber is additionally loaded into the first section.

(9) Repeating the operations (1) to (5) and removing the sub-chamber provided in the fourth section, and then the process is completed. The conditions and results of this process are shown in table 1.

Comparative example

The operations (1) to (5) in the above embodiment are performed except that the carbon black screened in the operation (1) of the above example is loaded into the accommodating space in the chamber without dividing the accommodating space in the chamber into the sub-chambers. Here, the charged amount of the powder was 1 g. The ALD process in operation (5) is repeatedly performed for 20 cycles instead of 5 cycles. The conditions and results of this process are shown in table 1.

[ TABLE 1 ]

Experimental example 1: comparison of powder Charge

It is understood that the charge amount of the powder in the embodiment was increased from 1g to 12g in the comparative example under the same time (i.e., the same number of cycles). In particular, in the comparative example, 1g of the powder was filled into one chamber. In contrast, in the example, a plurality of sub-chambers each including 3g of powder filled therein were loaded into the accommodation space and moved toward the discharge portion (from the first section to the fourth section) stepwise, and the gas was supplied five times per the loading or movement of the sub-chambers. Here, since the charged amount of the powder is increased by about 12 times under the condition that the same amount of gas is supplied the same number of times (20 times), the surface treatment of the powder can be efficiently performed.

Experimental example 2: STEM image analysis

Fig. 12 shows a Scanning Transmission Electron Microscope (STEM) image of a powder (i.e., Pt-supported catalyst) that was surface-treated in the sub-chambers of the first and fourth sections in the example in order. Fig. 13 shows other STEM images of the Pt-supported catalyst in the sub-chamber in the first section in the example, and fig. 14 shows other STEM images of the Pt-supported catalyst in the sub-chamber in the fourth section in the example.

With reference to fig. 12 to 14, it will be appreciated that the uniformity of the Pt coating of the Pt-supported catalyst disposed in the sub-chamber, particularly in the fourth section, was improved for the Pt-supported catalyst produced in the example compared to the comparative example. Further, it is understood that the amount of Pt carried in the sub-chamber in the fourth section is increased compared to the sub-chamber in the first section, and more supplied Pt precursor is consumed in the section closer to the supply portion (injection portion).

Experimental example 3: electrochemical activity assay

As can be seen from table 1, the amount of charge (QH, mC) for hydrogen desorption of the surface-treated powder (i.e., Pt-supported catalyst) increases in the same process time (i.e., the same number of cycles). Furthermore, it is understood that the electrochemical surface area (ECSA) increases substantially from 111.8m2/g to 189.6m2/g for the same process time (i.e., the same number of cycles). In the case of the example (sub-chamber in the fourth section), it is understood that excellent catalyst characteristics can be achieved by the stepwise movement and ALD process. In other words, it is understood that even though the ALD process was repeatedly performed for 20 cycles in the examples and comparative examples, the examples and comparative examples showed significant differences in the amount and uniformity of Pt supported on the carbon black powder. In particular, when a plurality of sub-chambers are loaded into the accommodation space and gradually moved toward the discharge portion, and the ALD process is performed 5 cycles per one movement of the sub-chambers, the powder can be uniformly coated with the gas by preventing the overgrowth.

Experimental example 4: energy dispersive X-ray spectroscopy (EDS) analysis

EDS analysis was performed on the gas in the sub-chambers in the first and fourth sections in the example to obtain the composition of Pt. The atomic weight ratio (wt%) and atomic number ratio (at%) of Pt are shown in table 2.

[ TABLE 2 ]

As can be seen from the results of table 2, there was almost no Pt in the sub-chamber of the fourth section, in contrast to the composition of Pt in the sub-chamber of the first section. It is understood that the larger amounts of carbon black and Pt precursor contact each other in a section near (or near) the supply portion (injection portion) rather than in a section near (or near) the discharge portion. Thus, the use of expensive noble metal precursors (e.g. Pt) is maximised by depositing Pt in conjunction with the stepwise movement of the sub-chambers.

As is apparent from the above description, a surface treatment apparatus for surface-treating powder and a method of surface-treating powder using the apparatus according to some embodiments of the present disclosure can improve the effect of surface treatment of powder and greatly increase the throughput of surface-treated powder by controlling the size and number of sub-chambers.

Furthermore, since a new sub-chamber newly added to the chamber is loaded near (or close to) the injection portion and the already loaded sub-chamber is moved away from the injection portion, the contact between the large amount of powder and the gas can be effectively controlled.

Therefore, in the case of performing surface treatment by contacting the metal precursor to the surface of the powder, it is possible to uniformly deposit the metal precursor, and thus to achieve a large electrochemical surface area and excellent catalyst characteristics, as compared to the conventional method.

Therefore, since the specific surface area/mass of the metal precursor for surface treatment is increased, the amount of metal required can be reduced while improving the performance of the catalyst. Therefore, cost reduction and mass production can be achieved, and thus production efficiency can be improved.

The effects of the present disclosure are not limited to the above effects. The effects of the present disclosure should be construed to include all effects derivable from the above description.

The present disclosure has been described in detail with reference to the preferred embodiments thereof. However, it would be appreciated by those skilled in the art that changes may be made in these embodiments without departing from the principles and spirit of the disclosure, the scope of which is defined in the claims and their equivalents.