阅读说明：本技术 一种稀土金属质电致变色薄膜电极及其制备方法和应用 (Rare earth metal electrochromic film electrode and preparation method and application thereof ) 是由 高太恒 张�成 黄越楷 廖兆贤 廖德艺 廖兆雄 于 2020-07-02 设计创作，主要内容包括：本发明提供一种稀土金属质电致变色薄膜电极及其制备方法和应用,该薄膜电极按照上下顺序依次为透明变色功能层、透明导电层和基材；所述透明变色功能层由稀土变色金属和间隙金属混合而成。制备方法包括：通过磁控溅射在基材上形成透明导电层；将稀土变色金属和间隙金属混合均匀后冲击成块,形成金属溅射靶材；在透明导电层上磁控溅射所述金属溅射靶材形成透明变色功能层,既得。本发明的变色功能层采用的是变色金属与间隙金属混合的技术方案,具有空穴多、空穴直径大、对离子嵌入与抽出阻碍小的特点,使得该薄膜电极变色响应快速,且颜色较深。(The invention provides a rare earth metal electrochromic film electrode and a preparation method and application thereof, wherein the film electrode sequentially comprises a transparent color-changing functional layer, a transparent conductive layer and a base material from top to bottom; the transparent color-changing functional layer is formed by mixing rare earth color-changing metal and gap metal. The preparation method comprises the following steps: forming a transparent conductive layer on a substrate by magnetron sputtering; uniformly mixing rare earth allochroic metal and gap metal, and then impacting into blocks to form a metal sputtering target material; and performing magnetron sputtering on the metal sputtering target material on the transparent conductive layer to form a transparent color-changing functional layer, thereby obtaining the metal sputtering target material. The color-changing functional layer adopts the technical scheme that the color-changing metal and the gap metal are mixed, and has the characteristics of more cavities, large cavity diameter and small obstruction to ion embedding and extraction, so that the thin-film electrode has quick color-changing response and darker color.)

1. A rare earth metal electrochromic film electrode is characterized in that: the transparent color-changing functional layer, the transparent conductive layer and the base material are sequentially arranged from top to bottom; the transparent color-changing functional layer is formed by mixing rare earth color-changing metal and gap metal.

2. The rare earth metal-based electrochromic film electrode as set forth in claim 1, wherein: the thickness of the transparent color-changing functional layer is 20nm-50 nm.

3. A rare earth metal-based electrochromic film electrode as set forth in claim 1, wherein: the transparent conducting layer is an ITO layer, and the thickness of the transparent conducting layer is 5nm-50 nm.

4. A rare earth metal-based electrochromic film electrode as set forth in claim 3, wherein: the square resistance of the ITO layer is 80-300 omega.

5. The rare earth metal-based electrochromic film electrode as set forth in claim 1, wherein: the base material is PET, the thickness is 20-200 μm, and the thickness error is not more than 5 μm.

6. A rare earth metal-based electrochromic film electrode as set forth in claim 1 or 2, characterized in that: the transparent color-changing functional layer contains rare earth color-changing metal 70-95 wt% and gap metal 5-30 wt%.

7. The rare earth metal-based electrochromic film electrode as set forth in claim 6, wherein: the rare earth color-changing metal is Nb, W, Ir, Rh, Co or at least one of the metal oxides.

8. The rare earth metal-based electrochromic film electrode as set forth in claim 6, wherein: the interstitial metal comprises Ti, Ni, Ta, Mo or at least one of the foregoing metal oxides.

9. The method for preparing a rare earth metal electrochromic film electrode as claimed in any one of claims 1 to 8, characterized in that: the method comprises the following steps:

forming a transparent conductive layer on a substrate by magnetron sputtering;

uniformly mixing rare earth allochroic metal and gap metal, and then impacting into blocks to form a metal sputtering target material;

and performing magnetron sputtering on the metal sputtering target material on the transparent conductive layer to form a transparent color-changing functional layer, thereby obtaining the metal sputtering target material.

10. Use of a rare earth metal electrochromic thin film electrode according to any one of claims 1 to 8 or obtained by the preparation method according to claim 9.

Technical Field

The invention relates to the technical field of electrochromic film preparation, in particular to a rare earth metal electrochromic film electrode and a preparation method and application thereof.

Background

The electrochromic film belongs to the latest product in the field of electro-optic response film, and has the advantages of no angle, low haze, low voltage, low power consumption, memory property and the like. The organic electrochromic electrode is generally divided into two categories of organic electrochromic electrodes and inorganic electrochromic electrodes, the relative weather resistance of the organic electrochromic electrode is poor, and the organic electrochromic electrode cannot be applied to outdoor, high-temperature and high-humidity occasions for a long time, so the application prospect is lower than that of the inorganic electrochromic electrode.

The existing inorganic electrochromic electrode is based on rare earth metal target formation, and then an electrochromic layer formed by magnetron sputtering generally selects unsaturated transition metal as a main color-changing metal, so that ions are conveniently embedded and extracted, and certain gap metal is needed to be matched, so that the magnetron sputtering layer made of combined metal has more and larger cavities, and a color-changing functional layer which is stable, longer in effect and faster in response is formed. However, the existing inorganic electrochromic electrode has poor weather resistance and easy aging, and generally adopts single metal sputtering, so that the color change reaction is slow and the color is lighter.

Disclosure of Invention

In order to overcome the defects of the prior art, the invention aims to provide a rare earth metal electrochromic film electrode and a preparation method and application thereof.

In order to solve the problems, the technical scheme adopted by the invention is as follows:

in a first aspect, the invention provides a rare earth metal electrochromic film electrode, which sequentially comprises a transparent color-changing functional layer, a transparent conductive layer and a substrate from top to bottom; the transparent color-changing functional layer is formed by mixing rare earth color-changing metal and gap metal.

Further, the thickness of the transparent color-changing functional layer is 20nm-50 nm.

Furthermore, the transparent conducting layer is an ITO layer, and the thickness is 5nm-50 nm.

Preferably, the tetragonal resistance of the ITO layer is 80-300 Ω.

Further, the base material is PET, the thickness is 20-200 μm, and the thickness error is not more than 5 μm.

Furthermore, the mass content of the rare earth color-changing metal in the transparent color-changing functional layer is 70-95%, and the mass content of the gap metal is 5-30 wt%.

Preferably, the rare earth color-changing metal is Nb, W, Ir, Rh, Co or at least one of the foregoing metal oxides.

Preferably, the interstitial metal comprises Ti, Ni, Ta, Mo or at least one of the foregoing metal oxides.

In a second aspect, the present invention provides a method for preparing a rare earth metal electrochromic thin film electrode, comprising the following steps:

forming a transparent conductive layer on a substrate by magnetron sputtering;

uniformly mixing rare earth allochroic metal and gap metal, and then impacting into blocks to form a metal sputtering target material;

and performing magnetron sputtering on the metal sputtering target material on the transparent conductive layer to form a transparent color-changing functional layer, thereby obtaining the metal sputtering target material.

Further, the metal sputtering target is magnetron sputtered on the transparent conductive layer to form a transparent color-changing functional layer, and the content of magnetron sputtering oxygen atmosphere is 1-30%.

In a third aspect, the invention provides an application of the rare earth metal electrochromic film electrode or the rare earth metal electrochromic film electrode obtained by the preparation method.

Compared with the prior art, the invention has the beneficial effects that:

the invention adopts the rare earth metal color-changing functional layer, has higher weather resistance grade than the existing inorganic electrochromic electrode, can adapt to high-temperature, high-humidity and high-ultraviolet environment, and can be widely applied to the fields of building outer walls, automobile glass and the like. The color-changing functional layer adopts the technical scheme that the color-changing metal and the gap metal are mixed, and has the characteristics of more holes, large hole diameter and small obstruction to ion embedding and extraction, so that the thin-film electrode has quick color-changing response and darker color. In addition, the invention has simple implementation and mature process, can be produced by magnetron sputtering for two times, has low cost and is the key point that the electrochromic material can be massively and cheaply produced.

Drawings

Fig. 1 is a schematic structural view of a rare earth metal-based electrochromic thin film electrode according to embodiment 1 of the present invention, in which 1 represents a transparent color-changing functional layer, 2 represents a transparent conductive layer, and 3 represents a substrate.

Detailed Description

In the description of the present invention, it is to be noted that those whose specific conditions are not specified in the examples are carried out according to the conventional conditions or the conditions recommended by the manufacturers. The reagents or instruments used are not indicated by the manufacturer, and are all conventional products available commercially.

The present invention will now be described in further detail with reference to the following figures and specific examples, which are intended to be illustrative, but not limiting, of the invention.