阅读说明：本技术 半导体装置的制造装置及半导体装置的制造方法 (semiconductor device manufacturing apparatus and semiconductor device manufacturing method ) 是由 中村祥太郎 于 2019-05-23 设计创作，主要内容包括：目的在于提供一种技术,其能够一边抑制设备成本的上升一边对半导体晶片的被镀面形成膜厚以及膜质均匀性优异的镀膜。半导体装置的制造装置具备：反应槽(2),其使半导体晶片(8)浸渍于反应溶液(10)而在半导体晶片(8)形成镀膜；供给管(4),其在反应槽(2)的内部延伸设置,并且在供给管(4)沿延伸设置方向设置有喷出反应溶液(10)的多个喷出孔(4a)；作为储存槽的外槽(3),其在供给管(4)的一端侧与反应槽(2)相邻设置,并且储存从反应槽2溢出的反应溶液(10),多个喷出孔(4a)中的离外槽3距离远的部分的开口率至少局部性地大于离外槽3距离近的部分的开口率。(An object is to provide a technique capable of forming a plating film having excellent uniformity in film thickness and film quality on a surface to be plated of a semiconductor wafer while suppressing an increase in facility cost. The manufacturing device of the semiconductor device comprises: a reaction tank (2) for immersing a semiconductor wafer (8) in a reaction solution (10) to form a plating film on the semiconductor wafer (8); a supply pipe (4) which is provided so as to extend inside the reaction tank (2), and in which a plurality of discharge holes (4a) for discharging the reaction solution (10) are provided along the direction in which the supply pipe (4) extends; and an outer tank (3) as a storage tank which is provided adjacent to the reaction tank (2) on one end side of the supply pipe (4) and stores the reaction solution (10) overflowing from the reaction tank (2), wherein the opening ratio of a portion of the plurality of discharge holes (4a) that is distant from the outer tank (3) is at least partially larger than the opening ratio of a portion that is close to the outer tank (3).)

1. An apparatus for manufacturing a semiconductor device, comprising:

A reaction tank for immersing a semiconductor wafer in a reaction solution to form a coating film on the semiconductor wafer;

A supply pipe extending inside the reaction tank and having a plurality of discharge holes for discharging the reaction solution, the discharge holes being provided in the supply pipe along an extending direction; and

A storage tank which is provided adjacent to the reaction tank and stores the reaction solution overflowing from the reaction tank,

The opening ratio of a portion of the plurality of discharge holes which is distant from the reservoir is at least partially larger than the opening ratio of a portion which is distant from the reservoir.

2. The manufacturing apparatus of a semiconductor device according to claim 1,

the supply pipe extends in a direction away from the storage tank.

3. the manufacturing apparatus of a semiconductor device according to claim 2,

The supply pipes are arranged in a plurality in a direction intersecting with an extending direction of the supply pipes.

4. The manufacturing apparatus of a semiconductor device according to claim 2 or 3,

Further comprises a storage tank different from the storage tank,

The storage tank is provided at one end side of the supply pipe,

The other reserve tank is provided on the other end side of the supply pipe,

The opening ratio of a portion of the plurality of discharge holes which is distant from the other reservoir is at least partially larger than the opening ratio of a portion which is close to the other reservoir.

5. The manufacturing apparatus of a semiconductor device according to claim 1,

The supply pipes are arranged in a plurality in a direction away from the storage tank and intersecting with the extending direction of the supply pipes.

6. the manufacturing apparatus of a semiconductor device according to any one of claims 1 to 5,

the diameters of the plurality of discharge holes are at least partially larger in a portion distant from the reservoir than in a portion close to the reservoir, or the densities of the plurality of discharge holes are at least partially larger in a portion distant from the reservoir than in a portion close to the reservoir.

7. the manufacturing apparatus of a semiconductor device according to claim 2,

The reaction tank has a rectangular shape in plan view,

The storage tank is arranged adjacent to the short side of the rectangular shape of the reaction tank,

The supply pipe extends in a direction parallel to the long side of the rectangular shape of the reaction tank.

8. The manufacturing apparatus of a semiconductor device according to claim 5,

The reaction tank has a rectangular shape in plan view,

The storage tank is arranged adjacent to the long side of the rectangular shape of the reaction tank,

The plurality of supply pipes extend in a direction parallel to the long sides of the rectangular shape of the reaction tank.

9. A method for manufacturing a semiconductor device includes the steps of:

A step (a) of cleaning a surface to be plated of a semiconductor wafer; and

A step (b) of forming the plating film by supplying the reaction solution to the surface to be plated of the semiconductor wafer using the apparatus for manufacturing a semiconductor device according to any one of claims 1 to 8.

10. The method for manufacturing a semiconductor device according to claim 9,

the step (a) is a step of performing a plasma cleaning treatment,

The plasma used in the plasma cleaning process is oxygen or argon.

11. The method for manufacturing a semiconductor device according to claim 9,

The step (b) is a step of using an electroless plating method.

Technical Field

The present invention relates to a manufacturing apparatus of a semiconductor device and a manufacturing method of a semiconductor device, which form a plating film having excellent uniformity of film thickness and film quality on a surface to be plated of a semiconductor wafer by an electroless plating method.

Background

In a power semiconductor device, for example, a power device such as an IGBT (insulated gate bipolar transistor) and a MOSFET (MOS field effect transistor), a semiconductor substrate is thinned in order to improve current carrying performance such as on characteristics. In recent years, in order to improve manufacturing cost and characteristics, a semiconductor device is manufactured by an ultra-thin wafer process which is thinned to about 50 μm.

On the other hand, when such a front-back conduction type power semiconductor device is mounted on a circuit board or the like, the back surface side is solder-bonded to the substrate, and the front surface side is wire-bonded with an aluminum wire or the like to perform electrical connection. In recent years, since the current carrying performance of a power semiconductor device has been improved, a structure has been developed in which the current carrying performance and the heat dissipation performance of a power semiconductor module in which the power semiconductor device is incorporated are improved by solder-bonding both surfaces. Therefore, an electrode layer formed on the front surface side of the power semiconductor device needs a Ni/Au film having excellent soldering performance.

However, since the Ni film is eroded by the solder and gradually decreases at the time of soldering, the Ni film of 2 μm or more is required. In vacuum film formation methods such as vapor deposition and sputtering, the film formation rate is slow and patterning is difficult, and there remains a problem in terms of production efficiency and production cost. Therefore, attention is being paid to formation of Ni by electroless plating which enables high-speed film formation, is easy to pattern, and is low in cost.

In forming a Ni plating layer on an Al alloy electrode surface of a semiconductor wafer, electroless Ni plating using a method called zincate method is generally used. Electroless Ni plating using the zincate method is a technique in which an Al alloy electrode formed on a semiconductor wafer is degreased and pickled to make the Al alloy electrode an active surface, and then a Zn film is deposited thinly on the surface of the Al alloy electrode by making the standard redox potential of Zn higher than that of Al. Then, the Zn film is replaced with the Ni film, and the Ni film is formed by a self-precipitation reaction.

in the above-described production, a semiconductor wafer is usually placed on a carrier, and the carrier on which the semiconductor wafer is placed is immersed in a tank to which each chemical solution is added to perform a treatment. In particular, in order to ensure uniformity of film thickness and film quality during processing in the Ni plating solution tank, it is necessary to make the flow rate of the solution in the Ni plating solution tank uniform. In order to improve the uniformity of film thickness and film quality, the volume of the Ni plating solution tank is increased, the outer tank is made 4-sided, and the supply piping is improved, for example, with respect to the structure in the tank.

However, if the above-described structure is realized, the apparatus becomes large in size and the facility cost also increases. As a technique for ensuring the uniformity of the film thickness and the film quality of the plating layer, for example, there is a technique disclosed in patent document 1.

Patent document 1 discloses a technique in which an outer tank is a bath tank having a 4-sided structure, and the aperture ratio of holes provided in a supply pipe is lower on the supply side of a reaction solution and higher on the bubble release side, whereby the occurrence of bubbles can be suppressed, and a film having excellent film thickness and film quality uniformity can be formed.

Patent document 1: japanese patent laid-open No. 2014-234539

However, in the technique described in patent document 1, it is difficult to ensure the uniformity of the film thickness and the film quality of the plating layer with respect to the outer groove on one surface. Further, it is necessary to provide a bubble releasing portion as a structure for releasing bubbles in the supply pipe, and since the bath is also a 4-sided outer tank, there is also a problem that the facility cost is increased. Further, by providing the bubble releasing portion, the amount of the reaction solution supplied to the surface to be plated is reduced as compared with the case where the bubble releasing portion is not provided. Therefore, the film formation rate is reduced and the throughput is also reduced. In order to increase the amount of the reaction solution to be supplied, it is necessary to increase the size of the pump, and as a result, the facility cost is expected to increase.

Disclosure of Invention

accordingly, an object of the present invention is to provide a technique for forming a plating film having excellent uniformity in film thickness and film quality on a surface to be plated of a semiconductor wafer while suppressing an increase in facility cost.

The manufacturing device of the semiconductor device according to the present invention includes: a reaction tank for immersing a semiconductor wafer in a reaction solution to form a coating film on the semiconductor wafer; a supply pipe extending inside the reaction tank and having a plurality of discharge holes for discharging the reaction solution, the discharge holes being provided in the supply pipe along an extending direction; and a storage tank that is provided adjacent to the reaction tank and stores the reaction solution overflowing from the reaction tank, wherein an opening ratio of a portion of the plurality of ejection holes that is distant from the storage tank is at least partially larger than an opening ratio of a portion of the plurality of ejection holes that is close to the storage tank.

ADVANTAGEOUS EFFECTS OF INVENTION

According to the present invention, the aperture ratio of the portion of the plurality of ejection holes which is distant from the reservoir is at least partially larger than the aperture ratio of the portion which is distant from the reservoir, so that the flow rate of the liquid in the reaction vessel can be made uniform, and a plated film having excellent uniformity in film thickness and film quality can be formed on the semiconductor wafer. Since such an effect can be achieved with a simple configuration, an increase in equipment cost can be suppressed.

drawings

fig. 1 is a schematic diagram of an apparatus for manufacturing a semiconductor device according to embodiment 1.

fig. 2 is a schematic view showing the arrangement of the ejection holes of the supply pipe provided in the apparatus for manufacturing a semiconductor device according to embodiment 1.

Fig. 3 is a schematic view showing the arrangement of the ejection holes of another supply pipe provided in the apparatus for manufacturing a semiconductor device according to embodiment 1.

Fig. 4 is a flowchart of a method for manufacturing a semiconductor device according to embodiment 1.

fig. 5 is a flowchart of the plating process.

Fig. 6 is a graph showing the simulation result of the magnitude of the flow velocity before the change of the aperture ratio of the supply pipe.

fig. 7 is a graph showing the simulation result of the magnitude of the flow velocity after the aperture ratio of the supply pipe is changed.

FIG. 8 is a graph showing a comparison between the difference in film thickness between plating carriers and the uniformity of NiP film thickness.

Fig. 9 is a schematic view of a plurality of supply tubes provided in the manufacturing apparatus of a semiconductor device according to modification 1 of embodiment 1.

Fig. 10 is a schematic view of another plurality of supply tubes provided in the manufacturing apparatus of a semiconductor device according to modification 1 of embodiment 1.

Fig. 11 is a schematic diagram of an apparatus for manufacturing a semiconductor device according to modification 2 of embodiment 1.

Fig. 12 is a schematic view showing the arrangement of the ejection holes of the supply pipe provided in the manufacturing apparatus of the semiconductor device according to modification 2 of embodiment 1.

Fig. 13 is a schematic view showing a relationship between a plurality of supply tubes and an outer tank provided in the apparatus for manufacturing a semiconductor device according to embodiment 2.

Fig. 14 is a schematic view showing the relationship between a plurality of supply pipes and an outer tank provided in the manufacturing apparatus for a semiconductor device according to embodiment 2.

Description of the reference numerals

1. 1A, 1B and 1C film forming apparatus, 2 reaction tank, 3 outer tank, 4 supply pipe, 4a spray hole, 4B pipeline and 8 semiconductor wafer.

Detailed Description

< embodiment 1 >

Embodiment 1 of the present invention will be described below with reference to the drawings. Fig. 1 is a schematic diagram of an apparatus for manufacturing a semiconductor device according to embodiment 1, and is a cross-sectional view taken along a direction parallel to the long side of a reaction vessel 2. Fig. 2 is a schematic diagram showing the arrangement of the ejection holes 4a of the supply pipe 4 provided in the manufacturing apparatus of the semiconductor device. Fig. 3 is a schematic diagram showing the arrangement of the ejection holes 4a of another supply pipe 4 provided in the manufacturing apparatus of the semiconductor device.

The chemical solution tank for electroless Ni plating generally has a 4-sided or 2-sided storage tank. In embodiment 1, the chemical solution tank has a single-sided storage tank. As shown in fig. 1, a film deposition apparatus 1, which is an apparatus for manufacturing a semiconductor device, is an apparatus for performing electroless Ni plating on a semiconductor wafer 8 processed by the steps shown in fig. 4 and 5 described later.

As shown in fig. 2 and 3, the supply pipe 4 includes a plurality of discharge holes 4 a. The plurality of discharge holes 4a are provided along the extending direction of the supply pipe 4. The opening ratio of the portion of the plurality of discharge holes 4a that is distant from the outer tub 3 is at least partially larger than the opening ratio of the portion that is distant from the outer tub 3. This makes it possible to deposit a Ni plating film having excellent film thickness and film quality uniformity on the Al alloy film of the semiconductor wafer 8 by electroless plating with a simple equipment structure without lowering production efficiency, and therefore, this is effective in suppressing an increase in equipment cost. The aperture ratio is an aperture ratio per unit length of the supply pipe 4.

Next, a method for manufacturing the semiconductor device will be described. Fig. 4 is a flowchart of a method of manufacturing a semiconductor device. Fig. 5 is a flowchart of the plating process.

As shown in fig. 4, a wafer surface side circuit is first formed (step S1). In the step of forming a circuit on the front surface of the wafer, a semiconductor element region is formed on the front surface of the semiconductor wafer 8 made of Si through an implantation step, a diffusion step, a photolithography step, an etching step, and a film formation step.

Next, wafer surface electrodes are formed (step S2). In the step of forming the wafer surface electrode, a surface electrode made of, for example, aluminum is formed in a desired region of, for example, about 5 μm on the surface of the semiconductor wafer 8 by using a vacuum vapor deposition method, a sputtering method, or the like. As a material of the surface electrode, pure Al, AlSi alloy, AlCu alloy, or AlSiCu alloy can be used.

Next, the back surface of the wafer is thinned (step S3). In the step of thinning the back surface of the wafer, the surface of the semiconductor wafer 8 is thinned to a desired thickness by wet etching or machining including hydrofluoric acid or nitric acid. Then, a wafer back surface diffusion layer is formed by activation treatment by ion implantation or heat treatment (step S4).

Next, a wafer back surface electrode is formed (step S5). In the step of forming the wafer back electrode, a Ni/Au film having excellent soldering performance is formed by a vacuum deposition method, a sputtering method, or the like as in the case of the front surface. As a material of the back electrode, for example, AlSi alloy, NiSi alloy, or TiSi alloy can be used as a metal silicide layer that can be in ohmic contact with the semiconductor wafer 8.

When the plating film is formed on both surfaces of the semiconductor wafer 8, the step is performed until the metal silicide layer is formed. Then, after the plating pretreatment is performed (step S6), a plating film is formed by the plating treatment (step S7).

Next, the details of the plating process will be described. As shown in fig. 5, first, in the surface activation treatment, an oxygen plasma cleaning treatment is performed on the electrode surface formed on the surface (step S11). The oxygen plasma cleaning treatment is a treatment method of cleaning the surface by subjecting the organic residue that cannot be removed in the plating pretreatment to acidolysis and bombardment with oxygen plasma.

Subsequently, degreasing and pickling are performed (steps S12 and S13). The degreasing treatment is performed to remove slight organic contamination and oxide film remaining on the surface of the Al alloy. Subsequently, the surface of the Al alloy is neutralized, and the surface of the Al alloy is etched to roughen the surface, thereby performing a treatment for improving the reactivity of a treatment liquid in a subsequent step and improving the adhesion of the plating layer.

Subsequently, a zincate treatment is performed (step S14). The zincate treatment is a treatment for forming a zinc (Zn) coating on the surface of the Al alloy while removing an Al oxide film. After the Zn coating is removed by immersion in nitric acid (step S15), zincate treatment is performed again (step S16) to form a Zn coating. By performing the zincate treatment 2 times in this manner, a dense Zn coating was formed on the surface of the Al alloy, and a plating film having strong adhesion and excellent uniformity was obtained. In the zincate treatment, the surface of the Al alloy is smoother and the plating is more satisfactory as the number of times is increased, but the number of times is usually at most about 3 times in consideration of the production efficiency.

then, electroless Ni plating is performed (step S17). When an Al alloy film covered with Zn is immersed in an electroless Ni plating solution, the standard redox potential of Zn is lower than that of Ni, and therefore Ni is first precipitated on the Al alloy. Then, if the surface is covered with Ni, Ni is formed by reductive deposition by the action of the reducing agent contained in the plating solution. The thickness of the electroless Ni plating film is preferably 2 μm or more and 10 μm or less in consideration of film stress to the semiconductor wafer 8 and the like.

Finally, in order to prevent oxidation, after the electroless Ni plating film is formed, the semiconductor wafer 8 is immersed in the electroless Au plating solution to form an electroless Au plating film of 20nm or more and 100nm or less (step S16). Thus, in the electroless plating method, such a thick film of several μm can be easily formed, and an electroless Ni plating film is not deposited on the upper surface of a protective film such as polyimide which does not cause electron exchange. This makes it possible to selectively precipitate the electroless Ni plating layer, thereby facilitating the process and improving the production efficiency.

The explanation returns to the film deposition apparatus 1. As shown in fig. 1, the film deposition apparatus 1 includes: a reaction tank 2, an outer tank 3 as a storage tank, a supply pipe 4, a pump 5, a heater 6, a rectifying plate 7, a carrier 9, and a pipe 11.

The reaction tank 2 is rectangular in plan view, and has a supply pipe 4, a rectifying plate 7, and a carrier 9 provided therein. The carrier 9 is a member for setting the semiconductor wafer 8. By arranging the semiconductor wafers 8 provided on the carrier 9 so as to be parallel to or perpendicular to the supply pipe 4, a large number of the semiconductor wafers 8 can be deposited with Ni plating films at a time. The semiconductor wafer 8 is immersed in a reaction solution 10 stored inside the reaction tank 2 to form a plating film on the semiconductor wafer 8. The rectifying plate 7 is disposed below the carrier 9.

The outer tank 3 is provided adjacent to the reaction tank 2 on one end side of the supply pipe 4. More specifically, the outer tank 3 is provided adjacent to the short side of the rectangular shape of the reaction tank 2, and stores the reaction solution overflowing from the reaction tank 2. This makes it possible to reduce the size of the film deposition apparatus 1.

The pipe 11 is connected between the bottom of the reaction tank 2 and the bottom of the outer tank 3. The supply pipe 4, the pump 5, and the heater 6 are connected to a pipe 11. This enables the reaction solution 10 to be supplied to the supply pipe 4 and circulated in the reaction tank 2.

The supply pipe 4 extends horizontally inside the reaction tank 2 and is disposed below the rectifying plate 7. More specifically, the supply pipe 4 extends in a direction parallel to the rectangular long side of the reaction tank 2. That is, the supply pipe 4 extends in a direction away from the outer tank 3.

The supply pipe 4 supplies the reaction solution 10 to the reaction tank 2. The supply pipe 4 is connected to a pipe 11 that penetrates the center of the bottom of the reaction tank 2. The reaction solution 10 supplied to the central portion of the supply pipe 4 in the extending direction is branched to the side closer to the outer tank 3 and the side farther from the outer tank 3, and is discharged from the plurality of discharge holes 4a formed in the supply pipe 4 and supplied to the reaction tank 2. The supply pipe 4 has a plurality of discharge holes 4a, and the discharge holes 4a are arranged so as to face upward or obliquely upward of the reaction tank 2. The discharge holes 4a are disposed to face upward of the reaction tank 2, but may be disposed to face downward, laterally, or obliquely downward.

This can suppress fluctuation of the reaction solution 10 discharged from each discharge hole 4a, and can make the flow rate of the reaction solution 10 supplied to the semiconductor wafer 8 uniform. However, since the overflow direction of the reaction solution 10 is one side, the reaction solution 10 is pulled toward the outer tank 3, and the flow rate of the reaction solution on the side opposite to the outer tank 3 is reduced.

Therefore, as shown in fig. 2 and 3, the opening ratio of the portion of the plurality of discharge holes 4a that is distant from the outer tank 3 needs to be at least partially larger than the opening ratio of the portion that is close to the outer tank 3. Further, there are two cases where, as shown in fig. 2, the opening ratio of a portion of the plurality of ejection holes 4a which is distant from the outer tank 3 is larger than the opening ratio of a portion which is close to the outer tank 3 with respect to the entire supply pipe 4, and where, as shown in fig. 3, the opening ratio of a portion of the plurality of ejection holes 4a which is distant from the outer tank 3 is locally larger than the opening ratio of a portion which is close to the outer tank 3.

The details of the supply pipe 4 will be described next. As shown in fig. 2, the supply pipe 4 includes a plurality of discharge holes 4 a. The plurality of discharge holes 4a are, for example, circular and are provided along the extending direction of the supply pipe 4. The opening ratio of the portion of the plurality of discharge holes 4a that is farther from the outer tank 3 is larger than the opening ratio of the portion that is closer to the outer tank 3. In other words, the farther the plurality of discharge holes 4a are from the outer tub 3, the larger the opening ratio. In fig. 2, the left side is a portion close to outer tub 3, and the right side is a portion far from outer tub 3.

The aperture ratio is an aperture ratio per unit length, and can be changed by changing the aperture diameter (in other words, area), density, pitch, number, or shape of the ejection holes 4 a. In fig. 2, the aperture ratio is changed by changing the hole diameter of the discharge hole 4a, but in fig. 3, the aperture ratio is changed by changing the density of the discharge hole 4 a. Specifically, in fig. 2, the larger the distance between the plurality of discharge holes 4a and the outer tub 3, the larger the hole diameter. In fig. 3, the density of the plurality of discharge holes 4a is locally higher in a portion distant from the outer tank 3 than in a portion close to the outer tank 3.

In fig. 2, the hole diameter of the portion of the plurality of discharge holes 4a that is distant from the outer tank 3 may be partially larger than the hole diameter of the portion that is close to the outer tank 3, instead of the entire supply pipe 4. In fig. 3, the density of the plurality of discharge holes 4a may be increased in a portion distant from the outer tank 3 as compared with a portion close to the outer tank 3 in the entire supply pipe 4, not locally.

Thus, the flow rate of the reaction solution 10 passing through the semiconductor wafer 8 is uniform in the reaction tank 2, and the plated film has a film thickness and a film quality excellent in uniformity.

By adjusting the aperture ratio of the plurality of ejection holes 4a, it is possible to deposit a Ni plating film excellent in film thickness and film quality uniformity on the Al alloy film of the semiconductor wafer 8 by electroless plating with a simple equipment configuration without lowering the production efficiency, and therefore, this is effective in suppressing the increase in equipment cost.

Fig. 6 and 7 show simulation results when the opening ratio of the discharge hole 4a is actually changed. Fig. 6 is a graph showing the simulation result of the magnitude of the flow velocity before the change of the aperture ratio of the supply pipe 4. Fig. 7 is a graph showing the simulation result of the magnitude of the flow velocity after the aperture ratio of the supply pipe 4 is changed. FIG. 8 is a graph showing a comparison between the difference in film thickness between plating carriers and the uniformity of NiP film thickness.

as shown in fig. 8, as a result of the electroless Ni plating treatment performed on the semiconductor wafer 8, the in-plane uniformity of the Ni plating film was CV (coefficient of variation) of 8.96% and the difference in film thickness between the plating carriers was 0.60 μm before the aperture ratio of the ejection holes 4a was changed, whereas the in-plane uniformity of the Ni plating film was CV of 7.63 and the difference in film thickness between the plating carriers was 0.07 μm after the aperture ratio of the ejection holes 4a was changed, which gave favorable results.

As described above, in the manufacturing apparatus of a semiconductor device according to embodiment 1, the aperture ratio of the portion of the plurality of ejection holes 4a that is distant from the outer tank 3 is at least partially larger than the aperture ratio of the portion that is close to the outer tank 3, so that the flow rate of the liquid in the reaction tank 2 can be made uniform, and a plating film having excellent uniformity in film thickness and film quality can be formed on the semiconductor wafer 8. Since such an effect can be achieved with a simple configuration, an increase in equipment cost can be suppressed.

The diameters of the plurality of discharge holes 4a are at least partially larger in a portion distant from the outer tank 3 than in a portion close to the outer tank 3, or the densities of the plurality of discharge holes 4a are at least partially larger in a portion distant from the outer tank 3 than in a portion close to the outer tank 3. Therefore, the degree of freedom in designing the film formation device 1 can be increased, and the film formation device 1 can be manufactured more easily.

The reaction tank 2 is rectangular in plan view, the outer tank 3 is provided adjacent to the short side of the rectangular shape of the reaction tank 2, and the supply pipe 4 extends in the direction parallel to the long side of the rectangular shape of the reaction tank 2, so that the reaction solution 10 can be supplied to the entire reaction tank 2 by 1 supply pipe 4. In this way, the number of supply pipes 4 can be reduced, and therefore the film deposition apparatus 1 can be manufactured more easily.

The method for manufacturing a semiconductor device further includes: a step (a) of cleaning the surface to be plated of the semiconductor wafer 8; and a step (b) of supplying the reaction solution 10 to the surface to be plated of the semiconductor wafer 8 in the film formation apparatus 1 to form a plated film.

Therefore, the organic residue adhering to the surface to be plated is cleaned, and the wettability of the plating solution is ensured, whereby a plating film having excellent film thickness and film quality uniformity can be formed. Further, by adjusting the opening ratio of the ejection holes 4a, the amount of the reaction solution 10 supplied from the plurality of ejection holes 4a of the supply pipe 4 can be adjusted, and the flow rate can be made uniform over the entire surface to be plated.

The step (a) is a step of performing a plasma cleaning treatment, and since the plasma used in the plasma cleaning treatment is oxygen or argon, by using a plasma having oxidizing and etching forces, it is possible to efficiently remove contaminants adhering to the surface to be plated.

Since the step (b) is a step using an electroless plating method, electroless plating can be performed with a simple equipment configuration while ensuring production efficiency.

< modification of embodiment 1 >

Next, modification 1 of embodiment 1 will be described. Fig. 9 is a schematic view of a plurality of supply tubes 4 provided in the manufacturing apparatus of a semiconductor device according to modification 1 of embodiment 1. Fig. 10 is a schematic view of another plurality of supply tubes 4 provided in the manufacturing apparatus of the semiconductor device according to modification 1 of embodiment 1.

as shown in fig. 9, the supply pipes 4 extend in a direction parallel to the long sides of the rectangular shape of the reaction tank 2, and 4 supply pipes are arranged in a direction intersecting the extending direction of the supply pipes 4, that is, in a direction parallel to the short sides of the rectangular shape of the reaction tank 2. The 4 supply pipes 4 are connected by 3 pipes 4b intersecting the extending direction. The number of the pipes 4b is not limited to 3, and may be, for example, only 1 in the center.

Among the plurality of ejection holes 4a provided in the 4 supply pipes 4, the portion distant from the outer tub 3 has an opening ratio at least partially larger than the portion distant from the outer tub 3.

more specifically, in the right side portion of the 4 supply pipes 4, the opening ratio of the portion of the plurality of discharge holes 4a that is farther from the outer tank 3 is larger than the opening ratio of the portion that is closer to the outer tank 3. That is, the plurality of discharge ports 4a have the same diameter, and the plurality of discharge ports 4a are provided at small intervals so that the density of the plurality of discharge ports 4a becomes higher in a portion of the plurality of discharge ports 4a that is distant from the outer tank 3. The plurality of discharge holes 4a are provided at intervals larger than those at portions distant from the outer tank 3 so that the density of the portions close to the outer tank 3 among the plurality of discharge holes 4a becomes smaller.

Further, the plurality of discharge holes 4a are provided at equal intervals at the left side portions of the 4 supply pipes 4 so as to reduce the density of the plurality of discharge holes 4a, the intervals being larger than the intervals at the right side portions of the 4 supply pipes 4. That is, if only the left side portions of the 4 supply pipes 4 are viewed, the density of the plurality of ejection holes 4a is constant. In addition, the left side portions of the 4 supply pipes 4 may be provided with the plurality of discharge holes 4a at intervals larger than the portions farther from the outer tank 3 so that the density of the portions closer to the outer tank 3 among the plurality of discharge holes 4a becomes smaller.

Thereby, more reaction solution 10 can be supplied to the entire reaction tank 2 than in the case of 1 supply tube 4.

alternatively, as shown in fig. 10, the plurality of discharge holes 4a may have a larger diameter as they are farther from the outer tub 3. In this case, the same effect as in the case of fig. 9 is obtained. Further, the hole diameter of the portion of the plurality of discharge holes 4a that is distant from the outer tank 3 may be locally larger than the hole diameter of the portion that is close to the outer tank 3, instead of the entire supply pipe 4.

As described above, in the manufacturing apparatus of a semiconductor device according to modification 1 of embodiment 1, a plurality of supply tubes 4 are arranged in a direction intersecting the direction in which the supply tubes 4 extend.

Therefore, the flow rate of the liquid in the reaction tank 2 can be made uniform, and a plating film having excellent uniformity in film thickness and film quality can be formed on the semiconductor wafer 8. Since such an effect can be achieved with a simple configuration, an increase in equipment cost can be suppressed. The plurality of supply pipes 4 provided with the plurality of discharge holes 4a can all be provided with the same specification. This makes it possible to facilitate the design and manufacture of the film deposition apparatus.

Next, modification 2 of embodiment 1 will be described. Fig. 11 is a schematic view of a film formation apparatus 1A as an apparatus for manufacturing a semiconductor device according to modification 2 of embodiment 1, and is a cross-sectional view taken along a direction parallel to the long side of the reaction tank 2. Fig. 12 is a schematic view showing the arrangement of the ejection holes 4a of the supply pipe 4 in the film formation device 1A according to modification 2 of embodiment 1.

As shown in fig. 11, the film formation apparatus 1A includes: reaction tank 2, 2 outer tanks 3, supply pipe 4, pump 5, heater 6, flow regulating plate 7, carrier 9, and piping 11.

The 2 outer tanks 3 are provided adjacent to the reaction tank 2 on one end side and the other end side of the supply pipe 4. More specifically, 2 outer tanks 3 are provided adjacent to 2 shorter sides of the rectangular shape of the reaction tank 2. In fig. 11, the outer tank 3 on the right side corresponds to the other reserve tanks.

as shown in fig. 12, the opening ratio of the portion of the plurality of discharge holes 4a that is farther from the left outer tank 3 is at least partially larger than the opening ratio of the portion that is closer to the left outer tank 3. Similarly, the opening ratio of the portion of the plurality of discharge holes 4a that is farther from the right outer tank 3 is at least partially larger than the opening ratio of the portion that is closer to the right outer tank 3. More specifically, in the right portion of the supply pipe 4, the diameter of the discharge holes 4a increases as the distance from the outer tank 3 on the right side increases. In the left portion of the supply pipe 4, the diameter of the plurality of discharge holes 4a increases as the distance from the left outer tank 3 increases.

Alternatively, the density of the plurality of discharge holes 4a may be increased as the distance from the right outer tank 3 is increased in the right portion of the supply pipe 4, and the density of the plurality of discharge holes 4a may be increased as the distance from the left outer tank 3 is increased in the left portion of the supply pipe 4.

The film formation apparatus 1A may further include 3 or 4 outer tanks 3. In this case, the film formation apparatus 1A includes 2 supply pipes 4 shown in fig. 12, and for example, the 2 supply pipes 4 are arranged so as to intersect perpendicularly. Accordingly, the opening ratio of the portion of the plurality of discharge holes 4a that is distant from the outer tank 3 is at least partially larger than the opening ratio of the portion that is distant from the outer tank 3.

as described above, in the manufacturing apparatus of a semiconductor device according to modification 2 of embodiment 1, in fig. 11, the other right-side outer tank 3 different from the left-side outer tank 3 is further provided, the left-side outer tank 3 is provided on one end side of the supply pipe 4, the right-side outer tank 3 is provided on the other end side of the supply pipe 4, and the opening ratio of a portion of the plurality of discharge holes 4a that is distant from the right-side outer tank 3 is at least partially larger than the opening ratio of a portion that is close to the right-side outer tank 3. Therefore, the flow rate of the liquid in the reaction tank 2 can be made uniform, and a plating film having excellent uniformity in film thickness and film quality can be formed on the semiconductor wafer 8. Since such an effect can be achieved with a simple configuration, an increase in equipment cost can be suppressed.

< embodiment 2>

Next, an apparatus for manufacturing a semiconductor device according to embodiment 2 will be described. Fig. 13 is a schematic view showing a relationship between the outer tank 3 and the plurality of supply pipes 4 provided in the film formation apparatus 1B as the apparatus for manufacturing a semiconductor device according to embodiment 2, and is a cross-sectional view of a portion between the supply pipe 4 and the rectifying plate 7 cut in a horizontal direction. Fig. 14 is a schematic view showing the relationship between the plurality of supply pipes 4 and the outer tank 3 provided in the film formation apparatus 1C according to embodiment 2, and is a cross-sectional view of the film formation apparatus after cutting in the horizontal direction between the supply pipes 4 and the rectifying plate 7. In embodiment 2, the same components as those described in embodiment 1 are denoted by the same reference numerals, and description thereof is omitted.

As shown in fig. 13, embodiment 2 differs from embodiment 1 in the arrangement direction of the plurality of supply tubes 4.

The outer tank 3 is provided adjacent to the reaction tank 2 in a direction perpendicular to the extending direction of the 9 supply pipes 4. More specifically, the outer tank 3 is provided adjacent to the short side of the rectangular shape of the reaction tank 2. The 9 supply pipes 4 extend in a direction parallel to the short sides of the rectangular shape of the reaction tank 2, and are arranged in a direction intersecting the direction of extension, that is, in a direction parallel to the long sides of the rectangular shape of the reaction tank 2. That is, 9 supply pipes 4 are arranged in a direction away from the outer tank 3 and intersecting the extending direction of the supply pipes 4. 9 this supply pipe 4 is connected by 2 pipes 4b intersecting the extending direction.

The opening ratio of the portion of the plurality of discharge holes 4a that is distant from the outer tub 3 is at least partially larger than the opening ratio of the portion that is distant from the outer tub 3. More specifically, the plurality of discharge holes 4a have the same diameter, and the number of supply pipes 4 is greater in the right side portion than in the left side portion of the reaction tank 2. In other words, the arrangement interval of the supply pipes 4 is narrower in the right side portion than in the left side portion of the reaction tank 2, and accordingly, the number of the discharge holes 4a is also large. Therefore, the plurality of supply pipes 4 provided with the plurality of discharge holes 4a can all be provided with the same specification. This makes it possible to easily design and manufacture the film formation device 1B. In fig. 13, the density of the plurality of discharge holes 4a may be locally increased in a portion distant from the outer tank 3 as compared with a portion close to the outer tank 3, or the density of the plurality of discharge holes 4a may be increased in a portion distant from the outer tank 3 as compared with a portion close to the outer tank 3 in the entire supply pipe 4, instead of locally.

Alternatively, as shown in fig. 14, the diameter of the discharge hole 4a of the 9 supply pipes 4 may be larger as the distance from the outer tank 3 is longer. Specifically, the number of the discharge holes 4a is changed by changing the hole diameter of each supply pipe 4 with the same number of the discharge holes 4a of each supply pipe 4, and the number of the discharge holes 4a is changed by changing the hole diameter of the discharge holes 4a of each supply pipe 4 with the same number. Alternatively, the aperture ratio can be adjusted by a combination thereof. This can increase the degree of freedom in designing the film formation device 1C, and thus the film formation device 1C can be manufactured more easily. In fig. 14, the arrangement intervals of the supply pipes 4 are narrower in the right side portion than in the left side portion of the reaction tank 2, but they may be arranged at the same intervals. In fig. 14, the hole diameters of the plurality of discharge holes 4a are larger in the portion distant from the outer tank 3 than in the portion close to the outer tank 3 in the entire supply pipe 4, but the hole diameters of the plurality of discharge holes 4a may be locally larger in the portion distant from the outer tank 3 than in the portion close to the outer tank 3 instead of the entire supply pipe 4.

As described above, in the manufacturing apparatus of a semiconductor device according to embodiment 2, a plurality of supply pipes 4 are arranged in a direction away from the outer tub 3 and intersecting the extending direction of the supply pipes 4.

Therefore, the flow rate of the liquid in the reaction tank 2 can be made uniform, and a plating film having excellent uniformity in film thickness and film quality can be formed on the semiconductor wafer 8. Since such an effect can be achieved with a simple configuration, an increase in equipment cost can be suppressed.

The outer tank 3 may be provided adjacent to the rectangular long side of the reaction tank 2. In this case, the plurality of supply pipes 4 extend in a direction parallel to the long side of the rectangular shape of the reaction tank 2. Therefore, since a larger number of supply pipes 4 can be provided than in the case of embodiment 1, the degree of freedom in design of the supply pipes 4 can be increased, and the film formation device 1 can be manufactured more easily.

In addition, as shown in fig. 13, in the film formation device 1B, since all of the plurality of supply pipes 4 provided with the plurality of ejection holes 4a can be provided with the same specification, the design and manufacture of the film formation device 1B can be facilitated.

Further, as shown in fig. 14, in the film forming apparatus 1C, the number of the ejection holes 4a can be changed for each supply pipe 4 by setting the same number of the ejection holes 4a of each supply pipe 4, the number of the ejection holes 4a can be changed by setting the same diameter of the ejection holes 4a of each supply pipe 4, or the aperture ratio can be adjusted by a combination of these, and therefore, the degree of freedom in designing the film forming apparatus 1C can be increased, and the film forming apparatus 1C can be manufactured more easily.

In addition, the present invention can freely combine the respective embodiments, and appropriately modify and omit the respective embodiments within the scope of the invention.