OLED display panel and preparation method thereof
阅读说明:本技术 Oled显示面板及制备方法 (OLED display panel and preparation method thereof ) 是由 张伟彬 于 2020-06-19 设计创作,主要内容包括:本发明实施例提供的OLED显示面板包括阵列层,阵列层包括相互触接设置的第一源极和第二源极、以及相互触接设置的第一漏极和第二漏极,源极和漏极通过过孔与有源层触接;通过分布形成相互触接的第一源/漏极和第二源/漏极,降低源漏极区过孔发生异常的几率,同时有利于源漏极区的走线布置。(The OLED display panel provided by the embodiment of the invention comprises an array layer, wherein the array layer comprises a first source electrode and a second source electrode which are mutually contacted, and a first drain electrode and a second drain electrode which are mutually contacted, and the source electrode and the drain electrode are contacted with an active layer through a through hole; the first source/drain electrode and the second source/drain electrode which are in contact with each other are formed in a distributed mode, the probability of abnormity of via holes of the source/drain electrode region is reduced, and meanwhile routing arrangement of the source/drain electrode region is facilitated.)
1. An OLED display panel, including substrate base plate, array layer, pixel definition layer, luminous functional layer and encapsulated layer, characterized in that, the array layer includes:
the buffer layer, an active layer, a first gate insulating layer, a first gate, a second gate insulating layer, a second gate, a passivation layer and an interlayer insulating layer are arranged on the buffer layer, wherein the source electrode comprises a first source electrode and a second source electrode arranged on the first source electrode in a contact mode, the drain electrode comprises a first drain electrode and a second drain electrode arranged on the first drain electrode in a contact mode, and the source electrode and the drain electrode are in contact with the active layer through a through hole.
2. The OLED display panel of claim 1, wherein the first source electrode and the first drain electrode are disposed on a same layer between the active layer and the interlayer insulating layer, and the second source electrode and the second drain electrode are disposed on a same layer on the interlayer insulating layer.
3. The OLED display panel of claim 2, wherein the first source electrode and the first drain electrode are disposed at a same layer as the second gate electrode.
4. The OLED display panel of claim 2, wherein the first source electrode and the first drain electrode are disposed at a same layer as the first gate electrode.
5. The OLED display panel of claim 2, wherein the first source electrode and the second source electrode are made of different materials, and the first drain electrode and the second drain electrode are made of different materials.
6. A preparation method of an OLED display panel is characterized by comprising the following steps:
providing a substrate base plate;
sequentially forming a buffer layer, an active layer, a first gate insulating layer, a first gate and a second gate insulating layer on the substrate;
etching the source drain region and the binding region for the first time to form a first source via hole and a first drain via hole;
forming a metal layer on the second gate insulating layer, and patterning the metal layer to form a second gate, a first source and a first drain;
sequentially forming a passivation layer and an interlayer insulating layer on the second grid;
performing second etching on the source drain region and the binding region to form a second source via hole and a second drain via hole;
forming a metal layer on the interlayer insulating layer, and patterning the metal layer to form a second source electrode and a second drain electrode;
and sequentially forming a flat layer, a pixel defining layer, a light-emitting function layer and a packaging layer on the second source electrode and the second drain electrode.
7. The method for manufacturing the OLED display panel according to claim 6, wherein in the step of performing first etching on the source-drain region and the binding region: and stopping etching the first time of the source and drain regions and the binding region when the etching gas in the source and drain regions reaches the active layer.
8. The method for manufacturing the OLED display panel according to claim 6, wherein in the step of performing the second etching on the source-drain region and the binding region: in the source-drain region, after etching gas reaches the first source and the first drain, the metal material is etched slowly, so that when the binding region is etched to a preset depth for the second time, the second etching of the source-drain region and the binding region is stopped.
9. The method of manufacturing an OLED display panel according to claim 6, wherein in the step of forming the first source electrode and the first drain electrode: and sequentially forming a titanium layer, an aluminum layer and a titanium layer on the second gate insulating layer, forming a metal layer which is formed by laminating three metal structures, and patterning the metal layer to form the first source electrode, the first drain electrode and the second gate electrode.
10. The method of manufacturing an OLED display panel according to claim 6, wherein the step of forming the first gate electrode includes: and forming a metal layer on the first gate insulating layer, and performing patterning treatment on the metal layer to form a metal pattern, wherein the metal pattern is the first gate.
Technical Field
The invention relates to the technical field of OLED display, in particular to an OLED display panel and a preparation method of the OLED display panel.
Background
In the existing OLED display panel, a source and drain region via hole is formed by one-time etching, the via hole needs to pass through four film layers, and the problems of different side etching sizes, uneven etching, etching residues, overlarge tape angle and the like easily occur due to different film layer etching rates during one-time etching, so that the film forming quality of a follow-up source electrode and a drain electrode is influenced, further, faults or poor contact occurs, the yield is reduced, and therefore, the existing OLED display panel has the technical problem of abnormity of the source and drain region via hole.
Disclosure of Invention
The embodiment of the invention provides an OLED display panel and a preparation method of the OLED display panel, which can solve the technical problem that the source and drain region via hole is abnormal in the conventional OLED display panel.
The embodiment of the invention provides an OLED display panel, which comprises a substrate base plate, an array layer, a pixel definition layer, a light-emitting function layer and an encapsulation layer, wherein the array layer comprises:
the buffer layer and set gradually active layer, first gate insulating layer, first grid, second gate insulating layer, second grid, passivation layer, interlayer insulating layer on the buffer layer, wherein, the source electrode includes first source electrode and touches and connects the setting and is in second source electrode on the first source electrode, the drain electrode includes first drain electrode and touches and connects the setting and is in second drain electrode on the first drain electrode, the source electrode with the drain electrode pass through the via hole with active layer touches and connects.
In the OLED display panel provided in the embodiment of the present invention, the first source electrode and the first drain electrode are disposed on the same layer between the active layer and the interlayer insulating layer, and the second source electrode and the second drain electrode are disposed on the same layer on the interlayer insulating layer.
In the OLED display panel provided in the embodiment of the present invention, the first source electrode, the first drain electrode, and the second gate electrode are disposed at the same layer.
In the OLED display panel provided in the embodiment of the present invention, the first source electrode, the first drain electrode, and the first gate electrode are disposed at the same layer.
In the OLED display panel provided in the embodiment of the present invention, the first source electrode and the second source electrode are made of different materials, and the first drain electrode and the second drain electrode are made of different materials.
The embodiment of the invention provides a preparation method of an OLED display panel, which comprises the following steps:
providing a substrate base plate;
sequentially forming a buffer layer, an active layer, a first gate insulating layer, a first gate and a second gate insulating layer on the substrate;
etching the source drain region and the binding region for the first time to form a first source via hole and a first drain via hole;
forming a metal layer on the second gate insulating layer, and patterning the metal layer to form a second gate, a first source and a first drain;
sequentially forming a passivation layer and an interlayer insulating layer on the second grid;
performing second etching on the source drain region and the binding region to form a second source via hole and a second drain via hole;
forming a metal layer on the interlayer insulating layer, and patterning the metal layer to form a second source electrode and a second drain electrode;
and sequentially forming a flat layer, a pixel defining layer, a light-emitting function layer and a packaging layer on the second source electrode and the second drain electrode.
In the method for manufacturing the OLED display panel according to the embodiment of the present invention, in the step of performing first etching on the source/drain region and the binding region: and stopping etching the first time of the source and drain regions and the binding region when the etching gas in the source and drain regions reaches the active layer.
In the method for manufacturing the OLED display panel according to the embodiment of the present invention, in the step of performing the second etching on the source/drain region and the binding region: in the source-drain region, after etching gas reaches the first source and the first drain, the metal material is etched slowly, so that when the binding region is etched to a preset depth for the second time, the second etching of the source-drain region and the binding region is stopped.
In the method for manufacturing an OLED display panel according to the embodiment of the present invention, in the step of forming the first source electrode and the first drain electrode: and sequentially forming a titanium layer, an aluminum layer and a titanium layer on the second gate insulating layer, forming a metal layer which is formed by laminating three metal structures, and patterning the metal layer to form the first source electrode, the first drain electrode and the second gate electrode.
In the method for manufacturing an OLED display panel provided in the embodiment of the present invention, the step of forming the first gate includes: and forming a metal layer on the first gate insulating layer, and performing patterning treatment on the metal layer to form a metal pattern, wherein the metal pattern is the first gate.
Has the advantages that: the OLED display panel provided by the embodiment of the invention comprises an array layer, wherein the array layer comprises: the source electrode comprises a first source electrode and a second source electrode which are mutually contacted, the drain electrode comprises a first drain electrode and a second drain electrode which are mutually contacted, and the source electrode and the drain electrode are contacted with the active layer through a through hole; the first source/drain electrode and the second source/drain electrode which are mutually contacted are formed in a distributed mode, the yield of the via hole, the source electrode and the drain electrode in the source/drain electrode area is improved, the probability of abnormity of the via hole in the source/drain electrode area is reduced, and meanwhile the first source/drain electrode and the second source/drain electrode which are mutually contacted are beneficial to wiring arrangement of the source/drain electrode area.
Drawings
The technical solution and other advantages of the present invention will become apparent from the following detailed description of specific embodiments of the present invention, which is to be read in connection with the accompanying drawings.
Fig. 1 is a schematic cross-sectional view of an OLED display panel according to an embodiment of the present invention;
FIG. 2 is a schematic cross-sectional view of an OLED display panel according to an embodiment of the present invention;
fig. 3 is a flowchart of a method for manufacturing an OLED display panel according to an embodiment of the present invention.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. It is to be understood that the described embodiments are merely exemplary of the invention, and not restrictive of the full scope of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like, indicate orientations and positional relationships based on those shown in the drawings, and are used only for convenience of description and simplicity of description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be considered as limiting the present invention. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, features defined as "first", "second", may explicitly or implicitly include one or more of the described features. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
As shown in fig. 1, an OLED display panel provided in an embodiment of the present invention includes a
In the present embodiment, the OLED display panel includes an array layer 20, and the array layer 20 includes: the liquid crystal display device comprises a
The source-
The source/
In one embodiment, the
Wherein the
the first source/
As shown in fig. 2, the first source/
The first source/
In view of the manufacturing process, the metal film layer, the
In view of the manufacturing process, the metal film layer and the
In one embodiment, the
The
The
The
The
In one embodiment, the
The
The
The
The
In one embodiment, the
The
The
The
The
The OLED display device provided in the embodiment of the present invention includes an OLED display panel, a diffusion sheet, an optical film, a reflection sheet, and a frame, as shown in fig. 1, the OLED display panel includes a
In the present embodiment, the OLED display panel includes an array layer 20, and the array layer 20 includes: the liquid crystal display device comprises a buffer layer 201, and an active layer 202, a first gate insulating layer 203, a first gate electrode 204, a second gate insulating layer 205, a second gate electrode 206, a passivation layer 207 and an interlayer insulating layer 208 which are sequentially arranged on the buffer layer 201, wherein the source electrode 2091 comprises a first source electrode 20911 and a second source electrode 20912 which are arranged in contact with each other, the drain electrode 2092 comprises a first drain electrode 20921 and a second drain electrode 20922 which are arranged in contact with each other, and the source electrode 2091 and the drain electrode 2092 are in contact with the active layer 202 through a via hole; the first source/drain 2092 and the second source/drain 2092 which are in contact with each other are formed in a distributed manner, so that the yield of the via hole, the source 2091 and the drain 2092 in the source/drain 2092 area is improved, the occurrence probability of the via hole abnormality in the source/drain 2092 area is reduced, and meanwhile, the first source/drain 2092 and the second source/drain 2092 which are in contact with each other are beneficial to the routing arrangement of the source/drain 2092 area.
The source-
The source/
In one embodiment, in a display device, the
Wherein the
the first source/
As shown in fig. 2, the first source/
The first source/
In view of the manufacturing process, the metal film layer, the
In view of the manufacturing process, the metal film layer and the
In one embodiment, the
The
The
The
The
In one embodiment, the
The
The
The
The
In one embodiment, in the display device, the
The
The
The
The
As shown in fig. 3, the method for manufacturing an OLED display panel according to the embodiment of the present invention includes:
s1, providing a
s2, sequentially forming a
s3, etching the source-
s4, forming a metal layer on the second
s5, sequentially forming a
s6, performing second etching on the source-
s7, forming a metal layer on the
s8, a planarization layer, a
The first etching is based on the etching depth of the source/
The etching depth of the bonding region is used as the standard for stopping etching in the second etching, and since the
The material for forming the
The SD via holes are formed through two steps, and the first source/
In one embodiment, the first etching step is performed on the source/
Since the
In this case, the stop timing of the etching can be controlled by a software by providing a sensor on the surface of the
In one embodiment, the step of etching the source/
In one embodiment, in the step of forming the
In one embodiment, the step of forming the
In one embodiment, the via is treated using a hydrogen activation process after the first etch.
In an embodiment, after forming the
In one embodiment, an organic layer is formed on the
The bonding area is provided with a plurality of layers of through holes, wherein the through holes in the bonding area can be filled with the layers of through holes, so that the effect of increasing flexibility is achieved, and subsequent bending of the bonding area is facilitated.
The OLED display panel provided by the embodiment of the invention comprises an array layer, wherein the array layer comprises: the source electrode comprises a first source electrode and a second source electrode which are mutually contacted, the drain electrode comprises a first drain electrode and a second drain electrode which are mutually contacted, and the source electrode and the drain electrode are contacted with the active layer through a through hole; the first source/drain electrode and the second source/drain electrode which are mutually contacted are formed in a distributed mode, the yield of the via hole, the source electrode and the drain electrode in the source/drain electrode area is improved, the probability of abnormity of the via hole in the source/drain electrode area is reduced, and meanwhile the first source/drain electrode and the second source/drain electrode which are mutually contacted are beneficial to wiring arrangement of the source/drain electrode area.
The foregoing detailed description is provided for one of the embodiments of the present invention, and the principle and the implementation of the present invention are explained herein by applying specific examples, and the above description of the embodiments is only used to help understanding the technical solution and the core idea of the present invention; those of ordinary skill in the art will understand that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
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